ATE445579T1 - Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren - Google Patents

Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren

Info

Publication number
ATE445579T1
ATE445579T1 AT03719187T AT03719187T ATE445579T1 AT E445579 T1 ATE445579 T1 AT E445579T1 AT 03719187 T AT03719187 T AT 03719187T AT 03719187 T AT03719187 T AT 03719187T AT E445579 T1 ATE445579 T1 AT E445579T1
Authority
AT
Austria
Prior art keywords
projection exposure
quartz glass
synthetic quartz
optical element
exposure apparatus
Prior art date
Application number
AT03719187T
Other languages
English (en)
Inventor
Yoshiaki Ikuta
N Agata
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE445579T1 publication Critical patent/ATE445579T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Glass Compositions (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Surface Treatment Of Glass (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT03719187T 2002-04-23 2003-04-23 Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren ATE445579T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002120805 2002-04-23
PCT/JP2003/005193 WO2003091175A1 (en) 2002-04-23 2003-04-23 Synthetic quartz glass for optical member, projection exposure device, and projection exposure method

Publications (1)

Publication Number Publication Date
ATE445579T1 true ATE445579T1 (de) 2009-10-15

Family

ID=29267384

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03719187T ATE445579T1 (de) 2002-04-23 2003-04-23 Synthetisches quarzglas für optisches element, projektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren

Country Status (9)

Country Link
US (1) US7368403B2 (de)
EP (1) EP1498394B1 (de)
JP (1) JPWO2003091175A1 (de)
KR (1) KR100952093B1 (de)
CN (1) CN100389085C (de)
AT (1) ATE445579T1 (de)
AU (1) AU2003235105A1 (de)
DE (1) DE60329671D1 (de)
WO (1) WO2003091175A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2003091175A1 (ja) 2002-04-23 2005-09-02 旭硝子株式会社 光学部材用合成石英ガラス、投影露光装置および投影露光方法
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
EP1740512A1 (de) * 2004-04-28 2007-01-10 Asahi Glass Company, Limited Optisches element aus synthetischem quarzglas und herstellungsverfahren dafür
JP5091128B2 (ja) * 2005-06-21 2012-12-05 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影レンズおよびそのための端部素子
EP1979279A1 (de) * 2006-01-30 2008-10-15 Asahi Glass Co., Ltd. Synthetisches quarzglas mit schnellen doppelbrechungsachsen, die in richtungen der tangenten konzentrischer kreise verteilt sind, und herstellungsverfahren dafür
JP4316589B2 (ja) * 2006-06-16 2009-08-19 東京電波株式会社 人工水晶部材およびその製造方法、ならびにそれを用いた光学素子
US9034539B2 (en) * 2010-06-28 2015-05-19 Carl Zeiss Sms Gmbh Controllable transmission and phase compensation of transparent material
JP2012145869A (ja) * 2011-01-14 2012-08-02 Hitachi High-Technologies Corp 露光方法及びその装置
JP6039207B2 (ja) * 2012-03-23 2016-12-07 Hoya株式会社 Ｅｕｖリソグラフィー用多層反射膜付き基板の製造方法及びｅｕｖリソグラフィー用反射型マスクブランクの製造方法、ｅｕｖリソグラフィー用反射型マスクの製造方法、及び半導体装置の製造方法
CN110058495A (zh) * 2013-05-21 2019-07-26 Asml荷兰有限公司 检查方法和设备、用于在其中使用的衬底及器件制造方法
CN110198918A (zh) * 2017-01-16 2019-09-03 Ａｇｃ株式会社 石英玻璃和使用该石英玻璃的紫外线发光元件用构件

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2784708B2 (ja) * 1992-12-28 1998-08-06 信越石英株式会社 エキシマレーザー用光学石英ガラス部材及びその製造方法
JP3451604B2 (ja) * 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
JP3274954B2 (ja) * 1995-08-18 2002-04-15 住友金属工業株式会社 光学用合成石英ガラス材及びその製造方法
JP3188624B2 (ja) * 1995-12-27 2001-07-16 信越石英株式会社 遠紫外線用高純度合成シリカガラス及びその製造方法
IL132431A0 (en) * 1997-04-18 2001-03-19 Nikon Corp Method and device for exposure control method and device for exposure and method of manufacture of device
JP3716574B2 (ja) * 1997-10-07 2005-11-16 株式会社ニコン エキシマレーザ照射に対する光学部材の耐久性予測方法及び石英ガラス光学部材の選択方法
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
JP3654500B2 (ja) * 1998-12-26 2005-06-02 信越石英株式会社 Ｆ２エキシマレーザー光学部材用石英ガラス材料及び光学部材
WO2000076923A1 (en) * 1999-06-10 2000-12-21 Asahi Glass Company, Limited Synthetic quartz glass and method for preparing the same
JP2001110710A (ja) * 1999-10-08 2001-04-20 Nikon Corp 露光装置、露光方法、および半導体デバイスの製造方法
JP3069562B1 (ja) * 1999-10-19 2000-07-24 信越石英株式会社 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法
JP3228732B2 (ja) * 1999-11-24 2001-11-12 信越石英株式会社 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法
JP2001270731A (ja) * 2000-03-28 2001-10-02 Nikon Corp 合成石英ガラス部材及びこれを用いた光リソグラフィー装置
JP4763877B2 (ja) * 2000-05-29 2011-08-31 信越石英株式会社 Ｆ２エキシマレーザー用合成石英ガラス光学材料及び光学部材
WO2002021217A1 (en) * 2000-09-08 2002-03-14 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
US6835683B2 (en) * 2001-04-19 2004-12-28 Nikon Corporation Quartz glass member and projection aligner
DE10159962A1 (de) * 2001-12-06 2003-07-03 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
JPWO2003091175A1 (ja) 2002-04-23 2005-09-02 旭硝子株式会社 光学部材用合成石英ガラス、投影露光装置および投影露光方法
JP4470479B2 (ja) 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法

Also Published As

Publication number Publication date
JPWO2003091175A1 (ja) 2005-09-02
CN1646440A (zh) 2005-07-27
KR20040104541A (ko) 2004-12-10
EP1498394A1 (de) 2005-01-19
US7368403B2 (en) 2008-05-06
DE60329671D1 (de) 2009-11-26
WO2003091175A1 (en) 2003-11-06
KR100952093B1 (ko) 2010-04-13
AU2003235105A1 (en) 2003-11-10
EP1498394B1 (de) 2009-10-14
US20050068644A1 (en) 2005-03-31
CN100389085C (zh) 2008-05-21
EP1498394A4 (de) 2006-06-07

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