CA2088031A1 - Novel diacrylates and dimethacrylates - Google Patents

Novel diacrylates and dimethacrylates

Info

Publication number
CA2088031A1
CA2088031A1 CA002088031A CA2088031A CA2088031A1 CA 2088031 A1 CA2088031 A1 CA 2088031A1 CA 002088031 A CA002088031 A CA 002088031A CA 2088031 A CA2088031 A CA 2088031A CA 2088031 A1 CA2088031 A1 CA 2088031A1
Authority
CA
Canada
Prior art keywords
group
formula
phenyl
substituent selected
unsubstituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002088031A
Other languages
English (en)
French (fr)
Inventor
Bettina Steinmann
Adrian Schulthess
Max Hunziker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2088031A1 publication Critical patent/CA2088031A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54Acrylic acid esters; Methacrylic acid esters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00Materials specially adapted for additive manufacturing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00Processes of additive manufacturing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/922Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CA002088031A 1992-01-27 1993-01-25 Novel diacrylates and dimethacrylates Abandoned CA2088031A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH216/92-0 1992-01-27
CH21692 1992-01-27

Publications (1)

Publication Number Publication Date
CA2088031A1 true CA2088031A1 (en) 1993-07-28

Family

ID=4181922

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002088031A Abandoned CA2088031A1 (en) 1992-01-27 1993-01-25 Novel diacrylates and dimethacrylates

Country Status (7)

Country Link
US (3) US6043323A (en, 2012)
EP (1) EP0554215B1 (en, 2012)
JP (2) JPH05286897A (en, 2012)
KR (1) KR100263033B1 (en, 2012)
CA (1) CA2088031A1 (en, 2012)
DE (1) DE59304927D1 (en, 2012)
TW (1) TW311923B (en, 2012)

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US7235195B2 (en) * 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
US20040115561A1 (en) * 2002-12-13 2004-06-17 Mikhail Laksin Energy curable, water washable printing inks suitable for waterless lithographic printing
KR20070005638A (ko) * 2004-03-22 2007-01-10 훈츠만 어드밴스트 머티리얼스(스위처랜드) 게엠베하 광경화성 조성물
DE102004056398A1 (de) * 2004-11-23 2006-05-24 Bayer Materialscience Ag Hydrolysestabile, hydrophobe, lösemittelfreie Polyole
US20090233230A1 (en) * 2005-07-22 2009-09-17 Yosuke Hata Photosensitive Resin Composition and Laminates
WO2007030910A1 (en) * 2005-09-15 2007-03-22 9173-4285 Quebec Inc. Adaptable shoe cover
JP4749305B2 (ja) * 2005-10-05 2011-08-17 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及び積層体
WO2007097049A1 (ja) * 2006-02-24 2007-08-30 Teikoku Printing Inks Mfg. Co., Ltd. インクの製造方法、及び、当該方法に基づくインク、印刷物、成形品
US8635214B2 (en) * 2006-07-26 2014-01-21 International Business Machines Corporation Improving results from search providers using a browsing-time relevancy factor
CN105524525A (zh) * 2011-01-21 2016-04-27 精工爱普生株式会社 放射线固化型喷墨用油墨组合物、记录物及喷墨记录方法
JP6736051B2 (ja) * 2016-05-30 2020-08-05 協立化学産業株式会社 エポキシ樹脂、完全変性エポキシ樹脂及びそれらを含む硬化性組成物
EP3604353A4 (en) * 2017-03-29 2020-11-04 Mitsui Chemicals, Inc. PHOTOCURING COMPOSITION, BASE FOR DENTAL PROSTHESIS, AND DENTIST

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US4097994A (en) * 1975-11-24 1978-07-04 Monsanto Company Dental restorative composition containing oligomeric BIS-GMA resin and Michler's ketone
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JPS60118710A (ja) * 1983-11-29 1985-06-26 Osaka Soda Co Ltd 風乾性を有するアリル系エポキシポリアクリレ−ト樹脂組成物
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JPH0762123B2 (ja) 1985-01-08 1995-07-05 武田薬品工業株式会社 接着方法
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DE3446910A1 (de) 1984-12-21 1986-07-03 Siemens AG, 1000 Berlin und 8000 München Versteifungsvorrichtung fuer einen elektronikschrank
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JPS6366279A (ja) 1986-04-11 1988-03-24 Takeda Chem Ind Ltd 接着方法
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Also Published As

Publication number Publication date
EP0554215A3 (en) 1993-09-01
US6316552B1 (en) 2001-11-13
EP0554215A2 (de) 1993-08-04
KR930016385A (ko) 1993-08-26
JPH05286897A (ja) 1993-11-02
EP0554215B1 (de) 1997-01-02
DE59304927D1 (de) 1997-02-13
US20020068801A1 (en) 2002-06-06
TW311923B (en, 2012) 1997-08-01
JP2003073337A (ja) 2003-03-12
US6043323A (en) 2000-03-28
US6783809B2 (en) 2004-08-31
KR100263033B1 (ko) 2000-08-01

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued