AU2003284574A1 - Fluoro compound and fluoropolymer - Google Patents
Fluoro compound and fluoropolymerInfo
- Publication number
- AU2003284574A1 AU2003284574A1 AU2003284574A AU2003284574A AU2003284574A1 AU 2003284574 A1 AU2003284574 A1 AU 2003284574A1 AU 2003284574 A AU2003284574 A AU 2003284574A AU 2003284574 A AU2003284574 A AU 2003284574A AU 2003284574 A1 AU2003284574 A1 AU 2003284574A1
- Authority
- AU
- Australia
- Prior art keywords
- fluoropolymer
- fluoro compound
- fluoro
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
- C07D493/10—Spiro-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F34/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring
- C08F34/02—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring in a ring containing oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003090049 | 2003-03-28 | ||
JP2003-90049 | 2003-03-28 | ||
JP2003-121735 | 2003-04-25 | ||
JP2003121735 | 2003-04-25 | ||
PCT/JP2003/014743 WO2004088422A1 (en) | 2003-03-28 | 2003-11-19 | Fluoro compound and fluoropolymer |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003284574A1 true AU2003284574A1 (en) | 2004-10-25 |
Family
ID=33134289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003284574A Abandoned AU2003284574A1 (en) | 2003-03-28 | 2003-11-19 | Fluoro compound and fluoropolymer |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4396525B2 (en) |
AU (1) | AU2003284574A1 (en) |
WO (1) | WO2004088422A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE602004022451D1 (en) * | 2003-12-03 | 2009-09-17 | Asahi Glass Co Ltd | PELLETS AND NEW FLUORED POLYMER |
CN101466744B (en) | 2006-06-12 | 2011-01-05 | 旭硝子株式会社 | Curable composition and fluorine-containing cured product |
JP5502079B2 (en) * | 2008-07-08 | 2014-05-28 | ソルヴェイ・スペシャルティ・ポリマーズ・イタリー・エッセ・ピ・ア | Method for producing fluoropolymer |
EP2143738A1 (en) * | 2008-07-08 | 2010-01-13 | Solvay Solexis S.p.A. | Method for manufacturing fluoropolymers |
JP2011049274A (en) * | 2009-08-26 | 2011-03-10 | Asahi Glass Co Ltd | Window material for solid-state imaging element package, and imaging apparatus |
DE102011088149A1 (en) | 2011-12-09 | 2013-06-13 | Evonik Industries Ag | A coated composite comprising a composite material |
JP6633992B2 (en) * | 2016-09-09 | 2020-01-22 | 株式会社豊田中央研究所 | Cycloalkyl perfluorodioxole monomer, low density ionomer, and polymer electrolyte fuel cell |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2951337B2 (en) * | 1989-04-17 | 1999-09-20 | 古河電気工業株式会社 | Pellicle |
JP2952962B2 (en) * | 1989-05-31 | 1999-09-27 | 旭硝子株式会社 | Pollution prevention equipment |
JP2502192B2 (en) * | 1990-11-29 | 1996-05-29 | 旭硝子株式会社 | Phase shift mask and manufacturing method thereof |
JP3075588B2 (en) * | 1991-05-22 | 2000-08-14 | 旭硝子株式会社 | Fluorine-containing compound and method for producing the same |
JP3004090B2 (en) * | 1991-07-03 | 2000-01-31 | 旭硝子株式会社 | Fluoropolymer and method for producing the same |
JPH0692957A (en) * | 1992-09-16 | 1994-04-05 | Asahi Glass Co Ltd | Production of fluorine-containing dioxolane compound |
JPH06128247A (en) * | 1992-10-14 | 1994-05-10 | Asahi Glass Co Ltd | Production of fluorine-containing dioxolane compound |
JPH1031119A (en) * | 1996-07-18 | 1998-02-03 | Asahi Glass Co Ltd | Core/clad type optical resin material |
JP2003514955A (en) * | 1999-11-17 | 2003-04-22 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Ultraviolet and vacuum ultraviolet permeable polymer compositions and their use |
JP2001330943A (en) * | 2000-03-15 | 2001-11-30 | Asahi Glass Co Ltd | Pellicle |
JP2001296662A (en) * | 2000-04-13 | 2001-10-26 | Asahi Glass Co Ltd | Resist composition |
ATE289082T1 (en) * | 2000-06-13 | 2005-02-15 | Asahi Glass Co Ltd | RESISTANT COMPOSITION |
JP2002303982A (en) * | 2001-04-06 | 2002-10-18 | Asahi Glass Co Ltd | Resist composition |
-
2003
- 2003-11-19 AU AU2003284574A patent/AU2003284574A1/en not_active Abandoned
- 2003-11-19 JP JP2004570191A patent/JP4396525B2/en not_active Expired - Fee Related
- 2003-11-19 WO PCT/JP2003/014743 patent/WO2004088422A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2004088422A1 (en) | 2004-10-14 |
JPWO2004088422A1 (en) | 2006-07-06 |
JP4396525B2 (en) | 2010-01-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |