ATE520495T1 - Verfahren und vorrichtung zur bildung von rissen - Google Patents

Verfahren und vorrichtung zur bildung von rissen

Info

Publication number
ATE520495T1
ATE520495T1 AT05805249T AT05805249T ATE520495T1 AT E520495 T1 ATE520495 T1 AT E520495T1 AT 05805249 T AT05805249 T AT 05805249T AT 05805249 T AT05805249 T AT 05805249T AT E520495 T1 ATE520495 T1 AT E520495T1
Authority
AT
Austria
Prior art keywords
crack
line
beam spot
presumed
spot
Prior art date
Application number
AT05805249T
Other languages
German (de)
English (en)
Inventor
Togo Gonoe
Original Assignee
Mitsuboshi Diamond Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsuboshi Diamond Ind Co Ltd filed Critical Mitsuboshi Diamond Ind Co Ltd
Application granted granted Critical
Publication of ATE520495T1 publication Critical patent/ATE520495T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B23K26/0736—Shaping the laser spot into an oval shape, e.g. elliptic shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
    • B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03—Observing, e.g. monitoring, the workpiece
    • B23K26/034—Observing the temperature of the workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/40—Removing material taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment
    • B23K26/703—Cooling arrangements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K31/00—Processes relevant to this subclass, specially adapted for particular articles or purposes, but not covered by only one of the preceding main groups
    • B23K31/12—Processes relevant to this subclass, specially adapted for particular articles or purposes, but not covered by only one of the preceding main groups relating to investigating the properties, e.g. the weldability, of materials
    • B23K31/125—Weld quality monitoring
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/09—Severing cooled glass by thermal shock
    • C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/10—Methods
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/10—Methods
    • Y10T225/16—Transversely of continuously fed work
    • Y10T225/18—Progressively to or from one side edge
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/30—Breaking or tearing apparatus
    • Y10T225/304—Including means to apply thermal shock to work

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Thermal Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Quality & Reliability (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)
AT05805249T 2004-10-25 2005-10-25 Verfahren und vorrichtung zur bildung von rissen ATE520495T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004309958 2004-10-25
PCT/JP2005/019533 WO2006046525A1 (ja) 2004-10-25 2005-10-25 クラック形成方法およびクラック形成装置

Publications (1)

Publication Number Publication Date
ATE520495T1 true ATE520495T1 (de) 2011-09-15

Family

ID=36227765

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05805249T ATE520495T1 (de) 2004-10-25 2005-10-25 Verfahren und vorrichtung zur bildung von rissen

Country Status (9)

Country Link
US (1) US7726532B2 (enExample)
EP (1) EP1806202B1 (enExample)
JP (1) JP4722054B2 (enExample)
KR (1) KR100821937B1 (enExample)
CN (1) CN100475419C (enExample)
AT (1) ATE520495T1 (enExample)
MX (1) MX2007005018A (enExample)
TW (1) TW200621661A (enExample)
WO (1) WO2006046525A1 (enExample)

Families Citing this family (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007018674A1 (de) * 2007-04-18 2008-10-23 Lzh Laserzentrum Hannover E.V. Verfahren zum Bilden von Durchgangslöchern in Bauteilen aus Glas
US8496866B2 (en) * 2007-04-25 2013-07-30 Ceramtec Gmbh Chip resistor substrate
JP5235987B2 (ja) * 2007-04-30 2013-07-10 コーニング インコーポレイテッド 移動中の帯状ガラスに切断線を設ける装置、システム及び方法
JP5011048B2 (ja) 2007-09-27 2012-08-29 三星ダイヤモンド工業株式会社 脆性材料基板の加工方法
KR100949152B1 (ko) * 2007-11-23 2010-03-25 삼성코닝정밀유리 주식회사 유리 기판 레이저 절단 장치
CN101468875A (zh) 2007-12-24 2009-07-01 鸿富锦精密工业（深圳）有限公司 脆性非金属基材及其切割方法
CN101910076B (zh) * 2007-12-27 2013-01-30 三星钻石工业股份有限公司 脆性材料基板的裂痕形成方法
CN101497150B (zh) * 2008-02-01 2012-10-10 鸿富锦精密工业（深圳）有限公司 激光切割装置
KR100848854B1 (ko) * 2008-04-21 2008-07-30 주식회사 탑 엔지니어링 취성기판의 스크라이빙 장치 및 그 방법
IT1394891B1 (it) * 2008-07-25 2012-07-20 Matteo Baistrocchi Impianto di scribing laser per il trattamento superficiale di lamierini magnetici con spot a sezione ellittica
KR101041137B1 (ko) * 2009-03-25 2011-06-13 삼성모바일디스플레이주식회사 기판 절단 장치 및 이를 이용한 기판 절단 방법
JP2010232603A (ja) * 2009-03-30 2010-10-14 Mitsuboshi Diamond Industrial Co Ltd 基板固定装置
TWI517922B (zh) 2009-05-13 2016-01-21 康寧公司 切割脆性材料之方法
JP5636423B2 (ja) * 2009-05-27 2014-12-03 コーニング インコーポレイテッド 高温でのガラスのレーザ・スコアリング
US11235395B2 (en) * 2009-07-15 2022-02-01 Tennine Corp. Controlled fracture machining method for producing through-holes
US20110011227A1 (en) * 2009-07-15 2011-01-20 Tingley Iii William Q Method and apparatus for non-rotary holemaking by means of controlled fracturing
US8932510B2 (en) 2009-08-28 2015-01-13 Corning Incorporated Methods for laser cutting glass substrates
US8426767B2 (en) * 2009-08-31 2013-04-23 Corning Incorporated Methods for laser scribing and breaking thin glass
US8946590B2 (en) * 2009-11-30 2015-02-03 Corning Incorporated Methods for laser scribing and separating glass substrates
WO2011155314A1 (ja) * 2010-06-07 2011-12-15 日本電気硝子株式会社 ガラス板の切断方法
JP5696393B2 (ja) * 2010-08-02 2015-04-08 日本電気硝子株式会社 ガラスフィルムの割断方法
TWI513670B (zh) 2010-08-31 2015-12-21 Corning Inc 分離強化玻璃基板之方法
US9938180B2 (en) 2012-06-05 2018-04-10 Corning Incorporated Methods of cutting glass using a laser
KR101358672B1 (ko) * 2012-08-13 2014-02-11 한국과학기술원 극초단 펄스 레이저를 이용한 투명시편 절단방법 및 다이싱 장치
KR101355807B1 (ko) * 2012-09-11 2014-02-03 로체 시스템즈(주) 비금속 재료의 곡선 절단방법
US9610653B2 (en) 2012-09-21 2017-04-04 Electro Scientific Industries, Inc. Method and apparatus for separation of workpieces and articles produced thereby
WO2014079478A1 (en) 2012-11-20 2014-05-30 Light In Light Srl High speed laser processing of transparent materials
US9092187B2 (en) 2013-01-08 2015-07-28 Apple Inc. Ion implant indicia for cover glass or display component
US9623628B2 (en) * 2013-01-10 2017-04-18 Apple Inc. Sapphire component with residual compressive stress
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
WO2014126551A1 (en) 2013-02-12 2014-08-21 Apple Inc. Multi-step ion implantation
US10286487B2 (en) * 2013-02-28 2019-05-14 Ipg Photonics Corporation Laser system and method for processing sapphire
CN105142853B (zh) * 2013-02-28 2017-07-04 Ipg光子公司 用于加工蓝宝石的激光系统和方法
US9416442B2 (en) 2013-03-02 2016-08-16 Apple Inc. Sapphire property modification through ion implantation
EP2781296B1 (de) * 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US9508570B2 (en) * 2013-10-21 2016-11-29 Asm Technology Singapore Pte Ltd Singulation apparatus and method
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9517963B2 (en) 2013-12-17 2016-12-13 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US20150165560A1 (en) 2013-12-17 2015-06-18 Corning Incorporated Laser processing of slots and holes
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
EP3110592B1 (en) 2014-02-28 2020-01-15 IPG Photonics Corporation Multple-laser distinct wavelengths and pulse durations processing
US10343237B2 (en) 2014-02-28 2019-07-09 Ipg Photonics Corporation System and method for laser beveling and/or polishing
US9764427B2 (en) 2014-02-28 2017-09-19 Ipg Photonics Corporation Multi-laser system and method for cutting and post-cut processing hard dielectric materials
WO2015190281A1 (ja) * 2014-06-11 2015-12-17 株式会社Ihi 脆性材料基板の割断方法及び脆性材料基板の割断装置
US11498156B2 (en) * 2014-07-03 2022-11-15 Nippon Steel Corporation Laser processing apparatus
KR102445217B1 (ko) 2014-07-08 2022-09-20 코닝 인코포레이티드 재료를 레이저 가공하는 방법 및 장치
WO2016010991A1 (en) 2014-07-14 2016-01-21 Corning Incorporated Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block
US10611667B2 (en) 2014-07-14 2020-04-07 Corning Incorporated Method and system for forming perforations
TWI659793B (zh) * 2014-07-14 2019-05-21 美商康寧公司 用於使用可調整雷射束焦線來處理透明材料的系統及方法
WO2016010943A2 (en) 2014-07-14 2016-01-21 Corning Incorporated Method and system for arresting crack propagation
WO2016033494A1 (en) 2014-08-28 2016-03-03 Ipg Photonics Corporation System and method for laser beveling and/or polishing
CN107148324A (zh) 2014-08-28 2017-09-08 Ipg光子公司 用于切割和切割后加工硬质电介质材料的多激光器系统和方法
JP6303950B2 (ja) * 2014-09-19 2018-04-04 旭硝子株式会社 ガラス板の加工方法
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
EP3245166B1 (en) 2015-01-12 2020-05-27 Corning Incorporated Laser cutting of thermally tempered substrates using the multi photon absorption method
WO2016125609A1 (ja) * 2015-02-03 2016-08-11 セントラル硝子株式会社 脆性材料の切断方法、脆性材料の切断装置、切断脆性材料の製造方法及び切断脆性材料
EP3848334A1 (en) 2015-03-24 2021-07-14 Corning Incorporated Alkaline earth boro-aluminosilicate glass article with laser cut edge
WO2016160391A1 (en) 2015-03-27 2016-10-06 Corning Incorporated Gas permeable window and method of fabricating the same
US11186060B2 (en) 2015-07-10 2021-11-30 Corning Incorporated Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same
US10280504B2 (en) 2015-09-25 2019-05-07 Apple Inc. Ion-implanted, anti-reflective layer formed within sapphire material
DE102016000051A1 (de) 2016-01-05 2017-07-06 Siltectra Gmbh Verfahren und Vorrichtung zum planaren Erzeugen von Modifikationen in Festkörpern
JP6703617B2 (ja) * 2016-03-22 2020-06-03 ジルテクトラ ゲゼルシャフト ミット ベシュレンクテル ハフツング 分離されるべき固体物の複合レーザ処理
MY194570A (en) 2016-05-06 2022-12-02 Corning Inc Laser cutting and removal of contoured shapes from transparent substrates
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
CN109803934A (zh) 2016-07-29 2019-05-24 康宁股份有限公司 用于激光处理的装置和方法
WO2018044843A1 (en) 2016-08-30 2018-03-08 Corning Incorporated Laser processing of transparent materials
CN109803786B (zh) 2016-09-30 2021-05-07 康宁股份有限公司 使用非轴对称束斑对透明工件进行激光加工的设备和方法
JP7066701B2 (ja) 2016-10-24 2022-05-13 コーニング インコーポレイテッド シート状ガラス基体のレーザに基づく加工のための基体処理ステーション
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
EP3551373A1 (de) 2016-12-12 2019-10-16 Siltectra GmbH Verfahren zum dünnen von mit bauteilen versehenen festkörperschichten
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
CN108002696B (zh) * 2017-12-27 2024-05-17 信义玻璃（营口）有限公司 一种跟踪控制装置和冷却控制系统
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
CN110293310A (zh) * 2018-03-22 2019-10-01 孟晋科技股份有限公司 避免铝分子渗入镀铝硅高张力钢板焊道的加工方法
TWI706614B (zh) * 2018-11-10 2020-10-01 鴻超環保能源股份有限公司 雷射光源模組
CN109680448B (zh) * 2019-01-21 2024-04-19 苏州大喆智能科技有限公司 一种切线热粘装置
CN112828474B (zh) * 2020-12-31 2022-07-05 武汉华工激光工程有限责任公司 用于透明脆性材料的斜向切割补偿方法及系统
JP7713186B2 (ja) * 2021-08-18 2025-07-25 エンシュウ株式会社 レーザ加工装置
US12387307B2 (en) 2022-10-26 2025-08-12 Saudi Arabian Oil Company Determining severity of stepwise cracking in a pressurized vessel

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1244346B (de) * 1964-10-19 1967-07-13 Menzel Gerhard Glasbearbeitung Verfahren zum Schneiden von Glas
RU2024441C1 (ru) * 1992-04-02 1994-12-15 Владимир Степанович Кондратенко Способ резки неметаллических материалов
JP3195050B2 (ja) 1992-06-18 2001-08-06 マツダ株式会社 エンジンの吸入空気量検出装置
CN2178584Y (zh) * 1993-11-09 1994-10-05 北京工业大学 可产生宽带激光束的转镜装置
JPH0929472A (ja) * 1995-07-14 1997-02-04 Hitachi Ltd 割断方法、割断装置及びチップ材料
DE69629704T2 (de) * 1995-08-31 2004-07-08 Corning Inc. Verfahren und vorrichtung zum zerbrechen von sprödem material
MY120533A (en) * 1997-04-14 2005-11-30 Schott Ag Method and apparatus for cutting through a flat workpiece made of brittle material, especially glass.
TW419867B (en) * 1998-08-26 2001-01-21 Samsung Electronics Co Ltd Laser cutting apparatus and method
JP2001130921A (ja) * 1999-10-29 2001-05-15 Mitsuboshi Diamond Industrial Co Ltd 脆性基板の加工方法及び装置
AU1096701A (en) * 1999-11-12 2001-06-06 P.T.G. Precision Technology Center Llc Laser glass cutting with super cooled gas chill
KR100631304B1 (ko) * 1999-12-24 2006-10-04 삼성전자주식회사 레이저 빔을 이용한 유리기판 절단 장치 및 그 방법
DE19963939B4 (de) * 1999-12-31 2004-11-04 Schott Spezialglas Gmbh Verfahren und Vorrichtung zum Durchtrennen von flachen Werkstücken aus sprödbrüchigem Material
JP3802442B2 (ja) * 2000-12-01 2006-07-26 エルジー電子株式会社 ガラス切断方法および装置
CN1255858C (zh) * 2001-07-16 2006-05-10 三星宝石工业株式会社 脆性材料基板的划线装置和脆性材料基板的划线方法
TW583046B (en) * 2001-08-10 2004-04-11 Mitsuboshi Diamond Ind Co Ltd Method and device for scribing brittle material substrate
JP2005231035A (ja) * 2001-08-23 2005-09-02 Mitsuboshi Diamond Industrial Co Ltd 脆性材料の加工方法及び加工装置
KR100794284B1 (ko) * 2001-09-29 2008-01-11 삼성전자주식회사 비금속 기판 절단 방법
TWI277612B (en) * 2002-08-09 2007-04-01 Mitsuboshi Diamond Ind Co Ltd Method and device for scribing fragile material substrate

Also Published As

Publication number Publication date
WO2006046525A1 (ja) 2006-05-04
CN100475419C (zh) 2009-04-08
EP1806202A4 (en) 2009-05-06
TW200621661A (en) 2006-07-01
US20070228100A1 (en) 2007-10-04
JPWO2006046525A1 (ja) 2008-05-22
EP1806202A1 (en) 2007-07-11
CN101048255A (zh) 2007-10-03
EP1806202B1 (en) 2011-08-17
KR100821937B1 (ko) 2008-04-15
US7726532B2 (en) 2010-06-01
JP4722054B2 (ja) 2011-07-13
KR20070051945A (ko) 2007-05-18
TWI358395B (enExample) 2012-02-21
MX2007005018A (es) 2008-02-19

Similar Documents

Publication Publication Date Title
ATE520495T1 (de) Verfahren und vorrichtung zur bildung von rissen
TW200711775A (en) Method for cutting plate-shaped body, and laser beam machining device
TW200420510A (en) Substrate dividing apparatus and method for dividing substrate
MX2007001159A (es) Metodo para formar una grieta media en un sustrato y aparato para formar una grieta media en un sustrato.
ATE534142T1 (de) Verfahren zum auftrennen eines substrats
DE602006010735D1 (de) Verfahren zur verbesserten ätzung eines optischen artikels durch bereitstellung einer temporären schicht aus einem organischen material
ATE405842T1 (de) Verfahren und vorrichtung zur präzisen positionierung einer pipettiervorrichtung
JP2004010466A5 (enExample)
PL1621303T3 (pl) Przyrząd obróbkowy
TW200624396A (en) Method and apparatus for scribing brittle material board and system for breaking brittle material board
MY150368A (en) Alignment system and method for a substrate in a nano-imprint process
TW200600883A (en) Fine pattern modification device and modification method of the fine pattern defect
WO2009047990A1 (ja) 脆性材料基板、および、脆性材料基板のレーザスクライブ方法、レーザスクライブ装置
ATE527091T1 (de) Verfahren zum teilen eines substrats und ein verfahren zur herstellung eines panels
ATE478393T1 (de) Verfahren zur bildung eines zweidimensionalen codes durch lasermarkierung und lasermarkierungseinrichtung
WO2009078324A1 (ja) 脆性材料基板の面取り加工方法および面取り加工装置
TW200834247A (en) Lamination apparatus of liquid crystal panel and lamination method of lamination of a liquid crystal panel
ATE493757T1 (de) Verfahren zur positionierung eines wafers
TWI256139B (en) Method and apparatus for fabricating flat panel display
ATE420746T1 (de) Verfahren zum lichtbogen- oder laserschweissen von metall mit der hilfe von kryogendurchfluss
CN105669014B (zh) 一种采用激光刻划玻璃加工方法
TW200613227A (en) Scriber
SG155856A1 (en) Method for coarse wafer alignment in a lithographic apparatus
TW201247575A (en) Processing method for brittle material substrate
ATE409893T1 (de) Verfahren zur herstellung eines bauelements und apparat zur prozessierung eines substrats, sowie substratträger

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties