ATE217445T1 - Zentrifugal-reinigungsvorrichtung für waferbehälter - Google Patents

Zentrifugal-reinigungsvorrichtung für waferbehälter

Info

Publication number
ATE217445T1
ATE217445T1 AT95118115T AT95118115T ATE217445T1 AT E217445 T1 ATE217445 T1 AT E217445T1 AT 95118115 T AT95118115 T AT 95118115T AT 95118115 T AT95118115 T AT 95118115T AT E217445 T1 ATE217445 T1 AT E217445T1
Authority
AT
Austria
Prior art keywords
rotor
processing
vessel
cleaning device
processing chamber
Prior art date
Application number
AT95118115T
Other languages
English (en)
Inventor
Raymon F Thompson
Aleksander Owczarz
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25414519&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE217445(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Semitool Inc filed Critical Semitool Inc
Application granted granted Critical
Publication of ATE217445T1 publication Critical patent/ATE217445T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Centrifugal Separators (AREA)
  • Drying Of Solid Materials (AREA)
AT95118115T 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter ATE217445T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/901,614 US5224503A (en) 1992-06-15 1992-06-15 Centrifugal wafer carrier cleaning apparatus

Publications (1)

Publication Number Publication Date
ATE217445T1 true ATE217445T1 (de) 2002-05-15

Family

ID=25414519

Family Applications (2)

Application Number Title Priority Date Filing Date
AT95118115T ATE217445T1 (de) 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter
AT93915207T ATE157196T1 (de) 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT93915207T ATE157196T1 (de) 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter

Country Status (8)

Country Link
US (4) US5224503A (de)
EP (4) EP1191575A3 (de)
JP (1) JP2547529B2 (de)
AT (2) ATE217445T1 (de)
AU (1) AU4527993A (de)
DE (2) DE69313277T2 (de)
HK (1) HK1002262A1 (de)
WO (1) WO1993026035A1 (de)

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CN108417515B (zh) * 2018-04-10 2020-04-28 宁波德深机械设备有限公司 一种硅片清洗设备
CN108672452B (zh) * 2018-05-09 2021-03-26 芜湖市诺康生物科技有限公司 一种药瓶清洗装置
CN108940996A (zh) * 2018-07-27 2018-12-07 深圳市凯尔迪光电科技有限公司 高精密集成电路离心清洗设备
KR102396369B1 (ko) * 2018-08-09 2022-05-10 주식회사 원익아이피에스 기판처리장치
CN109604246B (zh) * 2018-12-17 2020-09-29 象山维治模具有限公司 零件自动清洗装置
CN109731853A (zh) * 2019-01-02 2019-05-10 常州回天新材料有限公司 一种太阳能电池片风淋装置
CN111341699B (zh) * 2020-03-09 2023-03-31 杭州众硅电子科技有限公司 一种清洗刷预清洗系统
CN111318503A (zh) * 2020-03-20 2020-06-23 西安奕斯伟硅片技术有限公司 一种清洗装置
CN112139134B (zh) * 2020-09-22 2021-11-30 江苏汉达机械有限公司 一种带有油污过滤功能的五金部件除油装置
CN112238087A (zh) * 2020-10-10 2021-01-19 马鞍山健鼎化工有限公司 一种新型聚合硫酸铁研发自动清洗回流机构及工作方法
CN113770072A (zh) * 2021-09-10 2021-12-10 安徽富乐德科技发展股份有限公司 一种液晶面板显示器自动清洗烘干设备
CN115228867B (zh) * 2022-09-22 2023-01-13 智程半导体设备科技(昆山)有限公司 一种半导体清洗设备

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DE69331912D1 (de) 2002-06-13
US5738128A (en) 1998-04-14
EP0776027A3 (de) 1997-08-06
HK1002262A1 (en) 1998-08-07
EP0702397B1 (de) 2002-05-08
EP1191575A2 (de) 2002-03-27
AU4527993A (en) 1994-01-04
US5562113A (en) 1996-10-08
DE69331912T2 (de) 2002-09-05
EP1191575A3 (de) 2006-01-18
US5224503A (en) 1993-07-06
WO1993026035A1 (en) 1993-12-23
EP0702397A2 (de) 1996-03-20
JPH07505260A (ja) 1995-06-08
EP0702397A3 (de) 1996-05-29
DE69313277D1 (de) 1997-09-25
EP0641483B1 (de) 1997-08-20
EP0776027A2 (de) 1997-05-28
DE69313277T2 (de) 1998-03-26
US5972127A (en) 1999-10-26
JP2547529B2 (ja) 1996-10-23
EP0641483A1 (de) 1995-03-08
ATE157196T1 (de) 1997-09-15

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