WO2023140134A1 - 硬化性パーフルオロポリエーテルゲル組成物、パーフルオロポリエーテルゲル硬化物、および該硬化物で封止された電気・電子部品 - Google Patents
硬化性パーフルオロポリエーテルゲル組成物、パーフルオロポリエーテルゲル硬化物、および該硬化物で封止された電気・電子部品 Download PDFInfo
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- WO2023140134A1 WO2023140134A1 PCT/JP2023/000243 JP2023000243W WO2023140134A1 WO 2023140134 A1 WO2023140134 A1 WO 2023140134A1 JP 2023000243 W JP2023000243 W JP 2023000243W WO 2023140134 A1 WO2023140134 A1 WO 2023140134A1
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- perfluoropolyether
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- curable
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- 239000010702 perfluoropolyether Substances 0.000 title claims abstract description 118
- 239000000203 mixture Substances 0.000 title claims abstract description 91
- 150000001875 compounds Chemical class 0.000 claims abstract description 48
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 17
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 claims abstract description 13
- 239000007809 chemical reaction catalyst Substances 0.000 claims abstract description 11
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 10
- 239000011347 resin Substances 0.000 claims abstract description 10
- 229920005989 resin Polymers 0.000 claims abstract description 10
- 125000000524 functional group Chemical group 0.000 claims abstract description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 15
- -1 Dimethylphenylsilylene group Chemical group 0.000 claims description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 9
- 230000035515 penetration Effects 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 6
- 239000003054 catalyst Substances 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000000499 gel Substances 0.000 description 58
- 238000001723 curing Methods 0.000 description 37
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 239000000126 substance Substances 0.000 description 16
- 239000011737 fluorine Substances 0.000 description 14
- 229910052731 fluorine Inorganic materials 0.000 description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 238000004382 potting Methods 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 238000005259 measurement Methods 0.000 description 8
- 229920001296 polysiloxane Polymers 0.000 description 7
- 239000003566 sealing material Substances 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 125000005702 oxyalkylene group Chemical group 0.000 description 5
- 238000007259 addition reaction Methods 0.000 description 4
- 230000001588 bifunctional effect Effects 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 238000005187 foaming Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 150000003058 platinum compounds Chemical class 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000000113 differential scanning calorimetry Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 125000006551 perfluoro alkylene group Chemical group 0.000 description 3
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- GRGVQLWQXHFRHO-AATRIKPKSA-N (e)-3-methylpent-3-en-1-yne Chemical compound C\C=C(/C)C#C GRGVQLWQXHFRHO-AATRIKPKSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- HMVBQEAJQVQOTI-UHFFFAOYSA-N 3,5-dimethylhex-3-en-1-yne Chemical compound CC(C)C=C(C)C#C HMVBQEAJQVQOTI-UHFFFAOYSA-N 0.000 description 1
- HFYAEUXHCMTPOL-UHFFFAOYSA-N 3-Methyl-1-penten-3-ol Chemical compound CCC(C)(O)C=C HFYAEUXHCMTPOL-UHFFFAOYSA-N 0.000 description 1
- MQSZOZMNAJHVML-UHFFFAOYSA-N 3-phenylbut-1-yn-1-ol Chemical compound OC#CC(C)C1=CC=CC=C1 MQSZOZMNAJHVML-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004970 Chain extender Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000013006 addition curing Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229920005601 base polymer Polymers 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 150000001923 cyclic compounds Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 238000000806 fluorine-19 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012764 mineral filler Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/296—Organo-silicon compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
- C08G2650/46—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen
- C08G2650/48—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen containing fluorine, e.g. perfluropolyethers
Definitions
- the present invention relates to a curable perfluoropolyether gel composition that is excellent in heat resistance, chemical resistance, low-temperature properties, adhesion, etc. after curing, and has particularly low viscosity before curing, so that even if it is used for potting, sealing materials, coating materials, etc. of electric and electronic parts, bubbles can be easily removed in a short time, and can be suitably used for improving productivity;
- Cured silicone rubber is used as a material for potting and sealing electrical and electronic parts, and as a coating material for protecting control circuit elements such as power transistors, ICs, and capacitors from external thermal and mechanical damage, utilizing its excellent electrical and thermal insulation, stable electrical properties, and flexibility.
- gel-like cured products are particularly useful for the above applications due to their low modulus.
- a typical example of a silicone rubber composition that forms such a gel-like cured product is an addition-curable organopolysiloxane composition.
- This addition-curable organopolysiloxane composition contains, for example, an organopolysiloxane having a silicon-bonded vinyl group and an organohydrogenpolysiloxane having a silicon-bonded hydrogen atom, and is known to yield a silicone gel by undergoing a cross-linking reaction in the presence of a platinum-based catalyst (Patent Documents 1, 2, and 3).
- a fluorosilicone gel composition containing an organopolysiloxane having a trifluoropropyl group is also known (Patent Document 4).
- silicone gels obtained from these addition-curing organopolysiloxane compositions tend to swell and deteriorate due to chemicals such as strong bases and strong acids, and solvents such as toluene, alcohol, and gasoline, making it difficult to maintain their performance.
- Japanese Unexamined Patent Publication No. 56-143241 Japanese Unexamined Patent Publication No. 63-35655 Japanese Patent Application Laid-Open No. 63-33475 JP-A-7-324165 JP-A-11-116685
- the present invention has been devised in view of the above circumstances, and provides a curable perfluoropolyether gel composition that is excellent in heat resistance, chemical resistance, low temperature properties, adhesion, etc. after curing, and has particularly low viscosity before curing, so that bubbles can be easily removed in a short time even when used in potting, sealing materials, coating materials, etc. of electronic and electronic parts, and can be suitably used for improving productivity; aim.
- the present invention provides a curable perfluoropolyether gel composition that contains the following components (A) to (D), has a viscosity (23° C.) of 1000 mPa ⁇ s or less before curing, and provides a perfluoropolyether gel cured product having a resin modulus of 0.1 to 200 kPa ⁇ s after curing at 25° C. of the composition.
- a curable perfluoropolyether gel composition containing components (A) to (D) as in the present invention is excellent in heat resistance, chemical resistance, low-temperature properties, moisture resistance, low gas permeability, etc. after curing.
- the viscosity before curing is low, even if it is used for potting, sealing materials, coating materials, etc. of electronic and electronic parts, bubbles can be easily eliminated in a short time.
- X' is -CH 2 -, -OCH 2 -, -CH 2 OCH 2 -, or -CO-NR 2 -Y'- (provided that Y' is -CH 2 - or a group represented by the following structural formula (Z'), (Dimethylphenylsilylene group at ortho-, meta- or para-position)
- R2 is a hydrogen atom, a methyl group, a phenyl group, or an allyl group.
- p is independently 0 or 1.
- Rf 1 is a perfluoropolyether structure represented by the general formula -[C a F 2a O] w -CF 2 - (wherein a is an integer of 1 to 6, w is an integer of 1 to 300, and has no branched structure).
- ] is a linear perfluoropolyether compound represented by the above curable perfluoropolyether gel composition.
- a curable perfluoropolyether gel composition containing such a component (A) is excellent in heat resistance, chemical resistance, low-temperature properties, moisture resistance, low gas permeability, etc. after curing, and in particular, has a low viscosity before curing, so that bubbles can be removed in a short time, and it becomes a fluorine-containing curable gel composition that can be preferably used due to improved productivity.
- a curable perfluoropolyether gel composition which is at least one linear perfluoropolyether compound selected from the group consisting of compounds represented by:
- a curable perfluoropolyether gel composition containing such a component (B) is a gel composition and a cured product thereof, in which the viscosity and modulus are moderately lowered while maintaining physical properties such as heat resistance and chemical resistance.
- Rf2- (X') p' -CH CH2 (4)
- X' is -CH 2 -, -OCH 2 -, -CH 2 OCH 2 -, or -CO-NR 2 -Y'- (provided that Y' is -CH 2 - or a group represented by the following structural formula (Z'), (Dimethylphenylsilylene group at ortho-, meta- or para-position)
- R2 is a hydrogen atom, a methyl group, a phenyl group, or an allyl group.
- p′ is 0 or 1.
- Rf 2 is a perfluoropolyether structure represented by the general formula F-[CF(CF 3 )CF 2 O] w' -CF(CF 3 )- (wherein w' is an integer of 1-300). ] as an optional component to provide a curable perfluoropolyether gel composition.
- a curable perfluoropolyether gel composition containing such a component (E) provides a cured gel with moderately reduced crosslink density while maintaining physical properties such as chemical resistance.
- the curable perfluoropolyether gel composition preferably provides a cured perfluoropolyether gel having a penetration of 5 to 80 in ASTM D-1403 (1/4 cone).
- Such a curable perfluoropolyether gel composition gives a gel cured product with moderate softness.
- the present invention also provides a cured perfluoropolyether gel obtained by curing the curable perfluoropolyether gel composition.
- Such perfluoropolyether gel cured products are excellent in heat resistance, chemical resistance, low temperature characteristics, adhesion, etc., and are useful for potting, sealing materials, coating materials, etc. of electronic and electronic parts.
- the present invention also provides electrical and electronic components sealed with a cured product of the curable perfluoropolyether gel composition (that is, perfluoropolyether gel), particularly gas pressure sensors, liquid pressure sensors, temperature sensors, humidity sensors, rotation sensors, G sensors, timing sensors, air flow meters, electronic circuits, computer control units, and semiconductor modules.
- a curable perfluoropolyether gel composition that is, perfluoropolyether gel
- curable perfluoropolyether gel composition of the present invention which leads to the improvement of production efficiency by eliminating air bubbles generated during dispensing in a short period of time, and by sealing electric and electronic parts with a perfluoropolyether gel cured product obtained by curing the composition, electronic and electronic parts excellent in heat resistance, chemical resistance, low temperature characteristics, adhesion, etc. can be manufactured with good productivity.
- the curable perfluoropolyether gel composition of the present invention is excellent in heat resistance, chemical resistance, low-temperature properties, adhesiveness, etc., and has particularly low viscosity before curing. Therefore, even if it is used as a potting material, a sealing material, a coating material, etc. for electronic and electronic parts, bubbles can be easily removed in a short time, and a curable perfluoropolyether gel composition that can be suitably used for improving productivity can be provided.
- the specific perfluoropolyether gel composition according to the present invention can provide a perfluoropolyether gel composition that can have a lower viscosity than conventional fluorine-containing gel compositions while maintaining chemical resistance and solvent resistance, which leads to improved productivity, and in particular, a composition that gives a cured product without air bubbles after curing, and has completed the present invention.
- the present invention provides the following components (A) to (D), (A) a linear perfluoropolyether compound having at least two alkenyl groups in one molecule and having a perfluoropolyether structure containing —C a F 2a O— repeating units in the main chain (provided that the main chain does not have a branched structure; a is an integer of 1 to 6): 10 to 90 parts by mass; (B) a linear perfluoropolyether compound having a perfluoropolyether structure having no reactive functional group in one molecule: 10 to 90 parts by mass (where the total of components (A) and (B) is 100 parts by mass); (C) an organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms in one molecule: a curing effective amount; (D) Hydrosilylation reaction catalyst: A curable perfluoropolyether gel composition containing a catalytic amount, wherein the viscosity (23°C) of the composition before
- the component (A) contained in the curable perfluoropolyether gel composition of the present invention acts as the main agent (base polymer) of the curable perfluoropolyether gel composition of the present invention, and is a linear perfluoropolyether compound having at least two alkenyl groups in one molecule and a perfluoropolyether structure containing repeating units of —C a F 2a O— in the main chain (provided that the main chain does not have a branched structure, a is an integer of 1 to 6), that is, a divalent perfluoropolyether compound. It is a linear perfluoropolyether compound having an oxyalkylene structure.
- the number of alkenyl groups in one molecule of the compound is 2 or more, and the upper limit is not particularly limited.
- the perfluorooxyalkylene structure includes a structure containing a large number of repeating oxyalkylene units represented by -C a F 2a O- (wherein a in each unit is independently an integer of 1 to 6), such as those represented by the following general formula (I).
- -C a F 2a O- wherein a in each unit is independently an integer of 1 to 6
- a in each unit is independently an integer of 1 to 6
- -[ CaF2aO ] w- CF2- ( I) (Wherein, w is an integer of 1 to 300, preferably an integer of 2 to 300, more preferably an integer of 5 to 250, and still more preferably an integer of 10 to 200.)
- Examples of the individual repeating structures —C a F 2a O— (ie, oxyalkylene units) constituting the perfluorooxyalkylene structure represented by formula (I) include the following structures.
- the perfluoroalkyl ether structure may be composed of one of these repeating structures alone, or may be a combination of two or more.
- the “linear” main chain means that the individual repeating units —C a F 2a O— (oxyalkylene units) constituting the perfluoropolyether structure (perfluorooxyalkylene structure) of the main chain are bonded to each other in a straight chain.
- the main chain of component (A) has a perfluoropolyether structure that does not have a branched structure (that is, does not have a branched oxyalkylene unit).
- a perfluoropolyether compound with a branched structure has a higher viscosity than a perfluoropolyether without a branched structure. Therefore, by using a perfluoropolyether having no branched structure as the component (A), it is possible to reduce the viscosity of the composition, which is necessary for improving productivity.
- the alkenyl group in the linear perfluoropolyether compound of the component (A) preferably has 2 to 8 carbon atoms, particularly 2 to 6 carbon atoms, and has a CH 2 ⁇ CH— structure at the end.
- the alkenyl group may be directly bonded to both ends of a perfluoropolyether structure, particularly a divalent perfluorooxyalkylene structure, which constitutes the main chain of the linear perfluoropolyether compound, or may be a divalent linking group such as -CH 2 -, -CH 2 O-, -CH 2 OCH 2 -, or -Y-NR-CO- [wherein Y is -CH 2 - or a group represented by the following structural formula (Z) (Dimethylphenylsilylene group at ortho-, meta- or para-position) and R is a hydrogen atom, a methyl group, a phenyl group, or an allyl group. ] or the like.
- component (A) has at
- Component (A) includes polyfluorodialkenyl compounds represented by the following general formula (5) or (6).
- X is independently -CH 2 -, -CH 2 O-, -CH 2 OCH 2 -, or -Y-NR 1 -CO- (where Y is -CH 2 - or a group represented by the following structural formula (Z)
- R 1 is a hydrogen atom, a methyl group, a phenyl group, or an allyl group
- X' is -CH 2 -, -OCH 2 -, -CH 2 OCH 2 -, or - CO-NR 2 -Y'- (where Y' is -CH 2 - or a group represented by the following structural
- Rf 1 is a divalent perfluoropolyether structure (perfluorooxyalkylene structure), preferably represented by the above formula (I), ie, -[C a F 2a O] w -CF 2 -.
- Q is a divalent hydrocarbon group having 1 to 15 carbon atoms and may contain an ether bond, specifically an alkylene group, an alkylene group optionally containing an ether bond.
- p is independently 0 or 1; ]
- the proportion of component (A) in the total 100 parts by mass of component (A) and component (B) described later is 10 to 90 parts by mass, preferably 15 to 85 parts by mass. If the blending amount is less than 10 parts by mass, the resulting composition may have extremely low modulus and fluidity.
- the linear perfluoropolyether compound of the general formula (1) preferably has a polyethylene-equivalent weight-average molecular weight of 3,000 to 100,000, particularly 4,000 to 50,000 in molecular weight distribution measurement by gel permeation chromatography (GPC) analysis using a fluorine-based solvent as a developing solvent.
- GPC gel permeation chromatography
- the weight-average molecular weight is 3,000 or more, swelling in gasoline and various solvents is reduced. In particular, the swelling with respect to gasoline is 6% or less, and the properties can be satisfied as a member required to be resistant to gasoline. Further, when the weight average molecular weight is 100,000 or less, the viscosity is not too high and the workability is excellent, which is practical.
- the value of the degree of polymerization (m+n) of the linear perfluoropolyether compound of the general formula (1) can be similarly determined as the number average degree of polymerization or the weight average degree of polymerization in terms of polyethylene in molecular weight distribution measurement by gel permeation chromatography (GPC) analysis using a fluorine-based solvent as a developing solvent.
- the number average degree of polymerization and number average molecular weight can also be calculated from the ratio of the terminal structure to the repeating unit structure obtained from the 19 F-NMR spectrum.
- the linear perfluoropolyether compound of formula (1) in order to adjust the linear perfluoropolyether compound of formula (1) to a desired weight-average molecular weight according to the purpose, it is also possible to hydrosilylate the linear perfluoropolyether compound as described above with an organosilicon compound containing two SiH groups in the molecule under normal methods and conditions, and use the product obtained by chain extension as the component (A).
- the straight-chain perfluoropolyether compound of component (A) may be used alone or in combination of two or more.
- the component (B) of the present invention is a linear perfluoropolyether compound having a perfluoropolyether structure with no reactive functional group in one molecule.
- a composition having excellent chemical resistance, solvent resistance, low-temperature properties, and low viscosity can be obtained without impairing physical properties.
- "not having a reactive functional group” means that the molecule does not have an alkenyl group and a silicon-bonded hydrogen atom (hydrosilyl group represented by SiH) involved in the hydrosilylation addition reaction, and an adhesive functional group having a hetero atom (epoxy group, alkoxysilyl group, amino group, mercapto group, etc.).
- Component (B) is clearly distinguished from component (A) described above and components (C) and (E) described below in that it does not have a reactive functional group in the molecule.
- component (B) one or more (one or two or more) linear perfluoropolyether compounds selected from the group consisting of compounds represented by the following general formulas (2) and (3) can be used.
- A—O—(CF 2 CF 2 CF 2 O) b —A (2) (Wherein, A is independently a group represented by the formula: C s F 2s+1 - (s is an integer of 1 to 3), and b is an integer of 1 to 200) AO-(CF 2 O) d (CF 2 CF 2 O) e -A(3) (Wherein, A is as described above, d and e are each an integer of 0 to 200, and d + e 1 to 250)
- component (B) includes the following (the sum of b or d and e below satisfies the above requirements).
- CF 3 O—(CF 2 CF 2 CF 2 O) b —CF 2 CF 3 CF 3 —O—[(CF 2 O) d (CF 2 CF 2 O) e ]—CF 3 (b an integer of 1 to 200, preferably an integer of 2 to 150, more preferably an integer of 5 to 120, more preferably an integer of 10 to 100; d and e are each an integer of 0 to 200, preferably an integer of 1 to 100, more preferably an integer of 5 to 80, more preferably an integer of 10 to 60; 0 to 100)
- the proportion of component (B) is 10 to 90 parts by mass, preferably 15 to 85 parts by mass, and more preferably 20 parts by mass or more. If the blending amount is less than 10 parts by mass, the viscosity of the resulting composition may increase, making it difficult to remove air bubbles, and the modulus may become extremely high, resulting in reduced adhesion to the base material.
- Component (C) acts as a cross-linking agent and/or a chain extender for component (A) or component (E) described below.
- This component (C) is an organohydrogenpolysiloxane having at least two, preferably three or more, silicon-bonded hydrogen atoms (hydrosilyl groups represented by SiH) per molecule.
- the number of alkenyl groups in one molecule of the component (C) is 2 or more, and the upper limit is not particularly limited.
- Examples of such component (C) include the known organosilicon compounds described in Patent Document 5, but are not particularly limited.
- the organohydrogenpolysiloxane of component (C) can preferably be a fluorine-containing organohydrogenpolysiloxane having one or more monovalent perfluoroalkyl groups, monovalent perfluorooxyalkyl groups, divalent perfluoroalkylene groups and/or divalent perfluorooxyalkylene groups per molecule.
- Examples of the monovalent or divalent fluorine-containing organic group include perfluoroalkyl groups, perfluorooxyalkyl groups, perfluoroalkylene groups and perfluorooxyalkylene groups represented by the following formulas.
- f is an integer of 1 to 200, preferably an integer of 1 to 100, and h is an integer of 1 to 3.
- i and j are each an integer of 1 or more, preferably an integer of 1 to 100, and the average of i+j is 2 to 200, preferably 2 to 100.
- d and e are each an integer of 1 to 50, preferably an integer of 1 to 40.
- these perfluoroalkyl groups, perfluorooxyalkyl groups, perfluoroalkylene groups or perfluorooxyalkylene groups and silicon atoms are preferably linked by a divalent linking group, and the divalent linking group may be an alkylene group, an arylene group, a combination thereof, or an ether-bonded oxygen atom, an amide bond, a carbonyl bond, an ester bond, a diorganosilylene group, or the like interposed in these groups.
- Examples of the monovalent or divalent fluorine-containing organic groups and silicon-bonded monovalent substituents other than silicon-bonded hydrogen atoms in the fluorine-containing organohydrogenpolysiloxane of component (C) include, for example, alkyl groups such as methyl, ethyl, propyl, butyl, hexyl, cyclohexyl, octyl, and decyl; alkenyl groups such as vinyl and allyl; aryl groups such as phenyl, tolyl, and naphthyl; , an aralkyl group such as a phenylethyl group, and some or all of the hydrogen atoms of these groups are substituted with a chlorine atom, a cyano group, etc., for example, a chloromethyl group, a chloropropyl group, a cyanoethyl group, etc., having 1 to 20 carbon atoms, preferably 1 to 12 unsubstituted
- the fluorine-containing organohydrogenpolysiloxane of component (C) may be cyclic, linear, branched, three-dimensional network, or a combination thereof.
- the number of silicon atoms in this fluorine-containing organohydrogenpolysiloxane is not particularly limited, it is usually about 2-60, preferably about 3-30.
- Examples of (C) components having such monovalent or divalent fluorine-containing organic groups and silicon-bonded hydrogen atoms include the following compounds. These compounds may be used singly or in combination of two or more. In the formula below, Me represents a methyl group and Ph represents a phenyl group.
- the amount of component (C) is an effective amount for curing component (A) and component (E), which will be described later, that is, an effective amount for curing.
- the amount is such that the hydrosilyl groups (Si—H) in component (C) are preferably 0.2 to 4 mol, more preferably 0.5 to 3 mol, per 1 mol of alkenyl groups in total of component (A) and (E), if present, in the composition. If the amount of hydrosilyl groups (Si—H) is 0.2 mol or more, the degree of cross-linking is sufficient, and there is no possibility that a cured product cannot be obtained. Also, if the amount of hydrosilyl groups (Si—H) is 4 mol or less, there is no fear of foaming during curing.
- the component (C) can be used singly or in combination of two or more.
- the hydrosilylation reaction catalyst (addition reaction catalyst) of component (D) of the present invention is a catalyst that promotes the addition reaction between alkenyl groups in component (A) or alkenyl groups in component (E) described below and hydrosilyl groups in component (C).
- This hydrosilylation reaction catalyst is generally a compound of a noble metal (platinum group metal) and is expensive, so relatively easily available platinum or a platinum compound is often used.
- platinum compounds include chloroplatinic acid, complexes of chloroplatinic acid and olefins such as ethylene, complexes with vinylsiloxane, and metal platinum supporting silica, alumina, carbon, or the like.
- platinum group metal catalysts other than platinum compounds rhodium , ruthenium , iridium , and palladium- based compounds are also known.
- the blending amount of the hydrosilylation reaction catalyst can be a catalytic amount, but it is usually blended in a proportion of 0.1 to 500 ppm (in terms of mass of platinum group metal) relative to the total mass of components (A), (C) and (E), and more preferably blended in a proportion of 0.1 to 100 ppm.
- the (D) component hydrosilylation reaction catalyst can be used alone or in combination of two or more.
- Component (E) is an optional component for reducing the crosslink density and modulus in the curable perfluoropolyether gel composition of the present invention, and is a polyfluoromonoalkenyl compound having one alkenyl group per molecule and a perfluoropolyether structure in the main chain.
- a polyfluoromonoalkenyl compound represented by the following general formula (4) is particularly preferred.
- Rf2- (X') p' -CH CH2 (4)
- X' is -CH 2 -, -OCH 2 -, -CH 2 OCH 2 -, or -CO-NR 2 -Y'- (where Y' is -CH 2 - or a group represented by the following structural formula (Z'), R 2 is a hydrogen atom, a methyl group, a phenyl group, or an allyl group), and p' is 0 or 1.
- Rf 2 is a perfluoropolyether structure represented by the general formula F-[CF(CF 3 )CF 2 O] w' -CF(CF 3 )- (wherein w' is an integer of 1-300). ] (Dimethylphenylsilylene group at ortho-, meta- or para-position)
- polyfluoromonoalkenyl compound represented by the general formula (4) include the following.
- m is an integer of 1 to 200, particularly an integer of 2 to 100.
- the blending amount in the curable perfluoropolyether gel composition can be selected to be 0 to 100 parts by mass, preferably 1 to 50 parts per 100 parts by mass of the components (A) and (B) in the present composition.
- the (E) component polyfluoromonoalkenyl compound may be used alone or in combination of two or more.
- Component (F) is a hydrosilylation reaction catalyst control agent (curing control agent) and is an optional component. It can be added before heat curing, for example, during preparation of the composition or use of the composition, in order to prevent the composition from thickening or gelling.
- (F) component may be used individually by 1 type, or may be used together by 2 or more types.
- the amount of component (F) to be blended is in the range of 0 to 5 parts by mass with respect to the total of 100 parts by mass of components (A), (B) and (E). If the blending amount is 5 parts by mass or less, there is no possibility that the curability of the obtained composition will be lowered.
- inorganic fillers include, for example, surface-untreated or surface-hydrophobized fumed silica (fumed silica, dry silica), precipitated silica (wet silica), colloidal silica, sol-gel silica, crystalline silica (quartz fine powder), fused silica, silica-based fillers such as crushed silica, iron oxide, zinc oxide, titanium oxide, calcium carbonate, magnesium carbonate, zinc carbonate, carbon black, etc.
- the addition of these fillers adjusts the hardness and mechanical strength of the cured gel obtained from the present composition.
- Hollow mineral fillers or rubbery spherical fillers can also be added.
- Adhesion imparting agent a known adhesive agent containing an epoxy group, an alkoxy group, or the like can be added to impart adhesiveness.
- surfactant Furthermore, a known surfactant containing a fluorine group can be added to impart antifoaming properties.
- the amount of these compounding ingredients used is arbitrary depending on the properties of the resulting composition and the physical properties of the cured product.
- the viscosity of the composition at 23°C in the present invention must be 1000 mPa ⁇ s or less. If the viscosity is higher than this, there is a risk that the time required to remove air bubbles generated during application or injection onto a base material such as an electronic component will become longer.
- the above viscosity conforms to JIS K6249 and can be measured using a TV-10M type rotational viscometer.
- the curable perfluoropolyether gel composition of the present invention gives a perfluoropolyether gel cured product by curing it. Among them, it is preferable to give a cured perfluoropolyether gel having a penetration of 5 to 80 in ASTM D-1403 (1/4 cone).
- the present composition containing the above components can be cured to form a cured product excellent in solvent resistance, chemical resistance and the like.
- the cured product is formed by a conventionally known method such as injecting the present composition into a suitable mold and curing, or coating the present composition on a suitable substrate and then curing. Curing can be easily carried out by heat treatment usually at a temperature of 60 to 150° C. for about 30 to 180 minutes.
- the cured product of the composition of the present invention has a resin modulus of 0.1 to 200 kPa ⁇ s at 25°C. If it is less than 0.1 kPa ⁇ s, the shape retention property of the gel may become difficult, and if it exceeds 200 kPa ⁇ s, the adhesion to the substrate may decrease and reliability may be impaired.
- the resin modulus means the storage elastic modulus (G') at a certain temperature measured using a known dynamic viscoelasticity measuring device under shear conditions where the shape of the sample (composition, cured product) has a thickness of 1.0 mm, a diameter of 20 mm, and a frequency of 1 Hz.
- electrical and electronic components sealed with the cured product of the present composition include gas pressure sensors, liquid pressure sensors, temperature sensors, humidity sensors, rotation sensors, G sensors, timing sensors, air flow meters, electronic circuits, semiconductor modules, various control units such as computer control units, and the like.
- % shows the mass % in the following example.
- Viscosity measurement The viscosities of the curable compositions obtained from the examples and comparative examples shown in Table 1 were measured at 23°C. The viscosity was measured according to JIS K6249 using a TV-10M type rotational viscometer.
- Solvent resistance test After filling 3 g of the compositions of Examples 1 to 4 and Comparative Examples 1 and 4 in a glass container of 32 ⁇ ⁇ 15 mm, a sample was prepared by curing at 150 ° C. for 60 minutes, immersed in xylene at 25 ° C. for 7 days, and the weight change rate before and after immersion was measured.
- composition except dynamic viscoelasticity measurement comparative example 2 was measured using a dynamic viscoelasticity measuring device with a thickness of 1.0 mm, a diameter of 20 mm, a frequency of 1 Hz, a strain of 10%, and cured at 150 ° C. for 60 minutes. After cooling, the resin modulus (storage elastic modulus G') was measured again at 25 ° C. under the same conditions.
- the glass transition point of the cured product of each composition was determined by DSC (differential scanning calorimetry) in the range of -130°C to 25°C (heating rate 5°C/min).
- Each composition was filled in the airflow meter 1 shown in FIG. 1 and subjected to 1000 cycles of -30° C. (1 hour) and 150° C. (1 hour). When no abnormality such as peeling was observed from the base material, it was evaluated as ⁇ , and when peeling was observed, it was evaluated as x.
- the airflow meter 1 has a detection section 3, and each composition 2 is filled so that the detection section 3 is partially covered.
- the gels of Examples 1 to 4 using the curable perfluoropolyether gel composition of the present invention had good adhesion by debubbling and heat shock tests after injection into the substrate.
- the cured product obtained in the above example has an appropriate penetration, has flexibility suitable for potting of electronic and electronic parts, and does not have a reactive functional group in the molecule (that is, even if it contains the component (B), which is a linear perfluoropolyether compound that does not participate in the cross-linking reaction, it exhibits sufficient solvent resistance and has excellent low-temperature characteristics due to its low glass transition temperature.
- the resin modulus is in an appropriate range, the shape retention property as a gel and the adhesion to the substrate are excellent.
- the composition of the present invention has a perfluoropolyether structure
- the cured product (perfluoropolyether gel cured product) obtained from the composition has excellent chemical resistance.
- the component (A), which is an essential component of the present invention, is excessive the resin modulus is high and the adhesion is lowered
- Comparative Example 3 in which the component (B), which is an essential component of the present invention, is excessive, the resin modulus is significantly decreased and the shape retention as a gel is deteriorated.
- Comparative Example 2 which does not contain the essential component (C) component, curing does not occur
- Comparative Example 4 which is a perfluoropolyether composition having a branched structure in the main chain of the component (A)
- the viscosity is high and bubbles are not easily removed, so foaming was confirmed in the reduced pressure treatment.
- the present invention is excellent in heat resistance, chemical resistance, low-temperature properties, adhesion, etc. after curing, and in particular, has a low viscosity before curing, so that even if it is used for potting, sealing materials, coating materials, etc. of electronic / electronic parts, bubbles can be easily removed in a short time, and it is possible to obtain a fluorine-containing curable gel composition that can be suitably used to improve productivity.
- the present invention is not limited to the above embodiments.
- the above embodiment is an example, and any device having substantially the same configuration as the technical idea described in the claims of the present invention and having similar effects is included in the technical scope of the present invention.
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Abstract
Description
また、フロロシリコーンゲル組成物として、トリフロロプロピル基を持つオルガノポリシロキサンを含有しているものが公知である(特許文献4)。
(A)1分子中に少なくとも2個のアルケニル基を有し、かつ主鎖中に-CaF2aO-の繰り返し単位を含むパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物(ただし主鎖中に分岐構造を有さない。aは1~6の整数である。):10~90質量部、
(B)1分子中に反応性官能基を有さないパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物:10~90質量部(但し、(A)成分と(B)成分の合計は100質量部である)、
(C)1分子中にケイ素原子に結合した水素原子を少なくとも2個有するオルガノハイドロジェンポリシロキサン:硬化有効量、
(D)ヒドロシリル化反応触媒:触媒量
CH2=CH-(X’)p-Rf1-(X’)p-CH=CH2(1)
[式中、X’は-CH2-、-OCH2-、-CH2OCH2-、又は-CO-NR2-Y’-(但し、Y’は-CH2-又は下記構造式(Z’)で示される基であり、
R2は水素原子、メチル基、フェニル基、又はアリル基である。)であり、pは独立に0又は1である。Rf1は、一般式-[CaF2aO]w-CF2-(式中、aは1~6の整数、wは1~300の整数で表され、分岐構造を有さない)で示されるパーフルオロポリエーテル構造である。]で表される直鎖状パーフルオロポリエーテル化合物である上記硬化性パーフルオロポリエーテルゲル組成物を提供する。
A-O-(CF2CF2CF2O)b-A(2)
(式中、Aは独立に式:CsF2s+1-(sは1~3の整数)で表わされる基であり、bは1~200の整数である)
及び
下記一般式(3)
A-O-(CF2O)d(CF2CF2O)e-A(3)
(式中、Aは前記の通りであり、dおよびeはそれぞれ0~200の整数、d+e=1~250である)
で表わされる化合物からなる群から選ばれる少なくとも1種の直鎖状パーフルオロポリエーテル化合物である硬化性パーフルオロポリエーテルゲル組成物を提供する。
Rf2-(X’)p’-CH=CH2(4)
[式中、X’は-CH2-、-OCH2-、-CH2OCH2-、又は-CO-NR2-Y’-(但し、Y’は-CH2-又は下記構造式(Z’)で示される基であり、
R2は水素原子、メチル基、フェニル基、又はアリル基である。)であり、p’は0又は1である。Rf2は、一般式F-[CF(CF3)CF2O]w’-CF(CF3)-(式中、w’は1~300の整数で表される。)で示されるパーフルオロポリエーテル構造である。]で表されるポリフルオロモノアルケニル化合物を任意成分として含有する硬化性パーフルオロポリエーテルゲル組成物を提供する。
(A)1分子中に少なくとも2個のアルケニル基を有し、かつ主鎖中に-CaF2aO-の繰り返し単位を含むパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物(ただし主鎖中に分岐構造を有さない。aは1~6の整数である。):10~90質量部、
(B)1分子中に反応性官能基を有さないパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物:10~90質量部(但し、(A)成分と(B)成分の合計は100質量部である)、
(C)1分子中にケイ素原子に結合した水素原子を少なくとも2個有するオルガノハイドロジェンポリシロキサン:硬化有効量、
(D)ヒドロシリル化反応触媒:触媒量
を含有する硬化性パーフルオロポリエーテルゲル組成物であって、硬化前の前記組成物の粘度(23℃)が1000mPa・s以下であり、かつ硬化後の25℃における樹脂モジュラスが0.1~200kPa・sであるパーフルオロポリエーテルゲル硬化物を与えるものである硬化性パーフルオロポリエーテルゲル組成物である。
本発明の硬化性パーフルオロポリエーテルゲル組成物に含まれる(A)成分は、本発明の硬化性パーフルオロポリエーテルゲル組成物の主剤(ベースポリマー)として作用するものであり、1分子中に少なくとも2個のアルケニル基を有し、かつ主鎖中に-CaF2aO-の繰り返し単位を含むパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物(ただし主鎖中に分岐構造を有さない、aは1~6の整数)、つまり二価のパーフルオロオキシアルキレン構造を有する直鎖状パーフルオロポリエーテル化合物である。前記化合物の1分子中のアルケニル基の数は2個以上であり、上限は特に限定されないが、例えば2~12個、好ましくは2~8個、より好ましくは2~6個とすることができる。
-[CaF2aO]w-CF2- (I)
(式中、wは1~300の整数、好ましくは2~300の整数、より好ましくは5~250の整数、さらに好ましくは10~200の整数である。)
-CF2CF2O-
-CF2CF2CF2O-
-CF2CF2CF2CF2O-
-CF2CF2CF2CF2CF2CF2O-
-CF2O-
-CF2CF2O-
-CF2CF2CF2O-
一方、本発明において「分岐構造」とは、主鎖のパーフルオロポリエーテル構造(パーフルオロオキシアルキレン構造)を構成する個々の繰り返し単位-CaF2aO-(オキシアルキレン単位)自体が分岐状のオキシアルキレン単位(例えば、-CF(CF3)CF2O-、-C(CF3)2O-等)であることを意味するものであって、主鎖中に「分岐構造がない」とは、主鎖のパーフルオロポリエーテル構造(パーフルオロオキシアルキレン構造)を構成する個々のパーフルオロオキシアルキレン単位が分岐のないパーフルオロオキシアルキレン単位(例えば、-CF2CF2O-、-CF2CF2CF2O-等の直鎖状のパーフルオロオキシアルキレン単位)であることを意味する。
一般的に直鎖状のパーフルオロポリエーテル構造のうち、分岐構造があるパーフルオロポリエーテル化合物は分岐構造がないパーフルオロポリエーテルよりも粘度が高くなることが知られている。よって(A)成分に分岐構造がないパーフルオロポリエーテルを使用することで生産性の向上に必要な組成物の低粘度化を達成することができる。
であり、Rは水素原子、メチル基、フェニル基、又はアリル基である。]等を介して結合していてもよい。また、(A)成分は、アルケニル基を1分子中に少なくとも2個有する。
CH2=CH-(X)p-Rf1-(X’)p-CH=CH2 (5)
CH2=CH-(X)p-Q-Rf1-Q-(X’)p-CH=CH2 (6)
[式中、Xは独立に-CH2-、-CH2O-、-CH2OCH2-、又は-Y-NR1-CO-(但し、Yは-CH2-又は下記構造式(Z)で示される基であり、R1は水素原子、メチル基、フェニル基、又はアリル基である。)であり、X’は-CH2-、-OCH2-、-CH2OCH2-、又は-CO-NR2-Y’-(但し、Y’は-CH2-又は下記構造式(Z’)で示される基であり、R2は水素原子、メチル基、フェニル基又はアリル基である。)である。
CH2=CH-(X’)p-Rf1-(X’)p-CH=CH2 (1)
[式中、X’、Rf1、pは上記の通りである。]
下記一般式(1’)
CH=CH2-(X’)p-CF2O(CF2CF2O)g(CF2O)hCF2-(X’)p-CH=CH2 (1’)
[式中、X’及びpは前記と同じであり、gおよびhはそれぞれ0~200の整数、好ましくは1~150の整数、より好ましくは5~120の整数、更に好ましくは10~100の整数、g+h=1~250、好ましくは5~240、より好ましくは10~220、更に好ましくは40~200である)で示される、分岐構造を有さないパーフルオロポリエーテル構造である。]で表されるポリフルオロジアルケニル化合物であることが好ましい。
本発明の(B)成分は、1分子中に反応性官能基を有さないパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物である。前記直鎖状パーフルオロポリエーテル化合物は、これを配合することにより、物性等を損なうことなく、耐薬品性、耐溶剤性、低温特性に優れ、かつ低粘度化した組成物を与える。
なお、本発明において、「反応性官能基を有さない」とは、ヒドロシリル化付加反応に関与するアルケニル基及びケイ素原子に結合した水素原子(SiHで示されるヒドロシリル基)、並びに、ヘテロ原子を有する接着性官能性基(エポキシ基、アルコキシシリル基、アミノ基、メルカプト基等)を分子中に有さないものであることを意味する。
(B)成分は分子中に反応性官能基を有さないものである点において、上述した(A)成分及び後述する(C)、(E)成分とは明確に区別される。
(式中、Aは独立に式:CsF2s+1-(sは1~3の整数)で表わされる基であり、bは1~200の整数である)
A-O-(CF2O)d(CF2CF2O)e-A(3)
(式中、Aは前記の通りであり、dおよびeはそれぞれ0~200の整数、d+e=1~250である)
(なお、下記bまたはdとeの和は、上記要件を満足するものである。)
CF3-O-[(CF2O)d(CF2CF2O)e]-CF3
(b=1~200の整数、好ましくは2~150の整数、より好ましくは5~120の整数、更に好ましくは10~100の整数であり、dおよびeはそれぞれ0~200の整数、好ましくは1~100の整数、より好ましくは5~80の整数、更に好ましくは10~60の整数、d+e=1~250、好ましくは5~200、より好ましくは10~150、更に好ましくは40~100である)
(C)成分は、(A)成分または後述する(E)成分の架橋剤及び/又は鎖長延長剤として作用するものである。この(C)成分は、1分子中にケイ素原子に結合した水素原子(SiHで示されるヒドロシリル基)を少なくとも2個、好ましくは3個以上有するオルガノハイドロジエンポリシロキサンである。前記(C)成分の1分子中のアルケニル基の数は2個以上であり、上限は特に限定されないが、例えば2~50個、好ましくは3~30個、より好ましくは3~20個とすることができる。かかる(C)成分としては、前記特許文献5に記載の公知の有機ケイ素化合物が挙げられるが、特に限定されるものではない。
-CgF2g-
(式中、gは1~20の整数、好ましくは2~10の整数である。)
(式中、d及びeはそれぞれ1~50の整数、好ましくは1~40の整数である。)
-CH2CH2-、
-CH2CH2CH2-、
-CH2CH2CH2OCH2-、
-CH2CH2CH2-NH-CO-、
-CH2CH2CH2-N(Ph)-CO-、
-CH2CH2CH2-N(CH3)-CO-、
-CH2CH2CH2-N(CH2CH3)-CO-、
-CH2CH2-Si(CH3)2-Ph’-N(CH3)-CO-、
-CH2CH2CH2-Si(CH3)2-Ph’-N(CH3)-CO-、
-CH2CH2CH2-O-CO-
(式中、Phはフェニル基であり、Ph’はフェニレン基である。)
本発明の(D)成分のヒドロシリル化反応触媒(付加反応触媒)は、(A)成分中のアルケニル基、あるいは後述する(E)成分中のアルケニル基と、(C)成分中のヒドロシリル基との付加反応を促進する触媒である。このヒドロシリル化反応触媒は、一般に貴金属(白金族金属)の化合物であり、高価格であることから、比較的入手しやすい白金又は白金化合物がよく用いられる。
(E)成分は、本発明の硬化性パーフルオロポリエーテルゲル組成物において、架橋密度を低下させて低モジュラス化させるための任意の成分であり、1分子中に1個のアルケニル基を有し、かつ主鎖中にパーフルオロポリエーテル構造を有する、ポリフルオロモノアルケニル化合物である。特に、下記一般式(4)のポリフルオロモノアルケニル化合物が好ましい。
Rf2-(X’)p’-CH=CH2(4)
[式中、X’は-CH2-、-OCH2-、-CH2OCH2-、又は-CO-NR2-Y’-(但し、Y’は-CH2-又は下記構造式(Z’)で示される基であり、R2は水素原子、メチル基、フェニル基、又はアリル基である。)であり、p’は0又は1である。Rf2は、一般式F-[CF(CF3)CF2O]w’-CF(CF3)-(式中、w’は1~300の整数で表される。)で示されるパーフルオロポリエーテル構造である。]
本組成物においては、上記の(A)~(E)成分以外にも、各種配合剤を添加することは任意である。
(F)成分はヒドロシリル化反応触媒の制御剤(硬化制御剤)であり任意成分である。加熱硬化前、例えば上記組成物の調合時または該組成物の使用時に、上記組成物が増粘又はゲル化を起こさないようにするために添加することができる。例えば1-エチニル-1-ヒドロキシシクロヘキサン、3-メチル-1-ブチン-3-オール、3,5-ジメチル-1-ヘキシン-3-オール、3-メチル-1-ペンテン-3-オール、フェニルブチノールなどのアセチレンアルコールや、3-メチル-3-ペンテン-1-イン、3,5-ジメチル-3-ヘキセン-1-イン等、あるいはポリメチルビニルシロキサン環式化合物、有機リン化合物等が挙げられ、その添加により硬化反応性と保存安定性を適度に保つことができる。なお、(F)成分は1種単独で使用しても2種以上で併用してもよい。
その他、無機質充填剤として、例えば、表面未処理又は表面疎水化処理の煙霧質シリカ(ヒュームドシリカ、乾式シリカ)、沈降性シリカ(湿式シリカ)、コロイダルシリカ、ゾルゲルシリカ、結晶性シリカ(石英微粉末)、溶融シリカ、破砕シリカ等のシリカ系充填剤、酸化鉄、酸化亜鉛、酸化チタン、炭酸カルシウム、炭酸マグネシウム、炭酸亜鉛、カーボンブラック等が挙げられ、その添加により本組成物から得られるゲル状硬化物の硬さ・機械的強度を調整することができる。中空無機質充填剤またはゴム質の球状充填剤も添加できる。
また、接着性を付与するためにエポキシ基、アルコキシ基等を含有する、公知の接着性付与剤を添加することもできる。
更に、消泡性を付与するためフッ素基を含有する公知の界面活性剤を添加することもできる。
上記各成分を含有する本組成物は、これらを硬化させることにより耐溶剤性、耐薬品性等に優れた硬化物を形成させることができる。
また、本組成物の硬化物により封止された電気・電子部品としては、ガス圧センサー、液圧センサー、温度センサー、湿度センサー、回転センサー、Gセンサー、タイミングセンサー、エアフローメーター、電子回路、半導体モジュール、コンピューターコントロールユニットなどの各種コントロールユニット等が挙げられる。
下記原料を使用し、表1に示す硬化性パーフルオロポリエーテルゲル組成物を調製し、下記方法によって各組成物の粘度測定、発泡試験およびヒートショック試験を行った。また、これらのゲル組成物を150℃、60分の硬化条件にて硬化し、下記方法によって、それぞれの硬化物の針入度、耐溶剤性試験、動的粘弾性測定、DSC測定を行った。結果を表1に併記する。
(A)直鎖状パーフルオロポリエーテル化合物
(a-1)2官能性パーフルオロポリエーテル(パーフルオロポリエーテル1)
CH2=CH―CH2―O―CH2―Rf―CH2―O-CH2―CH=CH2
(Rf:-CF2O(CF2CF2O)21(CF2O)22CF2-、
ただし繰り返し単位CF2CF2OとCF2Oの配列はランダムである)
CH2=CH―CH2―O―CH2―Rf―CH2―O-CH2―CH=CH2
(Rf:-CF2O(CF2CF2O)91(CF2O)83CF2-、
ただし繰り返し単位CF2CF2OとCF2Oの配列はランダムである)
CH2=CH―CH2―O―CH2―Rf―CH2―O-CH2―CH=CH2
(式中、Rf:-CF2O(CF2CF2CF2CF2O)1(CF2CF2CF2O)1(CF2CF2O)39(CF2O)19CF2-、但し、各繰り返し単位;CF2CF2CF2CF2O、CF2CF2CF2O、CF2CF2O及びCF2Oの配列はランダムである)
(b-1)パーフルオロポリエーテル5
CF3O-(CF2CF2CF2O)b-C2F5(式中、b=27)
CF3-O-[(CF2O)d(CF2CF2O)e]-CF3
(d+e=60、d=20,e=40(平均))
表1に記載の実施例、比較例より得られた硬化性組成物について23℃で粘度を測定した。尚、粘度の測定はJIS K6249に準拠し、TV-10M型回転粘度計を使用した。
得られた組成物をそれぞれφ30×14mmのガラスシャーレに12g入れ5分間静置した。その後、ガラスシャーレごとデシケーターに入れて減圧脱泡を行い、組成物から発泡しなかったものを○、発泡したものを×とした。
得られた組成物をそれぞれφ30×14mmのガラスシャーレに入れ、150℃、60分の条件にて硬化させたサンプルを作製し、針入度を測定した。尚、硬化物の針入度はASTM D-1403に準じ、1/4コーンで測定を行った。
32φ×15mmガラス容器内に実施例1~4及び比較例1及び4の組成物を3g充填した後、150℃、60分間の条件にて硬化させたサンプルを作製し、キシレンに25℃にて7日間浸漬し、浸漬前と後の重量変化率を測定した。
比較例2を除く各組成物を、動的粘弾性測定装置を用いて厚さ1.0mm、直径20mm、周波数1Hz、歪み10%で150℃、60分間測定、硬化を行い、その後冷却し同条件にて再度25℃での樹脂モジュラス(貯蔵弾性率G’)を測定した。
各組成物の硬化物について-130℃~25℃(昇温速度5℃/分)の範囲についてDSC(示差走査熱量測定)によりガラス転移点を求めた。
各組成物を図1に示すエアフロメーター1に充填し、-30℃(1時間)と150℃(1時間)のサイクルを1000サイクル行った。基材から剥離等の異常が認められなかったものを○、剥離が認められたものを×とした。なお、エアフロメーター1は、検出部3を備え、各組成物2を検出部3が一部覆われるように充填している。
それに対し、本発明の必須成分である(A)成分が過剰な比較例1では樹脂モジュラスが高く密着性が低下し、必須成分の(B)成分が過剰な比較例3では樹脂モジュラスが著しく低下しゲルとしての形状保持性に悪化が見られた。また必須成分である(C)成分が含まれない比較例2は硬化には至らず、また(A)成分の主鎖中に分岐構造を有するパーフルオロポリエーテル組成物である比較例4では粘度が高く泡抜けが悪いため減圧処理にて発泡が確認された。
Claims (8)
- 下記(A)~(D)成分、
(A)1分子中に2個以上のアルケニル基を有し、かつ主鎖中に-CaF2aO-の繰り返し単位を含むパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物(ただし主鎖中に分岐構造を有さない。aは1~6の整数である。):10~90質量部、
(B)1分子中に反応性官能基を有さないパーフルオロポリエーテル構造を有する直鎖状パーフルオロポリエーテル化合物:10~90質量部(但し、(A)成分と(B)成分の合計は100質量部である)、
(C)1分子中にケイ素原子に結合した水素原子を2個以上有するオルガノハイドロジェンポリシロキサン:硬化有効量、
(D)ヒドロシリル化反応触媒:触媒量
を含有する硬化性パーフルオロポリエーテルゲル組成物であって、硬化前の前記組成物の粘度(23℃)が1000mPa・s以下であり、かつ硬化後の25℃における樹脂モジュラスが0.1~200kPa・sであるパーフルオロポリエーテルゲル硬化物を与えるものである硬化性パーフルオロポリエーテルゲル組成物。 - 前記(A)成分が、下記一般式(1)
CH2=CH-(X’)p-Rf1-(X’)p-CH=CH2(1)
[式中、X’は-CH2-、-OCH2-、-CH2OCH2-、又は-CO-NR2-Y’-(但し、Y’は-CH2-又は下記構造式(Z’)で示される基であり、
R2は水素原子、メチル基、フェニル基、又はアリル基である。)であり、pは独立に0又は1である。Rf1は、一般式-[CaF2aO]w-CF2-(式中、aは1~6の整数、wは1~300の整数で表され、分岐構造を有さない)で示されるパーフルオロポリエーテル構造である。]で表される直鎖状パーフルオロポリエーテル化合物である請求項1に記載の硬化性パーフルオロポリエーテルゲル組成物。 - 前記(B)成分が、下記一般式(2)
A-O-(CF2CF2CF2O)b-A(2)
(式中、Aは独立に式:CsF2s+1-(sは1~3の整数)で表わされる基であり、bは1~200の整数である)
及び
下記一般式(3)
A-O-(CF2O)d(CF2CF2O)e-A(3)
(式中、Aは前記の通りであり、dおよびeはそれぞれ0~200の整数、d+e=1~250である)
で表わされる化合物からなる群から選ばれる1種以上の直鎖状パーフルオロポリエーテル化合物であることを特徴とする請求項1または2に記載の硬化性パーフルオロポリエーテルゲル組成物。 - 更に(E)成分として、下記一般式(4)
Rf2-(X’)p’-CH=CH2(4)
[式中、X’は-CH2-、-OCH2-、-CH2OCH2-、又は-CO-NR2-Y’-(但し、Y’は-CH2-又は下記構造式(Z’)で示される基であり、
R2は水素原子、メチル基、フェニル基、又はアリル基である。)であり、p’は0又は1である。Rf2は、一般式F-[CF(CF3)CF2O]w’-CF(CF3)-(式中、w’は1~300の整数で表される。)で示されるパーフルオロポリエーテル構造である。]で表されるポリフルオロモノアルケニル化合物を含むものである請求項1~3のいずれか1項に記載の硬化性パーフルオロポリエーテルゲル組成物。 - ASTM D-1403(1/4コーン)における針入度が5~80であるパーフルオロポリエーテルゲル硬化物を与えるものである請求項1~4のいずれか1項に記載の硬化性パーフルオロポリエーテルゲル組成物。
- 請求項1~5のいずれか1項に記載の硬化性パーフルオロポリエーテルゲル組成物を硬化してなるパーフルオロポリエーテルゲル硬化物。
- 請求項6に記載のパーフルオロポリエーテルゲル硬化物で封止された電気・電子部品。
- 前記電気・電子部品が、ガス圧センサー、液圧センサー、温度センサー、湿度センサー、回転センサー、Gセンサー、タイミングセンサー、エアフローメーター、電子回路、コンピューターコントロールユニット及び半導体モジュールからなる群から選ばれるいずれかである請求項7に記載の電気・電子部品。
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JP2023575198A JPWO2023140134A1 (ja) | 2022-01-24 | 2023-01-10 | |
CN202380018220.4A CN118715285A (zh) | 2022-01-24 | 2023-01-10 | 固化性全氟聚醚凝胶组合物、全氟聚醚凝胶固化物、及用该固化物密封的电气及电子构件 |
KR1020247024775A KR20240134142A (ko) | 2022-01-24 | 2023-01-10 | 경화성 퍼플루오로폴리에테르 겔 조성물, 퍼플루오로폴리에테르 겔 경화물, 및 이 경화물로 봉지된 전기·전자부품 |
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JP2022008714 | 2022-01-24 |
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JP (1) | JPWO2023140134A1 (ja) |
KR (1) | KR20240134142A (ja) |
CN (1) | CN118715285A (ja) |
TW (1) | TW202336153A (ja) |
WO (1) | WO2023140134A1 (ja) |
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JPS56143241A (en) | 1980-04-11 | 1981-11-07 | Toshiba Silicone Co Ltd | Polyorganosiloxane composition |
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JP2013035904A (ja) * | 2011-08-04 | 2013-02-21 | Shin-Etsu Chemical Co Ltd | コーティング又はポッティング用液剤及びその製造方法、被覆層の形成方法、並びに該被覆層を有する物品 |
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2023
- 2023-01-10 JP JP2023575198A patent/JPWO2023140134A1/ja active Pending
- 2023-01-10 WO PCT/JP2023/000243 patent/WO2023140134A1/ja unknown
- 2023-01-10 CN CN202380018220.4A patent/CN118715285A/zh active Pending
- 2023-01-10 KR KR1020247024775A patent/KR20240134142A/ko unknown
- 2023-01-12 TW TW112101341A patent/TW202336153A/zh unknown
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JPS56143241A (en) | 1980-04-11 | 1981-11-07 | Toshiba Silicone Co Ltd | Polyorganosiloxane composition |
JPS6333475A (ja) | 1986-07-22 | 1988-02-13 | バイエル・アクチエンゲゼルシヤフト | 軟質シリコ−ンエラストマ− |
JPS6335655A (ja) | 1986-07-30 | 1988-02-16 | Toshiba Silicone Co Ltd | シリコ−ンゲル組成物 |
JPH07324165A (ja) | 1993-06-17 | 1995-12-12 | Shin Etsu Chem Co Ltd | チキソ性フルオロシリコーンゲル組成物 |
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JP2006022223A (ja) * | 2004-07-08 | 2006-01-26 | Shin Etsu Chem Co Ltd | 硬化性フルオロポリエーテル組成物 |
JP2010077267A (ja) * | 2008-09-25 | 2010-04-08 | Fujifilm Corp | 含フッ素ポリエーテル系化合物を含有する硬化性組成物 |
JP2010189602A (ja) * | 2009-02-20 | 2010-09-02 | Shin-Etsu Chemical Co Ltd | 硬化性フルオロポリエーテル組成物、該組成物から得られる微粉末状又はペースト状の重合生成物、及び該重合生成物の製造方法 |
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JP2013035904A (ja) * | 2011-08-04 | 2013-02-21 | Shin-Etsu Chemical Co Ltd | コーティング又はポッティング用液剤及びその製造方法、被覆層の形成方法、並びに該被覆層を有する物品 |
Also Published As
Publication number | Publication date |
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JPWO2023140134A1 (ja) | 2023-07-27 |
KR20240134142A (ko) | 2024-09-06 |
TW202336153A (zh) | 2023-09-16 |
CN118715285A (zh) | 2024-09-27 |
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