ATE261406T1 - Verfahren zur herstellung synthetischen kieselglases zur anwendung für arf-excimer- laserlithographie - Google Patents

Verfahren zur herstellung synthetischen kieselglases zur anwendung für arf-excimer- laserlithographie

Info

Publication number
ATE261406T1
ATE261406T1 AT99116937T AT99116937T ATE261406T1 AT E261406 T1 ATE261406 T1 AT E261406T1 AT 99116937 T AT99116937 T AT 99116937T AT 99116937 T AT99116937 T AT 99116937T AT E261406 T1 ATE261406 T1 AT E261406T1
Authority
AT
Austria
Prior art keywords
excimer laser
arf excimer
producing
application
laser lithography
Prior art date
Application number
AT99116937T
Other languages
English (en)
Inventor
Takayuki Oshima
Akira Fujinoki
Hiroyuki Nishimura
Yasuyuki Yaginuma
Original Assignee
Heraeus Quarzglas
Shin Etsu Quartz Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas, Shin Etsu Quartz Co Ltd filed Critical Heraeus Quarzglas
Application granted granted Critical
Publication of ATE261406T1 publication Critical patent/ATE261406T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/50—Doped silica-based glasses containing metals containing alkali metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Silicon Compounds (AREA)
AT99116937T 1998-09-10 1999-08-27 Verfahren zur herstellung synthetischen kieselglases zur anwendung für arf-excimer- laserlithographie ATE261406T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27247198 1998-09-10
JP1190799A JP2000143258A (ja) 1998-09-10 1999-01-20 ＡｒＦエキシマレ―ザ―リソグラフィ―用合成石英ガラスの製造方法

Publications (1)

Publication Number Publication Date
ATE261406T1 true ATE261406T1 (de) 2004-03-15

Family

ID=26347435

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99116937T ATE261406T1 (de) 1998-09-10 1999-08-27 Verfahren zur herstellung synthetischen kieselglases zur anwendung für arf-excimer- laserlithographie

Country Status (6)

Country Link
US (1) US6266978B1 (de)
EP (1) EP0985643B1 (de)
JP (1) JP2000143258A (de)
KR (1) KR100311068B1 (de)
AT (1) ATE261406T1 (de)
DE (1) DE69915420T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020042026A1 (en) * 2000-08-11 2002-04-11 Borrelli Nicholas F. Optical lithography and a method of inducing transmission in optical lithography preforms
US6915665B2 (en) 2000-10-31 2005-07-12 Corning Incorporated Method of inducing transmission in optical lithography preforms
JP2003089553A (ja) * 2001-09-13 2003-03-28 Shin Etsu Chem Co Ltd 内部マーキングされた石英ガラス、光学部材用石英ガラス基板及びマーキング方法
JP4158009B2 (ja) * 2001-12-11 2008-10-01 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラスの製造方法
US20050199484A1 (en) * 2004-02-10 2005-09-15 Franek Olstowski Ozone generator with dual dielectric barrier discharge and methods for using same
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
CN110627380A (zh) * 2019-09-16 2019-12-31 深圳市裕展精密科技有限公司 玻璃复合件、玻璃复合件的制备方法以及激光焊接设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
JP2826050B2 (ja) * 1993-10-07 1998-11-18 信越石英株式会社 シリカガラス体の加工方法
JP3674793B2 (ja) * 1995-10-31 2005-07-20 信越石英株式会社 紫外線レーザ用石英ガラス光学部材の製造方法
JP3757476B2 (ja) * 1996-08-05 2006-03-22 株式会社ニコン 石英ガラス光学部材、その製造方法、及び投影露光装置
EP0870737B1 (de) * 1997-04-08 2002-07-24 Shin-Etsu Quartz Products Co., Ltd. Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas

Also Published As

Publication number Publication date
KR20000023080A (ko) 2000-04-25
EP0985643A2 (de) 2000-03-15
DE69915420T2 (de) 2004-12-23
EP0985643A3 (de) 2000-10-25
JP2000143258A (ja) 2000-05-23
US6266978B1 (en) 2001-07-31
KR100311068B1 (ko) 2001-10-18
EP0985643B1 (de) 2004-03-10
DE69915420D1 (de) 2004-04-15

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