WO2005033367A8 - Electrode - Google Patents

Electrode

Info

Publication number
WO2005033367A8
WO2005033367A8 PCT/SE2004/001428 SE2004001428W WO2005033367A8 WO 2005033367 A8 WO2005033367 A8 WO 2005033367A8 SE 2004001428 W SE2004001428 W SE 2004001428W WO 2005033367 A8 WO2005033367 A8 WO 2005033367A8
Authority
WO
WIPO (PCT)
Prior art keywords
metal oxide
electrode
coating layer
coating solution
precursors
Prior art date
Application number
PCT/SE2004/001428
Other languages
French (fr)
Other versions
WO2005033367A1 (en
Inventor
Takayuki Shimamune
Erik Zimmerman
Christer Andreasson
Original Assignee
Akzo Nobel Nv
Eka Chemicals Ab
Takayuki Shimamune
Erik Zimmerman
Christer Andreasson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akzo Nobel Nv, Eka Chemicals Ab, Takayuki Shimamune, Erik Zimmerman, Christer Andreasson filed Critical Akzo Nobel Nv
Priority to JP2006532238A priority Critical patent/JP5037133B2/en
Priority to CA2541311A priority patent/CA2541311C/en
Priority to CN2004800264108A priority patent/CN1849414B/en
Priority to PL04775517T priority patent/PL1670973T3/en
Priority to EP04775517.8A priority patent/EP1670973B1/en
Priority to AU2004277578A priority patent/AU2004277578B2/en
Publication of WO2005033367A1 publication Critical patent/WO2005033367A1/en
Publication of WO2005033367A8 publication Critical patent/WO2005033367A8/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
    • C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
    • C25B11/061—Metal or alloy
    • C25B11/063—Valve metal, e.g. titanium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide

Abstract

The present invention relates to a method of preparing an electrode comprising providing an electrode substrate, depositing on said electrode substrate a first substantially aqueous coating solution comprising precursors of a valve metal oxide and of at least two platinum group metal oxides, treating the first coating solution to provide a first metal oxide coating layer on the electrode substrate, depositing on said first coating layer a second substantially organic coating solution comprising precursors of a valve metal oxide and at least one platinum group metal oxide, wherein at least one of the precursors is in organic form, treating said second coating solution to provide a second metal oxide coating layer on the first coating layer. The invention also relates to an electrode obtainable by said method, and the use thereof.
PCT/SE2004/001428 2003-10-08 2004-10-06 Electrode WO2005033367A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006532238A JP5037133B2 (en) 2003-10-08 2004-10-06 Electrode preparation method and electrode
CA2541311A CA2541311C (en) 2003-10-08 2004-10-06 Dual-layered electrode for electrolysis
CN2004800264108A CN1849414B (en) 2003-10-08 2004-10-06 Electrode
PL04775517T PL1670973T3 (en) 2003-10-08 2004-10-06 Electrode
EP04775517.8A EP1670973B1 (en) 2003-10-08 2004-10-06 Electrode
AU2004277578A AU2004277578B2 (en) 2003-10-08 2004-10-06 Electrode

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03445107 2003-10-08
EP03445107.0 2003-10-08

Publications (2)

Publication Number Publication Date
WO2005033367A1 WO2005033367A1 (en) 2005-04-14
WO2005033367A8 true WO2005033367A8 (en) 2006-04-06

Family

ID=34400645

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/SE2004/001428 WO2005033367A1 (en) 2003-10-08 2004-10-06 Electrode

Country Status (9)

Country Link
EP (1) EP1670973B1 (en)
JP (1) JP5037133B2 (en)
KR (1) KR100787276B1 (en)
CN (2) CN1849414B (en)
AU (1) AU2004277578B2 (en)
CA (1) CA2541311C (en)
PL (1) PL1670973T3 (en)
WO (1) WO2005033367A1 (en)
ZA (1) ZA200601219B (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100812990B1 (en) * 2006-11-08 2008-03-13 고등기술연구원연구조합 Manufacturing method of mono-polar electrode
EP2390385B1 (en) * 2010-05-25 2015-05-06 Permelec Electrode Ltd. Anode for electrolysis and manufacturing method thereof
JP5456744B2 (en) * 2010-11-04 2014-04-02 ペルメレック電極株式会社 Electrolytic sampling method
IT1403585B1 (en) * 2010-11-26 2013-10-31 Industrie De Nora Spa ANODE FOR CHLORINE ELECTROLYTIC EVOLUTION
CN102400203B (en) * 2011-11-09 2014-06-18 广东达志环保科技股份有限公司 Chromium plating anode of trivalent chromium chloride system
ES2697901T3 (en) * 2014-10-27 2019-01-29 Industrie De Nora Spa Electrode for electrochlorination processes and method of manufacturing them
AR106068A1 (en) * 2015-09-25 2017-12-06 Akzo Nobel Chemicals Int Bv ELECTRODE AND PROCESS FOR ITS MANUFACTURE
AR106069A1 (en) * 2015-09-25 2017-12-06 Akzo Nobel Chemicals Int Bv ELECTRODE AND PROCESS FOR ITS MANUFACTURE
CN108299868A (en) * 2016-08-25 2018-07-20 先丰通讯股份有限公司 Catalyst coating and use its anode
CN106367779A (en) * 2016-11-07 2017-02-01 南昌专腾科技有限公司 Titanium-based porous electrode material and preparation method thereof
CN107142496A (en) * 2017-04-10 2017-09-08 广东卓信环境科技股份有限公司 Active masking liquid of a kind of internal layer and preparation method thereof
WO2019031753A1 (en) * 2017-08-11 2019-02-14 주식회사 엘지화학 Electrolytic electrode and manufacturing method therefor
KR101950465B1 (en) 2017-08-11 2019-05-02 주식회사 엘지화학 Electrode for electrolysis and preparation method thereof
CN108070877B (en) * 2017-11-09 2020-07-07 江苏安凯特科技股份有限公司 Cathode for electrolytic production and preparation method thereof
CN108048862B (en) * 2017-11-16 2020-04-28 江苏安凯特科技股份有限公司 Anode for chlorine evolution and preparation method thereof
CN108048865B (en) * 2017-11-17 2020-04-28 江苏安凯特科技股份有限公司 Electrode and preparation method and application thereof
CA3091306A1 (en) * 2018-02-26 2019-08-29 T&W Engineering A/S Electrode for detecting bioelectrical signals
KR102347982B1 (en) * 2018-06-12 2022-01-07 주식회사 엘지화학 Anode for electrolysis and preparation method thereof
EP3808449A4 (en) * 2018-06-12 2022-03-30 Japan Science and Technology Agency Catalyst and method of use thereof
KR102503040B1 (en) * 2018-12-21 2023-02-23 주식회사 엘지화학 Anode Comprising Metal Phosphide Complex and Preparation Method thereof
EP3748042A1 (en) 2019-06-03 2020-12-09 Permascand Ab Electrode assembly for electrochemical processes and method of restoring the same
CN113151885B (en) * 2021-03-15 2023-03-21 广州鸿葳科技股份有限公司 Titanium anode for electroplating and preparation method thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4070504A (en) * 1968-10-29 1978-01-24 Diamond Shamrock Technologies, S.A. Method of producing a valve metal electrode with valve metal oxide semi-conductor face and methods of manufacture and use
GB1294373A (en) * 1970-03-18 1972-10-25 Ici Ltd Electrodes for electrochemical processes
BR8006373A (en) * 1979-10-08 1981-04-14 Diamond Shamrock Corp ELECTRODE FOR USE IN ELECTRIC PROCESSES, PROCESS FOR ITS MANUFACTURING, AND USE OF THE ELECTRODE
GB2083837B (en) * 1980-08-18 1984-06-27 Diamond Shamrock Corp Manufacture of electrode with manganese dioxide coating valve metal base intermediate semiconducting layer
JPS5861286A (en) * 1981-10-08 1983-04-12 Tdk Corp Electrode for electrolysis and its production
JPH0660427B2 (en) * 1988-05-31 1994-08-10 ティーディーケイ株式会社 Oxygen generating electrode and method for manufacturing the same
JPH05209299A (en) * 1992-01-28 1993-08-20 Nippon Steel Corp Insoluble electrode and its production
US5503663A (en) * 1994-11-30 1996-04-02 The Dow Chemical Company Sable coating solutions for coating valve metal anodes
US5587058A (en) * 1995-09-21 1996-12-24 Karpov Institute Of Physical Chemicstry Electrode and method of preparation thereof
EP0867527B1 (en) * 1997-02-27 2001-03-21 Aragonesas Industrias Y Energia, S.A. Electrode with catalytic coating for electrochemical processes and manufacture thereof
JP3725685B2 (en) * 1997-11-21 2005-12-14 ペルメレック電極株式会社 Hydrogen peroxide production equipment
US6217729B1 (en) * 1999-04-08 2001-04-17 United States Filter Corporation Anode formulation and methods of manufacture
CN1179068C (en) * 2000-08-22 2004-12-08 黄永昌 Titanium base iridium dioxide electrode with tin-antiomony intermediate layer

Also Published As

Publication number Publication date
JP5037133B2 (en) 2012-09-26
KR100787276B1 (en) 2007-12-20
KR20060085676A (en) 2006-07-27
AU2004277578B2 (en) 2008-07-17
WO2005033367A1 (en) 2005-04-14
AU2004277578A1 (en) 2005-04-14
JP2007507612A (en) 2007-03-29
CA2541311C (en) 2010-06-01
CN1849414B (en) 2011-01-26
CN1849414A (en) 2006-10-18
CA2541311A1 (en) 2005-04-14
ZA200601219B (en) 2007-05-30
CN101942673A (en) 2011-01-12
EP1670973B1 (en) 2018-04-11
EP1670973A1 (en) 2006-06-21
PL1670973T3 (en) 2018-09-28

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