ATE354548T1 - Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung - Google Patents
Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellungInfo
- Publication number
- ATE354548T1 ATE354548T1 AT00122418T AT00122418T ATE354548T1 AT E354548 T1 ATE354548 T1 AT E354548T1 AT 00122418 T AT00122418 T AT 00122418T AT 00122418 T AT00122418 T AT 00122418T AT E354548 T1 ATE354548 T1 AT E354548T1
- Authority
- AT
- Austria
- Prior art keywords
- optical material
- excimer
- production
- quartz glass
- material made
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S501/00—Compositions: ceramic
- Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
- Y10S501/905—Ultraviolet transmitting or absorbing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11296101A JP3069562B1 (ja) | 1999-10-19 | 1999-10-19 | エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE354548T1 true ATE354548T1 (de) | 2007-03-15 |
Family
ID=17829155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00122418T ATE354548T1 (de) | 1999-10-19 | 2000-10-13 | Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung |
Country Status (7)
Country | Link |
---|---|
US (1) | US6451719B1 (de) |
EP (1) | EP1094040B8 (de) |
JP (1) | JP3069562B1 (de) |
KR (1) | KR100359947B1 (de) |
AT (1) | ATE354548T1 (de) |
DE (1) | DE60033481T2 (de) |
TW (1) | TW593191B (de) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6544914B1 (en) * | 1999-03-25 | 2003-04-08 | Asahi Glass Company, Limited | Synthetic quartz glass for optical member, process for producing the same, and method of using the same |
JP3228732B2 (ja) * | 1999-11-24 | 2001-11-12 | 信越石英株式会社 | 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法 |
US6990836B2 (en) | 2000-02-23 | 2006-01-31 | Shin-Etsu Chemical Co., Ltd. | Method of producing fluorine-containing synthetic quartz glass |
JP2001270731A (ja) * | 2000-03-28 | 2001-10-02 | Nikon Corp | 合成石英ガラス部材及びこれを用いた光リソグラフィー装置 |
JP4500411B2 (ja) * | 2000-04-24 | 2010-07-14 | 株式会社オハラ | 紫外線用石英ガラスおよびその製造方法 |
JP4700787B2 (ja) * | 2000-06-27 | 2011-06-15 | 株式会社オハラ | 合成石英ガラスおよびその製造方法 |
US6844277B2 (en) * | 2000-07-31 | 2005-01-18 | Corning Incorporated | UV photosensitive melted glasses |
US6828262B2 (en) * | 2000-07-31 | 2004-12-07 | Corning Incorporated | UV photosensitive melted glasses |
JP2002114531A (ja) * | 2000-08-04 | 2002-04-16 | Sumitomo Electric Ind Ltd | フッ素添加ガラス |
US20050124839A1 (en) * | 2001-06-13 | 2005-06-09 | Gartside Robert J. | Catalyst and process for the metathesis of ethylene and butene to produce propylene |
US6683019B2 (en) * | 2001-06-13 | 2004-01-27 | Abb Lummus Global Inc. | Catalyst for the metathesis of olefin(s) |
JP4744046B2 (ja) * | 2001-09-28 | 2011-08-10 | 信越石英株式会社 | 合成石英ガラス材料の製造方法 |
JP4104338B2 (ja) * | 2002-01-31 | 2008-06-18 | 信越石英株式会社 | ArF露光装置用合成石英ガラス素材 |
DE60329671D1 (de) | 2002-04-23 | 2009-11-26 | Asahi Glass Co Ltd | Jektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren |
US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
JP2004269287A (ja) * | 2003-03-06 | 2004-09-30 | Shinetsu Quartz Prod Co Ltd | 光学用合成石英ガラス部材及びその製造方法 |
JP4453335B2 (ja) * | 2003-10-22 | 2010-04-21 | 富士ゼロックス株式会社 | 光回路パターン及び高分子光導波路の製造方法 |
US6992753B2 (en) * | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
DE102004009577B3 (de) * | 2004-02-25 | 2005-03-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils |
JP4134927B2 (ja) * | 2004-03-25 | 2008-08-20 | ウシオ電機株式会社 | エキシマランプ |
JP4462557B2 (ja) * | 2004-10-15 | 2010-05-12 | コバレントマテリアル株式会社 | フォトマスク用合成シリカガラス基板の製造方法、その方法によるフォトマスク用合成シリカガラス基板 |
US7506522B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High refractive index homogeneity fused silica glass and method of making same |
US7589039B2 (en) * | 2004-12-29 | 2009-09-15 | Corning Incorporated | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
US7506521B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High transmission synthetic silica glass and method of making same |
WO2006074083A1 (en) * | 2004-12-30 | 2006-07-13 | Corning Incorporated | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
US7928026B2 (en) | 2005-06-30 | 2011-04-19 | Corning Incorporated | Synthetic silica material with low fluence-dependent-transmission and method of making the same |
JP2007031217A (ja) * | 2005-07-28 | 2007-02-08 | Shinetsu Quartz Prod Co Ltd | エキシマuvランプ装置用大型合成石英ガラス板 |
US7994083B2 (en) * | 2005-09-16 | 2011-08-09 | Corning Incorporated | Fused silica glass and method for making the same |
US7964522B2 (en) | 2006-08-31 | 2011-06-21 | Corning Incorporated | F-doped silica glass and process of making same |
JP2008063181A (ja) * | 2006-09-07 | 2008-03-21 | Shin Etsu Chem Co Ltd | エキシマレーザー用合成石英ガラス基板及びその製造方法 |
JP5719590B2 (ja) * | 2007-05-09 | 2015-05-20 | コーニング インコーポレイテッド | Oh、odレベルの低いガラス |
JP5482662B2 (ja) | 2008-10-06 | 2014-05-07 | 旭硝子株式会社 | 合成石英ガラスの製造方法 |
EP2416184A4 (de) * | 2009-03-31 | 2014-09-03 | Stella Chemifa Corp | Optisches element und verfahren zu dessen herstellung |
KR101703720B1 (ko) * | 2016-07-06 | 2017-02-07 | (주)에이치엔피테크 | 이탈방지용 삽입형 링조인트 배관 |
EP4030204B1 (de) | 2021-01-19 | 2023-09-20 | Heraeus Quarzglas GmbH & Co. KG | Mikrostrukturierte optische faser und vorform dafür |
JP2023066627A (ja) * | 2021-10-29 | 2023-05-16 | ウシオ電機株式会社 | エキシマランプ及び紫外光照射装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2904713A (en) | 1952-07-15 | 1959-09-15 | Heraeus Schott Quarzschmelze | Casings for gas discharge tubes and lamps and process |
US3128166A (en) | 1953-11-25 | 1964-04-07 | Heraeus Schott Quarzschmelze | Process for producing quartz glass |
US3483613A (en) | 1966-04-08 | 1969-12-16 | Us Army | Method of making variable reluctance position transducer |
JP3368932B2 (ja) | 1992-02-07 | 2003-01-20 | 旭硝子株式会社 | 透明石英ガラスとその製造方法 |
US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
JPH0627013A (ja) | 1992-07-09 | 1994-02-04 | Satake Eng Co Ltd | 麦粉の粒度分析装置 |
JPH0648734A (ja) | 1992-07-27 | 1994-02-22 | Teika Corp | 結晶性チタン酸系ペロブスカイト化合物微粒子の製造方法 |
JP3125630B2 (ja) * | 1994-07-07 | 2001-01-22 | 株式会社ニコン | 真空紫外用石英ガラスの製造方法および石英ガラス光学部材 |
US5679125A (en) * | 1994-07-07 | 1997-10-21 | Nikon Corporation | Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range |
JP3188624B2 (ja) * | 1995-12-27 | 2001-07-16 | 信越石英株式会社 | 遠紫外線用高純度合成シリカガラス及びその製造方法 |
EP0835848A3 (de) * | 1996-08-21 | 1998-06-10 | Nikon Corporation | Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat |
JP3061010B2 (ja) * | 1997-06-27 | 2000-07-10 | 坂東機工株式会社 | ガラス板の折割装置 |
JPH11302025A (ja) * | 1998-04-23 | 1999-11-02 | Asahi Glass Co Ltd | 合成石英ガラス光学部材およびその製造方法 |
EP1043282A4 (de) * | 1998-10-28 | 2004-03-31 | Asahi Glass Co Ltd | Synthetisches quarzglas und herstellungsverfahren davon |
US6242136B1 (en) * | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
-
1999
- 1999-10-19 JP JP11296101A patent/JP3069562B1/ja not_active Expired - Lifetime
- 1999-11-01 TW TW088118971A patent/TW593191B/zh not_active IP Right Cessation
- 1999-11-01 KR KR1019990048058A patent/KR100359947B1/ko active IP Right Grant
-
2000
- 2000-10-13 AT AT00122418T patent/ATE354548T1/de not_active IP Right Cessation
- 2000-10-13 DE DE60033481T patent/DE60033481T2/de not_active Expired - Lifetime
- 2000-10-13 EP EP00122418A patent/EP1094040B8/de not_active Expired - Lifetime
- 2000-10-19 US US09/692,014 patent/US6451719B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE60033481T2 (de) | 2007-10-31 |
EP1094040A2 (de) | 2001-04-25 |
EP1094040B8 (de) | 2007-05-30 |
DE60033481D1 (de) | 2007-04-05 |
KR100359947B1 (ko) | 2002-11-04 |
US6451719B1 (en) | 2002-09-17 |
EP1094040A3 (de) | 2001-10-31 |
EP1094040B1 (de) | 2007-02-21 |
JP2001114529A (ja) | 2001-04-24 |
JP3069562B1 (ja) | 2000-07-24 |
TW593191B (en) | 2004-06-21 |
KR20010039472A (ko) | 2001-05-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE354548T1 (de) | Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung | |
ATE135669T1 (de) | Optisches bauteil aus hochreinem und transparentem, synthetischem quarzglas und verfahren zu seiner herstellung und sein rohling | |
ATE540005T1 (de) | Quarzglaskörper für ein optisches bauteil und verfahren zu seiner herstellung | |
JP3206916B2 (ja) | 欠陥濃度低減方法、紫外線透過用光学ガラスの製造方法及び紫外線透過用光学ガラス | |
EP0401845A3 (de) | Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung | |
KR960029260A (ko) | 석영 유리, 그것을 함유하는 광학 부재 및 그의 제조방법 | |
EP0835848A3 (de) | Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat | |
JP2008044843A (ja) | 合成石英ガラス製プリフォーム | |
ATE352526T1 (de) | Optische gläser die unter betriebsbedingungen bei uv-belichtung in bezug auf ihren brechungsindex möglichst stabil sind | |
DE60036252D1 (de) | Quarzglaselemente für Excimer-Laser und Verfahren zu deren Herstellung | |
WO2003078342A3 (en) | Uv photosensitive melted glasses | |
DE602004017549D1 (de) | Kunststofflinse und Verfahren zu deren Herstellung. | |
JPH0791084B2 (ja) | 耐紫外線用合成石英ガラスおよびその製造方法 | |
JPH0532432A (ja) | 高出力レーザ用光学部材 | |
KR20000035883A (ko) | 고에너지의 조사하에서 저압축을 갖는 실리카 | |
DE69915420D1 (de) | Verfahren zur Herstellung synthetischen Kieselglases zur Anwendung für ArF-Excimer-Laserlithographie | |
JP4323319B2 (ja) | アルミニウムを含有する溶融シリカ | |
EP1548014A4 (de) | Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel | |
ATE438675T1 (de) | Pellikel und neues fluoriertes polymer | |
JP2005504699A5 (de) | ||
US20010018835A1 (en) | Synthesized silica glass optical member and method for manufacturing the same | |
US20030119650A1 (en) | Fused silica containing aluminum | |
WO2003080526A1 (fr) | Verre au quartz de synthese | |
KR860001767A (ko) | GeO₂-SiO₂계 유리모재의 제조방법 | |
JP2005514309A5 (de) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification |
Ref document number: 1094040 Country of ref document: EP |
|
REN | Ceased due to non-payment of the annual fee |