JP2005257740A5 - - Google Patents

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Publication number
JP2005257740A5
JP2005257740A5 JP2004065375A JP2004065375A JP2005257740A5 JP 2005257740 A5 JP2005257740 A5 JP 2005257740A5 JP 2004065375 A JP2004065375 A JP 2004065375A JP 2004065375 A JP2004065375 A JP 2004065375A JP 2005257740 A5 JP2005257740 A5 JP 2005257740A5
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JP
Japan
Prior art keywords
exposure
optical system
projection optical
mask
partial
Prior art date
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Withdrawn
Application number
JP2004065375A
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English (en)
Japanese (ja)
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JP2005257740A (ja
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Publication date
Application filed filed Critical
Priority to JP2004065375A priority Critical patent/JP2005257740A/ja
Priority claimed from JP2004065375A external-priority patent/JP2005257740A/ja
Publication of JP2005257740A publication Critical patent/JP2005257740A/ja
Publication of JP2005257740A5 publication Critical patent/JP2005257740A5/ja
Withdrawn legal-status Critical Current

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JP2004065375A 2004-03-09 2004-03-09 投影光学系、露光装置、および露光方法 Withdrawn JP2005257740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004065375A JP2005257740A (ja) 2004-03-09 2004-03-09 投影光学系、露光装置、および露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004065375A JP2005257740A (ja) 2004-03-09 2004-03-09 投影光学系、露光装置、および露光方法

Publications (2)

Publication Number Publication Date
JP2005257740A JP2005257740A (ja) 2005-09-22
JP2005257740A5 true JP2005257740A5 (enExample) 2008-02-28

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ID=35083560

Family Applications (1)

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JP2004065375A Withdrawn JP2005257740A (ja) 2004-03-09 2004-03-09 投影光学系、露光装置、および露光方法

Country Status (1)

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JP (1) JP2005257740A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2157480B1 (en) 2003-04-09 2015-05-27 Nikon Corporation Exposure method and apparatus, and device manufacturing method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
TWI494972B (zh) 2004-02-06 2015-08-01 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP3232270A3 (en) 2005-05-12 2017-12-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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