WO2017170051A1 - ガラス粉末及びそれを用いた封着材料 - Google Patents
ガラス粉末及びそれを用いた封着材料 Download PDFInfo
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- WO2017170051A1 WO2017170051A1 PCT/JP2017/011486 JP2017011486W WO2017170051A1 WO 2017170051 A1 WO2017170051 A1 WO 2017170051A1 JP 2017011486 W JP2017011486 W JP 2017011486W WO 2017170051 A1 WO2017170051 A1 WO 2017170051A1
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- glass
- sealing material
- laser
- sealing
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- 239000011521 glass Substances 0.000 title claims abstract description 165
- 239000000843 powder Substances 0.000 title claims abstract description 90
- 239000003566 sealing material Substances 0.000 title claims description 115
- 239000000203 mixture Substances 0.000 claims abstract description 19
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000007789 sealing Methods 0.000 claims description 89
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 39
- 239000000945 filler Substances 0.000 claims description 26
- 239000002131 composite material Substances 0.000 claims description 15
- 239000011358 absorbing material Substances 0.000 claims description 10
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052878 cordierite Inorganic materials 0.000 claims description 4
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910000174 eucryptite Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- CNLWCVNCHLKFHK-UHFFFAOYSA-N aluminum;lithium;dioxido(oxo)silane Chemical compound [Li+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O CNLWCVNCHLKFHK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052642 spodumene Inorganic materials 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- 229910052844 willemite Inorganic materials 0.000 claims description 3
- 229910052845 zircon Inorganic materials 0.000 claims description 3
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims description 3
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical class [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 claims description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 abstract 4
- 229910052593 corundum Inorganic materials 0.000 abstract 1
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- CUVLMZNMSPJDON-UHFFFAOYSA-N 1-(1-butoxypropan-2-yloxy)propan-2-ol Chemical compound CCCCOCC(C)OCC(C)O CUVLMZNMSPJDON-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
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- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
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- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
- C03C3/145—Silica-free oxide glass compositions containing boron containing aluminium or beryllium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/57—Working by transmitting the laser beam through or within the workpiece the laser beam entering a face of the workpiece from which it is transmitted through the workpiece material to work on a different workpiece face, e.g. for effecting removal, fusion splicing, modifying or reforming
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
Definitions
- the present invention relates to a glass powder and a sealing material using the glass powder, and more particularly to a glass powder suitable for a sealing process using a laser beam (hereinafter referred to as laser sealing) and a sealing material using the glass powder.
- laser sealing a glass powder suitable for a sealing process using a laser beam (hereinafter referred to as laser sealing) and a sealing material using the glass powder.
- organic EL displays have attracted attention as flat display panels.
- an organic resin adhesive having low-temperature curability has been used as an adhesive material for organic EL displays.
- organic resin adhesives cannot completely block the ingress of gas and moisture, so active elements with low water resistance and organic light emitting layers are likely to deteriorate, and the display characteristics of organic EL displays deteriorate over time. Has occurred.
- the sealing material containing glass powder is less permeable to gas and moisture than the organic resin adhesive, the airtightness inside the organic EL display can be secured.
- the glass powder has a higher softening temperature than the organic resin adhesive, there is a possibility that the active element and the organic light emitting layer are thermally deteriorated at the time of sealing. For these reasons, laser sealing has attracted attention. According to laser sealing, it is possible to locally heat only the part to be sealed, and seal an object to be sealed such as an alkali-free glass substrate without causing thermal degradation of the active element or the organic light emitting layer. can do.
- LTCC low-temperature fired substrate
- the substrate and lid (lid) are used.
- an airtight package on which an LED element that emits light in the ultraviolet wavelength region is mounted it becomes easy to maintain light emission characteristics in the ultraviolet wavelength region by laser sealing. Furthermore, thermal degradation of the LED element can be prevented by laser sealing.
- the fluidity of the sealing material is important for laser sealing.
- the fluidity of the sealing material is high, the laser sealing strength is improved, and an airtight leak or the like hardly occurs due to mechanical impact or the like.
- it is effective to lower the melting point of the sealing material.
- the present invention has been made in view of the above circumstances, and its technical problem is to create a glass powder having a high fluidity during laser sealing and a low thermal expansion coefficient, and a sealing material using the same. By doing so, it is to suppress the deterioration of characteristics of the organic EL display, the hermetic package and the like.
- the present inventor has found that the above technical problem can be solved by strictly regulating the glass composition range of the glass powder, and proposes the present invention. That is, the glass powder of the present invention has a glass composition of mass%, Bi 2 O 3 + CuO 83 to 95%, Bi 2 O 3 75 to 90%, B 2 O 3 3 to 12%, ZnO 1 to 10%. Al 2 O 3 0 to 5%, CuO 4 to 15%, Fe 2 O 3 0 to 5%, MgO + CaO + SrO + BaO 0 to 7%, and substantially free of PbO.
- Bi 2 O 3 + CuO refers to the total amount of Bi 2 O 3 and CuO.
- MgO + CaO + SrO + BaO refers to the total amount of MgO, CaO, SrO and BaO. “Substantially no PbO” refers to the case where the content of PbO in the glass composition is less than 0.1 mass%.
- the total amount of Bi 2 O 3 and CuO has a great influence on increasing the fluidity during laser sealing.
- the content of Bi 2 O 3 + CuO in the glass composition is 83 to 95% by mass.
- the content of Bi 2 O 3 + CuO is regulated to 83% by mass or more, the fluidity at the time of laser sealing can be improved.
- the content of Bi 2 O 3 + CuO is regulated to 95% by mass or more, the glass is devitrified at the time of laser sealing, and it becomes easy to secure desired fluidity.
- the glass powder of the present invention has a CuO content of 4 to 15% by mass in the glass composition.
- the content of CuO is restricted to 4% by mass or more, the light absorption property is improved, and thus the fluidity at the time of laser sealing can be improved.
- the CuO content is restricted to 15% by mass or less, the glass becomes difficult to devitrify during laser sealing.
- the glass powder of the present invention has a ZnO content in the glass composition of 1 to 10% by mass.
- the content of ZnO is restricted to 1% by mass or more, the thermal expansion coefficient can be reduced.
- the content of ZnO is restricted to 10% by mass or less, the glass becomes difficult to devitrify at the time of laser sealing when the content of Bi 2 O 3 + CuO is 83% by mass or more.
- the glass powder of the present invention has a content of MgO + CaO + SrO + BaO in the glass composition of 7% by mass or less.
- the content of MgO + CaO + SrO + BaO is restricted to 7% by mass or less, the thermal expansion coefficient is easily lowered while securing fluidity during laser sealing.
- the glass powder of the present invention does not substantially contain PbO in the glass composition. In this way, environmental demands in recent years can be satisfied.
- the glass powder of the present invention preferably has a ZnO content of 1 to less than 5% by mass.
- the glass powder of the present invention preferably has a mass ratio (Bi 2 O 3 + CuO) / ZnO of 15 to 70.
- “(Bi 2 O 3 + CuO) / ZnO” refers to a value obtained by dividing the total amount of Bi 2 O 3 and CuO by the content of ZnO.
- the glass powder of the present invention preferably has a content of MgO + CaO + SrO + BaO of 0 to less than 2.0% by mass. If it does in this way, a thermal expansion coefficient can be reduced reliably, ensuring favorable fluidity at the time of laser sealing. As a result, long-term reliability after laser sealing can be improved.
- the sealing material of the present invention is a sealing material containing glass powder and refractory filler powder, wherein the glass powder is the glass powder described above, and the glass powder content is 50 to 95% by volume.
- the content of the refractory filler powder is preferably 5 to 50% by volume.
- the refractory filler powder is cordierite, willemite, alumina, zirconium phosphate compound, zircon, zirconia, tin oxide, quartz glass, ⁇ -eucryptite, ⁇ - It is preferable that it is 1 type, or 2 or more types chosen from quartz solid solution and spodumene.
- These refractory filler powders have good compatibility with the glass powder and have low thermal expansion. Therefore, when these refractory filler powders are used, the thermal expansion coefficient of the sealing material can be lowered so as to match the thermal expansion coefficient of the object to be sealed without devitrifying the glass powder during sealing.
- the sealing material of the present invention preferably further contains 0 to 25% by volume of a laser absorber.
- the sealing material of the present invention is a laser absorber, one or more selected from Cu-based oxides, Fe-based oxides, Cr-based oxides, Mn-based oxides and complex oxides thereof. It is preferable that If it does in this way, since it becomes easy to convert a laser beam into a heat energy, a laser sealing intensity
- to oxide refers to an oxide containing an explicit component as an essential component.
- the sealing material of the present invention is preferably used for laser sealing.
- the light source of the laser beam used for laser sealing is not particularly limited.
- a semiconductor laser, a YAG laser, a CO 2 laser, an excimer laser, an infrared laser, and the like are preferable in terms of easy handling.
- the emission center wavelength of the laser beam is preferably 500 to 1600 nm, particularly preferably 750 to 1300 nm, in order for the sealing material to absorb the laser beam accurately.
- the glass powder of the present invention has a glass composition in terms of mass%, Bi 2 O 3 + CuO 83 to 95%, Bi 2 O 3 75 to 90%, B 2 O 3 3 to 12%, ZnO 1 to 10%, Al It contains 2 O 3 0 to 5%, CuO 4 to 15%, Fe 2 O 3 0 to 5%, MgO + CaO + SrO + BaO 0 to 7%, and is substantially free of PbO.
- the reason for limiting the glass composition range of the glass powder as described above is shown below.
- % display points out the mass%.
- the total amount of Bi 2 O 3 and CuO has a great influence on increasing the fluidity at the time of laser sealing.
- the content of Bi 2 O 3 + CuO is 83 to 95%, preferably 85 to 92%, particularly 87 to 91%. If the content of Bi 2 O 3 + CuO is too small, the glass does not sufficiently soften and flow even when irradiated with laser light, and it becomes difficult to ensure the laser sealing strength. However, when the content of Bi 2 O 3 + CuO is too large, the glass is devitrified during laser sealing, it can not be ensured the desired fluidity.
- Bi 2 O 3 is a main component for lowering the softening point, and its content is 75 to 90%, preferably 76 to 86%, more preferably more than 77 to 84%, still more preferably 78 to 82. %.
- Bi 2 content of O 3 is too small, too high softening point, be irradiated with laser light, the glass is hardly softened.
- the content of Bi 2 O 3 is too large, glass becomes thermally unstable, the glass is liable to devitrify during laser sealing.
- B 2 O 3 is a component that forms a glass network, and its content is 3 to 12%, preferably 4 to 10%, more preferably 5 to 9%.
- the content of B 2 O 3 is too small, glass becomes thermally unstable, the glass is liable to devitrify during laser sealing.
- the content of B 2 O 3 is too large, too high softening point, be irradiated with laser light, the glass is hardly softened.
- ZnO is a component that decreases the thermal expansion coefficient.
- the content of ZnO is 1 to 10%, preferably 2 to 7%, 2.5 to 6%, particularly 3 to less than 5%.
- a thermal expansion coefficient will become high easily.
- the content of ZnO is too large, the glass becomes thermally unstable when the content of Bi 2 O 3 + CuO is 83% or more, and the glass tends to be devitrified at the time of laser sealing.
- the mass ratio (Bi 2 O 3 + CuO) / ZnO is preferably 15 to 70, 20 to 50, 23 to 45, in particular 25 to 40. If the mass ratio (Bi 2 O 3 + CuO) / ZnO is too small, the glass does not sufficiently soften and flow even when irradiated with laser light, making it difficult to ensure the laser sealing strength. On the other hand, if the mass ratio (Bi 2 O 3 + CuO) / ZnO is too large, the thermal expansion coefficient tends to increase.
- Al 2 O 3 is a component that improves water resistance.
- the content is preferably 0 to 5%, 0 to 3%, particularly preferably 0.1 to 2%.
- the content of Al 2 O 3 is too large, too high softening point, be irradiated with laser light, the glass is hardly softened.
- CuO is a component that enhances light absorption characteristics, that is, a component that absorbs laser light and softens the glass. Furthermore, it is a component that suppresses devitrification at the time of laser sealing when the content of Bi 2 O 3 is more than 77%.
- the CuO content is preferably 4 to 15%, 5 to 12%, 6 to 11%, particularly more than 7 to 10%. If the content of CuO is too small, the light absorption characteristics are poor, and the glass is difficult to soften even when irradiated with laser light. On the other hand, when there is too much content of CuO, the component balance in a glass composition will be impaired and it will become easy to devitrify glass conversely.
- Fe 2 O 3 is a component that enhances light absorption characteristics, that is, a component that absorbs laser light and softens the glass. Furthermore, it is a component that suppresses devitrification at the time of laser sealing when the content of Bi 2 O 3 is more than 77%.
- the content of Fe 2 O 3 is preferably 0 to 5%, 0.05 to 4%, 0.1 to 3%, especially 0.2 to 2%. If the content of Fe 2 O 3 is too small, the light absorption characteristics are poor, and the glass is difficult to soften even when irradiated with laser light. On the other hand, when the content of Fe 2 O 3 is too large, is impaired balance of components in the glass composition, the glass is liable to devitrify reversed.
- MgO, CaO, SrO and BaO are components that enhance the thermal stability.
- the content of Bi 2 O 3 + CuO is 83% or more, if the total amount of MgO, CaO, SrO and BaO is too large, the thermal expansion coefficient is lowered while ensuring fluidity during laser sealing. It becomes difficult to make. Therefore, the total amount and individual content of MgO, CaO, SrO and BaO are preferably 0 to 7%, 0 to 5%, 0 to 3%, 0 to less than 2.0%, 0 to 1%, 0 to Less than 1.0%, 0-0.5%, especially 0-0.1%.
- the mass ratio (Bi 2 O 3 + CuO) / (MgO + CaO + SrO + BaO) is preferably 35 or more, 50 or more, 100 or more, particularly 150 or more. If the mass ratio (Bi 2 O 3 + CuO) / (MgO + CaO + SrO + BaO) is too small, it is difficult to reduce the thermal expansion coefficient while ensuring fluidity during laser sealing. “(Bi 2 O 3 + CuO) / (MgO + CaO + SrO + BaO)” indicates a value obtained by dividing the total amount of Bi 2 O 3 and CuO by the total amount of MgO, CaO, SrO and BaO.
- the total amount introduced is preferably 12% or less, 10% or less, and particularly preferably 5% or less.
- SiO 2 is a component that improves water resistance.
- the content is preferably 0 to 10%, 0 to 5%, particularly preferably 0 to less than 1%.
- the content of SiO 2 is too large, too high softening point, be irradiated with laser light, the glass is hardly softened.
- Sb 2 O 3 is a component that suppresses devitrification.
- the content of Sb 2 O 3 is preferably 0 to 5%, 0 to 2%, particularly 0 to 1%.
- Sb 2 O 3 is a component that suppresses devitrification at the time of laser sealing when the content of Bi 2 O 3 is more than 77%.
- the content of Sb 2 O 3 is too large, is impaired balance of components in the glass composition, the glass is liable to devitrify reversed.
- Nd 2 O 3 is a component that suppresses devitrification.
- the content of Nd 2 O 3 is preferably 0 to 5%, 0 to 2%, particularly 0 to 1%.
- Nd 2 O 3 is a component that suppresses devitrification at the time of laser sealing when the content of Bi 2 O 3 is more than 77%.
- the content of Nd 2 O 3 is too large, is impaired balance of components in the glass composition, the glass is liable to devitrify reversed.
- Li 2 O, Na 2 O, K 2 O, and Cs 2 O are components that lower the softening point, but have a function of promoting devitrification at the time of melting. Therefore, the total content of these components is preferably 2% or less, particularly preferably less than 1%.
- P 2 O 5 is a component that suppresses devitrification at the time of melting. If the amount of P 2 O 5 added is more than 1%, the glass is likely to undergo phase separation at the time of melting.
- La 2 O 3 , Y 2 O 3 and Gd 2 O 3 are components that suppress phase separation during melting, but if the content of each component is more than 3%, the softening point becomes too high, Even when laser light is irradiated, the glass becomes difficult to soften.
- NiO, V 2 O 5 , CoO, MoO 3 , TiO 2 , CeO 2 and MnO 2 are components that enhance the light absorption characteristics.
- the content of each component is preferably 0-10%, in particular 0-7%. When there is too much content of each component, it will become easy to devitrify glass at the time of laser sealing.
- Maximum particle diameter D max of the glass powder is preferably 10 ⁇ m or less, especially 5 ⁇ m or less.
- the “maximum particle diameter D max ” refers to a value measured by a laser diffractometer, and in the volume-based cumulative particle size distribution curve measured by the laser diffraction method, the accumulated amount is accumulated from the smaller particle. The particle size is 99%.
- the softening point is preferably 480 ° C. or lower, 450 ° C. or lower, particularly preferably 350 to 430 ° C. If the softening point of the glass powder is too high, the glass becomes difficult to soften at the time of laser sealing, so that the laser sealing strength cannot be increased unless the output of the laser beam is increased.
- the “softening point” refers to the temperature at the fourth inflection point when measured by macro-type differential thermal analysis.
- the sealing material of the present invention is a sealing material containing glass powder and a refractory filler powder, wherein the glass powder is the glass powder described above, the glass powder content is 50 to 95% by volume, and the refractory filler The powder content is preferably 5 to 50% by volume.
- Glass powder is a material that acts as a flux, softens and flows during laser sealing, and tightly integrates the objects to be sealed.
- the refractory filler powder is a material that acts as an aggregate, reduces the thermal expansion coefficient of the sealing material, and increases the mechanical strength of the sealing material layer.
- the content of the refractory filler powder is preferably 1 to 50% by volume, 10 to 45% by volume, 20 to 40% by volume, particularly 22 to 35% by volume.
- content of glass powder will become relatively small, and it will become difficult to ensure desired fluidity
- the addition effect of a refractory filler powder will become scarce.
- refractory filler powder Various materials can be used as the refractory filler powder. Among them, cordierite, willemite, alumina, zirconium phosphate compounds, zircon, zirconia, tin oxide, quartz glass, ⁇ -eucryptite, ⁇ -Quartz solid solution and spodumene are preferred. These refractory filler powders have high mechanical strength in addition to a low coefficient of thermal expansion and good compatibility with the glass powder of the present invention.
- the maximum particle diameter D max of the refractory filler powder is preferably 15 ⁇ m or less, less than 10 ⁇ m, less than 5 ⁇ m, particularly less than 0.5 to 3 ⁇ m. If the maximum particle size Dmax of the refractory filler powder is too large, it will be difficult to make the gap between the objects to be sealed uniform, it will be difficult to narrow the gap between the objects to be sealed, and the airtight package will be made thinner and smaller. It becomes difficult. Note that when the gap between the objects to be sealed is large and the difference in thermal expansion coefficient between the objects to be sealed and the sealing material layer is large, cracks or the like are likely to occur in the objects to be sealed or the sealing material layer.
- the sealing material of the present invention may further contain a laser absorber in order to absorb laser light and convert it into thermal energy, and the content thereof is preferably 0 to 25% by volume, particularly 0 to 10%. % By volume.
- a laser absorber When there is too much content of a laser absorber, at the time of laser sealing, a laser absorber will become easy to melt
- the average particle diameter D 50 of the laser absorbing material is preferably 0.01 to 3 ⁇ m, 0.1 to 2.5 ⁇ m, 0.3 to 2 ⁇ m, particularly 0.5 to 1.5 ⁇ m.
- the maximum particle diameter D max of the laser absorbing material is preferably less than 20 ⁇ m, less than 10 ⁇ m, 6 ⁇ m or less, particularly 0.5 to 4 ⁇ m. If the particle diameter of the laser absorbing material is too small, the laser absorbing material is likely to be dissolved in the glass at the time of laser sealing, and the thermal stability of the sealing material is likely to be impaired.
- the “average particle diameter D 50 ” refers to a value measured with a laser diffractometer, and in the volume-based cumulative particle size distribution curve measured by the laser diffraction method, the accumulated amount is accumulated from the smaller particle.
- the particle diameter is 50%.
- Various materials can be used as the laser absorber, and among them, from the viewpoint of compatibility with the glass powder of the present invention, Cu-based oxide, Fe-based oxide, Cr-based oxide, Mn-based oxide And these complex oxides are preferable. Among these, Cu-based oxides and this composite oxide are particularly preferable from the viewpoint of light absorption characteristics, and Mn-based oxides and this composite oxide are particularly preferable from the viewpoint of compatibility with the glass powder of the present invention.
- the laser absorbing material is preferably black.
- a black laser absorbing material When a black laser absorbing material is used, it becomes easy to convert the light energy of the laser light into thermal energy, and even if a foreign substance is mixed in the sealing material, it is difficult to cause an appearance defect in the sealing material layer.
- Black laser absorbers include Al-Cu-Fe-Mn complex oxide, Al-Fe-Mn complex oxide, Co-Cr-Fe complex oxide, Co-Cr-Fe-Mn complex oxide Co-Cr-Fe-Ni composite oxide, Co-Cr-Fe-Mn composite oxide, Co-Cr-Fe-Ni-Zn composite oxide, Co-Fe-Mn-Ni composite oxide Preferred are Cr-Cu composite oxides, Cr-Cu-Mn composite oxides, Cr-Fe-Mn composite oxides, Fe-Mn composite oxides, Cr 2 O 3 , and C. From the viewpoint of compatibility with glass powder, an Al—Fe—Mn composite oxide is particularly preferable.
- the thermal expansion coefficient is preferably 85 ⁇ 10 ⁇ 7 / ° C. or less, 82 ⁇ 10 ⁇ 7 / ° C. or less, 79 ⁇ 10 ⁇ 7 / ° C. or less, particularly 50 ⁇ 10 ⁇ 7 / ° C.
- the temperature is 76 ⁇ 10 ⁇ 7 / ° C. or lower.
- the “thermal expansion coefficient” refers to a value measured by a push rod type thermal expansion coefficient measurement (TMA) apparatus, and the measurement temperature range is 30 to 300 ° C.
- the softening point is preferably 510 ° C. or lower, 480 ° C. or lower, particularly 350 to 450 ° C. If the softening point of the sealing material is too high, the sealing material layer is difficult to soften at the time of laser sealing, so that the laser sealing strength cannot be increased unless the output of the laser beam is increased.
- the sealing material of the present invention may be used in the form of powder, but it is easy to handle if it is uniformly kneaded with a vehicle and processed into a sealing material paste.
- the vehicle is mainly composed of a solvent and a resin.
- the resin is added for the purpose of adjusting the viscosity of the sealing material paste.
- surfactant, a thickener, etc. can also be added as needed.
- the sealing material paste is applied to an object to be sealed using an applicator such as a dispenser or a screen printer, and then subjected to a binder removal step.
- acrylic acid ester (acrylic resin), ethyl cellulose, polyethylene glycol derivative, nitrocellulose, polymethylstyrene, polyethylene carbonate, methacrylic acid ester and the like can be used.
- acrylic acid esters and nitrocellulose are preferable because they have good thermal decomposability.
- Solvents include N, N'-dimethylformamide (DMF), ⁇ -terpineol, higher alcohol, ⁇ -butyllactone ( ⁇ -BL), tetralin, butyl carbitol acetate, ethyl acetate, isoamyl acetate, diethylene glycol monoethyl ether, diethylene glycol Monoethyl ether acetate, benzyl alcohol, toluene, 3-methoxy-3-methylbutanol, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, tripropylene Glycol monobutyl ether, propylene carbonate, dimethyl sulfoxide (DMSO), N-methyl -2-pyrrolidone and the like can be used.
- DMF dimethylformamide
- ⁇ -BL ⁇ -butyllactone
- the sealing material of the present invention has high fluidity at the time of laser sealing and has a low coefficient of thermal expansion, it can be suitably used for laser sealing of a package substrate and a glass lid of an airtight package.
- the hermetic package according to the present invention is an airtight package in which a package base and a glass lid are hermetically sealed via a sealing material layer, the sealing material layer being a sintered body of a sealing material,
- the adhesive material is the sealing material described above.
- the package base preferably has a base and a frame provided on the base. If it does in this way, it will become easy to accommodate internal elements, such as a sensor element, in the frame part of a package base.
- the frame portion of the package base is preferably formed in a frame shape along the outer edge region of the package base. In this way, the effective area that functions as a device can be expanded. In addition, it becomes easy to accommodate internal elements such as sensor elements in the space in the package substrate, and it is also easy to perform wiring bonding and the like.
- the surface roughness Ra of the surface of the region where the sealing material layer is disposed at the top of the frame is preferably less than 1.0 ⁇ m. If the surface roughness Ra of the surface increases, the accuracy of laser sealing tends to decrease.
- the “surface roughness Ra” can be measured by, for example, a stylus type or non-contact type laser film thickness meter or surface roughness meter.
- the width of the top of the frame is preferably 100 to 7000 ⁇ m, 200 to 6000 ⁇ m, particularly 300 to 5000 ⁇ m. If the width of the top of the frame is too narrow, it is difficult to align the sealing material layer and the top of the frame. On the other hand, if the width of the top of the frame is too wide, the effective area that functions as a device is reduced.
- the package substrate is preferably made of any one of glass ceramic, aluminum nitride, and aluminum oxide, or a composite material thereof (for example, aluminum nitride and glass ceramic integrated). Since glass ceramic is easy to form a sealing material layer and a reaction layer, a strong sealing strength can be secured by laser sealing. Furthermore, since the thermal via can be easily formed, it is possible to appropriately prevent the temperature of the hermetic package from rising excessively. Since aluminum nitride and aluminum oxide have good heat dissipation, it is possible to appropriately prevent the temperature of the airtight package from rising excessively.
- the glass ceramic, aluminum nitride, and aluminum oxide preferably have a black pigment dispersed (sintered in a state in which the black pigment is dispersed).
- the package base can absorb the laser light transmitted through the sealing material layer.
- the portion of the package base that comes into contact with the sealing material layer is heated during laser sealing, so that the formation of the reaction layer can be promoted at the interface between the sealing material layer and the package base.
- the package substrate in which the black pigment is dispersed has the property of absorbing the laser beam to be irradiated, for example, the thickness is 0.5 mm, and the total light transmittance at the wavelength of the laser beam to be irradiated (808 nm) is 10% or less. (Desirably 5% or less) is preferable. If it does in this way, it will become easy to raise the temperature of a sealing material layer in the interface of a package base
- the thickness of the base of the package substrate is preferably 0.1 to 2.5 mm, particularly preferably 0.2 to 1.5 mm. Thereby, thickness reduction of an airtight package can be achieved.
- the height of the frame portion of the package substrate that is, the height obtained by subtracting the thickness of the base portion from the package substrate is preferably 100 to 2500 ⁇ m, particularly 200 to 1500 ⁇ m. In this way, it becomes easy to reduce the thickness of the hermetic package while properly accommodating the internal elements.
- the glass lid may be a laminated glass obtained by bonding a plurality of glass plates.
- a functional film may be formed on the surface of the glass lid on the inner element side, or a functional film may be formed on the outer surface of the glass lid.
- an antireflection film is preferable as the functional film.
- the thickness of the glass lid is preferably 0.1 mm or more, 0.15 to 2.0 mm, particularly 0.2 to 1.0 mm. If the thickness of the glass lid is small, the strength of the hermetic package is likely to decrease. On the other hand, when the thickness of the glass lid is large, it is difficult to reduce the thickness of the hermetic package.
- the sealing material layer has a function of softening and deforming by absorbing laser light, forming a reaction layer on the surface layer of the package substrate, and hermetically integrating the package substrate and the glass lid.
- the difference in thermal expansion coefficient between the glass lid and the sealing material layer is preferably less than 50 ⁇ 10 ⁇ 7 / ° C., less than 40 ⁇ 10 ⁇ 7 / ° C., and particularly preferably 30 ⁇ 10 ⁇ 7 / ° C. or less.
- this difference in thermal expansion coefficient is too large, the stress remaining in the sealed portion becomes unreasonably high, and the hermetic reliability of the hermetic package tends to be lowered.
- the sealing material layer is preferably formed so that the contact position with the frame portion is separated from the inner edge of the top portion of the frame portion, and is separated from the outer edge of the top portion of the frame portion, More preferably, it is formed at a position 50 ⁇ m or more, 60 ⁇ m or more, 70 to 2000 ⁇ m, particularly 80 to 1000 ⁇ m apart from the inner edge of the top of the frame. If the distance between the inner edge of the top of the frame and the sealing material layer is too short, the heat generated by local heating will be difficult to escape during laser sealing, and the glass lid will be easily damaged during the cooling process. .
- the distance between the inner edge of the top of the frame and the sealing material layer is too long, it is difficult to reduce the size of the hermetic package. Further, it is preferably formed at a position 50 ⁇ m or more, 60 ⁇ m or more, 70 to 2000 ⁇ m, particularly 80 to 1000 ⁇ m apart from the outer edge of the top of the frame portion. If the distance between the outer edge of the top of the frame and the sealing material layer is too short, the heat generated by local heating will be difficult to escape during laser sealing, and the glass lid will be easily damaged during the cooling process. . On the other hand, if the distance between the outer edge of the top of the frame and the sealing material layer is too long, it is difficult to reduce the size of the hermetic package.
- the sealing material layer is preferably formed so that the position of contact with the glass lid is 50 ⁇ m or more, 60 ⁇ m or more, 70 to 1500 ⁇ m, particularly 80 to 800 ⁇ m away from the edge of the glass lid. If the separation distance between the edge of the glass lid and the sealing material layer is too short, the surface temperature difference between the surface on the inner element side and the outer surface of the glass lid in the edge region of the glass lid during laser sealing. It becomes large and the glass lid is easily broken.
- the sealing material layer is preferably formed on the center line in the width direction of the top of the frame, that is, formed in the central region of the top of the frame. In this way, the heat generated by local heating is easily escaped at the time of laser sealing, so that the glass lid is difficult to break. In addition, when the width
- the average thickness of the sealing material layer is preferably less than 8.0 ⁇ m, particularly 1.0 ⁇ m or more and less than 7.0 ⁇ m. As the average thickness of the sealing material layer is smaller, the ⁇ -ray emission rate in the hermetic package is reduced, so that it becomes easier to prevent soft errors in the internal elements. The smaller the average thickness of the sealing material layer, the higher the accuracy of laser sealing. Further, when the thermal expansion coefficients of the sealing material layer and the glass lid are mismatched, the stress remaining in the sealing portion after laser sealing can be reduced. Examples of the method for regulating the average thickness of the sealing material layer as described above include a method of thinly applying a sealing material paste and a method of polishing the surface of the sealing material layer.
- the maximum width of the sealing material layer is preferably 1 ⁇ m or more and 2000 ⁇ m or less, particularly 100 ⁇ m or more and 1500 ⁇ m or less.
- the sealing material layer is easily separated from the edge of the frame portion, so that it is easy to reduce the stress remaining in the sealing portion after laser sealing.
- the width of the frame portion of the package substrate can be reduced, and the effective area that functions as a device can be increased.
- the maximum width of the sealing material layer is too narrow, the bulk of the sealing material layer is easily broken when a large shear stress is applied to the sealing material layer. Furthermore, the accuracy of laser sealing tends to be reduced.
- FIG. 1 is a schematic cross-sectional view for explaining an embodiment of an airtight package according to the present invention.
- the hermetic package 1 includes a package base 10 and a glass lid 11.
- the package base 10 includes a base 12 and a frame-shaped frame portion 13 on the outer peripheral edge of the base 12.
- An internal element 14 is accommodated in the space surrounded by the frame portion 13 of the package base 10.
- An electrical wiring (not shown) that electrically connects the internal element 14 and the outside is formed in the package base 10.
- the sealing material layer 15 is a sintered body of a sealing material, and the sealing material contains glass powder and refractory filler powder, but does not substantially contain a laser absorber.
- This glass powder has a glass composition of mass%, Bi 2 O 3 + CuO 83 to 95%, Bi 2 O 3 75 to 90%, B 2 O 3 3 to 12%, ZnO 1 to 10%, Al 2 O 3 0 to 5%, CuO 4 to 15%, Fe 2 O 3 0 to 5%, MgO + CaO + SrO + BaO 0 to 7% are contained, and substantially no PbO is contained.
- the sealing material layer 15 is disposed over the entire circumference of the top of the frame 13 between the top of the frame 13 of the package base 10 and the surface of the glass lid 11 on the internal element 14 side.
- the width of the sealing material layer 15 is smaller than the width of the top portion of the frame portion 13 of the package substrate 10, and is further away from the edge of the glass lid 11. Furthermore, the average thickness of the sealing material layer 15 is less than 8.0 ⁇ m.
- the airtight package 1 can be manufactured as follows. First, the glass lid 11 on which the sealing material layer 15 is formed in advance is placed on the package base 10 so that the sealing material layer 15 and the top of the frame portion 13 are in contact with each other. Subsequently, while pressing the glass lid 11 using a pressing jig, the laser beam L emitted from the laser irradiation apparatus is irradiated along the sealing material layer 15 from the glass lid 11 side. As a result, the sealing material layer 15 softens and flows and reacts with the top layer of the frame portion 13 of the package base 10, whereby the package base 10 and the glass lid 11 are hermetically integrated, and the airtight structure of the hermetic package 1. Is formed.
- Tables 1 and 2 show examples of the present invention (sample Nos. 1 to 11) and comparative examples (samples No. 12 to 15).
- the glass powder described in the table was produced as follows. First, a glass batch prepared by preparing raw materials such as various oxides and carbonates so as to have the glass composition in the table was prepared, and this was put in a platinum crucible and melted at 1000 to 1100 ° C. for 1 to 2 hours. Next, the obtained molten glass was formed into a thin piece with a water-cooled roller. Finally, glass flakes having an average particle diameter D 50 of 1.0 ⁇ m and a maximum particle diameter D max of 4 ⁇ m were obtained by pulverizing the flaky glass with a ball mill and air classification.
- Cordierite, ⁇ -eucryptite and ⁇ -quartz solid solution were used as the refractory filler powder. These refractory filler powders are adjusted to an average particle diameter D 50 of 1.0 ⁇ m and a maximum particle diameter D max of 3 ⁇ m by air classification.
- An Al—Fe—Mn composite oxide was used as the laser absorber.
- the average particle diameter D 50 of the Al—Fe—Mn composite oxide was 1.0 ⁇ m, and the maximum particle diameter D max was 2.5 ⁇ m.
- Glass powder, refractory filler powder and laser absorber were mixed in the mixing ratio shown in the table, and sample No. 1 to 8 and 12 to 14 were produced. Further, glass powder and refractory filler powder were mixed in the mixing ratio shown in the table, and sample No. 9 to 11 and 15 were produced. Sample No. For 1 to 15, thermal expansion coefficient, fluidity, laser sealing strength and airtightness were evaluated.
- the thermal expansion coefficient is a value measured in a temperature range of 30 to 300 ° C. using a TMA apparatus.
- TMA thermal expansion coefficient
- a powder having a mass corresponding to the synthesis density of each sample was dry-pressed into a button shape having an outer diameter of 20 mm using a mold and placed on a 40 mm ⁇ 40 mm ⁇ 2.8 mm thick high strain point glass substrate. Then, after raising the temperature in air at a rate of 10 ° C./min, holding at 510 ° C. for 10 minutes, the temperature was lowered to room temperature at 10 ° C./min, and the diameter of the obtained button was measured and evaluated. Specifically, the case where the flow diameter was 17.5 mm or more was evaluated as “ ⁇ ”, and the case where it was less than 17.5 mm was evaluated as “x”.
- the synthetic density is a theoretical density calculated by mixing the density of the glass powder and the density of the refractory filler powder in a volume ratio in the table.
- a laser-sealed sealing structure (type A in the table) was produced as follows. First, each sample and vehicle (tripropylene glycol monobutyl ether containing ethylcellulose resin) were uniformly kneaded with a three-roll mill and made into a paste, and then an alkali-free glass substrate (OA-10, 40 mm ⁇ Nippon Electric Glass Co., Ltd.) 0.5 mm thickness, coefficient of thermal expansion 38 ⁇ 10 ⁇ 7 / ° C.) and applied in a frame shape (15 ⁇ m thickness, 0.6 mm width) along the edge of the alkali-free glass substrate, and 120 ° C. in a drying oven. Dried for 10 minutes.
- vehicle tripropylene glycol monobutyl ether containing ethylcellulose resin
- the temperature is raised from room temperature at 10 ° C./minute, baked at 510 ° C. for 10 minutes, and then lowered to room temperature at 10 ° C./minute, incineration of the resin component in the paste (debinding treatment) and sealing material Fixing was performed to form a sealing material layer on the alkali-free glass substrate.
- the sealing material By irradiating a laser beam having a wavelength of 808 nm along the sealing material layer from the alkali-free glass substrate side having the layer, the sealing material layer was softened and fluidized, and the alkali-free glass substrates were hermetically sealed.
- the laser light irradiation conditions (output and irradiation speed) were adjusted according to the average thickness of the sealing material layer.
- the obtained sealing structure is dropped onto the concrete from 1 m above, and “ ⁇ ” indicates that peeling did not occur in the laser-sealed portion, and “ ⁇ ” indicates that peeling occurred.
- the adhesive strength after laser sealing that is, laser sealing strength was evaluated.
- a laser-sealed sealing structure (type B in the table) was produced as follows. First, each sample and vehicle (tripropylene glycol monobutyl ether containing ethylcellulose resin) were uniformly kneaded with a three-roll mill and made into a paste, and then an alkali-containing glass substrate (BDA, 10 mm ⁇ 0. 2 mm thick, coefficient of thermal expansion 66 ⁇ 10 ⁇ 7 / ° C.) applied in a frame shape (15 ⁇ m thickness, 0.3 mm width) along the edge of the alkali-containing glass substrate, and 120 ° C. for 10 minutes in a drying oven Dried.
- BDA alkali-containing glass substrate
- the temperature is raised from room temperature at 10 ° C./minute, baked at 510 ° C. for 10 minutes, and then lowered to room temperature at 10 ° C./minute, incineration of the resin component in the paste (debinding treatment) and sealing material Fixing was performed to form a sealing material layer on the alkali-containing glass substrate.
- an LTCC substrate (10 mm ⁇ 1.5 mm thickness, coefficient of thermal expansion 66 ⁇ 10 ⁇ 7 / ° C.) is accurately stacked on the alkali-containing glass substrate having the sealing material layer, and then the sealing material layer is formed.
- the sealing material layer was softened and flowed to hermetically seal the alkali-containing glass substrate and the LTCC substrate.
- the laser light irradiation conditions (output and irradiation speed) were adjusted according to the average thickness of the sealing material layer.
- the obtained sealing structure is dropped onto the concrete from 1 m above, and “ ⁇ ” indicates that peeling did not occur in the laser-sealed portion, and “ ⁇ ” indicates that peeling occurred.
- the adhesive strength after laser sealing that is, laser sealing strength was evaluated.
- the airtightness of the sealing structure was evaluated as follows. Similar to the evaluation of the laser sealing strength, a sealing structure was prepared for each sample. However, unlike the evaluation of the laser sealing strength, a 300-nm-thick metal Ca film (type A: ⁇ 25 mm) is formed on the glass substrate corresponding to the central part of the frame formed by the sealing material layer before laser sealing. , Type B: ⁇ 5 mm, each) was formed by vacuum deposition. Next, the sealing structure after laser sealing was held for 24 hours in a constant temperature and humidity chamber maintained at 121 ° C., humidity 100%, and 2 atm. Then, the metal Ca film maintained the metallic luster as “ ⁇ ”, and the transparent one as “X” was evaluated for airtightness. The metal Ca film becomes transparent calcium hydroxide when it reacts with moisture.
- sample no. In Nos. 1 to 11 since the glass composition of the glass powder was regulated within a predetermined range, the evaluation of fluidity, laser sealing strength and airtightness was good.
- sample No. Since 12 and 15 do not contain CuO in the glass powder, the evaluation of fluidity, laser sealing strength and airtightness was poor.
- Sample No. Since No. 13 does not contain ZnO in the glass powder, evaluation of laser sealing strength and airtightness was poor in the type A sealing structure.
- Sample No. In No. 14 the content of Bi 2 O 3 + CuO in the glass powder was small, so the evaluation of fluidity, laser sealing strength and airtightness was poor.
- the glass powder of the present invention and the sealing material using the glass powder include dye-sensitized solar cells, CIGS-based thin film compound solar cells, and the like in addition to laser sealing of organic EL devices such as organic EL displays and organic EL lighting devices. It is also suitable for laser sealing of solar cells, laser sealing of airtight packages such as MEMS packages and LED packages.
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Abstract
Description
10 パッケージ基体
11 ガラス蓋
12 基部
13 枠部
14 内部素子
15 封着材料層
L レーザー光
Claims (9)
- ガラス組成として、質量%で、Bi2O3+CuO 83~95%、Bi2O3 75~90%、B2O3 3~12%、ZnO 1~10%、Al2O3 0~5%、CuO 4~15%、Fe2O3 0~5%、MgO+CaO+SrO+BaO 0~7%を含有し、実質的にPbOを含有しないことを特徴とするガラス粉末。
- ZnOの含有量が1~5質量%未満であることを特徴とする請求項1に記載のガラス粉末。
- 質量比(Bi2O3+CuO)/ZnOが15~70であることを特徴とする請求項1又は2に記載のガラス粉末。
- MgO+CaO+SrO+BaOの含有量が0~2.0質量%未満であることを特徴とする請求項1~3の何れかに記載のガラス粉末。
- ガラス粉末と耐火性フィラー粉末を含有する封着材料において、
ガラス粉末が請求項1~4の何れかに記載のガラス粉末であり、
ガラス粉末の含有量が50~95体積%であり、
耐火性フィラー粉末の含有量が5~50体積%であることを特徴とする封着材料。 - 耐火性フィラー粉末が、コーディエライト、ウイレマイト、アルミナ、リン酸ジルコニウム系化合物、ジルコン、ジルコニア、酸化スズ、石英ガラス、β-ユークリプタイト、スポジュメンから選ばれる一種又は二種以上であることを特徴とする請求項5又は6に記載の封着材料。
- 更にレーザー吸収材を0~25体積%含有することを特徴とする請求項5又は6に記載の封着材料。
- レーザー吸収材が、Cu系酸化物、Fe系酸化物、Cr系酸化物、Mn系酸化物及びこれらの複合酸化物から選ばれる一種又は二種以上であることを特徴とする請求項7に記載の封着材料。
- レーザー封着に用いることを特徴とする請求項5~8の何れかに記載の封着材料。
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JP2018509132A JP6963214B2 (ja) | 2016-04-01 | 2017-03-22 | ガラス粉末及びそれを用いた封着材料 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107827365A (zh) * | 2017-11-30 | 2018-03-23 | 湖北工业大学 | 一种无铅低温真空钢化玻璃焊料 |
WO2020003989A1 (ja) * | 2018-06-28 | 2020-01-02 | 日本電気硝子株式会社 | 封着材料層付きガラス蓋の製造方法及び気密パッケージの製造方法 |
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CN116462411A (zh) * | 2023-04-26 | 2023-07-21 | 华东理工大学 | 一种无铅多组分铋基低熔点玻璃与陶瓷粉的复合粉体灌封材料及其制备方法与应用 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009227566A (ja) * | 2008-02-28 | 2009-10-08 | Nippon Electric Glass Co Ltd | 有機elディスプレイ用封着材料 |
JP2010047441A (ja) * | 2008-08-21 | 2010-03-04 | Nippon Electric Glass Co Ltd | 有機elディスプレイ用封着材料 |
JP2010254528A (ja) * | 2009-04-27 | 2010-11-11 | Nippon Electric Glass Co Ltd | 有機el照明用封着材料 |
JP2012012231A (ja) * | 2010-06-29 | 2012-01-19 | Central Glass Co Ltd | 無鉛低融点ガラス組成物 |
JP2014080351A (ja) * | 2012-09-25 | 2014-05-08 | Nippon Electric Glass Co Ltd | ビスマス系ガラス及びこれを用いた封着材料 |
JP2014105153A (ja) * | 2012-11-30 | 2014-06-09 | Nippon Electric Glass Co Ltd | ビスマス系ガラス組成物及びこれを用いた電極形成材料 |
JP2015107906A (ja) * | 2013-10-21 | 2015-06-11 | 日本電気硝子株式会社 | 封着材料 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6109994A (en) | 1996-12-12 | 2000-08-29 | Candescent Technologies Corporation | Gap jumping to seal structure, typically using combination of vacuum and non-vacuum environments |
JP4825448B2 (ja) | 2005-05-12 | 2011-11-30 | 傳 篠田 | 表示装置を製造する製造装置 |
JP4974058B2 (ja) * | 2007-01-30 | 2012-07-11 | 日本電気硝子株式会社 | 平面表示装置 |
JP5413562B2 (ja) * | 2007-12-06 | 2014-02-12 | 日本電気硝子株式会社 | 封着材料 |
WO2009107428A1 (ja) * | 2008-02-28 | 2009-09-03 | 日本電気硝子株式会社 | 有機elディスプレイ用封着材料 |
US20130161569A1 (en) * | 2010-08-17 | 2013-06-27 | Kentaro Ishihara | Glass for use in forming electrodes, and electrode-forming material using same |
-
2017
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009227566A (ja) * | 2008-02-28 | 2009-10-08 | Nippon Electric Glass Co Ltd | 有機elディスプレイ用封着材料 |
JP2010047441A (ja) * | 2008-08-21 | 2010-03-04 | Nippon Electric Glass Co Ltd | 有機elディスプレイ用封着材料 |
JP2010254528A (ja) * | 2009-04-27 | 2010-11-11 | Nippon Electric Glass Co Ltd | 有機el照明用封着材料 |
JP2012012231A (ja) * | 2010-06-29 | 2012-01-19 | Central Glass Co Ltd | 無鉛低融点ガラス組成物 |
JP2014080351A (ja) * | 2012-09-25 | 2014-05-08 | Nippon Electric Glass Co Ltd | ビスマス系ガラス及びこれを用いた封着材料 |
JP2014105153A (ja) * | 2012-11-30 | 2014-06-09 | Nippon Electric Glass Co Ltd | ビスマス系ガラス組成物及びこれを用いた電極形成材料 |
JP2015107906A (ja) * | 2013-10-21 | 2015-06-11 | 日本電気硝子株式会社 | 封着材料 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107827365A (zh) * | 2017-11-30 | 2018-03-23 | 湖北工业大学 | 一种无铅低温真空钢化玻璃焊料 |
WO2020003989A1 (ja) * | 2018-06-28 | 2020-01-02 | 日本電気硝子株式会社 | 封着材料層付きガラス蓋の製造方法及び気密パッケージの製造方法 |
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