JP5202141B2 - チタニアドープ石英ガラス部材及びその製造方法 - Google Patents

チタニアドープ石英ガラス部材及びその製造方法 Download PDF

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Publication number
JP5202141B2
JP5202141B2 JP2008177076A JP2008177076A JP5202141B2 JP 5202141 B2 JP5202141 B2 JP 5202141B2 JP 2008177076 A JP2008177076 A JP 2008177076A JP 2008177076 A JP2008177076 A JP 2008177076A JP 5202141 B2 JP5202141 B2 JP 5202141B2
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JP
Japan
Prior art keywords
titania
quartz glass
refractive index
doped quartz
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2008177076A
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English (en)
Japanese (ja)
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JP2010013335A5 (enExample
JP2010013335A (ja
Inventor
繁 毎田
久利 大塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2008177076A priority Critical patent/JP5202141B2/ja
Priority to EP20110160343 priority patent/EP2341036A1/en
Priority to EP09251646.7A priority patent/EP2145865B1/en
Priority to US12/496,688 priority patent/US8105734B2/en
Priority to TW103134408A priority patent/TWI541212B/zh
Priority to KR1020090061106A priority patent/KR101513310B1/ko
Priority to TW98122787A priority patent/TWI471281B/zh
Priority to CN201210297275.7A priority patent/CN102849929B/zh
Priority to CN2009101586137A priority patent/CN101639624B/zh
Publication of JP2010013335A publication Critical patent/JP2010013335A/ja
Publication of JP2010013335A5 publication Critical patent/JP2010013335A5/ja
Priority to US13/345,936 priority patent/US8377612B2/en
Application granted granted Critical
Publication of JP5202141B2 publication Critical patent/JP5202141B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/0026—Re-forming shaped glass by gravity, e.g. sagging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31616—Next to polyester [e.g., alkyd]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2008177076A 2008-07-07 2008-07-07 チタニアドープ石英ガラス部材及びその製造方法 Active JP5202141B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2008177076A JP5202141B2 (ja) 2008-07-07 2008-07-07 チタニアドープ石英ガラス部材及びその製造方法
EP20110160343 EP2341036A1 (en) 2008-07-07 2009-06-25 Titania-doped quartz glass member and making method
EP09251646.7A EP2145865B1 (en) 2008-07-07 2009-06-25 Titania-doped quartz glass member and making method
US12/496,688 US8105734B2 (en) 2008-07-07 2009-07-02 Titania-doped quartz glass member and making method
KR1020090061106A KR101513310B1 (ko) 2008-07-07 2009-07-06 티타니아 도핑 석영 유리 부재 및 그의 제조 방법
TW98122787A TWI471281B (zh) 2008-07-07 2009-07-06 摻雜二氧化鈦石英玻璃構件及其製造方法
TW103134408A TWI541212B (zh) 2008-07-07 2009-07-06 摻雜二氧化鈦石英玻璃構件及其製造方法
CN201210297275.7A CN102849929B (zh) 2008-07-07 2009-07-07 掺杂二氧化钛的石英玻璃元件及制备方法
CN2009101586137A CN101639624B (zh) 2008-07-07 2009-07-07 掺杂二氧化钛的石英玻璃元件及制备方法
US13/345,936 US8377612B2 (en) 2008-07-07 2012-01-09 Titania-doped quartz glass member and making method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008177076A JP5202141B2 (ja) 2008-07-07 2008-07-07 チタニアドープ石英ガラス部材及びその製造方法

Publications (3)

Publication Number Publication Date
JP2010013335A JP2010013335A (ja) 2010-01-21
JP2010013335A5 JP2010013335A5 (enExample) 2011-10-27
JP5202141B2 true JP5202141B2 (ja) 2013-06-05

Family

ID=41061205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008177076A Active JP5202141B2 (ja) 2008-07-07 2008-07-07 チタニアドープ石英ガラス部材及びその製造方法

Country Status (6)

Country Link
US (2) US8105734B2 (enExample)
EP (2) EP2145865B1 (enExample)
JP (1) JP5202141B2 (enExample)
KR (1) KR101513310B1 (enExample)
CN (2) CN101639624B (enExample)
TW (2) TWI541212B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10329184B2 (en) 2015-02-13 2019-06-25 Corning Incorporated Ultralow expansion titania-silica glass

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US9399000B2 (en) 2006-06-20 2016-07-26 Momentive Performance Materials, Inc. Fused quartz tubing for pharmaceutical packaging
EP2463250B2 (en) * 2009-05-13 2019-09-25 Asahi Glass Company, Limited Methods for producing and for heat-treating a tio2-sio2 glass body
EP2508492A4 (en) * 2009-12-04 2014-07-30 Asahi Glass Co Ltd METHOD FOR PRODUCING A SILICONE-BASED GLASS SUBSTRATE FOR A MOLDING FORM AND METHOD FOR PRODUCING THE MOLDING SHAPE
JP5476982B2 (ja) 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
JP5637062B2 (ja) * 2010-05-24 2014-12-10 信越化学工業株式会社 合成石英ガラス基板及びその製造方法
US8567214B2 (en) * 2010-06-28 2013-10-29 Asahi Glass Company, Limited Method for producing glass body and method for producing optical member for EUV lithography
WO2012005333A1 (ja) * 2010-07-08 2012-01-12 旭硝子株式会社 ＴｉＯ２含有石英ガラス基材およびその製造方法
JP5737070B2 (ja) * 2010-09-02 2015-06-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
JPWO2012105513A1 (ja) * 2011-01-31 2014-07-03 旭硝子株式会社 チタニアを含有するシリカガラス体の製造方法およびチタニアを含有するシリカガラス体
JP5768452B2 (ja) 2011-04-11 2015-08-26 信越化学工業株式会社 チアニアドープ石英ガラスの製造方法
WO2013084978A1 (ja) * 2011-12-09 2013-06-13 信越石英株式会社 チタニア－シリカガラス製ｅｕｖリソグラフィ用フォトマスク基板
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
JP6336792B2 (ja) * 2013-04-25 2018-06-06 Hoya株式会社 マスクブランクの製造方法および転写用マスクの製造方法
DE102013219808A1 (de) 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
EP2960219B1 (de) * 2014-06-27 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Rohling aus Titan-dotiertem Kieselglas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung
JP6819451B2 (ja) * 2017-05-08 2021-01-27 信越化学工業株式会社 大型合成石英ガラス基板並びにその評価方法及び製造方法
DE102018211234A1 (de) 2018-07-06 2020-01-09 Carl Zeiss Smt Gmbh Substrat für ein reflektives optisches Element
JP7122997B2 (ja) 2019-04-05 2022-08-22 信越石英株式会社 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法
JP2025527429A (ja) * 2022-08-26 2025-08-22 コーニング インコーポレイテッド 均質なシリカ・チタニアガラス
WO2025193428A1 (en) * 2024-03-12 2025-09-18 Corning Incorporated Methods to produce titania-silica glass using a directional temperature difference

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10329184B2 (en) 2015-02-13 2019-06-25 Corning Incorporated Ultralow expansion titania-silica glass
US11028006B2 (en) 2015-02-13 2021-06-08 Corning Incorporated Ultralow expansion titania-silica glass

Also Published As

Publication number Publication date
CN102849929A (zh) 2013-01-02
CN102849929B (zh) 2016-02-24
EP2145865B1 (en) 2016-08-10
TW201011331A (en) 2010-03-16
CN101639624B (zh) 2013-08-07
EP2341036A1 (en) 2011-07-06
TW201512131A (zh) 2015-04-01
US8105734B2 (en) 2012-01-31
TWI541212B (zh) 2016-07-11
US8377612B2 (en) 2013-02-19
EP2145865A1 (en) 2010-01-20
JP2010013335A (ja) 2010-01-21
KR20100005679A (ko) 2010-01-15
TWI471281B (zh) 2015-02-01
US20120104336A1 (en) 2012-05-03
KR101513310B1 (ko) 2015-04-17
CN101639624A (zh) 2010-02-03
US20100003609A1 (en) 2010-01-07

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