DE69118101D1 - Optisches Bauteil aus hochreinem und transparentem, synthetischem Quarzglas und Verfahren zu seiner Herstellung und sein Rohling - Google Patents
Optisches Bauteil aus hochreinem und transparentem, synthetischem Quarzglas und Verfahren zu seiner Herstellung und sein RohlingInfo
- Publication number
- DE69118101D1 DE69118101D1 DE69118101T DE69118101T DE69118101D1 DE 69118101 D1 DE69118101 D1 DE 69118101D1 DE 69118101 T DE69118101 T DE 69118101T DE 69118101 T DE69118101 T DE 69118101T DE 69118101 D1 DE69118101 D1 DE 69118101D1
- Authority
- DE
- Germany
- Prior art keywords
- blank
- purity
- transparent
- production
- optical component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/10—Melting processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S501/00—Compositions: ceramic
- Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
- Y10S501/905—Ultraviolet transmitting or absorbing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Geochemistry & Mineralogy (AREA)
- Thermal Sciences (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29248390A JPH0825764B2 (ja) | 1990-10-30 | 1990-10-30 | 水素分子含有シリカガラス体の製造方法 |
JP29248490A JPH0825765B2 (ja) | 1990-10-30 | 1990-10-30 | 耐レーザガラスの製造方法 |
JP32173690 | 1990-11-26 | ||
JP2413881A JPH08711B2 (ja) | 1990-12-26 | 1990-12-26 | 光学ガラス |
JP2413885A JPH08712B2 (ja) | 1990-12-26 | 1990-12-26 | 光学ガラス |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69118101D1 true DE69118101D1 (de) | 1996-04-25 |
DE69118101T2 DE69118101T2 (de) | 1996-09-19 |
Family
ID=27530825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69118101T Expired - Lifetime DE69118101T2 (de) | 1990-10-30 | 1991-10-29 | Optisches Bauteil aus hochreinem und transparentem, synthetischem Quarzglas und Verfahren zu seiner Herstellung und sein Rohling |
Country Status (4)
Country | Link |
---|---|
US (1) | US5410428A (de) |
EP (1) | EP0483752B1 (de) |
AT (1) | ATE135669T1 (de) |
DE (1) | DE69118101T2 (de) |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0165695B1 (ko) * | 1991-06-29 | 1998-12-15 | 아이하라 테루히코 | 엑시머레이저용 합성석영유리 광학부재 및 그의 제조방법 |
DE4206182C2 (de) * | 1992-02-28 | 1996-02-08 | Heraeus Quarzglas | Bauteil für die Übertragung von energiereichem Licht und Verwendung des Bauteils |
US5699183A (en) * | 1993-02-10 | 1997-12-16 | Nikon Corporation | Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
JP2859095B2 (ja) * | 1993-07-30 | 1999-02-17 | 信越化学工業株式会社 | エキシマレーザリソグラフィー用合成石英マスク基板 |
JP3578357B2 (ja) * | 1994-04-28 | 2004-10-20 | 信越石英株式会社 | 耐熱性合成石英ガラスの製造方法 |
DE4420024C2 (de) * | 1994-06-09 | 1996-05-30 | Heraeus Quarzglas | Halbzeug in Form eines Verbundkörpers für ein elektronisches oder opto-elektronisches Halbleiterbauelement |
JP3369730B2 (ja) * | 1994-06-16 | 2003-01-20 | 株式会社ニコン | 光リソグラフィー用光学部材の評価方法 |
KR100298167B1 (ko) * | 1994-07-07 | 2001-10-24 | 오노 시게오 | 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재 |
US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
US6442973B1 (en) | 1995-01-06 | 2002-09-03 | Nikon Corporation | Synthetic silica glass and its manufacturing method |
US6518210B1 (en) * | 1995-01-06 | 2003-02-11 | Nikon Corporation | Exposure apparatus including silica glass and method for producing silica glass |
US6087283A (en) * | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
JPH11209134A (ja) * | 1998-01-23 | 1999-08-03 | Nikon Corp | 合成石英ガラスおよびその製造方法 |
US5616159A (en) * | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
DE69601749T3 (de) * | 1995-06-07 | 2004-04-29 | Corning Inc. | Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten |
DE69635662T2 (de) * | 1995-09-12 | 2006-08-10 | Corning Inc. | Verfahren und Ofen zur Herstellung von Quarzglas mit reduziertem Gehalt an Schlieren |
JP3850880B2 (ja) * | 1995-09-12 | 2006-11-29 | コーニング インコーポレイテッド | 溶融シリカガラス製造用閉じ込め容器 |
WO1997010184A1 (en) * | 1995-09-12 | 1997-03-20 | Corning Incorporated | Boule oscillation patterns for producing fused silica glass |
JP3674793B2 (ja) * | 1995-10-31 | 2005-07-20 | 信越石英株式会社 | 紫外線レーザ用石英ガラス光学部材の製造方法 |
JP3472024B2 (ja) * | 1996-02-26 | 2003-12-02 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US6619073B2 (en) | 1996-03-05 | 2003-09-16 | Corning Incorporated | Method of increasing the initial transmittance of optical glass |
WO1998007053A2 (en) * | 1996-07-26 | 1998-02-19 | Corning Incorporated | Fused silica having high resistance to optical damage |
JP2001500631A (ja) | 1996-08-29 | 2001-01-16 | コーニング インコーポレイテッド | 高エネルギ照射下で低い収縮性を呈する石英 |
US6309991B1 (en) | 1996-08-29 | 2001-10-30 | Corning Incorporated | Silica with low compaction under high energy irradiation |
US6423656B1 (en) * | 1997-03-07 | 2002-07-23 | Schott Ml Gmbh | Synthetic quartz glass preform |
US6483639B2 (en) | 1997-03-25 | 2002-11-19 | Heraeus Quarzglas Gmbh | Optical system for integrated circuit fabrication |
EP0917523B1 (de) * | 1997-05-20 | 2003-07-30 | Heraeus Quarzglas GmbH & Co. KG | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
KR100554091B1 (ko) * | 1997-12-08 | 2006-05-16 | 가부시키가이샤 니콘 | 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재 |
US8402786B2 (en) | 1998-01-30 | 2013-03-26 | Asahi Glass Company, Limited | Synthetic silica glass optical component and process for its production |
DE19850736C2 (de) * | 1998-11-04 | 2003-04-17 | Heraeus Tenevo Ag | Kernglas für eine Vorform für eine optische Faser, unter Verwendung des Kernglases hergestellte Vorform, sowie Verfahren zur Herstellung des Kernglases einer Vorform für eine optische Faser |
US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
US6782716B2 (en) * | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6682859B2 (en) * | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
US6319634B1 (en) * | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
TW581747B (en) * | 1999-02-16 | 2004-04-01 | Nikon Corp | Synthetic quartz glass optical member for ultraviolet light |
JP4051474B2 (ja) * | 1999-04-01 | 2008-02-27 | 株式会社ニコン | 紫外用光学部材の透過率測定方法 |
US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
US6710930B2 (en) * | 1999-12-01 | 2004-03-23 | Nikon Corporation | Illumination optical system and method of making exposure apparatus |
US6466365B1 (en) * | 2000-04-07 | 2002-10-15 | Corning Incorporated | Film coated optical lithography elements and method of making |
EP1187170B1 (de) * | 2000-08-29 | 2007-05-09 | Heraeus Quarzglas GmbH & Co. KG | Plasmafeste Quartzglas-Haltevorrichtung |
EP1330679A4 (de) * | 2000-10-03 | 2006-09-06 | Corning Inc | Photolithographieverfahren und -systeme |
US6705125B2 (en) | 2000-10-23 | 2004-03-16 | The Regents Of The University Of California | Reduction of damage initiation density in fused silica optics via UV laser conditioning |
US6915665B2 (en) * | 2000-10-31 | 2005-07-12 | Corning Incorporated | Method of inducing transmission in optical lithography preforms |
DE60233768D1 (de) * | 2001-02-15 | 2009-11-05 | Heraeus Quarzglas | Verfahren zur Herstellung von synthetischen Quarzglaselementen für Excimerlaser und dazu hergestellte synthetische Quarzglaselemente |
JP2003051609A (ja) * | 2001-08-03 | 2003-02-21 | Tokyo Gas Co Ltd | ダイヤモンド高輝度紫外線発光素子 |
EP1288169A1 (de) | 2001-08-30 | 2003-03-05 | Schott Glas | Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper |
WO2003080525A1 (fr) * | 2002-03-25 | 2003-10-02 | Nikon Corporation | Element de verre de quartz synthetique et procede de production de celui-ci |
JP4107905B2 (ja) | 2002-07-31 | 2008-06-25 | 信越石英株式会社 | Yagレーザー高調波用合成石英ガラス光学材料 |
US6859311B2 (en) * | 2003-03-24 | 2005-02-22 | Memphis Eye & Cataract Associates Ambulatory Surgery Center | Digital micromirror device having a window transparent to ultraviolet (UV) light |
US6992753B2 (en) | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
US7506522B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High refractive index homogeneity fused silica glass and method of making same |
US7506521B2 (en) | 2004-12-29 | 2009-03-24 | Corning Incorporated | High transmission synthetic silica glass and method of making same |
US7589039B2 (en) | 2004-12-29 | 2009-09-15 | Corning Incorporated | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
WO2006074083A1 (en) | 2004-12-30 | 2006-07-13 | Corning Incorporated | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
JP4487783B2 (ja) * | 2005-01-25 | 2010-06-23 | 旭硝子株式会社 | TiO2を含有するシリカガラスの製造方法およびTiO2を含有するシリカガラスを用いたEUVリソグラフィ用光学部材 |
US7928026B2 (en) | 2005-06-30 | 2011-04-19 | Corning Incorporated | Synthetic silica material with low fluence-dependent-transmission and method of making the same |
GB0605461D0 (en) * | 2006-03-17 | 2006-04-26 | Saint Gobain Quartz Plc | Manufacture of large articles in synthetic vitreous silica |
US11402572B2 (en) * | 2009-03-04 | 2022-08-02 | Nkt Photonics A/S | Microstructured hollow core optical fiber using low chlorine concentration |
US8313662B2 (en) * | 2009-10-01 | 2012-11-20 | Lawrence Livermore National Security, Llc | Methods for globally treating silica optics to reduce optical damage |
DE102009055119B4 (de) * | 2009-12-22 | 2017-07-13 | Carl Zeiss Smt Gmbh | Spiegelelement für die EUV-Lithographie und Herstellungsverfahren dafür |
JP5500686B2 (ja) * | 2010-11-30 | 2014-05-21 | 株式会社Sumco | シリカガラスルツボ |
US8588261B2 (en) * | 2011-03-15 | 2013-11-19 | John A. Caird | Method and system for suppression of stimulated Raman scattering in laser materials |
US8937275B2 (en) * | 2012-10-12 | 2015-01-20 | Thermo Fisher Scientific Inc. | Method and apparatus to monitor gain of a proportional counter including correcting the counting threshold of a pulse height spectrum |
US9505649B2 (en) | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
JP6536036B2 (ja) * | 2015-01-14 | 2019-07-03 | 住友電気工業株式会社 | 光ファイバ |
NL2027828B1 (en) * | 2021-02-09 | 2022-09-09 | Corning Inc | Low inclusion tio2-sio2 glass obtained by hot isostatic pressing |
WO2022173592A1 (en) * | 2021-02-09 | 2022-08-18 | Corning Incorporated | Low inclusion tio2-sio2 glass obtained by hot isostatic pressing |
CN113443820A (zh) * | 2021-07-03 | 2021-09-28 | 四川神光石英科技有限公司 | 用于石英玻璃渗氢工艺的料架、反应釜及装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01138145A (ja) * | 1987-08-20 | 1989-05-31 | Shin Etsu Chem Co Ltd | 合成石英ガラス部材の製造方法 |
JPH01167258A (ja) * | 1987-12-23 | 1989-06-30 | Shinetsu Sekiei Kk | レーザ光学系素体 |
JP2737191B2 (ja) * | 1987-12-28 | 1998-04-08 | 東ソー株式会社 | 均質な石英ガラス塊の製造方法 |
JPH0825773B2 (ja) * | 1988-02-02 | 1996-03-13 | 信越石英株式会社 | レーザー光学系の製造素体 |
JP2660531B2 (ja) * | 1988-02-08 | 1997-10-08 | 日本石英硝子株式会社 | 合成石英ガラスの改質方法 |
JPH01212247A (ja) * | 1988-02-19 | 1989-08-25 | Shinetsu Sekiei Kk | レーザ光学系母材の製造方法 |
JPH0755845B2 (ja) * | 1988-09-03 | 1995-06-14 | 信越石英株式会社 | レーザ光用透過体 |
JPH0791084B2 (ja) * | 1988-09-14 | 1995-10-04 | 信越化学工業株式会社 | 耐紫外線用合成石英ガラスおよびその製造方法 |
JPH08709B2 (ja) * | 1988-10-12 | 1996-01-10 | 信越石英株式会社 | 光透過体用石英ガラス母材とその製造方法、及び前記母材を用いて形成した光透過体 |
US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
JPH02243535A (ja) * | 1989-03-16 | 1990-09-27 | Shinetsu Sekiei Kk | 紫外光用ガラス母材の製造方法 |
DE4008383A1 (de) * | 1989-03-16 | 1990-09-20 | Tosoh Corp | Achromat fuer ultraviolettstrahlen |
DE69015453T3 (de) * | 1989-06-09 | 2001-10-11 | Heraeus Quarzglas | Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung. |
-
1991
- 1991-10-23 US US07/779,737 patent/US5410428A/en not_active Expired - Lifetime
- 1991-10-29 DE DE69118101T patent/DE69118101T2/de not_active Expired - Lifetime
- 1991-10-29 AT AT91118411T patent/ATE135669T1/de not_active IP Right Cessation
- 1991-10-29 EP EP91118411A patent/EP0483752B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0483752B1 (de) | 1996-03-20 |
ATE135669T1 (de) | 1996-04-15 |
US5410428A (en) | 1995-04-25 |
DE69118101T2 (de) | 1996-09-19 |
EP0483752A3 (en) | 1993-04-28 |
EP0483752A2 (de) | 1992-05-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69118101D1 (de) | Optisches Bauteil aus hochreinem und transparentem, synthetischem Quarzglas und Verfahren zu seiner Herstellung und sein Rohling | |
ATE354548T1 (de) | Optischer werkstoff aus quarzglas für excimer laser und excimer lampe, und verfahren zu dessen herstellung | |
ATE116448T1 (de) | Optische teile und rohlinge aus synthetischem siliziumdioxidglas und verfahren zu ihrer herstellung. | |
EP0835848A3 (de) | Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat | |
DE69022345D1 (de) | Verfahren zur Entwicklung von Chlordioxyd und Zusammensetzungen für die Desinfektion. | |
DE69123659T2 (de) | Verfahren zur Herstellung von hochreinen, porenfreien Quarzglaskörpern | |
DE69613268T3 (de) | Verfahren zur Herstellung von hochreinem Quarzglas mit hohem Widerstand gegen optische Beschädigung, und hochreines Quarzglas | |
DE3861924D1 (de) | Transparentes ir-absorbierendes glas und verfahren zu dessen herstellung. | |
DE60105978D1 (de) | Lichtverstärkendes glass und verfahren zur herstellung desselben | |
DE69331048D1 (de) | Verfahren zur Herstellung von Cis-Oxalato (Trans-L-1,2-Cyclohexandiamin) Pt Komplex mit hoher optischer Reinheit | |
DE69502689T2 (de) | Verfahren zur Herstellung von Polarisierendem Glas | |
DE69408071T2 (de) | Hochreines opakes Quarzglas, Verfahren zu dessen Herstellung und dessen Verwendung | |
BR9812058A (pt) | Composição de moldagem reticulável, lente oftálmica, processos para moldar uma composição de moldagem reticulável, e, para fabricar uma lente oftálmica | |
DE69410704D1 (de) | Verfahren zur Herstellung von Glasformen für monomode, optische Fasern | |
ATE372306T1 (de) | Quarzglaselemente für excimer-laser und verfahren zu deren herstellung | |
ATE78239T1 (de) | Verfahren zur herstellung von zeolithen. | |
EP1088795A4 (de) | Synthetisches quarzglas für optische elemente, herstellungsverfahren und verfahren zur verwendung desselben | |
SE9504327D0 (sv) | Method of treating a catalyst | |
ATE246154T1 (de) | Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben | |
ATE447201T1 (de) | Dauerhaftes optisches system für einen projektionsbelichtingsapparat und verfahren zu dessen herstellung | |
DE69323980D1 (de) | Verfahren zur Herstellung von Vorformen für optische Wellenleiter | |
ATE315539T1 (de) | Vorform für eine optische faser, verfahren zur herstellung eines kernglases einer vorform für eine optische faser und einer optischen faser sowie verwendung von synthetischem quarzglases | |
DE69915420D1 (de) | Verfahren zur Herstellung synthetischen Kieselglases zur Anwendung für ArF-Excimer-Laserlithographie | |
DE69400947D1 (de) | Optischer Faserverstärker aus dotiertem Fluoridglas und Verfahren zu seiner Herstellung | |
ATE128457T1 (de) | Optisch aktive n-aplha-fluoracryloylaminosäure- derivate, ihre herstellung, die daraus hergestellten optisch aktiven polymeren und deren verwendung zur spaltung von racematen. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: HERAEUS QUARZGLAS GMBH & CO. KG, 63450 HANAU, DE S |