BG26673A3 - Фотоколимеризуем състав - Google Patents

Фотоколимеризуем състав

Info

Publication number
BG26673A3
BG26673A3 BG019648A BG1964872A BG26673A3 BG 26673 A3 BG26673 A3 BG 26673A3 BG 019648 A BG019648 A BG 019648A BG 1964872 A BG1964872 A BG 1964872A BG 26673 A3 BG26673 A3 BG 26673A3
Authority
BG
Bulgaria
Prior art keywords
photocolymerizable
composition
photocolymerizable composition
Prior art date
Application number
BG019648A
Other languages
Bulgarian (bg)
English (en)
Inventor
Richard Beaupre
Michael Gilano
Nelvin Lipson
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynachem Corp filed Critical Dynachem Corp
Publication of BG26673A3 publication Critical patent/BG26673A3/xx

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BG019648A 1971-02-04 1972-02-04 Фотоколимеризуем състав BG26673A3 (bg)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11279771A 1971-02-04 1971-02-04

Publications (1)

Publication Number Publication Date
BG26673A3 true BG26673A3 (bg) 1979-05-15

Family

ID=22345895

Family Applications (1)

Application Number Title Priority Date Filing Date
BG019648A BG26673A3 (bg) 1971-02-04 1972-02-04 Фотоколимеризуем състав

Country Status (23)

Country Link
JP (2) JPS5538961B1 (it)
AU (1) AU461461B2 (it)
BE (1) BE778729A (it)
BG (1) BG26673A3 (it)
CA (1) CA965291A (it)
CH (1) CH592322A5 (it)
DD (1) DD101035A5 (it)
DE (1) DE2205146C2 (it)
DK (2) DK142623B (it)
ES (1) ES399317A1 (it)
FI (1) FI57429C (it)
FR (1) FR2124974A5 (it)
GB (1) GB1361298A (it)
HK (1) HK28382A (it)
IL (1) IL38677A (it)
IT (1) IT949005B (it)
LU (1) LU64712A1 (it)
NL (1) NL176021C (it)
NO (1) NO141804C (it)
PL (1) PL83391B1 (it)
RO (1) RO64896A (it)
SE (1) SE390218B (it)
ZA (1) ZA72345B (it)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1507704A (en) * 1974-04-23 1978-04-19 Du Pont Photopolymerisable compositions
ZA757984B (en) * 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
JPS5917414B2 (ja) * 1975-10-07 1984-04-21 村上スクリ−ン （株） スクリ−ン版用感光性組成物及び感光膜
JPS5944615B2 (ja) * 1976-02-16 1984-10-31 富士写真フイルム株式会社 感光性樹脂組成物及びそれを用いた金属画像形成材料
SU941918A1 (ru) * 1976-08-10 1982-07-07 Предприятие П/Я Г-4444 Сухой пленочный фоторезист
US4239849A (en) 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
JPS55501072A (it) * 1978-12-25 1980-12-04
DE3034343A1 (de) * 1979-02-21 1981-04-09 Panelgraphic Corp Radiation curable cellulosic polyacrylic abrasion resistant coating
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
DE3560654D1 (en) * 1984-02-18 1987-10-22 Basf Ag Photosensitive recording material
DD250593A1 (de) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb Fotopolymerisierbares material
DE3504254A1 (de) 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE3841025A1 (de) * 1988-12-06 1990-06-07 Hoechst Ag Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2613462B2 (ja) * 1988-12-28 1997-05-28 コニカ株式会社 画像形成材料及び画像形成方法
JP2515885Y2 (ja) * 1990-09-28 1996-10-30 アンリツ株式会社 測定装置の表示部
DE19638032A1 (de) * 1996-09-18 1998-03-19 Du Pont Deutschland Photopolymerisierbares Gemisch mit geringerer Sauerstoffempfindlichkeit zur Herstellung von Farbprüfdrucken
US7052824B2 (en) 2000-06-30 2006-05-30 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning
US20100209843A1 (en) 2009-02-16 2010-08-19 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US2893868A (en) * 1955-08-22 1959-07-07 Du Pont Polymerizable compositions
NL218803A (it) * 1956-07-09
GB835849A (en) * 1957-04-26 1960-05-25 Du Pont Photopolymerisable compositions and uses thereof
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
FI57429B (fi) 1980-04-30
DK142623B (da) 1980-12-01
DE2205146C2 (de) 1990-03-08
IT949005B (it) 1973-06-11
DD101035A5 (it) 1973-10-12
LU64712A1 (it) 1973-09-04
RO64896A (ro) 1980-01-15
DK142623C (it) 1981-08-03
FR2124974A5 (it) 1972-09-22
DK144184B (da) 1982-01-04
ZA72345B (en) 1973-03-28
DE2205146A1 (de) 1972-11-23
CA965291A (en) 1975-04-01
IL38677A (en) 1974-12-31
DK144184C (da) 1982-06-14
IL38677A0 (en) 1972-03-28
PL83391B1 (it) 1975-12-31
JPS58144824A (ja) 1983-08-29
NL7201460A (it) 1972-08-08
SE390218B (sv) 1976-12-06
AU461461B2 (en) 1975-05-12
HK28382A (en) 1982-07-02
ES399317A1 (es) 1974-12-16
NO141804B (no) 1980-02-04
JPH0136924B2 (it) 1989-08-03
NL176021B (nl) 1984-09-03
FI57429C (fi) 1980-08-11
GB1361298A (en) 1974-07-24
BE778729A (fr) 1972-07-31
AU3839272A (en) 1973-08-02
JPS5538961B1 (it) 1980-10-07
NO141804C (no) 1980-05-14
CH592322A5 (it) 1977-10-31
NL176021C (nl) 1987-07-16

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