DE60233768D1 - Verfahren zur Herstellung von synthetischen Quarzglaselementen für Excimerlaser und dazu hergestellte synthetische Quarzglaselemente - Google Patents

Verfahren zur Herstellung von synthetischen Quarzglaselementen für Excimerlaser und dazu hergestellte synthetische Quarzglaselemente

Info

Publication number
DE60233768D1
DE60233768D1 DE60233768T DE60233768T DE60233768D1 DE 60233768 D1 DE60233768 D1 DE 60233768D1 DE 60233768 T DE60233768 T DE 60233768T DE 60233768 T DE60233768 T DE 60233768T DE 60233768 D1 DE60233768 D1 DE 60233768D1
Authority
DE
Germany
Prior art keywords
quartz glass
synthetic quartz
excimer lasers
glass elements
hydrogen molecules
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60233768T
Other languages
English (en)
Inventor
Hiroyuki Nishimura
Toru Yokota
Akira Fujinoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18901151&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60233768(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Application granted granted Critical
Publication of DE60233768D1 publication Critical patent/DE60233768D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Lasers (AREA)
DE60233768T 2001-02-15 2002-02-13 Verfahren zur Herstellung von synthetischen Quarzglaselementen für Excimerlaser und dazu hergestellte synthetische Quarzglaselemente Expired - Lifetime DE60233768D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001038112 2001-02-15

Publications (1)

Publication Number Publication Date
DE60233768D1 true DE60233768D1 (de) 2009-11-05

Family

ID=18901151

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60233768T Expired - Lifetime DE60233768D1 (de) 2001-02-15 2002-02-13 Verfahren zur Herstellung von synthetischen Quarzglaselementen für Excimerlaser und dazu hergestellte synthetische Quarzglaselemente

Country Status (4)

Country Link
US (1) US6810687B2 (de)
EP (1) EP1233005B2 (de)
AT (1) ATE443688T1 (de)
DE (1) DE60233768D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1288169A1 (de) * 2001-08-30 2003-03-05 Schott Glas Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper
AU2003221105A1 (en) * 2002-03-25 2003-10-08 Nikon Corporation Synthetic quartz glass member and process for producing the same
DE102006043368B4 (de) * 2005-09-16 2019-01-10 Corning Inc. Synthetisches Kieselsäureglas und Verfahren zur Herstellung desselben
JP2008063181A (ja) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法
US8261578B2 (en) * 2007-10-31 2012-09-11 Corning Incorporated Hydrogen loading of near net shape optics
DE102013215292A1 (de) * 2013-08-02 2015-02-05 Carl Zeiss Smt Gmbh Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv
EP3205630B1 (de) 2016-02-12 2020-01-01 Heraeus Quarzglas GmbH & Co. KG Diffusormaterial aus synthetisch erzeugtem quarzglas sowie verfahren zur herstellung eines vollständig oder teilweise daraus bestehenden formkörpers
JP6927062B2 (ja) * 2018-01-23 2021-08-25 信越化学工業株式会社 合成石英ガラス基板およびその製造方法
CN111574067B (zh) * 2020-05-18 2021-07-27 中国建筑材料科学研究总院有限公司 具有光吸收层的光学玻璃及其制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653593B2 (ja) * 1989-06-09 1994-07-20 信越石英株式会社 合成シリカガラス光学体及びその製造方法
JPH0627014B2 (ja) 1989-06-19 1994-04-13 信越石英株式会社 紫外線レーザ用合成シリカガラス光学体及びその製造方法
US5410428A (en) * 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
JP2971686B2 (ja) 1992-11-30 1999-11-08 信越石英株式会社 耐紫外線レーザー用光学部材の製造方法
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
US6094941A (en) * 1995-06-06 2000-08-01 Shin-Etsu Quartz Products Co., Ltd. Process for manufacturing optical member for excimer laser
US6619073B2 (en) * 1996-03-05 2003-09-16 Corning Incorporated Method of increasing the initial transmittance of optical glass
JP2980094B2 (ja) * 1997-05-16 1999-11-22 住友電気工業株式会社 石英ガラス物品及びその製造方法
KR100554091B1 (ko) * 1997-12-08 2006-05-16 가부시키가이샤 니콘 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재
JP4453936B2 (ja) 1998-07-15 2010-04-21 信越石英株式会社 エキシマレーザー用光学部材の製造方法
US6578382B2 (en) * 2000-03-29 2003-06-17 Heraeus Quarzglas Gmbh & Co. Kg Synthetic quartz glass for optical use, heat treatment method and heat treatment apparatus for the same

Also Published As

Publication number Publication date
ATE443688T1 (de) 2009-10-15
EP1233005A1 (de) 2002-08-21
EP1233005B1 (de) 2009-09-23
US20030027705A1 (en) 2003-02-06
EP1233005B2 (de) 2013-01-16
US6810687B2 (en) 2004-11-02

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