CN100377303C - 反射镜设备、曝光设备以及器件制造方法 - Google Patents

反射镜设备、曝光设备以及器件制造方法 Download PDF

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Publication number
CN100377303C
CN100377303C CNB038023571A CN03802357A CN100377303C CN 100377303 C CN100377303 C CN 100377303C CN B038023571 A CNB038023571 A CN B038023571A CN 03802357 A CN03802357 A CN 03802357A CN 100377303 C CN100377303 C CN 100377303C
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CN
China
Prior art keywords
mirror
speculum
temperature
exposure
equipment
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Expired - Fee Related
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CNB038023571A
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English (en)
Chinese (zh)
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CN1618114A (zh
Inventor
宫岛义一
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Canon Inc
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Canon Inc
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Publication of CN1618114A publication Critical patent/CN1618114A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
CNB038023571A 2002-06-28 2003-06-19 反射镜设备、曝光设备以及器件制造方法 Expired - Fee Related CN100377303C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002191282A JP3944008B2 (ja) 2002-06-28 2002-06-28 反射ミラー装置及び露光装置及びデバイス製造方法
JP191282/2002 2002-06-28
PCT/JP2003/007796 WO2004003982A1 (en) 2002-06-28 2003-06-19 Reflection mirror apparatus, exposure apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
CN1618114A CN1618114A (zh) 2005-05-18
CN100377303C true CN100377303C (zh) 2008-03-26

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CNB038023571A Expired - Fee Related CN100377303C (zh) 2002-06-28 2003-06-19 反射镜设备、曝光设备以及器件制造方法

Country Status (7)

Country Link
US (1) US7349063B2 (enExample)
EP (1) EP1518262A4 (enExample)
JP (1) JP3944008B2 (enExample)
KR (1) KR100572098B1 (enExample)
CN (1) CN100377303C (enExample)
TW (1) TW594436B (enExample)
WO (1) WO2004003982A1 (enExample)

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JP2004247438A (ja) * 2003-02-13 2004-09-02 Canon Inc 冷却装置
JP4532835B2 (ja) * 2003-02-13 2010-08-25 キヤノン株式会社 冷却装置、それを有する光学部材並びに露光装置
JP2005101537A (ja) * 2003-08-29 2005-04-14 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JP2005109158A (ja) * 2003-09-30 2005-04-21 Canon Inc 冷却装置及び方法、それを有する露光装置、デバイスの製造方法
US6977713B2 (en) * 2003-12-08 2005-12-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
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TWI409313B (zh) * 2005-01-26 2013-09-21 Nitto Denko Corp 黏著劑組成物、黏著型光學薄膜及影像顯示裝置
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JP2006269941A (ja) * 2005-03-25 2006-10-05 Canon Inc 導光装置、露光装置、並びにデバイス製造方法
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JP4893249B2 (ja) * 2006-11-10 2012-03-07 株式会社ニコン 露光装置とそれを用いた半導体素子または液晶素子の製造方法
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US7641349B1 (en) * 2008-09-22 2010-01-05 Cymer, Inc. Systems and methods for collector mirror temperature control using direct contact heat transfer
JP5732257B2 (ja) * 2010-01-15 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、デバイス製造方法およびコンピュータ読取可能媒体
JP5478773B2 (ja) * 2010-03-26 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系、露光装置、及び波面補正方法
JP5478553B2 (ja) 2010-09-03 2014-04-23 日東電工株式会社 連続ウェブ状光学フィルム積層体ロール及びその製造方法
DE102011005778A1 (de) * 2011-03-18 2012-09-20 Carl Zeiss Smt Gmbh Optisches Element
JP6209518B2 (ja) * 2011-09-21 2017-10-04 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のミラーの熱作動用の構成体
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP2013179330A (ja) * 2013-04-25 2013-09-09 Gigaphoton Inc 極端紫外光源装置
US9544984B2 (en) 2013-07-22 2017-01-10 Kla-Tencor Corporation System and method for generation of extreme ultraviolet light
DE102014219770A1 (de) 2014-09-30 2016-03-31 Carl Zeiss Smt Gmbh Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung
NL2015718A (en) * 2014-12-12 2016-09-20 Asml Netherlands Bv Reflector.
JP6742717B2 (ja) * 2015-12-10 2020-08-19 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
CN114690367A (zh) * 2020-12-30 2022-07-01 中国科学院长春光学精密机械与物理研究所 一种用于地面光学设施反射镜的热控装置
JP7550102B2 (ja) * 2021-04-16 2024-09-12 株式会社アマダ レーザ加工ヘッド及びレーザ加工装置
DE102022202241A1 (de) 2022-03-04 2023-03-02 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage
CN114967036B (zh) * 2022-05-30 2024-02-02 深圳综合粒子设施研究院 一种反射镜面形控制结构及光束线装置

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Also Published As

Publication number Publication date
WO2004003982A1 (en) 2004-01-08
CN1618114A (zh) 2005-05-18
TW594436B (en) 2004-06-21
EP1518262A4 (en) 2007-03-14
KR100572098B1 (ko) 2006-04-17
JP2004039696A (ja) 2004-02-05
US7349063B2 (en) 2008-03-25
JP3944008B2 (ja) 2007-07-11
EP1518262A1 (en) 2005-03-30
US20050073663A1 (en) 2005-04-07
TW200403543A (en) 2004-03-01
KR20050022016A (ko) 2005-03-07

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Termination date: 20110619