WO2015149458A1 - 柔性显示装置及其封装方法 - Google Patents
柔性显示装置及其封装方法 Download PDFInfo
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- WO2015149458A1 WO2015149458A1 PCT/CN2014/083118 CN2014083118W WO2015149458A1 WO 2015149458 A1 WO2015149458 A1 WO 2015149458A1 CN 2014083118 W CN2014083118 W CN 2014083118W WO 2015149458 A1 WO2015149458 A1 WO 2015149458A1
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- Prior art keywords
- protective layer
- film
- region
- water
- oxygen barrier
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 32
- 239000011241 protective layer Substances 0.000 claims abstract description 130
- 239000010410 layer Substances 0.000 claims abstract description 104
- 239000001301 oxygen Substances 0.000 claims abstract description 69
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 69
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 28
- 230000000903 blocking effect Effects 0.000 claims abstract description 14
- 230000004888 barrier function Effects 0.000 claims description 56
- 239000000463 material Substances 0.000 claims description 47
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 17
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 12
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 claims description 5
- 239000012528 membrane Substances 0.000 claims description 4
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- 238000005452 bending Methods 0.000 abstract description 19
- 230000009977 dual effect Effects 0.000 abstract 1
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- 230000035882 stress Effects 0.000 description 23
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- 238000009826 distribution Methods 0.000 description 8
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- 229910004205 SiNX Inorganic materials 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B23/00—Apparatus for displacing, setting, locking, releasing or removing tools, packers or the like in boreholes or wells
- E21B23/001—Self-propelling systems or apparatus, e.g. for moving tools within the horizontal portion of a borehole
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B31/00—Fishing for or freeing objects in boreholes or wells
- E21B31/002—Destroying the objects to be fished, e.g. by explosive means
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B33/00—Sealing or packing boreholes or wells
- E21B33/10—Sealing or packing boreholes or wells in the borehole
- E21B33/12—Packers; Plugs
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B4/00—Drives for drilling, used in the borehole
- E21B4/04—Electric drives
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B43/00—Methods or apparatus for obtaining oil, gas, water, soluble or meltable materials or a slurry of minerals from wells
- E21B43/11—Perforators; Permeators
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B43/00—Methods or apparatus for obtaining oil, gas, water, soluble or meltable materials or a slurry of minerals from wells
- E21B43/11—Perforators; Permeators
- E21B43/112—Perforators with extendable perforating members, e.g. actuated by fluid means
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B43/00—Methods or apparatus for obtaining oil, gas, water, soluble or meltable materials or a slurry of minerals from wells
- E21B43/14—Obtaining from a multiple-zone well
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B7/00—Special methods or apparatus for drilling
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/311—Flexible OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to the field of display, and in particular, to a flexible display device and a packaging method thereof. Background technique
- OLED Organic Light Emitting Diode
- OLED devices are very sensitive to moisture and oxygen and are easily attenuated. Effective packaging prevents moisture and oxygen from immersing, prevents aging of organic materials, and extends OLED device life.
- flexible OLEDs are mainly packaged in a cover package and a thin film package (TFE).
- the cover package is packaged using a prefabricated cover, mainly glass material and film material; the film package mainly uses a single layer film or a multilayer film. Package.
- FIG. 1 shows a schematic diagram of packaging a flexible display device in the prior art.
- a protective layer 13 for covering the cathode of the OLED device 12 is formed, and then a protective film 14 is attached over the protective layer 13.
- the protective layer 13 is mainly used for encapsulation to prevent the intrusion of moisture and oxygen;
- the protective film 14 is mainly used to prevent the protective layer 13 from being scratched.
- the conventional packaging method generally has the following problems: When the flexible display device is bent, the encapsulating film layer (i.e., the protective layer 13) is liable to cause cracks, resulting in poor bending resistance of the flexible display device. Summary of the invention
- the inventors conducted in-depth research on the problems caused by the packaging of the prior art flexible display device, and found the cause of the above problems:
- the problem of stress matching between the layers being contacted easily causes the encapsulating film layer to rupture along the defect position.
- the above-mentioned defect position refers to a micro-crack caused by a pinhole or a poor interlaminar stress generated at the time of coating, and these positions are stress concentration points when the flexible display device is bent, and are easily broken by an external force.
- the present invention provides a flexible display device and a packaging method thereof, which can solve the problem that the existing package film layer is prone to cracks, thereby improving the bending resistance of the flexible display device.
- a flexible display device comprising: an OLED device, a protective layer disposed on a cathode of the OLED device, the protective layer comprising a water oxygen barrier region and a multifunctional region, the multifunctional region having water oxygen The heavy function of blocking and stress blocking, wherein the film thickness of the multifunctional region is smaller than the film thickness of the water-oxygen barrier region and/or the film quality of the multifunctional region is looser than that of the water-oxygen barrier region.
- the protective layer in the flexible display device of the present invention comprises a multi-functional region
- the film stress generated by the bending of the film layer is buffered in the multi-functional region, that is, the existence of the multifunctional region can be
- the expansion path of the film stress is cut off, so that the possibility of microcracks during bending can be reduced; at the same time, the presence of the multifunctional region can also block the crack propagation. In this way, the bending resistance of the device is improved.
- the position of the multi-function area corresponds to a space area between adjacent pixels
- the position of the water-oxygen barrier area corresponds to a pixel area. Since the film layer corresponding to the multi-functional area varies in material, thickness, and porosity, it may affect the optical transmittance of the entire flexible display device. Therefore, preferably, the position of the multi-function area may correspond to the spacing area between adjacent pixels to avoid the visual effect of the flexible display device being affected.
- the protective layer comprises: a first protective layer continuously distributed and a patterned second protective layer, wherein the first protective layer covers the cathode of all OLED devices, and the second protective layer It is only distributed in the water-oxygen barrier zone, or preferably in a corresponding area above the pixel.
- a corresponding protective layer and a second protective layer are disposed on the corresponding area above the pixel, wherein the film layer is relatively thick and is a water-oxygen barrier region; and the spacer region between adjacent pixels is only provided with the first protective layer, that is, adjacent
- the film layer of the spacer region between the pixels is relatively thin, forming a multi-functional region, so that stress and cracks in the encapsulation film layer can be blocked here when bent.
- the first protective layer has a thickness of 0.05-1 ⁇ m.
- one of the first protective layer and the second protective layer is made of a silicon nitride material or a silicon oxide material, or a first protective layer and a second protection.
- the material of the layer is a silicon nitride material or a silicon oxide material.
- the protective layer comprises: a film a dense first layer of film, distributed only in the water-oxygen barrier region, or preferably distributed over a corresponding region above the pixel; and, the second film layer that is loosely porous, distributed only in the multifunctional region, or preferably distributed The gap of the first film layer.
- the second film layer is looser than the first film layer and formed by different steps, and the distribution regions of the second film layer are discontinuous, so that stress diffusion can be cut off, and thus the film layer is encapsulated. Stresses and cracks are blocked here.
- the distribution area of the second film layer corresponds to the multi-functional area
- the film quality of the first film layer 134 is relatively dense
- the distribution area corresponds to the water-oxygen barrier zone.
- the first film layer is a film-densified silicon nitride-based material or a silicon-oxygen material; and the second film layer is a film-like porous silicon-nitrogen material or Silicon oxide material.
- a packaging method of a flexible display device comprising: after the cathode of the OLED device is completed, forming a water and oxygen barrier region covering the cathode of the OLED device and a protective layer of the functional area, wherein the multifunctional area has a heavy function of water oxygen barrier and stress blocking, and the thickness of the multifunctional layer is smaller than the thickness of the water and oxygen barrier and/or the membrane quality of the multifunctional region The membrane of the oxygen barrier zone is loose.
- the packaging method solves the problem that the existing package film layer is prone to cracking by setting a multi-functional area in the protective layer, cutting the expansion path of the film stress and the path of the crack propagation, and improving the bending resistance of the flexible display device.
- the step of forming a protective layer covering the water-oxygen barrier region and the multi-functional region over the cathode of the OLED device may include: at the cathode of the OLED device Forming a first protective layer that continuously distributes and completely covers the cathode of the OLED device; and on the first protective layer, forming a second protective layer distributed only in a corresponding region above the pixel, wherein the region of the second protective layer constitutes water oxygen
- the barrier region, and only the region in which the first protective layer is distributed (or the region corresponding to the interval above the adjacent pixels) constitutes the multifunctional region.
- a second protective layer can be formed over the corresponding region above the pixel by using a mask.
- the step of forming a protective layer covering the water-oxygen barrier region and the multi-functional region over the cathode of the OLED device may include: at the cathode of the OLED device Forming a dense first film layer on the corresponding region above the pixel; and forming a second film layer with a loose film in the gap of the first film layer, wherein the region where the first film layer is located constitutes a water oxygen barrier The area, and the area where the second film layer is located constitutes a multifunctional area.
- FIG. 1 is a schematic view showing the packaging of a prior art flexible display device
- FIG. 2 is a schematic view showing a positional distribution of a multi-functional area on a protective layer in a flexible display device according to an embodiment of the present invention
- FIG. 3 is a package schematic view of a flexible display device according to a first embodiment of the present invention
- FIG. 4 is a package schematic view of a flexible display device according to a second embodiment of the present invention
- Fig. 6 is a flow chart showing a method of packaging a flexible display device in accordance with a second embodiment of the present invention.
- FIG. 1 shows a schematic diagram of a prior art flexible display device package.
- the flexible display device package structure includes, in order from bottom to top, a flexible substrate 11 , an OLED device 12 , a protective layer 13 completely covering the cathode of the OLED device 12 , and a protective film 14 covering the protective layer 13 .
- the protective layer 13 mainly serves as a package to prevent the intrusion of water vapor and oxygen; and the protective film 14 is mainly used to prevent the protective layer 13 from being scratched.
- the existing package structure has the following problems: When the flexible display device is bent, the package film layer (i.e., the protective layer 13) is liable to cause cracks, resulting in poor bending resistance of the flexible display device.
- the inventors have discovered the root cause of the problem, that is, when the flexible display device is bent, due to the small holes and the package film layer existing in the package film layer.
- the interlaminar stress matching problem easily causes the encapsulating film layer to rupture along the defect position.
- you can set more The functional area blocks the stress due to the bending of the OLED device 12, thereby preventing the protective layer 13 from being cracked.
- the basic idea is that the film layer of the multi-functional area can be set to be thinner or the film is more loose, so that the film layer stress caused by the film bending can be buffered in the multi-functional area to cut the expansion path of the film stress.
- the possibility that the OLED device 12 is bent to cause microcracking of the protective layer 13 can be reduced, and the crack propagation can be blocked, thereby improving the bending resistance of the device.
- the main innovation of the package structure of the flexible display device according to the present invention is that the structure of the protective layer 13 shown in Fig. 1 is changed as compared with the prior art.
- the protective layer in the package structure of the flexible display device according to the embodiment of the present invention includes a water oxygen barrier region and a multifunctional region, wherein the multifunctional region has a heavy function of water oxygen barrier and stress blocking, and the multifunctional region
- the film thickness is less than the film thickness of the water-oxygen barrier zone and/or the film quality of the multi-functional zone is looser than that of the water-oxygen barrier zone.
- Fig. 2 is a view showing the positional distribution of the multi-function area 130 of the protective layer in the flexible display device according to an embodiment of the present invention.
- the thickness of the film layer of the multi-functional zone 130 and the degree of looseness of the film quality can be designed according to the actual bending resistance resistance required.
- the size, shape and position of the multi-function area 130 can also be set according to actual needs.
- the position of the multi-function area 130 may correspond to an interval area between adjacent pixels to prevent the visual effect of the flexible display device from being affected.
- a single layer film can be disposed at a preset position of the multifunctional area 130, and a double layer can be set in a remaining area (predetermined position of the water and oxygen blocking area).
- the film is formed such that the film thickness of the pre-set position of the multi-function area 130 is relatively thin to form the multi-function area 130, and the remaining area forms a water-oxygen barrier zone; and in the second mode, the film can be formed at the preset position of the multi-function area 130.
- a relatively loose first film layer forms a multifunctional region 130, and a relatively dense second film layer is formed in the remaining region (predetermined position of the water-oxygen barrier region) to form a water-oxygen barrier region;
- the protective film layer may be integrally formed (for example, a water-oxygen barrier protective layer is formed by using a prior art packaging method), and then the film layer at a predetermined position of the multi-function region 130 is etched, and the preset position is after etching. The thickness of the film is thinned or the film quality becomes loose, thereby forming the multi-functional region 130, and the other unetched regions form a water-oxygen barrier region.
- any other suitable method may be used to construct the protective layer, and during the construction of the protective layer, the film layer of the multifunctional region 130
- the specific thickness or the specific porosity of the film can be set according to actual needs (such as bending resistance performance requirements or other factors) and specific materials.
- the configuration of the protective layer (particularly, the multi-function area therein) of the flexible display device according to the present invention will be specifically described below with reference to FIGS. 3 and 4.
- Fig. 3 is a view showing a package of a flexible display device according to a first embodiment of the present invention, wherein the protective layer corresponds to the first configuration described above.
- the substrate 10 is a flexible substrate 1 1
- the flexible substrate 11 is provided with an OLED device 12 and a circuit for driving the OLED device 12, and a protective layer for packaging is disposed thereon, and a protective film is disposed on the protective layer.
- the protective film 14 is mainly used to prevent the protective layer from being scratched.
- the protective layer includes a first protective layer 131 and a patterned second protective layer 132, wherein the first protective layer 131 completely covers the cathode of the OLED device 12 to prevent intrusion of moisture and oxygen, and the second protection Layer 132 is only distributed over corresponding areas above the pixels.
- a corresponding protective layer 131 and a second protective layer 132 are disposed in a corresponding region above the pixel, the film layer is relatively thick, and the region where it forms forms the water-oxygen barrier region 120; and between adjacent pixels
- the corresponding area above the interval is only provided with the first protective layer 131, that is, the film layer of the corresponding area above the interval between adjacent pixels is relatively thin, and the area where the area is formed forms the multifunctional area 130, so that the encapsulating film layer is formed when bent The stresses and cracks inside can be blocked here.
- the water-oxygen barrier region 120 and the multi-function region 130 relate only to the partition of the protective layer (including the first protective layer 131 and the second protective layer 132), and other devices of the flexible device (such as protection)
- the film 14, the OLED device 12, etc. are irrelevant.
- the water and oxygen barrier region 120 indicates only the region where the second protective layer 132 is located
- the multifunctional layer 130 indicates only the region where the first protective layer 131 is distributed.
- the thickness of the first protective layer 131 should be appropriately balanced.
- the sealing effect and the bending resistance, the thickness may preferably be 0.05-1 ⁇ m.
- one of the first protective layer 131 and the second protective layer 132 is made of a silicon nitride material (such as silicon nitride) or a silicon oxide material (such as silicon oxide).
- the materials of the first protective layer 131 and the second protective layer 132 are both silicon nitride materials or silicon oxide materials.
- the silicon nitride-based material includes, for example, a silicon-containing or oxygen-containing material such as silicon nitride, and the silicon-oxygen-based material includes a silicon- or nitrogen-containing material such as silicon oxide.
- the embodiment shown in Figure 3 provides a construction of the protective layer that reduces the encapsulation film
- the probability of cracking in the layer improves the bending resistance of the device; and it does not require improvement of the existing preparation process and is easy to implement.
- the protective layer of the original single-layer film structure may be separately formed into two steps, that is, a layer film structure is formed, wherein the first layer film, that is, the first protective layer 131 is continuously distributed, and the existing preparation is performed.
- the second layer of the film, that is, the second protective layer 132 is distributed only in the corresponding area above the pixel, and can be occluded using a mask or formed by photolithography.
- FIG. 4 is a block diagram showing a package of a flexible display device according to a second embodiment of the present invention, wherein the protective layer corresponds to the second configuration described above.
- the package structure of FIG. 4 is different from that of FIG. 3 in that, in FIG. 4, the protective layer comprises: a film-like dense first film layer 134 distributed in a corresponding region above the pixel, that is, a water-oxygen barrier region 120;
- the loose second film layer 135 is distributed in a gap of the first film layer 134 or a region corresponding to the interval between adjacent pixels, that is, the multi-function region 130.
- the water-oxygen barrier region 120 and the multi-function region 130 relate only to the partition of the protective layer (including the first film layer 134 and the second film layer 135), and other devices of the flexible device (such as The protective film 14, the OLED device 12, and the like are irrelevant.
- the water-oxygen barrier region 120 indicates only the region in which the first film layer 134 is located
- the multi-function layer 130 indicates only the region in which the second film layer 135 between the adjacent water-oxygen barrier regions 120 is located.
- the film quality of the second film layer 135 is looser than that of the first film layer 134 and is formed by different steps, and the distribution regions of the second film layer 135 are discontinuous. Therefore, the stress diffusion can be cut off, so that the stress and crack in the encapsulation film layer are blocked here, and the distribution area of the second film layer 135 is the multi-function region 130; and the first film layer 134 is relatively dense. The distribution area is the water oxygen barrier zone 120. It should be noted that although the second film layer 135 is loose in film quality, it is also required to provide a basic water and oxygen barrier function for the cathode of the underlying OLED device 12.
- the first film layer 134 may be a film-like dense silicon nitride or a silicon oxide material; and the second film layer 135 may be a film-like silicon nitride or a silicon-oxygen material, or other porous materials. material.
- the desired pattern can be obtained by using mask occlusion or photolithography.
- the first film layer 134 and the second film layer 135 may be the same material or different materials. If it is the same material, the first film layer 134 and the second film layer 135 should be respectively fabricated by different processes (or the same process, different process parameters) to meet different film quality requirements, and reduce the water and oxygen barrier zone 120 and the multifunctional The film thickness between the zones 130 is poor, because if the film thickness difference between the two regions is too large for the manufacturing of flexible display Subsequent processes are adversely affected.
- FIGS. 5 and 6 respectively show a flow chart of a method of packaging a flexible display device in accordance with various embodiments of the present invention.
- the packaging methods shown in FIGS. 5 and 6 can be summarized as follows: After the cathode of the OLED device is completed, the packaging method further includes: forming a protection including a water-oxygen barrier region and a multi-function region overlying the cathode of the OLED device. a multi-functional zone having a heavy function of water oxygen barrier and stress blockage, wherein a film thickness of the multi-functional zone is less than a film thickness of the water-oxygen barrier zone and/or a film of the multifunctional zone The film is looser than the membrane of the water-oxygen barrier zone.
- the difference between the two packaging methods is that the specific forming steps are different due to the different construction of the protective layer.
- FIG. 5 is a flow chart showing a flexible display device packaging method according to a first embodiment of the present invention, which corresponds to the package structure of the flexible display device shown in FIG.
- the packaging method includes: Step S101, forming a first protective layer 131 continuously distributed over the cathode of the OLED device 12 and completely covering the cathode of the OLED device 12; Step S102, forming a pixel only distributed over the first protective layer 131
- the area where the second protective layer 132 is located is the water oxygen barrier region 120, and the region where only the first protective layer 131 is distributed is the multifunctional region 130.
- the difference from the prior art is that the thickness of the first protective layer 131 is relatively thin, preferably 0.05-1 ⁇ m.
- the SiN x /SiO 2 first protective layer 131 may be plated on the OLED device by PECVD (plasma chemical vapor deposition).
- the second protective layer 132 is only distributed in the corresponding area above the pixel, which is the same as the material requirement of the existing protective layer.
- the second protective layer 132 can be formed only in the corresponding area above the pixel by using the mask to block; Of course, in addition to this, the second protective layer 132 can also be formed by photolithography.
- One of the first protective layer 131 and the second protective layer 132 is made of silicon nitride or a silicon oxide material, or the first protective layer 131 and the second protective layer 132 are made of silicon nitride or both. It is a silicone material.
- the specific packaging method of the flexible display device of the embodiment shown in FIG. 5 can reduce the probability of cracking of the package film layer and improve the bending resistance of the device; and, it does not need to greatly improve the existing preparation process, and is easy to implement.
- the protective layer of the original single-layer film structure is divided into two steps to form a two-layer film, respectively.
- a film, that is, a first protective layer 131 that is continuously distributed, is the same as the prior art; the second film, that is, the patterned second protective layer 132, is formed by masking using a mask or forming a pattern using photolithography.
- Fig. 6 is a flow chart showing a flexible display device packaging method according to a second embodiment of the present invention, which corresponds to the package structure of the flexible display device shown in Fig. 4.
- the method includes: Step S201, forming a film-dense first film layer 134 corresponding to the water-oxygen barrier region 120 on a corresponding region above the pixel, corresponding to the cathode of the OLED device 12; Step S202, in the first film layer
- the gap of 134 forms a membranous second film layer 135 that corresponds to the multifunctional region 130.
- a film-like dense SiN x /SiO 2 can be plated by PECVD on the OLED device 12 while being masked by masking, and the portion covering the first film layer 134 is not required (corresponding to more The functional area 130) is blocked by a mask.
- a portion of the mask occluded in the step S201 is deposited by PECVD to deposit a film of loose SiNx/Si0 2 , which acts as a stress blocking function and also functions as a sealing and flattening.
- the material of the second film layer 135 may also include a porous material such as a porous material having a hygroscopic function.
- the first film layer 134 may be a film-like dense silicon nitride or a silicon oxide material; the second film layer 135 may be a film-like porous silicon nitride or a silicon-oxygen material.
- the desired pattern can be obtained by using mask occlusion or photolithography.
- the first film layer 134 and the second film layer 135 described above may be the same material or different materials. If it is the same material, the first film layer 134 and the second film layer 135 should be made by different processes (or the same process and different process parameters) to form different film quality requirements and reduce the film thickness difference.
- the packaging method of the flexible display device of the embodiment shown in FIG. 5 and FIG. 6 solves the problem that the existing package film layer is prone to cracks and the flexibility is improved by providing a multi-functional area in the protective layer and cutting off the stress propagation path of the film layer.
- the bending resistance of the display device solves the problem that the existing package film layer is prone to cracks and the flexibility is improved by providing a multi-functional area in the protective layer and cutting off the stress propagation path of the film layer.
- the preparation and packaging process of the flexible display device is the same as that of the prior art except for the formation of the protective layer of the multifunctional region having the stress blocking function, and the embodiment of the present invention will not be described in detail.
- the protective layer after the protective layer is formed, it is also necessary to attach a protective film for protection to prevent the protective layer from being scratched.
- the attaching method may be hard hard and soft hard, which is substantially the same as the prior art and will not be described again.
- the first, second, etc. are used to classify similar items, but the first and second words do not quantitatively perform the present invention.
- Limitations are merely illustrative of a preferred approach. It will be apparent to those skilled in the art, in light of the present disclosure, that such modifications and variations are obvious within the scope of the invention.
- the same or similar parts may be referred to each other, and each embodiment focuses on differences from other embodiments.
- the manufacturing method embodiment it corresponds to the corresponding device embodiment, so the description is relatively simple, and the relevant points can be referred to the description of the corresponding device embodiment part.
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Abstract
Description
Claims
Priority Applications (1)
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US14/435,740 US20170012237A1 (en) | 2014-04-02 | 2014-07-28 | A flexible display apparatus and an encapsulation method thereof |
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CN201410131612.4A CN103943788B (zh) | 2014-04-02 | 2014-04-02 | 柔性显示装置及其封装方法 |
CN201410131612.4 | 2014-04-02 |
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PCT/CN2014/083118 WO2015149458A1 (zh) | 2014-04-02 | 2014-07-28 | 柔性显示装置及其封装方法 |
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CN (1) | CN103943788B (zh) |
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CN108538198B (zh) * | 2018-05-02 | 2023-11-21 | 京东方科技集团股份有限公司 | 一种保护膜、显示面板及显示装置 |
CN109004002B (zh) * | 2018-07-06 | 2021-06-15 | 云谷(固安)科技有限公司 | 显示模组及显示装置 |
CN109087586B (zh) * | 2018-07-18 | 2021-05-18 | 广州国显科技有限公司 | 显示装置及其柔性显示面板 |
WO2020073226A1 (en) * | 2018-10-10 | 2020-04-16 | Boe Technology Group Co., Ltd. | Display substrate, display apparatus, method of fabricating display substrate |
CN109671750B (zh) * | 2018-12-13 | 2021-04-20 | 云谷(固安)科技有限公司 | 一种显示面板、显示面板的制备方法及制备设备 |
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CN110470583B (zh) * | 2019-08-26 | 2020-07-10 | 武汉华星光电半导体显示技术有限公司 | 测试薄膜封装性能的方法 |
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Also Published As
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CN103943788A (zh) | 2014-07-23 |
US20190024469A1 (en) | 2019-01-24 |
CN103943788B (zh) | 2016-04-06 |
US20170012237A1 (en) | 2017-01-12 |
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