JP2002244036A - 投影レンズ、及び微細構造化部品の製造方法 - Google Patents

投影レンズ、及び微細構造化部品の製造方法

Info

Publication number
JP2002244036A
JP2002244036A JP2001392742A JP2001392742A JP2002244036A JP 2002244036 A JP2002244036 A JP 2002244036A JP 2001392742 A JP2001392742 A JP 2001392742A JP 2001392742 A JP2001392742 A JP 2001392742A JP 2002244036 A JP2002244036 A JP 2002244036A
Authority
JP
Japan
Prior art keywords
lens
projection
lens group
lenses
projection lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001392742A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002244036A5 (enExample
Inventor
Karl-Heinz Schuster
シュースター カール−ハインツ
Alexander Epple
エップレ アレクサンダー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of JP2002244036A publication Critical patent/JP2002244036A/ja
Publication of JP2002244036A5 publication Critical patent/JP2002244036A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/0095—Relay lenses or rod lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/12—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having three components only
    • G02B9/14—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having three components only arranged + - +

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2001392742A 2000-12-22 2001-12-25 投影レンズ、及び微細構造化部品の製造方法 Pending JP2002244036A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10064685A DE10064685A1 (de) 2000-12-22 2000-12-22 Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
DE10064685.9 2000-12-22

Publications (2)

Publication Number Publication Date
JP2002244036A true JP2002244036A (ja) 2002-08-28
JP2002244036A5 JP2002244036A5 (enExample) 2005-06-23

Family

ID=7668748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001392742A Pending JP2002244036A (ja) 2000-12-22 2001-12-25 投影レンズ、及び微細構造化部品の製造方法

Country Status (5)

Country Link
US (3) US6788387B2 (enExample)
EP (1) EP1217412B1 (enExample)
JP (1) JP2002244036A (enExample)
AT (1) ATE320018T1 (enExample)
DE (2) DE10064685A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005001543A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法
JP2007515660A (ja) * 2003-10-22 2007-06-14 カール・ツァイス・エスエムティー・アーゲー 浸漬リソグラフィー用屈折性投影対物レンズ
JP2009104184A (ja) * 2002-07-04 2009-05-14 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
CN101975983A (zh) * 2010-09-13 2011-02-16 北京理工大学 高分辨率非球面光刻物镜
JP2012518804A (ja) * 2009-02-20 2012-08-16 タレス・カナダ・インコーポレーテッド 双焦点レンズを用いた二視野光学撮像システム

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
EP1690139B1 (en) * 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
CN101107570B (zh) * 2004-12-30 2011-02-09 卡尔蔡司Smt股份公司 投影光学系统
DE102005027099A1 (de) * 2005-06-10 2006-12-14 Carl Zeiss Smt Ag Immersionslithographieobjektiv
TWI390244B (zh) * 2009-06-12 2013-03-21 Largan Precision Co Ltd 攝影鏡頭

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1478115A (en) * 1974-02-15 1977-06-29 Pilkington Perkin Elmer Ltd Infra-red lenses
EP0332201B1 (en) 1988-03-11 1994-06-29 Matsushita Electric Industrial Co., Ltd. Optical projection system
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3819048B2 (ja) * 1995-03-15 2006-09-06 株式会社ニコン 投影光学系及びそれを備えた露光装置並びに露光方法
JP3750123B2 (ja) * 1996-04-25 2006-03-01 株式会社ニコン 投影光学系
US5852490A (en) * 1996-09-30 1998-12-22 Nikon Corporation Projection exposure method and apparatus
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
JP3823436B2 (ja) * 1997-04-03 2006-09-20 株式会社ニコン 投影光学系
JPH116957A (ja) * 1997-04-25 1999-01-12 Nikon Corp 投影光学系および投影露光装置並びに投影露光方法
US5990926A (en) * 1997-07-16 1999-11-23 Nikon Corporation Projection lens systems for excimer laser exposure lithography
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) * 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
US5986824A (en) * 1998-06-04 1999-11-16 Nikon Corporation Large NA projection lens system with aplanatic lens element for excimer laser lithography
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
EP1006388A3 (de) 1998-11-30 2002-05-02 Carl Zeiss Reduktions-Projektionsobjektiv der Mikrolithographie
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
JP2000215430A (ja) * 1999-01-26 2000-08-04 Tdk Corp 磁気ヘッドおよびその製造方法並びに磁気ディスク装置
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
EP1134606B1 (de) * 2000-01-18 2002-04-10 Isco-Optic Gmbh Projektionsobjektiv
DE10119861A1 (de) * 2000-05-04 2001-11-08 Zeiss Carl Projektionsobjektiv, insbesondere für die Mikrolithographie
JP2002083766A (ja) * 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP4624535B2 (ja) * 2000-09-28 2011-02-02 富士フイルム株式会社 広角投映レンズおよびこれを用いた投写型画像表示装置
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323653A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
JP2002323652A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2004012825A (ja) * 2002-06-07 2004-01-15 Fuji Photo Optical Co Ltd 投影光学系およびそれを用いた投影露光装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009104184A (ja) * 2002-07-04 2009-05-14 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2005001543A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法
JP2007515660A (ja) * 2003-10-22 2007-06-14 カール・ツァイス・エスエムティー・アーゲー 浸漬リソグラフィー用屈折性投影対物レンズ
US7751129B2 (en) 2003-10-22 2010-07-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
US7969663B2 (en) 2003-10-22 2011-06-28 Carl Zeiss Smt Gmbh Projection objective for immersion lithography
JP2012518804A (ja) * 2009-02-20 2012-08-16 タレス・カナダ・インコーポレーテッド 双焦点レンズを用いた二視野光学撮像システム
CN101975983A (zh) * 2010-09-13 2011-02-16 北京理工大学 高分辨率非球面光刻物镜

Also Published As

Publication number Publication date
EP1217412A2 (de) 2002-06-26
DE50109144D1 (de) 2006-05-04
EP1217412B1 (de) 2006-03-08
US20060176573A1 (en) 2006-08-10
EP1217412A3 (de) 2004-01-28
DE10064685A1 (de) 2002-07-04
ATE320018T1 (de) 2006-03-15
US6788387B2 (en) 2004-09-07
US7023627B2 (en) 2006-04-04
US20040228001A1 (en) 2004-11-18
US20020122164A1 (en) 2002-09-05
US7289279B2 (en) 2007-10-30

Similar Documents

Publication Publication Date Title
JP3624973B2 (ja) 投影光学系
US6349005B1 (en) Microlithographic reduction objective, projection exposure equipment and process
JP3454390B2 (ja) 投影光学系、投影露光装置及び投影露光方法
JP3750123B2 (ja) 投影光学系
US6863403B2 (en) Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
JP3819048B2 (ja) 投影光学系及びそれを備えた露光装置並びに露光方法
KR20000011933A (ko) 카타다이옵트릭광학시스템및그를구비한노광장치
KR100507558B1 (ko) 투영광학시스템 및 이를 이용한 투영노광장치
JP2003535356A (ja) 非球面レンズ表面が隣接して配置されている投影対物レンズ
JP2005519332A (ja) 屈折型投影対物レンズ
JP2005233979A (ja) 反射屈折光学系
JP2005189850A (ja) 液浸リソグラフィー用屈折性投影対物レンズ
JP2002244036A (ja) 投影レンズ、及び微細構造化部品の製造方法
JP2006512777A (ja) 可変開口数・大フィールド等倍投影系
JPH1197344A (ja) 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
US7403262B2 (en) Projection optical system and exposure apparatus having the same
JP2002323658A (ja) 照明システムの分割形対物レンズ
JP2010091751A (ja) 投影光学系及び露光装置
US6600550B1 (en) Exposure apparatus, a photolithography method, and a device manufactured by the same
KR100511360B1 (ko) 투영광학계 및 그것을 사용한 투영노광장치, 및디바이스제조방법
TW508655B (en) Relay imaging optical system, and illumination optical device and exposure device having the optical system
JP2002250865A (ja) 投影光学系、露光装置、およびそれらの製造方法
JPH10197791A (ja) 投影レンズ
KR20050033492A (ko) 조명광학계 및 그것을 가진 노광장치
JP2000353661A (ja) 投影光学系および露光装置

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20040901

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041006

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041006

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070829

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070907

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20071204

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20071211

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080723