TW200619862A - Light source for exposure - Google Patents

Light source for exposure

Info

Publication number
TW200619862A
TW200619862A TW094127517A TW94127517A TW200619862A TW 200619862 A TW200619862 A TW 200619862A TW 094127517 A TW094127517 A TW 094127517A TW 94127517 A TW94127517 A TW 94127517A TW 200619862 A TW200619862 A TW 200619862A
Authority
TW
Taiwan
Prior art keywords
light
light source
mask
exposure
optical column
Prior art date
Application number
TW094127517A
Other languages
Chinese (zh)
Other versions
TWI398735B (en
Inventor
Ken Miyake
Original Assignee
Sanei Giken Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanei Giken Co Ltd filed Critical Sanei Giken Co Ltd
Publication of TW200619862A publication Critical patent/TW200619862A/en
Application granted granted Critical
Publication of TWI398735B publication Critical patent/TWI398735B/en

Links

Abstract

A light source of high power parallel light for exposure is provided to replace the conventional light, which comprises a plurality of plan light emitting elements. The light from a plurality of plan light emitting elements which are disposed on a substrate 1 serves as a light source. The light enters an optical column 3 from one end surface thereof, whereby the light is uniformed by the optical column 3. The light 9 emitting from other end surfaces of the optical column 3 is condensed by a lens 4 and reaches a curved mirror5 which converts the light into parallel light 11 reaching a mask 6. the parallel light 11 passes through the mask 6, whereby the pattern on the mask 6 is formed on a film on the substrate 7.
TW094127517A 2004-09-03 2005-08-12 Light source for exposure TWI398735B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004257578 2004-09-03
JP2004314314 2004-10-28
JP2005176278 2005-06-16
JP2005229706A JP4328320B2 (en) 2004-09-03 2005-08-08 Light source for exposure

Publications (2)

Publication Number Publication Date
TW200619862A true TW200619862A (en) 2006-06-16
TWI398735B TWI398735B (en) 2013-06-11

Family

ID=37150046

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094127517A TWI398735B (en) 2004-09-03 2005-08-12 Light source for exposure

Country Status (3)

Country Link
JP (1) JP4328320B2 (en)
KR (1) KR101110516B1 (en)
TW (1) TWI398735B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408511B (en) * 2009-04-24 2013-09-11 E Way Technology Co Ltd Exposure machine and its exposure method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009038255A (en) * 2007-08-02 2009-02-19 San Ei Giken Inc Light source
JP5355261B2 (en) * 2009-07-07 2013-11-27 株式会社日立ハイテクノロジーズ Proximity exposure apparatus, exposure light forming method for proximity exposure apparatus, and display panel substrate manufacturing method
CN102369484B (en) * 2010-02-05 2015-05-20 恩斯克科技有限公司 Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate
JP6057072B2 (en) * 2013-03-22 2017-01-11 ウシオ電機株式会社 Light source device
JP2019101361A (en) * 2017-12-07 2019-06-24 株式会社ユメックス Scan type exposure equipment
JP2023009810A (en) * 2021-07-08 2023-01-20 ウシオ電機株式会社 Illumination optical system and exposure apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05249688A (en) * 1992-03-09 1993-09-28 Asahi Optical Co Ltd Original plate exposing device and original plate inspecting method therefor
JP3762091B2 (en) * 1998-02-10 2006-03-29 キヤノン株式会社 Near-field photolithography method
JP4355384B2 (en) * 1999-01-14 2009-10-28 キヤノン株式会社 Pattern exposure method, exposure apparatus, nucleic acid array formation method, and peptide array formation method
JP4472151B2 (en) * 2000-10-19 2010-06-02 株式会社オーク製作所 Irradiation light distribution mechanism and apparatus equipped with the same
JP2004207343A (en) * 2002-12-24 2004-07-22 Nikon Corp Illumination light source, illumination apparatus, aligner, and exposing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408511B (en) * 2009-04-24 2013-09-11 E Way Technology Co Ltd Exposure machine and its exposure method

Also Published As

Publication number Publication date
KR20060050911A (en) 2006-05-19
JP2007025613A (en) 2007-02-01
JP4328320B2 (en) 2009-09-09
TWI398735B (en) 2013-06-11
KR101110516B1 (en) 2012-01-31

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