ATE354548T1 - Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung - Google Patents

Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung

Info

Publication number
ATE354548T1
ATE354548T1 AT00122418T AT00122418T ATE354548T1 AT E354548 T1 ATE354548 T1 AT E354548T1 AT 00122418 T AT00122418 T AT 00122418T AT 00122418 T AT00122418 T AT 00122418T AT E354548 T1 ATE354548 T1 AT E354548T1
Authority
AT
Austria
Prior art keywords
optical material
excimer
production
quartz glass
material made
Prior art date
Application number
AT00122418T
Other languages
English (en)
Inventor
Shigeru Dr Yamagata
Original Assignee
Heraeus Quarzglas
Shinetsu Quartz Prod
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17829155&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE354548(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Heraeus Quarzglas, Shinetsu Quartz Prod filed Critical Heraeus Quarzglas
Application granted granted Critical
Publication of ATE354548T1 publication Critical patent/ATE354548T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00—Compositions: ceramic
    • Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y10S501/905—Ultraviolet transmitting or absorbing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
AT00122418T 1999-10-19 2000-10-13 Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung ATE354548T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11296101A JP3069562B1 (ja) 1999-10-19 1999-10-19 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法

Publications (1)

Publication Number Publication Date
ATE354548T1 true ATE354548T1 (de) 2007-03-15

Family

ID=17829155

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00122418T ATE354548T1 (de) 1999-10-19 2000-10-13 Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung

Country Status (7)

Country Link
US (1) US6451719B1 (de)
EP (1) EP1094040B8 (de)
JP (1) JP3069562B1 (de)
KR (1) KR100359947B1 (de)
AT (1) ATE354548T1 (de)
DE (1) DE60033481T2 (de)
TW (1) TW593191B (de)

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EP1088795A4 (de) * 1999-03-25 2004-03-31 Asahi Glass Co Ltd Synthetisches quarzglas für optische elemente, herstellungsverfahren und verfahren zur verwendung desselben
JP3228732B2 (ja) * 1999-11-24 2001-11-12 信越石英株式会社 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法
US6990836B2 (en) * 2000-02-23 2006-01-31 Shin-Etsu Chemical Co., Ltd. Method of producing fluorine-containing synthetic quartz glass
JP2001270731A (ja) 2000-03-28 2001-10-02 Nikon Corp 合成石英ガラス部材及びこれを用いた光リソグラフィー装置
JP4500411B2 (ja) * 2000-04-24 2010-07-14 株式会社オハラ 紫外線用石英ガラスおよびその製造方法
JP4700787B2 (ja) * 2000-06-27 2011-06-15 株式会社オハラ 合成石英ガラスおよびその製造方法
US6844277B2 (en) * 2000-07-31 2005-01-18 Corning Incorporated UV photosensitive melted glasses
US6828262B2 (en) * 2000-07-31 2004-12-07 Corning Incorporated UV photosensitive melted glasses
JP2002114531A (ja) * 2000-08-04 2002-04-16 Sumitomo Electric Ind Ltd フッ素添加ガラス
US6683019B2 (en) * 2001-06-13 2004-01-27 Abb Lummus Global Inc. Catalyst for the metathesis of olefin(s)
US20050124839A1 (en) * 2001-06-13 2005-06-09 Gartside Robert J. Catalyst and process for the metathesis of ethylene and butene to produce propylene
JP4744046B2 (ja) * 2001-09-28 2011-08-10 信越石英株式会社 合成石英ガラス材料の製造方法
JP4104338B2 (ja) * 2002-01-31 2008-06-18 信越石英株式会社 ＡｒＦ露光装置用合成石英ガラス素材
ATE445579T1 (de) * 2002-04-23 2009-10-15 Asahi Glass Co Ltd Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
JP2004269287A (ja) * 2003-03-06 2004-09-30 Shinetsu Quartz Prod Co Ltd 光学用合成石英ガラス部材及びその製造方法
JP4453335B2 (ja) * 2003-10-22 2010-04-21 富士ゼロックス株式会社 光回路パターン及び高分子光導波路の製造方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
DE102004009577B3 (de) * 2004-02-25 2005-03-03 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines optischen Bauteils
JP4134927B2 (ja) * 2004-03-25 2008-08-20 ウシオ電機株式会社 エキシマランプ
JP4462557B2 (ja) * 2004-10-15 2010-05-12 コバレントマテリアル株式会社 フォトマスク用合成シリカガラス基板の製造方法、その方法によるフォトマスク用合成シリカガラス基板
US7589039B2 (en) * 2004-12-29 2009-09-15 Corning Incorporated Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
US7506522B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High refractive index homogeneity fused silica glass and method of making same
US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
JP5538679B2 (ja) * 2004-12-30 2014-07-02 コーニング インコーポレイテッド 低い偏光誘起複屈折を有する合成シリカ、同シリカの製造方法および同シリカを含むリソグラフィデバイス
US7928026B2 (en) * 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
JP2007031217A (ja) * 2005-07-28 2007-02-08 Shinetsu Quartz Prod Co Ltd エキシマｕｖランプ装置用大型合成石英ガラス板
US7994083B2 (en) * 2005-09-16 2011-08-09 Corning Incorporated Fused silica glass and method for making the same
US7964522B2 (en) 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
JP2008063181A (ja) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法
EP2158170A2 (de) * 2007-05-09 2010-03-03 Corning Incorporated Gläser mit hohen oh-, od-niveaus
JP5482662B2 (ja) 2008-10-06 2014-05-07 旭硝子株式会社 合成石英ガラスの製造方法
JP5643748B2 (ja) * 2009-03-31 2014-12-17 ステラケミファ株式会社 光学部材およびその製造方法
DE102018211234A1 (de) * 2018-07-06 2020-01-09 Carl Zeiss Smt Gmbh Substrat für ein reflektives optisches Element
EP4030204B1 (de) * 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Mikrostrukturierte optische faser und vorform dafür
JP7713171B2 (ja) * 2021-10-29 2025-07-25 ウシオ電機株式会社 エキシマランプ及び紫外光照射装置

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US3128166A (en) 1953-11-25 1964-04-07 Heraeus Schott Quarzschmelze Process for producing quartz glass
US3483613A (en) 1966-04-08 1969-12-16 Us Army Method of making variable reluctance position transducer
JP3368932B2 (ja) 1992-02-07 2003-01-20 旭硝子株式会社 透明石英ガラスとその製造方法
US5326729A (en) * 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
JPH0627013A (ja) 1992-07-09 1994-02-04 Satake Eng Co Ltd 麦粉の粒度分析装置
JPH0648734A (ja) 1992-07-27 1994-02-22 Teika Corp 結晶性チタン酸系ペロブスカイト化合物微粒子の製造方法
JP3125630B2 (ja) * 1994-07-07 2001-01-22 株式会社ニコン 真空紫外用石英ガラスの製造方法および石英ガラス光学部材
US5679125A (en) * 1994-07-07 1997-10-21 Nikon Corporation Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
JP3188624B2 (ja) * 1995-12-27 2001-07-16 信越石英株式会社 遠紫外線用高純度合成シリカガラス及びその製造方法
EP0835848A3 (de) * 1996-08-21 1998-06-10 Nikon Corporation Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat
JP3061010B2 (ja) * 1997-06-27 2000-07-10 坂東機工株式会社 ガラス板の折割装置
JPH11302025A (ja) * 1998-04-23 1999-11-02 Asahi Glass Co Ltd 合成石英ガラス光学部材およびその製造方法
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass

Also Published As

Publication number Publication date
DE60033481D1 (de) 2007-04-05
EP1094040B1 (de) 2007-02-21
EP1094040B8 (de) 2007-05-30
US6451719B1 (en) 2002-09-17
KR100359947B1 (ko) 2002-11-04
EP1094040A2 (de) 2001-04-25
DE60033481T2 (de) 2007-10-31
JP2001114529A (ja) 2001-04-24
TW593191B (en) 2004-06-21
KR20010039472A (ko) 2001-05-15
EP1094040A3 (de) 2001-10-31
JP3069562B1 (ja) 2000-07-24

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