BRPI0918640A2 - placa mãe, método de produção de placa mãe, e substrato de dispositivo. - Google Patents
placa mãe, método de produção de placa mãe, e substrato de dispositivo.Info
- Publication number
- BRPI0918640A2 BRPI0918640A2 BRPI0918640A BRPI0918640A BRPI0918640A2 BR PI0918640 A2 BRPI0918640 A2 BR PI0918640A2 BR PI0918640 A BRPI0918640 A BR PI0918640A BR PI0918640 A BRPI0918640 A BR PI0918640A BR PI0918640 A2 BRPI0918640 A2 BR PI0918640A2
- Authority
- BR
- Brazil
- Prior art keywords
- motherboard
- production method
- device substrate
- motherboard production
- substrate
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1229—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with different crystal properties within a device or between different devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/127—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement
- H01L27/1274—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor
- H01L27/1285—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor using control of the annealing or irradiation parameters, e.g. using different scanning direction or intensity for different transistors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
- G02F1/13456—Cell terminals located on one side of the display only
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136277—Active matrix addressed cells formed on a semiconductor substrate, e.g. of silicon
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Optics & Photonics (AREA)
- Recrystallisation Techniques (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008239167 | 2008-09-18 | ||
PCT/JP2009/060549 WO2010032519A1 (ja) | 2008-09-18 | 2009-06-09 | 母基板及びその製造方法、並びにデバイス基板 |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI0918640A2 true BRPI0918640A2 (pt) | 2015-12-01 |
Family
ID=42039364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0918640A BRPI0918640A2 (pt) | 2008-09-18 | 2009-06-09 | placa mãe, método de produção de placa mãe, e substrato de dispositivo. |
Country Status (7)
Country | Link |
---|---|
US (1) | US8471257B2 (pt) |
EP (1) | EP2328169A1 (pt) |
JP (1) | JP5451625B2 (pt) |
CN (1) | CN102089862A (pt) |
BR (1) | BRPI0918640A2 (pt) |
RU (1) | RU2476954C2 (pt) |
WO (1) | WO2010032519A1 (pt) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100841372B1 (ko) * | 2006-12-19 | 2008-06-26 | 삼성에스디아이 주식회사 | 박막트랜지스터 및 이의 제조방법 |
KR101900915B1 (ko) * | 2011-10-14 | 2018-09-27 | 삼성디스플레이 주식회사 | 표시 장치 |
JP6744155B2 (ja) * | 2016-06-30 | 2020-08-19 | 日本電産サンキョー株式会社 | 搬送システム |
KR20180063936A (ko) | 2016-12-02 | 2018-06-14 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
JP6885134B2 (ja) * | 2017-03-24 | 2021-06-09 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、電子機器 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6311989A (ja) | 1987-04-03 | 1988-01-19 | セイコーエプソン株式会社 | 電気光学的表示装置 |
JPH0221612A (ja) * | 1988-07-11 | 1990-01-24 | Hitachi Ltd | 写真処理方法 |
RU2008713C1 (ru) * | 1992-03-04 | 1994-02-28 | Малое научно-производственное объединение "ЭЛО" | Цветная жидкокристаллическая дисплейная панель с активной матрицей |
SE9301424L (sv) | 1993-04-28 | 1994-09-19 | Medevelop Ab | Protessystem för rehabilitering av tandlöshet |
JPH11186163A (ja) | 1997-12-18 | 1999-07-09 | Matsushita Electric Ind Co Ltd | 薄膜形成方法および薄膜形成装置 |
JP2000012460A (ja) | 1998-06-24 | 2000-01-14 | Matsushita Electric Ind Co Ltd | 薄膜の形成方法および薄膜形成装置 |
US6336089B1 (en) * | 1998-09-22 | 2002-01-01 | Michael Everding | Interactive digital phonetic captioning program |
JP2000231122A (ja) * | 1999-02-12 | 2000-08-22 | Sony Corp | 電気光学装置、電気光学装置用の駆動基板、及びこれらの製造方法 |
JP2001044133A (ja) * | 1999-08-02 | 2001-02-16 | Sharp Corp | レーザ照射方法及び半導体装置の製造方法 |
JP2001053282A (ja) * | 1999-08-11 | 2001-02-23 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタアレイ基板及びその検査方法 |
JP3937692B2 (ja) * | 2000-06-15 | 2007-06-27 | セイコーエプソン株式会社 | アレイ基板の検査方法、アレイ基板の製造方法、アレイ基板及び電気光学装置 |
JP3783532B2 (ja) * | 2000-07-24 | 2006-06-07 | セイコーエプソン株式会社 | 薄膜装置、トランジスタアレイ基板、電気光学装置および薄膜装置の製造方法 |
JP2003271067A (ja) | 2002-03-18 | 2003-09-25 | Seiko Epson Corp | 電気光学装置の製造方法、電気光学装置、および電子機器 |
JP2005276996A (ja) | 2004-03-24 | 2005-10-06 | Hitachi Ltd | 平面表示装置の製造方法 |
JP4674092B2 (ja) * | 2005-01-21 | 2011-04-20 | 株式会社 日立ディスプレイズ | 表示装置の製造方法 |
JP2008028303A (ja) * | 2006-07-25 | 2008-02-07 | Hitachi Displays Ltd | 平面表示装置の製造方法 |
JP5085902B2 (ja) | 2006-08-24 | 2012-11-28 | 株式会社ジャパンディスプレイイースト | 表示装置の製造方法 |
JP4925884B2 (ja) | 2007-03-26 | 2012-05-09 | 花王株式会社 | 吸収性物品の携帯用包装構造 |
-
2009
- 2009-06-09 EP EP09814364A patent/EP2328169A1/en not_active Withdrawn
- 2009-06-09 US US13/058,279 patent/US8471257B2/en not_active Expired - Fee Related
- 2009-06-09 JP JP2010529670A patent/JP5451625B2/ja not_active Expired - Fee Related
- 2009-06-09 CN CN2009801274665A patent/CN102089862A/zh active Pending
- 2009-06-09 WO PCT/JP2009/060549 patent/WO2010032519A1/ja active Application Filing
- 2009-06-09 RU RU2011115083/28A patent/RU2476954C2/ru not_active IP Right Cessation
- 2009-06-09 BR BRPI0918640A patent/BRPI0918640A2/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
RU2476954C2 (ru) | 2013-02-27 |
US8471257B2 (en) | 2013-06-25 |
WO2010032519A1 (ja) | 2010-03-25 |
US20110140110A1 (en) | 2011-06-16 |
RU2011115083A (ru) | 2012-10-27 |
EP2328169A1 (en) | 2011-06-01 |
CN102089862A (zh) | 2011-06-08 |
JPWO2010032519A1 (ja) | 2012-02-09 |
JP5451625B2 (ja) | 2014-03-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08F | Application fees: application dismissed [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 5A,6A E 7A ANUIDADES |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2373 DE 28-06-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |