JP2005257740A5

JP2005257740A5 -

Info

Publication number: JP2005257740A5
Application number: JP2004065375A
Authority: JP
Filing date: 2004-03-09
Publication date: 2008-02-28

Claims

In a projection optical system for forming a reduced image of the first surface on the second surface,
When the maximum object height on the first surface is φo, and the maximum effective diameter value of all the effective diameters of the lenses in the projection optical system is φmax,
6.6 <φmax / φo <12
A projection optical system characterized by satisfying the following conditions.

The projection optical system according to claim 1, wherein the projection optical system has a projection magnification of about | 1/5 | to about | 1/4 |.

When the refractive index of the atmosphere in the optical path of the projection optical system is 1, the optical path between the projection optical system and the second surface is filled with a medium having a refractive index greater than 1.1. The projection optical system according to claim 1, wherein a reduced image of the first surface is formed on the second surface.

Instead of the condition 6.6 <φmax / φo <12,
8 <φmax / φo <11
The projection optical system according to claim 1, wherein the following condition is satisfied .

An illumination process for illuminating the mask set on the first surface, and an image of a pattern formed on the mask via the projection optical system according to any one of claims 1 to 4 on the second surface An exposure method comprising: an exposure step of projecting and exposing on a set photosensitive substrate .

In the exposure step, projection exposure is performed on one shot area including two partial exposure areas,
The exposure step includes at least two partial exposure steps of projecting and exposing to the partial exposure region,
6. The exposure method according to claim 5, wherein in the partial exposure step, scanning exposure is performed on the partial exposure region while moving the mask and the photosensitive substrate relative to the projection optical system .

The exposure step includes a first partial exposure step of performing scanning exposure on one partial exposure region while relatively moving the mask and the photosensitive substrate in a predetermined direction with respect to the projection optical system; and the projection And a second partial exposure step of performing scanning exposure on the other partial exposure region while relatively moving the mask and the photosensitive substrate in the direction opposite to the predetermined direction with respect to the optical system. The exposure method according to claim 6 .

The exposure step includes a first partial exposure step of performing scanning exposure on one partial exposure region while relatively moving the mask and the photosensitive substrate in a predetermined direction with respect to the projection optical system; and the projection And a second partial exposure step of performing scanning exposure on the other partial exposure region while moving the mask and the photosensitive substrate relative to the optical system in the predetermined direction. 6. The exposure method according to 6 .

In the exposure step, projection exposure is performed on a plurality of shot areas,
The exposure step includes a first partial exposure step in which projection exposure is performed to the predetermined partial exposure region in the plurality of shot regions, and a second projection exposure to another partial exposure region in the plurality of shot regions. The exposure method according to claim 6, further comprising a second partial exposure step .

The exposure method according to claim 7, wherein the mask is not exchanged between the first partial exposure step and the second partial exposure step .

Prior to the exposure step, when the refractive index of the atmosphere in the optical path of the projection optical system is 1, the optical path between the projection optical system and the photosensitive substrate has a refractive index greater than 1.1. The exposure method according to claim 5, further comprising a filling step of filling with a medium .

5. An illumination system for illuminating a mask set on the first surface, and an image of a pattern formed on the mask on a photosensitive substrate set on the second surface. An exposure apparatus comprising the projection optical system according to any one of the above .

Scanning exposure to the photosensitive substrate while moving the mask and the photosensitive substrate in a predetermined direction with respect to the projection optical system,
The exposure apparatus according to claim 12, further comprising a mask stage for supporting the mask and moving it stepwise in a direction substantially perpendicular to the predetermined direction.