ATE204617T1 - Verfahren zur herstellung dicker keramikfilms durch sol-gel-beschichtungsprozess - Google Patents

Verfahren zur herstellung dicker keramikfilms durch sol-gel-beschichtungsprozess

Info

Publication number
ATE204617T1
ATE204617T1 AT96901675T AT96901675T ATE204617T1 AT E204617 T1 ATE204617 T1 AT E204617T1 AT 96901675 T AT96901675 T AT 96901675T AT 96901675 T AT96901675 T AT 96901675T AT E204617 T1 ATE204617 T1 AT E204617T1
Authority
AT
Austria
Prior art keywords
sol
producing thick
coating process
thick ceramic
ceramic film
Prior art date
Application number
AT96901675T
Other languages
English (en)
Inventor
David Barrow
Edward T Petroff
Michael Sayer
Original Assignee
Univ Kingston
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Kingston filed Critical Univ Kingston
Application granted granted Critical
Publication of ATE204617T1 publication Critical patent/ATE204617T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/62218—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic films, e.g. by using temporary supports
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1241—Metallic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
    • C23C18/127—Preformed particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Nanotechnology (AREA)
  • Dispersion Chemistry (AREA)
  • Structural Engineering (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Chemically Coating (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Laminated Bodies (AREA)
  • Inorganic Insulating Materials (AREA)
  • Cookers (AREA)
AT96901675T 1995-03-22 1996-02-13 Verfahren zur herstellung dicker keramikfilms durch sol-gel-beschichtungsprozess ATE204617T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/409,127 US5585136A (en) 1995-03-22 1995-03-22 Method for producing thick ceramic films by a sol gel coating process
PCT/CA1996/000088 WO1996029447A1 (en) 1995-03-22 1996-02-13 Method for producing thick ceramic films by a sol gel coating process

Publications (1)

Publication Number Publication Date
ATE204617T1 true ATE204617T1 (de) 2001-09-15

Family

ID=23619159

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96901675T ATE204617T1 (de) 1995-03-22 1996-02-13 Verfahren zur herstellung dicker keramikfilms durch sol-gel-beschichtungsprozess

Country Status (12)

Country Link
US (2) US5585136A (de)
EP (1) EP0815285B1 (de)
JP (1) JPH11502262A (de)
KR (1) KR100390037B1 (de)
AT (1) ATE204617T1 (de)
AU (1) AU4617496A (de)
CA (1) CA2213209C (de)
DE (1) DE69614673T2 (de)
DK (1) DK0815285T3 (de)
ES (1) ES2159716T3 (de)
PT (1) PT815285E (de)
WO (1) WO1996029447A1 (de)

Families Citing this family (94)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7166470B2 (en) * 1994-10-18 2007-01-23 Symyx Technologies, Inc. Formation of combinatorial arrays of materials using solution-based methodologies
US5585136A (en) * 1995-03-22 1996-12-17 Queen's University At Kingston Method for producing thick ceramic films by a sol gel coating process
US6063714A (en) * 1995-11-16 2000-05-16 Texas Instruments Incorporated Nanoporous dielectric thin film surface modification
JP3327149B2 (ja) * 1995-12-20 2002-09-24 セイコーエプソン株式会社 圧電体薄膜素子及びこれを用いたインクジェット式記録ヘッド
US6117294A (en) 1996-01-19 2000-09-12 Micron Technology, Inc. Black matrix material and methods related thereto
US6670050B2 (en) * 1997-05-30 2003-12-30 Honeywell International Inc. Titanium-based heat exchangers and methods of manufacture
US6165553A (en) * 1998-08-26 2000-12-26 Praxair Technology, Inc. Method of fabricating ceramic membranes
US6977095B1 (en) * 1997-10-01 2005-12-20 Wright Medical Technology Inc. Process for producing rigid reticulated articles
DE19817482C2 (de) * 1998-04-20 2003-07-03 Fraunhofer Ges Forschung Verfahren zur Herstellung von Dickschichten aus ferroelektrischen Keramiken
IT1306214B1 (it) * 1998-09-09 2001-05-30 Gel Design And Engineering Srl Processo per la preparazione di film vetrosi spessi di ossido disilicio secondo la tecnica sol-gel e film spessi cosi' ottenuti.
US20020024270A1 (en) * 1998-10-14 2002-02-28 Sumsung Electro-Mechanics Co. Piezoelectric/electrostrictive film element formed at low temperature using electrophoretic deposition
JP3081606B2 (ja) * 1998-12-30 2000-08-28 三星電機株式会社 シーディング層を利用した圧電／電歪厚膜の形成方法
US6251473B1 (en) 1999-05-12 2001-06-26 The Trustees Of The University Of Pennsylvania Preparation of ceramic thin films by spray coating
US6409813B1 (en) 1999-05-18 2002-06-25 Durga P. Beesabathina Glass-release coating, coating process, and coated parts for manufacturing glass
US6284682B1 (en) * 1999-08-26 2001-09-04 The University Of British Columbia Process for making chemically bonded sol-gel ceramics
US6750023B2 (en) * 1999-09-02 2004-06-15 Corning Incorporated Porous inorganic substrate for high-density arrays
DE19943789A1 (de) * 1999-09-13 2001-03-15 Fraunhofer Ges Forschung Verfahren zur Abscheidung von Zirkonoxid-Schichten unter Verwendung von löslichen Pulvern
FR2801135B1 (fr) * 1999-11-12 2002-02-08 Univ Claude Bernard Lyon Procede de realisation d'une cathode d'emission a l'aide de la technique sol-gel et cathode obtenue par un tel procede
US6627571B1 (en) 2000-03-01 2003-09-30 Symyx Technologies, Inc. Method and system for the situ synthesis of a combinatorial library of supported catalyst materials
US6426114B1 (en) 2000-05-02 2002-07-30 The University Of British Columbia Sol-gel calcium phosphate ceramic coatings and method of making same
EP1156024A1 (de) * 2000-05-19 2001-11-21 "VLAAMSE INSTELLING VOOR TECHNOLOGISCH ONDERZOEK", afgekort "V.I.T.O." Keramische Kompositvorstufen und Schichten
EP1286931A2 (de) 2000-05-19 2003-03-05 The University Of British Columbia Verfahren zur herstellung chemisch gebundener hydroxid-keramik-verbundmaterialien
US20040161789A1 (en) * 2000-08-30 2004-08-19 Tanner Cameron W. Porous inorganic substrate for high-density arrays
FR2813602B1 (fr) * 2000-09-07 2003-09-26 Armines Ass Pour La Rech Et Le Composition de revetement et procede de revetement d'une surface d'un substrat
KR100406646B1 (ko) * 2000-10-07 2003-11-21 한국과학기술연구원 고분자 매트릭스를 이용한 완화형 강유전체 세라믹스 후막 제조방법
KR100379771B1 (ko) * 2000-10-06 2003-04-11 한국과학기술연구원 고분자 물질을 이용한 유전체 후막 제조 방법
ES2292720T3 (es) * 2001-03-09 2008-03-16 Datec Coating Corporation Revestimiento resistivo y conductor derivado de sol-gel.
KR100416760B1 (ko) * 2001-03-12 2004-01-31 삼성전자주식회사 졸겔공정을 이용한 지르콘산-티탄산 납 후막의 제조방법
WO2002089243A2 (en) * 2001-04-27 2002-11-07 Alberta Reasearch Council Inc. Metal-supported solid electrolyte electrochemical cell and multi cell reactors incorporating same
US6544589B2 (en) * 2001-08-20 2003-04-08 Northrop Grumman Corporation Method of controlling drying stresses by restricting shrinkage of ceramic coating
EP1340541A1 (de) 2002-02-28 2003-09-03 Corning Incorporated Strukturierter Katalysator mit einem dicken "Washcoat"-Überzug und dessen Herstellungsverfahren
DE10225972B3 (de) * 2002-06-11 2004-03-04 Fachhochschule Kiel Verfahren zum Aufschleuderbeschichten einer dicken Keramikschicht mit einem Sol-Gel-Verfahren
US20060147699A1 (en) * 2002-10-03 2006-07-06 Alberta Research Council Inc. Protective ceramic coating
ATE339866T1 (de) 2002-11-22 2006-10-15 Koninkl Philips Electronics Nv Auf sol-gel basierendes heizelement
US6936561B2 (en) 2002-12-02 2005-08-30 Corning Incorporated Monolithic zeolite coated structures and a method of manufacture
EP1590310A1 (de) * 2003-02-03 2005-11-02 Eidgenössische Technische Hochschule Zürich VERFAHREN ZUR HERSTELLUNG EINER B/N/C/Si-KERAMIK AUS EINEM BORAZINPRECURSOR, NACH DIESEM VERFAHREN HERGESTELLTE KERAMIK SOWIE VERWENDUNG DER NACH DIESEM VERFAHREN HERGESTELLTEN KERAMIK
US6895645B2 (en) * 2003-02-25 2005-05-24 Palo Alto Research Center Incorporated Methods to make bimorph MEMS devices
US6964201B2 (en) * 2003-02-25 2005-11-15 Palo Alto Research Center Incorporated Large dimension, flexible piezoelectric ceramic tapes
US7089635B2 (en) * 2003-02-25 2006-08-15 Palo Alto Research Center, Incorporated Methods to make piezoelectric ceramic thick film arrays and elements
DE10322701B4 (de) * 2003-05-20 2006-12-28 Humboldt-Universität Zu Berlin Probenträger unter Verwendung eines porösen, Metalloxidpartikel umfassenden Films, Verfahren zur Herstellung eines Probenträgers, Verwendung des Probenträgers sowie Verfahren zum selektiven Nachweis von phosphorylierten/sulfatierten Biopolymeren, insbesondere Peptiden/Proteinen
US20040247791A1 (en) * 2003-06-03 2004-12-09 United States Department Of Energy Method for preparing nanocrystalline ceramic thin films
JP4825955B2 (ja) * 2003-06-13 2011-11-30 独立行政法人産業技術総合研究所 生体インプラント材及びその作製方法
US20040258611A1 (en) * 2003-06-23 2004-12-23 Mark Barrow Colloidal composite sol gel formulation with an expanded gel network for making thick inorganic coatings
US7300702B2 (en) * 2003-08-18 2007-11-27 Honeywell International, Inc. Diffusion barrier coating for Si-based components
DE10355160B4 (de) * 2003-11-26 2008-04-03 Schott Ag Beschichtete Glaskeramikplatte, Verfahren zu ihrer Herstellung und Kochfeld mit einer solchen Glaskeramikplatte
EP1547675A1 (de) * 2003-12-24 2005-06-29 Corning Incorporated Beschichtete Mikrovorrichtung und deren Herstellungsverfahren
FR2865219B1 (fr) * 2004-01-20 2006-03-31 Peugeot Citroen Automobiles Sa Procede de depot d'un revetement d'oxyde metallique sur un substrat
US7384779B2 (en) * 2004-04-12 2008-06-10 Corning Incorporated Porous substrate plates and the use thereof
JP2008505435A (ja) * 2004-05-19 2008-02-21 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 屋内電気機器に使用される層
DE102004052135A1 (de) * 2004-06-07 2005-12-29 Fachhochschule Schmalkalden Beschichtetes Metallsubstrat und Verfahren zu seiner Herstellung
DE102004041695A1 (de) * 2004-08-26 2006-03-02 Schott Ag Farbig beschichtete Glas- oder Glaskeramikplatte
US7959987B2 (en) * 2004-12-13 2011-06-14 Applied Materials, Inc. Fuel cell conditioning layer
US7094383B2 (en) * 2004-12-14 2006-08-22 Ctci Foundation Method for preparing pure, thermally stable and high surface area ceria
DE102005018246A1 (de) * 2005-04-19 2006-10-26 Schott Ag Glas- oder Glaskeramik-Artikel mit dekorativer Beschichtung
EP1808511A1 (de) * 2006-01-16 2007-07-18 Siemens Aktiengesellschaft Verfahren zur Oberflächenbeschichtung eines Verdichterbauteils
WO2007094019A1 (en) * 2006-02-17 2007-08-23 Nm Tech Ltd. Nanomaterials And Microdevices Technology A method for preparing nanocrystalline transparent films of tungsten oxide
US20070224359A1 (en) * 2006-03-22 2007-09-27 Burin David L Method for preparing strain tolerant coatings by a sol-gel process
JP2008088912A (ja) * 2006-10-03 2008-04-17 Tohoku Univ メカニカルポンプおよびその製造方法
JP2008094972A (ja) 2006-10-12 2008-04-24 Adeka Corp 塗布液および該塗布液を用いたチタン酸系セラミックス膜の製造方法
WO2008058121A2 (en) * 2006-11-06 2008-05-15 Drexel University Sol-gel precursors and methods for making lead-based perovskite films
US20090239061A1 (en) * 2006-11-08 2009-09-24 General Electric Corporation Ceramic corrosion resistant coating for oxidation resistance
DE102007015635A1 (de) * 2007-03-31 2008-10-02 Schaeffler Kg Beschichtung eines Bauteils aus gehärtetem Stahl und Verfahren zum Aufbringen der Beschichtung
US20100190643A1 (en) * 2007-05-31 2010-07-29 Carrier Corporation Deactivation resistant photocatalyst and method of preparation
CN102067719B (zh) 2008-04-22 2014-07-16 达泰克涂料股份公司 厚膜高温热塑性绝缘加热元件
US8993131B2 (en) * 2008-07-16 2015-03-31 Wisconsin Alumni Research Foundation Metal substrates including metal oxide nanoporous thin films and methods of making the same
DE102009023628A1 (de) * 2009-05-27 2010-12-02 Siemens Aktiengesellschaft Verfahren zum Erzeugen einer Schicht mit Absorberpartikeln für eine Energiestrahlung
CA2715958A1 (en) * 2009-10-12 2011-04-12 General Electric Company Process of forming a coating system, coating system formed thereby, and components coated therewith
JP5739189B2 (ja) * 2011-02-24 2015-06-24 三菱マテリアル株式会社 耐摩耗性に優れた表面被覆切削工具の製造方法
EP2520692A3 (de) * 2011-05-06 2014-08-13 Seiko Epson Corporation Vorläuferlösung für piezoelektrische Folien, Verfahren zur Herstellung davon, und Verfahren zur Herstellung von piezoelektrischer Folie
DE102011077021A1 (de) * 2011-06-07 2012-12-13 Schaeffler Technologies AG & Co. KG Beschichtungsverfahren für ein Kolben- oder Lager-Bauteil
DE102011107448A1 (de) 2011-07-08 2013-01-10 Fachhochschule Kiel Dicke keramische Beschichtung
CA2846269C (en) 2011-08-24 2019-01-15 National Research Council Of Canada Porosity control in piezoelectric films
FR2981064B1 (fr) * 2011-10-07 2014-11-28 Commissariat Energie Atomique Procede de preparation d'un materiau sur un substrat par voie sol-gel
US8716053B2 (en) * 2012-02-16 2014-05-06 E I Du Pont De Nemours And Company Moisture barrier for photovoltaic cells
JP5939044B2 (ja) * 2012-06-06 2016-06-22 日立化成株式会社 銀硫化防止材、銀硫化防止膜の形成方法、発光装置の製造方法及び発光装置
FR3013996B1 (fr) 2013-12-02 2017-04-28 Office National Detudes Et De Rech Aerospatiales Onera Procede de reparation locale de barrieres thermiques
FR3014115B1 (fr) 2013-12-02 2017-04-28 Office National Detudes Et De Rech Aerospatiales Onera Procede et systeme de depot d'oxyde sur un composant poreux
KR101424082B1 (ko) 2014-02-24 2014-07-28 주식회사 에코인프라홀딩스 졸겔법을 이용하여 제조된 복합 세라믹, 이를 함유하는 초고온 내열성 및 고 내식성을 갖는 박막 코팅재 및 이의 제조방법
NL2014080B1 (en) 2014-12-29 2016-07-25 Röntgen Technische Dienst B V Flexible ultrasonic transducer and a transducer block.
FR3053329B1 (fr) * 2016-06-29 2018-07-27 Safran Ceramics Procede de revetement d'une piece en materiau composite a matrice ceramique par une barriere environnementale
KR101725256B1 (ko) * 2016-09-05 2017-04-11 주식회사 이앤이켐 고열전도성 세라믹 코팅제 및 이의 시공방법
PL238466B1 (pl) 2016-09-20 2021-08-23 Politechnika Krakowska Im Tadeusza Kosciuszki Sposób wytwarzania na metalicznym podłożu warstwy katalitycznego nośnika z tlenku cyrkonu(IV)
KR102039996B1 (ko) * 2017-10-13 2019-11-04 한국원자력연구원 중이온빔 조사에 의한 TiO2 SiO2 하이브리드 코팅의 표면개질 방법 및 이를 이용하여 제조된 적층체
JP6813718B2 (ja) * 2019-01-10 2021-01-13 日本碍子株式会社 複合部材
CN112986125A (zh) * 2021-02-26 2021-06-18 武汉材料保护研究所有限公司 一种用于测量导电涂层与被保护的基材之间电偶腐蚀的试样及评价方法
JP2022142421A (ja) * 2021-03-16 2022-09-30 株式会社巴川製紙所 静電チャック装置およびその製造方法
JP2022142151A (ja) * 2021-03-16 2022-09-30 株式会社巴川製紙所 セラミック膜およびその製造方法、静電チャック装置およびその製造方法
WO2023285697A1 (en) * 2021-07-16 2023-01-19 Coastgrass Aps Biodegradable composite articles
US11818955B2 (en) 2021-08-26 2023-11-14 City University Of Hong Kong Method for forming piezoelectric films on surfaces of arbitrary morphologies
JP7799269B2 (ja) * 2021-10-23 2026-01-15 国立大学法人 熊本大学 ゾルゲル複合体圧電センサ作成方法
JP2023128113A (ja) * 2022-03-03 2023-09-14 株式会社巴川製紙所 静電チャック装置
CA3259986A1 (en) * 2022-06-21 2023-12-28 Covalent Coating Technology, Inc. GLASS/CERAMIC FUSE ON INDUSTRIAL METALLIC SUBSTRATES
CN115121131B (zh) * 2022-07-25 2024-04-16 浙江汇甬新材料有限公司 富硅型沸石分子筛膜及其制备方法
CN116550164B (zh) * 2023-05-25 2024-08-02 江西陶瓷工艺美术职业技术学院 一种纳滤陶瓷膜的制备方法及其制得的产品

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320959B2 (de) * 1973-05-14 1978-06-29
US3975165A (en) * 1973-12-26 1976-08-17 Union Carbide Corporation Graded metal-to-ceramic structure for high temperature abradable seal applications and a method of producing said
CA1154638A (en) * 1978-03-15 1983-10-04 Kunio Kimura Method of forming porcelain enamels
US4476156A (en) * 1983-03-10 1984-10-09 The United States Of America As Represented By The United States Department Of Energy Low temperature process for obtaining thin glass films
US4460639A (en) * 1983-04-06 1984-07-17 Dow Corning Corporation Fiber reinforced glass matrix composites
US4859525A (en) * 1985-02-25 1989-08-22 University Of Florida Method for low temperature processing of lightweight SiC/SiO2 composites and products
US4921731A (en) * 1986-02-25 1990-05-01 University Of Florida Deposition of ceramic coatings using sol-gel processing with application of a thermal gradient
US5204140A (en) * 1986-03-24 1993-04-20 Ensci, Inc. Process for coating a substrate with tin oxide
FR2600550B1 (fr) * 1986-05-30 1990-10-19 Meridional Oenologie Centre Procedes de fabrication de membrane minces composees d'un reseau mineral d'oxydes de titane et de silicium et poudre composee de grains submicroniques en oxydes mixtes de titane et de silicium
JPS6330365A (ja) * 1986-07-23 1988-02-09 新日本製鐵株式会社 Ｐｌｚｔ透光性セラミツクスの製造法
US5173331A (en) * 1986-08-01 1992-12-22 International Business Machines Corporation Zirconia toughening of glass-ceramic materials
US4726099A (en) * 1986-09-17 1988-02-23 American Cyanamid Company Method of making piezoelectric composites
US4738896A (en) * 1986-09-26 1988-04-19 Advanced Technology Materials, Inc. Sol gel formation of polysilicate, titania, and alumina interlayers for enhanced adhesion of metal films on substrates
US4990324A (en) * 1986-12-17 1991-02-05 Nippondenso Co., Ltd. Method for producing two-component or three-component lead zirconate-titanate
JP2598786B2 (ja) * 1986-12-17 1997-04-09 日本電装株式会社 ペロブストカイト系機能性セラミツクの製造方法
US4946710A (en) * 1987-06-02 1990-08-07 National Semiconductor Corporation Method for preparing PLZT, PZT and PLT sol-gels and fabricating ferroelectric thin films
US5106828A (en) * 1987-07-20 1992-04-21 North American Philips Corporation Method for fabricating superconductors by sol-gel process
US4788046A (en) * 1987-08-13 1988-11-29 Ceramics Process Systems Corporation Method for producing materials for co-sintering
US5185177A (en) * 1988-02-08 1993-02-09 Mitsubishi Kasei Corporation Producing a ceramic implant by coating a powder mixture of zirconia and either tricalcium phosphate or hydroxyapatite on a molded unsintered body of partially stabilized zirconia and then sintering the article
GB8809608D0 (en) * 1988-04-22 1988-05-25 Alcan Int Ltd Sol-gel method of making ceramics
JPH01275765A (ja) * 1988-04-28 1989-11-06 Seiko Epson Corp インプラント材の製造方法
EP0343934B1 (de) * 1988-05-24 1995-01-25 Anagen (U.K.) Limited Magnetisch anziehbare Teilchen und Herstellungsverfahren
US5198269A (en) * 1989-04-24 1993-03-30 Battelle Memorial Institute Process for making sol-gel deposited ferroelectric thin films insensitive to their substrates
JP2796123B2 (ja) * 1989-05-26 1998-09-10 神鋼パンテック株式会社 グラスライニング鋼製機器のライニングガラス層の破損局部の補修方法および装置
DK336689D0 (da) * 1989-07-06 1989-07-06 Risoe Forskningscenter Fremstilling af materialer
US5147515A (en) * 1989-09-04 1992-09-15 Dipsol Chemicals Co., Ltd. Method for forming ceramic films by anode-spark discharge
JPH0637283B2 (ja) * 1989-12-20 1994-05-18 セントラル硝子株式会社 酸化物薄膜の成膜方法
CA2053985A1 (en) * 1990-10-25 1992-04-26 Sumio Hoshino Process for producing thin glass film by sol-gel method
US5219611A (en) * 1991-09-30 1993-06-15 Cornell Research Foundation, Inc. Preparing densified low porosity titania sol gel forms
US5260094A (en) * 1991-09-30 1993-11-09 Cornell Research Foundation, Inc. Preparing densified low porosity titania sol-gel forms
US5266360A (en) * 1991-12-20 1993-11-30 United Technologies Corporation Inhibiting coke formation by coating gas turbine elements with silica
US5242631A (en) * 1992-01-13 1993-09-07 Westinghouse Electric Corp. Method for coating nuclear fuel pellets
US5281405A (en) * 1992-02-19 1994-01-25 E. I. Du Pont De Nemours And Company Optically useful compositions and a sol-gel process for their production
US5271955A (en) * 1992-04-06 1993-12-21 Motorola, Inc. Method for making a semiconductor device having an anhydrous ferroelectric thin film
US5352481A (en) * 1992-05-29 1994-10-04 Hughes Aircraft Company Process for forming particles having a uniform size distribution
US5308807A (en) * 1992-07-15 1994-05-03 Nalco Chemical Company Production of lead zirconate titanates using zirconia sol as a reactant
GB9300261D0 (en) * 1993-01-08 1993-03-03 British Tech Group Sol-gel composition for producing glassy coatings
US5885657A (en) * 1994-06-23 1999-03-23 Creavis Gesellschaft Fur Technologie Und Innovation Mbh Production of ceramic layers and their use
DE4431862C2 (de) * 1994-09-07 1997-12-11 Dot Duennschicht Und Oberflaec Verfahren zur Beschichtung von Metall- und Keramikoberflächen mit Hydroxylapatit
US5585136A (en) * 1995-03-22 1996-12-17 Queen's University At Kingston Method for producing thick ceramic films by a sol gel coating process
US5676745A (en) * 1995-06-07 1997-10-14 The United States Of America, As Represented By The Secretary Of Commerce Pre-ceramic polymers in fabrication of ceramic composites

Also Published As

Publication number Publication date
KR100390037B1 (ko) 2003-10-22
CA2213209A1 (en) 1996-09-26
HK1007889A1 (en) 1999-04-30
US5585136A (en) 1996-12-17
JPH11502262A (ja) 1999-02-23
PT815285E (pt) 2001-12-28
DE69614673T2 (de) 2002-06-27
DK0815285T3 (da) 2001-10-08
CA2213209C (en) 2003-10-21
WO1996029447A1 (en) 1996-09-26
USRE36573E (en) 2000-02-15
DE69614673D1 (de) 2001-09-27
EP0815285A1 (de) 1998-01-07
AU4617496A (en) 1996-10-08
EP0815285B1 (de) 2001-08-22
ES2159716T3 (es) 2001-10-16
KR19980703207A (ko) 1998-10-15

Similar Documents

Publication Publication Date Title
ATE204617T1 (de) Verfahren zur herstellung dicker keramikfilms durch sol-gel-beschichtungsprozess
FR2515667B1 (fr) Composition de siloxanes pour la realisation de revetements teintables resistant a l'abrasion, procede de revetement de substrats solides l'utilisant et substrats revetus ainsi obtenus
ATE31628T1 (de) Verfahren zur bildung einer hydrophilen beschichtung auf einem substrat.
CA2219497A1 (en) Coating composition containing acrylic polymers with pendant carbamate groups
DE59601722D1 (de) Beschichtete anorganische pigmente, verfahren zu deren herstellung und deren verwendung
ATE244691T1 (de) Verfahren zur beschichtung von beiden seiten eines glassubstrats
ATE15623T1 (de) Metallisierte verbundstruktur und verfahren zu ihrer herstellung.
ATE89496T1 (de) Verfahren zur beschichtung eines metallsubstrats mit pulvergrundierungsschicht und mittels tauchen angebrachte oberflaechenbeschichtung, grundierungszusammensetzung und so erhaltene materialien.
WO1995000259A3 (en) Brittle oxide substrates strengthened by cross-linkable silanes
US3914469A (en) Method of controlling solar heat and light in green houses
FR2636959B1 (fr) Enduit ou revetement de surfaces, son procede de preparation et d'application; surfaces revetues d'un tel enduit
JPS5798578A (en) Surface coating type waterdrop preventing agent
MY115139A (en) Method for preparing anti-reflective coating for display devices
DE69501992D1 (de) Verfahren zur Reduktion von Mikro-Schaum in einer durch Sprühen aufgetragenen, wässerigen Zusammensetzung
EP0083867A3 (de) Verfahren zum Anbringen einer nichtorganischem Anstrichzusammensetzung
ATE179448T1 (de) Härtbare zusammensetzungen mit verbesserter haftung und ihre verwendung zum beschichten von substraten
ATE178263T1 (de) Verfahren zur herstellung von mit mehreren schichten beschichteten substraten
JPH0323230B2 (de)
JPH01234377A (ja) コンクリート製品の被膜形成方法
JPS6418473A (en) Finishing method for painting
JPS6455232A (en) Decorating method of cement product
JPS62153180A (ja) 漆塗り陶器及びその製造方法
JPS628787B2 (de)
JPH05123639A (ja) 無機質化粧板の製造方法
JPS5317648A (en) Process of coating inorganic paint

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification