WO2013147572A1 - 유기전자소자용 기판 - Google Patents
유기전자소자용 기판 Download PDFInfo
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- WO2013147572A1 WO2013147572A1 PCT/KR2013/002705 KR2013002705W WO2013147572A1 WO 2013147572 A1 WO2013147572 A1 WO 2013147572A1 KR 2013002705 W KR2013002705 W KR 2013002705W WO 2013147572 A1 WO2013147572 A1 WO 2013147572A1
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- Prior art keywords
- layer
- high refractive
- substrate
- particles
- electrode layer
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Images
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
- G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
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- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
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- H10K77/10—Substrates, e.g. flexible substrates
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
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- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present application relates to a substrate for an organic electronic device and the like.
- An organic electronic device is a device that performs a function through charge exchange between an electrode layer and an organic material.
- Examples of the organic electronic device may include an organic light emitting diode (OLED), an organic solar cell, an organic photoconductor (OPC), an organic transistor, and the like.
- An organic light emitting device which is a representative organic electronic device, typically includes a substrate, a first electrode layer, an organic layer including a light emitting layer, and a second electrode layer sequentially.
- the first electrode layer may be formed of a transparent electrode layer, and the second electrode layer may be formed of a reflective electrode layer.
- the first electrode layer may be formed as a reflective electrode layer, and the second electrode layer may be formed as a transparent electrode layer.
- Electrons and holes are injected by the two electrode layers, respectively, and the injected electrons and holes are recombined in the emission layer to generate light.
- Light may be emitted to the substrate side in the bottom light emitting device and to the second electrode layer side in the top light emitting device.
- ITO Indium tin oxide
- an organic layer an organic layer
- a glass substrate which are generally used as a transparent electrode layer in the structure of the organic light emitting device, have refractive indices of about 2.0, 1.8, and 1.5, respectively.
- refractive indices of about 2.0, 1.8, and 1.5, respectively.
- the present application provides an organic electronic device substrate and an organic electronic device.
- Exemplary organic electronic device substrate of the present application the substrate layer; And a high refractive layer.
- the high refractive layer can be formed on the substrate layer, for example. 1 shows an exemplary substrate 100 comprising a substrate layer 101 and a high refractive layer 102 formed thereon.
- the term high refractive index layer may mean a layer having a refractive index of about 1.8 to 2.5 or about 1.8 to 2.2 or about 1.8 to 2.0.
- the term refractive index herein may refer to a refractive index for a wavelength of about 550 nm or about 633 nm, unless otherwise specified.
- the high refractive layer may be, for example, a light scattering flat layer.
- the term “light scattering flat layer” may provide a flat surface on which an organic electronic device may be formed, and may also scatter, diffuse, or diffuse incident light. It may mean a layer that can be refracted.
- the high refractive layer is a flat layer, the high refractive layer can scatter or diffuse incident light while having a surface having a maximum height roughness of 1 m or less or 0.5 m or less.
- the term "maximum height roughness” may mean a distance between a straight line passing through the highest point of the roughness curve and a straight line passing through the lowest point while being parallel to the center line in the roughness curve in the cut off. The maximum height roughness may be, for example, a numerical value measured for an arbitrary area having an area of 100 ⁇ m 2 on the flat surface.
- a light transmissive substrate layer for example, a substrate layer having a transmittance of 50% or more with respect to light in the visible region may be used.
- a light transmissive base material layer a glass base material layer or a transparent polymer base material layer can be illustrated.
- the base material layer containing soda-lime glass, barium / strontium containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, quartz, etc.
- Substrate layers including polyimide (PI), polyethylene naphthalate (PEN), polycarbonate (PC), acrylic resin, poly (ethylene terephthatle) (PET), poly (ether sulfide) (PES), polysulfone (PS) and the like can be illustrated. May be, but is not limited thereto.
- the said base material layer may be a TFT substrate in which a driving TFT exists as needed.
- the base layer need not necessarily be a transparent base layer.
- a reflective base layer having a reflective layer made of aluminum or the like may be used on the surface of the base layer as necessary.
- the high refractive layer may include, for example, scattering particles (hereinafter also referred to as second particles) and high refractive particles (hereinafter may also be referred to as first particles).
- a high refractive layer can be formed using a composition obtained by mixing the first and second particles with a binder.
- the high refractive index layer may be a light scattering flat layer that provides a surface on which an organic electronic device including an electrode layer and the like can be formed and can improve light extraction efficiency of the device through a scattering function.
- the high refractive index layer may have a refractive index that is equal to or greater than an adjacent electrode layer, for example, may have a refractive index of 1.8 or more.
- the refractive index of the high refractive layer may be, for example, 3.5 or less, 3.0 or less, 2.5 or less, or 2.0 or less.
- the high refractive layer may further comprise a binder for holding the first and second particles.
- a binder for holding the first and second particles.
- a known material can be used without particular limitation.
- various organic binders, inorganic binders or organic-inorganic binders known in the art can be used.
- Inorganic or organic-inorganic binders can be used in consideration of their excellent heat resistance and chemical resistance, and excellent resistance to high temperature processes, photolithography processes or etching processes performed during the life of the device and the fabrication process.
- An organic binder can also be used.
- the binder may, for example, have a refractive index of at least about 1.4, at least about 1.45, at least about 1.5, at least about 1.6, at least about 1.65, or at least about 1.7.
- the upper limit of the refractive index of the binder may be selected in a range capable of satisfying the refractive index of the high refractive layer in consideration of the refractive index of the particles to be blended together.
- the binder for example, polyimide, cardo resin having a fluorene ring, urethane, epoxide, polyester or acrylate-based thermal or photocurable monomeric, oligomeric or polymeric organic
- an inorganic material such as silicon oxide, silicon nitride, silicon oxynitride or polysiloxane, or an organic-inorganic composite material can be used.
- polysiloxane polyamic acid or polyimide
- the polysiloxane may be formed by polycondensing a condensable silane compound or a siloxane oligomer, and the like may form a matrix based on a bond between silicon and oxygen (Si—O).
- condensation conditions are controlled to form a binder matrix based on siloxane bonds (Si-O) only, or a matrix in which some organic groups such as alkyl groups or condensable functional groups such as alkoxy groups remain. Formation is also possible.
- a binder having a refractive index of about 1.5 or more, about 1.6 or more, about 1.65 or more, or about 1.7 or more can be used for light having a wavelength of 550 nm or 633 nm.
- a polyamic acid or polyimide can be manufactured using the monomer which introduce
- a polyamic acid capable of improving the dispersion stability of the particles by having a site capable of bonding with the particles, such as a carboxyl group, can be used.
- the compound containing the repeating unit of following General formula (1) can be used, for example.
- n is a positive number.
- the specific range of n in the general formula (1) is not particularly limited, and may be appropriately selected, for example, in a range satisfying the weight average molecular weight described below.
- the repeating unit may be optionally substituted by one or more substituents.
- substituents the functional group containing a halogen atom, such as a halogen atom other than fluorine, a phenyl group, a benzyl group, a naphthyl group, or a thiophenyl group, a sulfur atom, a phosphorus atom, etc. can be illustrated.
- the polyamic acid may be a homopolymer formed from only the repeating unit of Formula 1 or a copolymer including other units other than the repeating unit of Formula 1.
- the kind and ratio of another repeating unit can be suitably selected in the range which does not inhibit a desired refractive index, heat resistance, a light transmittance, etc., for example.
- repeating unit of formula (1) include repeating units of the following formula (2).
- L is n is a positive number.
- the specific range of n in the formula (2) is not particularly limited, and may be appropriately selected, for example, in a range satisfying the weight average molecular weight described below.
- the polyamic acid may be, for example, about 10,000 to 100,000 or about 10,000 to 50,000, based on the standard polystyrene weight average molecular weight measured by gel permeation chromatography (GPC).
- the polyamic acid having a repeating unit of formula (1) also has a light transmittance of 80% or more, 85% or more or 90% or more in the visible light region, and is excellent in heat resistance.
- a high refractive binder or a low refractive binder can be used as the binder.
- the term high refractive binder refers to a binder having a refractive index of about 1.7 to 2.5 or about 1.7 to 2.0
- the term low refractive binder may refer to a binder having a refractive index of about 1.4 or more and less than about 1.7.
- Such binders are variously known, and suitable binders may be selected and used among various kinds of binders described above or other known binders.
- the high refractive layer may include high refractive particles (first particles) together with the binder.
- high refractive particles may mean, for example, particles having a refractive index of 1.5 or more, 1.8 or more, 2.0 or more, 2.2 or more, 2.5 or more, 2.6 or more, or 2.7 or more.
- the upper limit of the refractive index of the high refractive particles may be selected in a range capable of satisfying the refractive index of the high refractive layer, for example, in consideration of the refractive index of the binder and the like blended together.
- the high refractive particles may have, for example, a smaller average particle diameter than the scattering particles (second particles) described later.
- the high refractive particles may have an average particle diameter that cannot scatter light.
- the high refractive particles may have, for example, an average particle diameter of about 100 nm or less, 90 nm or less, 80 nm or less, 70 nm or less, 60 nm or less, 50 nm or less, or about 45 nm or less.
- the average particle diameter of the high refractive particles (first particles) may be, for example, 1 nm or more, 5 nm or more, or 10 nm or more.
- alumina, aluminosilicate, titanium oxide, zirconium oxide, or the like can be used.
- rutile titanium oxide can be used, for example, as particles having a refractive index exceeding 2.3, 2.4 or more, 2.5 or more, or about 2.5 to 3.0.
- rutile titanium oxide it is possible to implement a high refractive index layer having a high refractive index even when the content of the high refractive particles in the material is relatively small.
- the ratio of the high refractive particles (first particles) in the high refractive layer is not particularly limited and may be adjusted within a range in which the refractive index of the high refractive layer described above can be secured.
- the high refractive particles (first particles) are 300 parts by weight or less and 100 parts by weight of the binder, up to 250 parts by weight. , 200 parts by weight or less, 150 parts by weight or less, or 120 parts by weight or less.
- the ratio of the first particles may be, for example, 40 parts by weight or more, 60 parts by weight or more, 80 parts by weight or more, 90 parts by weight or more, or 100 parts by weight or more.
- unit parts by weight means a ratio of weights between components, unless otherwise specified.
- the high refractive layer may also comprise scattering particles (second particles).
- scattering particles refers to particles that have a different refractive index than the surrounding medium and have a suitable size and can scatter incident light, such as, for example, a binder of a high refractive index layer or an electrode layer described later. Can be.
- the scattering particles (second particles) may have a refractive index of about 2.0 to 3.5 or about 2.2 to 3.0.
- Such scattering particles (second particles) may, for example, have a difference in refractive index with respect to the binder of greater than about 0.8.
- the difference in refractive index between the binder and the second particles may be, for example, about 1.5 or less or about 1.0 or less.
- the scattering particles (second particles) have, for example, an average particle diameter of 100 nm or more, more than 100 nm, 100 nm to 20000 nm, 100 nm to 15000 nm, 100 nm to 10000 nm, 100 nm to 5000 nm, 100 nm. Particles on the order of about 1000 nm or about 100 nm to about 500 nm can be exemplified.
- the scattering particles (second particle) may have a shape such as spherical, ellipsoidal, polyhedral or amorphous, but the form is not particularly limited.
- the scattering particles (second particles) for example, organic materials such as polystyrene or derivatives thereof, acrylic resins or derivatives thereof, silicone resins or derivatives thereof, novolak resins or derivatives thereof, or silica, alumina, titanium oxide or Particles comprising an inorganic material such as zirconium oxide can be exemplified.
- the scattering particles (second particles) may be formed by including only one of the above materials or two or more of the above materials.
- Such scattering particles may be included in the high refractive layer in a ratio of 10 to 100 parts by weight with respect to 100 parts by weight of the binder, it is possible to ensure appropriate scattering properties within this ratio.
- the high refractive layer can be formed, for example, by a wet coating method or a sol gel method using a coating liquid containing a binder, scattering particles (second particles), and high refractive particles (first particles).
- the ratio (A / B) of the weight (A) of the high refractive particles (first particles) and the weight (B) of the scattering particles (second particles) in the high refractive layer is, for example, 0.9 to 8, 1 to 8 or 1 To about 7 degrees.
- the ratio (A + B) of the weight (A) of the high refractive particles (first particles) and the weight (B) of the scattering particles (second particles) and the weight (C) of the binder ((A + B) / C) may be, for example, 1 to 5, 1 to 4.5, 1 to 4, 1.2 to 4.0, 1.2 to 3.8, 1.2 to 3.6, 1.2 to 3.4, 1.2 to 3.2 or 1.2 to 3.0. It is possible to maintain excellent scattering characteristics and other required properties of the high refractive layer within the range of such a ratio.
- the ratio between the binder and the first and second particles may be changed in consideration of, for example, the refractive index of the binder to be used.
- the high refractive layer may include the low refractive binder, in which case the sum of the weight A of the high refractive particles (the first particles) and the weight B of the scattering particles (the second particles) (A) + B) and the ratio ((A + B) / C) of the weight (C) of the binder may be about 2 to 5 degrees.
- the high refractive layer contains the above-described high refractive binder
- the sum of the weight A of the high refractive particles (the first particles) and the weight B of the scattering particles (the second particles) (A + B) and the weight of the binder may range from 1 to 2 or more than 1 and less than 2.
- physical properties of the high refractive index layer for example, refractive index and durability can be maintained at an appropriate level.
- the substrate may further include an electrode layer.
- the electrode layer may be formed on the high refractive layer.
- a conventional hole injecting or electron injecting electrode layer used for fabricating an organic electronic device such as an organic light emitting device may be formed.
- the hole injection electrode layer can be formed using a material having a relatively high work function, for example, and can be formed using a transparent material if necessary.
- the hole injection electrode layer may comprise a metal, alloy, electrically conductive compound, or a mixture of two or more thereof, having a work function of about 4.0 eV or more.
- Such materials include metals such as gold, CuI, Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), Zinc Tin Oxide (ZTO), zinc oxide doped with aluminum or indium, magnesium indium oxide, nickel tungsten oxide, Oxide materials such as ZnO, SnO 2 or In 2 O 3 , metal nitrides such as gallium nitride, metal serenides such as zinc serenides, metal sulfides such as zinc sulfides, and the like.
- the transparent hole injection electrode layer can also be formed using a laminate of a metal thin film such as Au, Ag or Cu, and a high refractive transparent material such as ZnS, TiO 2 or ITO.
- the hole injection electrode layer may be formed by any means such as vapor deposition, sputtering, chemical vapor deposition, or electrochemical means.
- the electrode layer formed as needed may be patterned through a process using known photolithography, shadow mask, or the like.
- the film thickness of the hole injection electrode layer varies depending on light transmittance, surface resistance, and the like, but may be usually in the range of 500 nm or 10 nm to 200 nm.
- the electron injection transparent electrode layer may be formed using, for example, a transparent material having a relatively small work function.
- an electron injection transparent electrode layer may be formed by using an appropriate material among materials used for forming the hole injection electrode layer. It may be formed, but is not limited thereto.
- the electron injection electrode layer can also be formed using, for example, a vapor deposition method or a sputtering method, and can be appropriately patterned if necessary.
- the electron injection electrode layer may be formed to an appropriate thickness as necessary.
- the high refractive layer may have a smaller projected area than the electrode layer.
- the high refractive layer may have a smaller projected area than the base layer.
- the term "projection area” refers to the area of the projection of an object recognized when the substrate is observed from above or below in a direction parallel to the normal direction of the surface thereof, for example, the base layer, the high refractive layer, or the electrode layer. Means the area.
- the high refractive layer is interpreted to have a smaller projected area than the electrode layer.
- the high refractive index layer or the like may exist in various forms as long as the projection area is smaller than that of the base layer and the projection area is smaller than that of the electrode layer.
- the high refractive layer 102 may be formed only at a portion excluding the edge of the base layer 101 as shown in FIG. 2, or the high refractive layer or the like may remain in the edge of the base layer or the like.
- FIG. 3 is a diagram illustrating a case where the substrate of FIG. 2 is observed from the top.
- the area A of the electrode layer 501 perceived when the substrate is viewed from above, that is, the projected area A of the electrode layer 501 is the projected area of the high refractive layer 102 below it.
- the ratio A / B of the projected area A of the electrode layer 501 and the projected area B of the high refractive layer 102 or the scattering layer is, for example, 1.04 or more, 1.06 or more, 1.08 or more, or 1.1 or more. Or 1.15 or greater.
- the upper limit of the ratio A / B of the projected area is particularly limited because a structure in which the optical functional layer described later is not exposed to the outside can be realized. It doesn't work.
- the upper limit of the ratio A / B may be, for example, about 2.0, about 1.5, about 1.4, about 1.3, or about 1.25.
- the electrode layer may be formed on an upper portion of the base layer on which the high refractive index layer is not formed. The electrode layer may be formed in contact with the base layer, or may be formed including an additional element between the base layer and the base layer.
- the electrode layer 501 may be formed up to an area including a region deviating from all the peripheral portions of the high refractive layer 102 when viewed from the top.
- at least one high refractive layer for example, an electrode layer up to a region including a region beyond all periphery of the high refractive layer on which an organic layer is to be formed. This can be formed.
- a structure in which the high refractive index layer is not exposed to the outside may be formed by attaching an encapsulation structure described later to an electrode layer on which the high refractive index layer is not formed.
- the high refractive index layer can be prevented from becoming a penetration path of external moisture, oxygen, or the like, and can stably secure the sealing structure or the adhesive force between the electrode and the substrate, and can also maintain the surface hardness of the outer portion of the device excellently.
- the substrate may further include, for example, an intermediate layer existing between the high refractive layer and the electrode layer.
- the intermediate layer may have a larger projected area than the high refractive layer, and may be formed on the top of the high refractive layer and on the base layer on which the high refractive layer is not formed.
- the intermediate layer may solve the problem of increasing the resistance of the electrode layer by alleviating the step at the boundary between the high refractive layer electrode layer and the base layer electrode layer formed by the high refractive layer having a smaller projected area than the electrode layer as described above.
- a barrier material that is, a material having low moisture or moisture permeability
- the intermediate layer may be, for example, a layer having an absolute value of a difference in refractive index from the electrode layer of about 1 or less, 0.7 or less, 0.5 or less, or 0.3 or less.
- the material forming the intermediate layer may be a material having a relation of refractive index with the electrode layer as described above and having a barrier property if necessary.
- TiOx titanium oxide
- SiOx silicon oxide
- AlOx aluminum oxide
- Al 2 O 3 Al 2 O 3
- Ta 2 O 3 Ti 3 O 3
- TiO, ZrO 2 , Nb 2 O 3 CeO 2 , ZnS or ZnO and the like or other metal oxides or oxynitrides
- the intermediate layer may be formed using a material as described above, for example, by a known deposition or sputtering method such as PVD, CVD, ALD, or the like by a wet coating method.
- the thickness of the intermediate layer is not particularly limited and may be, for example, in the range of about 1 nm to about 100 nm, about 10 nm to 100 nm or about 20 nm to 80 nm.
- the thickness means an average thickness.
- the intermediate layer formed on the high refractive layer and the intermediate layer formed on the substrate layer may have different thicknesses.
- An exemplary organic electronic device of the present application may include the organic electronic device substrate and the organic electronic device formed on the substrate, for example, on the high refractive layer of the substrate.
- the organic electronic device may include, for example, a first electrode layer, an organic layer, and a second electrode layer sequentially formed on the high refractive layer.
- the organic electronic device may be an organic light emitting diode (OLED).
- OLED organic light emitting diode
- the organic electronic device may have a structure in which an organic layer including at least a light emitting layer is interposed between the hole injection electrode layer and the electron injection electrode layer.
- the hole injection electrode layer or the electron injection electrode layer may be an electrode layer on the high refractive layer of the substrate described above.
- the organic layer existing between the electron and hole injection electrode layers may include at least one light emitting layer.
- the organic layer may include a plurality of light emitting layers of two or more layers.
- the light emitting layers may have a structure divided by an intermediate electrode or a charge generating layer (CGL) having charge generation characteristics, but is not limited thereto.
- the light emitting layer can be formed using, for example, various fluorescent or phosphorescent organic materials known in the art.
- Materials that can be used for the light emitting layer include tris (4-methyl-8-quinolinolate) aluminum (III) (tris (4-methyl-8-quinolinolate) aluminum (III)) (Alg3), 4-MAlq3 or Alq series materials such as Gaq3, C-545T (C 26 H 26 N 2 O 2 S), DSA-amine, TBSA, BTP, PAP-NPA, Spiro-FPA, Ph 3 Si (PhTDAOXD), PPCP (1, Cyclopenadiene derivatives such as 2,3,4,5-pentaphenyl-1,3-cyclopentadiene), DPVBi (4,4'-bis (2,2'-diphenylyinyl) -1,1'-biphenyl) , Distyryl benzene or its derivatives or DCJTB (4- (Dicyanomethylene) -2-tert-but
- the light emitting layer includes the material as a host, and further includes perylene, distyrylbiphenyl, DPT, quinacridone, rubrene, BTX, ABTX, DCJTB, and the like. It may have a host-dopant system including a dopant.
- the light emitting layer can be formed by appropriately adopting a kind showing light emission characteristics among the electron-accepting organic compound or electron donating organic compound described later.
- the organic layer may be formed in various structures further including other various functional layers known in the art, as long as it includes a light emitting layer.
- Examples of the layer that may be included in the organic layer may include an electron injection layer, a hole blocking layer, an electron transport layer, a hole transport layer, a hole injection layer, and the like.
- the electron injection layer or the electron transport layer can be formed using, for example, an electron accepting organic compound.
- an electron accepting organic compound any compound known without particular limitation may be used.
- organic compounds include polycyclic compounds such as p-terphenyl or quaterphenyl or derivatives thereof, naphthalene, tetratracene, pyrene, coronene, and coronene.
- Polycyclic hydrocarbon compounds or derivatives thereof such as chrysene, anthracene, diphenylanthracene, naphthacene or phenanthrene, phenanthroline, vasophenanthrol Heterocyclic compounds or derivatives thereof, such as lean (bathophenanthroline), phenanthridine, acridine (acridine), quinoline (quinoline), quinoxaline or phenazine (phenazine) may be exemplified.
- fluoroceine perylene, phthaloperylene, naphthaloperylene, naphthaloperylene, perynone, phthaloperinone, naphtharoferinone, diphenylbutadiene ( diphenylbutadiene, tetraphenylbutadiene, oxadiazole, ardazine, bisbenzoxazoline, bisstyryl, pyrazine, cyclopentadiene , Oxine, aminoquinoline, imine, diphenylethylene, vinylanthracene, diaminocarbazole, pyrane, thiopyrane, polymethine, mero Cyanine (merocyanine), quinacridone or rubrene, or derivatives thereof, JP-A-1988-295695, JP-A-1996-22557, JP-A-1996-81472, Japanese Patent Laid-Open Publication No.
- Metal chelate complex compounds disclosed in Japanese Patent Application Publication No. 017764 for example, tris (8-quinolinolato) aluminium, which is a metal chelated oxanoid compound, and bis (8-quinolin) Norato) magnesium, bis [benzo (f) -8-quinolinolato] zinc ⁇ bis [benzo (f) -8-quinolinolato] zinc ⁇ , bis (2-methyl-8-quinolinolato) aluminum, Tris (8-quinolinolato) indium, tris (5-methyl-8-quinolinolato) aluminum, 8-quinolinolatorium, tris (5-chloro- Metal complex having one or more 8-quinolinolato or derivatives thereof, such as 8-quinolinolato) gallium, bis (5-chloro-8-quinolinolato) calcium, as derivatives, Japanese Patent Application Laid-Open No.
- Fluorescent brighteners such as a benzooxazole compound, a benzothiazole compound or a benzoimidazole compound; 1,4-bis (2-methylstyryl) benzene, 1,4-bis (3-methylstyryl) benzene, 1,4-bis (4-methylstyryl) benzene, distyrylbenzene, 1,4- Bis (2-ethylstyryl) benzyl, 1,4-bis (3-ethylstyryl) benzene, 1,4-bis (2-methylstyryl) -2-methylbenzene or 1,4-bis (2- Distyrylbenzene compounds such as methylstyryl) -2-ethylbenzene and the like; 2,5-bis (4-methylstyryl) pyrazine, 2,5-bis (4-ethylstyryl) pyrazine, 2,5-bis [2- (1-naphthyl) vinyl
- Namin (silanamine) derivative disclosed in Japanese Patent Laid-Open No. 194-279322 or Japanese Patent Laid-Open No. 194-279323 Polyfunctional styryl compound, an oxadiazole derivative disclosed in Japanese Patent Application Laid-Open No. 194-107648 or Japanese Patent Application Laid-Open No. 194-092947, an anthracene compound disclosed in Japanese Patent Application Laid-Open No. 194-206865, Japanese Patent Oxynate derivative disclosed in Japanese Patent Application Laid-Open No. 194-145146, tetraphenylbutadiene compound disclosed in Japanese Patent Application Laid-Open No. 1992-96990, organic trifunctional compound disclosed in Japanese Patent Application Laid-Open No.
- the electron injection layer may be formed using, for example, a material such as LiF or CsF.
- the hole blocking layer is a layer capable of preventing the injected holes from entering the electron injection electrode layer through the light emitting layer to improve the life and efficiency of the device, and if necessary, using a known material, the light emitting layer and the electron injection electrode layer It can be formed in a suitable portion in between.
- the hole injection layer or hole transport layer may comprise, for example, an electron donating organic compound.
- the electron donating organic compound include N, N ', N'-tetraphenyl-4,4'-diaminophenyl, N, N'-diphenyl-N, N'-di (3-methylphenyl) -4, 4'-diaminobiphenyl, 2,2-bis (4-di-p-tolylaminophenyl) propane, N, N, N ', N'-tetra-p-tolyl-4,4'-diamino ratio Phenyl, bis (4-di-p-tolylaminophenyl) phenylmethane, N, N'-diphenyl-N, N'-di (4-methoxyphenyl) -4,4'-diaminobiphenyl, N , N, N ', N'-tetraphenyl-4,4'-diaminodiphenylether
- the hole injection layer or the hole transport layer may be formed by dispersing the organic compound in a polymer or using a polymer derived from the organic compound. Also, such as polyparaphenylene vinylene and derivatives thereof, so-called ⁇ -conjugated polymers, hole-transporting non-conjugated polymers such as poly (N-vinylcarbazole), or ⁇ conjugated polymers of polysilane may be used. have.
- the hole injection layer is formed by using electrically conductive polymers such as metal phthalocyanine such as copper phthalocyanine, nonmetal phthalocyanine, carbon film and polyaniline, or by reacting the aryl amine compound with Lewis acid using an oxidizing agent. You may.
- electrically conductive polymers such as metal phthalocyanine such as copper phthalocyanine, nonmetal phthalocyanine, carbon film and polyaniline, or by reacting the aryl amine compound with Lewis acid using an oxidizing agent. You may.
- the organic light emitting device may include: (1) a hole injection electrode layer / organic light emitting layer / electron injection electrode layer formed sequentially from a high refractive layer of a substrate; (2) the form of a hole injection electrode layer / hole injection layer / organic light emitting layer / electron injection electrode layer; (3) the form of a hole injection electrode layer / organic light emitting layer / electron injection layer / electron injection electrode layer; (4) the form of a hole injection electrode layer / hole injection layer / organic light emitting layer / electron injection layer / electron injection electrode layer; (5) the form of a hole injection electrode layer / organic semiconductor layer / organic light emitting layer / electron injection electrode layer; (6) the form of a hole injection electrode layer / organic semiconductor layer / electron barrier layer / organic light emitting layer / electron injection electrode layer; (7) the form of a hole injection electrode layer / organic semiconductor layer / organic light emitting layer / adhesion improvement layer / electron injection electrode layer; (8) the form of a hole injection electrode layer / organic
- the organic electronic device may further include an encapsulation structure.
- the encapsulation structure may be a protective structure to prevent foreign substances such as moisture or oxygen from flowing into the organic layer of the organic electronic device.
- the encapsulation structure may be, for example, a can such as a glass can or a metal can, or a film covering the entire surface of the organic layer.
- the organic layer 701 and the second electrode layer 702 formed on a substrate including a sequentially formed base layer 101, a high refractive layer 102, and a first electrode layer 501 may be formed of a glass can, a metal can, or the like.
- the shape protected by the encapsulation structure 703 of the can structure is exemplarily shown.
- the encapsulation structure 703 of FIG. 4 may be attached by, for example, an adhesive.
- the encapsulation structure 703 may be attached to, for example, an electrode layer 501 in which the high refractive index layer 102 does not exist below the substrate.
- the sealing structure 703 may be attached to the end of the substrate by an adhesive. In this way it is possible to maximize the protective effect through the encapsulation structure.
- the encapsulation structure may be, for example, a film covering the entire surface of the organic layer and the second electrode layer.
- FIG. 5 exemplarily illustrates a sealing structure 703 in the form of a film covering the entire surface of the organic layer 701 and the second electrode layer 702.
- the encapsulation structure 703 in the form of a film covers the entire surface of the organic layer 701 and the second electrode layer 702 as shown in FIG. 5, while the base layer 101, the high refractive layer 102 and the electrode layer (
- the substrate including the 501 and the upper second substrate 801 may be bonded to each other.
- the second substrate 801 for example, a glass substrate, a metal substrate, a polymer film or a barrier layer may be exemplified.
- the encapsulation structure in the form of a film is formed by applying, curing, and curing a liquid material that is cured by heat or ultraviolet (UV) irradiation or the like, for example, an epoxy resin, or by using the epoxy resin or the like beforehand It can be formed by laminating the substrate and the upper substrate using an adhesive sheet prepared in the form.
- a liquid material that is cured by heat or ultraviolet (UV) irradiation or the like, for example, an epoxy resin, or by using the epoxy resin or the like beforehand
- UV ultraviolet
- the encapsulation structure may include a metal oxide such as calcium oxide, beryllium oxide, a metal halide such as calcium chloride, or a water adsorbent such as phosphorus pentoxide, or a getter material.
- the moisture adsorbent or getter material may be included, for example, inside the encapsulation structure in the form of a film, or may be present at a predetermined position of the encapsulation structure in the can structure.
- the encapsulation structure may further include a barrier film, a conductive film, or the like.
- the encapsulation structure may be attached to an upper portion of the first electrode layer 501 where the high refractive index layer 102 is not formed. Accordingly, it is possible to implement a sealing structure in which the high refractive layer is not exposed to the outside.
- the sealing structure is, for example, the entire surface of the high refractive layer is surrounded by the base layer, the electrode layer and / or the sealing structure, or surrounded by a sealing structure formed including the base layer, the electrode layer and / or the sealing structure This may mean a state that is not exposed to the outside.
- the sealing structure includes the base layer, the electrode layer and the encapsulating structure as long as it is formed of only the base layer, the electrode layer and / or the encapsulating structure, or is formed so that the high refractive layer is not exposed to the outside. It may also be formed to include. For example, other elements may be present in a portion where the base layer 101 and the electrode layer 501 contact each other, or a portion where the electrode layer 501 and the encapsulation structure 703 contact each other or other positions in FIG. 4 or 5. The other element may be a low moisture-permeable organic material, an inorganic material or an organic-inorganic composite material, an insulating layer or an auxiliary electrode.
- the present application also relates to the use of such organic electronic devices, for example organic light emitting devices.
- the organic light emitting device may be, for example, a backlight of a liquid crystal display (LCD), a light source, a light source such as various sensors, a printer, a copier, a vehicle instrument light source, a signal lamp, an indicator light, a display device, a planar light emitting body, and the like. It can be effectively applied to a light source, a display, a decoration or various lights.
- the present application relates to a lighting device including the organic light emitting device.
- the organic light emitting device When the organic light emitting device is applied to the lighting device or other uses, other components constituting the device or the like or a method of constituting the device are not particularly limited, and are known in the art as long as the organic light emitting device is used. Any material or method can be employed.
- 1 to 3 are schematic diagrams showing an exemplary substrate.
- FIG. 6 and 7 show light emitting states of Examples 1 and 2.
- Scattering particles titanium oxide particles having a refractive index of about 1.7 to 1.8 and a binder having an average particle diameter of about 200 nm and a refractive index of about 2.6 are used as the polyamic acid synthesized by the synthesis method of (second particle).
- the prepared coating solution was coated on a glass substrate to form a high refractive layer.
- a portion of the high refractive layer was removed by irradiating a laser to the formed layer so that the remaining high refractive layer could correspond to the light emitting region of the organic layer.
- a hole injection electrode layer including ITO (Indium Tin Oxide) was formed in a thickness on the entire surface of the glass substrate by a known sputtering method.
- an organic layer capable of emitting white light is formed on the ITO layer using a known material and method, and an aluminum (Al) electrode is formed on the organic layer as an electron injecting reflective electrode on the organic layer by vacuum deposition to manufacture a device. It was.
- FIG. 6 and 7 are views illustrating the light emitting states of the organic electronic devices of Examples 1 and 2
- FIG. 8 is a view showing the light emitting states of Comparative Example 1.
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Abstract
Description
Claims (17)
- 기재층; 및 굴절률이 1.8 이상이며, 평균 직경이 50 nm 이하인 제 1 입자 및 굴절률이 2.0 내지 3.5이고, 평균 직경이 100 nm 이상인 제 2 입자를 포함하고, 상기 제 1 입자의 중량(A)과 제 2 입자의 중량(B)의 비율(A/B)이 0.9 내지 8이며, 굴절률이 1.8 이상인 고굴절층을 가지는 유기전자소자용 기판.
- 제 1 항에 있어서, 고굴절층의 표면의 최대 높이 조도가 1 ㎛ 이하인 유기전자소자용 기판.
- 제 1 항에 있어서, 고굴절층이 기재층과 접하고 있는 유기전자소자용 기판.
- 제 1 항에 있어서, 제 1 입자는 굴절률이 2.2 이상인 유기전자소자용 기판.
- 제 1 항에 있어서, 제 1 입자의 중량(A) 및 제 2 입자의 중량(B)의 비율(A/B)이 1 내지 8인 유기전자소자용 기판.
- 제 1 항에 있어서, 고굴절층이 바인더를 추가로 포함하고, 상기 바인더의 중량(C) 및 제 1 입자의 중량(A)과 제 2 입자의 중량(B)의 합계의 비율((A+B)/C)이 1 내지 5인 유기전자소자용 기판.
- 제 6 항에 있어서, 바인더는 폴리실록산, 폴리아믹산 또는 폴리이미드인 유기전자소자용 기판.
- 제 1 항에 있어서, 고굴절층은, 굴절률이 1.4 이상이고, 1.7 미만인 바인더를 추가로 포함하는 유기전자소자용 기판.
- 제 8 항에 있어서, 굴절률이 1.4 이상이고, 1.7 미만인 바인더의 중량(C) 및 제 1 입자의 중량(A)과 제 2 입자의 중량(B)의 합계의 비율((A+B)/C)이 2 내지 5인 유기전자소자용 기판.
- 제 1 항에 있어서, 고굴절층은, 굴절률이 1.7 이상인 바인더를 추가로 포함하는 유기전자소자용 기판.
- 제 10 항에 있어서, 굴절률이 1.7 이상인 바인더의 중량(C) 및 제 1 입자의 중량(A)과 제 2 입자의 중량(B)의 합계의 비율((A+B)/C)이 1 이상이고, 또한 2 미만인 유기전자소자용 기판.
- 제 1 항에 있어서, 고굴절층의 상부에 형성된 전극층을 추가로 포함하는 유기전자소자용 기판.
- 제 12 항에 있어서, 고굴절층의 투영 면적은 전극층의 투영 면적에 비하여 작으며, 전극층은 상기 고굴절층의 상부 및 상기 고굴절층이 형성되어 있지 않은 기재층의 상부 모두에 형성되어 있는 유기전자소자용 기판.
- 제 1 항의 기판 및 상기 기판상에 순차 존재하는 제 1 전극층; 발광층을 포함하는 유기층; 및 제 2 전극층을 포함하는 유기전자장치.
- 제 14 항에 있어서, 유기층은 발광층을 포함하는 유기전자장치.
- 제 14 항에 있어서, 기판의 고굴절층의 투영 면적은 제 1 전극층의 투영 면적에 비하여 작으며, 제 1 전극층은 상기 고굴절층의 상부 및 상기 고굴절층이 형성되어 있지 않은 기재층의 상부 모두에 형성되어 있는 유기전자장치.
- 제 14 항의 유기전자장치를 포함하는 조명.
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CN201380028595.5A CN104321900B (zh) | 2012-03-30 | 2013-04-01 | 用于有机电子器件的基板 |
EP13769209.1A EP2822053B1 (en) | 2012-03-30 | 2013-04-01 | Substrate for organic electronic device |
US14/056,600 US9030091B2 (en) | 2012-03-30 | 2013-10-17 | Substrate for organic electronic device |
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CN104637988A (zh) * | 2015-03-11 | 2015-05-20 | 京东方科技集团股份有限公司 | Oled显示装置及其制备方法 |
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KR102618808B1 (ko) * | 2016-10-31 | 2023-12-28 | 엘지디스플레이 주식회사 | 유기발광표시장치 및 그 제조방법 |
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- 2013-04-01 WO PCT/KR2013/002705 patent/WO2013147572A1/ko active Application Filing
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EP2822053A1 (en) | 2015-01-07 |
JP2015518631A (ja) | 2015-07-02 |
CN104321900B (zh) | 2017-04-26 |
US20140042415A1 (en) | 2014-02-13 |
CN104321900A (zh) | 2015-01-28 |
EP2822053B1 (en) | 2016-11-02 |
KR101645774B1 (ko) | 2016-08-05 |
JP6334509B2 (ja) | 2018-05-30 |
TW201402323A (zh) | 2014-01-16 |
EP2822053A4 (en) | 2015-11-11 |
KR20130111156A (ko) | 2013-10-10 |
US9030091B2 (en) | 2015-05-12 |
TWI551446B (zh) | 2016-10-01 |
KR20130111481A (ko) | 2013-10-10 |
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