CN100558735C - 全氟聚醚酰胺连接的膦酸酯、磷酸酯和其衍生物 - Google Patents

全氟聚醚酰胺连接的膦酸酯、磷酸酯和其衍生物 Download PDF

Info

Publication number
CN100558735C
CN100558735C CNB2004800239962A CN200480023996A CN100558735C CN 100558735 C CN100558735 C CN 100558735C CN B2004800239962 A CNB2004800239962 A CN B2004800239962A CN 200480023996 A CN200480023996 A CN 200480023996A CN 100558735 C CN100558735 C CN 100558735C
Authority
CN
China
Prior art keywords
alkyl
combinations
group
general formula
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2004800239962A
Other languages
English (en)
Chinese (zh)
Other versions
CN1839141A (zh
Inventor
理查德·M·弗林
马克·J·佩勒莱特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN1839141A publication Critical patent/CN1839141A/zh
Application granted granted Critical
Publication of CN100558735C publication Critical patent/CN100558735C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3808—Acyclic saturated acids which can have further substituents on alkyl
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3882—Arylalkanephosphonic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Detergent Compositions (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
CNB2004800239962A 2003-08-21 2004-07-07 全氟聚醚酰胺连接的膦酸酯、磷酸酯和其衍生物 Expired - Fee Related CN100558735C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49683703P 2003-08-21 2003-08-21
US60/496,837 2003-08-21

Publications (2)

Publication Number Publication Date
CN1839141A CN1839141A (zh) 2006-09-27
CN100558735C true CN100558735C (zh) 2009-11-11

Family

ID=34272523

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004800239962A Expired - Fee Related CN100558735C (zh) 2003-08-21 2004-07-07 全氟聚醚酰胺连接的膦酸酯、磷酸酯和其衍生物

Country Status (8)

Country Link
US (1) US7678426B2 (enExample)
EP (1) EP1656385B1 (enExample)
JP (1) JP4718463B2 (enExample)
KR (1) KR20060080920A (enExample)
CN (1) CN100558735C (enExample)
AT (1) ATE346852T1 (enExample)
DE (1) DE602004003506T2 (enExample)
WO (1) WO2005023822A1 (enExample)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7189479B2 (en) * 2003-08-21 2007-03-13 3M Innovative Properties Company Phototool coating
WO2005080406A2 (en) * 2003-12-19 2005-09-01 Jerini Ag Compounds for the inhibition of undesired cell proliferation and use thereof
ITMI20051533A1 (it) * 2005-08-04 2007-02-05 Solvay Solexis Spa Usi di composti fluororurati per il trattamento protettivo di superfici in titanio
GB2432836A (en) * 2005-12-01 2007-06-06 3M Innovative Properties Co Fluorinated surfactant
US7824755B2 (en) * 2006-06-29 2010-11-02 3M Innovative Properties Company Fluorinated leveling agents
CN101528975B (zh) * 2006-10-20 2012-05-23 3M创新有限公司 用于易于清洁的基底的方法以及由其制得的制品
US7825272B2 (en) * 2006-12-20 2010-11-02 3M Innovative Properties Company Fluorochemical urethane compounds having pendent silyl groups
WO2008147796A1 (en) * 2007-05-23 2008-12-04 3M Innovative Properties Company Aqueous compositions of fluorinated surfactants and methods of using the same
CN101679569A (zh) * 2007-06-06 2010-03-24 3M创新有限公司 氟化醚组合物以及使用该组合物的方法
WO2008154278A2 (en) * 2007-06-06 2008-12-18 3M Innovative Properties Company Fluorinated compositions and surface treatments made therefrom
EP2444428B1 (en) 2007-06-06 2013-07-24 3M Innovative Properties Company Fluorinated compositions and surface treatments made therefrom
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US7891636B2 (en) * 2007-08-27 2011-02-22 3M Innovative Properties Company Silicone mold and use thereof
US8115920B2 (en) * 2007-11-14 2012-02-14 3M Innovative Properties Company Method of making microarrays
US8071277B2 (en) * 2007-12-21 2011-12-06 3M Innovative Properties Company Method and system for fabricating three-dimensional structures with sub-micron and micron features
US20100270020A1 (en) * 2007-12-21 2010-10-28 Baran Jr Jimmie R Methods for treating hydrocarbon-bearing formations with fluorinated anionic surfactant compositions
US20100285227A1 (en) * 2007-12-31 2010-11-11 Yapel Robert A Method for applying a coatable material
EP2268418A1 (en) * 2008-03-26 2011-01-05 3M Innovative Properties Company Methods of slide coating two or more fluids
JP5519629B2 (ja) * 2008-03-26 2014-06-11 スリーエム イノベイティブ プロパティズ カンパニー ２種以上の流体をスライド塗布する方法
EP2268416A1 (en) * 2008-03-26 2011-01-05 3M Innovative Properties Company Methods of slide coating fluids containing multi unit polymeric precursors
JP2011528659A (ja) * 2008-07-18 2011-11-24 スリーエム イノベイティブ プロパティズ カンパニー フッ素化エーテル化合物及びその使用方法
WO2010062843A1 (en) * 2008-11-25 2010-06-03 3M Innovative Properties Company Fluorinated ether urethanes and methods of using the same
US8846160B2 (en) 2008-12-05 2014-09-30 3M Innovative Properties Company Three-dimensional articles using nonlinear thermal polymerization
CN102307734B (zh) 2008-12-11 2015-06-03 3M创新有限公司 图案化方法
WO2010080353A2 (en) * 2008-12-18 2010-07-15 3M Innovative Properties Company Method of contacting hydrocarbon-bearing formations with fluorinated phosphate and phosphonate compositions
WO2010080473A1 (en) 2008-12-18 2010-07-15 3M Innovative Properties Company Method of contacting hydrocarbon-bearing formations with fluorinated ether compositions
EP2451891B1 (en) 2009-07-09 2015-08-19 3M Innovative Properties Company Methods for treating carbonate hydrocarbon-bearing formations with fluorinated amphoteric compounds
US9096712B2 (en) 2009-07-21 2015-08-04 3M Innovative Properties Company Curable compositions, method of coating a phototool, and coated phototool
WO2011034845A1 (en) 2009-09-16 2011-03-24 3M Innovative Properties Company Fluorinated coating and phototools made therewith
US8268067B2 (en) 2009-10-06 2012-09-18 3M Innovative Properties Company Perfluoropolyether coating composition for hard surfaces
JP6345935B2 (ja) 2010-10-28 2018-06-20 スリーエム イノベイティブ プロパティズ カンパニー 細菌付着を低減するための加工表面
EP2635622A4 (en) 2010-11-02 2014-04-16 3M Innovative Properties Co SILOXANPROPOPOPOLYMERS FOR FORMING SOLUTION
EP2635614B1 (en) 2010-11-04 2015-08-12 3M Innovative Properties Company Fluorinated composition comprising phosphorus containing acid group and alkoxy silane group
FR2969663B1 (fr) * 2010-12-23 2013-01-18 Surfactis Technologies Composition hydrophobe et lipophobe de molecules bisphosphoniques et thiols
EP2500009A1 (en) 2011-03-17 2012-09-19 3M Innovative Properties Company Dental ceramic article, process of production and use thereof
BR112015029292B1 (pt) 2013-05-21 2022-06-14 3M Innovative Properties Company Portador de esporos nanoestruturado
WO2015061065A1 (en) 2013-10-24 2015-04-30 3M Innovative Properties Company Retroreflective articles with anti-staining properties
KR20170042683A (ko) 2014-08-19 2017-04-19 쓰리엠 이노베이티브 프로퍼티즈 컴파니 양친매성 중합체, 코팅 조성물, 및 방법
US10167356B2 (en) 2014-12-18 2019-01-01 3M Innovative Properties Company Fluorinated polymers comprising phosphonic moieties
US10534120B2 (en) 2015-04-03 2020-01-14 Moxtek, Inc. Wire grid polarizer with protected wires
JP6488890B2 (ja) * 2015-06-03 2019-03-27 信越化学工業株式会社 フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体、該誘導体を含む表面処理剤、該表面処理剤で処理された物品及び光学物品
JP6520419B2 (ja) * 2015-06-04 2019-05-29 信越化学工業株式会社 フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤、該表面処理剤で処理された物品及び光学物品
CN108137798B (zh) * 2015-10-09 2020-06-09 信越化学工业株式会社 含有氟代氧化亚烷基的聚合物改性膦酸衍生物、以及对应的表面处理剂和表面处理方法
GB201609437D0 (en) 2016-05-27 2016-07-13 Sphere Fluidics Ltd Surfactants
CN109415326A (zh) 2016-06-29 2019-03-01 3M创新有限公司 可聚合的离子液体组合物
GB201719846D0 (en) 2017-11-29 2018-01-10 Sphere Fluidics Ltd Surfactant
KR102855117B1 (ko) 2021-06-03 2025-09-05 삼성디스플레이 주식회사 표시 장치 및 표시 장치의 제조 방법
CN113549211B (zh) * 2021-06-04 2024-01-26 广州优尔材料科技有限公司 含全氟聚醚的磷酸化合物、表面处理剂及物品
CN113321799B (zh) * 2021-06-04 2023-10-24 广州优尔材料科技有限公司 全氟聚醚偕二磷酸化合物、表面处理剂及使用方法、物品
JP7365086B1 (ja) 2023-04-04 2023-10-19 株式会社ハーベス パーフルオロポリエーテル基含有ホスホネート化合物、表面処理剤、及び該表面処理剤で処理された物品

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA761007A (en) 1967-06-13 E. Le Bleu Ronald Polyfluoropolyoxa-alkyl phosphates
US3274244A (en) * 1963-06-14 1966-09-20 Du Pont Polyfluoropolyoxa-alkanamidoalkyl compounds
US3492374A (en) * 1963-06-14 1970-01-27 Du Pont Polyfluoropolyoxa-alkyl phosphates
US3306855A (en) * 1966-03-24 1967-02-28 Du Pont Corrosion and rust inhibited poly (hexafluoropropylene oxide) oil compositions
US3810874A (en) * 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
US3734687A (en) * 1969-04-04 1973-05-22 Fmc Corp A fabric finished with a fluorinated quarternized halomethyl ether
US3646085A (en) * 1970-09-24 1972-02-29 Du Pont Perfluoroalkyletheramidoalkyltrialkoxysilanes
US3901727A (en) * 1971-03-08 1975-08-26 Minnesota Mining & Mfg Process and composition for cleaning and imparting water and oil repellency and stain resistance to a substrate
US3950588A (en) * 1974-11-01 1976-04-13 Minnesota Mining And Manufacturing Company Coating of silanol-reactive surfaces with di-silyl poly(perfluorooxyalkylenes)
JPS60190727A (ja) * 1984-03-09 1985-09-28 Daikin Ind Ltd 含フツ素有機シラン化合物およびその製法と用途
ES2043640T3 (es) * 1987-12-21 1994-01-01 Union Carbide Corp Fluidos supercriticos como diluyentes en la aplicacion por rociada liquida de revestimientos.
JPH01268696A (ja) * 1988-04-19 1989-10-26 Daikin Ind Ltd 含フッ素リン酸エステル及びその製法並びに含フッ素防錆剤
US5106650A (en) * 1988-07-14 1992-04-21 Union Carbide Chemicals & Plastics Technology Corporation Electrostatic liquid spray application of coating with supercritical fluids as diluents and spraying from an orifice
US5108799A (en) * 1988-07-14 1992-04-28 Union Carbide Chemicals & Plastics Technology Corporation Liquid spray application of coatings with supercritical fluids as diluents and spraying from an orifice
US5066522A (en) * 1988-07-14 1991-11-19 Union Carbide Chemicals And Plastics Technology Corporation Supercritical fluids as diluents in liquid spray applications of adhesives
US5032279A (en) * 1989-09-21 1991-07-16 Occidental Chemical Corporation Separation of fluids using polyimidesiloxane membrane
AU632869B2 (en) * 1989-12-14 1993-01-14 Minnesota Mining And Manufacturing Company Fluorocarbon-based coating compositions and articles derived therefrom
US5256318A (en) * 1990-04-07 1993-10-26 Daikin Industries Ltd. Leather treatment and process for treating leather
US5227008A (en) * 1992-01-23 1993-07-13 Minnesota Mining And Manufacturing Company Method for making flexible circuits
IT1256721B (it) 1992-12-16 1995-12-15 Ausimont Spa Processo per impartire oleo- ed idro-repellenza alla superficie di materiali ceramici porosi
US5274159A (en) * 1993-02-18 1993-12-28 Minnesota Mining And Manufacturing Company Destructable fluorinated alkoxysilane surfactants and repellent coatings derived therefrom
US5550277A (en) * 1995-01-19 1996-08-27 Paciorek; Kazimiera J. L. Perfluoroalkyl and perfluoroalkylether substituted aromatic phosphates, phosphonates and related compositions
JP3820614B2 (ja) 1996-02-09 2006-09-13 住友化学株式会社 シラン化合物被膜の形成方法
JP3365470B2 (ja) * 1996-07-31 2003-01-14 エヌオーケー株式会社 フッ素ベース磁性流体
JP3976350B2 (ja) 1997-03-14 2007-09-19 スリーエム カンパニー 反応性シラン官能性を有する要求に応じて硬化する、湿分硬化性組成物
US5851674A (en) * 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6127000A (en) * 1997-10-10 2000-10-03 North Carolina State University Method and compositions for protecting civil infrastructure
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
WO1999037626A1 (en) * 1998-01-27 1999-07-29 Minnesota Mining And Manufacturing Company Fluorochemical benzotriazoles
US6184187B1 (en) * 1998-04-07 2001-02-06 E. I. Dupont De Nemours And Company Phosphorus compounds and their use as corrosion inhibitors for perfluoropolyethers
TW591097B (en) * 1998-12-10 2004-06-11 Toray Industries Optical articles and the preparation of optical articles
US6177357B1 (en) * 1999-04-30 2001-01-23 3M Innovative Properties Company Method for making flexible circuits
US6403211B1 (en) * 2000-07-18 2002-06-11 3M Innovative Properties Company Liquid crystal polymer for flexible circuits
ITMI20010114A1 (it) * 2001-01-23 2002-07-23 Ausimont Spa Processo per ottenere miscele di mono- e biesteri fosforici
JP4409122B2 (ja) 2001-07-18 2010-02-03 Ｎｏｋクリューバー株式会社 軸受用グリース組成物
US6824882B2 (en) * 2002-05-31 2004-11-30 3M Innovative Properties Company Fluorinated phosphonic acids
US7189479B2 (en) * 2003-08-21 2007-03-13 3M Innovative Properties Company Phototool coating

Also Published As

Publication number Publication date
US20050048288A1 (en) 2005-03-03
KR20060080920A (ko) 2006-07-11
DE602004003506T2 (de) 2007-09-20
DE602004003506D1 (de) 2007-01-11
CN1839141A (zh) 2006-09-27
ATE346852T1 (de) 2006-12-15
JP4718463B2 (ja) 2011-07-06
EP1656385B1 (en) 2006-11-29
JP2007502814A (ja) 2007-02-15
EP1656385A1 (en) 2006-05-17
US7678426B2 (en) 2010-03-16
WO2005023822A1 (en) 2005-03-17

Similar Documents

Publication Publication Date Title
CN100558735C (zh) 全氟聚醚酰胺连接的膦酸酯、磷酸酯和其衍生物
US7189479B2 (en) Phototool coating
CN1914183B (zh) 全氟聚醚苯并三唑衍生物和其作为涂料的用途
US7901868B2 (en) Photoresist topcoat for a photolithographic process
JP5932820B2 (ja) 光学装置の表面処理プロセス及びそれによって製造される防汚性物品
CN101622579B (zh) 具有斥水性区域的图案的处理基材及其制造方法、以及形成有功能性材料的膜构成的图案的构件的制造方法
US20110062619A1 (en) Silsesquioxane derived hard, hydrophobic and thermally stable thin films and coatings for tailorable protective and multi-structured surfaces and interfaces
KR20140050043A (ko) 디바이스 리소그래피에 사용하기 위한 자기-조립성 폴리머를 위한 템플릿의 제공 방법
EP0065352A2 (en) Light-sensitive polymer composition
JPS58167597A (ja) フルオロアミノシラン化合物
WO2012093736A1 (en) Method for cleansing nanoimprinting molds
JP5572802B2 (ja) 接着方法並びにそれを用いて作製したバイオケミカルチップ及び光学部品
KR20210022978A (ko) 불소 함유 (폴리)에테르기를 갖는 실란 화합물, 이를 포함하는 조성물, 이로부터 형성된 필름, 표시 장치 및 물품
US8034532B2 (en) High contact angle topcoat material and use thereof in lithography process
JP5712658B2 (ja) ポジ型感光性樹脂組成物
JP7257412B2 (ja) 透明ポリイミドフィルムの製造方法
US20130292877A1 (en) Nanoimprinting method
KR20190042033A (ko) 조성물
JPS6324554B2 (enExample)
JP7273352B2 (ja) 表面処理剤
TW202442760A (zh) 感光性樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件
TW202506830A (zh) 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件
TW202517714A (zh) 樹脂組成物、硬化物、積層體、硬化物之製造方法、積層體之製造方法、半導體元件之製造方法及半導體元件
TW202521606A (zh) 樹脂組成物、硬化物、積層體及硬化物的製造方法
JP2021169560A (ja) ポリイミドフィルムの製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20091111

Termination date: 20130707