WO2008081679A1 - 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法 - Google Patents

感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法 Download PDF

Info

Publication number
WO2008081679A1
WO2008081679A1 PCT/JP2007/073477 JP2007073477W WO2008081679A1 WO 2008081679 A1 WO2008081679 A1 WO 2008081679A1 JP 2007073477 W JP2007073477 W JP 2007073477W WO 2008081679 A1 WO2008081679 A1 WO 2008081679A1
Authority
WO
WIPO (PCT)
Prior art keywords
lithographic printing
printing plate
developer
photosensitive lithographic
producing
Prior art date
Application number
PCT/JP2007/073477
Other languages
English (en)
French (fr)
Inventor
Rieko Takahashi
Original Assignee
Konica Minolta Medical & Graphic, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical & Graphic, Inc. filed Critical Konica Minolta Medical & Graphic, Inc.
Publication of WO2008081679A1 publication Critical patent/WO2008081679A1/ja

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

 本発明は、画像露光された感光性平版印刷版材料を現像する感光性平版印刷版用現像液であって、下記一般式(1)で表される化合物を含有し、25°CにおけるpHが3.0~9.0の水溶液であることを特徴とし、良好な現像性を有し、現像槽に蓄積するスラッジによる版面の汚れが抑制され、耐刷性に優れた平版印刷版を与える、感光性平版印刷版用現像液及び平版印刷版の作製方法が提供できる。   一般式(1)  R1-Z-(R2-O)n-H
PCT/JP2007/073477 2006-12-28 2007-12-05 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法 WO2008081679A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-353785 2006-12-28
JP2006353785 2006-12-28

Publications (1)

Publication Number Publication Date
WO2008081679A1 true WO2008081679A1 (ja) 2008-07-10

Family

ID=39584468

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/073477 WO2008081679A1 (ja) 2006-12-28 2007-12-05 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法

Country Status (2)

Country Link
US (1) US20080160452A1 (ja)
WO (1) WO2008081679A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2662729A1 (en) * 2006-12-28 2013-11-13 Fujifilm Corporation Method for preparation of lithographic printing plate
JPWO2016092844A1 (ja) * 2014-12-12 2017-09-21 富士フイルム株式会社 重合体、組成物、光学フィルム、および液晶表示装置
JP2021189319A (ja) * 2020-05-29 2021-12-13 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、並びに、平版印刷方法
JP2021189320A (ja) * 2020-05-29 2021-12-13 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、並びに、平版印刷方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8198011B2 (en) * 2008-02-04 2012-06-12 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
JP2014506238A (ja) * 2010-11-23 2014-03-13 ダウ グローバル テクノロジーズ エルエルシー 分岐鎖第二級アルコールアルコキシレート界面活性剤及びその製造方法
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US11300878B2 (en) * 2017-11-13 2022-04-12 Taiwan Semiconductor Manufacturing Co., Ltd. Photoresist developer and method of developing photoresist
US11694896B2 (en) 2019-10-31 2023-07-04 Taiwan Semiconductor Manufacturing Co., Ltd. Photoresist developer and method of developing photoresist

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004295024A (ja) * 2003-03-28 2004-10-21 Konica Minolta Holdings Inc 画像形成方法及び感光性平版印刷版
JP2004318015A (ja) * 2003-04-21 2004-11-11 Konica Minolta Medical & Graphic Inc 平版印刷版の製版方法及び感光性平版印刷版材料用の現像液
JP2004317835A (ja) * 2003-04-17 2004-11-11 Konica Minolta Medical & Graphic Inc アルカリ性現像液及び現像方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197124A (en) * 1975-07-29 1980-04-08 Fuji Photo Film Co., Ltd. Non-treatment type planographic printing plate materials
US5565290A (en) * 1991-07-30 1996-10-15 Fuji Photo Film Co., Ltd. Desensitizing solution for offset printing
EP1739484B1 (en) * 2000-04-19 2011-08-24 AGFA Graphics NV Photosensitive lithographic printing plate and method for making a prinitng plate.
US6777155B2 (en) * 2000-10-03 2004-08-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004295024A (ja) * 2003-03-28 2004-10-21 Konica Minolta Holdings Inc 画像形成方法及び感光性平版印刷版
JP2004317835A (ja) * 2003-04-17 2004-11-11 Konica Minolta Medical & Graphic Inc アルカリ性現像液及び現像方法
JP2004318015A (ja) * 2003-04-21 2004-11-11 Konica Minolta Medical & Graphic Inc 平版印刷版の製版方法及び感光性平版印刷版材料用の現像液

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2662729A1 (en) * 2006-12-28 2013-11-13 Fujifilm Corporation Method for preparation of lithographic printing plate
JPWO2016092844A1 (ja) * 2014-12-12 2017-09-21 富士フイルム株式会社 重合体、組成物、光学フィルム、および液晶表示装置
JP2021189319A (ja) * 2020-05-29 2021-12-13 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、並びに、平版印刷方法
JP2021189320A (ja) * 2020-05-29 2021-12-13 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、並びに、平版印刷方法
JP7391767B2 (ja) 2020-05-29 2023-12-05 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、並びに、平版印刷方法

Also Published As

Publication number Publication date
US20080160452A1 (en) 2008-07-03

Similar Documents

Publication Publication Date Title
WO2008081679A1 (ja) 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法
TW200732840A (en) Resist composition and patterning process using the same
EP1975710A3 (en) Plate-making method of lithographic printing plate precursor
EP1829681A3 (en) Method for preparation of lithographic printing plate and lithographic printing plate precursor
WO2008096601A1 (ja) 感光性ポリイミド樹脂組成物
TW200613923A (en) Protective film-forming composition for immersion exposure and pattern forming method using the same
WO2007023336A3 (en) Method of developing lithographic printing plate precursors
EP2042312A3 (en) Processing method of lithographic printing plate precursor
TW200734820A (en) Amine compound, chemically amplified resist composition and patterning process
BRPI0518580A2 (pt) mÉtodo para melhorar a depuraÇço hepÁtica de substÂncias xenobiàticas em um animal, kit adequado para alimentar Ácido lipàico a um animal, meio para comunicar informaÇço, composiÇço, e, uso da composiÇço que compreende Ácido lipàico
TW200632592A (en) Lithographic rinse solution and resist-pattern forming method
EP1816521A3 (en) Developing solution and method for producing lithography printing plate
EP1939692A3 (en) Method for preparation of lithographic printing plate
ATE548189T1 (de) Lithographiedruckplattenvorläufer und plattenherstellungsverfahren damit
BR112014007169A2 (pt) processo para fazer placa de impressão litográfica
TW200628983A (en) Positive resist composition for immersion lithography and process for forming resist pattern
EP2610673A3 (en) Method for manufacturing lithographic printing plates
EP1645912A3 (en) Lithographic printing method
TW200643625A (en) Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device
EP1253472A3 (en) Alkaline developer for lithographic printing plate and method for preparing lithographic printing plate
WO2009078346A1 (ja) 感熱型平版印刷版
TW200728925A (en) Protective film forming material and photoresist pattern forming method using the same
EP2048000A3 (en) Plate making method of lithographic printing plate precursor
EP1708033A3 (en) Method of manufacturing a lithographic printing plate
TW200710102A (en) Polymerizable compound for photoresist, polymer thereof, and photoresist composition containing such polymer

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07850119

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07850119

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP