ZA200601219B - Electrode - Google Patents
Electrode Download PDFInfo
- Publication number
- ZA200601219B ZA200601219B ZA200601219A ZA200601219A ZA200601219B ZA 200601219 B ZA200601219 B ZA 200601219B ZA 200601219 A ZA200601219 A ZA 200601219A ZA 200601219 A ZA200601219 A ZA 200601219A ZA 200601219 B ZA200601219 B ZA 200601219B
- Authority
- ZA
- South Africa
- Prior art keywords
- electrode
- metal oxide
- platinum
- coating layer
- precursors
- Prior art date
Links
- 238000000576 coating method Methods 0.000 claims description 45
- 239000011248 coating agent Substances 0.000 claims description 43
- 229910044991 metal oxide Inorganic materials 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 30
- 239000011247 coating layer Substances 0.000 claims description 24
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 22
- 150000004706 metal oxides Chemical class 0.000 claims description 22
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 22
- 239000002243 precursor Substances 0.000 claims description 22
- 239000010936 titanium Substances 0.000 claims description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 18
- 229910052719 titanium Inorganic materials 0.000 claims description 18
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 17
- 239000010410 layer Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 17
- 229910052741 iridium Inorganic materials 0.000 claims description 16
- -1 platinum group metal oxide Chemical class 0.000 claims description 15
- 229910052707 ruthenium Inorganic materials 0.000 claims description 14
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 13
- 229910052762 osmium Inorganic materials 0.000 claims description 10
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 10
- 229910052703 rhodium Inorganic materials 0.000 claims description 10
- 239000010948 rhodium Substances 0.000 claims description 10
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 10
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 229910052697 platinum Inorganic materials 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 6
- 229910052758 niobium Inorganic materials 0.000 claims description 6
- 239000010955 niobium Substances 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 4
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims 1
- 150000003304 ruthenium compounds Chemical class 0.000 claims 1
- 239000000243 solution Substances 0.000 description 43
- 239000002253 acid Substances 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 5
- 238000002484 cyclic voltammetry Methods 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 238000011068 loading method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000001117 sulphuric acid Substances 0.000 description 3
- 235000011149 sulphuric acid Nutrition 0.000 description 3
- MXLMTQWGSQIYOW-UHFFFAOYSA-N 3-methyl-2-butanol Chemical compound CC(C)C(C)O MXLMTQWGSQIYOW-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 229910000457 iridium oxide Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000012702 metal oxide precursor Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- JYVLIDXNZAXMDK-UHFFFAOYSA-N pentan-2-ol Chemical compound CCCC(C)O JYVLIDXNZAXMDK-UHFFFAOYSA-N 0.000 description 2
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical class [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000005233 alkylalcohol group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007590 electrostatic spraying Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229910001924 platinum group oxide Inorganic materials 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
- C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
- C25B11/063—Valve metal, e.g. titanium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Ceramic Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Hybrid Cells (AREA)
- Electroluminescent Light Sources (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03445107 | 2003-10-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200601219B true ZA200601219B (en) | 2007-05-30 |
Family
ID=34400645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200601219A ZA200601219B (en) | 2003-10-08 | 2004-10-06 | Electrode |
Country Status (9)
| Country | Link |
|---|---|
| EP (1) | EP1670973B1 (ja) |
| JP (1) | JP5037133B2 (ja) |
| KR (1) | KR100787276B1 (ja) |
| CN (2) | CN1849414B (ja) |
| AU (1) | AU2004277578B2 (ja) |
| CA (1) | CA2541311C (ja) |
| PL (1) | PL1670973T3 (ja) |
| WO (1) | WO2005033367A1 (ja) |
| ZA (1) | ZA200601219B (ja) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100812990B1 (ko) * | 2006-11-08 | 2008-03-13 | 고등기술연구원연구조합 | 모노-폴라형 전극의 제조방법 |
| EP2390385B1 (en) * | 2010-05-25 | 2015-05-06 | Permelec Electrode Ltd. | Anode for electrolysis and manufacturing method thereof |
| JP5456744B2 (ja) * | 2010-11-04 | 2014-04-02 | ペルメレック電極株式会社 | 金属電解採取方法 |
| IT1403585B1 (it) * | 2010-11-26 | 2013-10-31 | Industrie De Nora Spa | Anodo per evoluzione elettrolitica di cloro |
| CN102400203B (zh) * | 2011-11-09 | 2014-06-18 | 广东达志环保科技股份有限公司 | 一种三价铬氯化物体系镀铬阳极 |
| RU2712545C2 (ru) * | 2014-10-27 | 2020-01-29 | Индустрие Де Нора С.П.А. | Электрод для процессов электрохлорирования и способ его изготовления |
| AR106069A1 (es) * | 2015-09-25 | 2017-12-06 | Akzo Nobel Chemicals Int Bv | Electrodo y proceso para su manufactura |
| AR106068A1 (es) * | 2015-09-25 | 2017-12-06 | Akzo Nobel Chemicals Int Bv | Electrodo y proceso para su manufactura |
| CN108299868A (zh) * | 2016-08-25 | 2018-07-20 | 先丰通讯股份有限公司 | 触媒涂料及使用其的阳极 |
| CN106367779A (zh) * | 2016-11-07 | 2017-02-01 | 南昌专腾科技有限公司 | 一种多孔钛基电极材料及其制备方法 |
| CN107142496A (zh) * | 2017-04-10 | 2017-09-08 | 广东卓信环境科技股份有限公司 | 一种内层活性涂液及其制备方法 |
| WO2019031753A1 (ko) * | 2017-08-11 | 2019-02-14 | 주식회사 엘지화학 | 전해용 전극 및 이의 제조방법 |
| KR101950465B1 (ko) | 2017-08-11 | 2019-05-02 | 주식회사 엘지화학 | 전해용 전극 및 이의 제조방법 |
| CN108070877B (zh) * | 2017-11-09 | 2020-07-07 | 江苏安凯特科技股份有限公司 | 一种用于电解生产的阴极及其制备方法 |
| CN108048862B (zh) * | 2017-11-16 | 2020-04-28 | 江苏安凯特科技股份有限公司 | 一种析氯用阳极及其制备方法 |
| CN108048865B (zh) * | 2017-11-17 | 2020-04-28 | 江苏安凯特科技股份有限公司 | 一种电极及其制备方法和应用 |
| EP3758582A1 (en) * | 2018-02-26 | 2021-01-06 | T&W Engineering A/S | Electrode for detecting bioelectrical signals |
| JP7315240B2 (ja) * | 2018-06-12 | 2023-07-26 | 国立研究開発法人科学技術振興機構 | 触媒及びその使用方法 |
| KR102347982B1 (ko) | 2018-06-12 | 2022-01-07 | 주식회사 엘지화학 | 전기분해용 양극 및 이의 제조방법 |
| KR102503040B1 (ko) * | 2018-12-21 | 2023-02-23 | 주식회사 엘지화학 | 복합 금속 인화물을 포함하는 산화 전극 및 이의 제조방법 |
| EP3748042A1 (en) | 2019-06-03 | 2020-12-09 | Permascand Ab | Electrode assembly for electrochemical processes and method of restoring the same |
| CN113151885B (zh) * | 2021-03-15 | 2023-03-21 | 广州鸿葳科技股份有限公司 | 一种电镀用钛阳极及其制备方法 |
| WO2024127921A1 (ja) * | 2022-12-14 | 2024-06-20 | デノラ・ペルメレック株式会社 | 塩素発生電解用陽極 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4070504A (en) * | 1968-10-29 | 1978-01-24 | Diamond Shamrock Technologies, S.A. | Method of producing a valve metal electrode with valve metal oxide semi-conductor face and methods of manufacture and use |
| GB1294373A (en) * | 1970-03-18 | 1972-10-25 | Ici Ltd | Electrodes for electrochemical processes |
| BR8006373A (pt) * | 1979-10-08 | 1981-04-14 | Diamond Shamrock Corp | Eletrodo para uso em processos eletroliticos, processo para sua fabricacao, e uso do eletrodo |
| GB2083837B (en) * | 1980-08-18 | 1984-06-27 | Diamond Shamrock Corp | Manufacture of electrode with manganese dioxide coating valve metal base intermediate semiconducting layer |
| JPS5861286A (ja) * | 1981-10-08 | 1983-04-12 | Tdk Corp | 電解用電極およびその製造方法 |
| JPH0660427B2 (ja) * | 1988-05-31 | 1994-08-10 | ティーディーケイ株式会社 | 酸素発生用電極及びその製造方法 |
| JPH05209299A (ja) * | 1992-01-28 | 1993-08-20 | Nippon Steel Corp | 不溶性電極及びその製造方法 |
| US5503663A (en) * | 1994-11-30 | 1996-04-02 | The Dow Chemical Company | Sable coating solutions for coating valve metal anodes |
| US5587058A (en) * | 1995-09-21 | 1996-12-24 | Karpov Institute Of Physical Chemicstry | Electrode and method of preparation thereof |
| EP0867527B1 (fr) * | 1997-02-27 | 2001-03-21 | Aragonesas Industrias Y Energia, S.A. | Electrode à recouvrement catalytique pour des processus électrochimiques et procédé de fabrication de celle-ci |
| JP3725685B2 (ja) * | 1997-11-21 | 2005-12-14 | ペルメレック電極株式会社 | 過酸化水素製造装置 |
| US6217729B1 (en) * | 1999-04-08 | 2001-04-17 | United States Filter Corporation | Anode formulation and methods of manufacture |
| CN1179068C (zh) * | 2000-08-22 | 2004-12-08 | 黄永昌 | 不溶性电极和制备方法及用途 |
-
2004
- 2004-10-06 AU AU2004277578A patent/AU2004277578B2/en not_active Ceased
- 2004-10-06 CA CA2541311A patent/CA2541311C/en not_active Expired - Fee Related
- 2004-10-06 ZA ZA200601219A patent/ZA200601219B/en unknown
- 2004-10-06 KR KR1020067006852A patent/KR100787276B1/ko not_active IP Right Cessation
- 2004-10-06 WO PCT/SE2004/001428 patent/WO2005033367A1/en active Application Filing
- 2004-10-06 PL PL04775517T patent/PL1670973T3/pl unknown
- 2004-10-06 CN CN2004800264108A patent/CN1849414B/zh not_active Expired - Fee Related
- 2004-10-06 JP JP2006532238A patent/JP5037133B2/ja not_active Expired - Fee Related
- 2004-10-06 EP EP04775517.8A patent/EP1670973B1/en not_active Not-in-force
- 2004-10-06 CN CN2010102936821A patent/CN101942673A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN1849414A (zh) | 2006-10-18 |
| KR100787276B1 (ko) | 2007-12-20 |
| EP1670973B1 (en) | 2018-04-11 |
| CN1849414B (zh) | 2011-01-26 |
| KR20060085676A (ko) | 2006-07-27 |
| AU2004277578B2 (en) | 2008-07-17 |
| WO2005033367A1 (en) | 2005-04-14 |
| CN101942673A (zh) | 2011-01-12 |
| CA2541311C (en) | 2010-06-01 |
| WO2005033367A8 (en) | 2006-04-06 |
| JP5037133B2 (ja) | 2012-09-26 |
| EP1670973A1 (en) | 2006-06-21 |
| AU2004277578A1 (en) | 2005-04-14 |
| JP2007507612A (ja) | 2007-03-29 |
| PL1670973T3 (pl) | 2018-09-28 |
| CA2541311A1 (en) | 2005-04-14 |
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