AU2003284574A1 - Fluoro compound and fluoropolymer - Google Patents

Fluoro compound and fluoropolymer

Info

Publication number
AU2003284574A1
AU2003284574A1 AU2003284574A AU2003284574A AU2003284574A1 AU 2003284574 A1 AU2003284574 A1 AU 2003284574A1 AU 2003284574 A AU2003284574 A AU 2003284574A AU 2003284574 A AU2003284574 A AU 2003284574A AU 2003284574 A1 AU2003284574 A1 AU 2003284574A1
Authority
AU
Australia
Prior art keywords
fluoropolymer
fluoro compound
fluoro
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003284574A
Inventor
Takeshi Eriguchi
Ikuo Matsukura
Eisuke Murotani
Hirokazu Takagi
Hiromasa Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of AU2003284574A1 publication Critical patent/AU2003284574A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D493/00Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/02Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
    • C07D493/10Spiro-condensed systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F34/00Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring
    • C08F34/02Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring in a ring containing oxygen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0046Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU2003284574A 2003-03-28 2003-11-19 Fluoro compound and fluoropolymer Abandoned AU2003284574A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2003090049 2003-03-28
JP2003-90049 2003-03-28
JP2003-121735 2003-04-25
JP2003121735 2003-04-25
PCT/JP2003/014743 WO2004088422A1 (en) 2003-03-28 2003-11-19 Fluoro compound and fluoropolymer

Publications (1)

Publication Number Publication Date
AU2003284574A1 true AU2003284574A1 (en) 2004-10-25

Family

ID=33134289

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003284574A Abandoned AU2003284574A1 (en) 2003-03-28 2003-11-19 Fluoro compound and fluoropolymer

Country Status (3)

Country Link
JP (1) JP4396525B2 (en)
AU (1) AU2003284574A1 (en)
WO (1) WO2004088422A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602004022451D1 (en) * 2003-12-03 2009-09-17 Asahi Glass Co Ltd PELLETS AND NEW FLUORED POLYMER
CN101466744B (en) 2006-06-12 2011-01-05 旭硝子株式会社 Curable composition and fluorine-containing cured product
JP5502079B2 (en) * 2008-07-08 2014-05-28 ソルヴェイ・スペシャルティ・ポリマーズ・イタリー・エッセ・ピ・ア Method for producing fluoropolymer
EP2143738A1 (en) * 2008-07-08 2010-01-13 Solvay Solexis S.p.A. Method for manufacturing fluoropolymers
JP2011049274A (en) * 2009-08-26 2011-03-10 Asahi Glass Co Ltd Window material for solid-state imaging element package, and imaging apparatus
DE102011088149A1 (en) 2011-12-09 2013-06-13 Evonik Industries Ag A coated composite comprising a composite material
JP6633992B2 (en) * 2016-09-09 2020-01-22 株式会社豊田中央研究所 Cycloalkyl perfluorodioxole monomer, low density ionomer, and polymer electrolyte fuel cell

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2951337B2 (en) * 1989-04-17 1999-09-20 古河電気工業株式会社 Pellicle
JP2952962B2 (en) * 1989-05-31 1999-09-27 旭硝子株式会社 Pollution prevention equipment
JP2502192B2 (en) * 1990-11-29 1996-05-29 旭硝子株式会社 Phase shift mask and manufacturing method thereof
JP3075588B2 (en) * 1991-05-22 2000-08-14 旭硝子株式会社 Fluorine-containing compound and method for producing the same
JP3004090B2 (en) * 1991-07-03 2000-01-31 旭硝子株式会社 Fluoropolymer and method for producing the same
JPH0692957A (en) * 1992-09-16 1994-04-05 Asahi Glass Co Ltd Production of fluorine-containing dioxolane compound
JPH06128247A (en) * 1992-10-14 1994-05-10 Asahi Glass Co Ltd Production of fluorine-containing dioxolane compound
JPH1031119A (en) * 1996-07-18 1998-02-03 Asahi Glass Co Ltd Core/clad type optical resin material
JP2003514955A (en) * 1999-11-17 2003-04-22 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー Ultraviolet and vacuum ultraviolet permeable polymer compositions and their use
JP2001330943A (en) * 2000-03-15 2001-11-30 Asahi Glass Co Ltd Pellicle
JP2001296662A (en) * 2000-04-13 2001-10-26 Asahi Glass Co Ltd Resist composition
ATE289082T1 (en) * 2000-06-13 2005-02-15 Asahi Glass Co Ltd RESISTANT COMPOSITION
JP2002303982A (en) * 2001-04-06 2002-10-18 Asahi Glass Co Ltd Resist composition

Also Published As

Publication number Publication date
WO2004088422A1 (en) 2004-10-14
JPWO2004088422A1 (en) 2006-07-06
JP4396525B2 (en) 2010-01-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase