ATE276969T1 - Verfahren zur herstellung von polykristallinem silizium - Google Patents
Verfahren zur herstellung von polykristallinem siliziumInfo
- Publication number
- ATE276969T1 ATE276969T1 AT02737219T AT02737219T ATE276969T1 AT E276969 T1 ATE276969 T1 AT E276969T1 AT 02737219 T AT02737219 T AT 02737219T AT 02737219 T AT02737219 T AT 02737219T AT E276969 T1 ATE276969 T1 AT E276969T1
- Authority
- AT
- Austria
- Prior art keywords
- polycrystalline silicon
- producing polycrystalline
- tetrachlorosilane
- hydrogen
- disilane
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/877,674 US20020187096A1 (en) | 2001-06-08 | 2001-06-08 | Process for preparation of polycrystalline silicon |
PCT/US2002/016754 WO2002100776A1 (en) | 2001-06-08 | 2002-05-23 | Process for preparation of polycrystalline silicon |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE276969T1 true ATE276969T1 (de) | 2004-10-15 |
Family
ID=25370477
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02737219T ATE276969T1 (de) | 2001-06-08 | 2002-05-23 | Verfahren zur herstellung von polykristallinem silizium |
Country Status (6)
Country | Link |
---|---|
US (1) | US20020187096A1 (de) |
EP (1) | EP1392601B1 (de) |
JP (2) | JP4532105B2 (de) |
AT (1) | ATE276969T1 (de) |
DE (1) | DE60201354T2 (de) |
WO (1) | WO2002100776A1 (de) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002012122A1 (fr) * | 2000-08-02 | 2002-02-14 | Mitsubishi Materials Polycrystalline Silicon Corporation | Procédé de production d'hexachlorure de disilicium |
DE102006009953A1 (de) * | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Verfahren zur Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes |
DE102006009954A1 (de) * | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes |
KR101341360B1 (ko) * | 2006-03-07 | 2013-12-13 | 도아고세이가부시키가이샤 | Hcd 가스의 제해방법과 제해장치 |
US7780938B2 (en) | 2006-04-13 | 2010-08-24 | Cabot Corporation | Production of silicon through a closed-loop process |
DE102006034061A1 (de) * | 2006-07-20 | 2008-01-24 | REV Renewable Energy Ventures, Inc., Aloha | Polysilanverarbeitung und Verwendung |
US7935327B2 (en) * | 2006-08-30 | 2011-05-03 | Hemlock Semiconductor Corporation | Silicon production with a fluidized bed reactor integrated into a siemens-type process |
DE102006043929B4 (de) * | 2006-09-14 | 2016-10-06 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von festen Polysilanmischungen |
DE102006050329B3 (de) * | 2006-10-25 | 2007-12-13 | Wacker Chemie Ag | Verfahren zur Herstellung von Trichlorsilan |
JP5435188B2 (ja) * | 2006-11-14 | 2014-03-05 | 三菱マテリアル株式会社 | 多結晶シリコンの製造方法および多結晶シリコン製造設備 |
CN101372336B (zh) * | 2007-08-20 | 2011-04-13 | 中国恩菲工程技术有限公司 | 一种多晶硅生产方法 |
DE102007041803A1 (de) | 2007-08-30 | 2009-03-05 | Pv Silicon Forschungs Und Produktions Gmbh | Verfahren zur Herstellung von polykristallinen Siliziumstäben und polykristalliner Siliziumstab |
JP4659798B2 (ja) * | 2007-09-05 | 2011-03-30 | 信越化学工業株式会社 | トリクロロシランの製造方法 |
JP4659797B2 (ja) | 2007-09-05 | 2011-03-30 | 信越化学工業株式会社 | 多結晶シリコンの製造方法 |
JP4714196B2 (ja) | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | トリクロロシランの製造方法および多結晶シリコンの製造方法 |
JP4714197B2 (ja) | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | トリクロロシランの製造方法および多結晶シリコンの製造方法 |
DE102008000052A1 (de) | 2008-01-14 | 2009-07-16 | Wacker Chemie Ag | Verfahren zur Abscheidung von polykristallinem Silicium |
KR101573933B1 (ko) * | 2008-02-29 | 2015-12-02 | 미쓰비시 마테리알 가부시키가이샤 | 트리클로로실란의 제조 방법 및 제조 장치 |
JP5444839B2 (ja) * | 2008-05-28 | 2014-03-19 | 三菱マテリアル株式会社 | トリクロロシラン製造装置及び製造方法 |
JP5316290B2 (ja) * | 2008-08-05 | 2013-10-16 | 三菱マテリアル株式会社 | トリクロロシラン製造装置及び製造方法 |
JP5316291B2 (ja) * | 2008-08-05 | 2013-10-16 | 三菱マテリアル株式会社 | トリクロロシラン製造装置及び製造方法 |
WO2010073725A1 (ja) * | 2008-12-26 | 2010-07-01 | 三菱マテリアル株式会社 | 多結晶シリコンの洗浄方法及び洗浄装置並びに多結晶シリコンの製造方法 |
US8168123B2 (en) * | 2009-02-26 | 2012-05-01 | Siliken Chemicals, S.L. | Fluidized bed reactor for production of high purity silicon |
EP2415712B1 (de) * | 2009-03-30 | 2017-05-03 | Denka Company Limited | Verfahren zum auffangen von hexachlordisilan |
TWI454309B (zh) | 2009-04-20 | 2014-10-01 | Jiangsu Zhongneng Polysilicon Technology Dev Co Ltd | 用於將反應排出氣體冷卻之方法及系統 |
JP2012523963A (ja) | 2009-04-20 | 2012-10-11 | エーイー ポリシリコン コーポレーション | ケイ化物がコーティングされた金属表面を有する反応器 |
CN101538044B (zh) * | 2009-04-21 | 2011-04-06 | 天津大学 | 多晶硅生产过程中的三氯氢硅分离提纯系统及操作方法 |
WO2011020028A2 (en) * | 2009-08-14 | 2011-02-17 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Silane blend for thin film vapor deposition |
DE102009043946A1 (de) * | 2009-09-04 | 2011-03-17 | G+R Technology Group Ag | Anlage und Verfahren zur Steuerung der Anlage für die Herstellung von polykristallinem Silizium |
EP2651954B1 (de) * | 2010-12-17 | 2015-09-16 | Dow Corning Corporation | Verfahren zur herstellung eines trihalosilanes |
US8875728B2 (en) | 2012-07-12 | 2014-11-04 | Siliken Chemicals, S.L. | Cooled gas distribution plate, thermal bridge breaking system, and related methods |
DE102013207441A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Hexachlordisilan durch Spaltung von höheren Polychlorsilanen wie Octachlortrisilan |
JP6131218B2 (ja) | 2014-06-17 | 2017-05-17 | 信越化学工業株式会社 | 多結晶シリコン棒の表面温度の算出方法および制御方法、多結晶シリコン棒の製造方法、多結晶シリコン棒、ならびに、多結晶シリコン塊 |
JP6486049B2 (ja) * | 2014-09-25 | 2019-03-20 | デンカ株式会社 | ペンタクロロジシランの製造方法並びに該方法により製造されるペンタクロロジシラン |
TWI791547B (zh) | 2017-07-31 | 2023-02-11 | 中國大陸商南大光電半導體材料有限公司 | 製備五氯二矽烷之方法及包含五氯二矽烷之經純化的反應產物 |
CN113371717B (zh) * | 2021-06-10 | 2022-12-27 | 青海亚洲硅业半导体有限公司 | 一种分段控制的多晶硅制备方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3933985A (en) * | 1971-09-24 | 1976-01-20 | Motorola, Inc. | Process for production of polycrystalline silicon |
US3809571A (en) * | 1972-04-04 | 1974-05-07 | Union Carbide Corp | Process for making silicon metal |
JPS5673617A (en) * | 1979-11-17 | 1981-06-18 | Osaka Titanium Seizo Kk | Manufacture of trichlorosilane |
FR2523113A1 (fr) * | 1982-03-10 | 1983-09-16 | G Pi | Procede de regeneration des chlorosilanes et de l'hydrogene non entres en reaction lors de l'obtention de silicium semi-conducteur polycristallin; chlorosilanes et hydrogene regeneres par ledit procede |
US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
NO881270L (no) * | 1987-05-14 | 1988-11-15 | Dow Corning | Framgangsmaate for aa redusere carboninnholdet i halvledere. |
JPH0791049B2 (ja) * | 1988-01-21 | 1995-10-04 | 大阪チタニウム製造株式会社 | 多結晶シリコンの製造におけるポリマーのトリクロロシラン転化方法 |
US5118485A (en) * | 1988-03-25 | 1992-06-02 | Hemlock Semiconductor Corporation | Recovery of lower-boiling silanes in a cvd process |
US5118486A (en) * | 1991-04-26 | 1992-06-02 | Hemlock Semiconductor Corporation | Separation by atomization of by-product stream into particulate silicon and silanes |
JP3853894B2 (ja) * | 1996-01-23 | 2006-12-06 | 株式会社トクヤマ | 塩化水素の減少した混合物の製造方法 |
-
2001
- 2001-06-08 US US09/877,674 patent/US20020187096A1/en not_active Abandoned
-
2002
- 2002-05-23 EP EP02737219A patent/EP1392601B1/de not_active Expired - Lifetime
- 2002-05-23 JP JP2003503550A patent/JP4532105B2/ja not_active Expired - Fee Related
- 2002-05-23 WO PCT/US2002/016754 patent/WO2002100776A1/en active IP Right Grant
- 2002-05-23 DE DE60201354T patent/DE60201354T2/de not_active Expired - Lifetime
- 2002-05-23 AT AT02737219T patent/ATE276969T1/de not_active IP Right Cessation
-
2008
- 2008-08-19 JP JP2008210876A patent/JP5374091B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP5374091B2 (ja) | 2013-12-25 |
JP2008303142A (ja) | 2008-12-18 |
DE60201354T2 (de) | 2006-02-16 |
JP4532105B2 (ja) | 2010-08-25 |
EP1392601A1 (de) | 2004-03-03 |
JP2004532786A (ja) | 2004-10-28 |
EP1392601B1 (de) | 2004-09-22 |
DE60201354D1 (de) | 2004-10-28 |
US20020187096A1 (en) | 2002-12-12 |
WO2002100776A1 (en) | 2002-12-19 |
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Legal Events
Date | Code | Title | Description |
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RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |