WO2020090757A1 - 導電性樹脂組成物、導電性接着剤、および半導体装置 - Google Patents
導電性樹脂組成物、導電性接着剤、および半導体装置 Download PDFInfo
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- WO2020090757A1 WO2020090757A1 PCT/JP2019/042214 JP2019042214W WO2020090757A1 WO 2020090757 A1 WO2020090757 A1 WO 2020090757A1 JP 2019042214 W JP2019042214 W JP 2019042214W WO 2020090757 A1 WO2020090757 A1 WO 2020090757A1
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- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29339—Silver [Ag] as principal constituent
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83855—Hardening the adhesive by curing, i.e. thermosetting
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/0781—Adhesive characteristics other than chemical being an ohmic electrical conductor
Definitions
- the present invention relates to a conductive resin composition, a conductive adhesive containing this conductive resin composition, and a semiconductor device containing these cured products.
- the present invention relates to a conductive resin composition that can be used in the field of flexible hybrid electronics, a conductive adhesive containing this conductive resin composition, and a semiconductor device containing these cured products.
- FHE flexible hybrid electronics
- a conductive epoxy resin adhesive for adhering an LED chip or an LD chip to a lead frame “(a) a polyimide silicone resin having two or more phenolic hydroxyl groups in one molecule, (b) A curable resin composition characterized by containing an epoxy resin and (c) a conductive metal powder "has been reported (Patent Document 1).
- this curable resin composition is a low temperature curable conductive adhesive, it has a problem that peeling, cracking or the like occurs in the adhesive because it does not have low elasticity, that is, has no flexibility.
- the low-temperature fast-curing low-elasticity conductive adhesive which is currently required as a conductive adhesive for mounting components in the FHE field, does not have sufficient properties.
- An object of the present invention is to provide a low-temperature fast-curing low-elasticity conductive adhesive useful as a conductive adhesive for mounting components for the FHE field.
- the present invention relates to a conductive resin composition, a conductive adhesive, and a semiconductor device that have the following configurations to solve the above problems.
- (B) radically polymerizable monomer A conductive resin composition comprising (C) a free radical generating curing agent and (D) conductive particles.
- the component (A) contains (A1) a high molecular weight urethane acrylate oligomer having a weight average molecular weight of 10,000 or more and (A2) a low molecular weight urethane acrylate oligomer having a weight average molecular weight of 9999 or less.
- Conductive resin composition [3] The conductive resin composition according to the above [1] or [2], wherein the component (B) contains (B1) a monofunctional radically polymerizable monomer and (B2) a polyfunctional radically polymerizable monomer. [4] (B2) The polyfunctional radical-polymerizable monomer has two or more (meth) acryloyl groups in one molecule, and has a linear carbon number between two adjacent (meth) acryloyl groups. 4. The conductive resin composition according to claim 3, wherein is an alkylene skeleton having 4 to 30 or a linear oxyalkylene skeleton having 4 to 30 carbon atoms.
- a conductive resin composition suitable for a low-temperature fast-curing low-elasticity conductive adhesive useful as a conductive adhesive for mounting components for the FHE field.
- a low-temperature fast-curing low-elasticity conductive adhesive useful as a component mounting conductive adhesive for the FHE field it is possible to provide a low-temperature fast-curing low-elasticity conductive adhesive useful as a component mounting conductive adhesive for the FHE field.
- a highly reliable semiconductor device can be obtained by using a cured product of a conductive resin composition suitable for a low-temperature fast-curing low-elasticity conductive adhesive useful as a conductive adhesive for mounting components for the FHE field. Obtainable.
- the conductive resin composition of the present invention (A) at least two types of urethane acrylate oligomers, (B) radically polymerizable monomer, (C) a free radical generating curing agent, and (D) conductive particles.
- the at least two kinds of urethane acrylate oligomers as the component (A) give the conductive resin composition after curing an appropriate elastic modulus, electrical characteristics, good handleability of the conductive resin composition, and good workability. ..
- the component (A) is composed of at least two kinds of urethane acrylate oligomers having different weight average molecular weights from the viewpoint of the elastic modulus of the cured conductive resin composition, the electrical characteristics, the handleability of the conductive resin composition and the workability. It is preferable to include.
- the component (A) preferably contains (A1) a high molecular weight urethane acrylate oligomer having a weight average molecular weight of 10,000 or more and (A2) a low molecular weight urethane acrylate oligomer having a weight average molecular weight of 9999 or less.
- Mw refers to a polystyrene equivalent weight average molecular weight using a calibration curve based on standard polystyrene by gel permeation chromatography (GPC) method.
- the conductive resin composition has good handleability, does not impair workability, and has low elasticity and good elasticity of the conductive resin composition after curing. It is possible to obtain excellent extensibility.
- the weight average molecular weight of the high molecular weight urethane acrylate oligomer (A1) having a weight average molecular weight of 10,000 or more is preferably 10,000 or more and 200,000 or less, more preferably 11,000 or more and 150,000 or less, and further preferably 13,000. The above range is 100,000 or less, and particularly preferably 14,000 or more and 80,000 or less.
- one type of the component (A) is a high molecular weight urethane acrylate oligomer having a weight average molecular weight of 10,000 or more, it is possible to obtain low elasticity and good extensibility of the conductive resin composition after curing.
- the weight average molecular weight of the (A2) low molecular weight urethane acrylate oligomer having a weight average molecular weight of 9999 or less is preferably 500 or more, more preferably 800 or more, further preferably 1000 or more, and preferably 8500 or less. , And more preferably 8000 or less.
- the component (A) is a low molecular weight urethane acrylate oligomer having a weight average molecular weight of 9999 or less, the workability of the conductive resin composition is not impaired, good workability is maintained, and the conductivity after curing is improved. It is possible to obtain low elasticity and good stretchability of the resin composition.
- Examples of commercially available products of the component (A1) include urethane acrylate oligomer (product name: CN9071) manufactured by Sartomer and urethane acrylate oligomer (product name: CNJ966J75) manufactured by Sartomer.
- urethane acrylate oligomer product name: CN9071
- urethane acrylate oligomer product name: CNJ966J75
- one type may be used alone, or two or more types may be used in combination.
- Examples of commercially available products of the component (A2) include urethane acrylate oligomer (product name: UN-6200) manufactured by Negami Kogyo Co., Ltd. and urethane acrylate oligomer (product name: Beamset 577) manufactured by Arakawa Chemical Co., Ltd.
- urethane acrylate oligomer product name: UN-6200
- urethane acrylate oligomer product name: Beamset 577 manufactured by Arakawa Chemical Co., Ltd.
- the component (A2) one type may be used alone, or two or more types may be used in combination.
- the radically polymerizable monomer as the component (B) gives the conductive resin composition after curing an appropriate elastic modulus, electrical characteristics, good handleability of the conductive resin composition, and good workability. Further, by using the component (B) and the component (A1) together, the elastic modulus is low and the elongation is low after curing while maintaining good handleability of the conductive resin composition and maintaining good workability. A large and flexible cured product can be obtained.
- the component (B) is composed of (B1) a monofunctional radically polymerizable monomer and (B2) a polyfunctional monomer from the viewpoints of appropriate elastic modulus, electrical characteristics, and handleability of the conductive resin composition of the cured conductive resin composition. It is preferable to include a functional radically polymerizable monomer.
- the conductive resin composition contains the (B1) monofunctional radically polymerizable monomer as the component (B), the reactivity is improved, the handleability of the conductive resin composition is improved, and good workability can be maintained. .. .
- the conductive resin composition contains the (B2) polyfunctional radically polymerizable monomer as the (B) component, the relatively long chain (B2) component has a large elastic modulus of the conductive resin composition after curing. The reactivity of the conductive resin composition can be improved without changing.
- the (B2) polyfunctional radically polymerizable monomer has two or more (meth) acryloyl groups in one molecule, and a linear alkylene having 4 to 30 carbon atoms is provided between the adjacent (meth) acryloyl groups. It is preferable that the skeleton or the straight chain has an oxyalkylene skeleton having 4 to 30 carbon atoms.
- the polyfunctional radical-polymerizable monomer has two or more (meth) acryloyl groups in one molecule, and a linear alkylene skeleton having 4 to 30 carbon atoms between adjacent (meth) acryloyl groups.
- a cured product having a low elastic modulus and a large elongation after curing and having appropriate flexibility can be obtained.
- B2 When the straight chain carbon number of the alkylene skeleton or the oxyalkylene skeleton between the adjacent (meth) acryloyl groups of the polyfunctional radically polymerizable monomer is 4 to 30, it has a relatively long chain skeleton,
- the storage elastic modulus of the conductive resin composition after curing is specifically 1 GPa or less, a low elastic modulus and a large elongation ratio, and a cured product having good elongation can be obtained.
- the alkylene group or oxyalkylene group between the adjacent (meth) acryloyl groups of the polyfunctional radical-polymerizable monomer (B2) may have a branched chain as long as the linear carbon number is 4 to 30. ..
- one type may be used alone, or two or more types may be used in combination.
- a commercially available product of the component (B1) is Isobornyl acrylate (product name: SR506A) manufactured by Sartomer.
- Examples of the component (B2) include dipropylene glycol diacrylate and polyethylene glycol diacrylate represented by the following formula (2), wherein n in the formula (2) is an integer of 2 to 15.
- n is an integer of 2 to 15.
- Examples of commercially available products of the component (B2) include dipropylene glycol diacrylate manufactured by Sartomer (product name: SR508N), polyethylene diacrylate manufactured by Kyoeisha Chemical Co., Ltd. (product name: light acrylate 9EG-A, product name: light acrylate 14EG-A). ) And the like.
- the component (B2) one type may be used alone, or two or more types may be used in combination.
- the free radical generating curing agent which is the component (C) cures the components (A) and (B).
- the component (C) is preferably a peroxide from the viewpoint of reactivity with the components (A) and (B).
- the peroxide of the component (C) preferably has a 10-hour half-life temperature of 165 ° C. or lower.
- the conductive resin composition can be cured at a relatively low temperature, and the electronic component can be damaged by heat. It is possible to mount an electronic component on a flexible wiring board or the like by using the conductive resin composition without applying it.
- the 10-hour half-life temperature is the temperature at which the time until the amount of the peroxide decomposes to become 1/2 (1/2) is 10 hours.
- the peroxide When the component (C) is a peroxide, the peroxide preferably has a 10-hour half-life temperature of 30 ° C. or higher. When the 10-hour half-life of the peroxide of the component (C) is less than 30 ° C., the reactivity of the components (A) and (B) becomes too high, and the stability may decrease.
- peroxide as the component (C)
- peroxydicarbonate product name: Perloyl TCP, NOF CORPORATION, 10-hour half-life temperature: 40.8 ° C.
- 1,1,3,3-tetra Methylbutylperoxy-2-ethylhexanoate Product name: Perocta O, NOF Corporation, 10-hour half-life temperature: 65.3 ° C
- t-butylcumyl peroxide Product name: Perbutyl C, NOF Corporation) 10-hour half-life temperature: 119.5 ° C
- dicumyl peroxide product name: Park Mill D, NOF CORPORATION, 10-hour half-life temperature: 116.4 ° C
- dilauroyl peroxide product name: perloyl L, NOF Corporation, 10-hour half-life temperature: 61.6 ° C
- dibenzoyl peroxide product name: Niper FF, NOF Corporation, 10-hour half-life temperature: 73.6 °
- the conductive particles as the component (D) impart conductivity to the conductive resin composition.
- the component (D) conventionally known conductive particles such as metal particles of gold, silver, nickel, copper, solder or the like, carbon particles, or plastic particles metal-plated can be used.
- the component (D) silver particles are preferable from the viewpoint of conductivity.
- the shape of the conductive particles is not particularly limited, but a flake shape is preferable from the viewpoint of conductivity and suppression of decomposition of the component (C) due to a redox reaction.
- the flake shape means a shape having a ratio of "major axis / minor axis" (aspect ratio) of 2 or more, and includes a plate shape such as a plate shape or a scale shape.
- the "major axis" means the longest diameter of the line segment that passes through the substantial center of gravity of the particle in the particle image obtained by SEM.
- the shape of the silver particles may be a combination of silver particles having different shapes.
- the tap density is preferably 2.0 g / cm 3 or more, more preferably 3.0 to 6.0 g / cm 3 .
- the tap density is measured according to JIS Z 2512 metal powder-tap density measuring method. If the tap density of the silver particles is too low, it is difficult to disperse the silver particles in the cured product of the conductive resin composition at a high density, and the conductivity of the cured product is likely to decrease. On the other hand, if the tap density of the silver particles is too high, the silver particles are likely to separate and settle in the conductive resin composition.
- the average particle size (D 50 ) is preferably 0.05 to 50 ⁇ m, and 0.1 to 50 ⁇ m from the viewpoint of conductivity and fluidity of the conductive resin composition.
- the thickness is more preferably 20 ⁇ m, most preferably 0.1 to 15 ⁇ m.
- the average particle size refers to a particle size (median size) having a cumulative frequency of 50% in a volume-based particle size distribution measured by a laser diffraction method.
- the specific surface area of the silver particles is preferably 1.5 m 2 / g or less, more preferably 0.1 to 0.6 m 2 / g.
- the specific surface area is measured by the BET method. If the specific surface area of the silver particles is too large, the viscosity during paste formation tends to increase, the handleability tends to deteriorate, and the workability tends to decrease. On the other hand, when the specific surface area of the silver particles is too small, the contact area between the silver particles becomes small and the conductivity decreases.
- component (D) examples include silver powder (product name: AA-9829N) manufactured by Metalor Technologies SA.
- the component (A) is 20 to 79.9 parts by mass based on 100 parts by mass of the total of the components (A), (B) and (C). And more preferably 40 to 62 parts by mass.
- the elastic modulus tends to be high, that is, flexibility tends to be small
- the amount of component (A) is too large, the viscosity is high, the handleability is lowered, and the workability is easily lowered.
- the resistance value tends to increase due to the steric hindrance of the component (A).
- the component (A1) is preferably 10 to 40 parts by mass, and 20 to 40 parts by mass with respect to 100 parts by mass in total of the components (A), (B) and (C).
- the component (A2) is preferably 10 to 60 parts by mass, and more preferably 20 to 40 parts by mass, based on 100 parts by mass of the total of the components (A), (B) and (C).
- the ratio of the (A1) high-molecular urethane acrylate oligomer is too low, that is, if the ratio of the low-molecular urethane acrylate oligomer is too high, the elastic modulus tends to increase, that is, the flexibility tends to decrease.
- the conductive resin composition is easy to handle and has good workability, and after curing. The electrical characteristics of the conductive resin composition are degraded.
- the component (B) is preferably 20 to 70 parts by mass, and more preferably 35 to 60 parts by mass, based on 100 parts by mass of the total of the components (A), (B) and (C). ..
- the amount of the component (B) is too small, the viscosity of the conductive resin composition is high, the handleability of the conductive resin composition is deteriorated, the workability is easily deteriorated, and the reactivity is also easily deteriorated.
- the component (B) is too much, the viscosity of the conductive resin composition becomes low, and the conductive particles settle in the conductive resin composition to lower the dispersibility. Further, if the amount of the component (B) is too large, the elastic modulus tends to be high and the flexibility tends to be lost.
- the component (B1) is preferably 30 to 70 parts by mass, and 40 to 60 parts by mass with respect to 100 parts by mass of the component (B). It is more preferable that the amount of component (B2) is 30 to 70 parts by mass, and it is more preferable that the amount of component (B2) is 40 to 60 parts by mass. If the ratio of the (B2) polyfunctional acrylic monomer is too low, the reactivity is lowered and the effect of oxygen inhibition is easily visible. If the ratio of the (B2) polyfunctional acrylic monomer is too high, the viscosity is high and the handling property is high. And the workability is likely to decrease.
- Oxygen inhibition here is a phenomenon peculiar to radical polymerization system.
- free radicals which are active points, are trapped by oxygen radicals in the air, deactivate free radicals, and deactivate free radicals.
- the component (B) is preferably 20 parts by mass or more and less than 80 parts by mass, more preferably 25 to 79 parts by mass, further preferably 100 parts by mass of the total of the components (A) and (B). Is 30 to 75 parts by mass, and particularly preferably 35 to 70 parts by mass.
- the conductive resin composition when the amount of the component (B) is 20 parts by mass or more and less than 80 parts by mass with respect to a total of 100 parts by mass of the component (A) and the component (B), the conductive resin composition is suitable Has a low elastic modulus and a large elongation rate while maintaining good viscosity, (D) the dispersibility of the conductive particles is not lowered, and the conductive resin composition has good handleability and maintains good workability. A cured product having excellent flexibility can be obtained.
- the component (C) is preferably 0.1 to 30 parts by mass, and preferably 3 to 10 parts by mass, based on 100 parts by mass of the total of the components (A), (B) and (C). More preferable. If the amount of component (C) is too small, the curing reactivity tends to decrease. If the component (C) is too much, the unreacted component (C) may remain in the cured product of the conductive resin composition after the conductive resin composition is cured, or the conductive resin composition is cured. Residual fever may be seen later.
- Component (A), component (B), and component (C) are 5 to 50 parts by mass when silver particles are used as component (D) with respect to 100 parts by mass of the conductive resin composition. It is more preferably 12 to 30 parts by mass.
- the component (D) is preferably 10 to 50% by volume, more preferably 20 to 44% by volume with respect to 100% by volume of the conductive resin composition. If the amount of component (D) is too small, the conductivity of the conductive resin composition after curing tends to decrease, and in some cases electrical continuity cannot be achieved. When the component (D) is too much, the resin component in the conductive resin composition is reduced, which may affect the elastic modulus (that is, flexibility) and the adhesive strength.
- the volume of the component (D) can be calculated from the content (mass basis) of each of the component (A), the component (B), the component (C), and the component (D) and the specific gravity.
- the content (volume part) of the component (D) can be calculated by thermogravimetric analysis (TGA: Thermogravimetric analysis).
- TGA thermogravimetric analysis
- the temperature of the conductive resin composition is raised to 600 to 900 ° C. to decompose and volatilize the resin component, only the component (D) remains, and the mass of the component (D) contained in the conductive resin composition is measured.
- the specific gravity of the component (D) and the components other than the component (D) are measured by the Archimedes method, and the mass obtained previously is divided by the specific gravity, whereby the volume of each component can be calculated.
- the amount of the component (D) is preferably 50 to 95 parts by mass, and preferably 70 to 88 parts by mass with respect to 100 parts by mass of the conductive resin composition. , And more preferable.
- a thixotropic agent for improving workability a coupling agent, a pigment such as carbon black, an ion trap agent, a dye, and a erasing agent.
- a foaming agent, a defoaming agent, an antioxidant, a polymerization inhibitor, other additives, etc., and a reactive diluent, an organic solvent, etc. can be added.
- the conductive resin composition of the present invention is, for example, stirred, melted or mixed with the components (A) to (D) and optionally other additives at the same time or separately, optionally with heat treatment.
- the devices for mixing, stirring, dispersing and the like are not particularly limited, but a Leiki machine equipped with a stirring and heating device, a three-roll mill, a ball mill, a planetary mixer, a bead mill and the like can be used. .. Further, these devices may be used in an appropriate combination.
- the curing of the conductive adhesive of the present invention is preferably performed at 60 to 180 ° C, more preferably 70 to 175 ° C, and further preferably 75 to 170 ° C. Curing of the conductive adhesive is preferably carried out for 1 to 150 minutes, more preferably 5 to 120 minutes, and further preferably 10 to 90 minutes.
- the storage elastic modulus of the conductive resin composition after curing is preferably 0.01 to 2.5 GPa because stress concentration can be avoided.
- the conductive adhesive of the present invention contains the above-mentioned conductive resin composition. This electrically conductive adhesive is very suitable for the field of FHE and for the use of electrically conductive adhesives for electronic textiles (e-textile).
- the semiconductor device of the present invention contains a cured product of the above-mentioned conductive resin composition.
- semiconductor devices include HE fields and electronic textiles (e-textiles).
- Urethane acrylate oligomer (A1) component Polymer urethane acrylate oligomer having a weight average molecular weight of 10,000 or more
- A1-1 Urethane acrylate oligomer manufactured by Sartomer (product name: CN9071), weight average molecular weight Mw: 24000.
- A1-2 Urethane acrylate oligomer (product name: CN9071) manufactured by Sartomer, weight average molecular weight Mw: 14000.
- Component (A2) Low molecular weight urethane acrylate oligomer having a weight average molecular weight of 9999 or less
- A2-1 Urethane acrylate oligomer (product name: UN-6200) manufactured by Negami Kogyo Co., Ltd., weight average molecular weight Mw: 6500.
- A2-2 Urethane acrylate oligomer (product name: Beamset 577) manufactured by Arakawa Chemical Industry Co., Ltd., weight average molecular weight Mw: about 1000.
- the weight average molecular weight (Mw) of the urethane acrylate oligomer (A) was measured by gel permeation chromatography (GPC), and the weight average molecular weight in terms of polystyrene was measured using a calibration curve based on standard polystyrene.
- C Free radical generating curing agent: peroxide
- C-1 Peroxydicarbonate (product name: perloyl TCP, 10-hour half-life temperature: 40.8 ° C.) manufactured by NOF CORPORATION.
- C-2) 1,1,3,3-tetramethylbutylperoxy-2-ethylhexanoate (product name: Perocta O, 10-hour half-life temperature: 65.3 ° C.) manufactured by NOF CORPORATION.
- C-4) t-butyl hydroperoxide manufactured by NOF CORPORATION product name: perbutyl H, 10-hour half-life temperature: 166.5 ° C manufactured by NOF CORPORATION).
- D Conductive Particles
- Component Silver Powder Made by Metalor Technologies SA (Product Name: AA-9829N, Flakes, Average Particle Diameter: 10.1 ⁇ m, Tap Density: 5.0 g / cm 3 , Specific Surface Area: 0.2 m 2 / g).
- the component (A1) is 7.7 parts by mass
- the component (A2) is 4.2 parts by mass
- the component (B1) is 3.7 parts by mass
- the component (B2) is 3.7 parts by mass
- the component (C) is 0. 0.80 parts by mass of component (D) and 80.00 parts by mass of component (D) were mixed using a three-roll mill to prepare a conductive resin composition.
- Example 2 to 14 The component (A1), the component (A2), the component (B1), the component (B2), the component (C) and the component (D) are mixed in a formulation shown in Table 1 by using a three-roll mill to prepare a conductive resin. A composition was made.
- FR4 was prepared as the substrate, and a 3 mm ⁇ Si die was prepared as the die.
- a conductive film composition was printed on a FR4 (glass / epoxy) substrate using a polyimide film stencil (thickness: 120 ⁇ m) having holes of ⁇ 2 mm. Thereafter, a 3 mm ⁇ Si die was mounted and cured in an Air convention oven at 80 ° C. for 30 minutes to prepare a sample for die shear strength measurement.
- This coating film is used in accordance with JIS C6481 using a viscoelasticity measuring device (DMA) (model number: DMS7100) manufactured by Hitachi High-Tech Science, deformation mode: tension, measurement mode: lamp (Ramp), frequency: 10 Hz, strain swing. Width: 5 ⁇ m, minimum tension / compression force: 50 mN, tension / compression force gain: 1.2, force amplitude initial value: 50 mN, movement waiting time: 8 seconds, creep waiting time coefficient: 0, measured at 25 ° C. ..
- DMA viscoelasticity measuring device
- FIG. 1 shows a diagram for explaining a method for measuring the change in electric resistance depending on the elongation rate.
- a thermoplastic polyurethane sheet product name: ST-604 (TPU) manufactured by BEMIS
- ST-604 thermoplastic polyurethane sheet
- a stretchable conductive silver paste for circuits made by NAMICS is screen-printed to a film thickness of 15 to 25 ⁇ m after drying. Then, it was dried at 120 ° C. for 30 minutes to form a conductive ink layer (Conductive Ink).
- the conductive resin composition prepared on the conductive ink layer was patterned (Conductive Adhesive) using a stencil with 1 mm square holes (polyimide stencil, film thickness: 120 ⁇ m), and then a 3216 size laminated ceramic.
- a capacitor (MLCC: Multi Layer Ceramic Capacitor) (3216 size MLCC) was mounted and cured in an Air convention oven at 80 ° C. for 30 minutes to prepare a sample. Thereafter, as shown in FIG. 1, the electrical resistance value between one electrode of the 3216 size MLCC and the conductive ink layer was measured by a four-terminal method using a digital multimeter.
- Fig. 2 shows a diagram for explaining the method of measuring elongation.
- the sample was fixed using a stretching tool, and the electrical resistance between one electrode of the MLCC and the conductive ink layer was measured by the 4-terminal method. Then, the sample was stretched and fixed by 10% with a stretching tool, and the electrical resistance between one electrode of the MLCC and the conductive ink layer was measured using a digital multimeter each time.
- Table 1 shows the elongation rate until the MLCC comes off from the TPU.
- Example 1 has a low viscosity, is cured at 80 ° C. for 30 minutes at a low temperature for a short time, has a high die shear strength in the curing atmosphere in the air, has a low specific resistance, and has a storage elastic modulus. It was low, and the change in resistance was small even after the elongation of 20%.
- Comparative Example 1 had a high storage elastic modulus. In Comparative Example 1, the MLCC was removed from the TPU after the elongation of 20%.
- Example 1 the change in the storage elastic modulus was small even after the HTHH was held.
- Comparative Example 1 the change in the storage elastic modulus became large after the HTHH was held.
- the resistance value change was not so large even after the HTHH was held and after the elongation of 20%, and the reliability was maintained.
- the resistance value change after elongation of 20% in Comparative Example 1 was 3.58 before HTHH, and after holding HTHH, the MLCC was removed from the TPU after elongation of 20%, The resistance value could not be measured.
- Examples 1, 3 and 4 contain both (A1) a high molecular weight urethane acrylate oligomer having a weight average molecular weight of 10,000 or more and (A2) a low molecular weight urethane acrylate oligomer having a weight average molecular weight of 9999 or less, the die shear strength is It was possible to obtain a cured product having a high elasticity, a low specific resistance, a low storage elastic modulus, a high elongation, a low elasticity and a good extensibility without impairing the handleability of the conductive resin composition.
- Example 2 since the two kinds of (A1) high molecular weight urethane acrylate oligomers having an average molecular weight of 10,000 or more are contained, the viscosity of the conductive resin composition is as high as 100 Pa ⁇ s or more, the handleability is lowered, and the workability is reduced. Was affected. Since Example 5 contains two kinds of (A2) low molecular weight urethane acrylate oligomer having an average molecular weight of 9999 or less, the crosslinking density increases due to the increased number of crosslinking points, and the elastic modulus of the conductive resin composition after curing increases. It became higher than 2.5 GPa.
- the cured conductive resin compositions of Examples 1 to 4 had a storage elastic modulus of 2.0 G ⁇ Pa or less even after being held at HTHH for 250 hours.
- the cured conductive resin composition of Example 5 did not show a large change in the storage elastic modulus after being held at HTHH for 250 hours.
- the cured conductive resin composition of Comparative Example 1 had a storage elastic modulus of more than 2.5 GPa after being held at HTHH for 250 hours.
- the longer the holding time of HTHH is the larger the change of the resistance value after 20% elongation is as compared with the state of not being stretched before HTHH holding. It was
- Examples 7 and 8 contain (B1) a monofunctional radically polymerizable monomer and (B2) a polyfunctional radically polymerizable monomer, and (B2) a polyfunctional radically polymerizable monomer has two or more (meta- ) Since it has an acryloyl group and an oxyalkylene skeleton having 4 to 30 linear carbon atoms between two adjacent (meth) acryloyl groups, the conductive resin composition after curing has a low elastic modulus and It had a large elongation and moderate flexibility.
- the cured conductive resin compositions of Examples 7 and 8 had a storage elastic modulus of 2.0 G ⁇ Pa or less even after being held at HTHH (high temperature and high humidity) for 250 hours.
- Examples 6 and 9 have (B1) a monofunctional radically polymerizable monomer, two or more (meth) acryloyl groups in one molecule, and a linear chain between two adjacent (meth) acryloyl groups.
- the elastic modulus of the conductive resin composition after curing is higher than that of Examples 6 and 9, and the elongation rate is 10%. It became%.
- Examples 10 and 11 since the (C) free radical generating curing agent was a peroxide and had a 10-hour half-life temperature of 165 ° C. or lower, it was cured at 80 ° C. in a low temperature for a short time of 30 minutes.
- the cured conductive resin composition has a high die shear strength, a low specific resistance, a low elastic modulus and a high elongation rate, does not impair the handleability of the conductive resin composition, and has a low elasticity and a good extensibility. It was possible to obtain a cured product having The cured conductive resin compositions of Examples 10 and 11 had a storage elastic modulus of 2.0 G ⁇ Pa or less even after being held at HTHH for 250 hours.
- Example 13 since the component (B) was 20 parts by mass with respect to the total 100 parts by mass of the components (A) and (B) in the conductive resin composition, (D) in the conductive resin composition ) Without lowering the dispersibility of the conductive particles, the conductive resin composition maintains a viscosity with good handleability, the die shear strength of the conductive resin composition after curing is high, and the specific resistance is low, It was possible to obtain a cured product having a low elastic modulus, a high elongation rate, good workability, low elasticity and good extensibility without impairing the handleability of the conductive resin composition.
- the cured conductive resin composition of Example 13 had a storage elastic modulus of 2.0 G ⁇ Pa or less even after being held at HTHH for 250 hours.
- the amount of the component (B) was 80 parts by mass with respect to 100 parts by mass of the total amount of the components (A) and (B) in the conductive resin composition, and the viscosity of the conductive resin composition decreased.
- (D) the conductive particles settle in the conductive resin composition, and it is difficult to maintain the dispersibility of the (D) conductive particles, and the storage elastic modulus of the conductive resin composition after curing is increased, and the elongation is also increased. It became 10%.
- the cured conductive resin composition of Example 14 had a large storage elastic modulus of 3.4 G ⁇ Pa after being held at HTHH for 250 hours.
- the conductive resin composition of the present invention is suitable as a low-temperature fast-curing type low-elasticity conductive adhesive, and is very suitable as a component mounting conductive adhesive for the FHE field.
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Abstract
Description
〔1〕(A)少なくとも2種類のウレタンアクリレートオリゴマー、
(B)ラジカル重合性モノマー、
(C)遊離ラジカル発生硬化剤、および
(D)導電性粒子
を含むことを特徴とする、導電性樹脂組成物。
〔2〕(A)成分が、(A1)重量平均分子量10000以上の高分子ウレタンアクリレートオリゴマーと、(A2)重量平均分子量9999以下の低分子ウレタンアクリレートオリゴマーと、を含む、上記〔1〕記載の導電性樹脂組成物。
〔3〕(B)成分が、(B1)単官能ラジカル重合性モノマーと、(B2)多官能ラジカル重合性モノマーと、を含む、上記〔1〕または〔2〕記載の導電性樹脂組成物。
〔4〕(B2)多官能ラジカル重合性モノマーが、1分子中に2つ以上の(メタ)アクリロイル基を有し、隣合う2つの前記(メタ)アクリロイル基の間に、直鎖の炭素数が4~30のアルキレン骨格又は直鎖の炭素数が4~30のオキシアルキレン骨格を有する、請求項3に記載の導電性樹脂組成物。
〔5〕(C)成分が過酸化物である、上記〔1〕~〔4〕のいずれか記載の導電性樹脂組成物。
〔6〕(C)成分の前記過酸化物が、165℃以下の10時間半減期温度を有する、上記〔5〕に記載の導電性樹脂組成物。
〔7〕(D)成分が、導電性樹脂組成物100体積%に対して、10~50体積%である、上記〔1〕~〔6〕のいずれか記載の導電性樹脂組成物。
〔8〕(D)成分が銀粒子である、上記〔1〕~〔7〕のいずれか記載の導電性樹脂組成物。
〔9〕上記〔1〕~〔8〕のいずれか記載の導電性樹脂組成物を含む、導電性接着剤。
〔10〕上記〔1〕~〔8〕のいずれか記載の導電性樹脂組成物の硬化物を含む、半導体装置。
(A)少なくとも2種類のウレタンアクリレートオリゴマー、
(B)ラジカル重合性モノマー、
(C)遊離ラジカル発生硬化剤、および
(D)導電性粒子
を含むことを特徴とする。
樹脂組成物が前記(A)成分~(D)成分のみからなる場合には、熱重量分析(TGA:Thermogravimetric analysis)により、(D)成分の含有量(体積部)を算出することもできる。導電性樹脂組成物を600~900℃まで昇温して樹脂分を分解・揮発させると、(D)成分のみが残り、導電性樹脂組成物が含有する(D)成分の質量を測定することができる。導電性樹脂組成物の質量からフィラーの質量を減ずることにより、(D)成分以外の成分((A)成分~(C)成分)の質量を算出することができる。その後、(D)成分および(D)成分以外の成分の比重をアルキメデス法により測定し、先に求めた質量を比重で除することにより、それぞれの成分の体積を算出することができる。
本発明の導電性接着剤は、上述の導電性樹脂組成物を含む。この導電性接着剤は、FHE分野用や電子テキスタイル(e-textile)の導電性接着剤の用途に、非常に適している。
本発明の半導体装置は、上述の導電性樹脂組成物の硬化物を含む。半導体装置としては、HE分野用や電子テキスタイル(e-textile)が、挙げられる。
(A)ウレタンアクリレートオリゴマー
(A1)成分:重量平均分子量10000以上の高分子ウレタンアクリレートオリゴマー
(A1-1):サートマー(Sartomer)製ウレタンアクリレートオリゴマー(品名:CN9071)、重量平均分子量Mw:24000。
(A1-2):サートマー(Sartomer)製ウレタンアクリレートオリゴマー(品名:CN9071)、重量平均分子量Mw:14000。
(A2-1):根上工業株式会社製ウレタンアクリレートオリゴマー(品名:UN-6200)、重量平均分子量Mw:6500。
(A2-2):荒川化学工業株式会社製ウレタンアクリレートオリゴマー(品名:ビームセット577)、重量平均分子量Mw:約1000。
(A)ウレタンアクリレートオリゴマーの重量平均分子量(Mw)は、いずれもゲルパーミエーションクロマトグラフィー(GPC)法により、標準ポリスチレンによる検量線を用いたポリスチレン換算の重量平均分子量を測定した。
(B1-1):サートマー(Sartomer)製アクリル酸イソボルニル(品名:SR506A)
(B2-1):サートマー(Sartomer)製ジプロピレングリコールジアクリレート(品名:SR508)、下記式(2)で表され、下記式(2)中、nが2であり、隣合う2つの(メタ)アクリロイル基の間の直鎖の炭素数が4である。
(C-1)日油株式会社製パーオキシジカーボネート(品名:パーロイルTCP、10時間半減期温度:40.8℃)。
(C-2)日油株式会社製1,1,3,3-テトラメチルブチルパーオキシ-2-エチルヘキサノアート(品名:パーオクタO、10時間半減期温度:65.3℃)。
(C-3)日油株式会社製ジクミルパーオキサイド(品名:パークミルD、10時間半減期温度:116.4℃)。(C-4)日油株式会社製t-ブチルハイドロパーオキサイド(品名:パーブチルH、日油株式会社製、10時間半減期温度:166.5℃)。
(D)成分:メタロー(Metalor)テクノロジーズSA製銀粉(品名:AA-9829N、フレーク状、平均粒子径:10.1μm、タップ密度:5.0g/cm3、比表面積:0.2m2/g)。
(A1)成分を7.7質量部、(A2)成分を4.2質量部、(B1)成分を3.7質量部、(B2)成分を3.7質量部、(C)成分を0.80質量部、(D)成分を80.00質量部の配合で、3本ロールミルを用いて混合し、導電性樹脂組成物を作製した。
(A1)成分、(A2)成分、(B1)成分、(B2)成分、(C)成分および(D)成分を、表1に示す配合で、3本ロールミルを用いて混合し、導電性樹脂組成物を作製した。
(A1)成分を6.72質量部、(B1)成分を6.72質量部、(C)成分を0.56質量部、(D)成分を86.00質量部の配合で、3本ロールミルを用いて混合し、導電性樹脂組成物を作製した。
〔粘度の測定〕
実施例および比較例の各導電性樹脂組成物を、ブルックフィールドB型粘度計(型番:DV3T、コーンスピンドル:CPA-52Z、コーンプレート温度:25℃)を使用し、10rpmで粘度を測定した。
基板にはFR4を、ダイには3mm□のSiダイを、準備した。φ2mmの孔があいたポリイミドフィルム孔版(厚さ:120μm)を使用し、導電性樹脂組成物をFR4(ガラス・エポキシ)基板上に印刷した。その後、3mm□のSiダイをマウントし、Airコンベンションオーブン中で、80℃で30分間硬化させ、ダイ剪断強度測定用試料を作製した。ノードソンDAGE製卓上強度試験器(型番:4000PLUS-CART-S200KG)を使用して、室温で、ダイ剪断強度を測定した(n=10)。各実施例および比較例について、10個のダイ剪断強度測定試料を測定し、その算術平均値をダイ剪断強度とした。
ガラス基板上に、2枚の約85~95μm厚のテープを、3mm間隔で平行に貼り、この2枚のテープ間に、幅:3mm×長さ:50mm×厚さ:約90μmの導電性樹脂組成物膜を印刷した後、Airコンベンションオーブン中で、80℃で30分間硬化させた。硬化後の導電性樹脂組成物膜の膜厚を測定した後、4端子法で、抵抗値を測定し、比抵抗を求めた。
テフロンテープを張り付けたスライドガラス上に、硬化した時の膜厚が200±50μmとなるように、導電性樹脂組成物を塗布して塗膜を形成し、Airコンベンションオーブン中で、80℃で30分間放置して、硬化させた。この塗膜を、ステンレス板から剥がした後、カッターで所定寸法(20mm×5mm)に切り取った。なお、切り口はサンドペーパーで滑らかに仕上げた。この塗膜を、JIS C6481に従い、日立ハイテクサイエンス製粘弾性測定装置(DMA)(型番:DMS7100)を用い、変形モード:引っ張り(Tension)、測定モード:ランプ(Ramp)、周波数:10Hz、歪振り幅:5μm、最小張力/圧縮力:50mN、張力/圧縮力ゲイン:1.2、力振幅初期値:50mN、移動待ち時間:8秒、クリープ待ち時間係数:0、25℃の条件で測定した。
図1に、伸び率による電気抵抗変化の測定方法を説明するための図を示す。ビーマス(BEMIS)社製熱可塑性ポリウレタンシート(品名:ST-604)(TPU)上に、ナミックス製回路用ストレッチャブル導電性銀ペーストを、乾燥後膜厚が15~25μmになるようにスクリーン印刷し、その後、120℃で30分間乾燥させ、導電性インク層(Conductive Ink)を形成した。導電性インク層上に、作製した導電性樹脂組成物を、1mm□の孔があいた孔版(ポリイミド孔版、膜厚:120μm)を用い、パターンを形成(Conductive Adhesive)した後、3216サイズの積層セラミックコンデンサ(MLCC:Multi Layer Ceramic Capacitor)(3216サイズのMLCC)を搭載し、Airコンベンションオーブン中で80℃で30分間硬化させ、試料を作製した。その後、図1に示すように、3216サイズのMLCCの一方の電極と、導電性インク層との間の電気抵抗値を、デジタルマルチメーターを使用して4端子法で測定した。
〔HTHH(高温高湿)後貯蔵弾性率〕
弾性率の測定方法と同様に作製した試料の信頼性評価を行った。試料を、85℃/85%の高温高湿(HTHH)下で、24、48、96、250時間保持した後、25℃で抵抗値を測定した。次に、25℃で弾性率を測定した。図3に、実施例1および比較例1のHTHH保持時間と弾性変化の関係を示す。
次に、貯蔵弾性率の測定方法と同様に作製した試料を、85℃/85%の高温高湿(HTHH)下で、24、48、96、250時間保持し、20%伸長させた後、25℃で抵抗値を測定した。次に、HTHH前の抵抗値を1としたときの抵抗値変化(倍率)を求めた。図4に、実施例1のHTHH保持時間と抵抗値変化の関係を示す。
また、実施例1から4の硬化後の導電性樹脂組成物は、HTHHで保持する時間が長くなるほど、HTHH保持前に伸長させない状態と比べて、20%伸長後の抵抗値の変化は大きくなった。
実施例6および9は、(B1)単官能ラジカル重合性モノマーと、1分子中に2つ以上の(メタ)アクリロイル基を有し、隣合う2つの(メタ)アクリロイル基の間の直鎖の炭素数が3のオキシアルキレン骨格を有する(B2’)多官能ラジカル重合性モノマーを含むため、硬化後の導電性樹脂組成物の弾性率が実施例6および9よりも高くなり、伸び率が10%となった。
実施例12は、(C)遊離ラジカル発生硬化剤が過酸化物であり、165℃を超える10時間半減期温度を有するものを含むため、80℃で30分間の低温短時間では硬化しなかった。
実施例14は、導電性樹脂組成物中の(A)成分と(B)成分の合計100質量部に対して(B)成分が80質量部であり、導電性樹脂組成物の粘度が低下し、(D)導電性粒子が導電性樹脂組成物中で沈降し、(D)導電性粒子の分散性を維持しにくく硬化後の導電性樹脂組成物の貯蔵弾性率が高くなり、伸び率も10%となった。実施例14の硬化後の導電性樹脂組成物は、HTHHで250時間保持した後は、貯蔵弾性率が3.4G・Paと大きくなった。
Claims (10)
- (A)少なくとも2種類のウレタンアクリレートオリゴマー、
(B)ラジカル重合性モノマー、
(C)遊離ラジカル発生硬化剤、および
(D)導電性粒子
を含むことを特徴とする、導電性樹脂組成物。 - (A)成分が、(A1)重量平均分子量10000以上の高分子ウレタンアクリレートオリゴマーと、(A2)重量平均分子量9999以下の低分子ウレタンアクリレートオリゴマーと、を含む、請求項1記載の導電性樹脂組成物。
- (B)成分が、(B1)単官能ラジカル重合性モノマーと、(B2)多官能ラジカル重合性モノマーと、を含む、請求項1または2記載の導電性樹脂組成物。
- (B2)多官能ラジカル重合性モノマーが、1分子中に2つ以上の(メタ)アクリロイル基を有し、隣合う2つの前記(メタ)アクリロイル基の間に、直鎖の炭素数が4~30のアルキレン骨格又は直鎖の炭素数が4~30のオキシアルキレン骨格を有する、請求項3に記載の導電性樹脂組成物。
- (C)成分が過酸化物である、請求項1~4のいずれか1項記載の導電性樹脂組成物。
- (C)成分の前記過酸化物が、165℃以下の10時間半減期温度を有する、請求項5に記載の導電性樹脂組成物。
- (D)成分が、導電性樹脂組成物100体積%に対して、10~50体積%である、請求項1~6のいずれか1項記載の導電性樹脂組成物。
- (D)成分が銀粒子である、請求項1~7のいずれか1項記載の導電性樹脂組成物。
- 請求項1~8のいずれか1項記載の導電性樹脂組成物を含む、導電性接着剤。
- 請求項1~8のいずれか1項記載の導電性樹脂組成物の硬化物を含む、半導体装置。
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JP2020553905A JP7373208B2 (ja) | 2018-10-29 | 2019-10-28 | 導電性樹脂組成物、導電性接着剤、および半導体装置 |
US17/287,833 US11542417B2 (en) | 2018-10-29 | 2019-10-28 | Conductive resin composition, conductive adhesive, and semiconductor device |
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WO2024009589A1 (ja) * | 2022-07-08 | 2024-01-11 | ナミックス株式会社 | 導電性ペースト、電気回路、可撓性電気回路体及び成形体の製造方法 |
WO2024048156A1 (ja) * | 2022-09-02 | 2024-03-07 | ナミックス株式会社 | 樹脂組成物、樹脂組成物の硬化物、半導体装置及び電子部品 |
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TW202031838A (zh) | 2020-09-01 |
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US11542417B2 (en) | 2023-01-03 |
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