DE602004022451D1 - Pellikel und neues fluoriertes polymer - Google Patents
Pellikel und neues fluoriertes polymerInfo
- Publication number
- DE602004022451D1 DE602004022451D1 DE200460022451 DE602004022451T DE602004022451D1 DE 602004022451 D1 DE602004022451 D1 DE 602004022451D1 DE 200460022451 DE200460022451 DE 200460022451 DE 602004022451 T DE602004022451 T DE 602004022451T DE 602004022451 D1 DE602004022451 D1 DE 602004022451D1
- Authority
- DE
- Germany
- Prior art keywords
- polymer
- forming
- unit
- main chain
- pellicle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
- C08G65/223—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
- C08G65/226—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
- Y10T428/24331—Composite web or sheet including nonapertured component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Polyethers (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003404403 | 2003-12-03 | ||
JP2004120237 | 2004-04-15 | ||
JP2004225707 | 2004-08-02 | ||
PCT/JP2004/017965 WO2005054336A1 (ja) | 2003-12-03 | 2004-12-02 | ペリクルおよび新規な含フッ素重合体 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602004022451D1 true DE602004022451D1 (de) | 2009-09-17 |
Family
ID=34657738
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE200460022451 Active DE602004022451D1 (de) | 2003-12-03 | 2004-12-02 | Pellikel und neues fluoriertes polymer |
Country Status (9)
Country | Link |
---|---|
US (1) | US7790811B2 (de) |
EP (1) | EP1690883B1 (de) |
JP (1) | JP4415942B2 (de) |
KR (1) | KR101141570B1 (de) |
CN (1) | CN1886442B (de) |
AT (1) | ATE438675T1 (de) |
DE (1) | DE602004022451D1 (de) |
TW (1) | TW200530300A (de) |
WO (1) | WO2005054336A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101946295B (zh) | 2008-02-22 | 2012-11-28 | 旭硝子株式会社 | 驻极体及静电感应型转换元件 |
JP5311331B2 (ja) * | 2008-06-25 | 2013-10-09 | ルネサスエレクトロニクス株式会社 | 液浸リソグラフィの現像処理方法および該現像処理方法を用いた電子デバイス |
JP2011113033A (ja) * | 2009-11-30 | 2011-06-09 | Shin-Etsu Chemical Co Ltd | ペリクル膜の製造方法および装置 |
KR20140042813A (ko) * | 2011-07-29 | 2014-04-07 | 아사히 가라스 가부시키가이샤 | 리소그래피용 펠리클, 펠리클이 부착된 포토마스크 및 노광 처리 방법 |
US9958771B2 (en) * | 2016-06-23 | 2018-05-01 | Rave Llc | Method and apparatus for pellicle removal |
WO2018163442A1 (ja) * | 2017-03-10 | 2018-09-13 | Dic株式会社 | 含フッ素アセトフェノン誘導体、フッ素系添加剤及びこれを含有する硬化性組成物とその硬化物 |
KR101952871B1 (ko) | 2017-04-13 | 2019-02-28 | 삼성전기주식회사 | 적층 세라믹 커패시터 및 그의 실장 기판 |
JP6863123B2 (ja) * | 2017-06-21 | 2021-04-21 | Dic株式会社 | 反射防止塗料組成物及び反射防止フィルム |
CN112310302A (zh) * | 2019-07-30 | 2021-02-02 | 陕西坤同半导体科技有限公司 | 一种有机发光器件 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4594399A (en) * | 1981-09-28 | 1986-06-10 | E. I. Du Pont De Nemours And Company | Cyclic monomers derived from trifluoropyruvate esters, amended to polymers and polymer films from dioxoles |
JP2951337B2 (ja) | 1989-04-17 | 1999-09-20 | 古河電気工業株式会社 | ペリクル |
JP2952962B2 (ja) | 1989-05-31 | 1999-09-27 | 旭硝子株式会社 | 汚染防止保護器具 |
DE69111699T2 (de) | 1990-06-01 | 1996-04-18 | Asahi Glass Co Ltd | Fluoropolymer-Überzugszusammensetzung und damit beschichteter Gegenstand. |
JP3029323B2 (ja) | 1990-06-01 | 2000-04-04 | 旭硝子株式会社 | コーティング用含フッ素重合体組成物およびその用途 |
JP3005040B2 (ja) | 1990-11-22 | 2000-01-31 | 旭硝子株式会社 | コーティング用樹脂組成物 |
JP3292534B2 (ja) | 1993-01-27 | 2002-06-17 | 旭硝子株式会社 | 基材の被覆方法 |
JP4106723B2 (ja) * | 1998-01-27 | 2008-06-25 | 旭硝子株式会社 | 反射防止フィルタ用コーティング組成物 |
JP3879279B2 (ja) | 1998-06-15 | 2007-02-07 | 旭硝子株式会社 | サイズ排除クロマトグラフ法 |
US6824930B1 (en) | 1999-11-17 | 2004-11-30 | E. I. Du Pont De Nemours And Company | Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
KR20030008215A (ko) | 1999-11-17 | 2003-01-24 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 자외선 및 진공자외선 투명 폴리머 조성물 및 그의 용도 |
US6770404B1 (en) | 1999-11-17 | 2004-08-03 | E. I. Du Pont De Nemours And Company | Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
JP4185233B2 (ja) | 2000-03-10 | 2008-11-26 | 信越化学工業株式会社 | リソグラフィー用ペリクル |
US6548129B2 (en) | 2000-03-15 | 2003-04-15 | Asahi Glass Company, Limited | Pellicle |
JP2001330943A (ja) * | 2000-03-15 | 2001-11-30 | Asahi Glass Co Ltd | ペリクル |
CA2420574C (en) * | 2000-08-30 | 2010-03-23 | Asahi Glass Company, Limited | Process for producing fluorinated ketone |
JP4126542B2 (ja) * | 2000-12-13 | 2008-07-30 | 旭硝子株式会社 | 含フッ素エステル化合物の分解反応生成物の製造方法 |
EP1388026A1 (de) * | 2001-05-14 | 2004-02-11 | E.I. Du Pont De Nemours & Company Incorporated | Verwendung von teilweise fluorierten polymeren für anwendungen die ultraviolet und vakuum ultraviolet tranzparenz erfordern |
EP1548014B1 (de) | 2002-08-21 | 2009-04-22 | Asahi Glass Company Ltd. | Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel |
JP2004085713A (ja) | 2002-08-23 | 2004-03-18 | Asahi Glass Co Ltd | ペリクル |
AU2003284574A1 (en) * | 2003-03-28 | 2004-10-25 | Asahi Glass Company, Limited | Fluoro compound and fluoropolymer |
-
2004
- 2004-12-02 AT AT04819912T patent/ATE438675T1/de not_active IP Right Cessation
- 2004-12-02 WO PCT/JP2004/017965 patent/WO2005054336A1/ja active Application Filing
- 2004-12-02 EP EP20040819912 patent/EP1690883B1/de not_active Not-in-force
- 2004-12-02 CN CN2004800352397A patent/CN1886442B/zh not_active Expired - Fee Related
- 2004-12-02 DE DE200460022451 patent/DE602004022451D1/de active Active
- 2004-12-02 KR KR1020067010801A patent/KR101141570B1/ko active IP Right Grant
- 2004-12-02 JP JP2005515973A patent/JP4415942B2/ja active Active
- 2004-12-03 TW TW93137550A patent/TW200530300A/zh not_active IP Right Cessation
-
2006
- 2006-06-05 US US11/446,242 patent/US7790811B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7790811B2 (en) | 2010-09-07 |
ATE438675T1 (de) | 2009-08-15 |
JPWO2005054336A1 (ja) | 2007-06-28 |
TW200530300A (en) | 2005-09-16 |
TWI359825B (de) | 2012-03-11 |
EP1690883A4 (de) | 2007-05-02 |
KR20060123242A (ko) | 2006-12-01 |
KR101141570B1 (ko) | 2012-05-03 |
CN1886442B (zh) | 2010-09-08 |
WO2005054336A1 (ja) | 2005-06-16 |
CN1886442A (zh) | 2006-12-27 |
EP1690883A1 (de) | 2006-08-16 |
EP1690883B1 (de) | 2009-08-05 |
US20060240222A1 (en) | 2006-10-26 |
JP4415942B2 (ja) | 2010-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE602004022451D1 (de) | Pellikel und neues fluoriertes polymer | |
DE60033481D1 (de) | Optischer Werkstoff aus Quarzglas für Excimer Laser und Excimer Lampe, und Verfahren zu dessen Herstellung | |
ATE413617T1 (de) | Verfahren zur herstellung eines lichtdiffusionsfilms | |
ES2167353T3 (es) | Reticulacion de composiciones que contienen fotoiniciadores de oxido de bisacilfosfina. | |
ATE305020T1 (de) | Fluorelastomerzusammensetzungen, ihre herstellung und anwendung | |
EP1548062A4 (de) | Optisches material, enthaltend photohärtbares fluorpolymer, und photohärtbares fluorharz enthaltende zusammensetzung | |
EP1746460A3 (de) | Photomaskenrohling, Photomaske und deren Herstellungsverfahren | |
AR076353A1 (es) | Absorbentes de luz uv/visible para materiales de lentes oftalmicas | |
MY140628A (en) | Negative deep ultraviolet photoresist | |
ATE495182T1 (de) | Phosphinat-komplexverbindungen der 2., 3., 12. und 13. gruppen und deren verwendung als flammenschutzmittel | |
BR9903612A (pt) | FluoroelastÈmeros curáveis com peróxidos, e, uso e processo para obtenção dos fluoroelastÈmeros | |
DE60329671D1 (de) | Jektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren | |
DE60327333D1 (de) | Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel | |
DE60036252D1 (de) | Quarzglaselemente für Excimer-Laser und Verfahren zu deren Herstellung | |
BR9708639A (pt) | Composição estabilizadora | |
ATE418748T1 (de) | Positive lichtempfindliche zusammensetzung und verfahren zur strukturformung damit | |
KR20050074509A (ko) | 감방사선성 수지 조성물 | |
EP0907106A4 (de) | Membran abdeckung für uv-strahlen und entsprechende membrane | |
EP1493719A4 (de) | Synthetisches quarzglas | |
ATE145658T1 (de) | Polymermischungen mit lcst-verhalten | |
ATE261406T1 (de) | Verfahren zur herstellung synthetischen kieselglases zur anwendung für arf-excimer- laserlithographie | |
DE602004017039D1 (de) | Üssigkristall | |
ATE201655T1 (de) | Stabilisierte und gepufferte wasserstoffperoxidlösung, verfahren zur deren herstellung und verwendung zur dekontamination von kontaktlinsen | |
ATE400626T1 (de) | Siliconzusammensetzung und polymerdispergierter flüssigkristall | |
JP2008235001A (ja) | 照明器具のセード |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |