JP2005257740A - 投影光学系、露光装置、および露光方法 - Google Patents

投影光学系、露光装置、および露光方法 Download PDF

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Publication number
JP2005257740A
JP2005257740A JP2004065375A JP2004065375A JP2005257740A JP 2005257740 A JP2005257740 A JP 2005257740A JP 2004065375 A JP2004065375 A JP 2004065375A JP 2004065375 A JP2004065375 A JP 2004065375A JP 2005257740 A JP2005257740 A JP 2005257740A
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Japan
Prior art keywords
exposure
optical system
projection optical
partial
mask
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Withdrawn
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JP2004065375A
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English (en)
Japanese (ja)
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JP2005257740A5 (enExample
Inventor
Marie Tanaka
麻利江 田中
Hironori Ikezawa
弘範 池沢
Yasuhiro Omura
泰弘 大村
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Nikon Corp
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Nikon Corp
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Publication of JP2005257740A5 publication Critical patent/JP2005257740A5/ja
Withdrawn legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004065375A 2004-03-09 2004-03-09 投影光学系、露光装置、および露光方法 Withdrawn JP2005257740A (ja)

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JP2004065375A JP2005257740A (ja) 2004-03-09 2004-03-09 投影光学系、露光装置、および露光方法

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JP2004065375A JP2005257740A (ja) 2004-03-09 2004-03-09 投影光学系、露光装置、および露光方法

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JP2005257740A true JP2005257740A (ja) 2005-09-22
JP2005257740A5 JP2005257740A5 (enExample) 2008-02-28

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7869122B2 (en) 2004-01-14 2011-01-11 Carl Zeiss Smt Ag Catadioptric projection objective
US8199400B2 (en) 2004-01-14 2012-06-12 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495981B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US7869122B2 (en) 2004-01-14 2011-01-11 Carl Zeiss Smt Ag Catadioptric projection objective
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes
US8730572B2 (en) 2004-01-14 2014-05-20 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8804234B2 (en) 2004-01-14 2014-08-12 Carl Zeiss Smt Gmbh Catadioptric projection objective including an aspherized plate
US8355201B2 (en) 2004-01-14 2013-01-15 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8339701B2 (en) 2004-01-14 2012-12-25 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8208199B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8289619B2 (en) 2004-01-14 2012-10-16 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8416490B2 (en) 2004-01-14 2013-04-09 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8199400B2 (en) 2004-01-14 2012-06-12 Carl Zeiss Smt Gmbh Catadioptric projection objective
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9726979B2 (en) 2004-05-17 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9019596B2 (en) 2004-05-17 2015-04-28 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US10495981B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10488759B2 (en) 2005-05-03 2019-11-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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