ATE484606T1 - Kathodenzerstäubung mit hoher abscheidungsrate - Google Patents

Kathodenzerstäubung mit hoher abscheidungsrate

Info

Publication number
ATE484606T1
ATE484606T1 AT03779387T AT03779387T ATE484606T1 AT E484606 T1 ATE484606 T1 AT E484606T1 AT 03779387 T AT03779387 T AT 03779387T AT 03779387 T AT03779387 T AT 03779387T AT E484606 T1 ATE484606 T1 AT E484606T1
Authority
AT
Austria
Prior art keywords
sputtering
sputtering target
anode
cathode assembly
ionized plasma
Prior art date
Application number
AT03779387T
Other languages
English (en)
Inventor
Roman Chistyakov
Original Assignee
Zond Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=32296386&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE484606(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Zond Inc filed Critical Zond Inc
Application granted granted Critical
Publication of ATE484606T1 publication Critical patent/ATE484606T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3492—Variation of parameters during sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3476—Testing and control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02266—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by physical ablation of a target, e.g. sputtering, reactive sputtering, physical vapour deposition or pulsed laser deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Disintegrating Or Milling (AREA)
AT03779387T 2002-11-14 2003-10-29 Kathodenzerstäubung mit hoher abscheidungsrate ATE484606T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/065,739 US6896773B2 (en) 2002-11-14 2002-11-14 High deposition rate sputtering
PCT/US2003/034226 WO2004044261A2 (en) 2002-11-14 2003-10-29 High deposition rate sputtering

Publications (1)

Publication Number Publication Date
ATE484606T1 true ATE484606T1 (de) 2010-10-15

Family

ID=32296386

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03779387T ATE484606T1 (de) 2002-11-14 2003-10-29 Kathodenzerstäubung mit hoher abscheidungsrate

Country Status (7)

Country Link
US (5) US6896773B2 (de)
EP (1) EP1560943B1 (de)
JP (1) JP4722486B2 (de)
AT (1) ATE484606T1 (de)
AU (1) AU2003285072A1 (de)
DE (1) DE60334561D1 (de)
WO (1) WO2004044261A2 (de)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6808607B2 (en) * 2002-09-25 2004-10-26 Advanced Energy Industries, Inc. High peak power plasma pulsed supply with arc handling
US7147759B2 (en) * 2002-09-30 2006-12-12 Zond, Inc. High-power pulsed magnetron sputtering
US6896773B2 (en) * 2002-11-14 2005-05-24 Zond, Inc. High deposition rate sputtering
US6806651B1 (en) * 2003-04-22 2004-10-19 Zond, Inc. High-density plasma source
US9771648B2 (en) * 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
US7663319B2 (en) * 2004-02-22 2010-02-16 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
US7095179B2 (en) * 2004-02-22 2006-08-22 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
US9123508B2 (en) * 2004-02-22 2015-09-01 Zond, Llc Apparatus and method for sputtering hard coatings
EP1580298A1 (de) * 2004-03-22 2005-09-28 Materia Nova A.S.B.L Verfahren und Gerät für gepulste Magnetron Kathodenzerstäubung
US7750575B2 (en) * 2004-04-07 2010-07-06 Zond, Inc. High density plasma source
US20100090101A1 (en) * 2004-06-04 2010-04-15 Ionwerks, Inc. Gold implantation/deposition of biological samples for laser desorption two and three dimensional depth profiling of biological tissues
EP1803142A1 (de) 2004-09-24 2007-07-04 Zond, Inc. Vorrichtung zum erzeugen von elektrischen hochstrom-entladungen
WO2007048098A2 (en) * 2005-10-18 2007-04-26 Southwest Research Institute Erosion resistant coatings
US20090214787A1 (en) * 2005-10-18 2009-08-27 Southwest Research Institute Erosion Resistant Coatings
US20070158181A1 (en) * 2006-01-12 2007-07-12 Seagate Technology Llc Method & apparatus for cathode sputtering with uniform process gas distribution
GB0608582D0 (en) * 2006-05-02 2006-06-07 Univ Sheffield Hallam High power impulse magnetron sputtering vapour deposition
US9812302B2 (en) * 2007-03-16 2017-11-07 National University Corporation Tohoku University Magnetron sputtering apparatus
DE112008000912T5 (de) * 2007-04-06 2010-02-18 National University Corporation Tohoku University, Sendai Magnetronsputtervorrichtung
US7966909B2 (en) * 2007-07-25 2011-06-28 The Gillette Company Process of forming a razor blade
EP2257964B1 (de) * 2007-12-07 2018-07-11 Evatec AG Reaktives sputtern mit hipims
WO2011006109A2 (en) * 2008-01-30 2011-01-13 Applied Materials, Inc. High efficiency low energy microwave ion/electron source
US7993733B2 (en) * 2008-02-20 2011-08-09 Applied Materials, Inc. Index modified coating on polymer substrate
US20090238998A1 (en) * 2008-03-18 2009-09-24 Applied Materials, Inc. Coaxial microwave assisted deposition and etch systems
US20090238993A1 (en) * 2008-03-19 2009-09-24 Applied Materials, Inc. Surface preheating treatment of plastics substrate
US8057649B2 (en) * 2008-05-06 2011-11-15 Applied Materials, Inc. Microwave rotatable sputtering deposition
US8349156B2 (en) * 2008-05-14 2013-01-08 Applied Materials, Inc. Microwave-assisted rotatable PVD
US20100078315A1 (en) * 2008-09-26 2010-04-01 Applied Materials, Inc. Microstrip antenna assisted ipvd
US20100078320A1 (en) * 2008-09-26 2010-04-01 Applied Materials, Inc. Microwave plasma containment shield shaping
DE102008050499B4 (de) 2008-10-07 2014-02-06 Systec System- Und Anlagentechnik Gmbh & Co. Kg PVD-Beschichtungsverfahren, Vorrichtung zur Durchführung des Verfahrens und nach dem Verfahren beschichtete Substrate
WO2010120792A1 (en) * 2009-04-17 2010-10-21 The Regents Of The University Of California Method and apparatus for super-high rate deposition
TW201130007A (en) * 2009-07-09 2011-09-01 Applied Materials Inc High efficiency low energy microwave ion/electron source
US8790791B2 (en) 2010-04-15 2014-07-29 Southwest Research Institute Oxidation resistant nanocrystalline MCrAl(Y) coatings and methods of forming such coatings
CN102534521A (zh) * 2010-12-13 2012-07-04 中国科学院沈阳科学仪器研制中心有限公司 一种磁控靶布气结构
RU2463382C2 (ru) * 2010-12-16 2012-10-10 Валерий Михайлович Башков Способ и устройство для получения многослойно-композиционных наноструктурированных покрытий и материалов
DE102010061487A1 (de) 2010-12-22 2012-06-28 EB Immobilien und Maschinen GmbH & Co. KG Verfahren zum Behandeln und/oder Beschichten von Oberflächen
MY170814A (en) * 2011-02-25 2019-08-30 Toray Industries Magnetron electrode for plasma processing
US9511572B2 (en) 2011-05-25 2016-12-06 Southwest Research Institute Nanocrystalline interlayer coating for increasing service life of thermal barrier coating on high temperature components
EP2541584B1 (de) 2011-06-27 2018-08-08 TRUMPF Huettinger Sp. Z o. o. Erzeugung von hochionisiertem Plasma in einer Plasmakammer
US9175382B2 (en) 2011-10-25 2015-11-03 Intermolecular, Inc. High metal ionization sputter gun
WO2014017682A1 (ko) * 2012-07-26 2014-01-30 주식회사 아비즈알 마그네트론 냉각부를 구비한 마그네트론 스퍼터링 장치
WO2014105872A2 (en) * 2012-12-27 2014-07-03 Flir Systems, Inc. Deposition systems and methods
US9018108B2 (en) 2013-01-25 2015-04-28 Applied Materials, Inc. Low shrinkage dielectric films
DE102013103762A1 (de) * 2013-04-15 2014-10-16 Von Ardenne Anlagentechnik Gmbh Beschichtungsanordnung
US9960026B1 (en) 2013-11-11 2018-05-01 Coldquanta Inc. Ion pump with direct molecule flow channel through anode
US9960025B1 (en) 2013-11-11 2018-05-01 Coldquanta Inc. Cold-matter system having ion pump integrated with channel cell
US9117563B2 (en) 2014-01-13 2015-08-25 Cold Quanta, Inc. Ultra-cold-matter system with thermally-isolated nested source cell
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
CN104694900A (zh) * 2015-03-27 2015-06-10 中国工程物理研究院激光聚变研究中心 可加偏压式薄膜样品架
US9523146B1 (en) 2015-06-17 2016-12-20 Southwest Research Institute Ti—Si—C—N piston ring coatings
US10043670B2 (en) * 2015-10-22 2018-08-07 Applied Materials, Inc. Systems and methods for low resistivity physical vapor deposition of a tungsten film
CN105441889A (zh) * 2015-12-22 2016-03-30 大连维钛克科技股份有限公司 一种离子源磁场分布结构
US10927449B2 (en) * 2017-01-25 2021-02-23 Applied Materials, Inc. Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment
CN107475677A (zh) * 2017-08-18 2017-12-15 嘉兴申宁精密科技有限公司 一种采用物理气相沉积工艺溅镀涂层的装置
JP6836976B2 (ja) * 2017-09-26 2021-03-03 東京エレクトロン株式会社 プラズマ処理装置
CN110112094B (zh) * 2018-02-01 2021-06-04 长鑫存储技术有限公司 铝膜低温溅镀方法、铝导线层制造方法及具有其的结构
JP6920245B2 (ja) * 2018-04-23 2021-08-18 東京エレクトロン株式会社 温度制御方法
JP6851706B2 (ja) * 2018-05-30 2021-03-31 東芝三菱電機産業システム株式会社 活性ガス生成装置
KR102533881B1 (ko) 2018-06-20 2023-05-17 보드 오브 트러스티즈 오브 미시건 스테이트 유니버시티 단일 빔 플라즈마 소스
JP7257807B2 (ja) * 2019-02-12 2023-04-14 東京エレクトロン株式会社 スパッタ装置
FR3097237B1 (fr) * 2019-06-11 2021-05-28 Safran Procédé de revêtement d'un substrat par du nitrure de tantale
JP6873588B1 (ja) 2019-11-12 2021-05-19 東芝三菱電機産業システム株式会社 活性ガス生成装置
KR102524433B1 (ko) 2019-11-27 2023-04-24 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 활성 가스 생성 장치
CA3111730C (en) * 2020-03-16 2023-09-26 Vapor Technologies, Inc. Convertible magnetics for rotary cathode
CN111560588B (zh) * 2020-05-09 2022-05-03 南方科技大学 用于超高真空环境的磁控溅射靶、磁控溅射装置
CN114032518A (zh) * 2021-10-29 2022-02-11 北京航空航天大学 双极脉冲磁控溅射系统及提高沉积离子流量和能量方法
CN114032519A (zh) * 2021-10-29 2022-02-11 北京航空航天大学 电磁场耦合双极脉冲磁控溅射系统及提高流量和能量方法

Family Cites Families (98)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1488482A (de) * 1965-07-16 1967-11-02
US3461054A (en) * 1966-03-24 1969-08-12 Bell Telephone Labor Inc Cathodic sputtering from a cathodically biased target electrode having an rf potential superimposed on the cathodic bias
CA941781A (en) 1970-05-13 1974-02-12 United Aircraft Corporation Metal deposition by liquid phase sputtering
US3761836A (en) * 1972-01-07 1973-09-25 United Aircraft Corp Magnetically compensated cross field flowing gas laser
JPS6010107B2 (ja) 1981-05-25 1985-03-15 日本真空技術株式会社 Ｒｆスパツタリングにおける絶縁物タ−ゲツト用カソ−ド
US4407708A (en) * 1981-08-06 1983-10-04 Eaton Corporation Method for operating a magnetron sputtering apparatus
DE3210351A1 (de) 1982-03-20 1983-09-22 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum herstellen von magnetischen aufzeichnungsschichten
US4588490A (en) * 1985-05-22 1986-05-13 International Business Machines Corporation Hollow cathode enhanced magnetron sputter device
JPS62216637A (ja) * 1986-03-19 1987-09-24 Anelva Corp プラズマ処理装置
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
US5429070A (en) * 1989-06-13 1995-07-04 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
WO1991000374A1 (de) * 1989-06-27 1991-01-10 Hauzer Holding Bv Verfahren und vorrichtung zur beschichtung von substraten
JP2819420B2 (ja) * 1989-11-20 1998-10-30 東京エレクトロン株式会社 イオン源
US5045166A (en) * 1990-05-21 1991-09-03 Mcnc Magnetron method and apparatus for producing high density ionic gas discharge
JP3076367B2 (ja) * 1990-11-29 2000-08-14 キヤノン株式会社 プラズマ処理装置
DE4108474A1 (de) * 1991-03-15 1992-09-17 Lambda Physik Forschung Vorrichtung zur vorionisierung eines gepulsten gaslasers
CA2108673A1 (en) * 1991-04-19 1992-10-20 John Marshall Method and apparatus for linear magnetron sputtering
DE4202425C2 (de) * 1992-01-29 1997-07-17 Leybold Ag Verfahren und Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
RU2029411C1 (ru) 1992-04-29 1995-02-20 Научно-производственная фирма "Плазматек" Способ плазменного травления тонких пленок
US5330800A (en) * 1992-11-04 1994-07-19 Hughes Aircraft Company High impedance plasma ion implantation method and apparatus
US5718813A (en) 1992-12-30 1998-02-17 Advanced Energy Industries, Inc. Enhanced reactive DC sputtering system
US5427669A (en) * 1992-12-30 1995-06-27 Advanced Energy Industries, Inc. Thin film DC plasma processing system
US6217717B1 (en) 1992-12-30 2001-04-17 Advanced Energy Industries, Inc. Periodically clearing thin film plasma processing system
RU2058429C1 (ru) 1993-06-17 1996-04-20 Георгий Владимирович Ходаченко Способ напыления пленок
US6190512B1 (en) * 1993-09-07 2001-02-20 Tokyo Electron Arizona Inc. Soft plasma ignition in plasma processing chambers
SE501888C2 (sv) * 1993-10-18 1995-06-12 Ladislav Bardos En metod och en apparat för generering av en urladdning i egna ångor från en radiofrekvenselektrod för kontinuerlig självförstoftning av elektroden
JP3250699B2 (ja) * 1994-02-03 2002-01-28 東京エレクトロン株式会社 プラズマ処理装置
DE4412906C1 (de) * 1994-04-14 1995-07-13 Fraunhofer Ges Forschung Verfahren und Einrichtung für die ionengestützte Vakuumbeschichtung
US5651865A (en) * 1994-06-17 1997-07-29 Eni Preferential sputtering of insulators from conductive targets
JP3562595B2 (ja) * 1994-08-26 2004-09-08 アネルバ株式会社 スパッタ装置
JPH08279495A (ja) * 1995-02-07 1996-10-22 Seiko Epson Corp プラズマ処理装置及びその方法
WO1996031899A1 (en) * 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
JPH08293470A (ja) * 1995-04-21 1996-11-05 Sony Corp 成膜装置および成膜方法
US5576939A (en) 1995-05-05 1996-11-19 Drummond; Geoffrey N. Enhanced thin film DC plasma power supply
JP3808917B2 (ja) * 1995-07-20 2006-08-16 オリンパス株式会社 薄膜の製造方法及び薄膜
US5702573A (en) * 1996-01-29 1997-12-30 Varian Associates, Inc. Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films
FR2744462B1 (fr) 1996-02-02 1998-02-27 Commissariat Energie Atomique Procede et dispositif pour realiser un depot par pulverisation cathodique a partir d'une cible portee a haute temperature
US5733418A (en) * 1996-05-07 1998-03-31 Pld Advanced Automation Systems, Inc. Sputtering method and apparatus
US5917286A (en) * 1996-05-08 1999-06-29 Advanced Energy Industries, Inc. Pulsed direct current power supply configurations for generating plasmas
DE19702187C2 (de) * 1997-01-23 2002-06-27 Fraunhofer Ges Forschung Verfahren und Einrichtung zum Betreiben von Magnetronentladungen
SE9704607D0 (sv) * 1997-12-09 1997-12-09 Chemfilt R & D Ab A method and apparatus for magnetically enhanced sputtering
JP4355036B2 (ja) * 1997-03-18 2009-10-28 キヤノンアネルバ株式会社 イオン化スパッタリング装置
JP3846970B2 (ja) * 1997-04-14 2006-11-15 キヤノンアネルバ株式会社 イオン化スパッタリング装置
DE19720251A1 (de) * 1997-05-15 1998-11-19 Fraunhofer Ges Forschung Verfahren zum Beschichten von Dünnfilmmagnetplatten
JPH10330932A (ja) * 1997-05-28 1998-12-15 Anelva Corp スパッタリング装置
US6238527B1 (en) * 1997-10-08 2001-05-29 Canon Kabushiki Kaisha Thin film forming apparatus and method of forming thin film of compound by using the same
US5976327A (en) * 1997-12-12 1999-11-02 Applied Materials, Inc. Step coverage and overhang improvement by pedestal bias voltage modulation
US6124675A (en) * 1998-06-01 2000-09-26 University Of Montreal Metastable atom bombardment source
US6057244A (en) * 1998-07-31 2000-05-02 Applied Materials, Inc. Method for improved sputter etch processing
US6238537B1 (en) * 1998-08-06 2001-05-29 Kaufman & Robinson, Inc. Ion assisted deposition source
DE19851062C1 (de) * 1998-11-05 2000-06-15 Ibm Verfahren zum Beschichten von Magnetspeicherplatten und danach hergestellte Magnetspeicherplatte
US6306265B1 (en) * 1999-02-12 2001-10-23 Applied Materials, Inc. High-density plasma for ionized metal deposition capable of exciting a plasma wave
US6183614B1 (en) * 1999-02-12 2001-02-06 Applied Materials, Inc. Rotating sputter magnetron assembly
US6497802B2 (en) * 1999-02-12 2002-12-24 Applied Materials, Inc. Self ionized plasma sputtering
JP4351755B2 (ja) * 1999-03-12 2009-10-28 キヤノンアネルバ株式会社 薄膜作成方法および薄膜作成装置
US6086730A (en) 1999-04-22 2000-07-11 Komag, Incorporated Method of sputtering a carbon protective film on a magnetic disk with high sp3 content
US6327163B1 (en) 1999-04-27 2001-12-04 Science Research Laboratory, Inc. Solid state pulsed power supply
US6319355B1 (en) * 1999-06-30 2001-11-20 Lam Research Corporation Plasma processor with coil responsive to variable amplitude rf envelope
US6290821B1 (en) * 1999-07-15 2001-09-18 Seagate Technology Llc Sputter deposition utilizing pulsed cathode and substrate bias power
US6398929B1 (en) * 1999-10-08 2002-06-04 Applied Materials, Inc. Plasma reactor and shields generating self-ionized plasma for sputtering
US8696875B2 (en) * 1999-10-08 2014-04-15 Applied Materials, Inc. Self-ionized and inductively-coupled plasma for sputtering and resputtering
US20010050220A1 (en) * 1999-11-16 2001-12-13 Applied Materials, Inc. Method and apparatus for physical vapor deposition using modulated power
US6350353B2 (en) * 1999-11-24 2002-02-26 Applied Materials, Inc. Alternate steps of IMP and sputtering process to improve sidewall coverage
US6344419B1 (en) * 1999-12-03 2002-02-05 Applied Materials, Inc. Pulsed-mode RF bias for sidewall coverage improvement
US6251242B1 (en) * 2000-01-21 2001-06-26 Applied Materials, Inc. Magnetron and target producing an extended plasma region in a sputter reactor
US6451177B1 (en) * 2000-01-21 2002-09-17 Applied Materials, Inc. Vault shaped target and magnetron operable in two sputtering modes
US6277249B1 (en) * 2000-01-21 2001-08-21 Applied Materials Inc. Integrated process for copper via filling using a magnetron and target producing highly energetic ions
DE10015244C2 (de) * 2000-03-28 2002-09-19 Fraunhofer Ges Forschung Verfahren und Schaltungsanordnung zur pulsförmigen Energieeinspeisung in Magnetronentladungen
US6679981B1 (en) * 2000-05-11 2004-01-20 Applied Materials, Inc. Inductive plasma loop enhancing magnetron sputtering
US6447655B2 (en) * 2000-05-30 2002-09-10 Alexander D. Lantsman DC plasma power supply for a sputter deposition
SE519931C2 (sv) 2000-06-19 2003-04-29 Chemfilt R & D Ab Anordning och förfarande för pulsad, starkt joniserad magnetronsputtering
US6352629B1 (en) * 2000-07-10 2002-03-05 Applied Materials, Inc. Coaxial electromagnet in a magnetron sputtering reactor
DE10051509B4 (de) * 2000-10-18 2007-08-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung eines Dünnschichtsystems und Anwendung des Verfahrens
US6413382B1 (en) * 2000-11-03 2002-07-02 Applied Materials, Inc. Pulsed sputtering with a small rotating magnetron
US6777037B2 (en) * 2001-02-21 2004-08-17 Hitachi, Ltd. Plasma processing method and apparatus
US6663754B2 (en) * 2001-04-13 2003-12-16 Applied Materials, Inc. Tubular magnet as center pole in unbalanced sputtering magnetron
US6755945B2 (en) * 2001-05-04 2004-06-29 Tokyo Electron Limited Ionized PVD with sequential deposition and etching
SE525231C2 (sv) 2001-06-14 2005-01-11 Chemfilt R & D Ab Förfarande och anordning för att alstra plasma
US20030029715A1 (en) * 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
JP3936892B2 (ja) 2002-06-07 2007-06-27 株式会社エスディーシー プラズマ浸炭処理方法および同処理装置
US6730196B2 (en) * 2002-08-01 2004-05-04 Applied Materials, Inc. Auxiliary electromagnets in a magnetron sputter reactor
US6808607B2 (en) 2002-09-25 2004-10-26 Advanced Energy Industries, Inc. High peak power plasma pulsed supply with arc handling
US7147759B2 (en) * 2002-09-30 2006-12-12 Zond, Inc. High-power pulsed magnetron sputtering
US6896775B2 (en) * 2002-10-29 2005-05-24 Zond, Inc. High-power pulsed magnetically enhanced plasma processing
US6853142B2 (en) * 2002-11-04 2005-02-08 Zond, Inc. Methods and apparatus for generating high-density plasma
US6896773B2 (en) * 2002-11-14 2005-05-24 Zond, Inc. High deposition rate sputtering
US20040112735A1 (en) * 2002-12-17 2004-06-17 Applied Materials, Inc. Pulsed magnetron for sputter deposition
US6899796B2 (en) * 2003-01-10 2005-05-31 Applied Materials, Inc. Partially filling copper seed layer
US6805779B2 (en) * 2003-03-21 2004-10-19 Zond, Inc. Plasma generation using multi-step ionization
US6806651B1 (en) * 2003-04-22 2004-10-19 Zond, Inc. High-density plasma source
GB2401116A (en) 2003-04-28 2004-11-03 Hauzer Techno Coating Bv Plasma Assisted Chemical Vapour Deposition
US6903511B2 (en) * 2003-05-06 2005-06-07 Zond, Inc. Generation of uniformly-distributed plasma
US9771648B2 (en) * 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
US20050103620A1 (en) 2003-11-19 2005-05-19 Zond, Inc. Plasma source with segmented magnetron cathode
US7081186B2 (en) * 2003-11-20 2006-07-25 Sheffield Hallam University Combined coating process comprising magnetic field-assisted, high power, pulsed cathode sputtering and an unbalanced magnetron
US7095179B2 (en) 2004-02-22 2006-08-22 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
EP1803142A1 (de) * 2004-09-24 2007-07-04 Zond, Inc. Vorrichtung zum erzeugen von elektrischen hochstrom-entladungen
KR101647515B1 (ko) 2008-04-03 2016-08-10 에바텍 어드벤스드 테크놀로지스 아크티엔게젤샤프트 반도체 칩용 금속 배선 구조의 제조 방법, 그리고 반도체 칩용 금속 배선 구조 제조를 위한 금속 배선 구조 제조 장치의 제어 방법

Also Published As

Publication number Publication date
WO2004044261A2 (en) 2004-05-27
EP1560943B1 (de) 2010-10-13
US20100326815A1 (en) 2010-12-30
US6896773B2 (en) 2005-05-24
US20170029936A1 (en) 2017-02-02
DE60334561D1 (de) 2010-11-25
US7811421B2 (en) 2010-10-12
EP1560943A2 (de) 2005-08-10
US20050178654A1 (en) 2005-08-18
WO2004044261A3 (en) 2004-08-26
AU2003285072A8 (en) 2004-06-03
US20040094411A1 (en) 2004-05-20
US20050252763A1 (en) 2005-11-17
AU2003285072A1 (en) 2004-06-03
JP4722486B2 (ja) 2011-07-13
JP2006506521A (ja) 2006-02-23

Similar Documents

Publication Publication Date Title
ATE484606T1 (de) Kathodenzerstäubung mit hoher abscheidungsrate
WO2007124032A3 (en) Dual plasma beam sources and method
WO2004095497A3 (en) High-density plasma source
WO2005084087A3 (en) Methods and apparatus for generating high-density plasmas with ionizational instabilities
ATE550454T1 (de) Plasmaquelle mit segmentierter magnetron-kathode
TW200420201A (en) Plasma generation device, plasma control method and substrate manufacturing method
JP2011518950A5 (de)
UA109032C2 (en) ELECTRONIC BEAM GENERATION DEVICE
ATE535629T1 (de) Gepulstes hochleistungs-magnetronsputterverfahren sowie hochleistungs-elektroenergiequelle
EP2304070A4 (de) Sputtering-system und -verfahren mit einem lichtbogenerkennungssystem
RU2014130057A (ru) Удлиненный каскадный плазмотрон
MX2015008261A (es) Dispositivo de bombardeo de iones y metodo para usar el mismo para limpiar una superficie de sustrato.
CN103874312A (zh) 一种面向z箍缩的壳层等离子体柱产生方法及其装置
CN103298233A (zh) 新型高密度阴极等离子体源
RU2010114726A (ru) Система электростатического ионного ускорителя
RU2011154038A (ru) Установка для ионно-лучевой и плазменной обработки
AU2003219001A1 (en) Getter metal alloy coating and device and method for the production thereof
TW335504B (en) A method for providing full-face high density plasma deposition
WO2009025306A1 (ja) スパッタリング方法
ES2883198T3 (es) Disposición de pulverización catódica y procedimiento para la distribución optimizada del flujo de energía
JP2018535532A (ja) 多相交流電流またはパルス電流によって駆動されるプラズマ装置およびプラズマを発生させる方法
JP4370949B2 (ja) 成膜方法
RU145256U1 (ru) Устройство для стационарной генерации ионного пучка большой мощности
Zhang et al. Simulation of microhollow cathode discharge with planar and hollow anodes
RU2360320C1 (ru) Источник электронов

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties