ATE320018T1 - Lithographieobjektiv mit einer ersten linsengruppe, bestehend ausschliesslich aus linsen positiver brechkraft und verfahren zur herstellung mikrostrukturierter bauteile mit einem solchen objektiv - Google Patents

Lithographieobjektiv mit einer ersten linsengruppe, bestehend ausschliesslich aus linsen positiver brechkraft und verfahren zur herstellung mikrostrukturierter bauteile mit einem solchen objektiv

Info

Publication number
ATE320018T1
ATE320018T1 AT01128878T AT01128878T ATE320018T1 AT E320018 T1 ATE320018 T1 AT E320018T1 AT 01128878 T AT01128878 T AT 01128878T AT 01128878 T AT01128878 T AT 01128878T AT E320018 T1 ATE320018 T1 AT E320018T1
Authority
AT
Austria
Prior art keywords
lens
refractive power
positive refractive
lenses
lens group
Prior art date
Application number
AT01128878T
Other languages
German (de)
English (en)
Inventor
Karl-Heinz Schuster
Alexander Epple
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Application granted granted Critical
Publication of ATE320018T1 publication Critical patent/ATE320018T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/0095—Relay lenses or rod lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/12—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having three components only
    • G02B9/14—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having three components only arranged + - +

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
AT01128878T 2000-12-22 2001-12-05 Lithographieobjektiv mit einer ersten linsengruppe, bestehend ausschliesslich aus linsen positiver brechkraft und verfahren zur herstellung mikrostrukturierter bauteile mit einem solchen objektiv ATE320018T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10064685A DE10064685A1 (de) 2000-12-22 2000-12-22 Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft

Publications (1)

Publication Number Publication Date
ATE320018T1 true ATE320018T1 (de) 2006-03-15

Family

ID=7668748

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01128878T ATE320018T1 (de) 2000-12-22 2001-12-05 Lithographieobjektiv mit einer ersten linsengruppe, bestehend ausschliesslich aus linsen positiver brechkraft und verfahren zur herstellung mikrostrukturierter bauteile mit einem solchen objektiv

Country Status (5)

Country Link
US (3) US6788387B2 (enExample)
EP (1) EP1217412B1 (enExample)
JP (1) JP2002244036A (enExample)
AT (1) ATE320018T1 (enExample)
DE (2) DE10064685A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2009104184A (ja) * 2002-07-04 2009-05-14 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
AU2003304557A1 (en) 2003-10-22 2005-06-08 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
EP1690139B1 (en) * 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
CN101107570B (zh) * 2004-12-30 2011-02-09 卡尔蔡司Smt股份公司 投影光学系统
DE102005027099A1 (de) * 2005-06-10 2006-12-14 Carl Zeiss Smt Ag Immersionslithographieobjektiv
BRPI1007853B1 (pt) * 2009-02-20 2019-11-12 Thales Canada Inc sistema de criação de imagem ótica de campo de visão duplo com lente bifocal
TWI390244B (zh) * 2009-06-12 2013-03-21 Largan Precision Co Ltd 攝影鏡頭
CN101975983B (zh) * 2010-09-13 2012-05-30 北京理工大学 高分辨率非球面光刻物镜

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GB1478115A (en) * 1974-02-15 1977-06-29 Pilkington Perkin Elmer Ltd Infra-red lenses
EP0332201B1 (en) 1988-03-11 1994-06-29 Matsushita Electric Industrial Co., Ltd. Optical projection system
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3819048B2 (ja) * 1995-03-15 2006-09-06 株式会社ニコン 投影光学系及びそれを備えた露光装置並びに露光方法
JP3750123B2 (ja) * 1996-04-25 2006-03-01 株式会社ニコン 投影光学系
US5852490A (en) * 1996-09-30 1998-12-22 Nikon Corporation Projection exposure method and apparatus
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
JP3823436B2 (ja) * 1997-04-03 2006-09-20 株式会社ニコン 投影光学系
JPH116957A (ja) * 1997-04-25 1999-01-12 Nikon Corp 投影光学系および投影露光装置並びに投影露光方法
US5990926A (en) * 1997-07-16 1999-11-23 Nikon Corporation Projection lens systems for excimer laser exposure lithography
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) * 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
US5986824A (en) * 1998-06-04 1999-11-16 Nikon Corporation Large NA projection lens system with aplanatic lens element for excimer laser lithography
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
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DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
EP1006388A3 (de) 1998-11-30 2002-05-02 Carl Zeiss Reduktions-Projektionsobjektiv der Mikrolithographie
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
JP2000215430A (ja) * 1999-01-26 2000-08-04 Tdk Corp 磁気ヘッドおよびその製造方法並びに磁気ディスク装置
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
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EP1134606B1 (de) * 2000-01-18 2002-04-10 Isco-Optic Gmbh Projektionsobjektiv
DE10119861A1 (de) * 2000-05-04 2001-11-08 Zeiss Carl Projektionsobjektiv, insbesondere für die Mikrolithographie
JP2002083766A (ja) * 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP4624535B2 (ja) * 2000-09-28 2011-02-02 富士フイルム株式会社 広角投映レンズおよびこれを用いた投写型画像表示装置
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323653A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
JP2002323652A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2004012825A (ja) * 2002-06-07 2004-01-15 Fuji Photo Optical Co Ltd 投影光学系およびそれを用いた投影露光装置

Also Published As

Publication number Publication date
EP1217412A2 (de) 2002-06-26
DE50109144D1 (de) 2006-05-04
EP1217412B1 (de) 2006-03-08
US20060176573A1 (en) 2006-08-10
EP1217412A3 (de) 2004-01-28
DE10064685A1 (de) 2002-07-04
JP2002244036A (ja) 2002-08-28
US6788387B2 (en) 2004-09-07
US7023627B2 (en) 2006-04-04
US20040228001A1 (en) 2004-11-18
US20020122164A1 (en) 2002-09-05
US7289279B2 (en) 2007-10-30

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