PL1670973T3 - Electrode - Google Patents

Electrode

Info

Publication number
PL1670973T3
PL1670973T3 PL04775517T PL04775517T PL1670973T3 PL 1670973 T3 PL1670973 T3 PL 1670973T3 PL 04775517 T PL04775517 T PL 04775517T PL 04775517 T PL04775517 T PL 04775517T PL 1670973 T3 PL1670973 T3 PL 1670973T3
Authority
PL
Poland
Prior art keywords
electrode
Prior art date
Application number
PL04775517T
Other languages
Polish (pl)
Inventor
Takayuki Shimamune
Erik Zimmerman
Christer Andreasson
Original Assignee
Permascand Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permascand Ab filed Critical Permascand Ab
Publication of PL1670973T3 publication Critical patent/PL1670973T3/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C25B11/053Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225Deposition of multilayers of inorganic material
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
    • C25B11/057Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
    • C25B11/061Metal or alloy
    • C25B11/063Valve metal, e.g. titanium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
PL04775517T 2003-10-08 2004-10-06 Electrode PL1670973T3 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03445107 2003-10-08
PCT/SE2004/001428 WO2005033367A1 (en) 2003-10-08 2004-10-06 Electrode
EP04775517.8A EP1670973B1 (en) 2003-10-08 2004-10-06 Electrode

Publications (1)

Publication Number Publication Date
PL1670973T3 true PL1670973T3 (en) 2018-09-28

Family

ID=34400645

Family Applications (1)

Application Number Title Priority Date Filing Date
PL04775517T PL1670973T3 (en) 2003-10-08 2004-10-06 Electrode

Country Status (9)

Country Link
EP (1) EP1670973B1 (en)
JP (1) JP5037133B2 (en)
KR (1) KR100787276B1 (en)
CN (2) CN1849414B (en)
AU (1) AU2004277578B2 (en)
CA (1) CA2541311C (en)
PL (1) PL1670973T3 (en)
WO (1) WO2005033367A1 (en)
ZA (1) ZA200601219B (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100812990B1 (en) * 2006-11-08 2008-03-13 고등기술연구원연구조합 Manufacturing method of mono-polar electrode
EP2390385B1 (en) * 2010-05-25 2015-05-06 Permelec Electrode Ltd. Anode for electrolysis and manufacturing method thereof
JP5456744B2 (en) * 2010-11-04 2014-04-02 ペルメレック電極株式会社 Electrolytic sampling method
IT1403585B1 (en) * 2010-11-26 2013-10-31 Industrie De Nora Spa ANODE FOR CHLORINE ELECTROLYTIC EVOLUTION
CN102400203B (en) * 2011-11-09 2014-06-18 广东达志环保科技股份有限公司 Chromium plating anode of trivalent chromium chloride system
ES2697901T3 (en) * 2014-10-27 2019-01-29 Industrie De Nora Spa Electrode for electrochlorination processes and method of manufacturing them
AR106068A1 (en) * 2015-09-25 2017-12-06 Akzo Nobel Chemicals Int Bv ELECTRODE AND PROCESS FOR ITS MANUFACTURE
AR106069A1 (en) * 2015-09-25 2017-12-06 Akzo Nobel Chemicals Int Bv ELECTRODE AND PROCESS FOR ITS MANUFACTURE
CN108299868A (en) * 2016-08-25 2018-07-20 先丰通讯股份有限公司 Catalyst coating and use its anode
CN106367779A (en) * 2016-11-07 2017-02-01 南昌专腾科技有限公司 Titanium-based porous electrode material and preparation method thereof
CN107142496A (en) * 2017-04-10 2017-09-08 广东卓信环境科技股份有限公司 Active masking liquid of a kind of internal layer and preparation method thereof
WO2019031753A1 (en) * 2017-08-11 2019-02-14 주식회사 엘지화학 Electrolytic electrode and manufacturing method therefor
KR101950465B1 (en) 2017-08-11 2019-05-02 주식회사 엘지화학 Electrode for electrolysis and preparation method thereof
CN108070877B (en) * 2017-11-09 2020-07-07 江苏安凯特科技股份有限公司 Cathode for electrolytic production and preparation method thereof
CN108048862B (en) * 2017-11-16 2020-04-28 江苏安凯特科技股份有限公司 Anode for chlorine evolution and preparation method thereof
CN108048865B (en) * 2017-11-17 2020-04-28 江苏安凯特科技股份有限公司 Electrode and preparation method and application thereof
CA3091306A1 (en) * 2018-02-26 2019-08-29 T&W Engineering A/S Electrode for detecting bioelectrical signals
KR102347982B1 (en) * 2018-06-12 2022-01-07 주식회사 엘지화학 Anode for electrolysis and preparation method thereof
EP3808449A4 (en) * 2018-06-12 2022-03-30 Japan Science and Technology Agency Catalyst and method of use thereof
KR102503040B1 (en) * 2018-12-21 2023-02-23 주식회사 엘지화학 Anode Comprising Metal Phosphide Complex and Preparation Method thereof
EP3748042A1 (en) 2019-06-03 2020-12-09 Permascand Ab Electrode assembly for electrochemical processes and method of restoring the same
CN113151885B (en) * 2021-03-15 2023-03-21 广州鸿葳科技股份有限公司 Titanium anode for electroplating and preparation method thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4070504A (en) * 1968-10-29 1978-01-24 Diamond Shamrock Technologies, S.A. Method of producing a valve metal electrode with valve metal oxide semi-conductor face and methods of manufacture and use
GB1294373A (en) * 1970-03-18 1972-10-25 Ici Ltd Electrodes for electrochemical processes
BR8006373A (en) * 1979-10-08 1981-04-14 Diamond Shamrock Corp ELECTRODE FOR USE IN ELECTRIC PROCESSES, PROCESS FOR ITS MANUFACTURING, AND USE OF THE ELECTRODE
GB2083837B (en) * 1980-08-18 1984-06-27 Diamond Shamrock Corp Manufacture of electrode with manganese dioxide coating valve metal base intermediate semiconducting layer
JPS5861286A (en) * 1981-10-08 1983-04-12 Tdk Corp Electrode for electrolysis and its production
JPH0660427B2 (en) * 1988-05-31 1994-08-10 ティーディーケイ株式会社 Oxygen generating electrode and method for manufacturing the same
JPH05209299A (en) * 1992-01-28 1993-08-20 Nippon Steel Corp Insoluble electrode and its production
US5503663A (en) * 1994-11-30 1996-04-02 The Dow Chemical Company Sable coating solutions for coating valve metal anodes
US5587058A (en) * 1995-09-21 1996-12-24 Karpov Institute Of Physical Chemicstry Electrode and method of preparation thereof
EP0867527B1 (en) * 1997-02-27 2001-03-21 Aragonesas Industrias Y Energia, S.A. Electrode with catalytic coating for electrochemical processes and manufacture thereof
JP3725685B2 (en) * 1997-11-21 2005-12-14 ペルメレック電極株式会社 Hydrogen peroxide production equipment
US6217729B1 (en) * 1999-04-08 2001-04-17 United States Filter Corporation Anode formulation and methods of manufacture
CN1179068C (en) * 2000-08-22 2004-12-08 黄永昌 Titanium base iridium dioxide electrode with tin-antiomony intermediate layer

Also Published As

Publication number Publication date
JP5037133B2 (en) 2012-09-26
KR100787276B1 (en) 2007-12-20
KR20060085676A (en) 2006-07-27
AU2004277578B2 (en) 2008-07-17
WO2005033367A1 (en) 2005-04-14
AU2004277578A1 (en) 2005-04-14
JP2007507612A (en) 2007-03-29
CA2541311C (en) 2010-06-01
CN1849414B (en) 2011-01-26
WO2005033367A8 (en) 2006-04-06
CN1849414A (en) 2006-10-18
CA2541311A1 (en) 2005-04-14
ZA200601219B (en) 2007-05-30
CN101942673A (en) 2011-01-12
EP1670973B1 (en) 2018-04-11
EP1670973A1 (en) 2006-06-21

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