WO2018016526A1 - ポリイミド樹脂フィルム及びポリイミド樹脂フィルムの製造方法 - Google Patents
ポリイミド樹脂フィルム及びポリイミド樹脂フィルムの製造方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1078—Partially aromatic polyimides wholly aromatic in the diamino moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/005—Stabilisers against oxidation, heat, light, ozone
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/13—Phenols; Phenolates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2505/00—Polyamides
- B05D2505/50—Polyimides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/52—Phosphorus bound to oxygen only
- C08K5/524—Esters of phosphorous acids, e.g. of H3PO3
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/16—Applications used for films
Definitions
- the present invention relates to a polyimide resin film and a method for producing a polyimide resin film.
- Polyimide resin has excellent properties in mechanical properties, chemical resistance, electrical properties, etc. in addition to its high heat resistance. Therefore, films made of polyimide resin are widely used in the fields of molding materials, composite materials, electric / electronic parts, display devices, and the like.
- a polyimide resin film produced using cyclohexanetetracarboxylic dianhydride as a tetracarboxylic dianhydride that is a raw material of polyimide resin has good transparency.
- a nitrogen atmosphere is required, which is considered to be one factor that increases the cost of film production. Therefore, if the atmosphere during film production is an air atmosphere, it is very significant for cost reduction.
- Patent Document 1 proposes a method for producing a colorless transparent resin film having high colorless transparency and excellent heat resistance and flatness, and an apparatus for producing the resin film.
- Patent Document 1 The manufacturing method described in Patent Document 1 is significant in that it is not necessary to have a complete nitrogen atmosphere, but it needs to go through a plurality of steps, has some complicated points, and requires higher productivity. There is a case.
- an object of the present invention is to provide a method for producing a polyimide resin film that can produce a polyimide resin film having a low YI and a high transparency with high productivity and at low cost. Another object is to provide a highly transparent polyimide resin film having a low YI.
- the present inventors solved the above problem by mixing a phenolic antioxidant with a polyimide resin to obtain a polyimide resin composition, and subjecting the coating film formed from this composition to a predetermined drying treatment in air.
- the present inventors have found that the present invention can be accomplished and have completed the present invention.
- the present invention relates to the following [1] to [6].
- [1] A coating process in which a polyimide resin composition containing a polyimide resin, an antioxidant, and a solvent is coated on a substrate to form a coating film, and a drying process in which drying is performed at 180 ° C. or higher in air.
- the said antioxidant is a phenolic antioxidant
- the manufacturing method of the polyimide resin film which makes content of the said phenolic antioxidant with respect to 100 mass parts of said polyimide resins 0.05 mass part or more.
- the coating film is heated in a range of a heating temperature of 50 to 110 ° C. and a heating time of 30 to 90 minutes to produce a primary dry film.
- the manufacturing method of the polyimide resin film as described in [1] including a primary dry film preparation process.
- the polyimide resin composition contains a sulfur-based antioxidant and / or a phosphorus-based antioxidant, and the total content of the sulfur-based antioxidant and / or the phosphorus-based antioxidant with respect to 100 parts by mass of the polyimide resin.
- a polyimide resin film comprising a dried product of a polyimide resin composition containing a polyimide resin and a phenolic antioxidant and having a residual solvent amount of 3.0% by mass or less.
- the present invention it is possible to provide a method for producing a polyimide resin film capable of producing a highly transparent polyimide resin film having a low YI with high productivity and at low cost.
- a highly transparent polyimide resin film having a low YI can be provided.
- the method for producing a polyimide resin film of the present invention includes a specific coating process and a drying process. These will be described in detail below.
- a polyimide resin composition containing a polyimide resin, an antioxidant, and a solvent is coated on a substrate to form a coating film.
- the manufacturing method of a polyimide resin composition is not specifically limited, For example, the diamine component which comprises a polyimide resin is melt
- the carboxylic acid dianhydride which comprises a polyimide resin is mixed with this diamine solution with a solvent. Then, it heats to predetermined temperature and obtains a polyimide resin solution. And the said polyimide resin composition is obtained by mixing antioxidant into this polyimide resin solution.
- the temperature of the imidization reaction is preferably 120 to 250 ° C., more preferably 160 to 200 ° C., from the viewpoint of suppressing the reaction rate and gelation.
- the reaction time is preferably 0.5 to 10 hours after the start of distillation of the produced water.
- the temperature of the imidization reaction is preferably 200 to 350 ° C.
- the imidization reaction it is preferable to perform the reaction using a Dean-Stark apparatus or the like while removing water generated during production. By performing such an operation, the degree of polymerization and the imidization rate can be further increased.
- a phenolic antioxidant is used as the antioxidant.
- a phenolic antioxidant it becomes possible to perform a drying process in air, which will be described later, and finally a highly transparent polyimide resin film having a low YI is obtained.
- a drying process in air which will be described later
- a highly transparent polyimide resin film having a low YI is obtained.
- the polyimide resin tends to be oxidized when dried at high temperature in the air, and as a result, the YI of the resulting polyimide resin film tends to be high. , Transparency tends to be low.
- an antioxidant is added to suppress the oxidation of the polyimide resin, even if the oxidation of the polyimide resin is suppressed, the presence of the antioxidant itself may cause an increase in the YI of the film and a decrease in transparency. Is done. Therefore, it was thought that it was difficult to perform a drying process in the air in the manufacturing method of a polyimide resin.
- the antioxidants if it is a phenolic antioxidant, the oxidation of the polyimide resin is sufficiently suppressed, and the coloration and transparency of the film due to the presence of the antioxidant itself are extremely low. We have found that there is little.
- phenolic antioxidant refers to an antioxidant having a phenol structure at the terminal, and among them, one having a phenol structure represented by the following formula (A) is preferable.
- R 1 and R 2 each independently represents an alkyl group having 4 or less carbon atoms.
- R 1 and R 2 each independently represents an alkyl group having 4 or less carbon atoms.
- the alkyl groups of R 1 and R 2 are preferably each independently a methyl group or a t-butyl group.
- the molecular weight of the phenolic antioxidant is preferably 600 or more, and more preferably 650 or more.
- phenolic antioxidants include 2,6-bis (1,1-dimethylethyl) -4-methylphenol, 2-tert-butyl-6- (3-tert-butyl-2- Hydroxybenzyl) -4-methylphenyl acrylate (SUMILIZER® GM), 2- [1- (2-hydroxy-3,5-di-tert-pentylphenyl) ethyl] -4,6-di-tert- Pentylphenyl acrylate (SUMILIZER® GS (F)), 6- [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-tert -Butyl-dibenzo [d, f] [1,3,2] dioxaphosphine (SUMILIZER GP), 3,9 Bis [2- [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy] -1,1-
- phenolic antioxidant examples include the following compounds (A1), (A2) and (A3).
- Compound (A1) is obtained from 6- [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-tert-butyl-dibenzo [d, f] [1,3,2] Dioxaphosfepine, which is available as SUMILIZER GP manufactured by Sumitomo Chemical Co., Ltd.
- the compound (A2) is pentaerythritol tetrakis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate], and is ADEKA's ADK STAB AO-60, SONGWON's SONGNOX 1010, or BASF It is available as Irganox 1010.
- Compound (A3) is a compound of 3,9-bis [2- [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy] -1,1-dimethylethyl] -2,4,8. , 10-tetraoxaspiro [5.5] undecane, available as SUMILIZER GA-80 manufactured by Sumitomo Chemical Co., Ltd. or Adeka Stub AO-80 manufactured by ADEKA.
- the content of the phenolic antioxidant with respect to 100 parts by mass of the polyimide resin is 0.05 parts by mass or more, preferably 0.05 to 10 parts by mass, More preferably, the content is 0.1 to 1 part by mass. If content of a phenolic antioxidant is less than 0.05 mass part, YI of the polyimide resin film finally obtained will become high. From the viewpoint of suppressing a decrease in transparency of the film due to the presence of the antioxidant itself, the content of the phenolic antioxidant is preferably 10 parts by mass or less.
- polyimide resin a polyimide resin having a structural unit represented by the following general formula (I) is preferable from the viewpoint of reducing the YI of the polyimide resin film and obtaining high transparency.
- Rx is a tetravalent aliphatic hydrocarbon group or alicyclic hydrocarbon group having 4 to 39 carbon atoms
- Ry is a divalent aliphatic hydrocarbon group having 1 to 39 carbon atoms
- Examples of the tetravalent aliphatic hydrocarbon group having 4 to 39 carbon atoms represented by Rx include butane-1,1,4,4-tetrayl, octane-1,1,8,8-tetrayl group, decane- Examples include groups such as 1,1,10,10-tetrayl group.
- Examples of the tetravalent alicyclic hydrocarbon group having 4 to 39 carbon atoms represented by Rx include cyclobutane-1,2,3,4-tetrayl group, cyclopentane-1,2,4,5-tetrayl.
- cyclohexane-1,2,4,5-tetrayl group bicyclo [2.2.2] oct-7-ene-2,3,5,6-tetrayl group, bicyclo [2.2.2] octane- 2,3,5,6-tetrayl group, 3,3 ′, 4,4′-dicyclohexyltetrayl group, 3,6-dimethylcyclohexane-1,2,4,5-tetrayl group, 3,6-diphenylcyclohexane And a group such as a -1,2,4,5-tetrayl group.
- Examples of the divalent aliphatic hydrocarbon group having 1 to 39 carbon atoms which has or does not have the above linking group represented by Ry include groups represented by the following structural formulas.
- n represents the number of structural units, preferably 1 to 5, and more preferably 1 to 3.
- X is an alkanediyl group having 1 to 3 carbon atoms, that is, a methylene group, an ethylene group, a trimethylene group, or a propane-1,2-diyl group, and a methylene group is preferable.
- Examples of the divalent alicyclic hydrocarbon group having 4 to 39 carbon atoms having or not having the above linking group represented by Ry include groups represented by the following structural formulas.
- Examples of the divalent aromatic hydrocarbon group having 6 to 39 carbon atoms with or without the above-described bonding group represented by Ry include groups represented by the following structural formulas.
- Examples of the group consisting of a combination of these aliphatic hydrocarbon group, alicyclic hydrocarbon group and aromatic hydrocarbon group include groups represented by the following structural formula.
- Ry is preferably a divalent aromatic hydrocarbon group having 6 to 39 carbon atoms having a linking group, or a combination of the aromatic hydrocarbon group and an aliphatic hydrocarbon group. The groups shown are preferred.
- the structural unit represented by the general formula (I) is preferably 10 to 100 mol%, more preferably 50 to 100 mol%, still more preferably 80 to 100 mol%, particularly preferably 90 to all the structural units. ⁇ 100 mol%.
- the number of structural units of the general formula (I) in one molecule of the polyimide resin is 10 to 2000, preferably 20 to 200. Within this range, the glass transition temperature is preferably 230 to 350 ° C. 250 to 330 ° C. is more preferable.
- the polyimide resin is obtained by reacting an aliphatic or alicyclic tetracarboxylic acid or a derivative thereof with a diamine or a derivative thereof.
- the aliphatic or alicyclic tetracarboxylic acid derivatives include aliphatic or alicyclic tetracarboxylic acids, aliphatic or alicyclic tetracarboxylic acid esters, aliphatic or alicyclic tetracarboxylic dianhydrides, and the like. Can be mentioned. Of the aliphatic or alicyclic tetracarboxylic acids or derivatives thereof, alicyclic tetracarboxylic dianhydrides are preferred.
- diamine derivatives include diisocyanates and diaminodisilanes. Of the diamines or derivatives thereof, diamines are preferred.
- Examples of the aliphatic tetracarboxylic acid include 1,2,3,4-butanetetracarboxylic acid.
- Examples of the alicyclic tetracarboxylic acid include 1,2,3,4-cyclobutanetetracarboxylic acid, 1,2,4,5-cyclopentanetetracarboxylic acid, 1,2,4,5-cyclohexanetetracarboxylic acid, Bicyclo [2.2.2] oct-7-ene-2,3,5,6-tetracarboxylic acid, bicyclo [2.2.2] octane-2,3,5,6-tetracarboxylic acid and the like It is done.
- Examples of the aliphatic tetracarboxylic acid esters include monoalkyl esters, dialkyl esters, trialkyl esters, and tetraalkyl esters of the above aliphatic tetracarboxylic acids.
- Examples of the alicyclic tetracarboxylic acid esters include monoalkyl esters, dialkyl esters, trialkyl esters, and tetraalkyl esters of the above alicyclic tetracarboxylic acids.
- the alkyl group site is preferably an alkyl group having 1 to 5 carbon atoms, and more preferably an alkyl group having 1 to 3 carbon atoms.
- Examples of the aliphatic tetracarboxylic dianhydride include 1,2,3,4-butanetetracarboxylic dianhydride.
- Examples of the alicyclic tetracarboxylic dianhydride include 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,4,5-cyclopentanetetracarboxylic dianhydride, 1,2, 4,5-cyclohexanetetracarboxylic dianhydride, bicyclo [2.2.2] oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, bicyclo [2.2.2] octane -2,3,5,6-tetracarboxylic dianhydride and the like.
- 1,2,4,5-cyclohexanetetracarboxylic dianhydride is particularly preferred.
- a polyimide resin having an aliphatic diamine as a constituent component forms a strong salt with a polyamic acid, which is an intermediate product, and a diamine. Cresol, N, N-dimethylacetamide, ⁇ -butyrolactone, N-methyl-2-pyrrolidone, etc.) are preferably used.
- polyimide resins containing aliphatic diamine as a constituent when 1,2,4,5-cyclohexanetetracarboxylic dianhydride is used as a constituent, the salt of polyamic acid and diamine is relatively weak. Since they are connected by bonding, high molecular weight is easy and a flexible film is easily obtained.
- One type of aliphatic or alicyclic tetracarboxylic acid or derivative thereof may be used alone, or two or more types may be used in combination. Further, other tetracarboxylic acids or derivatives thereof (particularly dianhydrides) may be used in combination as long as the solvent solubility of the polyimide resin, the flexibility of the film, the thermocompression bonding property, and the transparency are not impaired.
- Examples of such other tetracarboxylic acids or derivatives thereof include pyromellitic acid, 3,3 ′, 4,4′-biphenyltetracarboxylic acid, 2,3,3 ′, 4′-biphenyltetracarboxylic acid, 2,2 -Bis (3,4-dicarboxyphenyl) propane, 2,2-bis (2,3-dicarboxyphenyl) propane, 2,2-bis (3,4-dicarboxyphenyl) -1,1,1, 3,3,3-hexafluoropropane, 2,2-bis (2,3-dicarboxyphenyl) -1,1,1,3,3,3-hexafluoropropane, bis (3,4-dicarboxyphenyl) ) Sulfone, bis (3,4-dicarboxyphenyl) ether, bis (2,3-dicarboxyphenyl) ether, 3,3 ′, 4,4′-benzophenonetetracarboxylic acid, 2,2
- the diamine may be an aromatic diamine, an aliphatic diamine, or a mixture thereof.
- aromatic diamine refers to a diamine in which an amino group is directly bonded to an aromatic ring, and an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or any other part of the structure. It may contain a substituent (for example, a halogen atom, a sulfonyl group, a carbonyl group, an oxygen atom, etc.).
- Aliphatic diamine refers to a diamine in which an amino group is directly bonded to an aliphatic hydrocarbon group or an alicyclic hydrocarbon group, and an aromatic hydrocarbon group or other substituent (for example, it may contain a halogen atom, a sulfonyl group, a carbonyl group, an oxygen atom, etc.).
- aromatic diamines include p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 2,6-diaminotoluene, benzidine, o-tolidine, m-tolidine, bis (trifluoromethyl) benzidine, octa Fluorobenzidine, 3,3′-dihydroxy-4,4′-diaminobiphenyl, 3,3′-dimethoxy-4,4′-diaminobiphenyl, 3,3′-dichloro-4,4′-diaminobiphenyl, 3, 3'-difluoro-4,4'-diaminobiphenyl, 2,6-diaminonaphthalene, 1,5-diaminonaphthalene, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane
- aliphatic diamine examples include ethylene diamine, hexamethylene diamine, polyethylene glycol bis (3-aminopropyl) ether, polypropylene glycol bis (3-aminopropyl) ether, 1,3-bis (aminomethyl) cyclohexane, 1,4- Bis (aminomethyl) cyclohexane, metaxylylenediamine, paraxylylenediamine, 1,4-bis (2-amino-isopropyl) benzene, 1,3-bis (2-amino-isopropyl) benzene, isophoronediamine, norbornane Diamine, siloxane diamine, 4,4'-diaminodicyclohexylmethane, 3,3'-dimethyl-4,4'-diaminodicyclohexylmethane, 3,3'-diethyl-4,4'-diaminodicyclohexylmethane, 3,3
- diisocyanate which is a diamine derivative the diisocyanate obtained by making the said aromatic or aliphatic diamine and phosgene react is mentioned, for example.
- diaminodisilanes that are diamine derivatives include trimethylsilylated aromatic or aliphatic diamine obtained by reacting the above aromatic or aliphatic diamine with chlorotrimethylsilane.
- the above diamines and derivatives thereof may be used in an arbitrary mixture, but the amount of diamine in them is preferably 50 to 100 mol%, more preferably 80 to 100 mol%.
- the reaction solvent (organic solvent) used in the synthesis of the polyimide resin is a solvent capable of dissolving the polyimide resin, such as N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-diethylacetamide, N, N-dimethylformamide, N, N-diethylformamide, N-methylcaprolactam, hexamethylphosphoramide, tetramethylenesulfone, dimethylsulfoxide, m-cresol, phenol, p-chlorophenol, 2-chloro-4-hydroxy Toluene, diglyme, triglyme, tetraglyme, dioxane, ⁇ -butyrolactone, dioxolane, cyclohexanone, cyclopentanone, 1,4-dioxane, epsilon caprolactam, dichloromethane, chloroform, etc.
- N-methyl-2-pyrrolidone, N, N-dimethyl Acetamide and ⁇ -butyrolactone are preferably used alone or in combination, and more preferably at least one of N, N-dimethylacetamide and ⁇ -butyrolactone.
- the use of ⁇ -butyrolactone is preferable in that the temperature for imidization can be increased.
- a poor solvent such as hexane, heptane, benzene, toluene, xylene, chlorobenzene, or o-dichlorobenzene may be used to such an extent that the polyimide resin does not precipitate.
- a tertiary amine is preferably used as a catalyst for preparing the polyimide resin.
- Tertiary amines include, for example, trialkylamines such as trimethylamine, triethylamine, tripropylamine, and tributylamine; alcohol amines such as triethanolamine, N, N-dimethylethanolamine, and N, N-diethylethanolamine; triethylenediamine Diamines such as N-methylpyrrolidine, N-ethylpyrrolidine, N-methylpiperidine, N-ethylpiperidine and the like; nitrogen-containing aromatic heterocyclic compounds such as imidazole, pyridine, quinoline and isoquinoline Etc. Of these tertiary amines, trialkylamine is preferable, and triethylamine is more preferable.
- the solvent contained in the polyimide resin composition according to the present invention in addition to the reaction solvent used at the time of synthesizing the polyimide resin as described above, an organic solvent added additionally to adjust to a desired solid content concentration May be included.
- the solvent contained in the polyimide resin composition preferably contains at least one selected from N, N-dimethylacetamide and ⁇ -butyrolactone, and more preferably contains both N, N-dimethylacetamide and ⁇ -butyrolactone. preferable.
- an increase in YI when the polyimide resin composition according to the present invention is dried in air at 180 ° C. or more tends to be suppressed.
- the blending mass ratio of N, N-dimethylacetamide and ⁇ -butyrolactone (N, N-dimethylacetamide: ⁇ -butyrolactone) in the solvent until drying by the drying step according to the present invention is 90:10 to It is preferably 10:90, more preferably 70:30 to 30:70, and even more preferably 2: 1.
- the blending mass ratio is in the above range, YI deterioration can be suppressed even at high temperatures.
- the concentration of the polyimide resin in the polyimide resin composition is preferably 1 to 50% by mass, and more preferably 10 to 40% by mass. If it is 50 mass% or less, the surface flatness of the polyimide resin film obtained will become favorable.
- the polyimide resin composition may contain a surfactant such as fluorine or polysiloxane.
- a surfactant such as fluorine or polysiloxane.
- fluorosurfactant include MF Corporation's MegaFace (registered trademark) series and Neos Corporation's Aftergent (registered trademark) series. (Registered Trademarks) 251, 212MH, 250, 222F, 212D, FTX-218, and the like.
- polysiloxane surfactants examples include BYK-307, BYK-315, BYK-320, BYK-325, BYK-330, BYK-331, BYK-333, BYK-333, BYK- from BYK Japan, Inc. 344 etc. are mentioned.
- the polyimide resin composition may contain a sulfur-based antioxidant and / or a phosphorus-based antioxidant, but when it is contained, the sulfur-based antioxidant and / or the polyimide resin with respect to 100 parts by mass of the polyimide resin.
- the total content of the phosphorus antioxidant is preferably 10 parts by mass or less, more preferably 3 parts by mass or less, and still more preferably 1 part by mass or less.
- YI of a film can be reduced by setting it as 10 mass parts or less.
- sulfur-based antioxidants examples include SUMILIZER TPL-R, SUMILIZER TPM, SUMILIZER TPS, SUMILIZER TP-D, SUMILIZER MB (manufactured by Sumitomo Chemical Co., Ltd.), AO-412S, AO-503 (manufactured by ADEKA), and the like. .
- Phosphorus antioxidants include SONGNOX 1680, 1680F, and 6260 (all manufactured by SONGWON), PEP-8, PEP-36A, HP-10, 2112, 2112RG (all manufactured by ADEKA), IRGAFOS 168 (Made by BASF).
- the base material to which the polyimide resin composition is applied is preferably a metal plate such as stainless steel or aluminum, a glass plate, a PET substrate, or the like.
- a coating method methods such as die coating, gravure coating, spin coating, and ink jet can be applied.
- the casting method apply
- the primary dry film production process drying is performed by a drying process described later after coating, and it is preferable to produce a primary dry film as the previous stage. That is, it is preferable to provide the primary dry film production process between the coating process and the drying process.
- the primary dry film production step it is preferable to obtain a primary dry film having self-supporting property by heating the coating film formed in the coating step at a temperature lower than the drying temperature in the drying step. Thereby, it can dry efficiently by a subsequent drying process.
- the conditions for producing the primary dry film are preferably a heating temperature of 50 to 110 ° C. and a heating time of 30 to 90 minutes. Heating may be performed either in air or in a nitrogen atmosphere, but is preferably in air.
- the heating means is not particularly limited, and a known device such as a hot air dryer or a hot plate can be used.
- the coating film obtained in the coating step is dried in air at 180 ° C. or higher.
- the amount of residual solvents of a polyimide resin film can be 1.5% or less.
- production in a post process can be suppressed because the residual solvent amount of a polyimide resin film shall be 1.5% or less.
- the drying temperature is preferably 190 to 300 ° C, more preferably 200 to 270 ° C, and further preferably 230 to 270 ° C.
- the drying time is preferably 0.5 hours to 5 hours, more preferably 2 hours to 4 hours, from the viewpoint of the amount of residual solvent and cost / productivity.
- the atmosphere is a nitrogen atmosphere.
- “in the air” means an atmosphere in which the atmosphere such as a nitrogen atmosphere is not controlled.
- drying means examples include a hot air dryer and an IR heater. From the viewpoint of drying efficiency, it is preferable to use a hot air dryer. Moreover, about drying, what is necessary is just to have the highest drying temperature in the above-mentioned temperature (180 degreeC or more), and you may dry several times.
- a highly transparent polyimide resin film having a low yellowness (YI) and high transparency can be produced at a low cost.
- YI of the polyimide resin film produced by the production method of the present invention is preferably 10 or less and more preferably 4 or less at a film thickness of 70 ⁇ m.
- the total light transmittance is preferably 85% or more, more preferably 89% or more when the thickness is 80 ⁇ m.
- the haze is preferably 8 or less, and more preferably 1 or less.
- YI of a polyimide resin film, haze, and total light transmittance can be measured by the method as described in an Example.
- the polyimide resin film of the present invention comprises a dried product of a polyimide resin composition containing a polyimide resin and a phenolic antioxidant, and the residual solvent amount is 3.0% by mass or less.
- the “dried product” refers to, for example, a product obtained by drying according to the above-described method for producing a polyimide resin film of the present invention and having a residual solvent amount of 3.0% by mass or less.
- the amount of residual solvent is preferably 1.5% by mass or less, and more preferably 1.0% by mass or less.
- the residual solvent amount can be measured by the method described in the examples.
- the content of the phenolic antioxidant with respect to 100 parts by mass of the polyimide resin is preferably 0.05 parts by mass or more, more preferably 0.05 to 10 parts by mass, It is more preferably from 3 to 3 parts by mass, particularly preferably from 0.1 to 1 part by mass.
- YI of a film can be reduced because it is 0.05 mass part or more.
- the polyimide resin film of this invention can be produced with the manufacturing method of the polyimide resin film of this invention as stated above. Moreover, it is preferable that the yellowness degree (YI) of the polyimide resin film of this invention is 10 or less with a film thickness of 70 micrometers, and it is more preferable that it is 4 or less.
- the total light transmittance is preferably 85% or more, more preferably 89% or more when the thickness is 80 ⁇ m.
- the haze is preferably 8 or less, and more preferably 1 or less.
- the polyimide resin film manufactured by the manufacturing method of this invention or the polyimide resin film of this invention is used suitably as a film for various members, such as a color filter, a flexible display, a semiconductor component, an optical member.
- the polyimide resin film manufactured by the manufacturing method of this invention, or the polyimide resin film of this invention may become the film single-piece
- the thickness of the polyimide resin film produced by the production method of the present invention or the polyimide resin film of the present invention is preferably 10 to 100 ⁇ m, and more preferably 30 to 80 ⁇ m.
- the measuring method of the physical property of the polyimide resin film obtained by the following Example is shown below.
- (1) Total light transmittance, YI value (Yellow Index) and haze In accordance with JIS K7105, the total light transmittance, YI value and haze were measured using a haze meter (Z- ⁇ 80, manufactured by Nippon Denshoku Industries Co., Ltd.). And measured.
- a thermogravimetric analyzer DTG-50, manufactured by Shimadzu
- the obtained polyimide resin solution was applied on a glass plate, kept on a hot plate at 100 ° C. for 60 minutes, and the solvent was volatilized to obtain a colorless and transparent primary dry film having self-supporting property.
- the film was fixed to a stainless steel frame, heated in a hot air dryer at 250 ° C. for 2 hours to evaporate the solvent, and a film having a thickness of 30 ⁇ m was obtained.
- the disappearance of the raw material peak and the appearance of the peak derived from the imide skeleton were confirmed by FT-IR analysis (device name: Spectrum 100 manufactured by PerkinElmer) of the obtained film.
- This film had a refractive index nD of 1.619 and a glass transition temperature of 303 ° C.
- the refractive index nD of the film was measured at 23 ° C. using an Atago Co., Ltd. refractive index measuring device (DR-M2) with a 589 nm interference filter set.
- the glass transition temperature was measured by raising the temperature to 400 ° C. at 10 ° C./min in a nitrogen atmosphere using a differential thermal analyzer (model number DSC-6220) manufactured by SII NanoTechnology.
- a polyimide resin film was prepared using the polyimide resin solution (solid content: 20% by mass) prepared as described above, as described in the following Examples and Comparative Examples.
- the antioxidants used are as follows. Phenol antioxidant (a1): SUMILIZER GP (manufactured by Sumitomo Chemical Co., Ltd.) Phenolic antioxidant (a2): ADK STAB AO-60 (manufactured by ADEKA) Phenolic antioxidant (a3): ADK STAB AO-80 (manufactured by ADEKA) Phenol antioxidant (a4): SUMILIZER GA-80 (manufactured by Sumitomo Chemical Co., Ltd.) Phenol antioxidant (a5): SONGNOX1010 (manufactured by SONGWON) Phosphorous antioxidant (b1): SONGNOX1680 (manufactured by SONGWON) Phosphorous antioxidant (b2): PEP-36A (manufactured by ADEKA)
- Example 1 20 g of a polyimide resin solution (20% by mass solid content) prepared as described above and 0.012 g of phenolic antioxidant (a1) (0.3 parts by mass with respect to 100 parts by mass of polyimide resin) K. Using a HOMODISPER Model 2.5 (manufactured by PRIMIX Co., Ltd.), kneading was carried out at a rotation speed of 2000 rpm for 5 minutes to obtain a polyimide resin composition.
- the obtained polyimide resin composition is coated on a glass plate using a glass rod, and is self-supporting by heating stepwise with a hot air dryer at 60 ° C. ⁇ 30 minutes and 100 ° C. ⁇ 60 minutes.
- the film was further fixed to a stainless steel frame, heated in a hot air dryer at 200 ° C. for 3 hours to evaporate the solvent, and a polyimide resin film having a thickness of 63 ⁇ m was obtained.
- the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were measured by the methods described above. The results are shown in Table 1 below.
- Example 2 instead of the phenolic antioxidant (a1), the same procedure as in Example 1 was performed except that 0.004 g of the phenolic antioxidant (a2) (0.1 part by mass with respect to 100 parts by mass of the polyimide resin) was used. A polyimide resin composition was obtained. In the same manner as in Example 1, a polyimide resin film having a thickness of 56 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 1 below.
- Example 3 The same procedure as in Example 1 was conducted except that 0.004 g of phenolic antioxidant (a3) (0.1 part by mass relative to 100 parts by mass of polyimide resin) was used instead of phenolic antioxidant (a1). A polyimide resin composition was obtained. In the same manner as in Example 1, a polyimide resin film having a thickness of 56 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 1 below.
- Example 4 Instead of the phenolic antioxidant (a1), 0.012 g of phenolic antioxidant (a4) (0.3 parts by mass with respect to 100 parts by mass of the polyimide resin) was used. A polyimide resin composition was obtained. In the same manner as in Example 1, a polyimide resin film having a thickness of 64 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 1 below.
- Example 5 instead of phenolic antioxidant (a1), 0.012 g of phenolic antioxidant (a1) (0.3 parts by mass with respect to 100 parts by mass of polyimide resin) and 0.012 g of phenolic antioxidant (a4) A polyimide resin composition was obtained in the same manner as in Example 1 except that (0.3 parts by mass with respect to 100 parts by mass of the polyimide resin) was used. In the same manner as in Example 1, a polyimide resin film having a thickness of 63 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 1 below.
- Comparative Example 1 A polyimide resin composition was obtained in the same manner as in Example 1 except that the phenolic antioxidant (a1) was not added. In the same manner as in Example 1, a polyimide resin film having a thickness of 70 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 1 below.
- Example 6 A polyimide resin composition was obtained in the same manner as in Example 1 except that the temperature in the hot air dryer after obtaining the primary dry film was changed from 200 ° C to 250 ° C. In the same manner as in Example 1, a polyimide resin film having a thickness of 73 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 7 The amount of phenolic antioxidant (a1) added was changed from 0.3 parts by mass to 0.6 parts by mass, and the temperature in the hot air dryer after obtaining the primary dry film was changed from 200 ° C to 250 ° C.
- a polyimide resin composition was obtained in the same manner as in Example 1 except that.
- a polyimide resin film having a thickness of 60 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 8 Instead of the phenolic antioxidant (a1), 0.004 g of the phenolic antioxidant (a3) (0.1 part by mass with respect to 100 parts by mass of the polyimide resin) was used to obtain a primary dry film.
- a polyimide resin composition was obtained in the same manner as in Example 1 except that the temperature in the hot air dryer was changed from 200 ° C to 250 ° C.
- a polyimide resin film having a thickness of 70 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 9 Instead of phenolic antioxidant (a1), 0.012 g of phenolic antioxidant (a4) (0.3 parts by mass with respect to 100 parts by mass of polyimide resin) was used to obtain a primary dry film.
- a polyimide resin composition was obtained in the same manner as in Example 1 except that the temperature in the hot air dryer was changed from 200 ° C to 250 ° C.
- a polyimide resin film having a thickness of 80 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 10 instead of the phenolic antioxidant (a1), 0.024 g of the phenolic antioxidant (a4) (0.6 parts by mass with respect to 100 parts by mass of the polyimide resin) was used to obtain a primary dry film.
- a polyimide resin composition was obtained in the same manner as in Example 1 except that the temperature in the hot air dryer was changed from 200 ° C to 250 ° C.
- a polyimide resin film having a thickness of 66 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 11 Instead of the phenolic antioxidant (a1), 0.006 g of the phenolic antioxidant (a5) (0.15 parts by mass with respect to 100 parts by mass of the polyimide resin) and 0.006 g of the phosphorus antioxidant (b1) (0.15 parts by mass with respect to 100 parts by mass of the polyimide resin) was used in the same manner as in Example 1 except that the temperature in the hot air dryer after obtaining the primary dry film was changed from 200 ° C to 250 ° C. Thus, a polyimide resin composition was obtained.
- Example 2 a polyimide resin film having a thickness of 76 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 12 Instead of the phenolic antioxidant (a1), 0.006 g of the phenolic antioxidant (a1) (0.15 parts by mass with respect to 100 parts by mass of the polyimide resin) and 0.006 g of the phenolic antioxidant (a4) (0.15 parts by mass with respect to 100 parts by mass of the polyimide resin) was used in the same manner as in Example 1 except that the temperature in the hot air dryer after obtaining the primary dry film was changed from 200 ° C to 250 ° C. Thus, a polyimide resin composition was obtained.
- Example 2 In the same manner as in Example 1, a 65 ⁇ m-thick polyimide resin film was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 13 Instead of phenolic antioxidant (a1), 0.012 g of phenolic antioxidant (a1) (0.3 parts by mass with respect to 100 parts by mass of polyimide resin) and 0.012 g of phenolic antioxidant (a4) (0.3 parts by mass with respect to 100 parts by mass of the polyimide resin) was used in the same manner as in Example 1 except that the temperature in the hot air dryer after obtaining the primary dry film was changed from 200 ° C to 250 ° C. Thus, a polyimide resin composition was obtained.
- Example 2 In the same manner as in Example 1, a polyimide resin film having a thickness of 55 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 14 Instead of the phenolic antioxidant (a1), 0.002 g of the phenolic antioxidant (a3) (0.05 parts by mass with respect to 100 parts by mass of the polyimide resin) and 0.002 g of the phosphorus antioxidant (b2) (0.05 parts by mass with respect to 100 parts by mass of polyimide resin) was used in the same manner as in Example 1 except that the temperature in the hot air dryer after obtaining the primary dry film was changed from 200 ° C to 250 ° C. Thus, a polyimide resin composition was obtained.
- Example 2 a polyimide resin film having a thickness of 64 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Example 15 Instead of phenolic antioxidant (a1), 0.006 g of phenolic antioxidant (a4) (0.15 parts by mass with respect to 100 parts by mass of polyimide resin) and 0.006 g of sulfurous antioxidant (c1) (0.15 parts by mass with respect to 100 parts by mass of the polyimide resin) was used in the same manner as in Example 1 except that the temperature in the hot air dryer after obtaining the primary dry film was changed from 200 ° C to 250 ° C. Thus, a polyimide resin composition was obtained.
- Example 2 In the same manner as in Example 1, a polyimide resin film having a thickness of 78 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Comparative Example 2 A polyimide resin composition was prepared in the same manner as in Example 1 except that the temperature in the hot air dryer after the primary dry film was obtained was changed from 200 ° C. to 250 ° C. without adding the phenolic antioxidant (a1). Got. In the same manner as in Example 1, a 79 ⁇ m-thick polyimide resin film was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
- Comparative Example 3 Instead of the phenolic antioxidant (a1), 0.004 g of phosphorus antioxidant (b2) (0.1 part by mass with respect to 100 parts by mass of the polyimide resin) was used to obtain a primary dry film.
- a polyimide resin composition was obtained in the same manner as in Example 1 except that the temperature in the hot air dryer was changed from 200 ° C to 250 ° C.
- a polyimide resin film having a thickness of 70 ⁇ m was obtained from the obtained polyimide resin composition, and the residual solvent amount, total light transmittance, haze value, and YI value of the polyimide resin film were determined by the methods described above. It was measured. The results are shown in Table 2 below.
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Abstract
Description
[1] ポリイミド樹脂と酸化防止剤と溶媒とを含むポリイミド樹脂組成物を基材上に塗布して塗布膜を形成する塗布工程と、空気中で180℃以上で乾燥する乾燥工程とを含み、前記酸化防止剤がフェノール系酸化防止剤であり、前記ポリイミド樹脂100質量部に対する前記フェノール系酸化防止剤の含有量を0.05質量部以上とするポリイミド樹脂フィルムの製造方法。
[2] 前記塗布工程と前記乾燥工程との間に、前記塗布膜を、加温温度50~110℃、加温時間30~90分の範囲で加温して、1次乾燥フィルムを作製する1次乾燥フィルム作製工程を含む[1]に記載のポリイミド樹脂フィルムの製造方法。
[3] 前記溶媒が、N,N-ジメチルアセトアミド及びγ-ブチロラクトンから選ばれる少なくとも1種である[1]又は[2]に記載のポリイミド樹脂フィルムの製造方法。
[4] 前記ポリイミド樹脂組成物が硫黄系酸化防止剤及び/又はリン系酸化防止剤を含有し、前記ポリイミド樹脂100質量部に対する前記硫黄系酸化防止剤及び/又はリン系酸化防止剤の合計含有量が10質量部以下である[1]~[3]のいずれかに記載のポリイミド樹脂フィルムの製造方法。
[5] ポリイミド樹脂とフェノール系酸化防止剤とを含むポリイミド樹脂組成物の乾燥物からなり、残留溶媒量が3.0質量%以下であるポリイミド樹脂フィルム。
[6] 前記ポリイミド樹脂組成物における、前記ポリイミド樹脂100質量部に対する前記フェノール系酸化防止剤の含有量が0.05質量部以上である[5]に記載のポリイミド樹脂フィルム。
本発明のポリイミド樹脂フィルムの製造方法は、特定の塗布工程と乾燥工程とを含む。以下、これらについて詳説する。
塗布工程では、ポリイミド樹脂と酸化防止剤と溶媒とを含むポリイミド樹脂組成物を基材上に塗布して塗布膜を形成する。
ポリイミド樹脂組成物の製造方法は特に限定されず、例えば、ポリイミド樹脂を構成するジアミン成分を溶媒中にイミド化触媒とともに溶解し、ジアミン溶液を得る。このジアミン溶液に、ポリイミド樹脂を構成するテトラカルボン酸二無水物を溶媒と共に混合する。その後、所定温度に加熱して、ポリイミド樹脂溶液を得る。そして、このポリイミド樹脂溶液へ酸化防止剤を混合することで、当該ポリイミド樹脂組成物が得られる。
具体的な反応方法としては、(1)ジアミン成分及び反応溶媒を反応器に仕込んで溶解させた後、テトラカルボン酸二無水物成分を仕込み、必要に応じて室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(2)テトラカルボン酸二無水物成分、ジアミン成分、及び反応溶媒を反応器に仕込み、室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(3)テトラカルボン酸二無水物成分、ジアミン成分、及び反応溶媒を反応器に仕込み、直ちに昇温してイミド化反応を行う方法等が挙げられる。
なお、イミド化触媒を用いない場合のイミド化反応の温度は、好ましくは200~350℃である。
上述したように、YIが低く、高透明なポリイミド樹脂フィルムを得るためには、フィルム作製過程におけるポリイミド樹脂の酸化を避けるべく、乾燥工程を窒素雰囲気下で行うことが従来は一般的であった。
生産性向上及びコスト低減の観点からは乾燥工程を空気中で行うことが望まれるものの、空気中で高温乾燥するとポリイミド樹脂が酸化されやすく、その結果、得られるポリイミド樹脂フィルムのYIは高くなりやすく、透明性も低くなりやすい。一方、ポリイミド樹脂の酸化を抑制するために酸化防止剤を添加すると、ポリイミド樹脂の酸化は抑えられても、酸化防止剤の存在自体が原因で、フィルムのYIの増加及び透明性の低下が懸念される。そのため、ポリイミド樹脂の製造方法において、乾燥工程を空気中で行うことは難しいと考えられていた。
しかしながら、驚くことに酸化防止剤の中でもフェノール系酸化防止剤であれば、ポリイミド樹脂の酸化を十分に抑えつつ、かつ、酸化防止剤の存在自体を原因とするフィルムの着色や透明性低下が極めて少ないことを本発明者らは見出した。
化合物(A2)は、ペンタエリトリトールテトラキス[3-(3,5-ジ-tert-ブチル-4-ヒドロキシフェニル)プロピオナート]であり、ADEKA社製のアデカスタブAO-60、SONGWON社製のSONGNOX1010、又はBASF社製のイルガノックス(Irganox)1010として入手可能である。
化合物(A3)は、3,9-ビス[2-〔3-(3-tert-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ〕-1,1-ジメチルエチル]-2,4,8,10-テトラオキサスピロ[5.5]ウンデカンであり、住友化学株式会社製のSUMILIZER GA-80又はADEKA社製のアデカスタブAO-80として入手可能である。
(式中、Rxは炭素数4~39の4価の脂肪族炭化水素基又は脂環式炭化水素基である。Ryは炭素数1~39の2価の脂肪族炭化水素基、炭素数4~39の2価の脂環式炭化水素基、炭素数6~39の2価の芳香族炭化水素基、又はこれらの組み合わせからなる基であって、結合基として、-O-、-SO2-、-CO-、-CH2-、-C(CH3)2-、-OSi(CH3)2-、-C2H4O-及び-S-からなる群から選ばれる少なくとも1つの基を含有していてもよい。)
また、Rxが表す、炭素数4~39の4価の脂環式炭化水素基としては、例えばシクロブタン-1,2,3,4-テトライル基、シクロペンタン-1,2,4,5-テトライル基、シクロヘキサン-1,2,4,5-テトライル基、ビシクロ[2.2.2]オクト-7-エン-2,3,5,6-テトライル基、ビシクロ[2.2.2]オクタン-2,3,5,6-テトライル基、3,3’,4,4’-ジシクロヘキシルテトライル基、3,6-ジメチルシクロヘキサン-1,2,4,5-テトライル基、3,6-ジフェニルシクロヘキサン-1,2,4,5-テトライル基等の基が挙げられる。
Ryが表す、上記結合基を有する又は有さない炭素数1~39の2価の脂肪族炭化水素基としては、例えば下記構造式で示される基が挙げられる。
脂肪族もしくは脂環式テトラカルボン酸の誘導体としては、脂肪族もしくは脂環式テトラカルボン酸、脂肪族もしくは脂環式テトラカルボン酸エステル類、脂肪族もしくは脂環式テトラカルボン酸二無水物等が挙げられる。なお、脂肪族もしくは脂環式テトラカルボン酸又はその誘導体のうち、脂環式テトラカルボン酸二無水物が好ましい。
ジアミンの誘導体としては、ジイソシアネート、ジアミノジシラン類等が挙げられる。ジアミン又はその誘導体のうち、ジアミンが好ましい。
かかる他のテトラカルボン酸又はその誘導体としては、例えばピロメリット酸、3,3’,4,4’-ビフェニルテトラカルボン酸、2,3,3’,4’-ビフェニルテトラカルボン酸、2,2-ビス(3,4-ジカルボキシフェニル)プロパン、2,2-ビス(2,3-ジカルボキシフェニル)プロパン、2,2-ビス(3,4-ジカルボキシフェニル)-1,1,1,3,3,3-ヘキサフルオロプロパン、2,2-ビス(2,3-ジカルボキシフェニル)-1,1,1,3,3,3-ヘキサフルオロプロパン、ビス(3,4-ジカルボキシフェニル)スルホン、ビス(3,4-ジカルボキシフェニル)エーテル、ビス(2,3-ジカルボキシフェニル)エーテル、3,3’,4,4’-ベンゾフェノンテトラカルボン酸、2,2’,3,3’-ベンゾフェノンテトラカルボン酸、4,4-(p-フェニレンジオキシ)ジフタル酸、4,4-(m-フェニレンジオキシ)ジフタル酸、1,1-ビス(2,3-ジカルボキシフェニル)エタン、ビス(2,3-ジカルボキシフェニル)メタン、ビス(3,4-ジカルボキシフェニル)メタン等の芳香族系テトラカルボン酸及びこれらの誘導体(特に二無水物);エチレンテトラカルボン酸等の炭素数1~3の脂肪族テトラカルボン酸及びこれらの誘導体(特に二無水物)等が挙げられる。
また、ジアミン誘導体であるジアミノジシラン類としては、例えば上記芳香族又は脂肪族ジアミンとクロロトリメチルシランを反応させて得られるトリメチルシリル化した芳香族又は脂肪族ジアミンが挙げられる。
ポリイミド樹脂組成物中に含まれる溶媒は、N,N-ジメチルアセトアミド、γ-ブチロラクトンより選ばれる少なくとも1種を含むことが好ましく、N,N-ジメチルアセトアミド及びγ-ブチロラクトンの両方を含むことがより好ましい。ポリイミド樹脂組成物中にこれらの溶媒を含むと、本発明に係るポリイミド樹脂組成物を空気中で180℃以上で乾燥した際のYIの上昇が抑制される傾向がある。特に、後述するように、ジアミン成分として1,4-ビス(4-アミノ-α,α-ジメチルベンジル)ベンゼン及び4,4’-ビス(4-アミノフェノキシ)ビフェニル、脂環式テトラカルボン酸成分として1,2,4,5-シクロヘキサンテトラカルボン酸二無水物を用いた場合に有効である。
なお、本発明に係る乾燥工程による乾燥を行うまでの溶媒中のN,N-ジメチルアセトアミドとγ-ブチロラクトンとの配合質量比(N,N-ジメチルアセトアミド:γ-ブチロラクトン)は、90:10~10:90であることが好ましく、70:30~30:70であることがより好ましく、2:1であることがさらに好ましい。配合質量比が上記範囲にあると、高温下でもYIの悪化を抑えることができる。
本発明においては塗布後に後述する乾燥工程による乾燥を行うが、その前段階として、1次乾燥フィルムを作製することが好ましい。すなわち、1次乾燥フィルム作製工程を、塗布工程と乾燥工程の間に設けることが好ましい。1次乾燥フィルム作製工程においては、塗布工程で形成した塗布膜を乾燥工程の乾燥温度より低温で加温することにより、自己支持性を有する1次乾燥フィルムを得ることが好ましい。これにより、後の乾燥工程で効率よく乾燥を行うことができる。1次乾燥フィルムを作製する際の条件は、加温温度50~110℃、加温時間30~90分とすることが好ましい。また加温は空気中あるいは窒素雰囲気中のいずれで行ってもよいが、空気中であることが好ましい。加温手段は特に限定されず、熱風乾燥機やホットプレート等の公知の機器を利用できる。
乾燥工程では、塗布工程で得られた塗布膜を、好ましくは上記の1次乾燥フィルムを、空気中で180℃以上で乾燥する。180℃以上とすることで、ポリイミド樹脂フィルムの残留溶媒量を1.5%以下とすることができる。ポリイミド樹脂フィルムの残留溶媒量を1.5%以下とすることで、後工程でのアウトガス発生を抑制することができる。
乾燥温度は190~300℃であることが好ましく、200~270℃であることがより好ましく、230~270℃であることがさらに好ましい。
また、乾燥時間は、残存溶媒量とコスト/生産性の観点から、0.5時間~5時間であることが好ましく、2時間~4時間であることがより好ましい。
なお、本発明において、「空気中」とは、特に窒素雰囲気等の雰囲気を制御しない状態の雰囲気をいう。
また、乾燥については、最も高い乾燥温度が既述の温度(180℃以上)にあればよく、複数回の乾燥を行ってもよい。
なお、ポリイミド樹脂フィルムのYI、ヘイズ、全光線透過率は、実施例に記載の方法により測定することができる。
本発明のポリイミド樹脂フィルムは、ポリイミド樹脂とフェノール系酸化防止剤とを含むポリイミド樹脂組成物の乾燥物からなり、残留溶媒量が3.0質量%以下である。
なお、上記「乾燥物」とは、例えば、既述の本発明のポリイミド樹脂フィルムの製造方法に係る乾燥によって得られ、残留溶媒量が3.0質量%以下とされたものをいう。
なお、残留溶媒量は、実施例に記載の方法により測定することができる。
また、本発明のポリイミド樹脂フィルムの黄色度(YI)は、膜厚70μmで10以下であることが好ましく、4以下であることがより好ましい。全光線透過率は、例えば厚みが80μmで85%以上であることが好ましく、89%以上であることがより好ましい。ヘイズは、8以下であることが好ましく、1以下であることがより好ましい。
なお、本発明の製造方法により製造されるポリイミド樹脂フィルム、又は、本発明のポリイミド樹脂フィルムは、自立膜としてのフィルム単体となっている場合もあり、また、積層体の一部の層となっている場合もある。
(1)全光線透過率、YI値(Yellow Index)及びヘイズ
JIS K7105に準拠して、全光線透過率、YI値及びヘイズを、ヘイズメーター(Z-Σ80、日本電色工業株式会社製)を用いて測定した。
(2)残留溶媒量(溶媒残存率)
熱重量分析装置(DTG-50、株式会社島津製作所製)を用い、窒素気流下、昇温速度15℃/minの条件で、室温から300℃まで昇温し、300℃で30分間保持した。150℃から300℃まで昇温する間と300℃で30分間保持する間に減少した質量の合計を試料の初期の質量で除し、溶媒残存率とした。
ステンレス製半月型撹拌翼、窒素導入管、冷却管を取り付けたディーンスターク、温度計、ガラス製エンドキャップを備えた300mLの5つ口丸底フラスコに、ジアミン成分として1,4-ビス(4-アミノ-α,α-ジメチルベンジル)ベンゼン(三井化学ファイン株式会社製)12.65g(0.037モル)及び4,4’-ビス(4-アミノフェノキシ)ビフェニル(和歌山精化工業株式会社製)13.53g(0.037モル)、有機溶媒としてγ-ブチロラクトン(三菱化学株式会社製)51.18g、イミド化触媒としてトリエチルアミン(関東化学株式会社製)0.372gを投入し、系内温度70℃、窒素雰囲気下、回転数200rpmで撹拌して溶液を得た。
なお、フィルムの屈折率nDは、株式会社アタゴ製屈折率測定装置(DR-M2)を用い、589nmの干渉フィルターをセットして、23℃で屈折率を測定した。ガラス転移温度は、エス・アイ・アイ・ナノテクノロジー株式会社製示差熱分析装置(型番DSC-6220)により、窒素雰囲気下において10℃/分で400℃まで昇温して測定した。
なお、使用した酸化防止剤は以下の通りである。
フェノール系酸化防止剤(a1):SUMILIZER GP(住友化学株式会社製)
フェノール系酸化防止剤(a2):アデカスタブAO-60(ADEKA社製)
フェノール系酸化防止剤(a3):アデカスタブAO-80(ADEKA社製)
フェノール系酸化防止剤(a4):SUMILIZER GA-80(住友化学株式会社製)
フェノール系酸化防止剤(a5):SONGNOX1010(SONGWON社製)
リン系酸化防止剤(b1):SONGNOX1680(SONGWON社製)
リン系酸化防止剤(b2):PEP-36A(ADEKA社製)
硫黄系酸化防止剤(c1):SUMILIZER TP-D(住友化学株式会社製)
上記の通り作製したポリイミド樹脂溶液(固形分20質量%)20gと、フェノール系酸化防止剤(a1)0.012g(ポリイミド樹脂100質量部に対して0.3質量部)とをT.K.HOMODISPER Model 2.5(プライミクス株式会社製)を用いて、回転数2000rpmで5分間混練し、ポリイミド樹脂組成物を得た。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a2)0.004g(ポリイミド樹脂100質量部に対して0.1質量部)を用いた以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み56μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表1に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a3)0.004g(ポリイミド樹脂100質量部に対して0.1質量部)を用いた以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み56μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表1に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a4)0.012g(ポリイミド樹脂100質量部に対して0.3質量部)を用いた以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み64μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表1に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a1)0.012g(ポリイミド樹脂100質量部に対して0.3質量部)及びフェノール系酸化防止剤(a4)0.012g(ポリイミド樹脂100質量部に対して0.3質量部)を用いた以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み63μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表1に示す。
フェノール系酸化防止剤(a1)を添加しなかった以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み70μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表1に示す。
1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み73μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の添加量を0.3質量部から0.6質量部に変更し、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み60μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a3)0.004g(ポリイミド樹脂100質量部に対して0.1質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み70μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a4)0.012g(ポリイミド樹脂100質量部に対して0.3質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み80μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a4)0.024g(ポリイミド樹脂100質量部に対して0.6質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み66μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a5)0.006g(ポリイミド樹脂100質量部に対して0.15質量部)及びリン系酸化防止剤(b1)0.006g(ポリイミド樹脂100質量部に対して0.15質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み76μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a1)0.006g(ポリイミド樹脂100質量部に対して0.15質量部)及びフェノール系酸化防止剤(a4)0.006g(ポリイミド樹脂100質量部に対して0.15質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み65μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a1)0.012g(ポリイミド樹脂100質量部に対して0.3質量部)及びフェノール系酸化防止剤(a4)0.012g(ポリイミド樹脂100質量部に対して0.3質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み55μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a3)0.002g(ポリイミド樹脂100質量部に対して0.05質量部)及びリン系酸化防止剤(b2)0.002g(ポリイミド樹脂100質量部に対して0.05質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み64μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、フェノール系酸化防止剤(a4)0.006g(ポリイミド樹脂100質量部に対して0.15質量部)及び硫黄系酸化防止剤(c1)0.006g(ポリイミド樹脂100質量部に対して0.15質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み78μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)を添加せず、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み79μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
フェノール系酸化防止剤(a1)の代わりに、リン系酸化防止剤(b2)0.004g(ポリイミド樹脂100質量部に対して0.1質量部)を用い、1次乾燥フィルムを得た後の熱風乾燥機中の温度を200℃から250℃に変更した以外は実施例1と同様にしてポリイミド樹脂組成物を得た。実施例1と同様にして、得られたポリイミド樹脂組成物から厚み70μmのポリイミド樹脂フィルムを得、当該ポリイミド樹脂フィルムの残留溶媒量、全光線透過率、ヘイズ値、YI値を既述の方法で測定した。結果を下記表2に示す。
上記の結果から、使用したポリイミド樹脂は空気中200℃で乾燥してもあまり酸化されないものであったと考えられる。そのため、酸化防止剤を添加していない場合(比較例1)であってもフィルムは良好なYI及び全光線透過率を示し、同じポリイミド樹脂に対して酸化防止剤を添加した場合(実施例1~5)でもYI及び全光線透過率の改善は限定的であったと考えられる。ただし、実施例1~5では、酸化防止剤としてフェノール系酸化防止剤を用いた結果、フィルム中に存在する酸化防止剤の存在自体に起因するYI及び全光線透過率の低下も認められなかった。
しかし、比較例2のフィルム製造方法は、比較例1のフィルム製造方法と乾燥温度の点でのみ異なり、同じポリイミド樹脂を使用したにもかかわらず、YI及び全光線透過率の評価結果が非常に悪かった(YIは非常に高い値となり、全光線透過率は非常に低い値となった)。これは、空気中250℃の乾燥条件下では、ポリイミド樹脂の酸化が進行したことに起因すると考えられる。しかし、空気中250℃の乾燥条件下においても、同じポリイミド樹脂に対してフェノール系酸化防止剤を添加した場合(実施例6~15)には、YI及び全光線透過率は良好な値を示し、酸化防止剤の添加による大幅な改善が認められた。また、空気中250℃の乾燥条件下において、同じポリイミド樹脂に対してリン系酸化防止剤のみを添加した場合(比較例3)には、YIはさらに悪化してしまい、全光線透過率はそれほど大きくは改善されなかった。
Claims (6)
- ポリイミド樹脂と酸化防止剤と溶媒とを含むポリイミド樹脂組成物を基材上に塗布して塗布膜を形成する塗布工程と、空気中で180℃以上で乾燥する乾燥工程とを含み、
前記酸化防止剤がフェノール系酸化防止剤であり、
前記ポリイミド樹脂100質量部に対する前記フェノール系酸化防止剤の含有量を0.05質量部以上とするポリイミド樹脂フィルムの製造方法。 - 前記塗布工程と前記乾燥工程との間に、前記塗布膜を、加温温度50~110℃、加温時間30~90分の範囲で加温して、1次乾燥フィルムを作製する1次乾燥フィルム作製工程を含む請求項1に記載のポリイミド樹脂フィルムの製造方法。
- 前記溶媒が、N,N-ジメチルアセトアミド及びγ-ブチロラクトンから選ばれる少なくとも1種である請求項1又は2に記載のポリイミド樹脂フィルムの製造方法。
- 前記ポリイミド樹脂組成物が硫黄系酸化防止剤及び/又はリン系酸化防止剤を含有し、
前記ポリイミド樹脂100質量部に対する前記硫黄系酸化防止剤及び/又はリン系酸化防止剤の合計含有量が10質量部以下である請求項1~3のいずれか1項に記載のポリイミド樹脂フィルムの製造方法。 - ポリイミド樹脂とフェノール系酸化防止剤とを含むポリイミド樹脂組成物の乾燥物からなり、残留溶媒量が3.0質量%以下であるポリイミド樹脂フィルム。
- 前記ポリイミド樹脂組成物における、前記ポリイミド樹脂100質量部に対する前記フェノール系酸化防止剤の含有量が0.05質量部以上である請求項5に記載のポリイミド樹脂フィルム。
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TWI752982B (zh) | 2022-01-21 |
KR20190032372A (ko) | 2019-03-27 |
EP3489284A4 (en) | 2019-07-24 |
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