CN100592205C - 着色感光性树脂组合物 - Google Patents

着色感光性树脂组合物 Download PDF

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Publication number
CN100592205C
CN100592205C CN200410071208A CN200410071208A CN100592205C CN 100592205 C CN100592205 C CN 100592205C CN 200410071208 A CN200410071208 A CN 200410071208A CN 200410071208 A CN200410071208 A CN 200410071208A CN 100592205 C CN100592205 C CN 100592205C
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CN
China
Prior art keywords
acid
methyl
photosensitive composition
quality
pigment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN200410071208A
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English (en)
Chinese (zh)
Other versions
CN1577089A (zh
Inventor
市川幸司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of CN1577089A publication Critical patent/CN1577089A/zh
Application granted granted Critical
Publication of CN100592205C publication Critical patent/CN100592205C/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
CN200410071208A 2003-07-16 2004-07-14 着色感光性树脂组合物 Active CN100592205C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003197752 2003-07-16
JP197752/03 2003-07-16
JP197752/2003 2003-07-16

Publications (2)

Publication Number Publication Date
CN1577089A CN1577089A (zh) 2005-02-09
CN100592205C true CN100592205C (zh) 2010-02-24

Family

ID=34587132

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200410071208A Active CN100592205C (zh) 2003-07-16 2004-07-14 着色感光性树脂组合物

Country Status (3)

Country Link
KR (1) KR101096838B1 (ko)
CN (1) CN100592205C (ko)
TW (1) TWI342983B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4657808B2 (ja) * 2005-05-24 2011-03-23 東京応化工業株式会社 感光性組成物および該感光性組成物から形成されたカラーフィルタ
KR101314033B1 (ko) * 2005-06-15 2013-10-01 제이에스알 가부시끼가이샤 감광성 수지 조성물, 표시 패널용 스페이서의 형성 방법
JP4828275B2 (ja) * 2006-03-30 2011-11-30 新日鐵化学株式会社 カラーフィルター用遮光性樹脂組成物及びカラーフィルター
JP5117002B2 (ja) * 2006-07-10 2013-01-09 富士フイルム株式会社 光硬化性組成物およびそれを用いたパターン形成方法
JP2008070480A (ja) * 2006-09-12 2008-03-27 Az Electronic Materials Kk フォトレジスト用溶媒とそれを用いたスリットコーティング用フォトレジスト組成物
JP5147499B2 (ja) * 2008-02-13 2013-02-20 富士フイルム株式会社 感光性着色組成物、並びにカラーフィルタ及びその製造方法
WO2010090406A2 (ko) * 2009-02-04 2010-08-12 동우화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터, 및 이를 구비한 액정표시장치
KR102654926B1 (ko) * 2016-08-10 2024-04-05 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 금속 패턴의 형성 방법
KR101933940B1 (ko) * 2018-01-31 2018-12-31 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및/또는 컬럼 스페이서를 포함하는 컬러필터 및 컬러필터를 포함하는 화상표시장치

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4346230B2 (ja) * 2000-09-12 2009-10-21 三菱化学株式会社 カラーフィルター用組成物およびカラーフィルター
JP2002372779A (ja) * 2001-06-15 2002-12-26 Toray Ind Inc カラーフィルター用レジストおよびカラーフィルターの製造方法

Also Published As

Publication number Publication date
TW200504467A (en) 2005-02-01
TWI342983B (en) 2011-06-01
KR101096838B1 (ko) 2011-12-22
CN1577089A (zh) 2005-02-09
KR20050009175A (ko) 2005-01-24

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