WO2016119303A1 - 阵列基板及该阵列基板的断线修补方法 - Google Patents
阵列基板及该阵列基板的断线修补方法 Download PDFInfo
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- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
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- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F1/136263—Line defects
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Abstract
Description
Claims (13)
- 一种阵列基板,包括:基板、设于基板上的栅极扫描线与共用电极线、设于所述栅极扫描线与共用电极线上的栅极绝缘层、设于所述栅极绝缘层上的源漏极数据线、设于所述源漏极数据线上的第一钝化层、设于所述第一钝化层上的有机层、及设于所述有机层及第一钝化层上的第二钝化层;所述共用电极线包括数个封闭环与数条连接线路,所述数个封闭环由数条连接线路连接在一起,所述封闭环与源漏极数据线交叉设置,所述有机层上对应每一交叉点设有一通孔,所述第二钝化层沉积于该通孔处形成开口,所述开口用于在源漏极数据线断线时作为镭射熔接点。
- 如权利要求1所述的阵列基板,其中,所述开口的大小为7μm×7μm。
- 如权利要求1所述的阵列基板,其中,所述有机层为色阻层或平坦层。
- 如权利要求1所述的阵列基板,其中,所述第一钝化层和第二钝化层的材料为无机材料。
- 如权利要求1所述的阵列基板,其中,所述有机层的厚度大于所述第一钝化层和第二钝化层的厚度。
- 一种阵列基板,包括:基板、设于基板上的栅极扫描线与共用电极线、设于所述栅极扫描线与共用电极线上的栅极绝缘层、设于所述栅极绝缘层上的源漏极数据线、设于所述源漏极数据线上的第一钝化层、设于所述第一钝化层上的有机层、及设于所述有机层及第一钝化层上的第二钝化层;所述共用电极线包括数个封闭环与数条连接线路,所述数个封闭环由数条连接线路连接在一起,所述封闭环与源漏极数据线交叉设置,所述有机层上对应每一交叉点设有一通孔,所述第二钝化层沉积于该通孔处形成开口,所述开口用于在源漏极数据线断线时作为镭射熔接点;其中,所述开口的大小为7μm×7μm;其中,所述有机层为色阻层或平坦层。
- 如权利要求6所述的阵列基板,其中,所述第一钝化层和第二钝化层的材料为无机材料。
- 如权利要求6所述的阵列基板,其中,所述有机层的厚度大于所述 第一钝化层和第二钝化层的厚度。
- 一种阵列基板的断线修补方法,包括如下步骤:步骤1、提供一阵列基板,所述阵列基板包括:基板、设于基板上的栅极扫描线与共用电极线、设于所述栅极扫描线与共用电极线上的栅极绝缘层、设于所述栅极绝缘层上的源漏极数据线、设于所述源漏极数据线上的第一钝化层、设于所述第一钝化层上的有机层、及设于所述有机层及第一钝化层上的第二钝化层;所述共用电极线包括数个封闭环与数条连接线路,所述数个封闭环由数条连接线路连接在一起,所述封闭环与源漏极数据线交叉设置,所述有机层上对应每一交叉点设有一通孔,所述第二钝化层沉积于该通孔处形成开口,所述开口用于在源漏极数据线断线时作为镭射熔接点;步骤2、检测源漏极数据线断线的位置,对断线处两端的开口处进行镭射熔接,将源漏极数据线和共用电极线的封闭环搭接;步骤3、将共用电极线的封闭环两侧的连接线路用镭射进行切断,利用共用电极线的封闭环取代源漏极数据线的断线部分,实现源漏极数据线的断线修复。
- 如权利要求9所述的阵列基板的断线修补方法,其中,所述步骤1中,所述开口的大小为7μm×7μm。
- 如权利要求9所述的阵列基板的断线修补方法,其中,所述步骤1中,所述有机层为色阻层或平坦层。
- 如权利要求9所述的阵列基板的断线修补方法,其中,所述步骤1中,所述第一钝化层和第二钝化层的材料为无机材料。
- 如权利要求9所述的阵列基板的断线修补方法,其中,所述步骤1中,所述有机层的厚度大于所述第一钝化层和第二钝化层的厚度。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2017538679A JP6518330B2 (ja) | 2015-01-27 | 2015-04-01 | 配列基板及びその配列基板の断線補修方法 |
KR1020177012280A KR101947295B1 (ko) | 2015-01-27 | 2015-04-01 | 어레이 기판 및 어레이 기판의 단선복구방법 |
US14/781,593 US9568793B2 (en) | 2015-01-27 | 2015-04-01 | Array substrate and method of repairing broken lines for the array substrate |
GB1706052.6A GB2546043B (en) | 2015-01-27 | 2015-04-01 | Array substrate and method of repairing broken lines for the array substrate |
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CN201510042169.8A CN104516133B (zh) | 2015-01-27 | 2015-01-27 | 阵列基板及该阵列基板的断线修补方法 |
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JP (1) | JP6518330B2 (zh) |
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Cited By (1)
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JP2018508031A (ja) * | 2015-02-12 | 2018-03-22 | 深▲セン▼市華星光電技術有限公司 | アレイ基板とその断線補修方法 |
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CN104898333B (zh) * | 2015-06-17 | 2017-07-28 | 合肥鑫晟光电科技有限公司 | 一种阵列基板及其线不良维修方法、显示装置 |
CN105425433B (zh) * | 2015-11-10 | 2018-10-30 | 深圳市华星光电技术有限公司 | 具有亮点缺陷的像素的修复方法、阵列基板及液晶面板 |
CN105467706B (zh) * | 2016-01-15 | 2018-10-26 | 武汉华星光电技术有限公司 | 阵列基板结构及阵列基板断线修复方法 |
CN105527736B (zh) * | 2016-02-15 | 2019-01-18 | 京东方科技集团股份有限公司 | 一种阵列基板及其修复方法、显示面板和显示装置 |
CN105549281B (zh) * | 2016-03-16 | 2018-09-04 | 京东方科技集团股份有限公司 | 阵列基板及修复方法、显示面板和显示装置 |
CN106773427A (zh) * | 2017-03-10 | 2017-05-31 | 京东方科技集团股份有限公司 | 数据线维修方法和阵列基板 |
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CN108594551A (zh) * | 2018-04-28 | 2018-09-28 | 京东方科技集团股份有限公司 | 阵列基板及其数据线断路的修复方法和显示装置 |
CN110376809A (zh) * | 2019-06-11 | 2019-10-25 | 惠科股份有限公司 | 断线修复结构、显示面板及断线修复方法 |
CN110634730B (zh) * | 2019-09-27 | 2021-08-13 | 扬州扬杰电子科技股份有限公司 | 一种沟槽肖特基多晶硅沉积后栅氧中断返工方法 |
CN110824796B (zh) * | 2019-10-29 | 2022-03-01 | Tcl华星光电技术有限公司 | 阵列基板及其修补方法 |
CN113764436B (zh) * | 2021-09-03 | 2022-12-06 | 深圳市华星光电半导体显示技术有限公司 | 阵列基板的修补方法及修补装置 |
CN114675455A (zh) * | 2022-03-18 | 2022-06-28 | Tcl华星光电技术有限公司 | 阵列基板及其信号线断线修复方法 |
CN114755866A (zh) * | 2022-04-28 | 2022-07-15 | 深圳市华星光电半导体显示技术有限公司 | 阵列基板及该阵列基板的异常修补方法、显示面板 |
WO2023245408A1 (zh) * | 2022-06-21 | 2023-12-28 | 京东方科技集团股份有限公司 | 显示基板、显示背板、显示面板 |
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GB201706052D0 (en) | 2017-05-31 |
KR20170066573A (ko) | 2017-06-14 |
US9568793B2 (en) | 2017-02-14 |
GB2546043B (en) | 2021-03-10 |
US20160363829A1 (en) | 2016-12-15 |
CN104516133A (zh) | 2015-04-15 |
JP2018508818A (ja) | 2018-03-29 |
KR101947295B1 (ko) | 2019-02-12 |
CN104516133B (zh) | 2017-12-29 |
GB2546043A (en) | 2017-07-05 |
JP6518330B2 (ja) | 2019-05-22 |
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