BRPI0918828A2 - método de preparação de placa de impressão litográfica - Google Patents
método de preparação de placa de impressão litográficaInfo
- Publication number
- BRPI0918828A2 BRPI0918828A2 BRPI0918828-2A BRPI0918828A BRPI0918828A2 BR PI0918828 A2 BRPI0918828 A2 BR PI0918828A2 BR PI0918828 A BRPI0918828 A BR PI0918828A BR PI0918828 A2 BRPI0918828 A2 BR PI0918828A2
- Authority
- BR
- Brazil
- Prior art keywords
- printing plate
- lithographic printing
- processing
- manufacturing
- developer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008-244452 | 2008-09-24 | ||
| JP2008244452 | 2008-09-24 | ||
| JP2009018511 | 2009-01-29 | ||
| JP2009-018511 | 2009-01-29 | ||
| PCT/JP2009/066305 WO2010035697A1 (ja) | 2008-09-24 | 2009-09-17 | 平版印刷版の作製方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BRPI0918828A2 true BRPI0918828A2 (pt) | 2018-04-24 |
Family
ID=42059697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0918828-2A BRPI0918828A2 (pt) | 2008-09-24 | 2009-09-17 | método de preparação de placa de impressão litográfica |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110168044A1 (pt) |
| EP (1) | EP2330464A4 (pt) |
| JP (1) | JP2010197989A (pt) |
| CN (1) | CN102165374B (pt) |
| AU (1) | AU2009297598A1 (pt) |
| BR (1) | BRPI0918828A2 (pt) |
| WO (1) | WO2010035697A1 (pt) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5705584B2 (ja) * | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| EP2693270B1 (en) * | 2011-03-28 | 2015-12-09 | FUJIFILM Corporation | Method for producing lithographic printing plate |
| EP2762973B1 (en) * | 2011-09-26 | 2017-11-29 | Fujifilm Corporation | Method for producing lithographic printing plate |
| JP5872082B2 (ja) * | 2015-02-25 | 2016-03-01 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US20190079406A1 (en) * | 2016-03-16 | 2019-03-14 | Agfa Nv | Method for processing a lithographic printing plate |
| US20190193449A1 (en) * | 2017-12-27 | 2019-06-27 | Fujifilm Manufacturing U.S.A., Inc. | Printing plate |
| JP7019031B2 (ja) * | 2018-03-29 | 2022-02-14 | 富士フイルム株式会社 | 平版印刷版作製用現像処理装置、及び、平版印刷版の作製方法 |
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| JP2007233071A (ja) * | 2006-03-01 | 2007-09-13 | Fujifilm Corp | 平版印刷版の作製方法および平版印刷版原版 |
| JP2007328243A (ja) | 2006-06-09 | 2007-12-20 | Fujifilm Corp | 平版印刷版の作製方法および平版印刷版原版 |
| EP1868036B1 (en) | 2006-06-14 | 2010-09-22 | Eastman Kodak Company | Method for processing of photopolymer printing plates with overcoat |
| EP1892572B1 (en) * | 2006-08-25 | 2011-07-20 | FUJIFILM Corporation | Method for preparing a lithographic printing plate |
| DE102007023034B4 (de) | 2007-02-23 | 2010-11-04 | Advanced Mask Technology Center Gmbh & Co. Kg | Dummy-Rohling und Verfahren zum Bestimmen einer Rohlingschicht |
| JP5186814B2 (ja) | 2007-06-20 | 2013-04-24 | 新日鐵住金株式会社 | 容器用鋼板とその製造方法 |
| JP5244518B2 (ja) * | 2007-09-28 | 2013-07-24 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
| JP5171483B2 (ja) * | 2008-08-29 | 2013-03-27 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
-
2009
- 2009-09-17 AU AU2009297598A patent/AU2009297598A1/en not_active Abandoned
- 2009-09-17 US US13/119,651 patent/US20110168044A1/en not_active Abandoned
- 2009-09-17 CN CN200980137600XA patent/CN102165374B/zh active Active
- 2009-09-17 EP EP09816112A patent/EP2330464A4/en not_active Withdrawn
- 2009-09-17 JP JP2009216222A patent/JP2010197989A/ja active Pending
- 2009-09-17 WO PCT/JP2009/066305 patent/WO2010035697A1/ja active Application Filing
- 2009-09-17 BR BRPI0918828-2A patent/BRPI0918828A2/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CN102165374B (zh) | 2013-07-31 |
| JP2010197989A (ja) | 2010-09-09 |
| WO2010035697A1 (ja) | 2010-04-01 |
| CN102165374A (zh) | 2011-08-24 |
| US20110168044A1 (en) | 2011-07-14 |
| AU2009297598A1 (en) | 2010-04-01 |
| EP2330464A4 (en) | 2012-03-14 |
| EP2330464A1 (en) | 2011-06-08 |
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