CN101625965B - 基板处理装置 - Google Patents

基板处理装置 Download PDF

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Publication number
CN101625965B
CN101625965B CN2009101584856A CN200910158485A CN101625965B CN 101625965 B CN101625965 B CN 101625965B CN 2009101584856 A CN2009101584856 A CN 2009101584856A CN 200910158485 A CN200910158485 A CN 200910158485A CN 101625965 B CN101625965 B CN 101625965B
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CN
China
Prior art keywords
platform
substrate
floats
float
substrate board
Prior art date
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Expired - Fee Related
Application number
CN2009101584856A
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English (en)
Chinese (zh)
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CN101625965A (zh
Inventor
川口义广
元松一骑
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Filing date
Publication date
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Publication of CN101625965A publication Critical patent/CN101625965A/zh
Application granted granted Critical
Publication of CN101625965B publication Critical patent/CN101625965B/zh
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
CN2009101584856A 2008-07-11 2009-07-10 基板处理装置 Expired - Fee Related CN101625965B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008-181131 2008-07-11
JP2008181131A JP4592787B2 (ja) 2008-07-11 2008-07-11 基板処理装置
JP2008181131 2008-07-11

Publications (2)

Publication Number Publication Date
CN101625965A CN101625965A (zh) 2010-01-13
CN101625965B true CN101625965B (zh) 2011-09-21

Family

ID=41521750

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009101584856A Expired - Fee Related CN101625965B (zh) 2008-07-11 2009-07-10 基板处理装置

Country Status (4)

Country Link
JP (1) JP4592787B2 (ko)
KR (1) KR20100007725A (ko)
CN (1) CN101625965B (ko)
TW (1) TW201009991A (ko)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107017191B (zh) * 2010-02-17 2020-08-14 株式会社尼康 搬送装置、曝光装置、以及元件制造方法
CN102386091A (zh) * 2010-09-02 2012-03-21 南通康比电子有限公司 一种二极管的制造方法及其自动输出装置
CN102602695A (zh) * 2011-01-25 2012-07-25 佶新科技股份有限公司 基板输送分类装置
JP5369128B2 (ja) * 2011-03-01 2013-12-18 東京エレクトロン株式会社 浮上式塗布装置
JP5502788B2 (ja) * 2011-03-16 2014-05-28 東京エレクトロン株式会社 浮上式塗布装置
JP5869782B2 (ja) * 2011-05-30 2016-02-24 東レエンジニアリング株式会社 浮上搬送加熱装置
JP2014022538A (ja) * 2012-07-18 2014-02-03 Toray Eng Co Ltd 熱処理装置および熱処理方法
JP6053468B2 (ja) * 2012-11-20 2016-12-27 東レエンジニアリング株式会社 浮上搬送熱処理装置
JP6312959B2 (ja) * 2013-07-17 2018-04-18 セーレン株式会社 インクジェット記録装置
KR101480900B1 (ko) * 2013-08-09 2015-01-09 주식회사 포스코 코크가이드의 열팽창 영향 저감장치
KR101503176B1 (ko) * 2013-11-27 2015-03-24 주식회사 휘닉스 디지탈테크 기판 검사 장치 및 방법
KR101603205B1 (ko) 2014-02-18 2016-03-14 오미정 오아시스 지지구조를 포함하는 화환받침대
CN103928371A (zh) * 2014-04-17 2014-07-16 京东方科技集团股份有限公司 一种湿法刻蚀设备
CN110190019A (zh) * 2018-02-22 2019-08-30 圆益Ips股份有限公司 基板运送模块以及包括该模块的基板处理系统
JP6861198B2 (ja) * 2018-12-12 2021-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板搬送装置および塗布装置
CN112916559B (zh) * 2021-01-25 2022-09-13 山东圣亚圣世玻璃制品有限公司 一种免夹式玻璃清洗池
CN112850238B (zh) * 2021-02-03 2022-12-23 厦门特仪科技有限公司 一种硅片光刻用防污输送设备
KR20230164168A (ko) * 2021-04-02 2023-12-01 어플라이드 머티어리얼스, 인코포레이티드 필드 가이드 노출 후 베이킹 프로세스를 위한 프로세스 셀

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003188078A (ja) * 2001-12-19 2003-07-04 Shibaura Mechatronics Corp 基板乾燥装置
JP2006003036A (ja) * 2004-06-18 2006-01-05 Shimada Phys & Chem Ind Co Ltd 乾燥装置
JP4672538B2 (ja) * 2005-12-06 2011-04-20 東京エレクトロン株式会社 加熱処理装置
JP4272230B2 (ja) * 2006-12-22 2009-06-03 東京エレクトロン株式会社 減圧乾燥装置
JP4542577B2 (ja) * 2007-09-19 2010-09-15 東京エレクトロン株式会社 常圧乾燥装置及び基板処理装置及び基板処理方法

Also Published As

Publication number Publication date
CN101625965A (zh) 2010-01-13
JP2010021396A (ja) 2010-01-28
TW201009991A (en) 2010-03-01
JP4592787B2 (ja) 2010-12-08
KR20100007725A (ko) 2010-01-22

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