WO2017033633A1 - 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置 - Google Patents

樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置 Download PDF

Info

Publication number
WO2017033633A1
WO2017033633A1 PCT/JP2016/071401 JP2016071401W WO2017033633A1 WO 2017033633 A1 WO2017033633 A1 WO 2017033633A1 JP 2016071401 W JP2016071401 W JP 2016071401W WO 2017033633 A1 WO2017033633 A1 WO 2017033633A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
formula
group
resin
polymer
Prior art date
Application number
PCT/JP2016/071401
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
亘平 穴田
大西　治
Original Assignee
住友ベークライト株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友ベークライト株式会社 filed Critical 住友ベークライト株式会社
Priority to CN201680048062.7A priority Critical patent/CN107922708A/zh
Priority to KR1020187007447A priority patent/KR101927037B1/ko
Publication of WO2017033633A1 publication Critical patent/WO2017033633A1/ja

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • C08G81/02—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02—Homopolymers or copolymers of hydrocarbons
    • C08L25/04—Homopolymers or copolymers of styrene
    • C08L25/08—Copolymers of styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/14—Modified phenol-aldehyde condensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • Mw weight average molecular weight
  • Mn number average molecular weight
  • Mw / Mn molecular weight distribution
  • a polystyrene conversion value obtained from a standard polystyrene (PS) calibration curve obtained by GPC measurement is used.
  • the measurement conditions are, for example, as follows.
  • Tosoh gel permeation chromatography device HLC-8320GPC Column: Tosoh TSK-GEL Supermultipore HZ-M Detector: RI detector for liquid chromatogram Measurement temperature: 40 ° C
  • Solvent THF Sample concentration: 2.0 mg / milliliter
  • the amount of low molecular weight components in the polymer is based on the data on the molecular weight obtained by GPC measurement, for example. It is calculated from the ratio.
  • hydroxy compounds such as sodium hydroxide and potassium hydroxide, alkylamines such as pyridine and triethylamine, amine compounds such as dimethylaniline, urotropine and dimethylaminopyridine, metal salts such as sodium acetate, ammonia and the like are used. be able to. These may be used alone or in combination of two or more kinds of base catalysts in order to further increase the reactivity.
  • acid catalyst mineral acids such as sulfuric acid and hydrochloric acid, organic acids such as p-toluenesulfonic acid, Lewis acids such as boron fluoride etherate, and the like can be used.
  • an unsaturated carboxylic acid anhydride having a cyclic structure in another molecule may be used.
  • the resin composition of this embodiment comprises an ester compound in which the acid anhydride portion of the polymer containing the repeating unit represented by the above formula (1) and the phenolic hydroxyl group provided in the phenol resin constitute an ester bond. It may be included.
  • all of the acid anhydride (eg, maleic anhydride) of the polymer may be ring-opened and / or the phenolic hydroxyl group provided in the phenol resin. All may have an ester bond. Thereby, heat resistance can be improved further.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
PCT/JP2016/071401 2015-08-21 2016-07-21 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置 WO2017033633A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201680048062.7A CN107922708A (zh) 2015-08-21 2016-07-21 树脂组合物、感光性树脂组合物、树脂膜和电子装置
KR1020187007447A KR101927037B1 (ko) 2015-08-21 2016-07-21 수지 조성물, 감광성 수지 조성물, 수지막 및 전자 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015163438 2015-08-21
JP2015-163438 2015-08-21

Publications (1)

Publication Number Publication Date
WO2017033633A1 true WO2017033633A1 (ja) 2017-03-02

Family

ID=58101193

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2016/071401 WO2017033633A1 (ja) 2015-08-21 2016-07-21 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置

Country Status (5)

Country Link
JP (3) JP6354802B2 (enrdf_load_stackoverflow)
KR (1) KR101927037B1 (enrdf_load_stackoverflow)
CN (1) CN107922708A (enrdf_load_stackoverflow)
TW (1) TWI694098B (enrdf_load_stackoverflow)
WO (1) WO2017033633A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018061584A1 (ja) * 2016-09-28 2018-04-05 住友ベークライト株式会社 摩擦材用フェノール樹脂組成物および摩擦材

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7088640B2 (ja) * 2017-08-01 2022-06-21 旭化成株式会社 半導体装置、及びその製造方法
JP7043756B2 (ja) * 2017-08-31 2022-03-30 住友ベークライト株式会社 感光性樹脂組成物、パターン形成方法、電子デバイスの製造方法、ポリマーおよびポリマーの製造方法
JP7020018B2 (ja) * 2017-09-15 2022-02-16 住友ベークライト株式会社 ゴム組成物
JP6764885B2 (ja) * 2018-01-11 2020-10-07 Ｊｆｅケミカル株式会社 熱硬化性樹脂組成物およびその硬化物
JP6950573B2 (ja) * 2018-02-26 2021-10-13 Jnc株式会社 熱硬化性組成物
CN113811556B (zh) * 2019-05-08 2024-05-28 住友电木株式会社 感光性树脂组合物、树脂膜和电子装置
CN110511532B (zh) * 2019-09-25 2022-03-25 河南工业大学 一种马来酸酐-丙烯酸酯共聚物改性酚醛树脂
JP7559421B2 (ja) * 2020-03-02 2024-10-02 住友ベークライト株式会社 カラーフィルタまたはブラックマトリクス形成用ポリマー溶液
JP7173380B2 (ja) * 2020-09-23 2022-11-16 住友ベークライト株式会社 ポリマー、ポリマーの製造方法、ポリマー溶液および感光性樹脂組成物

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS595243A (ja) * 1982-07-02 1984-01-12 Hitachi Ltd 放射線感応性組成物及びパタ−ン形成方法
JPH07146556A (ja) * 1993-06-04 1995-06-06 Mitsubishi Chem Corp ネガ型感光性組成物
JP2000122278A (ja) * 1998-10-21 2000-04-28 Okamoto Kagaku Kogyo Kk 感光性組成物および感光性平版印刷版
JP2001215696A (ja) * 1999-11-24 2001-08-10 Clariant (Japan) Kk 感光性樹脂組成物
JP2006058601A (ja) * 2004-08-20 2006-03-02 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
JP2015166431A (ja) * 2014-03-04 2015-09-24 日立化成株式会社 熱硬化性樹脂組成物、プリプレグ及び積層板
JP2016018168A (ja) * 2014-07-10 2016-02-01 日油株式会社 感光性樹脂組成物およびその用途
JP2016139030A (ja) * 2015-01-28 2016-08-04 住友ベークライト株式会社 感光性樹脂組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5110700A (en) * 1990-12-28 1992-05-05 Xerox Corporation Electrophotographic imaging member
JPH06305076A (ja) * 1993-04-26 1994-11-01 Hitachi Chem Co Ltd 金属ベースメラミン樹脂化粧板の製造方法
JP3953100B2 (ja) * 1995-01-27 2007-08-01 レイケム・コーポレイション 無水物含有ポリマーからのゲル
JP3944966B2 (ja) * 1996-09-30 2007-07-18 日本ゼオン株式会社 変性ノルボルネン系重合体及びその製造方法
KR100538968B1 (ko) * 1997-02-18 2006-07-11 후지 샤신 필름 가부시기가이샤 포지티브감광성조성물
US6449918B1 (en) 1999-11-08 2002-09-17 Premark Rwp Holdings, Inc. Multipanel floor system panel connector with seal
US6534235B1 (en) * 2000-10-31 2003-03-18 Kansai Research Institute, Inc. Photosensitive resin composition and process for forming pattern
WO2002068525A1 (en) * 2001-02-26 2002-09-06 Enthone, Inc. Positive photodefinable composition of polycarboxylic acid, phenolic and thermocurable resins
CN1717630A (zh) * 2003-06-30 2006-01-04 株式会社新克 正型感光性组合物
JP2005105209A (ja) 2003-10-01 2005-04-21 Yokohama Rubber Co Ltd:The 高減衰エラストマー組成物
US8748074B2 (en) * 2010-11-24 2014-06-10 Promerus, Llc Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
TWI636330B (zh) * 2013-05-29 2018-09-21 Sumitomo Bakelite Co., Ltd. 負型感光性樹脂組成物、電子裝置及聚合物
JP6065750B2 (ja) * 2013-05-29 2017-01-25 住友ベークライト株式会社 感光性樹脂組成物および電子装置
JP5672403B1 (ja) * 2014-05-26 2015-02-18 住友ベークライト株式会社 感光性樹脂組成物および電子装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS595243A (ja) * 1982-07-02 1984-01-12 Hitachi Ltd 放射線感応性組成物及びパタ−ン形成方法
JPH07146556A (ja) * 1993-06-04 1995-06-06 Mitsubishi Chem Corp ネガ型感光性組成物
JP2000122278A (ja) * 1998-10-21 2000-04-28 Okamoto Kagaku Kogyo Kk 感光性組成物および感光性平版印刷版
JP2001215696A (ja) * 1999-11-24 2001-08-10 Clariant (Japan) Kk 感光性樹脂組成物
JP2006058601A (ja) * 2004-08-20 2006-03-02 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
JP2015166431A (ja) * 2014-03-04 2015-09-24 日立化成株式会社 熱硬化性樹脂組成物、プリプレグ及び積層板
JP2016018168A (ja) * 2014-07-10 2016-02-01 日油株式会社 感光性樹脂組成物およびその用途
JP2016139030A (ja) * 2015-01-28 2016-08-04 住友ベークライト株式会社 感光性樹脂組成物

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018061584A1 (ja) * 2016-09-28 2018-04-05 住友ベークライト株式会社 摩擦材用フェノール樹脂組成物および摩擦材
JP6338034B1 (ja) * 2016-09-28 2018-06-06 住友ベークライト株式会社 摩擦材用フェノール樹脂組成物および摩擦材
JP2018138656A (ja) * 2016-09-28 2018-09-06 住友ベークライト株式会社 摩擦材用フェノール樹脂組成物および摩擦材

Also Published As

Publication number Publication date
TW201718719A (zh) 2017-06-01
CN107922708A (zh) 2018-04-17
KR101927037B1 (ko) 2018-12-07
JP6414352B2 (ja) 2018-10-31
JP6354802B2 (ja) 2018-07-11
KR20180031804A (ko) 2018-03-28
TWI694098B (zh) 2020-05-21
JP2017039909A (ja) 2017-02-23
JP6468393B2 (ja) 2019-02-13
JP2018172700A (ja) 2018-11-08
JP2018109196A (ja) 2018-07-12

Similar Documents

Publication Publication Date Title
JP6468393B2 (ja) 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置
JP5077023B2 (ja) 接着方法およびそれに用いられるポジ型感光性接着剤組成物、並びに電子部品
JP5035240B2 (ja) 感放射線性絶縁樹脂組成物
JP6585592B2 (ja) 高耐熱性ポリシルセスキオキサン系感光性樹脂組成物｛ｈｉｇｈｌｙ ｈｅａｔ ｒｅｓｉｓｔａｎｔ ｐｏｌｙｓｉｌｓｅｓｑｕｉｏｘａｎｅ−ｂａｓｅｄ ｐｈｏｔｏｓｅｎｓｉｔｉｖｅ ｒｅｓｉｎ ｃｏｍｐｏｓｉｔｉｏｎ｝
WO2018016640A1 (ja) 化合物、樹脂、組成物並びにレジストパターン形成方法及び回路パターン形成方法
WO2018016614A1 (ja) 化合物、樹脂、組成物及びパターン形成方法
WO2018016615A1 (ja) 化合物、樹脂、組成物並びにレジストパターン形成方法及び回路パターン形成方法
WO2018016634A1 (ja) 化合物、樹脂及び組成物、並びにレジストパターン形成方法及び回路パターン形成方法
WO2018016648A1 (ja) 化合物、樹脂、組成物及びパターン形成方法
JP7452947B2 (ja) 化合物、樹脂、組成物、並びにレジストパターン形成方法及び回路パターン形成方法
JP4853155B2 (ja) ポジ型感光性絶縁樹脂組成物、その硬化物および回路基板
JP7627431B2 (ja) トリアジン骨格を有するプレポリマー、これを含む組成物、レジストパターン形成方法、回路パターン形成方法、及び当該プレポリマーの精製方法
WO2018101377A1 (ja) 化合物、樹脂、組成物並びにレジストパターン形成方法及び回路パターン形成方法
JPWO2018056277A1 (ja) 化合物、樹脂、組成物、並びにレジストパターン形成方法及び回路パターン形成方法
WO2018056279A1 (ja) 化合物、樹脂、組成物、並びにレジストパターン形成方法及びパターン形成方法
JP2020170103A (ja) 感光性樹脂組成物、樹脂膜、及び、電子装置
WO2018101376A1 (ja) 化合物、樹脂、組成物並びにレジストパターン形成方法及び回路パターン形成方法
JPWO2018135498A1 (ja) 化合物、樹脂、組成物及びパターン形成方法
WO2018052028A1 (ja) 化合物、樹脂、組成物及びパターン形成方法
JP2018115249A (ja) 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置
JP2018127564A (ja) 樹脂組成物、感光性樹脂組成物、樹脂膜および電子装置
JP5237692B2 (ja) モノマー、ポリマー、感光性樹脂組成物及びレジストパターンの形成方法
JP2019148727A (ja) 化合物、樹脂、組成物及びパターン形成方法
JPWO2018097215A1 (ja) 化合物、樹脂、組成物、パターン形成方法及び精製方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 16838980

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20187007447

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 16838980

Country of ref document: EP

Kind code of ref document: A1