ATE552310T1 - Unterfüllungszusammensetzung und optisches halbleiterbauelement - Google Patents

Unterfüllungszusammensetzung und optisches halbleiterbauelement

Info

Publication number
ATE552310T1
ATE552310T1 AT10176334T AT10176334T ATE552310T1 AT E552310 T1 ATE552310 T1 AT E552310T1 AT 10176334 T AT10176334 T AT 10176334T AT 10176334 T AT10176334 T AT 10176334T AT E552310 T1 ATE552310 T1 AT E552310T1
Authority
AT
Austria
Prior art keywords
weight
parts
group
underfill composition
carbon atoms
Prior art date
Application number
AT10176334T
Other languages
English (en)
Inventor
Yusuke Taguchi
Junichi Sawada
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Application granted granted Critical
Publication of ATE552310T1 publication Critical patent/ATE552310T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • H10W74/476—Organic materials comprising silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C08G77/08—Preparatory processes characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/548—Silicon-containing compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/852—Encapsulations
    • H10H20/854—Encapsulations characterised by their material, e.g. epoxy or silicone resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H10W74/012—Manufacture or treatment of encapsulations on active surfaces of flip-chip devices, e.g. forming underfills
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Silicon Polymers (AREA)
  • Led Device Packages (AREA)
AT10176334T 2009-09-15 2010-09-13 Unterfüllungszusammensetzung und optisches halbleiterbauelement ATE552310T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009213778A JP4964928B2 (ja) 2009-09-15 2009-09-15 アンダーフィル材組成物及び光半導体装置

Publications (1)

Publication Number Publication Date
ATE552310T1 true ATE552310T1 (de) 2012-04-15

Family

ID=42829989

Family Applications (1)

Application Number Title Priority Date Filing Date
AT10176334T ATE552310T1 (de) 2009-09-15 2010-09-13 Unterfüllungszusammensetzung und optisches halbleiterbauelement

Country Status (7)

Country Link
US (1) US8519063B2 (de)
EP (1) EP2295499B1 (de)
JP (1) JP4964928B2 (de)
KR (1) KR101701514B1 (de)
CN (1) CN102020852B (de)
AT (1) ATE552310T1 (de)
TW (1) TWI432522B (de)

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CN102598235B (zh) * 2009-09-30 2014-12-03 积水化学工业株式会社 半导体接合用粘接剂、半导体接合用粘接膜、半导体芯片的安装方法及半导体装置
JP2012057000A (ja) * 2010-09-07 2012-03-22 Shin-Etsu Chemical Co Ltd シリコーン樹脂組成物、半導体装置の封止材、及び半導体装置
JP2014096539A (ja) * 2012-11-12 2014-05-22 Tokuyama Corp 紫外発光素子、および発光構造体
CN105745253A (zh) * 2013-09-20 2016-07-06 琳得科株式会社 固化性组合物、固化物和固化性组合物的使用方法
KR102213302B1 (ko) * 2013-09-20 2021-02-05 린텍 가부시키가이샤 경화성 조성물, 경화물 및 경화성 조성물의 사용 방법
CN103613930B (zh) * 2013-11-21 2015-11-18 山东宝龙达实业集团有限公司 耐-100℃低温的脱醇型有机硅密封件的制备方法
JP6329776B2 (ja) * 2014-01-28 2018-05-23 株式会社アドマテックス モールドアンダーフィル用封止材
JP6525573B2 (ja) * 2014-12-08 2019-06-05 信越化学工業株式会社 縮合硬化性シリコーン樹脂組成物
CN105778506B (zh) 2014-12-25 2019-04-30 广东生益科技股份有限公司 一种有机硅树脂组合物及使用它的预浸料、层压板、覆铜板以及铝基板
WO2016120953A1 (ja) * 2015-01-26 2016-08-04 セントラル硝子株式会社 半導体封止用硬化性樹脂組成物およびその硬化物、並びにこれらを用いた半導体装置
JP6403016B2 (ja) * 2015-07-23 2018-10-10 信越化学工業株式会社 熱硬化性シリコーン樹脂組成物、それを用いたフォトカプラー、及びそのフォトカプラーを有する光半導体装置
JP6512181B2 (ja) * 2016-06-23 2019-05-15 信越化学工業株式会社 フォトカプラー一次封止用熱硬化性シリコーン樹脂組成物、該組成物で封止されたフォトカプラー及び該フォトカプラーを有する光半導体装置
US12480027B2 (en) 2019-03-29 2025-11-25 Dow Toray Co., Ltd. Curable silicone composition, cured product of same, and method for producing same
JP7285343B2 (ja) * 2019-09-04 2023-06-01 サムスン エスディアイ カンパニー，リミテッド 硬化型樹脂組成物、それから形成された硬化膜、および前記硬化膜を有する電子装置
WO2024236999A1 (ja) 2023-05-12 2024-11-21 ダウ・東レ株式会社 硬化性シリコーン組成物、その硬化物、およびその製造方法
CN119331344B (zh) * 2024-10-09 2025-06-06 合肥工业大学 熔融催化改性竹粉/聚丙烯复合材料的方法及应用

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US4102970A (en) * 1974-10-03 1978-07-25 Wacker-Chemie Gmbh Thermosetting compositions which can be cured to form molded objects or coatings
JP3419273B2 (ja) * 1997-09-09 2003-06-23 信越化学工業株式会社 室温硬化性オルガノポリシロキサン組成物
JP3993373B2 (ja) * 2000-09-14 2007-10-17 信越化学工業株式会社 ポリオルガノシロキサン化合物及びそれを含有するコーティング組成物
JP4948716B2 (ja) * 2001-06-29 2012-06-06 東レ・ダウコーニング株式会社 硬化性エポキシ樹脂組成物
JP3821214B2 (ja) * 2001-07-16 2006-09-13 信越化学工業株式会社 スクラッチ可能な隠蔽性コーティング用シリコーン組成物
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Also Published As

Publication number Publication date
JP2011063663A (ja) 2011-03-31
CN102020852A (zh) 2011-04-20
EP2295499A1 (de) 2011-03-16
JP4964928B2 (ja) 2012-07-04
US8519063B2 (en) 2013-08-27
TWI432522B (zh) 2014-04-01
KR20110030338A (ko) 2011-03-23
US20110065872A1 (en) 2011-03-17
CN102020852B (zh) 2013-03-27
EP2295499B1 (de) 2012-04-04
TW201114840A (en) 2011-05-01
KR101701514B1 (ko) 2017-02-01

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