JP2007507612A - 電極 - Google Patents
電極 Download PDFInfo
- Publication number
- JP2007507612A JP2007507612A JP2006532238A JP2006532238A JP2007507612A JP 2007507612 A JP2007507612 A JP 2007507612A JP 2006532238 A JP2006532238 A JP 2006532238A JP 2006532238 A JP2006532238 A JP 2006532238A JP 2007507612 A JP2007507612 A JP 2007507612A
- Authority
- JP
- Japan
- Prior art keywords
- metal oxide
- electrode
- coating layer
- coating solution
- platinum group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011248 coating agent Substances 0.000 claims abstract description 48
- 238000000576 coating method Methods 0.000 claims abstract description 48
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 36
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000011247 coating layer Substances 0.000 claims abstract description 27
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 21
- 239000002243 precursor Substances 0.000 claims abstract description 15
- 239000012702 metal oxide precursor Substances 0.000 claims abstract description 12
- 238000000151 deposition Methods 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 239000010936 titanium Substances 0.000 claims description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 18
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 18
- 229910052719 titanium Inorganic materials 0.000 claims description 18
- 239000010410 layer Substances 0.000 claims description 16
- 229910052741 iridium Inorganic materials 0.000 claims description 15
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 15
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 14
- 229910052707 ruthenium Inorganic materials 0.000 claims description 14
- 229910052762 osmium Inorganic materials 0.000 claims description 10
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 10
- -1 platinum group metal oxides Chemical class 0.000 claims description 10
- 229910052703 rhodium Inorganic materials 0.000 claims description 10
- 239000010948 rhodium Substances 0.000 claims description 10
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 10
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 229910052697 platinum Inorganic materials 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 6
- 229910052758 niobium Inorganic materials 0.000 claims description 6
- 239000010955 niobium Substances 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 4
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical group O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims 1
- 150000003304 ruthenium compounds Chemical class 0.000 claims 1
- 239000000243 solution Substances 0.000 description 44
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000002484 cyclic voltammetry Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 238000011068 loading method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- MXLMTQWGSQIYOW-UHFFFAOYSA-N 3-methyl-2-butanol Chemical compound CC(C)C(C)O MXLMTQWGSQIYOW-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 229910000457 iridium oxide Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- JYVLIDXNZAXMDK-UHFFFAOYSA-N pentan-2-ol Chemical compound CCCC(C)O JYVLIDXNZAXMDK-UHFFFAOYSA-N 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021638 Iridium(III) chloride Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000005233 alkylalcohol group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007590 electrostatic spraying Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229910001924 platinum group oxide Inorganic materials 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
- C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
- C25B11/063—Valve metal, e.g. titanium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Ceramic Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electroluminescent Light Sources (AREA)
- Chemically Coating (AREA)
- Hybrid Cells (AREA)
Abstract
Description
本発明はまた電極支持体、約10mC/cm2(ミリクーロン/cm2)から約200mC/cm2まで、好ましくは約25mC/cm2から約200mC/cm2まで、最も好ましくは約25mC/cm2から約190mC/cm2までの電荷/突出面積を有する第一の被覆層(前記第一の被覆層は前記電極支持体に付着されたバルブメタル酸化物及び少なくとも2種の白金族金属酸化物を含む)、及び前記第一の層に付着されたバルブメタル酸化物及び少なくとも一種の白金族金属酸化物を含む約210mC/cm2から約1000mC/cm2まで、更に好ましくは約250mC/cm2から約1000mC/cm2まで、最も好ましくは約300mC/cm2から約800mC/cm2までの電荷/突出面積を有する第二の被覆層を含むことを特徴とする電極に関する。
前記電極支持体は本明細書に記載されるとおりであることが好ましい。特に、この電極支持体は好適には多孔にされ、又は約1mmから約10mmまで、好ましくは約2mmから約5mmまでの直径を有する開口部を有するメッシュの形状を有する。この特定範囲内の開口部を有する電極は運転電解槽に浸漬された場合に発生ガスの小さい気泡を生じ、これが順に、特に膜電解槽中で増大された均一な電流分布及び一層低い抵抗損をもたらすことがわかった。
Claims (10)
- 電極支持体を用意し、前記電極支持体にバルブメタル酸化物及び少なくとも2種の白金族金属酸化物の前駆体を含む第一の実質的に水性の被覆溶液を付着し、この第一の被覆溶液を処理して前記電極支持体上に第一の金属酸化物被覆層を得、前記第一の被覆層にバルブメタル酸化物及び少なくとも一種の白金族金属酸化物の前駆体を含む第二の実質的に有機の被覆溶液を付着することを含む電極の調製方法であって、前記前駆体の少なくとも一種が有機形態であり、前記第二の被覆溶液を処理して前記第一の被覆層の上に第二の金属酸化物被覆層を得ることを特徴とする電極の調製方法。
- 前記白金族金属酸化物の前駆体がイリジウム、パラジウム、白金、ロジウム、オスミウム、及びルテニウムの少なくとも一種の可溶性化合物を含む、請求項1に記載の方法。
- 前記バルブメタル酸化物の前駆体がアルミニウム、ジルコニウム、ビスマス、タングステン、ニオブ、チタン、ケイ素及びタンタルの少なくとも一種の可溶性化合物である、請求項1又は2に記載の方法。
- 前記白金族金属酸化物の前駆体が一種の可溶性ルテニウム化合物並びにイリジウム、パラジウム、白金、ロジウム、及びオスミウムの少なくとも一種の可溶性化合物を含む、請求項1から3のいずれかに記載の方法。
- 前記電極支持体の材料がチタン、タンタル、ジルコニウム、ニオブ、タングステン、及びケイ素の少なくとも一種のバルブメタルを含む、請求項1から4のいずれかに記載の方法。
- 請求項1から5のいずれかに記載の方法により得られる電極。
- 電極支持体、約10mC/cm2から約200mC/cm2までの電荷/突出面積を有する第一の金属酸化物被覆層、前記電極支持体に付着されたバルブメタル酸化物及び少なくとも2種の白金族金属酸化物を含む前記第一の被覆層は、及び前記第一の層に付着されたバルブメタル酸化物及び少なくとも一種の白金族金属酸化物を含む約210mC/cm2から約1000mC/cm2までの電荷/突出面積を有する第二の金属酸化物被覆層を含むことを特徴とする電極。
- 前記白金族金属酸化物がイリジウム、白金、パラジウム、ロジウム、オスミウム、及びルテニウムの少なくとも一種の酸化物を含む、請求項7に記載の電極。
- 前記白金族金属酸化物が酸化ルテニウム並びにイリジウム、白金、パラジウム、ロジウム、及びオスミウムの少なくとも一種の酸化物から選ばれる、請求項7又は8に記載の電極。
- 電解槽中で請求項6から9のいずれかに記載の電極の使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03445107 | 2003-10-08 | ||
EP03445107.0 | 2003-10-08 | ||
PCT/SE2004/001428 WO2005033367A1 (en) | 2003-10-08 | 2004-10-06 | Electrode |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007507612A true JP2007507612A (ja) | 2007-03-29 |
JP5037133B2 JP5037133B2 (ja) | 2012-09-26 |
Family
ID=34400645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006532238A Expired - Fee Related JP5037133B2 (ja) | 2003-10-08 | 2004-10-06 | 電極の調製方法及び電極 |
Country Status (9)
Country | Link |
---|---|
EP (1) | EP1670973B1 (ja) |
JP (1) | JP5037133B2 (ja) |
KR (1) | KR100787276B1 (ja) |
CN (2) | CN101942673A (ja) |
AU (1) | AU2004277578B2 (ja) |
CA (1) | CA2541311C (ja) |
PL (1) | PL1670973T3 (ja) |
WO (1) | WO2005033367A1 (ja) |
ZA (1) | ZA200601219B (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012007235A (ja) * | 2010-05-25 | 2012-01-12 | Permelec Electrode Ltd | 電解用陽極及び電解用陽極の製造方法 |
JP2018500457A (ja) * | 2014-10-27 | 2018-01-11 | インドゥストリエ・デ・ノラ・ソチエタ・ペル・アツィオーニ | 電気塩素化プロセスのための電極及びその製造方法 |
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JP2021514727A (ja) * | 2018-02-26 | 2021-06-17 | ティ・オ・ドォッブルビィ・エンジニアリング・アー/エス | 生体電気信号を検出するための電極 |
JPWO2019240200A1 (ja) * | 2018-06-12 | 2021-07-15 | 国立研究開発法人科学技術振興機構 | 触媒及びその使用方法 |
WO2024127921A1 (ja) * | 2022-12-14 | 2024-06-20 | デノラ・ペルメレック株式会社 | 塩素発生電解用陽極 |
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KR100812990B1 (ko) * | 2006-11-08 | 2008-03-13 | 고등기술연구원연구조합 | 모노-폴라형 전극의 제조방법 |
JP5456744B2 (ja) * | 2010-11-04 | 2014-04-02 | ペルメレック電極株式会社 | 金属電解採取方法 |
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CN108299868A (zh) * | 2016-08-25 | 2018-07-20 | 先丰通讯股份有限公司 | 触媒涂料及使用其的阳极 |
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CN108048862B (zh) * | 2017-11-16 | 2020-04-28 | 江苏安凯特科技股份有限公司 | 一种析氯用阳极及其制备方法 |
CN108048865B (zh) * | 2017-11-17 | 2020-04-28 | 江苏安凯特科技股份有限公司 | 一种电极及其制备方法和应用 |
KR102347982B1 (ko) * | 2018-06-12 | 2022-01-07 | 주식회사 엘지화학 | 전기분해용 양극 및 이의 제조방법 |
EP3748042A1 (en) | 2019-06-03 | 2020-12-09 | Permascand Ab | Electrode assembly for electrochemical processes and method of restoring the same |
CN113151885B (zh) * | 2021-03-15 | 2023-03-21 | 广州鸿葳科技股份有限公司 | 一种电镀用钛阳极及其制备方法 |
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- 2004-10-06 WO PCT/SE2004/001428 patent/WO2005033367A1/en active Application Filing
- 2004-10-06 AU AU2004277578A patent/AU2004277578B2/en not_active Ceased
- 2004-10-06 ZA ZA200601219A patent/ZA200601219B/en unknown
- 2004-10-06 CA CA2541311A patent/CA2541311C/en not_active Expired - Fee Related
- 2004-10-06 JP JP2006532238A patent/JP5037133B2/ja not_active Expired - Fee Related
- 2004-10-06 CN CN2010102936821A patent/CN101942673A/zh active Pending
- 2004-10-06 PL PL04775517T patent/PL1670973T3/pl unknown
- 2004-10-06 KR KR1020067006852A patent/KR100787276B1/ko not_active IP Right Cessation
- 2004-10-06 CN CN2004800264108A patent/CN1849414B/zh not_active Expired - Fee Related
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JPS5773193A (en) * | 1980-08-18 | 1982-05-07 | Diamond Shamrock Corp | Coated electrode with dimension stability for electrolysis having oxide protecting film on base of valve metal and production thereof |
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JP2012007235A (ja) * | 2010-05-25 | 2012-01-12 | Permelec Electrode Ltd | 電解用陽極及び電解用陽極の製造方法 |
JP2018500457A (ja) * | 2014-10-27 | 2018-01-11 | インドゥストリエ・デ・ノラ・ソチエタ・ペル・アツィオーニ | 電気塩素化プロセスのための電極及びその製造方法 |
JP2021514727A (ja) * | 2018-02-26 | 2021-06-17 | ティ・オ・ドォッブルビィ・エンジニアリング・アー/エス | 生体電気信号を検出するための電極 |
JPWO2019240200A1 (ja) * | 2018-06-12 | 2021-07-15 | 国立研究開発法人科学技術振興機構 | 触媒及びその使用方法 |
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KR20200077927A (ko) * | 2018-12-21 | 2020-07-01 | 주식회사 엘지화학 | 복합 금속 인화물을 포함하는 산화 전극 및 이의 제조방법 |
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WO2024127921A1 (ja) * | 2022-12-14 | 2024-06-20 | デノラ・ペルメレック株式会社 | 塩素発生電解用陽極 |
Also Published As
Publication number | Publication date |
---|---|
CN1849414B (zh) | 2011-01-26 |
AU2004277578A1 (en) | 2005-04-14 |
CA2541311C (en) | 2010-06-01 |
WO2005033367A1 (en) | 2005-04-14 |
CN1849414A (zh) | 2006-10-18 |
CN101942673A (zh) | 2011-01-12 |
ZA200601219B (en) | 2007-05-30 |
AU2004277578B2 (en) | 2008-07-17 |
JP5037133B2 (ja) | 2012-09-26 |
KR20060085676A (ko) | 2006-07-27 |
EP1670973A1 (en) | 2006-06-21 |
PL1670973T3 (pl) | 2018-09-28 |
WO2005033367A8 (en) | 2006-04-06 |
EP1670973B1 (en) | 2018-04-11 |
CA2541311A1 (en) | 2005-04-14 |
KR100787276B1 (ko) | 2007-12-20 |
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