WO2016117398A1 - 樹脂組成物、塗料、電子部品、モールド変圧器、モータコイル、ケーブル - Google Patents
樹脂組成物、塗料、電子部品、モールド変圧器、モータコイル、ケーブル Download PDFInfo
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- WO2016117398A1 WO2016117398A1 PCT/JP2016/050596 JP2016050596W WO2016117398A1 WO 2016117398 A1 WO2016117398 A1 WO 2016117398A1 JP 2016050596 W JP2016050596 W JP 2016050596W WO 2016117398 A1 WO2016117398 A1 WO 2016117398A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G81/00—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
- C08G81/02—Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C08G81/024—Block or graft polymers containing sequences of polymers of C08C or C08F and of polymers of C08G
- C08G81/027—Block or graft polymers containing sequences of polymers of C08C or C08F and of polymers of C08G containing polyester or polycarbonate sequences
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
- C09D125/02—Homopolymers or copolymers of hydrocarbons
- C09D125/04—Homopolymers or copolymers of styrene
- C09D125/08—Copolymers of styrene
- C09D125/14—Copolymers of styrene with unsaturated esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D187/00—Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
- C09D187/005—Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B7/00—Insulated conductors or cables characterised by their form
- H01B7/02—Disposition of insulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/28—Coils; Windings; Conductive connections
- H01F27/32—Insulating of coils, windings, or parts thereof
- H01F27/324—Insulation between coil and core, between different winding sections, around the coil; Other insulation structures
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K3/00—Details of windings
- H02K3/30—Windings characterised by the insulating material
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/02—Casings
- H01F27/022—Encapsulation
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
Definitions
- the present invention relates to a resin composition and a product to which the resin composition is applied.
- Patent Document 1 is a patent relating to the study of a polymer in which an alkoxyamine skeleton is introduced into a polymer chain as a polymer utilizing such a dynamic covalent bond.
- Patent document 2 relates to "The present invention relates to a thermosetting resin capable of heat deformation and a thermosetting composite material containing the same, and this composition is an acid anhydride in the presence of at least one transesterification catalyst. At least one curing agent selected from at least one of thermosetting resins, and at least one thermosetting resin precursor.
- This publication aims at developing a thermosetting resin that can be thermally deformed after curing, and utilizes an ester bond exchange reaction as a dynamic co-bond.
- the characteristic of this resin is that although it is a thermosetting resin, it can be deformed, and at the same time, adhesion and stress relaxation are possible. Therefore, in addition to the recyclability described in Patent Document 2, improvement in crack resistance, application to a maintenance-free resin for paint having a self-repairing function, and an increase in the life of the resin itself can be expected. .
- Patent No. 5333975 gazette JP-A-2014-503670
- Resins produced according to the prior art have the property of low hydrolysis resistance. For example, when used for a long time in areas with high humidity such as Japan, hydrolytic degradation is a concern.
- the present invention provides a resin composition in which resin molecular structure design and catalyst optimization have been performed to improve hydrolysis resistance.
- the resin composition of the present invention comprises (1) a copolymer of a vinyl compound containing two or more epoxy groups, a carboxylic acid anhydride, and a transesterification catalyst, or (2) two or more And a copolymer of a vinyl compound containing a carboxylic acid anhydride group, an epoxy, and a transesterification catalyst.
- the resin composition of the present invention comprises (1) a copolymer of a vinyl compound containing two or more epoxy groups, a carboxylic acid anhydride and a transesterification reaction catalyst, or (2) two or more carboxylic acid anhydrides And a copolymer of a vinyl compound containing a substance group, an epoxy, and a transesterification catalyst.
- the resin composition of the present invention has an ester bond and a hydroxyl group as a result of the reaction of the epoxy and the carboxylic acid anhydride. And under the transesterification catalyst, these ester bond and hydroxyl group start transesterification by heating.
- the hydrolysis resistance of the resin can be improved by using a vinyl compound having high hydrolysis resistance for the main chain skeleton.
- the resin composition shown in FIG. 1 is characterized in that an epoxy group or a carboxylic acid anhydride is bonded to the side chain of the vinyl compound copolymer of the main chain skeleton.
- vinyl compounds having an epoxy group 1,3-butadiene epoxide, 1,2-epoxy-5-hexene, allyl glycidyl ether, glycidyl methacrylate, 1,2-epoxy-4-vinyl cyclohexane It is possible to choose from.
- vinyl compounds having a carboxylic acid anhydride examples include maleic anhydride, methylmaleic acid, allyl succinic acid, 4-cyclohexene-1,2-dicarboxylic acid anhydride, 5-norbornene-2,3- It is possible to choose from dicarboxylic acid anhydrides.
- vinyl monomers described above if the functional groups of the vinyl monomers are epoxy groups, different vinyl monomers may be mixed at an appropriate blending ratio to carry out a copolymerization reaction. Similarly, when the functional group of the vinyl monomer is a carboxylic acid anhydride, different vinyl monomers may be mixed at an appropriate blending ratio to carry out a copolymerization reaction.
- the precursor vinyl monomer is an aromatic vinyl compound, an aromatic allyl compound, a heterocyclic vinyl compound, a heterocyclic allyl compound, an alkyl (meth) acrylate, an unsaturated monocarboxylic acid ester, a fluoroalkyl (meth) acrylate, a siloxanyl compound , Alkylene glycol mono- (meth) acrylate and di- (meth) acrylate, alkoxyalkyl (meth) acrylate, cyanoalkyl (meth) acrylate, acrylonitrile and methacrylonitrile, hydroxyalkyl ester of unsaturated carboxylic acid, unsaturated alcohol Unsaturated mono-carboxylic acid, unsaturated polycarboxylic acid and unsaturated polycarboxylic acid anhydride; monoester and diester of unsaturated polycarboxylic acid or unsaturated polycarboxylic acid anhydride; epoxy group-containing unsaturated Compounds, diene compounds, vinyl
- the vinyl monomer described above is combined with a vinyl monomer having an epoxy group or a carboxylic acid anhydride, and the copolymerization reaction can be performed to control the amount of transesterification reaction sites.
- This makes it possible to control the crosslink density and the flexibility of the main chain skeleton. Since it is possible to change the elastic modulus by controlling the crosslink density and the flexibility of the main chain skeleton, it is also possible to control the thermal deformation characteristics.
- the resin composition of the present invention is characterized in that the proportion of the transesterification catalyst is 0.23 to 11 mol% with respect to the total vinyl compounds. By including a transesterification catalyst at this ratio, it is possible to satisfy the condition that transesterification occurs.
- the proportion of transesterification catalyst in Table 2 described later is included in this range.
- the resin composition of the present invention is a vinyl compound copolymer resin composition comprising a polymer obtained by polymerizing or copolymerizing a vinyl monomer selected from a precursor vinyl monomer by radical polymerization, a carboxylic acid anhydride or an epoxy compound, and the above It is characterized by being a vinyl compound copolymer composition containing an ester bond and a hydroxyl group formed by adding a catalyst selected from the transesterification reaction catalysts described above.
- radical polymerization initiator for polymerization of the main chain skeleton
- initiators such as peroxide type and azo type compounds can be used.
- Living radical polymerization initiators can also be used, and transition metal compounds, thiocarbonyl compounds, and alkylborane compounds can be used.
- the whole skeleton vinyl monomer is polymerized or copolymerized to form a main chain skeleton, and then a carboxylic anhydride and a transesterification catalyst are added.
- a monomer having an epoxy group as a functional group is selected as the precursor vinyl monomer
- the whole skeleton vinyl monomer is polymerized or copolymerized to form a main chain skeleton, and then a carboxylic anhydride and a transesterification catalyst are added.
- the resin composition of the present invention containing ester bonds and hydroxyl groups is obtained.
- carboxylic anhydride examples include phthalic anhydride, nadic anhydride, hexahydrophthalic anhydride, dodecene succinic anhydride, glutaric anhydride and the like, but other carboxylic anhydrides can be used without particular limitation.
- the precursor vinyl monomer When a monomer having a carboxylic acid anhydride as a functional group is selected as the precursor vinyl monomer, the precursor vinyl monomer is polymerized or copolymerized to form a main chain skeleton, and then an epoxy compound and a transesterification catalyst are added. Thus, the resin composition of the present invention containing ester bonds and hydroxyl groups is obtained.
- novolak epoxy resin bisphenol A diglycidyl ether (BADGE), bisphenol F diglycidyl ether, tetraglycidyl methylenedianiline, pentaerythritol tetraglycidyl ether, tetrabromobisphenol A diglycidyl ether or hydroquinone diglyco Glycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, 1,6-hexanediol Diglycidyl ether, cyclohexane dimethanol diglycidyl ether, polyethylene glycol diglycidyl ace Ter, polypropylene glycol diglycidyl ether, polytetramethylene glycol diglycidyl ether,
- the resin composition of the present invention can be used as a mold resin material for a transformer.
- a crack is generated due to a strain due to a difference in expansion coefficient with other members at the time of molding. If the crosslink density of the resin is lowered to improve the crack resistance, the heat resistance is lowered.
- the resin composition of the present invention can be used as a mold sealing material. In the mold sealing material, there is a problem of crack resistance due to the difference in expansion coefficient with other members such as metal.
- the fall of the crosslinking density of resin, the fall of the toughness value by additives, such as a rubber particle and a filler, etc. are common. In these methods, it is not possible to prevent a crack generated for a strain generated at the time of use of the product once formed and processed.
- the strain generated with other members after molding due to the heat generated during product use prevents the occurrence of cracks by stress relaxation of the bond recombination of the transesterification reaction. Is also possible.
- FIG. 2 is a diagram of an electronic package using the resin composition of the present invention as a mold sealing material.
- Fig.2 (a) is an example of the electronic package which applied the resin composition of this invention as a mold sealing material
- FIG.2 (b) is AA sectional drawing of the electronic package of Fig.2 (a). is there.
- the electronic package 200 includes a semiconductor element 24 disposed on a base 24 a, a lead frame 22 extending to the outside of the mold sealing material 23, and a bonding wire 25 electrically connecting the lead frame 22 and the semiconductor element 24. It consists of The lead frame 22, the semiconductor element 24, the base 24a, and the bonding wire 25 are sealed by a mold sealing material made of the resin composition of the present invention.
- Each of the lead frame 22 and the bonding wire 25 is made of a good conductor, and specifically, made of copper, aluminum or the like. Further, the form of the lead frame 22 and the bonding wire 25 can be any form known in the art, such as, for example, a lithographic (solid) wire or a stranded wire.
- the shape of the semiconductor element 24 may be, for example, a circle, a divided circle, or a compression type. Furthermore, the material constituting the semiconductor element 24 is not particularly limited as long as the material can be sealed by the mold sealing material 23.
- the resin composition of the present invention can be used as a protective material or varnish material for a motor coil.
- the motor coil has a problem of generation of a crack due to electromagnetic vibration or the like. In the resin composition of the present invention, since bonding recombination occurs due to the heat generated when using the motor, it is possible to relieve the strain causing the crack, that is, the stress.
- FIG. 3 is a view of a motor using the resin composition of the present invention as a protective material for a motor coil.
- 3 (a) is an upper side view of the motor coil 300
- FIG. 3 (b) is a cross sectional structure of the motor 301 using the motor coil 300
- the left side of FIG. 3 (b) is the axial direction of the rotor core 32
- 3B is a cross-sectional view in the direction perpendicular to the axial direction of the rotor core 32. As shown in FIG.
- the coil 300 for a motor is comprised by the magnetic core 36, the coated copper wire 37 wound by the magnetic core 36, and the motor coil protection material 38 which consists of a resin composition of this invention.
- the resin composition of the present invention according to the present embodiment is uniformly applied to the coil 300 as a varnish material for motor coil protection material.
- the magnetic core 36 is made of, for example, metal such as iron. Furthermore, an enameled wire with a diameter of 1 mm is used as the coated copper wire 37.
- the coil 300 is used for the motor 301 shown in FIG.
- the motor 301 has a cylindrical stator core 30 fixed to the inner edge of the motor 301, a rotor core 32 coaxially rotating inside the stator core 30, a stator coil 39, and a stator core 30. It consists of eight coils 300 in which a coated copper wire is wound in a slot 31.
- the resin composition of the present invention can be used for a coating layer or an insulating layer of a cable.
- the coating material of the cable such as the electric wire is reduced in electrical insulation when a crack is generated due to long-term use. Because these cables are not easy to replace, there is a need for locally repairable materials.
- the crack can be repaired by heating the portion where the crack is generated, by the bond regeneration function of the bond recombination of the transesterification reaction.
- FIG. 4 is a cross-sectional view of a cable manufactured using the dynamic crosslinking resin of the present invention.
- the dynamically crosslinked resin of the present invention is used for the covering layer 40.
- the dynamic crosslinking resin of the present invention is used for the insulating layer 41.
- a cable 400 shown in FIG. 4A includes a conductor 43, an inner semiconductor layer 44, an insulating layer 45, an outer semiconductor layer (adhesion layer) 46, an outer semiconductor layer (peeling layer) 47, and a covering layer 40. , And the outer skin layer 49.
- a material which comprises the conductor 43 For example, arbitrary good conductors, such as copper and aluminum, can be used.
- the form of the conductor 43 is not particularly limited, and may be any known form such as a solid (solid) wire or a stranded wire.
- the cross-sectional shape of the conductor 43 is not particularly limited, and may be, for example, a circle, a divided circle, or a compression shape.
- the material constituting the insulating layer 45 and the form thereof are not particularly limited, but, for example, oil-impregnated paper, oil-impregnated semi-synthetic paper-based material, rubber material, resin material or the like can be used.
- insulating materials such as rubber materials and resin materials include ethylene-propylene rubber, butyl rubber, polypropylene, thermoplastic elastomer, polyethylene, cross-linked unsaturated polyethylene, etc., from the viewpoint of being widely used in insulated cables, Among them, polyethylene and crosslinked polyethylene are preferable.
- the outer semiconductive layer (adhesion layer) 46 is provided for the purpose of relaxing a strong electric field generated around the conductor 43.
- a material used for the outer semiconductive layer (adhesion layer) 46 for example, a semiconductive resin composition in which a conductive carbon black is mixed with a resin material such as a styrene-butadiene type thermoplastic elastomer, a polyester type elastomer, a soft polyolefin or the like And conductive paints to which conductive carbon black is added.
- the material is not particularly limited as long as the material satisfies the required performance.
- the outer semiconductive layer (peeling layer) 47 is provided for the purpose of alleviating the strong electric field generated around the conductor 43 and protecting the inner layer, as the outer semiconductive layer (adhesion layer) 46.
- any layer may be used as long as it can be easily peeled off from the outer semiconductive layer (adhesion layer) 46, and another layer may be interposed.
- the material used for the outer semiconductive layer (release layer) 47 is, for example, at least one or more of rubber materials such as soft polyolefin, ethylene-propylene rubber, butyl rubber, styrene-butadiene thermoplastic elastomer, polyester elastomer, etc.
- Examples thereof include a crosslinkable or non-crosslinkable resin composition in which 30 to 100 parts by mass of conductive carbon black is blended per 100 parts by mass of the base material contained.
- the material is not particularly limited as long as the material satisfies the required performance.
- additives such as fillers, such as a graphite, a lubricant, a metal, and an inorganic filler, may be contained as needed, for example.
- the method of forming the outer semiconductive layer (peeling layer) 47 on the surface of the outer semiconductive layer (adhesion layer) 46 is not particularly limited, but extrusion is preferred.
- the reaction was performed at 60 ° C. for 3 hours under an N 2 atmosphere.
- the syrup after the reaction was dissolved in tetrahydrofuran (Wako Pure Chemical Industries, Ltd.) and dropped into a large amount of methanol (Wako Pure Chemical Industries, Ltd.) to perform reprecipitation.
- the resulting reprecipitate and liquid were separated by suction filtration and dried at room temperature using vacuum drying to obtain copolymer A.
- the weight average molecular weight of the copolymer A was 50,000, the molecular weight distribution (Mw / Mn) was 1.8, and the glass transition temperature was 66 ° C.
- the weight average molecular weight in this specification is a standard polystyrene conversion value by a gel permeation type chromatography method. Further, the incorporation ratio (molar ratio) of methyl glycidyl methacrylate to polystyrene in copolymer A was determined from the integral ratio of the 1 H-NMR spectrum to be 71:29.
- ester bond site 1.5 g of copolymer A synthesized by the above method HN 5500 (Hitachi Chemical Co., Ltd.) 0.34 0.53 g of zinc naphthenate (Tokyo Kasei Kogyo Co., Ltd.) was dissolved in 2 g of tetrahydrofuran and varnished. The varnish was dried under a stream of N 2 to form tetrahydrofuran.
- the produced film is potted in a mold made of a 0.5 mm thick Teflon (registered trademark) sheet, and a strip-shaped test piece of 20 mm ⁇ 5 mm ⁇ 0.5 mm and 20 mm ⁇ 2 mm ⁇ 0.5 mm by a vacuum press.
- the cured product A was obtained.
- the press pressure was 0.44 MPa, and heating was performed at 90 ° C. for 1 hour and at 140 ° C. for 4 hours.
- the compositions of the cured products B to E prepared in the same manner are shown in Table 2.
- Example 2 demonstrates the physical-property evaluation result of the resin composition which the coupling
- Bonding As shown in Fig. 5, two 20 mm ⁇ 5 mm ⁇ 0.5 mm test pieces 60 are stacked, the test piece is held by a slide glass 61, fixed from above by a clip, and kept for 5 hours in a 120 ° C thermostatic chamber. It heated and checked the existence of adhesion. The cured products A to E confirmed adhesion. The cured product of the hydrolyzable 20 mm ⁇ 5 mm ⁇ 0.5 mm test piece was left in a humidified water bath at a temperature of 85 ° C.
- the press pressure was 0.44 MPa and heating was performed at 90 ° C. for 1 hour and at 140 ° C. for 8 hours to obtain two types of test pieces.
- Comparative example 2 Similar to the resin composition of the present invention, it was confirmed by the adhesion test as in Example 2 that the resin composition of the present invention exhibits the characteristics of the resin composition in which bond recombination occurs due to transesterification.
- the cured product J is based on the aromatic region of 1509cm -1, to obtain a result of absorption of 1736 cm -1 of the carbonyl groups is increased. From this result, it can be seen that the cured product F is affected by hydrolysis.
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Abstract
Description
<塗料>
本発明の樹脂組成物は、各種塗料に使用することが可能である。車や電車等の移動体の塗料として使用した場合、適度な加熱により、傷の修復が可能である。これは、加熱により損傷部分では、エステル交換反応が生じ、一度解裂した結合部の再結合が可能となり、傷は修復される。また、建材用塗料でも同様の使用が可能である。
<モールド変圧器>
本発明の樹脂組成物は、変圧器用のモールド樹脂材料に用いることができる。変圧器用モールド樹脂材料は、成型時の他の部材との膨張係数の違いによる歪が原因でクラックが発生する。耐クラック性を向上させるために、樹脂の架橋密度を低下させると、耐熱性が低下してしまう。また、ゴム粒子やフィラー等の添加材を使用すると、樹脂粘度が上昇し、モールド注形の際にボイドが発生し易くなり、そこを起点としたクラックや、電気絶縁性が低下する問題がある。一方、本発明による樹脂では、これらの課題を克服することができる。また、小さなクラックであれば、使用後に発生したクラックも加熱により修復が可能である。
<電子部品>
本発明の樹脂組成物は、モールド封止材に用いることができる。モールド封止材では、金属などの他の部材との膨張係数の違いによる耐クラック性の課題がある。モールド封止材用樹脂の耐クラック性向上の手法としては、樹脂の架橋密度の低下、ゴム粒子やフィラー等の添加材による靱性値の低下等が一般的である。これらの手法では、一度成形加工した後、製品使用時に発生した歪に対して発生するクラックは防ぐことができない。一方、本発明の樹脂組成物では、製品使用中に発生する熱により、成型後に他の部材との間に発生した歪が、エステル交換反応の結合組換の応力緩和により、クラック発生を防ぐことも可能である。
<モータコイル>
本発明の樹脂組成物は、モータコイルの保護材またはワニス材に用いることができる。モータコイルは、電磁振動等によるクラック発生の課題がある。本発明の樹脂組成物では、モータ使用時に発生する熱により、結合組換えが起こるため、クラックの原因となる歪、すなわち応力を緩和させることが可能である。
<ケーブル>
図4は本発明の動的架橋樹脂を用いて製造したケーブルの断面図である。図4(a)(a)に示すケーブル400においては、本発明の動的架橋樹脂は被覆層40に用いられている。また(b)に示すケーブル401においては、本発明の動的架橋樹脂は絶縁層41に用いられている。
主鎖骨格の合成 まず主鎖骨格の合成について説明する。グリシジルメタクリル酸メチル(東京化成)4
.24g(30mmol)、スチレン(東京化成)15.6g(150mmol)、2,2'-アゾビス(イソブチロニトリル)(東京化成)0.8858g(54mmol)、トルエン(和光純薬)30mlをセパラブルフラスコに入れ、室温でメカニカルスターラーによりよく撹拌した。2,2'-アゾビス(イソブチロニトリル)が溶解したのを確認したら、N2雰囲気下で、60℃で3時間反応させた。反応後のシロップをテトラヒドロフラン(和光純薬)に溶解させ、多量のメタノール(和光純薬)に滴下し、再沈殿を行った。得られた再沈殿物と液体を吸引濾過により分離し、真空乾燥を用いて室温下乾燥させて共重合物Aを得た。共重合物Aの重量平均分子量は5万であり、分子量分布(Mw/Mn)は、1.8、ガラス転移温度は66℃であった。なお、本明細書における重量平均分子量は、ゲル透過型クロマトグラフィー法による標準ポリスチレン換算値である。また、1H-NMRスペクトルの積分比より、共重合物A中のグリシジルメタクリル酸メチルとポリスチレンの取込比(mol比)を求めた結果、71:29となった。
、ナフテン酸亜鉛(東京化成)0.53gをテトラヒドロフラン2gに溶解させ、ワニス化した。ワニスをN2気流下にてテトラヒドロフランを乾燥させ、フィルムとした。
接着 図5のように、2枚の20mm×5mm×0.5mmの試験片60を重ね合わせ、スライドガ
ラス61で試験片を挟み、その上からクリップで固定し、120℃の恒温槽で5時間加熱し、接着の有無を確認した。硬化物A~Eは、接着を確認した。
加水分解性 20mm×5mm×0.5mmの試験片の硬化物を温度85度、湿度85%の湿潤恒温槽に放
置し、赤外吸収スペクトルの変化を20日間において追跡した。赤外吸収スペクトルでは、1509cm-1の芳香族領域を基準に、加水分解後に生成されると考えられるカルボニル基の1736cm-1の吸収の変化を観察した。その結果、硬化物A~Eは、20日間の観察の結果、1736cm-1の吸収はほとんど変化が無かった。
(比較例1)
比較例1では、従来の樹脂組成物の合成法について説明する。10.7 gのjer825エポキシ樹脂(ダウ、当量エポキシ質量:170~180g/eq.)と、0.81gの亜鉛アセチルアセトネートとをテフロン(登録商標)製ビーカーに入れる。加熱空気ガン(T=180℃)を用いて反応物を加熱し、完全溶解するまで混合する。次に、4.4gのHN5500を加え、完全溶解するまで混合する。0.5mm厚のテフロン(登録商標)製シートで作製した型に混合した溶液を流し、真空プレスにて、20mm×5mm×0.5mm及び20mm×2mm×0.5mmの短冊型の試験片として硬化物Jを得た。プレス圧0.44MPa、加熱は、90℃で1時間、140℃で8時間プレスし、二種類の試験片を得た。
(比較例2)
実施例2と同様に接着の試験により、本発明の樹脂組成物と同様に、エステル交換反応による結合組換が生じる樹脂組成物の特徴を示すことを確認した。
22 リードフレーム
23 モールド封止材
24 半導体素子
24a 基材
25 ボンディングワイヤ
300 コイル
301 モータ
30 固定子磁心
31 スロット
32 回転子磁心
36 磁心
37 被覆銅線
38 モータコイル保護材
39 固定子コイル
400 ケーブル
401 ケーブル
40 被覆層
41 絶縁層
43 導体
44 内部半導体層
45 絶縁層
46 外部半導電層(密着層)
47 外部半導電層(剥離層)
48 被覆層
49 外皮層
60 試験片
61 スライドガラス
Claims (20)
- 2つ以上のエポキシ基を含むビニル化合物の共重合体と、
カルボン酸無水物と、
エステル交換反応触媒を有することを特徴とする樹脂組成物。 - 請求項1に記載の樹脂組成物において、
前記ビニル化合物の共重合体に含まれるエポキシ基と、前記カルボン酸無水物が反応して、エステル結合とヒドロキシル基を有することを特徴とする樹脂組成物。 - 請求項2に記載の樹脂組成物において、
前記エステル結合及び前記ヒドロキシル基は、加熱によりエステル交換反応を開始することを特徴とする樹脂組成物。 - 請求項1乃至3のいずれかに記載の樹脂組成物において、
主鎖骨格のビニル化合物共重合体の側鎖にエポキシ基が結合していることを特徴とする樹脂組成物。 - 請求項1乃至4のいずれかに記載の樹脂組成物において、
前記ビニル化合物の総量に対する前記エステル交換反応触媒の割合が0.20~11mol%であることを特徴とする樹脂組成物。 - 請求項1乃至5のいずれかに記載の樹脂組成物を含むことを特徴とする塗料。
- 請求項1乃至5のいずれかに記載の樹脂組成物をモールド封止材に用いたことを特徴とする電子部品。
- 請求項1乃至5のいずれかに記載の樹脂組成物をモールド樹脂材に用いたことを特徴とするモールド変圧器。
- 請求項1乃至5のいずれかに記載の樹脂組成物を保護材またはワニス材に用いたことを特徴とするモータコイル。
- 請求項1乃至5のいずれかに記載の樹脂組成物を被覆層または絶縁層に用いたことを特徴とするケーブル。
- 2つ以上のカルボン酸無水物基を含むビニル化合物の共重合体と、
エポキシと、
エステル交換反応触媒を有することを特徴とする樹脂組成物。 - 請求項11に記載の樹脂組成物において、
前記ビニル化合物の共重合体に含まれるカルボン酸無水物基と、前記エポキシが反応して、エステル結合とヒドロキシル基を有することを特徴とする樹脂組成物。 - 請求項12に記載の樹脂組成物において、
前記エステル結合及び前記ヒドロキシル基は、加熱によりエステル交換反応を開始することを特徴とする樹脂組成物。 - 請求項11乃至13のいずれかに記載の樹脂組成物において、
主鎖骨格のビニル化合物共重合体の側鎖にカルボン酸無水物基が結合していることを特徴とする樹脂組成物。 - 請求項11乃至14のいずれかに記載の樹脂組成物において、
前記ビニル化合物の総量に対する前記エステル交換反応触媒の割合が0.20~11mol%であることを特徴とする樹脂組成物。 - 請求項11乃至15のいずれかに記載の樹脂組成物を含むことを特徴とする塗料。
- 請求項11乃至15のいずれかに記載の樹脂組成物をモールド封止材に用いたことを特徴とする電子部品。
- 請求項11乃至15のいずれかに記載の樹脂組成物をモールド樹脂材に用いたことを特徴とするモールド変圧器。
- 請求項11乃至15のいずれかに記載の樹脂組成物を保護材またはワニス材に用いたことを特徴とするモータコイル。
- 請求項11乃至15のいずれかに記載の樹脂組成物を被覆層または絶縁層に用いたことを特徴とするケーブル。
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WO2003087230A1 (fr) * | 2002-04-16 | 2003-10-23 | Hitachi Chemical Co., Ltd. | Composition de resine thermodurcissable, preimpregne et feuille stratifiee utilisant cette composition. |
JP2005248147A (ja) * | 2004-02-04 | 2005-09-15 | Hitachi Chem Co Ltd | 熱硬化性樹脂組成物及びそれを用いたプリプレグ、金属張積層板、印刷配線板 |
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JP2014513192A (ja) * | 2011-05-10 | 2014-05-29 | アルケマ フランス | 熱間成形およびリサイクルすることができる熱硬化性物質/超分子ハイブリッド複合体および樹脂 |
JP2014189587A (ja) * | 2013-03-26 | 2014-10-06 | Osaka Organic Chem Ind Ltd | 樹脂組成物 |
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JPS6028422A (ja) * | 1983-07-26 | 1985-02-13 | Mitsubishi Electric Corp | 低粘度エポキシ含浸樹脂の製造方法 |
JPH0819315B2 (ja) * | 1990-04-05 | 1996-02-28 | 日本ペイント株式会社 | 熱硬化性樹脂組成物 |
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JPS6414224A (en) * | 1987-07-07 | 1989-01-18 | Mitsubishi Gas Chemical Co | Production of thermosetting resin |
WO2003087230A1 (fr) * | 2002-04-16 | 2003-10-23 | Hitachi Chemical Co., Ltd. | Composition de resine thermodurcissable, preimpregne et feuille stratifiee utilisant cette composition. |
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