DE60336574D1 - Gepulste Hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter Wirkung - Google Patents

Gepulste Hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter Wirkung

Info

Publication number
DE60336574D1
DE60336574D1 DE60336574T DE60336574T DE60336574D1 DE 60336574 D1 DE60336574 D1 DE 60336574D1 DE 60336574 T DE60336574 T DE 60336574T DE 60336574 T DE60336574 T DE 60336574T DE 60336574 D1 DE60336574 D1 DE 60336574D1
Authority
DE
Germany
Prior art keywords
cathode
weakly
proximate
plasma processing
ionized plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60336574T
Other languages
English (en)
Inventor
Roman Chistyakov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zond LLC
Original Assignee
Zond LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=32106072&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60336574(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Zond LLC filed Critical Zond LLC
Application granted granted Critical
Publication of DE60336574D1 publication Critical patent/DE60336574D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Magnetic Treatment Devices (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
DE60336574T 2002-10-29 2003-10-28 Gepulste Hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter Wirkung Expired - Lifetime DE60336574D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/065,551 US6896775B2 (en) 2002-10-29 2002-10-29 High-power pulsed magnetically enhanced plasma processing
PCT/US2003/034191 WO2004040615A2 (en) 2002-10-29 2003-10-28 High-power pulsed magnetically enhanced plasma processing

Publications (1)

Publication Number Publication Date
DE60336574D1 true DE60336574D1 (de) 2011-05-12

Family

ID=32106072

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60336574T Expired - Lifetime DE60336574D1 (de) 2002-10-29 2003-10-28 Gepulste Hochleistungsplasmabearbeitungsanlage mit magnetisch erhöhter Wirkung

Country Status (7)

Country Link
US (2) US6896775B2 (de)
EP (1) EP1556882B1 (de)
JP (1) JP2006505128A (de)
AT (1) ATE504074T1 (de)
AU (1) AU2003284194A1 (de)
DE (1) DE60336574D1 (de)
WO (1) WO2004040615A2 (de)

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JP2014125651A (ja) * 2012-12-26 2014-07-07 Kobe Steel Ltd インライン式プラズマｃｖｄ装置
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US9249500B2 (en) 2013-02-07 2016-02-02 Applied Materials, Inc. PVD RF DC open/closed loop selectable magnetron
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US11776793B2 (en) 2020-11-13 2023-10-03 Applied Materials, Inc. Plasma source with ceramic electrode plate
US11798790B2 (en) 2020-11-16 2023-10-24 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
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US11495470B1 (en) 2021-04-16 2022-11-08 Applied Materials, Inc. Method of enhancing etching selectivity using a pulsed plasma
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Also Published As

Publication number Publication date
US20040082187A1 (en) 2004-04-29
ATE504074T1 (de) 2011-04-15
JP2006505128A (ja) 2006-02-09
EP1556882B1 (de) 2011-03-30
EP1556882A2 (de) 2005-07-27
US20050167263A1 (en) 2005-08-04
AU2003284194A1 (en) 2004-05-25
WO2004040615A2 (en) 2004-05-13
US6896775B2 (en) 2005-05-24
WO2004040615A3 (en) 2004-09-23

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