CN100540318C - 绘图方法以及绘图装置 - Google Patents
绘图方法以及绘图装置 Download PDFInfo
- Publication number
- CN100540318C CN100540318C CNB2004100716639A CN200410071663A CN100540318C CN 100540318 C CN100540318 C CN 100540318C CN B2004100716639 A CNB2004100716639 A CN B2004100716639A CN 200410071663 A CN200410071663 A CN 200410071663A CN 100540318 C CN100540318 C CN 100540318C
- Authority
- CN
- China
- Prior art keywords
- mentioned
- cut zone
- control signal
- drawing device
- spatial light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K15/00—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers
- G06K15/02—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers
- G06K15/12—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers
- G06K15/1238—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point
- G06K15/1242—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point on one main scanning line
- G06K15/1252—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point on one main scanning line using an array of light modulators, e.g. a linear array
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Facsimile Scanning Arrangements (AREA)
- Ink Jet (AREA)
Abstract
Description
Claims (32)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003277613 | 2003-07-22 | ||
JP2003277613 | 2003-07-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1590110A CN1590110A (zh) | 2005-03-09 |
CN100540318C true CN100540318C (zh) | 2009-09-16 |
Family
ID=33487682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100716639A Expired - Fee Related CN100540318C (zh) | 2003-07-22 | 2004-07-21 | 绘图方法以及绘图装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20050018255A1 (zh) |
EP (1) | EP1500515A2 (zh) |
JP (2) | JP2005055881A (zh) |
KR (1) | KR100752588B1 (zh) |
CN (1) | CN100540318C (zh) |
TW (1) | TWI262138B (zh) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4373731B2 (ja) * | 2003-07-22 | 2009-11-25 | 富士フイルム株式会社 | 描画装置及び描画方法 |
JP4647355B2 (ja) * | 2004-03-29 | 2011-03-09 | 富士フイルム株式会社 | マルチビーム露光方法及び装置 |
JP2006113413A (ja) * | 2004-10-15 | 2006-04-27 | Fuji Photo Film Co Ltd | 描画方法および描画装置 |
JP2006113412A (ja) * | 2004-10-15 | 2006-04-27 | Fuji Photo Film Co Ltd | 描画方法および描画装置 |
JP4638826B2 (ja) * | 2005-02-04 | 2011-02-23 | 富士フイルム株式会社 | 描画装置及び描画方法 |
TW200640245A (en) * | 2005-02-04 | 2006-11-16 | Fuji Photo Film Co Ltd | Rendering device and rendering method |
JP4843344B2 (ja) * | 2005-03-18 | 2011-12-21 | 株式会社リコー | 照明装置及び画像読取装置 |
US7403265B2 (en) | 2005-03-30 | 2008-07-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing data filtering |
JP2006284842A (ja) * | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | パターン形成方法 |
CA2603170A1 (en) * | 2005-04-02 | 2006-10-12 | Punch Graphix Prepress Germany Gmbh | Exposure device for press plates |
JP2006337601A (ja) * | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | 描画装置及び描画方法 |
JP4753625B2 (ja) * | 2005-05-31 | 2011-08-24 | 大日本スクリーン製造株式会社 | パターン描画装置およびブロック数決定方法 |
JP2006350022A (ja) * | 2005-06-16 | 2006-12-28 | Fujifilm Holdings Corp | 描画装置及び描画方法 |
JP2007003661A (ja) * | 2005-06-22 | 2007-01-11 | Fujifilm Holdings Corp | パターン形成方法 |
JP2007010785A (ja) * | 2005-06-28 | 2007-01-18 | Fujifilm Holdings Corp | 永久パターン形成方法 |
JP4773146B2 (ja) * | 2005-07-01 | 2011-09-14 | 富士フイルム株式会社 | 半導体レーザの駆動方法および装置、並びに半導体レーザ駆動電流パターンの導出方法および装置 |
JP2007024969A (ja) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | セル内構造の製造方法及びセル内構造並びに表示装置 |
JP2007025394A (ja) * | 2005-07-19 | 2007-02-01 | Fujifilm Holdings Corp | パターン形成方法 |
JP2007086373A (ja) * | 2005-09-21 | 2007-04-05 | Fujifilm Corp | 永久パターン形成方法 |
JP4532381B2 (ja) * | 2005-09-30 | 2010-08-25 | 富士フイルム株式会社 | 描画方法および装置 |
JP2007101617A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | 描画装置及び描画方法 |
JP5022587B2 (ja) | 2005-10-07 | 2012-09-12 | 富士フイルム株式会社 | 半導体レーザの駆動方法および装置、並びに補正パターンの導出方法および装置 |
US7676153B1 (en) | 2005-10-17 | 2010-03-09 | The United States Of America As Represented By The Secretary Of The Air Force | Digital delay device |
JP4938784B2 (ja) * | 2005-10-26 | 2012-05-23 | マイクロニック レーザー システムズ アクチボラゲット | 書込み装置および方法 |
US8122846B2 (en) | 2005-10-26 | 2012-02-28 | Micronic Mydata AB | Platforms, apparatuses, systems and methods for processing and analyzing substrates |
TWI432908B (zh) * | 2006-03-10 | 2014-04-01 | Mapper Lithography Ip Bv | 微影系統及投射方法 |
JP5258226B2 (ja) | 2007-08-10 | 2013-08-07 | 株式会社オーク製作所 | 描画装置および描画方法 |
JP5241226B2 (ja) * | 2007-12-27 | 2013-07-17 | 株式会社オーク製作所 | 描画装置および描画方法 |
JP5253037B2 (ja) * | 2008-08-18 | 2013-07-31 | 株式会社日立ハイテクノロジーズ | 露光装置、露光方法、及び表示用パネル基板の製造方法 |
JP5416867B2 (ja) * | 2009-12-28 | 2014-02-12 | 株式会社日立ハイテクノロジーズ | 露光装置、露光方法、及び表示用パネル基板の製造方法 |
WO2014140046A2 (en) | 2013-03-12 | 2014-09-18 | Micronic Mydata AB | Mechanically produced alignment fiducial method and device |
WO2014140047A2 (en) | 2013-03-12 | 2014-09-18 | Micronic Mydata AB | Method and device for writing photomasks with reduced mura errors |
JP7427352B2 (ja) | 2017-12-27 | 2024-02-05 | 株式会社アドテックエンジニアリング | 露光装置 |
JP6625151B2 (ja) * | 2018-03-13 | 2019-12-25 | 株式会社フジクラ | レーザモジュール |
CN112034615B (zh) * | 2020-08-31 | 2022-06-24 | 同济大学 | 高速扫描用可变透镜的控制编码方法、装置及介质 |
CN114257746A (zh) * | 2021-12-23 | 2022-03-29 | 深圳市先地图像科技有限公司 | 一种激光直接成像设备曝光图像的方法及相关设备 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6201521B1 (en) * | 1995-09-29 | 2001-03-13 | Texas Instruments Incorporated | Divided reset for addressing spatial light modulator |
JP2000155377A (ja) * | 1998-11-19 | 2000-06-06 | Noritsu Koki Co Ltd | 写真焼付装置 |
US6402171B1 (en) * | 2000-07-18 | 2002-06-11 | Maclean-Fogg Company | Link assembly for automotive suspension system |
US6436913B1 (en) * | 2000-07-25 | 2002-08-20 | Pharmacia & Upjohn Company | Use of estramustine phosphate in the treatment of bone metastasis |
US6606739B2 (en) * | 2000-11-14 | 2003-08-12 | Ball Semiconductor, Inc. | Scaling method for a digital photolithography system |
JP2003115449A (ja) * | 2001-02-15 | 2003-04-18 | Nsk Ltd | 露光装置 |
JP2002365570A (ja) * | 2001-06-05 | 2002-12-18 | Ricoh Co Ltd | 光走査装置における像面調整方法および線像結像光学系、光走査装置および画像形成装置 |
JP5144863B2 (ja) * | 2001-06-29 | 2013-02-13 | 株式会社オーク製作所 | 多重露光描画方法及び多重露光描画装置 |
JP4324645B2 (ja) * | 2001-08-21 | 2009-09-02 | 株式会社オーク製作所 | 多重露光描画装置および多重露光描画方法 |
EP1381241A3 (en) * | 2002-07-10 | 2007-09-05 | FUJIFILM Corporation | Display device |
KR100519433B1 (ko) * | 2002-12-26 | 2005-10-10 | 우삼의료기 주식회사 | 정형용 소프트 캐스팅 테이프 |
-
2004
- 2004-07-13 JP JP2004205415A patent/JP2005055881A/ja active Pending
- 2004-07-21 EP EP04017222A patent/EP1500515A2/en not_active Withdrawn
- 2004-07-21 CN CNB2004100716639A patent/CN100540318C/zh not_active Expired - Fee Related
- 2004-07-21 US US10/895,118 patent/US20050018255A1/en not_active Abandoned
- 2004-07-22 TW TW093121841A patent/TWI262138B/zh not_active IP Right Cessation
- 2004-07-22 KR KR1020040057359A patent/KR100752588B1/ko active IP Right Grant
-
2007
- 2007-12-03 JP JP2007311939A patent/JP2008098659A/ja not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1500515A2 (en) | 2005-01-26 |
TWI262138B (en) | 2006-09-21 |
US20050018255A1 (en) | 2005-01-27 |
JP2005055881A (ja) | 2005-03-03 |
TW200526424A (en) | 2005-08-16 |
KR20050012164A (ko) | 2005-01-31 |
JP2008098659A (ja) | 2008-04-24 |
KR100752588B1 (ko) | 2007-08-29 |
CN1590110A (zh) | 2005-03-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: FUJI PHOTO FILM CO., LTD. Free format text: FORMER OWNER: FUJIFILM HOLDINGS CORP. Effective date: 20070914 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20070914 Address after: Tokyo, Japan Applicant after: Fuji Film Corp. Address before: Tokyo, Japan Applicant before: Fuji Photo Film Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090916 Termination date: 20100721 |