TW200619862A - Light source for exposure - Google Patents
Light source for exposureInfo
- Publication number
- TW200619862A TW200619862A TW094127517A TW94127517A TW200619862A TW 200619862 A TW200619862 A TW 200619862A TW 094127517 A TW094127517 A TW 094127517A TW 94127517 A TW94127517 A TW 94127517A TW 200619862 A TW200619862 A TW 200619862A
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- light source
- mask
- exposure
- optical column
- Prior art date
Links
Abstract
A light source of high power parallel light for exposure is provided to replace the conventional light, which comprises a plurality of plan light emitting elements. The light from a plurality of plan light emitting elements which are disposed on a substrate 1 serves as a light source. The light enters an optical column 3 from one end surface thereof, whereby the light is uniformed by the optical column 3. The light 9 emitting from other end surfaces of the optical column 3 is condensed by a lens 4 and reaches a curved mirror5 which converts the light into parallel light 11 reaching a mask 6. the parallel light 11 passes through the mask 6, whereby the pattern on the mask 6 is formed on a film on the substrate 7.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004257578 | 2004-09-03 | ||
JP2004314314 | 2004-10-28 | ||
JP2005176278 | 2005-06-16 | ||
JP2005229706A JP4328320B2 (en) | 2004-09-03 | 2005-08-08 | Light source for exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200619862A true TW200619862A (en) | 2006-06-16 |
TWI398735B TWI398735B (en) | 2013-06-11 |
Family
ID=37150046
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094127517A TWI398735B (en) | 2004-09-03 | 2005-08-12 | Light source for exposure |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4328320B2 (en) |
KR (1) | KR101110516B1 (en) |
TW (1) | TWI398735B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI408511B (en) * | 2009-04-24 | 2013-09-11 | E Way Technology Co Ltd | Exposure machine and its exposure method |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009038255A (en) * | 2007-08-02 | 2009-02-19 | San Ei Giken Inc | Light source |
JP5355261B2 (en) * | 2009-07-07 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | Proximity exposure apparatus, exposure light forming method for proximity exposure apparatus, and display panel substrate manufacturing method |
CN102369484B (en) * | 2010-02-05 | 2015-05-20 | 恩斯克科技有限公司 | Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate |
JP6057072B2 (en) * | 2013-03-22 | 2017-01-11 | ウシオ電機株式会社 | Light source device |
JP2019101361A (en) * | 2017-12-07 | 2019-06-24 | 株式会社ユメックス | Scan type exposure equipment |
JP2023009810A (en) * | 2021-07-08 | 2023-01-20 | ウシオ電機株式会社 | Illumination optical system and exposure apparatus |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05249688A (en) * | 1992-03-09 | 1993-09-28 | Asahi Optical Co Ltd | Original plate exposing device and original plate inspecting method therefor |
JP3762091B2 (en) * | 1998-02-10 | 2006-03-29 | キヤノン株式会社 | Near-field photolithography method |
JP4355384B2 (en) * | 1999-01-14 | 2009-10-28 | キヤノン株式会社 | Pattern exposure method, exposure apparatus, nucleic acid array formation method, and peptide array formation method |
JP4472151B2 (en) * | 2000-10-19 | 2010-06-02 | 株式会社オーク製作所 | Irradiation light distribution mechanism and apparatus equipped with the same |
JP2004207343A (en) * | 2002-12-24 | 2004-07-22 | Nikon Corp | Illumination light source, illumination apparatus, aligner, and exposing method |
-
2005
- 2005-08-08 JP JP2005229706A patent/JP4328320B2/en active Active
- 2005-08-12 TW TW094127517A patent/TWI398735B/en active
- 2005-09-01 KR KR1020050081151A patent/KR101110516B1/en active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI408511B (en) * | 2009-04-24 | 2013-09-11 | E Way Technology Co Ltd | Exposure machine and its exposure method |
Also Published As
Publication number | Publication date |
---|---|
KR20060050911A (en) | 2006-05-19 |
JP2007025613A (en) | 2007-02-01 |
JP4328320B2 (en) | 2009-09-09 |
TWI398735B (en) | 2013-06-11 |
KR101110516B1 (en) | 2012-01-31 |
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