ATE550144T1 - Synthetischer schleifstein - Google Patents
Synthetischer schleifsteinInfo
- Publication number
- ATE550144T1 ATE550144T1 AT08751823T AT08751823T ATE550144T1 AT E550144 T1 ATE550144 T1 AT E550144T1 AT 08751823 T AT08751823 T AT 08751823T AT 08751823 T AT08751823 T AT 08751823T AT E550144 T1 ATE550144 T1 AT E550144T1
- Authority
- AT
- Austria
- Prior art keywords
- less
- filler
- additive
- volume
- cerium oxide
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
- B24D3/32—Resins or natural or synthetic macromolecular compounds for porous or cellular structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007079244 | 2007-03-26 | ||
PCT/JP2008/056279 WO2008117883A1 (ja) | 2007-03-26 | 2008-03-25 | 合成砥石 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE550144T1 true ATE550144T1 (de) | 2012-04-15 |
Family
ID=39788611
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08751823T ATE550144T1 (de) | 2007-03-26 | 2008-03-25 | Synthetischer schleifstein |
Country Status (7)
Country | Link |
---|---|
US (1) | US8377159B2 (de) |
EP (1) | EP2140974B1 (de) |
JP (1) | JP5010675B2 (de) |
KR (1) | KR101503545B1 (de) |
CN (1) | CN101678533B (de) |
AT (1) | ATE550144T1 (de) |
WO (1) | WO2008117883A1 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5539339B2 (ja) | 2008-06-23 | 2014-07-02 | サンーゴバン アブレイシブズ,インコーポレイティド | 高気孔率ビトリファイド超砥粒製品および製造方法 |
JP5681201B2 (ja) | 2009-10-27 | 2015-03-04 | サンーゴバン アブレイシブズ,インコーポレイティド | 樹脂ボンド砥粒 |
EP2493659A4 (de) | 2009-10-27 | 2015-09-02 | Saint Gobain Abrasives Inc | Glasgebundener schleifartikel |
JP5496780B2 (ja) * | 2010-05-31 | 2014-05-21 | 株式会社東京精密 | 薄刃ブレード |
US8658578B2 (en) | 2010-12-29 | 2014-02-25 | Industrial Technology Research Institute | Lubricating oil composition and method for manufacturing the same |
US9266220B2 (en) | 2011-12-30 | 2016-02-23 | Saint-Gobain Abrasives, Inc. | Abrasive articles and method of forming same |
KR101594647B1 (ko) * | 2013-09-04 | 2016-02-16 | 오동석 | 연마구 조성물 및 그 제조방법 |
CN105141812B (zh) * | 2015-06-18 | 2022-02-11 | 重庆新知创科技有限公司 | 一种蓝宝石摄像头窗口片的生产方法 |
CN105141813B (zh) * | 2015-06-18 | 2021-09-21 | 江苏苏创光学器材有限公司 | 蓝宝石摄像头窗口片的制备方法 |
CN105215864A (zh) * | 2015-08-27 | 2016-01-06 | 安徽威铭耐磨材料有限公司 | 一种含纳米金刚石的低热膨胀耐温型超细粒度cbn砂轮及其制备方法 |
CN105081989A (zh) * | 2015-08-27 | 2015-11-25 | 安徽威铭耐磨材料有限公司 | 一种高透气隔热的致密型超细粒度cbn砂轮及其制备方法 |
CN105108663A (zh) * | 2015-08-27 | 2015-12-02 | 安徽威铭耐磨材料有限公司 | 一种含胶体石墨的自润滑性的超细粒度cbn砂轮及其制备方法 |
CN105127917A (zh) * | 2015-08-27 | 2015-12-09 | 安徽威铭耐磨材料有限公司 | 一种高光洁度高磨削精度的超细粒度cbn砂轮及其制备方法 |
CN105081991A (zh) * | 2015-08-27 | 2015-11-25 | 安徽威铭耐磨材料有限公司 | 一种高抗蚀耐温变的超细粒度cbn砂轮及其制备方法 |
US20220048161A1 (en) * | 2019-02-01 | 2022-02-17 | Noritake Co., Limited | Metal bond grindstone for hard and brittle material |
JP7229610B1 (ja) | 2022-09-26 | 2023-02-28 | 株式会社東京ダイヤモンド工具製作所 | 合成砥石、合成砥石アセンブリ、及び、合成砥石の製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3328141A (en) | 1966-02-28 | 1967-06-27 | Tizon Chemical Corp | Process for polishing crystalline silicon |
JPS5594981A (en) * | 1979-01-12 | 1980-07-18 | Toyo Seiki Kogyo Kk | Abrasive for grind |
US5264010A (en) | 1992-04-27 | 1993-11-23 | Rodel, Inc. | Compositions and methods for polishing and planarizing surfaces |
JPH0985627A (ja) * | 1995-09-26 | 1997-03-31 | Matsushita Electric Ind Co Ltd | 研削用砥石 |
JP3533356B2 (ja) | 1999-03-11 | 2004-05-31 | 日本特殊研砥株式会社 | ガラス質基板用研磨砥石 |
JP2001205565A (ja) | 2000-01-26 | 2001-07-31 | Nippon Tokushu Kento Kk | 半導体用研磨砥石 |
JP4530479B2 (ja) | 2000-05-24 | 2010-08-25 | 弘 江田 | 精密加工装置 |
JP4419299B2 (ja) | 2000-09-01 | 2010-02-24 | 三菱マテリアル株式会社 | ハイブリッド砥石及びその製造方法 |
JP2002103238A (ja) * | 2000-10-03 | 2002-04-09 | Nihon Micro Coating Co Ltd | 研磨フィルム及びその製造方法 |
JP4573492B2 (ja) * | 2001-03-27 | 2010-11-04 | 株式会社東京ダイヤモンド工具製作所 | 合成砥石 |
JP3857118B2 (ja) * | 2001-12-04 | 2006-12-13 | 富士通株式会社 | レジンダイヤモンドブレード及び該ブレードを使用した光導波路の製造方法 |
JP2004261942A (ja) * | 2003-03-04 | 2004-09-24 | Nippon Tokushu Kento Kk | 研磨砥石 |
JP2005131711A (ja) * | 2003-10-28 | 2005-05-26 | Nihon Micro Coating Co Ltd | ダイヤモンド研磨粒子及びその製造方法 |
JP4283088B2 (ja) | 2003-10-30 | 2009-06-24 | 弘 江田 | 工作物表面加工方法 |
JP2005186246A (ja) | 2003-12-26 | 2005-07-14 | Tokyo Magnetic Printing Co Ltd | 複合材の研磨方法および仕上げ研磨に用いるラッピングオイル組成物 |
JP4852868B2 (ja) | 2005-04-04 | 2012-01-11 | トヨタ自動車株式会社 | 精密加工方法 |
-
2008
- 2008-03-25 EP EP08751823A patent/EP2140974B1/de active Active
- 2008-03-25 CN CN2008800100996A patent/CN101678533B/zh active Active
- 2008-03-25 AT AT08751823T patent/ATE550144T1/de active
- 2008-03-25 US US12/450,366 patent/US8377159B2/en active Active
- 2008-03-25 JP JP2009506388A patent/JP5010675B2/ja active Active
- 2008-03-25 WO PCT/JP2008/056279 patent/WO2008117883A1/ja active Application Filing
- 2008-03-25 KR KR1020097019852A patent/KR101503545B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JPWO2008117883A1 (ja) | 2010-07-15 |
KR101503545B1 (ko) | 2015-03-17 |
CN101678533A (zh) | 2010-03-24 |
EP2140974B1 (de) | 2012-03-21 |
US8377159B2 (en) | 2013-02-19 |
CN101678533B (zh) | 2011-11-16 |
KR20100014540A (ko) | 2010-02-10 |
WO2008117883A1 (ja) | 2008-10-02 |
EP2140974A1 (de) | 2010-01-06 |
JP5010675B2 (ja) | 2012-08-29 |
EP2140974A4 (de) | 2011-05-04 |
US20100037530A1 (en) | 2010-02-18 |
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