WO2015008805A1 - 酸化物半導体薄膜および薄膜トランジスタ - Google Patents
酸化物半導体薄膜および薄膜トランジスタ Download PDFInfo
- Publication number
- WO2015008805A1 WO2015008805A1 PCT/JP2014/068961 JP2014068961W WO2015008805A1 WO 2015008805 A1 WO2015008805 A1 WO 2015008805A1 JP 2014068961 W JP2014068961 W JP 2014068961W WO 2015008805 A1 WO2015008805 A1 WO 2015008805A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- thin film
- phase
- oxide semiconductor
- semiconductor thin
- oxide
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 272
- 239000004065 semiconductor Substances 0.000 title claims abstract description 131
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 50
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910052738 indium Inorganic materials 0.000 claims abstract description 26
- 239000012535 impurity Substances 0.000 claims abstract description 14
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims description 93
- 238000000137 annealing Methods 0.000 claims description 60
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 claims description 27
- 238000002425 crystallisation Methods 0.000 claims description 22
- 230000008025 crystallization Effects 0.000 claims description 22
- 238000005530 etching Methods 0.000 abstract description 44
- 239000013078 crystal Substances 0.000 abstract description 26
- 229910052760 oxygen Inorganic materials 0.000 abstract description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 14
- 239000001301 oxygen Substances 0.000 abstract description 14
- 239000000463 material Substances 0.000 abstract description 13
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 abstract description 8
- 238000000206 photolithography Methods 0.000 abstract description 7
- 229910005264 GaInO3 Inorganic materials 0.000 abstract 2
- 239000012071 phase Substances 0.000 description 105
- 239000000758 substrate Substances 0.000 description 41
- 238000000034 method Methods 0.000 description 32
- 238000004544 sputter deposition Methods 0.000 description 30
- 230000015572 biosynthetic process Effects 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 18
- 239000000843 powder Substances 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 15
- 239000007789 gas Substances 0.000 description 13
- 230000008569 process Effects 0.000 description 13
- 238000001039 wet etching Methods 0.000 description 13
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 11
- 238000005259 measurement Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 9
- 238000005245 sintering Methods 0.000 description 9
- 239000013081 microcrystal Substances 0.000 description 8
- 238000000059 patterning Methods 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 238000005477 sputtering target Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 229910003437 indium oxide Inorganic materials 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 5
- 229910001195 gallium oxide Inorganic materials 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229920001940 conductive polymer Polymers 0.000 description 4
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000005669 field effect Effects 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- 230000005355 Hall effect Effects 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000001483 high-temperature X-ray diffraction Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- BLIQUJLAJXRXSG-UHFFFAOYSA-N 1-benzyl-3-(trifluoromethyl)pyrrolidin-1-ium-3-carboxylate Chemical compound C1C(C(=O)O)(C(F)(F)F)CCN1CC1=CC=CC=C1 BLIQUJLAJXRXSG-UHFFFAOYSA-N 0.000 description 1
- 238000007088 Archimedes method Methods 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010021143 Hypoxia Diseases 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000012356 Product development Methods 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02565—Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/127—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement
- H01L27/1274—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor
- H01L27/1285—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor using control of the annealing or irradiation parameters, e.g. using different scanning direction or intensity for different transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66969—Multistep manufacturing processes of devices having semiconductor bodies not comprising group 14 or group 13/15 materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
Definitions
- the present invention relates to an oxide semiconductor thin film and a thin film transistor using the same.
- a thin film transistor is a kind of field effect transistor (FET).
- FET field effect transistor
- a TFT is a three-terminal element having a gate terminal, a source terminal, and a drain terminal as a basic configuration.
- a semiconductor thin film formed on a substrate is used as a channel layer in which electrons or holes move, and a voltage is applied to the gate terminal. It is an active element having a function of switching the current between the source terminal and the drain terminal by applying and controlling the current flowing in the channel layer.
- a polycrystalline silicon thin film or an amorphous silicon thin film is widely used as a TFT channel layer.
- amorphous silicon thin films are widely used as channel layers for TFTs for liquid crystal panels because they can be uniformly formed on a large-area 10th generation glass substrate.
- the mobility of electrons as carriers is as low as 1 cm 2 V ⁇ 1 sec ⁇ 1 or less, and application to TFTs for high-definition panels is becoming difficult. That is, with the high definition of the liquid crystal, high speed driving of the thin film transistor is required.
- the carrier mobility of the amorphous silicon thin film is 1 cm 2 V ⁇ 1 sec ⁇ . It is necessary to use a semiconductor thin film exhibiting carrier mobility higher than 1 for the channel layer.
- the polycrystalline silicon thin film has a high carrier mobility of about 100 cm 2 V ⁇ 1 sec ⁇ 1 , it has sufficient characteristics as a channel layer material for a thin film transistor for a high-definition panel. I can say that.
- the polycrystalline silicon thin film has a problem in that the carrier mobility is lowered at the crystal grain boundary, so that the in-plane uniformity of the substrate is poor and the characteristics of the thin film transistor are varied.
- a polycrystalline silicon thin film can be obtained by forming an amorphous silicon film at a substrate temperature of 300 ° C. or lower and then crystallizing it by annealing. At this time, annealing is performed by a special method such as excimer laser annealing.
- Patent Document 1 proposes a transparent amorphous oxide semiconductor thin film formed by vapor phase film formation and composed of elements of In, Ga, Zn, and O.
- the transparent amorphous oxide semiconductor thin film was InGaO the composition when crystallized 3 (ZnO) m (m is a natural number of less than 6), without adding an impurity ion, 1cm 2 V -1 sec -1 And a carrier concentration of 1 ⁇ 10 16 cm ⁇ 3 or less can be achieved.
- an amorphous oxide semiconductor thin film inherently tends to generate oxygen vacancies, and the behavior of the electron as a carrier is not always stable against external factors such as heat. There is a problem of becoming stable.
- a negative bias is continuously applied to the thin film transistor under irradiation with visible light, there is a problem in that a negative light bias deterioration phenomenon occurs in which the threshold voltage is shifted to the negative side.
- Patent Document 2 gallium is dissolved in indium oxide, the Ga / (In + Ga) atomic ratio is 0.001 to 0.12, and the content ratio of indium and gallium with respect to all metal atoms is 80 atoms. %, And an oxide semiconductor thin film having an In 2 O 3 bixbyite structure has been proposed.
- Patent Document 3 proposes an oxide semiconductor thin film made of indium oxide having a Ga / (In + Ga) atomic ratio of 0.10 to 0.15 and having a bixbyite structure as a crystal structure.
- an amorphous oxide thin film is formed by sputtering using an oxide sintered body composed of a single phase In 2 O 3 having a bixbyite structure, and then annealed.
- a crystalline oxide semiconductor thin film is obtained.
- the problem resulting from the amorphous oxide semiconductor thin film mentioned above does not arise.
- the crystalline oxide semiconductor thin film described in these documents achieves a high carrier mobility of 40 cm 2 V ⁇ 1 sec ⁇ 1 or more.
- Patent Documents 2 and 3 an amorphous film is once formed, and a crystalline oxide semiconductor thin film is obtained by subsequent annealing treatment.
- a weak acid such as an aqueous solution containing oxalic acid or hydrochloric acid in order to perform patterning into a desired channel layer shape.
- Patent Documents 2 and 3 since the oxide sintered body having substantially only the Bigsbyte structure is used as the sputtering target used for sputtering film formation, the crystallization temperature of the formed amorphous film is low.
- Patent Document 4 proposes a thin film transistor using an oxide semiconductor thin film with a Ga / (In + Ga) atomic ratio of 0.01 to 0.09 as a channel layer.
- this oxide semiconductor thin film is formed by sputtering film formation in an atmosphere of a mixed gas (sputtering gas) containing water molecules.
- sputtering gas a mixed gas containing water molecules.
- Patent Document 5 when a film is formed by a sputtering method in an atmosphere where water molecules are present, there is a possibility that particles are taken into the obtained oxide semiconductor thin film.
- Non-Patent Document 1 reports that H + remains in an oxide semiconductor thin film obtained by the above-described method in a crystal after annealing. Theoretically calculated that H + remaining in such a thin film deteriorates the film quality of the oxide semiconductor thin film or becomes an unnecessary carrier source, so that the carrier concentration may increase. It is pointed out from both the literature 2) and the experiment (non-patent literature 3).
- Patent Document 6 contains indium and gallium as oxides, and the In 2 O 3 phase having a bixbite type structure is the main crystal phase, and the ⁇ -Ga 2 O 3 type structure is included therein.
- the GaInO 3 phase, or the GaInO 3 phase and the (Ga, In) 2 O 3 phase are finely dispersed as crystal grains having an average grain size of 5 ⁇ m or less, and the gallium content is in the Ga / (In + Ga) atomic ratio. It has been proposed to use an oxide sintered body that is 10 atomic% or more and less than 35 atomic% as a target.
- Patent Document 7 when the gallium content is approximately 50 atomic% in terms of the Ga / (In + Ga) atomic ratio, GaInO 3 having a ⁇ -gallium oxide crystal structure similar to one of the Ga 2 O 3 forms is disclosed. It is described that a transparent conductive thin film of GaInO 3 can be obtained from a single-phase sintered body.
- Patent Document 7 is not a bixbite-type In 2 O 3 single-phase crystalline oxide thin film that is expected to have high carrier mobility from the oxide sintered body of Patent Document 6, but ⁇ -Ga. that oxide thin film crystalline containing GaInO 3 phases 2 O 3 type structure is formed strongly suggests.
- the present invention is excellent in etching property in the amorphous state without using a special process such as water-added sputtering film formation, and has a low carrier concentration and high carrier mobility in the crystalline state
- An object of the present invention is to provide a crystalline oxide semiconductor thin film composed only of an In 2 O 3 phase having a bixbite structure, which is suitable as a channel layer material of a thin film transistor.
- Another object of the present invention is to provide a thin film transistor using such an oxide semiconductor thin film as a channel layer.
- the present inventors formed an amorphous oxide thin film by sputtering using an oxide sintered body composed of indium, gallium, and inevitable impurities, and then annealed to form a crystalline oxide. Experiments to form semiconductor thin films were repeated. As a result, an oxide sintered body having a gallium content in a specific range is obtained from an In 2 O 3 phase having a bixbite type structure and a GaInO 3 phase having a ⁇ -Ga 2 O 3 type structure, or ⁇ -Ga 2 O. When a three- type GaInO 3 phase and a (Ga, In) 2 O 3 phase are used, an oxide thin film formed by sputtering under general conditions using this oxide sintered body as a target is microcrystalline.
- an amorphous film that does not contain any partial crystals, and that the oxide thin film that has been crystallized by annealing is composed only of the In 2 O 3 phase with a bixbyite structure.
- an amorphous oxide thin film obtained from an oxide sintered body composed of at least an In 2 O 3 phase and a GaInO 3 phase exhibits good etching properties, and a crystalline oxide semiconductor thin film after annealing treatment It was newly found out that it consists of a single phase In 2 O 3 with a bixbite structure that can be expected to have high carrier mobility.
- the oxide semiconductor thin film of the present invention is a crystalline oxide semiconductor thin film obtained from an oxide sintered body made of indium, gallium and inevitable impurities, and the oxide sintered body is an In 2 having a bixbyite structure.
- the crystalline oxide comprising an O 3 phase and a ⁇ -Ga 2 O 3 type GaInO 3 phase, or a ⁇ -Ga 2 O 3 type GaInO 3 phase and a (Ga, In) 2 O 3 phase.
- the semiconductor thin film has a gallium content of 0.09 or more and 0.45 or less in terms of the Ga / (In + Ga) atomic ratio, and the crystal phase is composed only of an In 2 O 3 phase having a bixbite structure.
- the oxide semiconductor thin film preferably has a gallium content of 0.10 or more and 0.30 or less in a Ga / (In + Ga) atomic ratio.
- the oxide semiconductor thin film preferably has a carrier concentration of 5.0 ⁇ 10 17 cm ⁇ 3 or less, and more preferably has a carrier mobility of 10 cm 2 V ⁇ 1 sec ⁇ 1 or more.
- the oxide semiconductor thin film preferably has a crystallization temperature of 225 ° C. or higher before the amorphous semiconductor film is crystallized by annealing.
- the thin film transistor of the present invention is a thin film transistor including a source electrode, a drain electrode, a gate electrode, a channel layer, and a gate insulating film, wherein the channel layer is constituted by the oxide semiconductor thin film.
- Such a thin film transistor can be applied to various display devices.
- an etching property is excellent in an amorphous state without using a special process such as water-added sputtering film formation, and a low carrier concentration and a high carrier mobility are present in a crystalline state. and, suitable as the material of the channel layer of a thin film transistor, it is possible to provide an oxide semiconductor thin film crystalline consisting only in 2 O 3 phase bixbite type structure. Further, according to the present invention, a thin film transistor using such an oxide semiconductor thin film as a channel layer can be provided.
- FIG. 1 is a schematic cross-sectional view of a TFT element of the present invention.
- the inventors of the present invention have excellent etching properties in an amorphous state, and have a low carrier concentration and a high carrier mobility in a crystalline state, and are crystalline oxides that are suitable as channel layer materials for thin film transistors. Research on semiconductor thin films was repeated.
- This oxide semiconductor thin film is highly amorphous and exhibits excellent etching properties before annealing.
- the present invention has been completed based on these findings.
- the oxide semiconductor thin film of the present invention is a crystalline oxide semiconductor obtained from an oxide sintered body made of indium, gallium, and inevitable impurities, and the oxide sintered body is a bixbyite type and in 2 O 3 phase structure, beta-Ga 2 O 3 -type structure GaInO 3 phase, or beta-Ga 2 O 3 -type structure GaInO 3 phase and (Ga, an in) consists 2 O 3 phase, gallium content is 0.09 to 0.45 Ga / (in + Ga) atomic ratio, characterized in that the crystalline phase is constituted by only in 2 O 3 phase bixbite type structure.
- the oxide semiconductor thin film of the present invention has a gallium content of 0.09 to 0.45, preferably 0.10 to 0.30, more preferably 0, in terms of the Ga / (In + Ga) atomic ratio. It is contained in the range of 10 to 0.15.
- the composition of the oxide sintered body used as the target is inherited by the oxide semiconductor thin film.
- the content of gallium is controlled in the range of 0.09 to 0.45 in terms of Ga / (In + Ga) atomic ratio, and this oxide sintering
- the body structure has a bixbite type In 2 O 3 phase as a main crystal phase, and includes a ⁇ -Ga 2 O 3 type GaInO 3 phase or a ⁇ -Ga 2 O 3 type GaInO structure.
- 3 phase and (Ga, in) 2 O 3 phase can be obtained by finely dispersed as less grain average particle size 5 [mu] m.
- annealing the amorphous oxide thin film oxygen vacancies in the thin film can be sufficiently eliminated by gallium having a high oxygen affinity, and the amorphous oxide thin film is 5.0 ⁇ 10 17 cm ⁇ 3 or less.
- a crystalline oxide semiconductor thin film having a low carrier concentration and a high carrier mobility of 10 cm 2 V ⁇ 1 sec ⁇ 1 or higher can be obtained.
- the oxide sintered body used as the target is composed only of the In 2 O 3 phase having a bixbite structure, so that sputtering film formation is performed. It becomes impossible to form an amorphous film having good wet etching property, which is necessary for patterning a later oxide semiconductor thin film into a desired shape. Further, since the gallium content is too small, oxygen vacancies cannot be sufficiently eliminated, and in the finally obtained crystalline oxide semiconductor thin film, the carrier concentration is 5.0 ⁇ 10 17 cm ⁇ 3 or less. It becomes difficult to do.
- the inevitable impurities mean a small amount of impurities that exist in the raw material powder or are inevitably mixed in the manufacturing process. It is necessary to control the content of such inevitable impurities to be 100 mass ppm or less. When an unavoidable impurity, particularly a tetravalent element such as tin, is included beyond this range, it becomes difficult to control the carrier concentration of the obtained crystalline oxide semiconductor thin film to 5 ⁇ 10 17 cm ⁇ 3 or less. .
- the gallium content is set to the Ga / (In + Ga) atomic ratio. And more preferably 0.15 to 0.20 or less.
- the oxide semiconductor thin film of the present invention is formed at room temperature or below the crystallization temperature with the oxide sintered body having the above-described crystal structure as a target, it is highly amorphous before annealing. Therefore, fine crystals that cause residues in wet etching are not generated, or a part of the thin film is not crystallized.
- an amorphous oxide thin film is measured by X-ray diffraction, an In 2 O 3 phase having a bixbite structure, a GaInO 3 phase having a ⁇ -Ga 2 O 3 structure, and (Ga, In) 2 Diffraction peaks of any crystalline phase including the O 3 phase are not detected.
- an oxide thin film obtained by forming a film using an oxide sintered body composed only of an In 2 O 3 phase as a target has microcrystals in the thin film or a thin film A part of is crystallized. For this reason, when X-ray diffraction measurement is performed, it can be seen that a diffraction peak derived from the In 2 O 3 phase or the like is detected, although only slightly.
- the oxide semiconductor thin film of the present invention is characterized by being composed only of an In 2 O 3 phase having a bixbite type structure after annealing under specific conditions.
- the fact that it is composed only of an In 2 O 3 phase having a bixbite structure means that a diffraction peak derived from the In 2 O 3 phase is detected in X-ray diffraction measurement, and diffraction derived from other crystal phases. It means that no peak is detected.
- the oxide semiconductor thin film of the present invention has high crystallinity with reduced oxygen deficiency due to the above-described action of gallium. Therefore, a low carrier concentration of 5.0 ⁇ 10 17 cm ⁇ 3 or less and a high carrier mobility of 10 cm 2 V ⁇ 1 sec ⁇ 1 or more can be achieved simultaneously.
- the oxide semiconductor thin film of the present invention does not require the addition of water molecules to the sputtering gas during film formation, the generation of particles is small and the flatness of the film is excellent.
- the film thickness of the oxide semiconductor thin film of the present invention is appropriately selected according to the application, but is generally preferably 10 nm to 500 nm, more preferably 20 nm to 300 nm. Preferably, the thickness is 30 nm to 100 nm. If the film thickness is less than 10 nm, sufficient crystallinity cannot be obtained, and high carrier mobility may not be realized. On the other hand, when the film thickness exceeds 500 nm, coloring of the oxide semiconductor thin film may be a problem.
- the amorphous oxide thin film before the annealing treatment preferably has a crystallization temperature of 225 ° C. or higher, and more preferably 250 ° C. or higher.
- the upper limit of the crystallization temperature is not particularly limited, but with reference to the upper limit of the annealing temperature described in Patent Document 8, there is no problem in TFT production as long as it is 700 ° C. or lower.
- Such a crystallization temperature can be easily realized by controlling the Ga / (In + Ga) atomic ratio in the above-described range.
- the crystallization temperature can be measured by high temperature X-ray diffraction measurement.
- the channel layer of a thin film transistor is generally formed by forming an amorphous film at a substrate temperature lower than the crystallization temperature, patterning the amorphous film in a desired shape by a wet etching method, etc. It is formed by annealing. Therefore, it is important that the amorphous oxide thin film after film formation is excellent in etching property. When the etching property is low, there arise problems that a desired pattern cannot be formed or an etching residue is generated.
- the oxide semiconductor thin film of the present invention since the oxide semiconductor thin film of the present invention has high amorphousness before annealing, it is excellent in etching property, for example, even a weak acid such as an aqueous solution containing oxalic acid or hydrochloric acid. Etching can be easily and rapidly performed without generating etching residues.
- an oxide semiconductor thin film of the present invention is etched using an etchant containing oxalic acid as a main component (for example, ITO-06N manufactured by Kanto Chemical Co., Inc.) whose liquid temperature is adjusted to room temperature to 50 ° C. before annealing.
- the etching rate can be preferably 15 nm / min or more, more preferably 20 nm / min or more, and further preferably 25 nm / min or more.
- the etching rate can be measured by, for example, the amount of change in film thickness before and after etching within a predetermined time.
- the etching rate is generally less than 10 nm / min, and etching residues are generated.
- the oxide semiconductor thin film of the present invention has a low carrier concentration of 5.0 ⁇ 10 17 cm ⁇ 3 or less, preferably 2.0 ⁇ 10 17 cm ⁇ 3 or less, more preferably 2.0 ⁇ 10 16 cm ⁇ 3 or less. Is provided. In order for the thin film transistor to operate stably, it is necessary to have a high on / off ratio of 1 ⁇ 10 6 or more (ratio of the resistance of the off state to the on state). When the carrier concentration of the semiconductor thin film is in the above-described range, such an on / off ratio can be easily achieved.
- the oxide semiconductor thin film of the present invention has a high carrier mobility of 10 cm 2 V ⁇ 1 sec ⁇ 1 or more, preferably 15 cm 2 V ⁇ 1 sec ⁇ 1 or more, more preferably 20 cm 2 V ⁇ 1 sec ⁇ 1 or more. Is provided. For this reason, the oxide semiconductor thin film of this invention can be used conveniently as a channel layer of the thin-film transistor for high-definition panels in which high-speed driving is requested
- the oxide semiconductor thin film of the present invention has an average transmittance in the visible region (wavelength: 400 nm to 800 nm) of 80% or more, preferably 85% or more, more preferably 90% or more. By controlling the average transmittance in the visible range to such a range, it can be used as a transparent thin film transistor (TTFT).
- TTFT transparent thin film transistor
- the method for producing an oxide semiconductor thin film of the present invention comprises indium, gallium, and unavoidable impurities, and the gallium content is 0.09 to 0.00 in terms of Ga / (In + Ga) atomic ratio.
- the main crystal phase is an In 2 O 3 phase having a bixbite structure, and includes a ⁇ -Ga 2 O 3 type GaInO 3 phase or a ⁇ -Ga 2 O 3 type structure.
- An amorphous oxide thin film is formed using an oxide sintered body in which GaInO 3 phase and (Ga, In) 2 O 3 phase are finely dispersed as crystal grains having an average grain size of 5 ⁇ m or less as a target; It is characterized by comprising a film forming step and an annealing step for obtaining a crystalline oxide semiconductor thin film by annealing the obtained amorphous oxide thin film.
- Target [Composition] The composition of the oxide sintered body used as the target is inherited by the obtained oxide semiconductor thin film. That is, the target is composed of indium, gallium, oxygen and inevitable impurities, and the gallium content is 0.09 to 0.45, preferably 0.10 to 0.30 in terms of the Ga / (In + Ga) atomic ratio. More preferably, it is necessary to use an oxide sintered body containing 0.10 to 0.20. Since the critical significance of the gallium content in the target is as described in “1. Oxide semiconductor thin film”, description thereof is omitted here.
- the main crystal phase is an In 2 O 3 phase having a bixbite structure, and a GaInO 3 phase having a ⁇ -Ga 2 O 3 type structure or a ⁇ -Ga 2 O 3 phase is included therein.
- An oxide sintered body in which a GaInO 3 phase and a (Ga, In) 2 O 3 phase having a mold structure are finely dispersed as crystal grains having an average particle diameter of 5 ⁇ m or less, more preferably 3 ⁇ m or less is used as a target.
- GaInO 3-phase ⁇ -Ga 2 O 3 -type structure of In 2 O 3 phase in the bixbyite structure and (Ga, In) 2 O 3 phase can be confirmed by X-ray diffraction analysis.
- the average crystal grain size of these crystal phases is determined by measuring the average value of the sintered oxide cross-section after polishing and etching using a scanning electron microscope-electron beam backscatter diffraction (SEM-EBSD). It can be obtained by calculation.
- the ⁇ -Ga 2 O 3 type GaInO 3 phase, or the ⁇ -Ga 2 O 3 type GaInO 3 phase and the (Ga, In) 2 O 3 phase in the oxide sintered body have a sintering temperature. Is formed by being controlled to 1200 ° C. or higher and 1550 ° C. or lower.
- the oxide sintered body used as a target preferably has a density of 6.3 g / cm 3 or more, preferably 6.7 g / cm 3 or more, more preferably 6.8 g / cm 3 or more.
- the oxide sintered body can have a sufficiently low resistance, and generation of nodules and arcing during film formation can be suppressed.
- the oxide semiconductor thin film of the present invention is not particularly limited except that the above-described oxide sintered body is used as a target, and a known process such as a sputtering method or an ion plating method is used.
- the film can be formed by a film method.
- a sputtering method particularly a direct current (DC) sputtering method that has a low thermal effect during film formation and enables high-speed film formation. For this reason, below, the case where it forms into a film by DC sputtering method is mentioned as an example, and the manufacturing method of the oxide semiconductor thin film of this invention is demonstrated.
- DC direct current
- a substrate on which the oxide semiconductor thin film of the present invention is formed a substrate for a semiconductor device such as a glass substrate or Si (silicon) can be used. Further, even if the substrate is other than these, a resin plate or a resin film can be used as long as it can withstand the temperature at the time of film formation or annealing.
- the oxide sintered body described above is processed into a predetermined shape and then joined (bonded) to a backing plate or a backing tube.
- the film formation conditions are not particularly limited and are appropriately selected according to the characteristics of the sputtering apparatus used, but generally the following film formation conditions can be employed.
- a sputtering target is set so that the distance between the substrates is 10 mm to 100 mm.
- sputtering gas is introduced, and the gas pressure is 0.1 Pa to 1 Pa, preferably 0.2 Pa to 0.00. Adjust to 8 Pa.
- DC power is applied so that the DC power with respect to the area of the target, that is, the DC power density is in the range of about 1 W / cm 2 to 5 W / cm 2 to generate DC plasma, and pre-sputtering is performed for 5 minutes or more. Sputtering is performed for 30 minutes, under the same conditions after correcting the substrate position as necessary.
- the substrate temperature needs to be adjusted so as to obtain an amorphous oxide thin film according to the composition of the oxide sintered body used as the target.
- the oxide sintered body having the above-described crystal structure is used as a target, an amorphous oxide thin film can be formed even when a film is formed at a substrate temperature exceeding 300 ° C. Is possible.
- the sputtering gas it is preferable to use a mixed gas composed of a rare gas and oxygen, particularly argon and oxygen.
- the DC power to be input is increased.
- a target made of an oxide sintered body containing a GaInO 3 phase having a ⁇ -Ga 2 O 3 type structure or a (Ga, In) 2 O 3 phase is used, these phases remain uncut and the nodule growth starts. There is a problem.
- the oxide sintered body used as a target in the present invention the average crystal grain size of these crystal phases is controlled to 5 ⁇ m or less and uniformly dispersed, so that the DC power to be input is increased. Even in this case, generation of nodules and arcing can be effectively suppressed.
- Fine processing step The obtained amorphous oxide thin film is finely processed by wet etching or dry etching using a photolithography technique as necessary to form a predetermined pattern. Even if such fine processing is not performed, it is possible to form a pattern by forming an oxide semiconductor thin film after performing masking in the film forming step. However, in order to form a fine pattern with high accuracy, it is preferable to use a photolithography technique.
- the oxide semiconductor thin film of the present invention has high amorphousness before annealing, it is excellent in wet etching property, can be uniformly etched over the entire thin film, and does not generate etching residues. .
- the oxide semiconductor thin film of the present invention can be processed easily and with high precision by wet etching using a weak acid before the annealing treatment.
- the etchant is not particularly limited and can be generally used as long as it is a weak acid, but an aqueous solution containing a weak acid mainly composed of oxalic acid or hydrochloric acid can be preferably used.
- ITO-06N manufactured by Kanto Chemical Co., Ltd. can be preferably used.
- the etching gas is not limited, and for example, sulfur hexafluoride, carbon tetrafluoride, trifluoromethane, xenon difluoride, or the like can be used.
- the crystalline oxide semiconductor thin film of the present invention is obtained by annealing the above-described amorphous oxide thin film in an oxidizing atmosphere.
- the oxidizing atmosphere is an atmosphere in which oxidation of the oxide semiconductor thin film is promoted during the annealing treatment, and indicates an atmosphere containing at least one of oxygen, ozone, water vapor, and nitrogen oxide. .
- the annealing process is not limited, and a known process can be applied as long as the amorphous oxide thin film can be sufficiently crystallized.
- the annealing can be performed under the following conditions.
- the annealing temperature is selected according to the composition of the oxide semiconductor thin film and needs to be at least the crystallization temperature or higher.
- the temperature is preferably 30 ° C. or higher, preferably 50 ° C. or higher, more preferably 60 ° C. or higher than the crystallization temperature.
- the upper limit of the annealing treatment is not particularly limited. However, as in the present invention, an amorphous material containing gallium in a Ga / (In + Ga) atomic ratio in the range of 0.09 to 0.45. When a target oxide thin film is used, it is preferably 700 ° C. or lower.
- the annealing time is preferably 1 minute to 120 minutes, and more preferably 5 minutes to 60 minutes.
- the treatment time is less than 1 minute, the amorphous oxide thin film cannot be sufficiently crystallized.
- the processing time exceeds 120 minutes, not only a further effect cannot be obtained, but also the productivity deteriorates.
- RTA Rapid Thermal Processing method
- a thin-film transistor (TFT element) of the present invention is a thin-film transistor comprising three electrodes, a source electrode, a drain electrode, and a gate electrode, and each element of a channel layer and a gate insulating film.
- the oxide semiconductor thin film of the invention is applied.
- the structure of such a thin film transistor is not particularly limited, for example, the thin film transistor having the structure shown in FIG. 1 can be exemplified.
- the thin film transistor of FIG. 1 is composed of an oxide semiconductor thin film and an Au / Ti laminated electrode of the present invention on a SiO 2 / Si substrate on which a SiO 2 film is formed by thermal oxidation. More specifically, the gate electrode 1 is a Si substrate, the gate insulating film 2 is a SiO 2 film, the channel layer 3 is an oxide semiconductor thin film of the present invention, and the source electrode 4 and the drain electrode 5 are Au / Ti laminated electrodes. Composed.
- the thin film transistor of FIG. 1 uses a SiO 2 / Si substrate, but the substrate is not limited to this, and a conventionally known substrate for an electronic device including a thin film transistor can be used.
- a glass substrate such as non-alkali glass or quartz glass can be used in addition to the SiO 2 / Si substrate or the Si substrate.
- various metal substrates, plastic substrates, non-transparent heat-resistant polymer film substrates such as polyimide can be used.
- the gate electrode 1 is composed of a Si substrate, but is not limited thereto.
- a metal thin film or alloy thin film of Mo, Al, Ta, Ti, Au, Pt or the like, or a conductive oxide thin film, a nitride thin film, or an oxynitride thin film of these metals can be used.
- Various known conductive polymer materials can also be used.
- a transparent conductive film such as ITO can be used.
- a transparent conductive film having the same metal composition as that of the oxide semiconductor thin film of the present invention can be used. Regardless of which material is used, the gate electrode 1 is required to have good conductivity.
- the specific resistance of the gate electrode 1 is preferably controlled in the range of 1 ⁇ 10 ⁇ 6 ⁇ ⁇ cm to 1 ⁇ 10 ⁇ 1 ⁇ ⁇ cm, and 1 ⁇ 10 ⁇ 6 ⁇ ⁇ cm to 1 More preferably, it is controlled within the range of ⁇ 10 ⁇ 3 ⁇ ⁇ cm.
- the specific resistance of the gate insulating film 2 is preferably in the range of 1 ⁇ 10 6 ⁇ ⁇ cm to 1 ⁇ 10 15 ⁇ ⁇ cm, and preferably 1 ⁇ 10 10 ⁇ ⁇ cm to 1 ⁇ 10 15 ⁇ ⁇ cm. Is more preferable.
- the specific resistance of the channel layer 3 is not particularly limited, 1 ⁇ 10 is preferably controlled to -1 ⁇ ⁇ cm ⁇ 1 ⁇ 10 6 ⁇ ⁇ cm, 1 ⁇ ⁇ cm ⁇ 1 ⁇ 10 3 ⁇ More preferably, it is controlled to cm.
- the generation amount of oxygen vacancies can be adjusted by selecting the film forming conditions in the sputtering method or the ion plating method and the annealing treatment conditions for crystallization. For this reason, the specific resistance of the channel layer 3 can be easily controlled within the above-described range.
- Source electrode 4 and the drain electrode 5 similarly to the gate electrode 1, a metal thin film or alloy thin film such as Mo, Al, Ta, Ti, Au, or Pt, or a conductive oxide thin film or nitride of these metals.
- a thin film or an oxynitride thin film can be used.
- Various known conductive polymer materials can also be used.
- a transparent conductive film such as ITO can be used.
- the specific resistance of the source electrode 4 and the drain electrode 4 is preferably controlled in the range of 1 ⁇ 10 ⁇ 6 ⁇ ⁇ cm to 10 ⁇ 1 ⁇ ⁇ cm, and 1 ⁇ 10 ⁇ 6 ⁇ ⁇ cm. More preferably, it is controlled in the range of ⁇ 1 ⁇ 10 ⁇ 3 ⁇ ⁇ cm.
- the thin-film transistor of this invention can be utilized suitably for display apparatuses, such as a liquid crystal display, an organic EL display, and a MEMS display.
- the channel layer 3 is a film forming step for forming an amorphous oxide thin film using the oxide sintered body of the present invention described above. And an annealing treatment step of crystallizing the amorphous oxide thin film by annealing in an oxidizing atmosphere.
- the thin film transistor of the present invention including such a channel layer 3 can be manufactured by combining the film forming process and the annealing process described above with some known methods.
- the manufacturing method of the thin-film transistor of this invention is not limited by the following description.
- a SiO 2 film is formed by thermal oxidation on the surface of a highly doped n-type Si wafer substrate to obtain a SiO 2 / Si substrate.
- an amorphous oxide thin film having a predetermined thickness is formed on the SiO 2 film of the substrate by a direct current magnetron sputtering method using the oxide sintered body of the present invention as a target (film formation). Process). At this time, it is necessary to form the film while keeping the substrate temperature lower than the crystallization temperature of the oxide semiconductor thin film.
- the conditions for this film forming step are the same as those described in “2. Method for manufacturing oxide semiconductor thin film”, and thus the description thereof is omitted here.
- patterning is performed by etching the obtained amorphous oxide thin film using a photolithography technique or the like. Patterning can also be performed by forming an amorphous oxide thin film after masking. However, in order to form a fine pattern, it is advantageous to use a photolithography technique or the like.
- the amorphous oxide thin film is annealed at a temperature equal to or higher than the crystallization temperature to obtain a channel layer made of a crystalline oxide semiconductor thin film having a predetermined channel length and channel width.
- the conditions for the annealing treatment at this time are also the same as the conditions described in “2. Method for manufacturing oxide semiconductor thin film”, and thus the description thereof is omitted here.
- a Ti thin film with a thickness of 5 nm and an Au thin film with a thickness of 100 nm are laminated in this order on the channel layer to form a source electrode and a drain electrode.
- Patterning at this time can also be performed by masking or etching using a photolithography technique or the like, as in the case of the channel layer.
- the thin film transistor of the present invention can be obtained.
- the thin film transistor of the present invention is not limited to the bottom gate / top contact type shown in FIG. 1, and other forms such as a bottom gate / bottom contact, a top gate / bottom contact, and a top gate / top contact are possible. You can also choose.
- Example 1 [Oxide sintered body] As the raw material powder, indium oxide powder and gallium oxide powder adjusted to have an average particle size of 1 ⁇ m or less were prepared. These raw material powders were prepared so that the ratio of gallium oxide powder was 0.10 in terms of the Ga / (In + Ga) atomic number ratio, put into a resin pot with water and slurried, and mixed using a wet ball mill. . At this time, using a hard ZrO 2 ball, the mixing time was 18 hours.
- the slurry was taken out from the resin pot, filtered and dried, and then spray-dried using a spray dryer to obtain granulated powder.
- the granulated powder was filled into a rubber mold and subjected to pressure molding at a pressure of 300 / cm 2 by a cold isostatic press to obtain a disk-shaped molded body.
- this compact was placed in a sintering furnace, oxygen was introduced at a rate of 5 L / min per 0.1 m 3 in the furnace volume, and the sintering temperature was set to 1400 ° C. to sinter for 20 hours. A sintered body was obtained. At this time, the temperature was raised from room temperature to the sintering temperature at 1 ° C./min. Further, after the sintering, the introduction of oxygen was stopped, and the temperature was lowered from the sintering temperature to 1000 ° C. at 10 ° C./min.
- the oxide sintered body thus obtained was processed into a size of 152 mm in diameter and 5 mm in thickness, and then the sputtering surface was polished with a cup grindstone so that the maximum height Rz was 3.0 ⁇ m or less. did. Subsequently, the processed oxide sintered body was bonded to a backing plate made of oxygen-free copper using metallic indium to obtain a sputtering target.
- this oxide sintered body is Ga / (In + Ga) in the same manner as the raw material powder. ) It was confirmed that gallium was contained in an atomic ratio of 0.10, and the content of inevitable impurities was 100 ppm by mass or less.
- this oxide sintered body was found to have an In 2 O 3 phase having a Bigsbite structure and a ⁇ -Ga 2 O 3 structure. It was confirmed that it was composed of two GaInO 3 phases. As a result of observation by SEM-EBSD (Carl Zeiss, ULTRA55, and HKL, Channel 5), it was confirmed that the average crystal grain size of the GaInO 3 phase was 2.8 ⁇ m.
- this oxide sintered body was confirmed to be 7.00 g / cm 3 by Archimedes method.
- the obtained sputtering target was attached to the cathode for a nonmagnetic target of a DC magnetron sputtering apparatus (SPK-503, manufactured by Tokki) equipped with a DC power supply having no arcing suppression function.
- a nonmagnetic target of a DC magnetron sputtering apparatus SPK-503, manufactured by Tokki
- a DC power supply having no arcing suppression function.
- an alkali-free glass substrate (Corning # 7059) was used, and the target-substrate distance was fixed to 60 mm.
- a mixed gas of argon and oxygen was introduced so that the ratio of oxygen was 1.5%, and the gas pressure was adjusted to 0.6 Pa.
- direct current power of 300 W (1.64 W / cm 2 ) is applied to generate direct current plasma, and after pre-sputtering for 10 minutes, a substrate is placed immediately above the sputtering target, that is, at a stationary facing position, at room temperature.
- An oxide thin film was formed by performing sputtering.
- a surface shape measuring device manufactured by Tencor, Alpha-Step IQ
- this oxide thin film was found to be gallium having a Ga / (In + Ga) atomic ratio of 0.10, similar to the oxide sintered body. It was confirmed that no tin was contained.
- a diffraction pattern includes an In 2 O 3 phase having a bixbite structure, a GaInO 3 phase having a ⁇ -Ga 2 O 3 structure, and a (Ga, In) 2 O 3 phase. It was confirmed that none of the peaks were present. That is, this oxide thin film was confirmed to have high amorphousness. On the other hand, as a result of performing high temperature X-ray diffraction measurement on a separately prepared sample, it was confirmed that the crystallization temperature of this oxide half thin film was 245 ° C.
- a wet etching test was performed on a separately prepared sample. Specifically, the sample was immersed for 1 minute in an etchant (Kanto Chemical Co., Ltd., ITO-06N) heated to 30 ° C. As a result, it was confirmed that the oxide thin film can be etched without any problem and no etching residue is generated. Furthermore, the etching rate was confirmed to be 32 nm / min by obtaining the film thickness difference before and after etching.
- the oxide semiconductor thin film was crystallized and was a single phase of indium oxide having a bixbyite structure having In 2 O 3 (222) as a main peak. It was.
- the carrier concentration and specific resistance of the oxide semiconductor thin film were measured using a Hall effect measuring device (ResiTest 8400, manufactured by Toyo Technica Co., Ltd.), and the carrier mobility was calculated from these results. As a result, it was confirmed that the carrier concentration of the oxide semiconductor thin film was 2.0 ⁇ 10 17 cm ⁇ 3 and the carrier mobility was 22.5 cm 2 V ⁇ 1 sec ⁇ 1 .
- Example 2 Except that the manufacturing conditions of the oxide sintered body and oxide semiconductor thin film are as shown in Table 1 and Table 2, the oxide sintered body, the amorphous oxide thin film, A crystalline oxide semiconductor thin film was obtained. Each was evaluated in the same manner as in Example 1. These results are shown in Tables 1 and 2.
- an amorphous oxide thin film was formed and evaluated in the same manner as in Example 1.
- the amorphous oxide thin film of Comparative Example 1 has a slight amount of microcrystals derived from the In 2 O 3 phase having a bixbite structure in the thin film. Confirmed to do. Further, when the surface was visually observed after the wet etching test, it was confirmed that an etching residue was generated and the etching was uneven.
- a crystalline oxide semiconductor thin film was obtained and evaluated in the same manner as in Example 1 except that the annealing temperature was 300 ° C. Note that the crystalline oxide semiconductor thin film of Comparative Example 1 was measured using an X-ray diffractometer, and as a result, the oxide semiconductor thin film had a main crystal phase of the In 2 O 3 phase having a bixbite structure. Was confirmed. These results are shown in Tables 1 and 2.
- indium oxide powder having an average particle diameter of about 1 ⁇ m and gallium oxide powder having an average particle diameter of about 1 ⁇ m are used as raw material powders, and the sintering temperature is set to 1600 ° C. to produce an oxide sintered body And evaluated.
- an amorphous oxide thin film was formed and evaluated in the same manner as in Example 1.
- the amorphous oxide thin film of Comparative Example 4 has microcrystals derived from the In 2 O 3 phase having a bixbite structure in the thin film. was confirmed. Further, when the surface was visually observed after the wet etching test, it was confirmed that an etching residue was generated and the etching was uneven.
- Example 6 (Comparative Example 6) Except that the Ga / (In + Ga) atomic ratio in the raw material powder was adjusted to 0.50 and the manufacturing conditions such as the substrate temperature during film formation were as shown in Tables 1 and 2, the same as Example 1 Thus, an oxide sintered body, an amorphous oxide thin film, and a crystalline oxide semiconductor thin film were obtained. Each was evaluated in the same manner as in Example 1. These results are shown in Tables 1 and 2.
- the oxide semiconductor thin films of Examples 1 to 11 belonging to the technical scope of the present invention are bixbite type In 2 O 3 phases and ⁇ -Ga 2 O 3 type GaInO 3 structures. Since a film is formed using an oxide sintered body comprising a phase or a ⁇ -Ga 2 O 3 type GaInO 3 phase and a (Ga, In) 2 O 3 phase as a target, before annealing, It was confirmed that the amorphous property was high and the etching property was excellent.
- the annealing treatment is composed only of the In 2 O 3 phase having a bixbite structure, and has a carrier concentration of 5.0 ⁇ 10 17 cm ⁇ 3 or less and a carrier transfer of 10 cm 2 V ⁇ 1 sec ⁇ 1 or more. It was confirmed that the degree was achieved at the same time.
- the film forming conditions and the annealing conditions are set appropriately. It was confirmed that a carrier concentration of 0 ⁇ 10 17 cm ⁇ 3 or less and a carrier mobility of 15 cm 2 V ⁇ 1 sec ⁇ 1 or more were achieved at the same time.
- the carrier mobility is less than 15 cm 2 V ⁇ 1 sec ⁇ 1 . It was confirmed that the carrier concentration can be reduced to 2.0 ⁇ 10 16 cm ⁇ 3 or less by setting the film forming condition and the annealing condition.
- the oxide sintered bodies of Comparative Examples 1 to 3 manufactured with reference to Patent Document 2 have a gallium content of 0.08 in terms of the Ga / (In + Ga) atomic ratio. it was confirmed to be constituted by only in 2 O 3 phase byte structure.
- the oxide semiconductor thin film obtained by forming a film using these oxide sintered bodies as a target is amorphous before annealing, but has microcrystals and is sufficiently etched. It was confirmed that it was not possible. Note that the crystallization temperatures of these amorphous oxide thin films were all less than 225 ° C.
- the crystalline oxide semiconductor thin film obtained by annealing these oxide semiconductor thin films has a carrier mobility of 10 cm 2 V ⁇ 1 sec ⁇ 1 or more, the carrier concentration is 5.0 ⁇ . It was confirmed that it exceeded 10 17 cm ⁇ 3 .
- the oxide sintered bodies of Comparative Examples 4 and 5 produced with reference to Patent Document 3 are composed only of In 2 O 3 phases having a bixbite structure, as in Comparative Examples 1 to 3.
- the oxide semiconductor thin film obtained by forming a film using these oxide sintered bodies as a target is amorphous before annealing, but has microcrystals and is sufficiently etched. It was confirmed that it was not possible. Note that the crystallization temperatures of these amorphous oxide thin films were all less than 225 ° C.
- Comparative Example 6 is an example in which the Ga / (In + Ga) atomic ratio is 0.50, and the oxide sintered body obtained in this comparative example has an In 2 O 3 phase with a big Svit type structure, It was confirmed that the film was composed of three phases of a ⁇ -Ga 2 O 3 type GaInO 3 phase and a (Ga, In) 2 O 3 phase. Moreover, it was confirmed that the oxide semiconductor thin film obtained by forming a film using this oxide sintered body as a target has high amorphousness and excellent etching properties before the annealing treatment. However, the crystallization temperature of this amorphous oxide thin film was as high as 600 ° C.
- the crystalline oxide semiconductor thin film obtained by annealing the oxide semiconductor thin film has two types of In 2 O 3 phase having a Big Svit type structure and GaInO 3 phase having a ⁇ -Ga 2 O 3 type structure. It was confirmed that both the carrier concentration and the carrier density were below the measurement limit.
- the obtained oxide semiconductor thin film was subjected to patterning by etching under the same conditions as the wet etching test of Example 1.
- the etched oxide semiconductor thin film was crystallized by annealing for 30 minutes at 325 ° C. under the same conditions as in Example 1, that is, in the air.
- the Si substrate, the SiO 2 film, and the crystalline oxide semiconductor thin film were used as a gate electrode, a gate insulating film, and a channel layer, respectively.
- a source film and a drain electrode made of an Au / Ti laminated film are formed by forming a Ti film having a thickness of 5 nm and an Au film having a thickness of 100 nm in this order by DC magnetron sputtering. A film was formed. At this time, patterning was performed using a metal mask, and a source electrode and a drain electrode were formed so as to have a channel length of 100 ⁇ m and a channel width of 450 ⁇ m, thereby obtaining a thin film transistor having the configuration shown in FIG. Note that the film formation conditions for the source electrode and the drain electrode were the same as those for the oxide semiconductor thin film except that the sputtering gas was argon only and the DC power was changed to 50 W.
- the operating characteristics of the obtained thin film transistor were analyzed using a semiconductor parameter analyzer (420CS manufactured by Keithley). As a result, operation characteristics as a thin film transistor were confirmed. Further, it was confirmed that this thin film transistor had a good value with a field effect mobility of 27.9 cm 2 V ⁇ 1 sec ⁇ 1 , an on / off ratio of 2 ⁇ 10 8 , and an S value of 1.0.
- a thin film transistor was fabricated in the same manner as in Example 12 except that the film was crystallized by annealing for 30 minutes.
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thin Film Transistor (AREA)
- Nonlinear Science (AREA)
- Physical Vapour Deposition (AREA)
- Mathematical Physics (AREA)
- Optics & Photonics (AREA)
Abstract
Description
本発明の酸化物半導体薄膜は、インジウム、ガリウム、および不可避不純物からなる酸化物焼結体から得られる結晶質の酸化物半導体であって、前記酸化物焼結体がビックスバイト型構造のIn2O3相と、β-Ga2O3型構造のGaInO3相、あるいはβ-Ga2O3型構造のGaInO3相および(Ga,In)2O3相からなり、ガリウムの含有量が、Ga/(In+Ga)原子数比で0.09~0.45であり、結晶相がビックスバイト型構造のIn2O3相のみによって構成されることを特徴とする。
本発明の酸化物半導体薄膜は、ガリウム含有量を、Ga/(In+Ga)原子数比で、0.09~0.45、好ましくは0.10~0.30、より好ましくは0.10~0.15の範囲で含有することを特徴とする。本発明では、成膜条件を適切に制御する限り、ターゲットとして使用する酸化物焼結体の組成は、酸化物半導体薄膜に引き継がれることとなる。
[アニール処理前]
本発明の酸化物半導体薄膜は、上述した結晶構造を備える酸化物焼結体をターゲットとして、室温ないしは結晶化温度以下で成膜されるものであるため、アニール処理前においては、高い非晶質性を有し、ウエットエッチングにおいて残渣の原因となる微結晶が生成しない、あるいは薄膜の一部が結晶化することがない。このような非晶質の酸化物薄膜をX線回折測定した場合には、ビックスバイト型構造のIn2O3相、β-Ga2O3型構造のGaInO3相および(Ga,In)2O3相を含めた、あらゆる結晶相の回折ピークが検出されない。
本発明の酸化物半導体薄膜は、特定条件のアニール処理後に、ビックスバイト型構造のIn2O3相のみによって構成されていることを特徴とする。ここで、ビックスバイト型構造のIn2O3相のみによって構成されるとは、X線回折測定において、In2O3相に由来する回折ピークが検出され、それ以外の結晶相に由来する回折ピークが検出されないことを意味する。
本発明の酸化物半導体薄膜の膜厚は、その用途に応じて適宜選択されるものであるが、概ね、10nm~500nmとすることが好ましく、20nm~300nmとすることがより好ましく、30nm~100nmとすることがさらに好ましい。膜厚が10nm未満では、十分な結晶性が得られず、高いキャリア移動度を実現することができない場合がある。一方、膜厚が500nmを超えると、酸化物半導体薄膜の着色が問題になる場合がある。
[結晶化温度]
アニール処理前の非晶質の酸化物薄膜は、結晶化温度が225℃以上であることが好ましく、250℃以上であることがより好ましい。結晶化温度がこのような範囲にあることにより、成膜時に、酸化物薄膜の一部が結晶化したり、薄膜中に微結晶が生成したりすることを回避でき、良好なエッチング性を実現することができる。なお、結晶化温度の上限は特に制限されないが、特許文献8に記載のアニール温度上限を参考に、700℃以下であればTFT製造に支障はない。TFT製造ラインにおけるスループット向上や熱負荷の軽減を考慮すれば、500℃以下がより好ましい。このような結晶化温度は、Ga/(In+Ga)原子数比を上述した範囲に制御することにより、容易に実現することができる。また、結晶化温度は、高温X線回折測定により測定することができる。
薄膜トランジスタのチャネル層は、一般に、結晶化温度よりも低い基板温度で非晶質膜を成膜し、ウエットエッチング法などにより所望の形状にパターニングした後、この非晶質膜を、酸化雰囲気中でアニール処理することにより形成される。したがって、成膜後の非晶質の酸化物薄膜は、エッチング性に優れていることが重要である。エッチング性が低いと、所望のパターンを形成することができなかったり、エッチング残渣が発生したりするなどの問題が生じる。
本発明の酸化物半導体薄膜は、5.0×1017cm-3以下、好ましくは2.0×1017cm-3以下、より好ましくは2.0×1016cm-3以下の低いキャリア濃度を備える。薄膜トランジスタが安定して動作するためには、1×106以上の高いоn/off比(on状態に対するoff状態の抵抗の比)を備えることが必要とされるが、チャネル層を構成する酸化物半導体薄膜のキャリア濃度が上述した範囲にある場合、このようなоn/off比を容易に達成することができる。
本発明の酸化物半導体薄膜は、可視域(波長:400nm~800nm)における平均透過率が80%以上、好ましくは85%以上、より好ましくは90%以上である。可視域における平均透過率をこのような範囲に制御することにより、透明薄膜トランジスタ(Transparent Thin Film Transistor:TTFT)としても使用することが可能となる。
本発明の酸化物半導体薄膜の製造方法は、インジウム、ガリウム、および不可避不純物からなり、ガリウムの含有量が、Ga/(In+Ga)原子数比で0.09~0.45の範囲にあり、ビックスバイト型構造のIn2O3相を主たる結晶相とし、その中に、β-Ga2O3型構造のGaInO3相、または、β-Ga2O3型構造のGaInO3相および(Ga,In)2O3相が平均粒径5μm以下の結晶粒として微細に分散している酸化物焼結体をターゲットとして、非晶質の酸化物薄膜を成膜する、成膜工程と、得られた非晶質の酸化物薄膜をアニール処理することにより、結晶質の酸化物半導体薄膜を得る、アニール処理工程とを備えることを特徴とする。
[組成]
ターゲットとして使用する酸化物焼結体の組成は、得られる酸化物半導体薄膜に引き継がれることとなる。すなわち、ターゲットとしては、インジウム、ガリウム、酸素および不可避不純物からなり、ガリウムの含有量を、Ga/(In+Ga)原子数比で0.09~0.45、好ましくは0.10~0.30、より好ましくは0.10~0.20の範囲で含有する酸化物焼結体を使用することが必要となる。なお、ターゲット中のガリウムの含有量の臨界的意義は、「1.酸化物半導体薄膜」で説明した通りであるため、ここでの説明は省略する。
上述したように、ビックスバイト型構造のIn2O3相のみからなる酸化物焼結体をターゲットとして、スパッタリング法などにより成膜した場合には、基板温度を室温とした場合であっても、微結晶が生成する、あるいは膜の一部が結晶化するため、非晶質性の高い酸化物半導体薄膜を得ることはできない。
ターゲットとして使用する酸化物焼結体は、密度が6.3g/cm3以上であることが好ましく、6.7g/cm3以上、より好ましくは6.8g/cm3以上であることが好ましい。これにより、酸化物焼結体を十分に低抵抗なものとすることができ、成膜時におけるノジュールやアーキングの発生を抑制することが可能となる。
本発明の酸化物半導体薄膜は、ターゲットとして、上述した酸化物焼結体を用いること以外は特に制限されることはなく、スパッタリング法やイオンプレーティング法などの公知の成膜方法で成膜することができる。ただし、工業規模の生産を前提とした場合、スパッタリング法、特に、成膜時の熱影響が少なく、高速成膜が可能な直流(DC)スパッタリング法を利用することが好ましい。このため、以下では、DCスパッタリング法により成膜する場合を例に挙げて、本発明の酸化物半導体薄膜の製造方法について説明する。
本発明の酸化物半導体薄膜を成膜する基板としては、ガラス基板やSi(ケイ素)などの半導体デバイス用基板を用いることができる。また、これら以外の基板であっても、成膜時あるいはアニール処理時の温度に耐え得るものであれば、樹脂板や樹脂フィルムなども使用することができる。
スパッタリングターゲットとしては、上述した酸化物焼結体を所定の形状に加工した後、バッキングプレートやバッキングチューブに接合(ボンディング)したものを使用する。
成膜条件は、特に制限されることはなく、使用するスパッタリング装置の特性などに応じて適宜選択されるものであるが、概ね、以下のような成膜条件を採用することができる。
得られた非晶質の酸化物薄膜は、必要に応じて、フォトリソグラフィ技術を利用したウエットエッチングやドライエッチングによって微細加工し、所定のパターンを形成する。このような微細加工を行わなくても、成膜工程において、マスキングをした上で、酸化物半導体薄膜を成膜することにより、パターンを形成することは可能である。しかしながら、微細なパターンを高精度で形成するためには、フォトリソグラフィ技術を利用することが好ましい。
本発明の結晶質の酸化物半導体薄膜は、上述した非晶質の酸化物薄膜を、酸化性雰囲気でアニール処理することによって得られる。ここで、酸化性雰囲気とは、アニール処理中に、酸化物半導体薄膜の酸化が促進される雰囲気であり、酸素、オゾン、水蒸気、および窒素酸化物のいずれかを少なくとも1種を含む雰囲気を指す。
(1)構成
本発明の薄膜トランジスタ(TFT素子)は、ソース電極、ドレイン電極およびゲート電極の3つの電極、ならびに、チャネル層およびゲート絶縁膜の各要素を備える薄膜トランジスタであって、チャネル層に本発明の酸化物半導体薄膜を適用していることを特徴とする。このような薄膜トランジスタの構成は、特に制限されるものではないが、たとえば、図1に示した構成の薄膜トランジスタを例示することができる。
図1の薄膜トランジスタでは、SiO2/Si基板を用いているが、基板はこれに限定されるものではなく、従来から薄膜トランジスタを含む電子デバイスの基板として公知のものを用いることができる。たとえば、SiO2/Si基板やSi基板のほかに、無アルカリガラス、石英ガラスなどのガラス基板を用いることができる。また、各種金属基板やプラスチック基板、ポリイミドなどの透明でない耐熱性高分子フィルム基板などを用いることもできる。
図1の薄膜トランジスタでは、ゲート電極1をSi基板により構成しているが、これに制限されることはない。たとえば、Mo、Al、Ta、Ti、Au、Ptなどの金属薄膜または合金薄膜、あるいは、これらの金属の導電性酸化物薄膜、窒化物薄膜または酸窒化物薄膜を用いることができる。また、公知の各種導電性高分子材料を用いることもできる。透明薄膜トランジスタの場合には、ITOなどの透明導電膜を用いることができる。さらには、本発明の酸化物半導体薄膜と同様の金属組成を有する透明導電膜を用いることもできる。いずれの材料を用いる場合であっても、ゲート電極1には、良好な導電性が求められる。具体的には、ゲート電極1の比抵抗は、1×10-6Ω・cm~1×10-1Ω・cmの範囲に制御されることが好ましく、1×10-6Ω・cm~1×10-3Ω・cmの範囲に制御されることがより好ましい。
また、ゲート絶縁膜2は、SiO2、Y2O3、Ta2O5、Hf酸化物などの金属酸化物薄膜やSiNxなどの金属窒化物薄膜、あるいは、ポリイミドをはじめとする絶縁性の高分子材料などの公知の材料を用いることができる。ゲート絶縁膜2の比抵抗は、1×106Ω・cm~1×1015Ω・cmの範囲であることが好ましく、1×1010Ω・cm~1×1015Ω・cmであることがより好ましい。
チャネル層3の比抵抗は、特に制限されるものではないが、1×10-1Ω・cm~1×106Ω・cmに制御されることが好ましく、1Ω・cm~1×103Ω・cmに制御されることがより好ましい。本発明の酸化物半導体薄膜では、スパッタリング法またはイオンプレーティング法における成膜条件や結晶化する際のアニール処理の条件の選択によって、酸素欠損の生成量を調整することができる。このため、チャネル層3の比抵抗を、上述した範囲に容易に制御することができる。
ソース電極4およびドレイン電極5としては、ゲート電極1と同様に、Mo、Al、Ta、Ti、Au、Ptなどの金属薄膜または合金薄膜、あるいは、これらの金属の導電性酸化物薄膜、窒化物薄膜または酸窒化物薄膜を用いることができる。また、公知の各種導電性高分子材料を用いることもできる。透明薄膜トランジスタの場合には、ITOなどの透明導電膜を用いることができる。さらに、必要に応じて、これらの薄膜を積層化したものを用いてもよい。いずれの材料を用いる場合であっても、ソース電極4やドレイン電極5には、良好な導電性が求められる。具体的には、ソース電極4およびドレイン電極4の比抵抗は、1×10-6Ω・cm~10-1Ω・cmの範囲に制御されることが好ましく、1×10-6Ω・cm~1×10-3Ω・cmの範囲に制御されることがより好ましい。
本発明の薄膜トランジスタは、その用途が制限されることはないが、液晶ディスプレイ、有機ELディスプレイ、MEMSディスプレイなどの表示装置に好適に利用することができる。
本発明の薄膜トランジスタの構成要素のうち、チャネル層3は、上述した本発明の酸化物焼結体を用いて、非晶質の酸化物薄膜を成膜する成膜工程と、この非晶質の酸化物薄膜を、酸化性雰囲気でアニール処理することにより結晶化するアニール処理工程とを備える製造方法によって形成することができる。
[酸化物焼結体]
原料粉末として、平均粒径が1μm以下となるように調整した酸化インジウム粉末および酸化ガリウム粉末を用意した。これらの原料粉末を、酸化ガリウム粉末の比率が、Ga/(In+Ga)原子数比で0.10となるように調合し、水とともに樹脂製ポットに入れてスラリー化し、湿式ボールミルを用いて混合した。この際、硬質ZrO2ボールを用いて、混合時間を18時間とした。
アーキング抑制機能のない直流電源を装備した直流マグネトロンスパッタリング装置(トッキ製、SPK-503)の非磁性体ターゲット用カソードに、得られたスパッタリングターゲットを取り付けた。基板には、無アルカリのガラス基板(コーニング♯7059)を用い、ターゲット-基板間距離を60mmに固定した。5×10-5Pa以下まで真空排気後、アルゴンと酸素の混合ガスを酸素の比率が1.5%になるように導入し、ガス圧を0.6Paに調整した。
上述のようにして得られた非晶質の酸化物薄膜を、大気中、325℃で、30分間アニール処理するいことのより、酸化物半導体薄膜を得た。
酸化物焼結体および酸化物半導体薄膜の製造条件を表1および表2に示すようにしたこと以外は、実施例1と同様にして、酸化物焼結体、非晶質の酸化物薄膜および結晶質の酸化物半導体薄膜を得た。また、それぞれについて、実施例1と同様にして評価を行った。これらの結果を表1および表2に示す。
特許文献2を参考にして、原料粉末として、平均粒径が1.2μmの酸化インジウム粉末と、平均粒径が1.5μmの酸化ガリウム粉末を用い、ガリウムの含有量をGa/(In+Ga)原子数比で0.08に調整し、焼結温度を1400℃として、酸化物焼結体を作製し、その評価を行った。
アニール処理温度を表2に示すようにしたこと以外は、比較例1と同様にして、酸化物焼結体、非晶質の酸化物薄膜および結晶質の酸化物半導体薄膜を得た。また、それぞれについて、実施例1と同様にして評価を行った。これらの結果を表1および表2に示す。
特許文献3を参考にして、原料粉末として、平均粒径約1μmの酸化インジウム粉末と、平均粒径約1μmの酸化ガリウム粉末を用い、焼結温度を1600℃として、酸化物焼結体を作製し、その評価を行った。
原料粉末におけるGa/(In+Ga)原子数比を、表1に示すように、0.12に調整したこと以外は、比較例4と同様に特許文献3を参考にして、酸化物焼結体、非晶質の酸化物薄膜および結晶質の酸化物半導体薄膜を得た。また、それぞれについて、実施例1と同様にして評価を行った。これらの結果を表1および表2に示す。
原料粉末におけるGa/(In+Ga)原子数比を0.50に調整したことや成膜時の基板温度などの製造条件を表1および表2に示すようにしたこと以外は、実施例1と同様にして、酸化物焼結体、非晶質の酸化物薄膜および結晶質の酸化物半導体薄膜を得た。また、それぞれについて、実施例1と同様にして、評価を行った。これらの結果を表1および表2に示す。
表1および表2より、本発明の技術的範囲に属する実施例1~11の酸化物半導体薄膜は、ビックスバイト型構造のIn2O3相と、β-Ga2O3型構造のGaInO3相、あるいはβ-Ga2O3型構造のGaInO3相および(Ga,In)2O3相からなる酸化物焼結体をターゲットに用いて成膜されているため、アニール処理前においては、非晶質性が高く、エッチング性に優れていることが確認された。また、アニール処理後においては、ビックスバイト型構造のIn2O3相のみから構成され、5.0×1017cm-3以下のキャリア濃度と、10cm2V-1sec-1以上のキャリア移動度を同時に達成していることが確認された。特に、Ga/(In+Ga)原子数比が0.10~0.30の範囲にある実施例1、2および4~6では、成膜条件およびアニール条件を適切なものとすることで、2.0×1017cm-3以下のキャリア濃度と、15cm2V-1sec-1以上のキャリア移動度を同時に達成していることが確認された。また、Ga/(In+Ga)原子数比が0.15を超え0.20以下の範囲にある実施例8~10では、キャリア移動度が15cm2V-1sec-1未満になるものの、特定の成膜条件およびアニール条件とすることで、キャリア濃度を2.0×1016cm-3以下にまで低減させることが可能であることが確認された。
熱酸化によってSiO2膜が形成された、厚さ300nmのSi基板の表面に、実施例1で得られた酸化物焼結体(Ga/(In+Ga)原子数比=0.10)をターゲットとして、直流マグネトロンスパッタリング法により、厚さが50nmの酸化物半導体薄膜を室温成膜した。なお、この際のスパッタリング条件は、実施例1と同様にした。
実施例2で得られた酸化物焼結体(Ga/(In+Ga)原子数比=0.12)をターゲットとして使用したこと、および、エッチング後の酸化物半導体薄膜を、大気中、375℃で、30分間のアニール処理することで結晶化させたこと以外は、実施例12と同様にして、薄膜トランジスタを作製した。
実施例12および13では、薄膜トランジスタとしての動作特性が確認することができ、on/off比、電解効果移動度およびS値のいずれもが、良好な値を示していることが確認された。
2 ゲート絶縁膜
3 チャネル層
4 ソース電極
5 ドレイン電極
Claims (7)
- インジウムとガリウムと不可避不純物からなる酸化物焼結体から得られる結晶質の酸化物半導体薄膜であって、
前記酸化物焼結体がビックスバイト型構造のIn2O3相と、β-Ga2O3型構造のGaInO3相、あるいはβ-Ga2O3型構造のGaInO3相および(Ga,In)2O3相からなり、
前記結晶質の酸化物半導体薄膜は、ガリウムの含有量がGa/(In+Ga)原子数比で0.09以上0.45以下であり、結晶相がビックスバイト型構造のIn2O3相のみによって構成される、酸化物半導体薄膜。 - ガリウムの含有量がGa/(In+Ga)原子数比で0.10以上0.30以下である、請求項1に記載の酸化物半導体薄膜。
- キャリア濃度が5.0×1017cm-3以下である、請求項1または2に記載の酸化物半導体薄膜。
- キャリア移動度が10cm2V-1sec-1以上である、請求項1または2に記載の酸化物半導体薄膜。
- アニール処理によって結晶化する前の非晶質膜の結晶化温度が225℃以上である、請求項1または2に記載の酸化物半導体薄膜。
- ソース電極、ドレイン電極、ゲート電極、チャネル層およびゲート絶縁膜を備える薄膜トランジスタであって、前記チャネル層が請求項1または2に記載の酸化物半導体薄膜によって構成される、薄膜トランジスタ。
- 請求項7に記載の薄膜トランジスタを備える、表示装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015512959A JP5928657B2 (ja) | 2013-07-16 | 2014-07-16 | 酸化物半導体薄膜および薄膜トランジスタ |
US14/905,008 US9768316B2 (en) | 2013-07-16 | 2014-07-16 | Oxide semiconductor thin film and thin film transistor |
CN201480040462.4A CN105393360B (zh) | 2013-07-16 | 2014-07-16 | 氧化物半导体薄膜和薄膜晶体管 |
KR1020167003601A KR20160033145A (ko) | 2013-07-16 | 2014-07-16 | 산화물 반도체 박막 및 박막 트랜지스터 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-147193 | 2013-07-16 | ||
JP2013147193 | 2013-07-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015008805A1 true WO2015008805A1 (ja) | 2015-01-22 |
Family
ID=52346253
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2014/068961 WO2015008805A1 (ja) | 2013-07-16 | 2014-07-16 | 酸化物半導体薄膜および薄膜トランジスタ |
Country Status (6)
Country | Link |
---|---|
US (1) | US9768316B2 (ja) |
JP (2) | JP5928657B2 (ja) |
KR (1) | KR20160033145A (ja) |
CN (2) | CN108962724A (ja) |
TW (1) | TWI503992B (ja) |
WO (1) | WO2015008805A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017150275A1 (ja) * | 2016-02-29 | 2017-09-08 | シャープ株式会社 | 薄膜トランジスタ |
WO2017150050A1 (ja) * | 2016-02-29 | 2017-09-08 | 住友金属鉱山株式会社 | 酸化物焼結体及びスパッタリング用ターゲット |
KR20200080115A (ko) * | 2018-12-26 | 2020-07-06 | 제이엑스금속주식회사 | 스퍼터링 타깃 부재, 스퍼터링 타깃 부재의 제조 방법, 스퍼터링 타깃, 스퍼터링막, 스퍼터링막의 제조 방법, 막체, 적층 구조체, 및 유기 el 장치 |
CN112563353A (zh) * | 2020-12-29 | 2021-03-26 | 中国科学院长春光学精密机械与物理研究所 | 一种异质结紫外探测器及其制备方法 |
CN113643960A (zh) * | 2021-06-07 | 2021-11-12 | 西安电子科技大学 | 一种基于脉冲法的β-Ga2O3薄膜及其制备方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180079086A (ko) * | 2016-12-30 | 2018-07-10 | 엘지디스플레이 주식회사 | 산화물 박막트랜지스터 및 그 제조 방법과, 이를 이용한 표시패널 및 표시장치 |
GB201705755D0 (en) | 2017-04-10 | 2017-05-24 | Norwegian Univ Of Science And Tech (Ntnu) | Nanostructure |
FR3085535B1 (fr) * | 2019-04-17 | 2021-02-12 | Hosseini Teherani Ferechteh | Procédé de fabrication d’oxyde de gallium de type p par dopage intrinsèque, le film mince obtenu d’oxyde de gallium et son utilisation |
CN111312733B (zh) * | 2020-04-02 | 2023-06-02 | 武汉华星光电半导体显示技术有限公司 | 阵列基板及其制备方法 |
KR20220090871A (ko) * | 2020-12-23 | 2022-06-30 | 한양대학교 산학협력단 | Igto 산화물 반도체 결정화를 통한 고이동도 트랜지스터 소자 및 그의 제조 방법 |
WO2023214513A1 (ja) * | 2022-05-06 | 2023-11-09 | 出光興産株式会社 | 結晶酸化インジウム半導体膜の製造方法、薄膜トランジスタ及びスパッタリングターゲット |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007277039A (ja) * | 2006-04-06 | 2007-10-25 | Sumitomo Metal Mining Co Ltd | 酸化物焼結体及びそれを用いた酸化物透明導電膜の製造方法 |
JP2013067855A (ja) * | 2011-09-06 | 2013-04-18 | Idemitsu Kosan Co Ltd | スパッタリングターゲット |
JP2013128128A (ja) * | 2010-12-28 | 2013-06-27 | Idemitsu Kosan Co Ltd | 薄膜トランジスタ、その製造方法、及び表示装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5407602A (en) | 1993-10-27 | 1995-04-18 | At&T Corp. | Transparent conductors comprising gallium-indium-oxide |
KR101078483B1 (ko) | 2004-03-12 | 2011-10-31 | 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 | Lcd 또는 유기 el 디스플레이의 스위칭 소자 |
US8440115B2 (en) | 2007-07-06 | 2013-05-14 | Sumitomo Metal Mining Co., Ltd. | Oxide sintered body and production method therefor, target, and transparent conductive film and transparent conductive substrate obtained by using the same |
JP5348132B2 (ja) * | 2008-04-16 | 2013-11-20 | 住友金属鉱山株式会社 | 薄膜トランジスタ型基板、薄膜トランジスタ型液晶表示装置および薄膜トランジスタ型基板の製造方法 |
KR20130080063A (ko) * | 2008-06-06 | 2013-07-11 | 이데미쓰 고산 가부시키가이샤 | 산화물 박막용 스퍼터링 타겟 및 그의 제조 방법 |
WO2010032422A1 (ja) | 2008-09-19 | 2010-03-25 | 出光興産株式会社 | 酸化物焼結体及びスパッタリングターゲット |
CN102171159A (zh) | 2008-09-25 | 2011-08-31 | Jx日矿日石金属株式会社 | 透明导电膜制造用的氧化物烧结体 |
CN105679766A (zh) | 2009-09-16 | 2016-06-15 | 株式会社半导体能源研究所 | 晶体管及显示设备 |
KR20120091026A (ko) * | 2009-09-30 | 2012-08-17 | 이데미쓰 고산 가부시키가이샤 | In-Ga-Zn-O계 산화물 소결체 |
JP5437825B2 (ja) * | 2010-01-15 | 2014-03-12 | 出光興産株式会社 | In−Ga−O系酸化物焼結体、ターゲット、酸化物半導体薄膜及びこれらの製造方法 |
JP5189674B2 (ja) * | 2010-12-28 | 2013-04-24 | 出光興産株式会社 | 酸化物半導体薄膜層を有する積層構造、積層構造の製造方法、薄膜トランジスタ及び表示装置 |
US9178076B2 (en) * | 2011-08-11 | 2015-11-03 | Idemitsu Kosan Co., Ltd. | Thin-film transistor |
-
2014
- 2014-07-16 WO PCT/JP2014/068961 patent/WO2015008805A1/ja active Application Filing
- 2014-07-16 KR KR1020167003601A patent/KR20160033145A/ko not_active Application Discontinuation
- 2014-07-16 JP JP2015512959A patent/JP5928657B2/ja not_active Expired - Fee Related
- 2014-07-16 CN CN201810801711.7A patent/CN108962724A/zh active Pending
- 2014-07-16 TW TW103124547A patent/TWI503992B/zh not_active IP Right Cessation
- 2014-07-16 CN CN201480040462.4A patent/CN105393360B/zh not_active Expired - Fee Related
- 2014-07-16 US US14/905,008 patent/US9768316B2/en not_active Expired - Fee Related
-
2016
- 2016-02-23 JP JP2016032549A patent/JP6376153B2/ja not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007277039A (ja) * | 2006-04-06 | 2007-10-25 | Sumitomo Metal Mining Co Ltd | 酸化物焼結体及びそれを用いた酸化物透明導電膜の製造方法 |
JP2013128128A (ja) * | 2010-12-28 | 2013-06-27 | Idemitsu Kosan Co Ltd | 薄膜トランジスタ、その製造方法、及び表示装置 |
JP2013067855A (ja) * | 2011-09-06 | 2013-04-18 | Idemitsu Kosan Co Ltd | スパッタリングターゲット |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017150275A1 (ja) * | 2016-02-29 | 2017-09-08 | シャープ株式会社 | 薄膜トランジスタ |
WO2017150050A1 (ja) * | 2016-02-29 | 2017-09-08 | 住友金属鉱山株式会社 | 酸化物焼結体及びスパッタリング用ターゲット |
KR20200080115A (ko) * | 2018-12-26 | 2020-07-06 | 제이엑스금속주식회사 | 스퍼터링 타깃 부재, 스퍼터링 타깃 부재의 제조 방법, 스퍼터링 타깃, 스퍼터링막, 스퍼터링막의 제조 방법, 막체, 적층 구조체, 및 유기 el 장치 |
KR102274149B1 (ko) * | 2018-12-26 | 2021-07-08 | 제이엑스금속주식회사 | 스퍼터링 타깃 부재, 스퍼터링 타깃 부재의 제조 방법, 스퍼터링 타깃, 스퍼터링막, 스퍼터링막의 제조 방법, 막체, 적층 구조체, 및 유기 el 장치 |
CN112563353A (zh) * | 2020-12-29 | 2021-03-26 | 中国科学院长春光学精密机械与物理研究所 | 一种异质结紫外探测器及其制备方法 |
CN113643960A (zh) * | 2021-06-07 | 2021-11-12 | 西安电子科技大学 | 一种基于脉冲法的β-Ga2O3薄膜及其制备方法 |
CN113643960B (zh) * | 2021-06-07 | 2024-03-19 | 西安电子科技大学 | 一种基于脉冲法的β-Ga2O3薄膜及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI503992B (zh) | 2015-10-11 |
JPWO2015008805A1 (ja) | 2017-03-02 |
US9768316B2 (en) | 2017-09-19 |
US20160163865A1 (en) | 2016-06-09 |
CN108962724A (zh) | 2018-12-07 |
JP2016129241A (ja) | 2016-07-14 |
TW201515236A (zh) | 2015-04-16 |
JP5928657B2 (ja) | 2016-06-01 |
KR20160033145A (ko) | 2016-03-25 |
CN105393360A (zh) | 2016-03-09 |
CN105393360B (zh) | 2018-11-23 |
JP6376153B2 (ja) | 2018-08-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6376153B2 (ja) | 酸化物半導体薄膜および薄膜トランジスタ | |
TWI595668B (zh) | 氧化物半導體薄膜及薄膜電晶體 | |
JP5345952B2 (ja) | a−IGZO酸化物薄膜の製造方法 | |
WO2012118150A1 (ja) | 酸化物焼結体およびスパッタリングターゲット | |
TWI594433B (zh) | 氧化物半導體薄膜與其製造方法以及薄膜電晶體 | |
JP6269814B2 (ja) | 酸化物焼結体、スパッタリング用ターゲット、及びそれを用いて得られる酸化物半導体薄膜 | |
JP2010238770A (ja) | 酸化物薄膜及びその製造方法 | |
JP2019038735A (ja) | 酸化物焼結体、酸化物焼結体の製造方法、スパッタリング用ターゲット、及び非晶質の酸化物半導体薄膜 | |
WO2016136479A1 (ja) | 酸化物焼結体、スパッタリング用ターゲット、及びそれを用いて得られる酸化物半導体薄膜 | |
JP6036984B2 (ja) | 酸窒化物半導体薄膜 | |
TWI622568B (zh) | 氧化物燒結體及濺鍍用靶 | |
JP6252903B2 (ja) | 薄膜トランジスタおよびその製造方法 | |
WO2023189014A1 (ja) | 半導体膜、及び半導体膜の製造方法 | |
JP2017168572A (ja) | 酸化物半導体薄膜、酸化物焼結体、薄膜トランジスタ及び表示装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201480040462.4 Country of ref document: CN |
|
ENP | Entry into the national phase |
Ref document number: 2015512959 Country of ref document: JP Kind code of ref document: A |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 14826909 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14905008 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20167003601 Country of ref document: KR Kind code of ref document: A |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 14826909 Country of ref document: EP Kind code of ref document: A1 |