CN100377381C - 制造发光装置的方法 - Google Patents

制造发光装置的方法 Download PDF

Info

Publication number
CN100377381C
CN100377381C CNB021411360A CN02141136A CN100377381C CN 100377381 C CN100377381 C CN 100377381C CN B021411360 A CNB021411360 A CN B021411360A CN 02141136 A CN02141136 A CN 02141136A CN 100377381 C CN100377381 C CN 100377381C
Authority
CN
China
Prior art keywords
organic compound
compound layer
emitting device
pixel electrode
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB021411360A
Other languages
English (en)
Chinese (zh)
Other versions
CN1396792A (zh
Inventor
山崎舜平
荒井康行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Publication of CN1396792A publication Critical patent/CN1396792A/zh
Application granted granted Critical
Publication of CN100377381C publication Critical patent/CN100377381C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/17—Ink jet characterised by ink handling
    • B41J2/175—Ink supply systems ; Circuit parts therefor
    • B41J2/17596—Ink pumps, ink valves
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CNB021411360A 2001-07-06 2002-07-05 制造发光装置的方法 Expired - Lifetime CN100377381C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001206751A JP2003022892A (ja) 2001-07-06 2001-07-06 発光装置の製造方法
JP206751/01 2001-07-06
JP206751/2001 2001-07-06

Publications (2)

Publication Number Publication Date
CN1396792A CN1396792A (zh) 2003-02-12
CN100377381C true CN100377381C (zh) 2008-03-26

Family

ID=19042837

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB021411360A Expired - Lifetime CN100377381C (zh) 2001-07-06 2002-07-05 制造发光装置的方法

Country Status (4)

Country Link
US (5) US7378291B2 (https=)
JP (1) JP2003022892A (https=)
CN (1) CN100377381C (https=)
TW (1) TWI287413B (https=)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3969698B2 (ja) * 2001-05-21 2007-09-05 株式会社半導体エネルギー研究所 発光装置の作製方法
US20020197393A1 (en) * 2001-06-08 2002-12-26 Hideaki Kuwabara Process of manufacturing luminescent device
JP2003022892A (ja) * 2001-07-06 2003-01-24 Semiconductor Energy Lab Co Ltd 発光装置の製造方法
GB0225202D0 (en) 2002-10-30 2002-12-11 Hewlett Packard Co Electronic components
JP3966283B2 (ja) * 2003-01-28 2007-08-29 セイコーエプソン株式会社 発光体とその製造方法及び製造装置、電気光学装置並びに電子機器
JP2004335492A (ja) 2003-03-07 2004-11-25 Junji Kido 有機電子材料の塗布装置およびそれを使用した有機電子素子の製造方法
JP3915734B2 (ja) * 2003-05-12 2007-05-16 ソニー株式会社 蒸着マスクおよびこれを用いた表示装置の製造方法、ならびに表示装置
US7893438B2 (en) * 2003-10-16 2011-02-22 Samsung Mobile Display Co., Ltd. Organic light-emitting display device including a planarization pattern and method for manufacturing the same
KR101195165B1 (ko) 2003-11-14 2012-10-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치의 제조 방법
WO2005050597A1 (en) 2003-11-14 2005-06-02 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device and method for manufacturing the same
KR100741962B1 (ko) * 2003-11-26 2007-07-23 삼성에스디아이 주식회사 평판표시장치
US7374977B2 (en) * 2003-12-17 2008-05-20 Semiconductor Energy Laboratory Co., Ltd. Droplet discharge device, and method for forming pattern, and method for manufacturing display device
GB0402559D0 (en) * 2004-02-05 2004-03-10 Cambridge Display Tech Ltd Molecular electronic device fabrication methods and structures
WO2005098993A1 (en) * 2004-04-05 2005-10-20 Koninklijke Philips Electronics N.V. Method for providing a substrate with a printed pattern
CN101219596B (zh) * 2004-05-12 2011-04-27 精工爱普生株式会社 液滴喷出装置、以及电光学装置及其制造方法
JP2008505991A (ja) * 2004-05-18 2008-02-28 メルク　パテント　ゲゼルシャフト　ミット　ベシュレンクテル　ハフトング 半導電性ポリマーを含むインクジェット印刷用の配合物
US7757631B2 (en) * 2004-05-26 2010-07-20 Hewlett-Packard Development Company, L.P. Apparatus for forming a circuit
JP5017826B2 (ja) * 2004-09-21 2012-09-05 カシオ計算機株式会社 ディスプレイパネル及びその駆動方法
GB0424294D0 (en) * 2004-11-03 2004-12-01 Elam T Ltd Buffer layer
JP2006252787A (ja) * 2005-03-08 2006-09-21 Toppan Printing Co Ltd 有機ｅｌ素子製造方法および有機ｅｌ素子
JP4894150B2 (ja) * 2005-03-15 2012-03-14 セイコーエプソン株式会社 電気光学装置の製造方法、液滴吐出装置
JP4539518B2 (ja) * 2005-03-31 2010-09-08 セイコーエプソン株式会社 電気光学装置及び電気光学装置の製造方法
JP2007103302A (ja) * 2005-10-07 2007-04-19 Toshiba Matsushita Display Technology Co Ltd 塗布装置及び塗布方法
JP2007115465A (ja) * 2005-10-19 2007-05-10 Toppan Printing Co Ltd 有機エレクトロルミネッセンス素子
JP4747793B2 (ja) * 2005-11-14 2011-08-17 セイコーエプソン株式会社 電気光学装置、電気光学装置の製造方法及び画像形成装置
JP4251330B2 (ja) * 2005-12-22 2009-04-08 カシオ計算機株式会社 表示装置の製造装置及び表示装置の製造方法
WO2007129551A1 (ja) * 2006-05-01 2007-11-15 Ulvac, Inc. 印刷装置
JP2008078011A (ja) * 2006-09-22 2008-04-03 Seiko Epson Corp 発光装置および電子機器
US20100051993A1 (en) * 2008-09-03 2010-03-04 Casio Computer Co., Ltd. Light emitting apparatus and manufacturing method thereof
JP4770896B2 (ja) * 2008-09-08 2011-09-14 カシオ計算機株式会社 発光装置及び発光装置の製造方法
GB2463670A (en) * 2008-09-19 2010-03-24 Cambridge Display Tech Ltd A method for inkjet printing organic electronic devices
JP2013188892A (ja) * 2012-03-12 2013-09-26 Toshiba Tec Corp インクジェットヘッド
US8906713B2 (en) * 2012-03-30 2014-12-09 Nthdegree Technologies Worldwide Inc. LED lamp using blue and cyan LEDs and a phosphor
KR20190123811A (ko) 2012-12-27 2019-11-01 카티바, 인크. 정밀 공차 내로 유체를 증착하기 위한 인쇄 잉크 부피 제어를 위한 기법
US12330178B2 (en) 2012-12-27 2025-06-17 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
US11673155B2 (en) 2012-12-27 2023-06-13 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
US11141752B2 (en) 2012-12-27 2021-10-12 Kateeva, Inc. Techniques for arrayed printing of a permanent layer with improved speed and accuracy
KR102034420B1 (ko) 2013-12-12 2019-11-08 카티바, 인크. 두께를 제어하기 위해 하프토닝을 이용하는 잉크-기반 층 제조
JP6375705B2 (ja) * 2014-01-17 2018-08-22 株式会社リコー 情報処理システム、端末装置及びプログラム
KR20150129153A (ko) * 2014-05-08 2015-11-19 삼성디스플레이 주식회사 유기 발광 표시 장치의 제조 장치 및 제조 방법
JP2018107084A (ja) * 2016-12-28 2018-07-05 株式会社半導体エネルギー研究所 発光装置の製造方法
KR102690047B1 (ko) 2017-11-29 2024-07-29 엘지디스플레이 주식회사 박막트랜지스터 어레이 기판 및 그를 포함하는 유기발광표시장치
KR102598753B1 (ko) * 2017-12-12 2023-11-03 엘지디스플레이 주식회사 산화물 반도체 패턴을 포함하는 디스플레이 장치
KR102660491B1 (ko) * 2017-12-15 2024-04-23 엘지디스플레이 주식회사 전계발광 표시장치
KR102574096B1 (ko) * 2017-12-29 2023-09-01 엘지디스플레이 주식회사 유기발광표시패널 및 그 제조 방법과 이를 이용한 유기발광표시장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1212114A (zh) * 1996-11-25 1999-03-24 精工爱普生株式会社 有机电致发光元件及其制造方法和有机电致发光显示装置
JP2000106278A (ja) * 1997-09-02 2000-04-11 Seiko Epson Corp 有機ｅｌ素子の製造方法及び有機ｅｌ素子
US6066357A (en) * 1998-12-21 2000-05-23 Eastman Kodak Company Methods of making a full-color organic light-emitting display
CN1291786A (zh) * 1999-10-12 2001-04-18 株式会社半导体能源研究所 电光器件及其制作方法

Family Cites Families (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10283A (en) * 1853-11-29 Tightening packing of engine and pump pistons
US1709926A (en) * 1923-12-15 1929-04-23 American Telephone & Telegraph Apparatus and method for transmitting pictures
US4146900A (en) * 1977-07-13 1979-03-27 St. Regis Paper Company Printing system
JPS60104337A (ja) 1983-11-11 1985-06-08 Fujitsu Ltd インクジエツトヘツド
JPS61173944A (ja) * 1985-01-30 1986-08-05 Tokyo Electric Co Ltd 画像記録方法及びその装置
US4742963A (en) * 1986-02-21 1988-05-10 Marvaldi Douglas A Aerosol airbrush
JP2752420B2 (ja) * 1989-03-24 1998-05-18 キヤノン株式会社 インクジェット記録装置
JP2812980B2 (ja) * 1989-03-28 1998-10-22 株式会社リコー 液体噴射記録装置
JPH04338545A (ja) * 1991-05-15 1992-11-25 Fujitsu Ltd インクジェット記録装置
US6081281A (en) * 1991-12-30 2000-06-27 Vutek, Inc. Spray head for a computer-controlled automatic image reproduction system
JPH0780384A (ja) * 1993-09-10 1995-03-28 Hirata Corp 流体塗布装置
US6342275B1 (en) * 1993-12-24 2002-01-29 Seiko Epson Corporation Method and apparatus for atmospheric pressure plasma surface treatment, method of manufacturing semiconductor device, and method of manufacturing ink jet printing head
JP3595909B2 (ja) * 1994-06-10 2004-12-02 ノードソン株式会社 スプレイ塗布によるスピンコーティング方法
JPH0817700A (ja) * 1994-06-24 1996-01-19 Toshiba Microelectron Corp レジスト塗布方法およびレジスト塗布装置
US5684365A (en) 1994-12-14 1997-11-04 Eastman Kodak Company TFT-el display panel using organic electroluminescent media
KR100229231B1 (ko) * 1995-04-04 1999-11-01 미다라이 후지오 전자 방출 소자 형성용 금속 함유 조성물, 및 전자방출소자,전자원및화상형성장치의제조방법
EP0738599B1 (en) * 1995-04-19 2002-10-16 Seiko Epson Corporation Ink Jet recording head and method of producing same
EP0788882B1 (en) * 1996-01-29 2002-07-17 Seiko Epson Corporation Ink-jet recording head
EP0800920B1 (en) * 1996-04-10 2002-02-06 Seiko Epson Corporation Ink jet recording head
JP3036436B2 (ja) 1996-06-19 2000-04-24 セイコーエプソン株式会社 アクティブマトリックス型有機ｅｌ表示体の製造方法
CA2230584A1 (en) 1996-06-28 1998-01-08 Pelikan Produktions Ag Hydrophobic coating for ink jet printing heads
EP1229568B1 (en) * 1996-09-18 2003-12-10 Matsushita Electric Industrial Co., Ltd Production method of plasma display panel suitable for minute cell structure, the plasma display panel, and for displaying the plasma display panel
US6013982A (en) * 1996-12-23 2000-01-11 The Trustees Of Princeton University Multicolor display devices
JP3463971B2 (ja) 1996-12-26 2003-11-05 出光興産株式会社 有機アクティブｅｌ発光装置
US6843937B1 (en) 1997-07-16 2005-01-18 Seiko Epson Corporation Composition for an organic EL element and method of manufacturing the organic EL element
JP3911775B2 (ja) * 1997-07-30 2007-05-09 セイコーエプソン株式会社 有機ｅｌ素子の製造方法
JP3861400B2 (ja) 1997-09-01 2006-12-20 セイコーエプソン株式会社 電界発光素子およびその製造方法
JP3633229B2 (ja) 1997-09-01 2005-03-30 セイコーエプソン株式会社 発光素子の製造方法および多色表示装置の製造方法
TW340978B (en) 1997-10-09 1998-09-21 Highlight Optoelectronics Inc The producing method for polymer light emitted diode
JP3543170B2 (ja) 1998-02-24 2004-07-14 カシオ計算機株式会社 電界発光素子及びその製造方法
JP3646510B2 (ja) * 1998-03-18 2005-05-11 セイコーエプソン株式会社 薄膜形成方法、表示装置およびカラーフィルタ
TW425618B (en) 1998-05-19 2001-03-11 Tokyo Electron Ltd Coating apparatus and coating method
JP3335904B2 (ja) * 1998-05-19 2002-10-21 東京エレクトロン株式会社 塗布装置および塗布方法
KR100625730B1 (ko) * 1998-09-01 2006-09-20 다이셀 가가꾸 고교 가부시끼가이샤 유기 전자 발광 소자용 재료 및 그의 제조 방법
JP2000263817A (ja) * 1998-10-30 2000-09-26 Canon Inc インクジェット記録ヘッド及びインクジェット記録装置
JP3800282B2 (ja) * 1998-11-30 2006-07-26 大日本スクリーン製造株式会社 塗布液塗布方法
JP3676938B2 (ja) * 1999-01-27 2005-07-27 シャープ株式会社 カラーエレクトロルミネッセンス表示装置およびその製造方法
US6533376B1 (en) * 1999-01-29 2003-03-18 Spectra, Inc. Conditioning ink jet orifices
CA2377907A1 (en) * 1999-04-12 2000-10-19 Takamaro Kakehi Process for producing vinyl polymer having functional group at end and vinyl polymer having functional group at end
US7288420B1 (en) * 1999-06-04 2007-10-30 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electro-optical device
TW556357B (en) 1999-06-28 2003-10-01 Semiconductor Energy Lab Method of manufacturing an electro-optical device
TW512543B (en) * 1999-06-28 2002-12-01 Semiconductor Energy Lab Method of manufacturing an electro-optical device
JP4226159B2 (ja) * 1999-08-06 2009-02-18 シャープ株式会社 有機ｌｅｄディスプレイの製造方法
JP2001060493A (ja) 1999-08-23 2001-03-06 Seiko Epson Corp インクジェット記録方法を用いた有機発光素子の製造方法
JP3895077B2 (ja) 1999-09-10 2007-03-22 シャープ株式会社 有機ｌｅｄディスプレイの製造方法
JP4067259B2 (ja) * 2000-01-12 2008-03-26 富士フイルム株式会社 縮環多環式炭化水素化合物、発光素子材料およびそれを使用した発光素子
GB2360489A (en) * 2000-03-23 2001-09-26 Seiko Epson Corp Deposition of soluble materials
JP2001341296A (ja) 2000-03-31 2001-12-11 Seiko Epson Corp インクジェット法による薄膜形成方法、インクジェット装置、有機ｅｌ素子の製造方法、有機ｅｌ素子
JP4048687B2 (ja) * 2000-04-07 2008-02-20 セイコーエプソン株式会社 有機ｅｌ素子および有機ｅｌ素子の製造方法
US6572987B2 (en) * 2000-09-28 2003-06-03 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device
US6723807B2 (en) * 2000-11-13 2004-04-20 Sumitomo Chemical Company, Limited Catalyst component and catalyst for addition polymerization, and process for producing addition polymer
US6933673B2 (en) * 2001-04-27 2005-08-23 Semiconductor Energy Laboratory Co., Ltd. Luminescent device and process of manufacturing the same
JP4431958B2 (ja) * 2001-06-01 2010-03-17 セイコーエプソン株式会社 カラーフィルタ及び電気光学装置
JP4683772B2 (ja) 2001-06-15 2011-05-18 株式会社半導体エネルギー研究所 発光装置の作製方法
JP4766782B2 (ja) 2001-06-20 2011-09-07 株式会社半導体エネルギー研究所 有機発光素子、並びにそれを用いた発光装置、電気器具、及び照明機器
JP2003007459A (ja) 2001-06-21 2003-01-10 Semiconductor Energy Lab Co Ltd インクジェット方式によるパターン形成用組成物並びに発光装置の作製方法
JP2003022892A (ja) * 2001-07-06 2003-01-24 Semiconductor Energy Lab Co Ltd 発光装置の製造方法
US6572222B2 (en) * 2001-07-17 2003-06-03 Eastman Kodak, Company Synchronizing printed droplets in continuous inkjet printing
US6686065B2 (en) * 2001-12-12 2004-02-03 Canon Kabushiki Kaisha [5]-helicene and dibenzofluorene materials for use in organic light emitting devices
JP2006190759A (ja) 2005-01-05 2006-07-20 Idemitsu Kosan Co Ltd 有機エレクトロルミネッセンス素子

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1212114A (zh) * 1996-11-25 1999-03-24 精工爱普生株式会社 有机电致发光元件及其制造方法和有机电致发光显示装置
JP2000106278A (ja) * 1997-09-02 2000-04-11 Seiko Epson Corp 有機ｅｌ素子の製造方法及び有機ｅｌ素子
US6066357A (en) * 1998-12-21 2000-05-23 Eastman Kodak Company Methods of making a full-color organic light-emitting display
CN1291786A (zh) * 1999-10-12 2001-04-18 株式会社半导体能源研究所 电光器件及其制作方法

Also Published As

Publication number Publication date
US20030008429A1 (en) 2003-01-09
US8752940B2 (en) 2014-06-17
US20090237467A1 (en) 2009-09-24
US8197052B2 (en) 2012-06-12
US20140132654A1 (en) 2014-05-15
US7547563B2 (en) 2009-06-16
US8425016B2 (en) 2013-04-23
US20080026501A1 (en) 2008-01-31
CN1396792A (zh) 2003-02-12
TWI287413B (en) 2007-09-21
JP2003022892A (ja) 2003-01-24
US7378291B2 (en) 2008-05-27
US20120227664A1 (en) 2012-09-13

Similar Documents

Publication Publication Date Title
CN100377381C (zh) 制造发光装置的方法
JP4683772B2 (ja) 発光装置の作製方法
US7547562B2 (en) Light emitting device and method for manufacturing same
CN102709493B (zh) 制造发光器件的方法
US6887392B2 (en) Light emitting device and method of manufacturing the same
CN100477323C (zh) 有机电致发光装置及其制造方法和电子机器
TWI453791B (zh) 裝置、膜形成方法及裝置的製造方法
CN1992157B (zh) 显示装置的制造装置及显示装置的制造方法
JP2013175486A (ja) 発光装置の製造装置、及び発光装置の作製方法
JP2003332073A (ja) 発光装置およびその作製方法
JP2004171943A (ja) 発光装置の作製方法
JP4837227B2 (ja) 成膜装置
JP5520902B2 (ja) 発光装置の作製方法
JP6348539B2 (ja) インクヘッド
JP2015173113A (ja) 発光装置の作製方法
JP2003007459A (ja) インクジェット方式によるパターン形成用組成物並びに発光装置の作製方法
JP2014056839A (ja) 装置
JP2003282248A (ja) 有機ｅｌ装置の製造方法及び製造装置、有機ｅｌ装置及び電子機器

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CX01 Expiry of patent term

Granted publication date: 20080326

CX01 Expiry of patent term