WO2014010433A1 - タッチパネル用透明電極、タッチパネル、および表示装置 - Google Patents
タッチパネル用透明電極、タッチパネル、および表示装置 Download PDFInfo
- Publication number
- WO2014010433A1 WO2014010433A1 PCT/JP2013/067690 JP2013067690W WO2014010433A1 WO 2014010433 A1 WO2014010433 A1 WO 2014010433A1 JP 2013067690 W JP2013067690 W JP 2013067690W WO 2014010433 A1 WO2014010433 A1 WO 2014010433A1
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- WIPO (PCT)
- Prior art keywords
- touch panel
- nitrogen
- electrode
- group
- transparent electrode
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- 0 c(cc1)cc(-c(cc2)cc(c3c4ccc(-c(cccc5)c5-c5ncccc5)c3)c2[n]4-c(cc2c3c4)ccc2[s]c3ccc4-[n]2c(ccc(-c3ccccc3-*3ncccc3)c3)c3c3cc(-c4ccccc4-c4ccccn4)ccc23)c1-c1ccccn1 Chemical compound c(cc1)cc(-c(cc2)cc(c3c4ccc(-c(cccc5)c5-c5ncccc5)c3)c2[n]4-c(cc2c3c4)ccc2[s]c3ccc4-[n]2c(ccc(-c3ccccc3-*3ncccc3)c3)c3c3cc(-c4ccccc4-c4ccccn4)ccc23)c1-c1ccccn1 0.000 description 4
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/14—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
- C07D471/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
- C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
- C07D491/04—Ortho-condensed systems
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D519/00—Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups C07D453/00 or C07D455/00
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
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- G—PHYSICS
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- G06F—ELECTRIC DIGITAL DATA PROCESSING
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- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/047—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/03—Viewing layer characterised by chemical composition
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- G—PHYSICS
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- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- G—PHYSICS
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- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
Definitions
- the present invention relates to a transparent electrode for a touch panel, a touch panel, and a display device, and more particularly to a transparent electrode for a touch panel suitable for thinning, a touch panel including the same, and a display device.
- Capacitance type has the feature that multi-point input is possible, and practical use is progressing in smartphones.
- the patch panel is interposed.
- the visibility of the arranged display image is ensured.
- a metal oxide such as indium tin oxide (ITO) has been mainly used.
- ITO indium tin oxide
- the conductivity is not sufficient, and a voltage drop is likely to occur near the center of the panel, which hinders the enlargement of the touch panel.
- a certain amount of thickness is required. For this reason, when the electrode has a pattern as in the projection capacitive method, the pattern is easily visible, and as a result, the visibility of the display image serving as a base is lowered.
- Patent Document 1 a configuration using a metal nanowire having higher conductivity than ITO has been proposed as a transparent electrode for a touch panel (for example, see Patent Document 1 below).
- a transparent electrode using metal nanowires has a problem that when the amount of metal nanowires added is increased in order to reduce resistance, the visibility of a display image as a base is reduced due to light scattering in the metal nanowires. Was.
- an object of the present invention is to provide a transparent electrode for a touch panel that can be further increased in size, and to provide a touch panel that can be further increased in size, and a display device using the same. To do.
- the transparent electrode for touchscreens provided with the nitrogen containing layer comprised using the compound containing a nitrogen atom, and the electrode layer which has the silver as a main component and laminated
- the compound containing a nitrogen atom is obtained when n is the number of unshared electron pairs that are not involved in aromaticity and are not coordinated to a metal, and the molecular weight is M.
- the nitrogen-containing layer is constituted by using another compound together with the compound, and the average value of the effective unshared electron pair content [n / M] in consideration of the mixing ratio of these compounds is 2.0 ⁇ 10.
- the transparent electrode for a touch panel according to any one of the structures 2 and 3, wherein ⁇ 3 ⁇ [n / M].
- R11 and R12 represent a hydrogen atom or a substituent.
- Y21 represents a divalent linking group composed of an arylene group, a heteroarylene group, or a combination thereof.
- E201 to E216 and E221 to E238 each represent —C (R21) ⁇ or —N ⁇ , and R21 represents a hydrogen atom or a substituent.
- k21 and k22 represent an integer of 0 to 4, and k21 + k22 is an integer of 2 or more.
- E301 to E312 each represent —C (R31) ⁇
- R31 represents a hydrogen atom or a substituent
- Y31 represents a divalent linking group composed of an arylene group, a heteroarylene group, or a combination thereof.
- E401 to E414 each represent —C (R41) ⁇ , and R41 represents a hydrogen atom or a substituent.
- Ar41 represents a substituted or unsubstituted aromatic hydrocarbon ring or aromatic heterocyclic ring.
- K41 represents an integer of 3 or more.
- R51 represents a substituent
- E501, E502, E511 to E515, E521 to E525 each represent —C (R52) ⁇ or —N ⁇
- R52 represents a hydrogen atom (H) or a substituent
- E601 to E612 each represent —C (R61) ⁇ or —N ⁇ , and R61 represents a hydrogen atom or a substituent.
- Ar61 represents a substituted or unsubstituted aromatic hydrocarbon ring or aromatic heterocyclic ring.
- a touch panel comprising the transparent electrode for a touch panel according to any one of Structures 1 to 14.
- a display device comprising the touch panel according to the configuration 15 and a display panel disposed so as to overlap the transparent electrode for the touch panel.
- the transparent electrode for a touch panel configured as described above has a configuration in which an electrode layer mainly composed of silver is provided by being laminated on a nitrogen-containing layer configured using a compound containing nitrogen atoms.
- an electrode layer mainly composed of silver is provided by being laminated on a nitrogen-containing layer configured using a compound containing nitrogen atoms.
- the electrode layer is generally a single-layer growth type (Frank-van der Merwe: FM type) that is easily isolated in an island shape by film growth of a nuclear growth type (Volume-Weber: VW type). ) Film growth. Accordingly, an electrode layer having a uniform film thickness can be obtained even though the film thickness is small.
- both the improvement in conductivity and the improvement in light transmittance in the electrode layer mainly composed of silver are achieved, so that the transparent electrode for a touch panel having this electrode layer can be obtained. Larger size is possible. In addition, it is possible to increase the size of a touch panel and a display device using the transparent electrode for a touch panel.
- FIG. 1 is a schematic cross-sectional view illustrating a configuration of a transparent electrode for a touch panel (hereinafter referred to as a transparent electrode) according to an embodiment of the present invention.
- the transparent electrode 1 has a two-layer structure in which a nitrogen-containing layer 3 and an electrode layer 5 are stacked.
- the nitrogen-containing layer 3 and the electrode layer 5 are provided in this order on the transparent substrate 11. ing.
- the electrode layer 5 constituting a substantial electrode portion in the transparent electrode 1 is a layer composed mainly of silver (Ag), and is laminated in a state adjacent to the nitrogen-containing layer 3 here.
- the nitrogen-containing layer 3 disposed adjacent to the electrode layer 5 is configured using a compound containing nitrogen atoms (N) that are stably bonded to silver, which is the main material constituting the electrode layer 5. It is characterized by being.
- the transparency of the transparent electrode 1 of the present invention means that the light transmittance at a wavelength of 550 nm is 50% or more.
- the transparent substrate 11 on which the transparent electrode 1 of the present invention is formed may also serve as a front plate of a display panel, for example.
- Examples of such a transparent substrate 11 include glass, quartz, and a transparent resin film.
- the glass examples include silica glass, soda lime silica glass, lead glass, borosilicate glass, and alkali-free glass. From the viewpoints of adhesion, durability, and smoothness with the nitrogen-containing layer 3 on the surface of these glass materials, if necessary, physical treatment such as polishing is performed, a film made of an inorganic material or an organic material, A hybrid film combining these films is formed.
- polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyethylene, polypropylene, cellophane, cellulose diacetate, cellulose triacetate (TAC), cellulose acetate butyrate, cellulose acetate propionate ( CAP), cellulose esters such as cellulose acetate phthalate, cellulose nitrate or derivatives thereof, polyvinylidene chloride, polyvinyl alcohol, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyether ketone, polyimide , Polyethersulfone (PES), polyphenylene sulfide, polysulfone , Polyetherimide, polyetherketoneimide, polyamide, fluororesin, nylon, polymethylmethacrylate, acrylic or polyarylates, cyclone resins such as Arton (trade name, manufactured by JSR) or Appel (trade name
- a film made of an inorganic material or an organic material or a hybrid film combining these films may be formed on the surface of the resin film.
- Such coatings and hybrid coatings have a water vapor transmission rate (25 ⁇ 0.5 ° C., relative humidity 90 ⁇ 2% RH) of 0.01 g / (measured by a method in accordance with JIS-K-7129-1992. m 2 ⁇ 24 hours) or less of a barrier film (also referred to as a barrier film or the like) is preferable.
- the oxygen permeability measured by a method according to JIS-K-7126-1987 is 10 ⁇ 3 ml / (m 2 ⁇ 24 hours ⁇ atm) or less, and the water vapor permeability is 10 ⁇ 5 g / ( m 2 ⁇ 24 hours) or less is preferable.
- the material for forming the barrier film as described above may be any material that has a function of suppressing intrusion of elements that cause deterioration of elements such as moisture and oxygen.
- silicon oxide, silicon dioxide, silicon nitride, or the like is used. be able to.
- the method for forming the barrier film is not particularly limited.
- the vacuum deposition method, the sputtering method, the reactive sputtering method, the molecular beam epitaxy method, the cluster ion beam method, the ion plating method, the plasma polymerization method, the atmospheric pressure plasma weighting can be used, but an atmospheric pressure plasma polymerization method described in JP-A No. 2004-68143 is particularly preferable.
- the nitrogen-containing layer 3 is a layer provided on the electrode layer 5, and is provided adjacent to the electrode layer 5 here.
- Such a nitrogen-containing layer 3 is configured using a compound containing a nitrogen atom (N). Examples of the compound containing a nitrogen atom include the following [compounds 1 to 3].
- an unshared electron pair of a nitrogen atom that is stably bonded to silver, which is the main material constituting the electrode layer 5 is particularly [ [Effective unshared electron pair], and a compound in which the content of [effective unshared electron pair] is within a predetermined range is preferably used.
- “effective unshared electron pair” means an unshared electron pair that is not involved in aromaticity and is not coordinated to a metal among the unshared electron pairs of the nitrogen atom contained in the compound.
- [Effective unshared electron pair] as described above refers to an unshared electron pair possessed by a nitrogen atom regardless of whether or not the nitrogen atom itself provided with the unshared electron pair is a hetero atom constituting an aromatic ring. Is selected depending on whether or not is involved in aromaticity. For example, even if a nitrogen atom is a heteroatom constituting an aromatic ring, if the nitrogen atom has an unshared electron pair that does not participate in aromaticity, the unshared electron pair is [effective unshared electron. It is counted as one of the pair.
- the number n of [effective unshared electron pairs] with respect to the molecular weight M of such a compound is defined as, for example, the effective unshared electron pair content [n / M].
- the nitrogen-containing layer 3 is preferably configured using a compound selected such that [n / M] is 2.0 ⁇ 10 ⁇ 3 ⁇ [n / M].
- the nitrogen-containing layer 3 is more preferable if the effective unshared electron pair content [n / M] defined as described above is in the range of 3.9 ⁇ 10 ⁇ 3 ⁇ [n / M].
- the nitrogen-containing layer 3 only needs to be configured using a compound having an effective unshared electron pair content [n / M] within the predetermined range described above, or may be configured only with such a compound. Further, such a compound and other compounds may be mixed and used. The other compound may or may not contain a nitrogen atom, and the effective unshared electron pair content [n / M] may not be within the predetermined range described above.
- the nitrogen-containing layer 3 is configured using a plurality of compounds, for example, based on the mixing ratio of the compounds, the molecular weight M of the mixed compound obtained by mixing these compounds is obtained, and [effective non- The total number n of [shared electron pairs] is obtained as an average value of the effective unshared electron pair content [n / M], and this value is preferably within the predetermined range described above. That is, the effective unshared electron pair content [n / M] of the nitrogen-containing layer 3 itself is preferably within a predetermined range.
- the nitrogen-containing layer 3 is composed of a plurality of compounds and the composition ratio (content ratio) of the compounds is different in the film thickness direction, the nitrogen on the side in contact with the electrode layer 5
- the effective unshared electron pair content [n / M] in the surface layer of the containing layer 3 is preferably within a predetermined range.
- Table 1 shows the corresponding general formulas when these exemplary compounds belong to any one of the general formulas (1) to (6) representing [Compound-2] described below.
- the compounds represented by the general formulas (1) to (6) there are also compounds that fall within the range of the effective unshared electron pair content [n / M] described above. It is preferably used alone as a compound constituting the nitrogen-containing layer 3 (see Table 1 above).
- the compound represented by the following general formulas (1) to (6) is a compound that does not fall within the range of the above-mentioned effective unshared electron pair content [n / M]
- the effective unshared electron pair content [ n / M] is preferably used as a compound constituting the nitrogen-containing layer 3 by mixing with a compound in the above-described range.
- R11 in General formula (1) and said R12 represent a hydrogen atom or a substituent.
- substituents examples include an alkyl group (for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group).
- alkyl group for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group.
- cycloalkyl groups for example, cyclopentyl group, cyclohexyl group, etc.
- alkenyl groups for example, vinyl group, allyl group, etc.
- alkynyl groups for example, ethynyl group, propargyl group, etc.
- aromatic hydrocarbon groups aromatic Also referred to as aromatic carbocyclic group, aryl group, etc., for example, phenyl group, p-chlorophenyl group, mesityl group, tolyl group, xylyl group, naphthyl group, anthryl group, azulenyl group, acenaphthenyl group, fluorenyl group, phenanthryl group, indenyl group , Pyrenyl group, biphenylyl group), aromatic heterocyclic group (eg , Furyl group, thienyl group, pyridyl group, pyridazinyl group,
- substituents may be further substituted with the above substituents.
- a plurality of these substituents may be bonded to each other to form a ring.
- the above general formula (2) is also a form of the general formula (1).
- Y21 represents a divalent linking group composed of an arylene group, a heteroarylene group, or a combination thereof.
- E201 to E216 and E221 to E238 each represent —C (R21) ⁇ or —N ⁇ , and R21 represents a hydrogen atom or a substituent.
- R21 represents a hydrogen atom or a substituent.
- k21 and k22 represent an integer of 0 to 4, and k21 + k22 is an integer of 2 or more.
- examples of the arylene group represented by Y21 include o-phenylene group, p-phenylene group, naphthalenediyl group, anthracenediyl group, naphthacenediyl group, pyrenediyl group, naphthylnaphthalenediyl group, and biphenyldiyl.
- examples of the heteroarylene group represented by Y21 include a carbazole ring, a carboline ring, a diazacarbazole ring (also referred to as a monoazacarboline ring, and one of carbon atoms constituting the carboline ring is nitrogen.
- the ring structure is replaced by an atom), a triazole ring, a pyrrole ring, a pyridine ring, a pyrazine ring, a quinoxaline ring, a thiophene ring, an oxadiazole ring, a dibenzofuran ring, a dibenzothiophene ring, and an indole ring.
- a carbazole ring also referred to as a monoazacarboline ring
- a triazole ring also referred to as a monoazacarboline ring
- a pyrrole ring also referred to as a monoazacarboline ring
- a condensed aromatic heterocyclic ring formed by condensing three or more rings is used.
- a group derived from a condensed aromatic heterocyclic ring formed by condensing three or more rings is preferably included, and a group derived from a dibenzofuran ring or a dibenzothiophene ring is preferable.
- a group derived from a dibenzofuran ring or a dibenzothiophene ring is preferable.
- R21 of —C (R21) represented by E201 to E216 and E221 to E238 is a substituent
- examples of the substituent include R11 of the general formula (1)
- the substituents exemplified as R12 apply similarly.
- E221 to E224 and E230 to E233 are each represented by —C (R21) ⁇ .
- E203 is represented by —C (R21) ⁇ and R21 represents a linking site
- R21 preferably represents a linking site.
- the above general formula (3) is also a form of the general formula (1).
- E301 to E312 each represent —C (R31) ⁇
- R31 represents a hydrogen atom or a substituent.
- Y31 represents a divalent linking group composed of an arylene group, a heteroarylene group, or a combination thereof.
- the above general formula (4) is also a form of the general formula (1).
- E401 to E414 each represent —C (R41) ⁇ , and R41 represents a hydrogen atom or a substituent.
- Ar41 represents a substituted or unsubstituted aromatic hydrocarbon ring or aromatic heterocyclic ring.
- k41 represents an integer of 3 or more.
- the aromatic hydrocarbon ring includes benzene ring, biphenyl ring, naphthalene ring, azulene ring, anthracene ring, phenanthrene ring, pyrene ring, chrysene Ring, naphthacene ring, triphenylene ring, o-terphenyl ring, m-terphenyl ring, p-terphenyl ring, acenaphthene ring, coronene ring, fluorene ring, fluoranthrene ring, naphthacene ring, pentacene ring, perylene ring, pentaphen And a ring, a picene ring, a pyrene ring, a pyranthrene ring, and an anthraanthrene ring.
- These rings may further have the substituents exemplified as R11
- the aromatic heterocycle when Ar41 represents an aromatic heterocycle, the aromatic heterocycle includes a furan ring, a thiophene ring, an oxazole ring, a pyrrole ring, a pyridine ring, a pyridazine ring, a pyrimidine ring, a pyrazine ring, Triazine ring, benzimidazole ring, oxadiazole ring, triazole ring, imidazole ring, pyrazole ring, thiazole ring, indole ring, benzimidazole ring, benzothiazole ring, benzoxazole ring, quinoxaline ring, quinazoline ring, phthalazine ring, carbazole ring And azacarbazole ring.
- the azacarbazole ring refers to one in which at least one carbon atom of the benzene ring constituting the carbazole ring is replaced with a nitrogen atom. These rings may further have the substituents exemplified as R11 and R12 in the general formula (1).
- R51 represents a substituent.
- R52 represents a hydrogen atom (H) or a substituent.
- E601 to E612 each represent —C (R61) ⁇ or —N ⁇ , and R61 represents a hydrogen atom or a substituent.
- Ar61 represents a substituted or unsubstituted aromatic hydrocarbon ring or aromatic heterocyclic ring.
- the substituted or unsubstituted aromatic hydrocarbon ring or aromatic heterocyclic ring represented by Ar61 may be the same as Ar41 in the general formula (4).
- Step 1 (Synthesis of Intermediate 1) Under a nitrogen atmosphere, 2,8-dibromodibenzofuran (1.0 mol), carbazole (2.0 mol), copper powder (3.0 mol), potassium carbonate (1.5 mol), DMAc (dimethylacetamide) 300 ml Mixed in and stirred at 130 ° C. for 24 hours.
- Step 2 (Synthesis of Intermediate 2)
- Intermediate 1 (0.5 mol) was dissolved in 100 ml of DMF (dimethylformamide) at room temperature in the atmosphere, NBS (N-bromosuccinimide) (2.0 mol) was added, and the mixture was stirred overnight at room temperature. The resulting precipitate was filtered and washed with methanol, yielding intermediate 2 in 92% yield.
- Step 3 (Synthesis of Compound 5) Under a nitrogen atmosphere, intermediate 2 (0.25 mol), 2-phenylpyridine (1.0 mol), ruthenium complex [( ⁇ 6 -C 6 H 6 ) RuCl 2 ] 2 (0.05 mol), triphenyl Phosphine (0.2 mol) and potassium carbonate (12 mol) were mixed in 3 L of NMP (N-methyl-2-pyrrolidone) and stirred at 140 ° C. overnight.
- NMP N-methyl-2-pyrrolidone
- the film forming method includes a method using a wet process such as a coating method, an inkjet method, a coating method, a dip method, Examples include a method using a dry process such as a vapor deposition method (resistance heating, EB method, etc.), a sputtering method, a CVD method, or the like. Of these, the vapor deposition method is preferably applied.
- the nitrogen-containing layer 3 is formed using a plurality of compounds
- co-evaporation in which a plurality of compounds are simultaneously supplied from a plurality of evaporation sources is applied.
- a coating method is preferably applied.
- a coating solution in which the compound is dissolved in a solvent is used.
- the solvent in which the compound is dissolved is not limited.
- a coating solution may be prepared using a solvent capable of dissolving the plurality of compounds.
- the electrode layer 5 is a layer composed mainly of silver, is composed of silver or an alloy composed mainly of silver, and is a layer formed adjacent to the nitrogen-containing layer 3.
- a method for forming such an electrode layer 5 a method using a wet process such as a coating method, an inkjet method, a coating method, a dip method, a vapor deposition method (resistance heating, EB method, etc.), a sputtering method, a CVD method, or the like. And a method using the dry process. Of these, the vapor deposition method is preferably applied.
- the electrode layer 5 is formed on the nitrogen-containing layer 3 so that it has sufficient conductivity even without high-temperature annealing after the film formation.
- the film may be subjected to a high temperature annealing treatment after the film.
- Examples of the alloy mainly composed of silver (Ag) constituting the electrode layer 5 include silver magnesium (AgMg), silver copper (AgCu), silver palladium (AgPd), silver palladium copper (AgPdCu), and silver indium (AgIn). Etc.
- the electrode layer 5 as described above may have a configuration in which silver or an alloy layer mainly composed of silver is divided into a plurality of layers as necessary.
- the electrode layer 5 preferably has a thickness in the range of 4 to 12 nm.
- a film thickness of 12 nm or less is preferable because the absorption component or reflection component of the layer can be kept low and the light transmittance of the transparent barrier film is maintained.
- the electroconductivity of a layer is also ensured because a film thickness is 4 nm or more.
- the transparent electrode 1 having a laminated structure including the nitrogen-containing layer 3 and the electrode layer 5 provided adjacent thereto as described above has an upper part of the electrode layer 5 covered with a protective film, A conductive layer may be stacked.
- the protective film and the conductive layer have light transmittance so as not to impair the light transmittance of the transparent electrode 1.
- the transparent electrode 1 configured as described above has a configuration in which an electrode layer 5 mainly composed of silver is provided adjacent to a nitrogen-containing layer 3 configured using a compound containing a nitrogen atom.
- an electrode layer 5 mainly composed of silver is provided adjacent to a nitrogen-containing layer 3 configured using a compound containing a nitrogen atom.
- a silver thin film that is easily isolated in an island shape by film growth of a nuclear growth type is a single layer growth type (Frank-van der Merwe: FM type) film growth.
- a film is formed.
- an electrode layer 5 mainly composed of silver with a uniform thickness even though it is thin can be obtained on the nitrogen-containing layer 3, and light transmittance is ensured by the thin thickness.
- Such a transparent electrode 1 was confirmed to have a low sheet resistance although it is a thin film as compared with a transparent electrode using ITO, as will be described in detail in the following examples. Moreover, since this transparent electrode 1 is a laminated structure of the homogeneous nitrogen-containing layer 3 and the electrode layer 5, light scattering is also suppressed. As a result, the transparent electrode 1 does not hinder the visibility of the underlying display image as a transparent electrode for a touch panel, and can be applied as a transparent electrode for an enlarged touch panel.
- Such a transparent electrode 1 is low in cost because it does not use indium (In), which is a rare metal, and has excellent long-term reliability because it does not use a chemically unstable material such as ZnO. Yes.
- FIG. 2 is a schematic cross-sectional view for explaining Modification Example 1 of the transparent electrode for a touch panel of the present embodiment.
- the transparent electrode 1a of Modification 1 has a configuration in which a nitrogen-containing layer 3 and an electrode layer 5 are laminated via an intermediate layer A, and the configuration other than the intermediate layer A uses FIG. This is the same as the transparent electrode for a touch panel of this embodiment described above. Therefore, only the configuration of the intermediate layer A will be described here.
- the intermediate layer A is provided between these layers in contact with the nitrogen-containing layer 3 and the electrode layer 5.
- This intermediate layer A is a film that is sufficiently thin so as not to impede the light transmittance of the transparent electrode 1a and to inhibit the influence of nitrogen atoms contained in the nitrogen-containing layer 3 on the electrode layer 5. It is important that it be thick. For this reason, such an intermediate layer A may have a thickness of 1 nm or less, and does not need to be configured as a continuous film, and may have an island shape or a shape having a plurality of holes. . In this case, the nitrogen-containing layer 3 and the electrode layer 5 laminated via the intermediate layer A are partially disposed adjacent to each other.
- the intermediate layer A as described above is a layer formed using an organic material or a conductive material. If it is an organic material, it may not contain nitrogen.
- As the conductive material magnesium, aluminum, copper, indium lithium, or an alloy thereof is used.
- the sheet resistance is low although it is a thin film compared to the transparent electrode using ITO, like the transparent electrode of the present embodiment described above.
- the transparent electrode 1a since it has a laminated structure of a homogeneous nitrogen-containing layer 3, an intermediate layer A, and an electrode layer 5, light scattering is also suppressed.
- the transparent electrode 1a does not hinder the visibility of the underlying display image as a transparent electrode for a touch panel, and can be applied as a transparent electrode for an enlarged touch panel.
- FIG. 3 is a schematic cross-sectional view for explaining Modification Example 2 of the transparent electrode for a touch panel of the present embodiment.
- the transparent electrode 1b of Modification 2 has a configuration in which a high refractive index layer H that sandwiches the nitrogen-containing layer 3 is provided between the electrode layer 5 and the transparent substrate 11 side.
- the refractive index layer H, the nitrogen-containing layer 3, and the electrode layer 5 are laminated in this order.
- the configuration other than the high refractive index layer H is the same as the transparent electrode for a touch panel of the present embodiment described with reference to FIG. Therefore, here, the configuration of the transparent electrode 1b will be described focusing on the configuration of the high refractive index layer H.
- the high refractive index layer H is a layer having a higher refractive index than the upper nitrogen-containing layer 3.
- Such a high refractive index layer H is made of a material having a high refractive index and light transmittance as described above.
- the nitrogen-containing layer 3 preferably has a film thickness of 5 nm or less.
- the film thickness of the nitrogen-containing layer 3 is 5 nm or less, that is, when the distance between the high refractive index layer H and the electrode layer 5 is 5 nm or less, the transparent electrode 1b This is because it was confirmed that the characters formed on the base via the surface were easily visible and the light transmittance of the transparent electrode 1b was high.
- the lower limit value of the film thickness of the nitrogen-containing layer 3 is a film thickness that does not interfere with the FM type film growth of the electrode layer 5 formed on the nitrogen-containing layer 3, that is, the nitrogen-containing layer 3 is island-shaped.
- the film thickness is such that it is formed as a continuous film covering the high refractive index layer H.
- the transparent electrode 1b As described above, similarly to the transparent electrode of the present embodiment described above, the sheet resistance is low and the homogeneous refractive index is high even though it is a thin film compared to the transparent electrode using ITO. Since the layer H, the nitrogen-containing layer 3 and the electrode layer 5 are stacked, light scattering is also suppressed. Further, the transparent electrode 1b has a high refractive index layer H, and the high refractive index layer H, the nitrogen-containing layer 3, and the electrode layer 5 are laminated in this order. Thereby, the reflection in the electrode layer 5 which has silver as a main component is suppressed, and the light transmittance of the transparent electrode 1b further improves. As a result, the transparent electrode 1b further improves the visibility of the display image serving as a base, and can be favorably applied as a transparent electrode for a touch panel. In addition, it can be applied as a transparent electrode for an enlarged touch panel.
- the transparent electrode 1b of the second modification may be combined with the configuration of the transparent electrode 1a of the first modification described with reference to FIG.
- the intermediate layer A described with reference to FIG. 2 is provided between the nitrogen-containing layer 3 and the electrode layer 5 in the transparent electrode 1b shown in FIG.
- FIG. 4 is a perspective view showing a schematic configuration of the touch panel 21 using the above-described transparent electrode for a touch panel.
- FIG. 5 is a plan view of the two transparent electrodes 1-1 and 1-2 showing the electrode configuration of the touch panel 21.
- the touch panel 21 shown in these drawings is a projected capacitive touch panel.
- the first transparent electrode 1-1 and the second transparent electrode 1-2 are arranged in this order on one main surface of the transparent substrate 11, and the upper part is covered with the front plate 13.
- Each of the first transparent electrode 1-1 and the second transparent electrode 1-2 is any of the transparent electrodes for a touch panel described with reference to FIG. 1 or FIG. Therefore, the first transparent electrode 1-1 is composed of the first nitrogen-containing layer 3-1 and the first electrode layer 5-1 laminated thereon.
- the second transparent electrode 1-2 is composed of a second nitrogen-containing layer 3-2 and a second electrode layer 5-2 laminated thereon.
- the transparent substrate 11 shown in FIGS. 4, 6, and 7 is the transparent substrate 11 described in the previous transparent electrode for a touch panel.
- the first nitrogen-containing layer 3-1 is the nitrogen-containing layer described in the previous transparent electrode for a touch panel, and is formed on one main surface of the transparent substrate 11.
- the first nitrogen-containing layer 3-1 is provided so as to cover the entire surface of one main surface of the transparent substrate 11. May be patterned in the same shape.
- the first electrode layer 5-1 is the electrode layer described in the previous transparent electrode for touch panel, and is configured as a plurality of x electrode patterns 5x1, 5x2,... Patterned on the first nitrogen-containing layer 3-1. Has been.
- Each of the x electrode patterns 5x1, 5x2,... Is arranged in parallel with an interval between each other in a state of extending in the x direction.
- Each of these x electrode patterns 5x1, 5x2,... Has, for example, a shape in which rhombus pattern portions arranged in the x direction are linearly connected in the x direction in the vicinity of the apex of the rhombus.
- x wirings 17x are connected to respective end portions of the x electrode patterns 5x1, 5x2,. These x wirings 17 x are wired in the peripheral area on the transparent substrate 11 and drawn out to the edge of the transparent substrate 11.
- Each of the x wirings 17x may be configured as the first electrode layer 5-1 mainly composed of silver, as in the case of the x electrode patterns 5x1, 5x2,. It may be composed of an electrode layer.
- the second nitrogen-containing layer 3-2 is the nitrogen-containing layer described in the previous transparent electrode for touch panel, and is formed on one main surface of the transparent substrate 11 so as to cover the first electrode layer 5-1. ing.
- the second nitrogen-containing layer 3-2 is provided so as to cover at least the first electrode layer 5-1, and expose at least the terminal portion of the x wiring 17x.
- the second nitrogen-containing layer 3-2 is provided in such a manner that the terminal portion of the x wiring 17x is exposed and the other portion covers the entire main surface of the transparent substrate 11. However, it may be patterned in the same shape as a second electrode layer 5-2 described below.
- the second electrode layer 5-2 is the electrode layer described in the previous transparent electrode for touch panel, and is configured as a plurality of y electrode patterns 5y1, 5y2,... Patterned on the second nitrogen-containing layer 3-2. Has been.
- Each of the y electrode patterns 5y1, 5y2,... Is arranged in parallel with a distance from each other in a state of extending in the y direction orthogonal to the x electrode patterns 5x1, 5x2,.
- Each of these y electrode patterns 5y1, 5y2,... Has, for example, a shape in which rhombus pattern portions arranged in the y direction are linearly connected in the y direction in the vicinity of the apex of the rhombus.
- the rhombus pattern portions constituting the respective y electrode patterns 5y1, 5y2,... are viewed in plan view with respect to the rhombus pattern portions forming the x electrode patterns 5x1, 5x2,. It is arranged at a position that does not overlap, and has a shape that occupies as large a range as possible without overlapping. Accordingly, in the central region of the transparent substrate 11, the x electrode patterns 5x1, 5x2,... Constituted by the first electrode layer 5-1, and the y electrode constituted by the second electrode layer 5-2. Patterns 5y1, 5y2,... Are difficult to visually recognize.
- Each y electrode pattern 5y1, 5y2,... Is stacked with each x electrode pattern 5x1, 5x2,.
- the second nitrogen-containing layer 3-2 is sandwiched between these laminated portions, and thereby the insulation between the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,. ing.
- a y wiring 17y is connected to each end of each y electrode pattern 5y1, 5y2,. These y wirings 17y are wired in the peripheral region on the transparent substrate 11, and are drawn out to the edge of the transparent substrate 11 so as to be aligned with the x wirings 17x.
- Each of such y wirings 17y may be configured as a second electrode layer 5-2 containing silver as a main component, similarly to the y electrode patterns 5y1, 5y2,. It may be composed of an electrode layer.
- a flexible printed circuit board or the like is connected to the x wiring 17x and the y wiring 17y drawn to the edge of the transparent substrate 11.
- the front plate 13 illustrated in FIGS. 4 and 7 is a plate material on which a portion corresponding to the input position on the touch panel 21 is pressed.
- a front plate 13 is a plate material having optical transparency, and the same material as the transparent substrate 11 is used. Further, the front plate 13 may be used by selecting a material having optical characteristics as required.
- Such a front plate 13 is attached to the second transparent electrode 1-2 side by, for example, an adhesive 15 (see FIG. 7).
- the material of the adhesive 15 is not particularly limited as long as it has light transparency.
- the front plate 13 is provided with a light-shielding film that covers the periphery of the transparent substrate 11, and is drawn from the x wiring 17x drawn from the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,.
- the y wiring 17y is prevented from being visually recognized from the front plate 13 side.
- the 1st transparent electrode 1-1 and the 2nd transparent electrode 1-2 may be comprised as the transparent electrode 1a for touchscreens demonstrated using FIG.
- the intermediate layer patterned in the same shape as the first electrode layer 5-1 is used as the first nitrogen-containing layer 3-1 and the first electrode layer 5. It can be held between -1.
- the intermediate layer patterned in the same shape as the second electrode layer 5-2 is replaced with the second nitrogen-containing layer 3-2 and the second electrode layer 5. Just hold it between -2.
- ⁇ Touch panel operation> When operating the touch panel 21 as described above, a voltage is applied to the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,... From a flexible printed circuit connected to the x wiring 17x and the y wiring 17y. Keep it. In this state, when a finger or a touch pen touches the surface of the front plate 13, the capacitance of each part existing in the touch panel 21 changes, and the voltages of the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,. It appears as a change. This change varies depending on the distance from the position touched by the finger or touch pen, and is greatest at the position touched by the finger or touch pen. For this reason, the position addressed by the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,.
- the touch panel 21 as described above uses, as the two-layer transparent electrodes 1-1 and 1-2, the transparent electrode for a touch panel having a low sheet resistance although it is the thin film described above. Thereby, the voltage drop of the transparent electrode for touch panels can be suppressed, and the touch panel 21 can be enlarged.
- the touch panel 21 is a projection capacitive type having x electrode patterns 5x1, 5x2,... And electrode patterns 5y1, 5y2,. Therefore, the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,.
- these x electrode patterns 5x1, 5x2,... And y electrode patterns 5y1, 5y2,... Are the electrode layers 5 of the transparent electrode for touch panel described above, they can be made thin while maintaining conductivity. is there. Therefore, the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,... Themselves are difficult to visually recognize, and deterioration of the visibility of the underlying display image through the touch panel 21 can be prevented.
- FIG. 8 is a schematic cross-sectional view for explaining Modification Example 1 of the touch panel of the present embodiment, and is a view corresponding to the AA cross section of FIG.
- the touch panel 23 shown in this figure has a configuration in which the two-layer transparent electrode 1b having the high refractive index layer H described with reference to FIG. 3 is provided on the transparent substrate 11, and the other configurations are the same as those in FIG. This is the same as the touch panel 21 of this embodiment described with reference to FIG. For this reason, the detailed description of the configuration of the touch panel 23 according to the first modification example uses the same cross-sectional views of FIGS. 4 to 6 and FIG. 8 as those used for the description of the touch panel 21 according to the present embodiment. The same reference numerals are given, and duplicate descriptions are omitted.
- the first transparent electrode 1b-1 and the second transparent electrode 1b-2 are arranged in this order on one main surface of the transparent substrate 11, and the upper portion is covered with the front plate 13. It has been broken.
- Each of the first transparent electrode 1b-1 and the second transparent electrode 1b-2 is a transparent electrode for a touch panel described with reference to FIG. Therefore, the first transparent electrode 1b-1 has a configuration in which the first high refractive index layer H-1, the first nitrogen-containing layer 3-1, and the first electrode layer 5-1 are laminated in this order. is there.
- the second transparent electrode 1-2 has a configuration in which a second high refractive index layer H-2, a second nitrogen-containing layer 3-2, and a second electrode layer 5-2 are laminated in this order. is there.
- Such a touch panel 23 is the touch panel 21 of the present embodiment only in the above laminated structure where the first high refractive index layer H-1 and the second high refractive index layer H-2 are provided. And different.
- the first high-refractive index layer H-1 (see FIG. 8) is the high-refractive index layer described above for the transparent electrode for a touch panel, and is formed on one main surface of the transparent substrate 11.
- the first high refractive index layer H-1 is provided so as to cover the entire main surface of the transparent substrate 11.
- the first high refractive index layer H-1 is provided together with the first nitrogen-containing layer 3-1. It may be patterned in the same shape as one electrode layer 5-1.
- the second high refractive index layer H-2 (see FIG. 8) is the high refractive index layer described above for the transparent electrode for touch panel, and covers the first electrode layer 5-1, and the transparent substrate 11 A film is formed on one main surface.
- Such a second high refractive index layer H-2 is provided so as to cover at least the terminal portion of the x wiring 17x while covering the first electrode layer 5-1.
- the second high-refractive index layer H-2 exposes the terminal portion of the x wiring 17x in the same manner as the second nitrogen-containing layer 3-2, and the other portion is one main surface of the transparent substrate 11. However, it may be patterned in the same shape as the second electrode layer 5-2 together with the second nitrogen-containing layer 3-2.
- touch panel 23 having the high refractive index layers H-1 and H-2 as described above can be operated in the same manner as the touch panel of the present embodiment.
- the touch panel 23 as described above uses, as the two-layer transparent electrodes 1b-1 and 1b-2, transparent electrodes for a touch panel having sufficient light conductivity as described above. Thereby, it is possible to suppress a voltage drop when the transparent electrode for the touch panel is enlarged while maintaining the visibility of the underlying display image, and to increase the size of the touch panel 23.
- the touch panel 23 is a projected capacitive type having x electrode patterns 5x1, 5x2,... And electrode patterns 5y1, 5y2,. Therefore, the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,.
- these x electrode patterns 5x1, 5x2,... And y electrode patterns 5y1, 5y2,... Are the electrode layers 5 of the transparent electrode for touch panel described above, they can be made thin while maintaining conductivity. is there. Therefore, the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,... Themselves are difficult to be visually recognized, and deterioration of the visibility of the underlying display image via the touch panel 23 can be prevented.
- FIG. 9 is a schematic cross-sectional view for explaining Modification Example 2 of the touch panel of the present embodiment, and corresponds to a cross section taken along the line AA of FIG.
- the touch panel 25 shown in this figure has a configuration in which a first transparent electrode 1b-1 and a second transparent electrode 1b-2 are provided on one main surface of two transparent substrates 11-1 and 11-2.
- the other configuration is the same as that of the present embodiment described above. For this reason, the same code
- the touch panel 25 according to the second modification includes a first transparent substrate 11-1 provided with the first transparent electrode 1b-1 and a second transparent substrate 11- provided with the second transparent electrode 1b-2. And 2. These transparent substrates 11-1 and 11-2 have the transparent electrodes 1b-1 and 1b-2 formed in the same direction, and the first transparent electrode 1b-1 is formed on the first transparent substrate 11-1. On the surface, the second transparent substrate 11-2 is placed so as to be positioned.
- the first transparent substrate 11-1 and the second transparent substrate 11-2 are the same transparent substrate 11 as described in the transparent electrode for touch panel. Further, each of the first transparent electrode 1b-1 and the second transparent electrode 1b-2 has the same configuration as that of the first modification described with reference to FIG.
- the high refractive index layers H-1 and H-2, the nitrogen-containing layers 3-1 and 3-2, and the electrode layers 5-1 and 5-2 are stacked in this order on the 11-2.
- each of the electrode layers 5-1, 5-2 is the same as that of the present embodiment described above, and the x electrode patterns 5x1, 5x2,.
- the y electrode patterns 5y1, 5y2,... Constituted by the two electrode layers 5-2 have a pattern configuration and an arrangement configuration that are hardly visible.
- the second transparent substrate 11-2, the second high refractive index layer H-2, and the second nitrogen-containing layer are provided between the first electrode layer 5-1 and the second electrode layer 5-2. Insulation is secured by 3-2.
- first transparent substrate 11-1 and second transparent substrate 11-2 are bonded together by an adhesive not shown here, and also by this adhesive.
- the first electrode layer 5-1 and the second electrode layer 5-2 are insulated.
- touch panel 25 as described above can be operated in the same manner as the touch panel of the present embodiment described above.
- the transparent electrode for a touch panel having sufficient conductivity as well as the light transmittance described above is used, so that it is the same as the touch panel of the present embodiment described above.
- the size of the display image can be increased, and the visibility of the underlying display image via the touch panel 25 can be prevented from being deteriorated.
- FIG. 10 is a schematic cross-sectional view for explaining a modification of the touch panel of the present embodiment described above, and corresponds to a cross section taken along the line AA in FIG.
- the touch panel 27 shown in this figure has a configuration in which the first transparent electrode 1b-1 and the second transparent electrode 1b-2 are provided on both surfaces of the transparent substrate 11, and the other configuration is the present embodiment described above. It is the same. For this reason, the same code
- the touch panel 27 of Modification 3 is provided on one transparent substrate 11, the first transparent electrode 1 b-1 provided on one main surface side of the transparent substrate 11, and the other main surface side of the transparent substrate 11.
- a second transparent electrode 1b-2 a second transparent electrode 1b-2.
- the first transparent electrode 1b-1 has a configuration in which a high refractive index layer H-1, a nitrogen-containing layer 3-1, and an electrode layer 5-1 are laminated on one main surface of the transparent substrate 11 in this order. is there.
- the second transparent electrode 1b-2 has a configuration in which a high refractive index layer H-2, a nitrogen-containing layer 3-2, and an electrode layer 5-2 are laminated in this order on the other main surface of the transparent substrate 11. is there.
- the transparent substrate 11 is the same as that described for the transparent electrode for touch panel. Further, each of the layers constituting the first transparent electrode 1b-1 and the second transparent electrode 1b-2 is the same as that of the first modification example, and each of them is a high refractive index layer in order from the transparent substrate 11 side. H-1, H-2, nitrogen-containing layers 3-1, 3-2, and electrode layers 5-1, 5-2 are stacked in this order.
- each of the electrode layers 5-1 and 5-2 is the same as that of the present embodiment described above, and the x electrode patterns 5 x 1, 5 x 2,.
- the y electrode patterns 5y1, 5y2,... Constituted by the two electrode layers 5-2 have a pattern configuration and an arrangement configuration that are hardly visible.
- the first electrode layer 5-1 and the second electrode layer 5-2 the first nitrogen-containing layer 3-1, the first high refractive index layer H-1, the transparent substrate 11, the first electrode layer 5-1 Insulation is secured by the second high refractive index layer H-2 and the second nitrogen-containing layer 3-2.
- touch panel 27 as described above can be operated in the same manner as the touch panel of the present embodiment described above.
- the transparent electrode for a touch panel having sufficient conductivity as well as the light transmittance described above is used, so that it is similar to the touch panel of the present embodiment described above.
- the size can be increased, and deterioration of the visibility of the underlying display image via the touch panel 27 can also be prevented.
- FIG. 11 is a schematic cross-sectional view for explaining Modification Example 4 of the touch panel of the present embodiment described above, and is a view corresponding to the BB cross section of FIG.
- the laminated structure of the touch panel 29 of Modification 4 and the laminated structure of the touch panel 21 shown in FIG. 6 are different as described below. That is, the touch panel 29 shown in FIG. 11 has a configuration in which the electrode layer 5 having both the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,.
- symbol is attached
- the touch panel 29 of Modification 4 includes a transparent substrate 11, and a transparent electrode 1 b having a high refractive index layer H, a nitrogen-containing layer 3, and an electrode layer 5 that are sequentially laminated on the transparent substrate 11, and further includes an electrode layer.
- An interlayer insulating film B and a connection electrode C are sequentially stacked on the substrate 5.
- the electrode layer 5 is characterized in that it has both x electrode patterns 5x1, 5x2,... And y electrode patterns 5y1, 5y2,.
- the transparent substrate 11, the high refractive index layer H, and the nitrogen-containing layer 3 are the same as the transparent electrode for a touch panel described with reference to FIG.
- the high refractive index layer H and the nitrogen-containing layer 3 are provided as an example so as to cover the entire surface of one main surface of the transparent substrate 11.
- the electrode layer 5 is provided. May be patterned in the same shape.
- the electrode layer 5 is the electrode layer described in the previous transparent electrode for a touch panel, and a plurality of x electrode patterns 5x1, 5x2,... Patterned on the nitrogen-containing layer 3 and a plurality of y electrode patterns 5y1, 5y2,. It is comprised.
- the x electrode patterns 5x1, 5x2,... are arranged in parallel while being spaced apart from each other, with each extending in the x direction.
- Each of these x electrode patterns 5x1, 5x2,... Has, for example, a shape in which rhombus pattern portions arranged in the x direction are linearly connected in the x direction in the vicinity of the apex of the rhombus. This is the same as this embodiment and the other modifications 1 to 3.
- Each of the y electrode patterns 5y1, 5y2,... Is arranged in parallel with a distance from each other in a state of extending in the y direction orthogonal to the x electrode patterns 5x1, 5x2,.
- Each of these y electrode patterns 5y1, 5y2,... Is composed of a plurality of patterns A arranged in the y direction.
- the pattern A is, for example, a rhombus, and is arranged with an interval enough to maintain an insulating state without overlapping with the x electrode patterns 5x1, 5x2,.
- the rhombus pattern A has a shape that occupies as large a range as possible within a range having an interval sufficient to maintain an insulation state with the x electrode patterns 5x1, 5x2,.
- connection electrode C is an electrode composed of a conductive layer different from the electrode layer 5, and the pattern A constituting each of the y electrode patterns 5 y 1, 5 y 2,..., For example, in the y direction near the apex of the rhombus pattern A Connect in a straight line. Further, the connection electrode C is disposed at each position where the connection electrode C intersects with a portion connecting the rhombus patterns of the x electrode patterns 5x1, 5x2,.
- the interlayer insulating film B covers a portion connecting the rhombic patterns of the x electrode patterns 5x1, 5x2,..., And the connection electrode C is formed on the interlayer insulating film B on the x electrode patterns 5x1, 5x2,. It is laminated through. Thereby, the insulation between the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,.
- a common electrode material such as silver or an electrode material having optical transparency such as ITO may be used. From the viewpoint of the visibility of the underlying display image through the touch panel 29, it is preferable. Uses an electrode material having optical transparency.
- connection electrode C is provided in the upper layer of the electrode layer 5
- the connection electrode C may be provided in the lower layer of the electrode layer 5.
- the transparent electrode 1b in which the high refractive index layer H, the nitrogen-containing layer 3, and the electrode layer 5 are laminated in this order on the transparent substrate 11, between the transparent substrate 11 and the high refractive index layer H, or A connection electrode C is provided between the high refractive index layer H and the nitrogen-containing layer 3.
- Such a connection electrode C and the pattern A constituting each of the y electrode patterns 5y1, 5y2,... Are connected via the high refractive index layer H and the nitrogen-containing layer 3 or the connection holes provided in the nitrogen-containing layer 3. Connected.
- connection electrode C is arranged at each position intersecting in plan view with a portion connecting the rhombic patterns of the x electrode patterns 5x1, 5x2,. At these intersections, the high refractive index layer H and the nitrogen-containing layer 3 or the nitrogen-containing layer 3 are sandwiched between the connecting electrode C and the portion connecting the rhombic patterns of the x electrode patterns 5x1, 5x2,. Will be. Therefore, also in the example in which the connection electrode C is provided in the lower layer of the electrode layer 5, the insulation between the x electrode patterns 5x1, 5x2,... And the y electrode patterns 5y1, 5y2,. It is in the state.
- touch panel 29 as described above can be operated in the same manner as the touch panel of the present embodiment.
- the transparent electrode for a touch panel having sufficient conductivity as well as the light transmittance described above is used, so that the touch panel 29 of the present embodiment described above is used.
- the size can be increased, and deterioration of the visibility of the underlying display image via the touch panel 29 can also be prevented.
- each touch panel using the transparent electrode 1b described with reference to FIG. 3 has been described.
- the touch panels of these modifications 1 to 4 may have a configuration in which the transparent electrode 1b is replaced with the transparent electrode 1 described with reference to FIG. 1 or the transparent electrode 1a described with reference to FIG.
- the touch panel of the present invention is not limited to the configuration of the above-described embodiment and modification example, and can be widely applied as long as the configuration uses a transparent electrode.
- the transparent electrode for the touch panel of the present invention is used as the transparent electrode. Should be used.
- the putter shape is not limited.
- the touch panel may be a resistance film type in which two transparent electrodes 1-1 and 1-2 each having a solid film-like electrode layer 5 are arranged with a spacer interposed therebetween. A capacity type may be used, and the effect of increasing the size can be obtained similarly.
- FIG. 12 is a perspective view showing the configuration of the display device of the present invention.
- the display device 31 shown in this figure is a display device with an information input function in which the touch panel of the present invention is provided on the display surface of the display panel 33.
- the touch panel of the present invention for example, the touch panel of any one of the present embodiment and the modified examples 1 to 4 is applied, but here, the touch panel 21 illustrated with reference to FIGS. 4 to 7 is representatively illustrated. .
- the display panel 33 is not particularly limited.
- the display panel 33 may be a flat display panel such as a liquid crystal display panel or a display panel using an organic electroluminescent element, or a CRT (Cathode Ray Tube) display. good.
- the display panel 33 is not limited to a display panel that displays moving images, and may be a display panel for still images.
- the touch panel 21 is placed on the image display surface of the display panel 33 so as to cover the display surface. Further, the touch panel 21 and the display panel 33 may be further accommodated in a frame-shaped case member 35 as necessary, and a front plate made of a transparent plate material may be further provided on the case member 35.
- the user can input the position information of the contact portion to the touch panel 21 by bringing a finger or a touch pen into contact with a part of the display image displayed on the display panel 33 via the touch panel 21. .
- the display device 31 having such a configuration can be thinned by using the touch panel 21 described above.
- transparent electrodes for the touch panel (hereinafter referred to as transparent electrodes) of Samples 1 to 27 were produced on a transparent substrate so as to have an area of 5 cm ⁇ 5 cm.
- a polyethylene terephthalate (PET) substrate was prepared as the transparent substrate.
- Table 2 below shows the configuration of each layer in each of the transparent electrodes of Samples 1 to 27. In the following, a procedure for producing each transparent electrode of Samples 1 to 27 will be described.
- the resistance heating boat was energized and heated, and the electrode layer made of silver was formed to 8 nm with a deposition rate of 0.1 nm / second to 0.2 nm / second. It was formed with a film thickness.
- ⁇ Preparation of transparent electrodes for samples 6 to 25> Referring to FIG. 1, in each of samples 6 to 25, a nitrogen-containing layer 3 (film thickness: 25 nm) using each compound shown in Table 2 below is formed on one main surface of transparent substrate 11 by vapor deposition. Subsequently, an electrode layer 5 (film thickness: 8 nm) made of silver (Ag) was formed by a vapor deposition method. Thereby, the transparent electrode 1 having a two-layer structure of the nitrogen-containing layer 3 and the electrode layer 5 was produced.
- the transparent substrate 11 was fixed to a base material holder of a commercially available vacuum deposition apparatus.
- the compounds shown in Table 2 below were placed in a tantalum resistance heating boat. These substrate holder and heating boat were attached to the first vacuum chamber of the vacuum deposition apparatus.
- silver (Ag) was put into the resistance heating boat made from tungsten, and it attached in the 2nd vacuum chamber.
- compounds No.-1 to No.-3 are shown below. Of these, Compound No.-1 is anthracene containing no nitrogen atom. Compounds No.-2 to No.-3 contain nitrogen, but the value of the effective unshared electron pair content [n / M] is [n / M] ⁇ 2.0 ⁇ 10 ⁇ 3 . In these compounds No.-2 to No.-3, a nitrogen atom having an [effective unshared electron pair] was marked with a circle.
- each of the compounds No. 1 to No. 16 and No. 18 are compounds containing nitrogen atoms exemplified in the present embodiment.
- Table 2 below also shows the number of effective unshared electron pairs [n], molecular weight [M], and effective unshared electron pair content [n / M] of the compounds used here.
- the heating boat containing each compound was energized and heated, and the transparent substrate 11 was deposited at a deposition rate of 0.1 nm / second to 0.2 nm / second.
- a nitrogen-containing layer 3 composed of each compound having a film thickness of 25 nm (underlayer containing no nitrogen in sample 6).
- the transparent substrate 11 formed up to the nitrogen-containing layer 3 (underlayer) is transferred to the second vacuum chamber while keeping the surroundings in a vacuum state, and the pressure in the second vacuum chamber is reduced to 4 ⁇ 10 ⁇ 4 Pa.
- the heating boat containing silver was energized and heated.
- an electrode layer 5 made of silver having a film thickness of 8 nm is formed at a deposition rate of 0.1 nm / second to 0.2 nm / second, and a laminated structure of the nitrogen-containing layer 3 (underlayer) and the upper electrode layer 5 is formed.
- Each transparent electrode 1 of Samples 6 to 25 consisting of was obtained.
- ⁇ Preparation of transparent electrodes of samples 26 to 27> Referring to FIG. 2, in each of samples 26 and 27, a nitrogen-containing layer 3 (film thickness: 25 nm) using compound No. 7 is formed on one main surface of transparent substrate 11 by vapor deposition. Then, an intermediate layer A made of each material was formed by a vapor deposition method, and then an electrode layer 5 (film thickness 8 nm) made of silver (Ag) was formed by the vapor deposition method. Thus, a transparent electrode 1a having a three-layer structure including the nitrogen-containing layer 3, the intermediate layer A, and the electrode layer 5 was produced.
- a step of depositing the intermediate layer A was added between the deposition of the nitrogen-containing layer 3 and the deposition of the electrode layer 5 described in the preparation of the transparent electrode of the sample 15.
- magnesium (Mg) was vapor-deposited with a thickness of 0.5 nm in sample 26
- anthracene was vapor-deposited with a thickness of 0.5 nm in sample 27.
- Example 1 As is clear from Table 2, the transparent electrodes of Samples 7 to 27, that is, the transparent electrode in which the electrode layer 5 mainly composed of silver is laminated on the nitrogen-containing layer 3 was made of silver having substantial conductivity. Although the electrode layer 5 is an ultra-thin film having a thickness of 8 nm, the sheet resistance value can be measured, and the electrode layer 5 is formed with a substantially uniform film thickness by single-layer growth type (Frank-van der Merwe: FM type) film growth. It was confirmed that This result was substantially the same for the transparent electrodes of Samples 26 and 27 in which the ultrathin intermediate layer A was provided between the nitrogen-containing layer 3 and the electrode layer 5.
- the transparent electrode having a single-layer structure using ITO of Sample 1 had a sheet resistance higher than that of the transparent electrodes of Samples 7 to 27 even though it was a 100 nm thick film.
- the transparent electrode having a single layer structure using silver nanowires of Samples 2 to 4 the value of the sheet resistance with respect to the film thickness is higher than that of the transparent electrodes of Samples 7 to 27, and in Sample 4 having the lowest sheet resistance, Character visibility was very low at 1.5 due to light scattering.
- the transparent electrodes of Samples 5 and 6 that is, a transparent electrode having a single-layer structure consisting only of an electrode layer made of silver without a nitrogen-containing layer, and an underlayer of Compound No.-1 (anthracene) containing no nitrogen atom
- the transparent electrode on which the electrode layer made of the material is laminated cannot measure the sheet resistance and cannot be used as an electrode.
- the transparent electrodes of samples 9 to 27, that is, the effective unshared electron pair content [n / M] is a predetermined range of 2.0 ⁇ 10 ⁇ 3 ⁇ [n / M] ⁇ 1.9 ⁇ 10 ⁇ 2 .
- the transparent electrode composed of a nitrogen-containing layer using the compounds No. 1 to No. 16 and No. 18 is an ultrathin electrode layer of 8 nm using silver that carries substantial conductivity. Sheet resistance is 45 ⁇ / sq. The value was as low as below. Thus, it was confirmed that the film was formed with a substantially uniform film thickness by single-layer growth type (Frank-van der Merwe: FM type) film growth.
- the transparent electrodes of Samples 9 to 27 in which the effective unshared electron pair content [n / M] is within a predetermined range also had a character visibility of 4.5 or more.
- FIG. 13 shows compounds No. 1 to No. in which the effective unshared electron pair content [n / M] is 2.0 ⁇ 10 ⁇ 3 ⁇ [n / M] ⁇ 1.9 ⁇ 10 ⁇ 2. .20 for a transparent electrode in which an electrode layer having a film thickness of 6 nm is provided on the upper part of the nitrogen-containing layer, the effective unshared electron pair content [n / M] of the compound constituting the nitrogen-containing layer, and each transparent electrode The graph which plotted the value of the sheet resistance measured about was shown.
- a thin film is obtained in order to obtain light transmissivity by selecting and using a compound constituting the nitrogen-containing layer provided adjacent to the electrode layer using the effective unshared electron pair content [n / M] as an index.
- an electrode film having low resistance that is, a transparent electrode
- the transparent electrodes for the touch panel (hereinafter referred to as transparent electrodes) having the high refractive index layers of Samples 206 to 334 were produced on a transparent substrate so as to have an area of 5 cm ⁇ 5 cm.
- a polyethylene terephthalate (PET) substrate was prepared as the transparent substrate.
- Table 3 below shows the configuration of each layer in each of the transparent electrodes of Samples 206 to 234 and the configuration of each layer in each of the transparent electrodes of Samples 1 to 5 prepared as a comparison in Example 1 described above.
- a procedure for producing each transparent electrode of Samples 206 to 234 will be described.
- a high refractive index layer made of titanium oxide (TiO 2 ) was formed with a thickness of 30 nm, and an electrode layer made of silver was formed thereon with a thickness of 8 nm. This produced the transparent electrode which consists of a laminated structure of the high refractive index layer and this upper electrode layer.
- the transparent substrate is fixed to a base material holder of a commercially available electron beam evaporation apparatus, titanium oxide (TiO 2 ) is put into a heating boat, and these substrate holder and heating boat are attached to a vacuum chamber of the electron beam evaporation apparatus. It was. Moreover, silver (Ag) was put into the resistance heating boat made from tungsten, and it attached to the vacuum chamber of the vacuum evaporation system.
- TiO 2 titanium oxide
- silver (Ag) was put into the resistance heating boat made from tungsten, and it attached to the vacuum chamber of the vacuum evaporation system.
- the heating boat containing titanium oxide is heated by irradiating the electron beam with a deposition rate of 0.1 nm / second to 0.2 nm / second.
- a high refractive index layer made of titanium oxide having a thickness of 30 nm was provided on the transparent substrate in seconds.
- the transparent substrate formed up to the high refractive index layer is transferred to a vacuum chamber of a vacuum evaporation apparatus, and the vacuum chamber is depressurized to 4 ⁇ 10 ⁇ 4 Pa, and then silver is added.
- the heated boat was energized and heated.
- an electrode layer made of silver having a film thickness of 8 nm was formed at a deposition rate of 0.1 nm / second to 0.2 nm / second.
- a high refractive index layer H made of titanium oxide (TiO 2 ) is formed on one main surface of transparent substrate 11 with a film thickness of 30 nm.
- a nitrogen-containing layer 3 using each of the compounds shown was formed by a vapor deposition method with each film thickness shown in Table 3 below.
- an electrode layer 5 made of silver (Ag) was formed by a vapor deposition method with each film thickness shown in Table 3 below.
- a transparent electrode 1b having a three-layer structure including a high refractive index layer H, a nitrogen-containing layer 3, and an electrode layer 5 was produced.
- an underlayer containing no nitrogen was formed instead of the nitrogen-containing layer.
- the transparent substrate 11 is fixed to a base material holder of a commercially available electron beam evaporation apparatus, titanium oxide (TiO 2 ) is put into a heating boat, and these substrate holder and heating boat are connected to a vacuum chamber of the electron beam evaporation apparatus. Attached to. Moreover, each compound shown in the following Table 3 was put into a resistance heating boat made of tantalum and attached to the first vacuum tank of the vacuum evaporation apparatus. Moreover, silver (Ag) was put into the resistance heating boat made from tungsten, and it attached in the 2nd vacuum chamber of a vacuum evaporation system.
- each of the compounds No. 1 to No. 18 is a compound containing a nitrogen atom exemplified in this embodiment.
- Table 3 below also shows the number of effective unshared electron pairs [n], molecular weight [M], and effective unshared electron pair content [n / M] of the compounds used here.
- the heating boat containing titanium oxide was heated by irradiating the electron beam with a deposition rate of 0.1 nm / second to 0.2 nm.
- a high refractive index layer H made of titanium oxide having a thickness of 30 nm was provided on the transparent substrate at a rate of / sec.
- the transparent substrate formed up to the high refractive index layer was transferred to the first vacuum chamber of the vacuum evaporation apparatus, and after reducing the first vacuum chamber to 4 ⁇ 10 ⁇ 4 Pa, The heating boat containing the compound was energized and heated.
- the nitrogen-containing layer 3 (underlayer containing no nitrogen in the sample 207) composed of each compound of each film thickness on the high refractive index layer H at a deposition rate of 0.1 nm / second to 0.2 nm / second.
- the transparent substrate 11 formed up to the nitrogen-containing layer 3 (underlayer) was transferred to the second vacuum chamber, and the second vacuum chamber was depressurized to 4 ⁇ 10 ⁇ 4 Pa.
- the heating boat containing silver was energized and heated.
- an electrode layer 5 made of silver having a film thickness of 8 nm was formed at a deposition rate of 0.1 nm / second to 0.2 nm / second, and the high refractive index layer H, the nitrogen-containing layer 3 (underlayer), and the electrode layer 5 Samples 207 to 231 having the laminated structure were obtained.
- Example 2 ⁇ Evaluation of each sample of Example 2> For each of the transparent electrodes of Samples 206 to 234 produced in Example 2, sheet resistance (surface resistance) and character visibility were evaluated in the same manner as in Example 1. These evaluation results are shown in Table 3 below together with the evaluation results of Samples 1 to 5 as comparative examples prepared in Example 1.
- Example 2> As is apparent from Table 3, the transparent electrodes of the samples 208 to 234, that is, the transparent electrode 1b in which the high refractive index layer H, the nitrogen-containing layer 3, and the electrode layer 5 are laminated in this order bear substantial conductivity.
- the electrode layer 5 using silver is an extremely thin film of 8 nm or 10 nm, it is possible to measure the sheet resistance value, and it is almost uniform by film growth of a single layer growth type (Frank-van der Merwe: FM type). It was confirmed that the film was formed with a film thickness.
- the transparent electrode having a single layer structure using ITO of Sample 1 had a sheet resistance higher than that of the transparent electrodes of Samples 208 to 234 even though it was a 100 nm thick film.
- the value of the sheet resistance with respect to the film thickness is higher than that of the transparent electrodes of Samples 208 to 234, and in Sample 4 having the lowest sheet resistance, Character visibility was very low at 1.5 due to light scattering.
- the transparent electrode of Samples 5, 206, 207 that is, a transparent electrode having a single-layer structure consisting only of an electrode layer made of silver without a nitrogen-containing layer, and an electrode made of silver on the high refractive index layer without interposing a nitrogen-containing layer
- a transparent electrode in which layers are laminated, and a transparent electrode in which a high refractive index layer, an underlayer of Compound No.-1 (anthracene) containing no nitrogen atom, and an electrode layer made of silver are sequentially laminated are measured for sheet resistance. Cannot be used as an electrode.
- the transparent electrodes of the samples 212 to 234, that is, the effective unshared electron pair content [n / M] is in a predetermined range of 2.0 ⁇ 10 ⁇ 3 ⁇ [n / M] ⁇ 1.9 ⁇ 10 ⁇ 2 .
- the transparent electrode comprising a nitrogen-containing layer using the compounds No. 1 to No. 18 is a sheet, although the electrode layer using silver responsible for substantial conductivity is an extremely thin film of 8 nm or 10 nm. Resistance is 76 ⁇ / sq. The value was as low as below. Thus, it was confirmed that the film was formed with a substantially uniform film thickness by single-layer growth type (Frank-van der Merwe: FM type) film growth.
- the transparent electrodes of Samples 212 to 234 in which the effective unshared electron pair content [n / M] is within a predetermined range also had a character visibility of 4.5 or more.
- the transparent electrodes of Samples 208 to 210 differ only in the thickness of the nitrogen-containing layer.
- the transparent electrodes of Samples 209 and 210 in which the thickness of the nitrogen-containing layer is 5 nm or less are visually recognized.
- the property was good with 3.6 or more.
- the sheet resistance value was comparable for all the transparent electrodes.
- Transparent electrode for touch panel (transparent electrode) 1-1, 1b-1 ... 1st transparent electrode 1-2, 1b-2 ... 2nd transparent electrode 3 ... Nitrogen containing layer 3-1 ... 1st nitrogen containing layer 3-2 ... 2nd nitrogen containing Layer 5 ... Electrode layer 5-1 ... First electrode layer 5-2 ... Second electrode layer 5x1, 5x2, 5x3, ... x electrode pattern (first electrode layer) 5y1, 5y2, 5y3,... Y electrode pattern (second electrode layer) 21, 23, 25, 27, 29 ... touch panel 31 ... display device 33 ... display panel A ... intermediate layer H ... high refractive index layer H-1 ... first high refractive index layer H-2 ... second high refractive index layer
Abstract
Description
1.タッチパネル用透明電極
2.タッチパネル用透明電極の変形例1(中間層を設けた例)
3.タッチパネル用透明電極の変形例2(高屈折率層を設けた例)
4.タッチパネル(透明基板上に二層の透明電極を設けた構成1)
5.タッチパネルの変形例1(透明基板上に二層の透明電極を設けた構成2)
6.タッチパネルの変形例2(2枚の透明基板を用いた構成)
7.タッチパネルの変形例3(透明基板の両面に一層ずつ透明電極を設けた構成)
8.タッチパネルの変形例4(透明基板の同一平面上に2パターンの透明電極を設けた構成)
9.表示装置(タッチパネルを用いた構成)
図1は、本発明の一実施形態のタッチパネル用透明電極(以下、透明電極と称する)の構成を示す断面模式図である。この図に示すように、透明電極1は、窒素含有層3と電極層5とを積層した2層構造であり、例えば透明基板11の上部に、窒素含有層3、電極層5の順に設けられている。このうち、透明電極1における実質的な電極部分を構成する電極層5は、銀(Ag)を主成分として構成された層であり、ここでは窒素含有層3に隣接した状態で積層されている。一方、電極層5に隣接して配置された窒素含有層3は、電極層5を構成する主材料である銀と安定的に結合する窒素原子(N)を含有する化合物を用いて構成されていることを特徴としている。
本発明の透明電極1が形成される透明基板11は、例えば表示パネルの前面板を兼ねるものであっても良い。このような透明基板11としては、例えばガラス、石英、透明樹脂フィルムである。
窒素含有層3は、電極層5に積層して設けられた層であり、ここでは電極層5に対して隣接して設けられている。このような窒素含有層3は、窒素原子(N)を含有する化合物を用いて構成されている。窒素原子を含有する化合物としては、次のような[化合物1~3]が例示される。
窒素含有層3を構成する化合物の一例として、当該化合物に含有される窒素原子のうち、特に電極層5を構成する主材料である銀と安定的に結合する窒素原子の非共有電子対を[有効非共有電子対]とし、この[有効非共有電子対]の含有率が所定範囲である化合物が好ましく用いられる。
窒素含有層3を構成する化合物の他の例として、以上のような有効非共有電子対含有率[n/M]が上述した所定範囲である化合物の他、その成膜性の観点から、以降に説明する一般式(1)~(6)で表される化合物が用いられる。
窒素含有層3を構成する化合物のさらに他の例として、以上のような一般式(1)~(6)で表される化合物の他、下記に具体例を示す化合物1~118が例示される。これらの化合物は、化合物の安定性が高いため、好ましい。尚、これらの化合物1~118の中には、上述した有効非共有電子対含有率[n/M]の範囲に当てはまる化合物も含まれ、このような化合物であれば単独で窒素含有層3を構成する化合物として好ましく用いられる。さらに、これらの化合物1~118の中には、上述した一般式(1)~(6)に当てはまる化合物もある。
以下に代表的な化合物の合成例として、化合物5の具体的な合成例を示すが、これに限定されない。
窒素雰囲気下、2,8-ジブロモジベンゾフラン(1.0モル)、カルバゾール(2.0モル)、銅粉末(3.0モル)、炭酸カリウム(1.5モル)を、DMAc(ジメチルアセトアミド)300ml中で混合し、130℃で24時間撹拌した。これによって得た反応液を室温まで冷却後、トルエン1Lを加え、蒸留水で3回洗浄し、減圧雰囲気下において洗浄物から溶媒を留去し、その残渣をシリカゲルフラッシュクロマトグラフィー(n-ヘプタン:トルエン=4:1~3:1)にて精製し、中間体1を収率85%で得た。
室温、大気下で中間体1(0.5モル)をDMF(ジメチルホルムアミド)100mlに溶解し、NBS(N-ブロモコハク酸イミド)(2.0モル)を加え、一晩室温で撹拌した。得られた沈殿を濾過し、メタノールで洗浄し、中間体2を収率92%で得た。
窒素雰囲気下、中間体2(0.25モル)、2-フェニルピリジン(1.0モル)、ルテニウム錯体[(η6-C6H6)RuCl2]2(0.05モル)、トリフェニルホスフィン(0.2モル)、炭酸カリウム(12モル)を、NMP(N-メチル-2-ピロリドン)3L中で混合し、140℃で一晩撹拌した。
以上のような窒素含有層3が透明基板11上に成膜されたものである場合、その成膜方法としては、塗布法、インクジェット法、コーティング法、ディップ法などのウェットプロセスを用いる方法や、蒸着法(抵抗加熱、EB法など)、スパッタ法、CVD法などのドライプロセスを用いる方法などが挙げられる。なかでも蒸着法が好ましく適用される。
電極層5は、銀を主成分として構成された層であって、銀または銀を主成分とした合金を用いて構成され、窒素含有層3に隣接して成膜された層である。このような電極層5の成膜方法としては、塗布法、インクジェット法、コーティング法、ディップ法などのウェットプロセスを用いる方法や、蒸着法(抵抗加熱、EB法など)、スパッタ法、CVD法などのドライプロセスを用いる方法などが挙げられる。なかでも蒸着法が好ましく適用される。また電極層5は、窒素含有層3上に成膜されることにより、成膜後の高温アニール処理等がなくても十分に導電性を有することを特徴とするが、必要に応じて、成膜後に高温アニール処理等を行ったものであっても良い。
以上のように構成された透明電極1は、窒素原子を含有する化合物を用いて構成された窒素含有層3に隣接させて、銀を主成分とした電極層5を設けた構成である。これにより、窒素含有層3に隣接させて電極層5を成膜する際には、電極層5を構成する銀原子が窒素含有層3を構成する窒素原子を含んだ化合物と相互作用し、銀原子の窒素含有層3表面においての拡散距離が減少し、銀の凝集が抑えられる。このため、一般的には核成長型(Volumer-Weber:VW型)での膜成長により島状に孤立し易い銀薄膜が、単層成長型(Frank-van der Merwe:FM型)の膜成長によって成膜されるようになる。したがって、窒素含有層3上には、薄い膜厚でありながらも均一な膜厚の銀を主成分とする電極層5が得られるようになり、薄い膜厚であることで光透過性を確保しつつも、均一な膜厚であることで導電性が確保された銀を主成分とする電極層5を得ることができる。
(中間層を設けた例)
図2は、本実施形態のタッチパネル用透明電極の変形例1を説明するための断面模式図である。この図に示すように、変形例1の透明電極1aは、窒素含有層3と電極層5とが中間層Aを介して積層された構成であり、中間層A以外の構成は図1を用いて説明した本実施形態のタッチパネル用透明電極と同様である。このため、ここでは中間層Aの構成のみを説明する。
中間層Aは、窒素含有層3および電極層5に接した状態で、これらの層間に設けられている。この中間層Aは、透明電極1aの光透過性を阻害することなく、かつ窒素含有層3に含有されている窒素原子の電極層5への影響を阻害することのない程度に十分に薄い膜厚であることが重要である。このため、このような中間層Aは、1nm以下の膜厚であって良く、連続した膜として構成されている必要はなく、島状であったり、複数の孔を有する形状であっても良い。この場合、中間層Aを介して積層された窒素含有層3と電極層5とは、一部分が隣接して配置されることになる。
以上のような透明電極1aであっても、上述した本実施形態の透明電極と同様に、ITOを用いた透明電極と比較して薄膜でありながらもシート抵抗が低く、さらに金属ナノワイヤーとは異なり均質な窒素含有層3と中間層Aと電極層5との積層構造であるため、光散乱も抑えられたものとなる。この結果、透明電極1aは、タッチパネル用の透明電極として下地の表示画像の視認性を阻害することのないものとなり、また大型化されたタッチパネル用の透明電極として適用可能なものとなる。
(高屈折率層を設けた例)
図3は、本実施形態のタッチパネル用透明電極の変形例2を説明するための断面模式図である。この図に示すように、変形例2の透明電極1bは、電極層5との間に窒素含有層3を狭持する高屈折率層Hを設けた構成であり、透明基板11側から、高屈折率層H、窒素含有層3、電極層5がこの順に積層された構成である。このような透明電極1bにおいて、高屈折率層H以外の構成は図1を用いて説明した本実施形態のタッチパネル用透明電極と同様である。このため、ここでは高屈折率層Hの構成を中心に、透明電極1bの構成を説明する。
高屈折率層Hは、上層の窒素含有層3よりも高い屈折率を有する層である。高屈折率層Hの波長550nmにおける屈折率が、窒素含有層3の屈折率(n=1.7~1.8)より0.1以上高いと好ましく、0.3以上高いとさらに好ましい。このような高屈折率層Hは、先に説明した高い屈折率と、光透過性とを有する材料で構成され、例えば、酸化チタン(TiO2:n=2.3~2.4)、酸化ジルコニウム(ZrO:n=2.4)、酸化カドミウム(CdO:n=2.49)、酸化インジウムスズ(ITO:n=2.1~2.2)、酸化ハフニウム(HfO2:n=1.9~2.1)、五酸化タンタル(Ta2O5:n=2.16)、酸化ニオブ(Nb2O5:n=2.2~2.4)等の光学フィルムに一般的に用いられる高屈折率材料が用いられる。
以上のような透明電極1bであっても、上述した本実施形態の透明電極と同様に、ITOを用いた透明電極と比較して薄膜でありながらもシート抵抗が低く、さらに均質な高屈折率層Hと窒素含有層3と電極層5との積層構造であるため、光散乱も抑えられたものとなる。さらに、透明電極1bは、高屈折率層Hを有する構成であり、高屈折率層H、窒素含有層3、および電極層5がこの順に積層されている。これにより、銀を主成分とする電極層5においての反射が抑制され、透明電極1bの光透過性がさらに向上する。この結果、透明電極1bは、下地となる表示画像の視認性をさらに良好とするものであり、タッチパネル用の透明電極として良好に適用できる。また、大型化されたタッチパネル用の透明電極として適用可能なものとなる。
(透明基板上に二層の透明電極を設けた構成1)
図4は、上述したタッチパネル用透明電極を用いたタッチパネル21の概略構成を示す斜視図である。また図5は、タッチパネル21の電極構成を示す2枚の透明電極1-1,1-2の平面図である。
図4,図6,および図7に示す透明基板11は、先のタッチパネル用透明電極で説明した透明基板11である。
第1の窒素含有層3-1は、先のタッチパネル用透明電極で説明した窒素含有層であり、透明基板11の一主面に成膜されている。ここでは一例として、第1の窒素含有層3-1は、透明基板11の一主面の全面を覆う状態で設けられていることとするが、次に説明する第1の電極層5-1と同一形状にパターニングされていても良い。
第1の電極層5-1は、先のタッチパネル用透明電極で説明した電極層であり、第1の窒素含有層3-1上においてパターニングされた複数のx電極パターン5x1,5x2,…として構成されている。各x電極パターン5x1,5x2,…は、それぞれがx方向に延設された状態で、互いに間隔を保って並列に配置されている。これらの各x電極パターン5x1,5x2,…は、例えばx方向に配列されたひし形のパターン部分を、ひし形の頂点付近においてx方向に直線状に連結した形状であることとする。
第2の窒素含有層3-2は、先のタッチパネル用透明電極で説明した窒素含有層であり、第1の電極層5-1を覆う状態で、透明基板11の一主面に成膜されている。このような第2の窒素含有層3-2は、第1の電極層5-1を覆いつつ、少なくともx配線17xの端子部分を露出する状態で設けられていることとする。ここでは一例として、第2の窒素含有層3-2は、x配線17xの端子部分を露出させ、他の部分は透明基板11の一主面の全面を覆う状態で設けられていることとするが、次に説明する第2の電極層5-2と同一形状にパターニングされていても良い。
第2の電極層5-2は、先のタッチパネル用透明電極で説明した電極層であり、第2の窒素含有層3-2上においてパターニングされた複数のy電極パターン5y1,5y2,…として構成されている。各y電極パターン5y1,5y2,…は、それぞれがx電極パターン5x1,5x2,…と直交するy方向に延設された状態で、互いに間隔を保って並列に配置されている。これらの各y電極パターン5y1,5y2,…は、例えばy方向に配列されたひし形のパターン部分を、ひし形の頂点付近においてy方向に直線状に連結した形状であることとする。
図4および図7に図示した前面板13は、タッチパネル21において入力位置に対応する部分が押し圧される板材である。このような前面板13は、光透過性を有する板材であって、透明基板11と同様のものが用いられる。またこの前面板13は、必要に応じた光学特性を備えた材料を選択して用いても良い。このような前面板13は、例えば接着剤15に(図7参照)よって第2の透明電極1-2側に張り合わせられていることとする。この接着剤15は、光透過性を有するものであれば特に材料が限定されることはない。
以上のようなタッチパネル21を動作させる場合、x配線17xおよびy配線17yに接続させたフレキシブルプリント基板などから、x電極パターン5x1,5x2,…およびy電極パターン5y1,5y2,…対して電圧を印加しておく。この状態で、前面板13の表面に指またはタッチペンが触れると、タッチパネル21内に存在する各部の容量が変化し、x電極パターン5x1,5x2,…およびy電極パターン5y1,5y2,…の電圧の変化となって現れる。この変化は、指またはタッチペンが触れた位置からの距離によって異なり、指またはタッチペンが触れた位置で最も大きくなる。このため、電圧の変化が最大となる、x電極パターン5x1,5x2,…およびy電極パターン5y1,5y2,…でアドレスされた位置が、指またはタッチペンが触れた位置として検出される。
以上のようなタッチパネル21は、2層の透明電極1-1,1-2として、先に説明した薄膜でありながらもシート抵抗が低いタッチパネル用透明電極を用いている。これにより、タッチパネル用透明電極の電圧降下を抑えることができ、タッチパネル21の大型化が可能である。
(透明基板上に二層の透明電極を設けた構成2)
図8は、本実施形態のタッチパネルの変形例1を説明するための断面模式図であり、図6のA-A断面に相当する図である。この図に示すタッチパネル23は、透明基板11上に、図3を用いて説明した高屈折率層Hを有する二層の透明電極1bを設けた構成であり、それ以外の構成は先の図4~図7を用いて説明した本実施形態のタッチパネル21と同様である。このため本変形例1のタッチパネル23の構成の詳細な説明は、本実施形態のタッチパネル21の説明に用いたと同様の図4~図6、および図8の断面図を用い、同様の構成には同様の符号を付し、重複する説明は省略する。
第1の高屈折率層H-1(図8参照)は、先のタッチパネル用透明電極で説明した高屈折率層であり、透明基板11の一主面に成膜されている。ここでは一例として、第1の高屈折率層H-1は、透明基板11の一主面の全面を覆う状態で設けられていることとするが、第1の窒素含有層3-1と共に第1の電極層5-1と同一形状にパターニングされていても良い。
第2の高屈折率層H-2(図8参照)は、先のタッチパネル用透明電極で説明した高屈折率層であり、第1の電極層5-1を覆う状態で、透明基板11の一主面に成膜されている。このような第2の高屈折率層H-2は、第1の電極層5-1を覆いつつ、少なくともx配線17xの端子部分を露出する状態で設けられていることとする。ここでは一例として、第2の高屈折率層H-2は、第2の窒素含有層3-2と同様にx配線17xの端子部分を露出させ、他の部分は透明基板11の一主面の全面を覆う状態で設けられていることとするが、第2の窒素含有層3-2と共に第2の電極層5-2と同一形状にパターニングされていても良い。
以上のようなタッチパネル23は、2層の透明電極1b-1,1b-2として、先に説明した光透過性と共に充分な導電性を備えたタッチパネル用透明電極を用いている。これにより、下地の表示画像の視認性を良好に保ちつつ、タッチパネル用透明電極を大型化した際の電圧降下を抑えることができ、タッチパネル23の大型化をすることが可能となる。
(2枚の透明基板を用いた構成)
図9は、本実施形態のタッチパネルの変形例2を説明するための断面模式図であり、図6のA-A断面に相当する図である。この図に示すタッチパネル25は、2枚の透明基板11-1,11-2の一主面上に、第1の透明電極1b-1および第2の透明電極1b-2を設けた構成であり、それ以外の構成は先に説明した本実施形態と同様である。このため、本実施形態のタッチパネルと同様の構成には同様の符号を付し、重複する説明は省略する。
このような変形例2のタッチパネル25であっても、先に説明した光透過性と共に充分な導電性を備えたタッチパネル用透明電極を用いたことにより、先に説明した本実施形態のタッチパネルと同様に大型化が可能であり、タッチパネル25を介しての下地の表示画像の視認性を劣化させることをも防止できる。
(透明基板の両面に一層ずつ透明電極を設けた構成)
図10は、先に説明した本実施形態のタッチパネルの変形例を説明するための断面模式図であり、図6のA-A断面に相当する図である。この図に示すタッチパネル27は、透明基板11の両面に第1の透明電極1b-1および第2の透明電極1b-2を設けた構成であり、それ以外の構成は先に説明した本実施形態と同様である。このため、本実施形態のタッチパネルと同様の構成には同様の符号を付し、重複する説明は省略する。
このような変形例3のタッチパネル27あっても、先に説明した光透過性と共に充分な導電性を備えたタッチパネル用透明電極を用いたことにより、先に説明した本実施形態のタッチパネルと同様に大型化が可能であり、タッチパネル27を介しての下地の表示画像の視認性を劣化させることをも防止できる。
(透明基板の同一平面上に2パターンの透明電極を設けた構成)
図11は、先に説明した本実施形態のタッチパネルの変形例4を説明するための断面模式図であり、図6のB-B断面に相当する図である。ただし、変形例4のタッチパネル29の積層構造と、図6に示したタッチパネル21の積層構造とは、次に説明するとおりに異なる。すなわち図11に示すタッチパネル29は、透明基板11の同一平面上にx電極パターン5x1,5x2,…とy電極パターン5y1,5y2,…との両方を有する電極層5を設けた構成である。ここでは、先に説明した本実施形態のタッチパネルと同様の構成には同様の符号を付し、重複する説明は省略する。
透明基板11、高屈折率層H、および窒素含有層3は、それぞれ先の図3を用いて説明したタッチパネル用透明電極と同様のものである。また高屈折率層Hおよび窒素含有層3は、一例として、透明基板11の一主面の全面を覆う状態で設けられていることとするが、先の変形例1と同様に、電極層5と同一形状にパターニングされていても良い。
電極層5は、先のタッチパネル用透明電極で説明した電極層であり、窒素含有層3上においてパターニングされた複数のx電極パターン5x1,5x2,…と複数のy電極パターン5y1,5y2,…とを有して構成されている。
接続電極Cは、電極層5とは別の導電層で構成された電極であり、各y電極パターン5y1,5y2,…を構成するパターンAを、例えばひし形のパターンAの頂点付近においてy方向に直線状に連結する。またこの接続電極Cは、x電極パターン5x1,5x2,…のひし形のパターンを連結する部分と平面視的に交差する各位置に配置される。これらの交差部分において、層間絶縁膜Bがx電極パターン5x1,5x2,…のひし形のパターンを連結する部分を覆っており、接続電極Cはx電極パターン5x1,5x2,…上に層間絶縁膜Bを介して積層される。これにより、x電極パターン5x1,5x2,…とy電極パターン5y1,5y2,…との絶縁性が確保された状態となっている。なお接続電極Cには、銀等の一般的な電極材料、またはITO等の光透過性を有する電極材料を用いればよく、タッチパネル29を介しての下地の表示画像の視認性の観点から、好ましくは光透過性を有する電極材料を用いる。
このような変形例2のタッチパネル29あっても、先に説明した光透過性と共に充分な導電性を備えたタッチパネル用透明電極を用いたことにより、先に説明した本実施形態のタッチパネルと同様に大型化が可能であり、タッチパネル29を介しての下地の表示画像の視認性を劣化させることをも防止できる。
(タッチパネルを用いた構成)
図12は、本発明の表示装置の構成を示す斜視図である。この図に示す表示装置31は、表示パネル33における表示面上に、本発明のタッチパネルを設けた情報入力機能付きの表示装置である。本発明のタッチパネルとしては、例えば本実施形態および変形例1~4の何れかのタッチパネルが適用されるが、ここでは代表して図4~図7を用いて説明したタッチパネル21として図示している。
このような構成の表示装置31は、上述したタッチパネル21を用いたことにより、薄型化が可能である。
ここでは、試料1~27の各タッチパネル用透明電極(以下、透明電極と称する)を、面積が5cm×5cmとなるように透明基板上に作製した。透明基板としては、ポリエチレンテレフタレート(PET)基板を用意した。下記表2には、試料1~27の各透明電極における各層の構成を示した。以下に、試料1~27の各透明電極の作製手順を説明する。
透明基板の一主面上に、ITO膜(膜厚100nm)をスパッタ法によって形成した。これにより、ITO膜を電極層とした単層構造の透明電極を作製した。
試料2~4のそれぞれにおいて、透明基板の一主面上に、銀ナノワイヤーを用いた電極層を塗布法によって形成した。これにより銀ナノワイヤーを用いた電極層のみの単層構造の透明電極を作製した。この際、銀ナノワイヤーの分散液を塗布し、その後乾燥処理した後の膜厚が、試料2では50nm、試料3では150nm、試料4では200nmとなるように銀ナノワイヤー分散液の塗布膜厚を調整した。
透明基板の一主面上に、銀(Ag)からなる電極層(膜厚8nm)を蒸着法によって形成した。これにより、銀を電極層5に用いた単層構造の透明電極を作製した。この際、市販の真空蒸着装置の基材ホルダーに固定し、真空蒸着装置の真空槽に取り付けた。またタングステン製の抵抗加熱ボートに銀(Ag)を入れ、当該真空槽内に取り付けた。次に、真空槽を4×10-4Paまで減圧した後、抵抗加熱ボートを通電して加熱し、蒸着速度0.1nm/秒~0.2nm/秒で、銀からなる電極層を8nmの膜厚で形成した。
図1を参照し、試料6~25のそれぞれにおいて、透明基板11の一主面上に、下記表2に示した各化合物を用いた窒素含有層3(膜厚25nm)を蒸着法によって形成し、これに続けて銀(Ag)からなる電極層5(膜厚8nm)を蒸着法によって形成した。これにより、窒素含有層3と電極層5との2層構造の透明電極1を作製した。
<試料26~27の透明電極の作製>
図2を参照し、試料26,27のそれぞれにおいて、透明基板11の一主面上に、化合物No.7を用いた窒素含有層3(膜厚25nm)を蒸着法によって形成し、これに続けて各材料からなる中間層Aを蒸着法によって形成し、さらに続けて銀(Ag)からなる電極層5(膜厚8nm)を蒸着法によって形成した。これにより、窒素含有層3と中間層Aと電極層5との3層構造の透明電極1aを作製した。
上記で作製した試料1~27の各透明電極について、シート抵抗(面抵抗)、および文字の視認性を評価した。シート抵抗の測定は、抵抗率計(三菱化学社製MCP-T610)を用い、4端子4探針法定電流印加方式で行った。文字の視認性は、文字を表した画像の上部に透明電極が形成された透明基板を重ね合わせ、これらを介しての文字の見えやすさを5段階評価した。5段階評価は、透明電極の電極面に対する方線方向を0°とし、0°と45°の2つの角度から行い、これらの平均値を評価結果として算出した。これらの評価結果を下記表2に合わせて示す。
表2から明らかなように、試料7~27の透明電極、すなわち窒素含有層3に銀を主成分とする電極層5を積層させた透明電極は、実質的な導電性を担う銀を用いた電極層5が8nmと極薄膜でありながらも、シート抵抗値の測定が可能であり、単層成長型(Frank-van der Merwe:FM型)の膜成長によってほぼ均一な膜厚で形成されていることが確認された。この結果は、窒素含有層3と電極層5との間に、極薄膜の中間層Aを設けた試料26,27の透明電極であってもほぼ同様であった。
試料206~334の、高屈折率層を有する各タッチパネル用透明電極(以下、透明電極と称する)を、面積が5cm×5cmとなるように透明基板上に作製した。透明基板としては、ポリエチレンテレフタレート(PET)基板を用意した。下記表3には、試料206~234の各透明電極における各層の構成、および先の実施例1で比較として作製した試料1~5の各透明電極における各層の構成を示した。以下に、試料206~234の各透明電極の作製手順を説明する。
透明基板の一主面上に、酸化チタン(TiO2)からなる高屈折率層を30nmの膜厚で形成し、この上部に銀からなる電極層を8nmの膜厚で形成した。これにより、高屈折率層とこの上部の電極層との積層構造からなる透明電極を作製した。
図3を参照し、試料207~231のそれぞれにおいて、透明基板11の一主面上に、酸化チタン(TiO2)からなる高屈折率層Hを30nmの膜厚で形成し、下記表3に示した各化合物を用いた窒素含有層3を下記表3に示した各膜厚で蒸着法によって形成した。これに続けて銀(Ag)からなる電極層5を下記表3に示した各膜厚で蒸着法によって形成した。これにより、高屈折率層H、窒素含有層3、および電極層5の3層構造の透明電極1bを作製した。尚、試料207では、窒素含有層に換えて窒素を含有しない下地層を形成した。
高屈折率層Hとして下記表3に示した各化合物を用いたこと以外は、上記試料230と同様の手順で試料232~234の各透明電極1bを得た。
実施例2で作製した試料206~234の各透明電極について、実施例1と同様にシート抵抗(面抵抗)、および文字の視認性を評価した。これらの評価結果を、実施例1で作製した比較例としての試料1~5の評価結果と共に、下記表3に合わせて示す。
表3から明らかなように、試料208~234の透明電極、すなわち高屈折率層Hと窒素含有層3と電極層5とをこの順に積層させた透明電極1bは、実質的な導電性を担う銀を用いた電極層5が8nmまたは10nmと極薄膜でありながらも、シート抵抗値の測定が可能であり、単層成長型(Frank-van der Merwe:FM型)の膜成長によってほぼ均一な膜厚で形成されていることが確認された。
実施例1で作製した試料7~27の各透明電極、および実施例2で作製した試料208~234の各透明電極を2枚重ねて簡易式の各タッチパネルを作製した。
作製した各タッチパネルについて、実施例1と同様の方法で文字の視認性を評価した。この結果、試料7~27の各透明電極および試料208~234の各透明電極と同程度に、良好な文字の視認性が得られることが確認された。
1-1,1b-1…第1の透明電極
1-2,1b-2…第2の透明電極
3…窒素含有層
3-1…第1の窒素含有層
3-2…第2の窒素含有層
5…電極層
5-1…第1の電極層
5-2…第2の電極層
5x1,5x2,5x3,…x電極パターン(第1の電極層)
5y1,5y2,5y3,…y電極パターン(第2の電極層)
21,23,25,27,29…タッチパネル
31…表示装置
33…表示パネル
A…中間層
H…高屈折率層
H-1…第1の高屈折率層
H-2…第2の高屈折率層
Claims (16)
- 窒素原子を含有する化合物を用いて構成された窒素含有層と、
前記窒素含有層に積層して設けられた銀を主成分とする電極層とを備えた
タッチパネル用透明電極。
- 前記窒素原子を含有する化合物は、窒素原子が有する非共有電子対のうち芳香族性に関与せずかつ金属に配位していない非共有電子対の数をn、分子量をMとした場合の有効非共有電子対含有率[n/M]が、2.0×10-3≦[n/M]となる化合物である
請求項1記載のタッチパネル用透明電極。
- 前記化合物における前記有効非共有電子対含有率[n/M]が、3.9×10-3≦[n/M]である
請求項2記載のタッチパネル用透明電極。
- 前記窒素含有層は、前記化合物と共に他の化合物を用いて構成され、これらの化合物の混合比を考慮した前記有効非共有電子対含有率[n/M]の平均値が、2.0×10-3≦[n/M]である
請求項2または3の何れか記載のタッチパネル用透明電極。
- 前記電極層との間に前記窒素含有層を狭持して設けられ、前記窒素含有層よりも高い屈折率を有する高屈折率層を備えた
請求項1~4の何れかに記載のタッチパネル用透明電極。
- 前記高屈折率層は、酸化チタンまたは酸化ニオブで構成された
請求項5記載のタッチパネル用透明電極。
- 前記窒素含有層は、5nm以下の厚さを有する
請求項5または6に記載のタッチパネル用透明電極。
- 前記窒素含有層と前記電極層とが隣接して配置された
請求項1~13の何れかに記載のタッチパネル用透明電極。
- 請求項1~14の何れかに記載のタッチパネル用透明電極を備えた
タッチパネル。
- 請求項15に記載のタッチパネルと、
前記タッチパネルに重ねて配置された表示パネルとを備えた
表示装置。
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Also Published As
Publication number | Publication date |
---|---|
EP2874049A1 (en) | 2015-05-20 |
EP2874049A4 (en) | 2016-02-17 |
JP6065909B2 (ja) | 2017-01-25 |
JPWO2014010433A1 (ja) | 2016-06-23 |
US20160055937A1 (en) | 2016-02-25 |
EP2874049B1 (en) | 2018-10-17 |
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