WO2013061990A1 - Filtre optique, procédé pour sa fabrication et dispositif de capture d'image - Google Patents

Filtre optique, procédé pour sa fabrication et dispositif de capture d'image Download PDF

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Publication number
WO2013061990A1
WO2013061990A1 PCT/JP2012/077439 JP2012077439W WO2013061990A1 WO 2013061990 A1 WO2013061990 A1 WO 2013061990A1 JP 2012077439 W JP2012077439 W JP 2012077439W WO 2013061990 A1 WO2013061990 A1 WO 2013061990A1
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WIPO (PCT)
Prior art keywords
light
optical filter
shielding resin
resin film
film
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Application number
PCT/JP2012/077439
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English (en)
Japanese (ja)
Inventor
松尾　淳
悟史 梅田
勉 木梨
Original Assignee
旭硝子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to CN201280014239.3A priority Critical patent/CN103460683B/zh
Priority to KR1020137024439A priority patent/KR101483386B1/ko
Priority to KR1020147017159A priority patent/KR20140089441A/ko
Priority to JP2013540801A priority patent/JP6197647B2/ja
Publication of WO2013061990A1 publication Critical patent/WO2013061990A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B11/00—Filters or other obturators specially adapted for photographic purposes
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation

Definitions

  • Embodiments described herein relate generally to an optical filter, a manufacturing method thereof, and an imaging apparatus.
  • a filter optical filter having a specific function is disposed between the imaging lens and the solid-state imaging device.
  • a typical example is a filter (near-infrared cut filter) that blocks light in the near-infrared wavelength region in order to correct the spectral sensitivity of a solid-state image sensor to human visibility. It arrange
  • the imaging device adjusts the amount of incoming light to prevent the imaging device from saturating the charge generated by light reception and preventing imaging, and the optical members such as lenses and sensors in the imaging device and the like.
  • a shielding member called a diaphragm is disposed.
  • a method for realizing downsizing of an imaging device for example, a method of integrally providing a black coating functioning as a diaphragm on an optical filter is known (see, for example, Patent Document 1).
  • This method eliminates the need for a space for disposing the diaphragm, and can reduce the size of the apparatus. In addition, the number of parts can be reduced and the assembly process can be simplified.
  • a low refractive index layer and a high refractive index are generally formed by vapor deposition or sputtering.
  • An antireflection film made of a multilayer film or the like in which layers are laminated is formed. Such antireflection treatment is also desired for the black coating (light-shielding film).
  • the antireflection film has a complicated formation process, and has problems in productivity and cost.
  • the antireflection film also has a problem that the antireflection effect generally has wavelength dependency and angle (incident angle) dependency. For this reason, there is a need for a technique that can provide the light-shielding film with an antireflection effect that is excellent in productivity and economical efficiency and has no problems such as wavelength dependency and angle dependency.
  • the present invention relates to an optical filter that is integrally provided with a light-shielding film that is excellent in productivity and economy and has an antireflection effect that does not depend on the wavelength or angle of incident light, and a method for manufacturing the same, and also provides such an optical filter.
  • An object is to provide an imaging apparatus used.
  • An optical filter according to an embodiment of the present invention is an optical filter used in an imaging device including an imaging element into which light from a subject or a light source is incident, and is disposed between the subject or the light source and the imaging element.
  • An optical filter body that is transparent to the incident light, and a light-blocking resin film that is integrally formed on at least one surface of the optical filter body and blocks a part of the light incident on the imaging element.
  • the fine uneven structure which prevents reflection of light is formed in the light-incidence surface of the said light shielding resin film.
  • the “light incident surface” refers to the surface of the light shielding resin film opposite to the optical filter body.
  • An optical filter manufacturing method is a method for manufacturing an optical filter used in an imaging device incorporating an imaging element into which light from a subject or a light source is incident, and is transmissive to the incident light. Forming a light-shielding resin film having a predetermined pattern shape on at least one surface of the optical filter having the imprint mold pressed against the surface of the light-shielding resin film in an uncured or semi-cured state. And a step of forming a fine relief structure.
  • An optical filter manufacturing method is a method for manufacturing an optical filter used in an imaging device incorporating an imaging element into which light from a subject or a light source is incident, and is transmissive to the incident light.
  • An optical filter manufacturing method is a method for manufacturing an optical filter used in an imaging device incorporating an imaging element into which light from a subject or a light source is incident, and is transmissive to the incident light.
  • An imaging apparatus includes an imaging element on which light from a subject or a light source is incident, a lens disposed between the subject or the light source and the imaging element, the subject or the light source, and the imaging element. And the optical filter disposed between the two.
  • an optical filter that is integrally provided with a light shielding film that is excellent in productivity and economy and has an antireflection effect that does not depend on the wavelength or angle of incident light.
  • an imaging device including such an optical filter is provided.
  • FIG. 3C is a cross-sectional view showing a step subsequent to the step shown in FIG. 3A. It is sectional drawing which shows the next process of the process shown to FIG. 3B.
  • FIG. 4D is a cross-sectional view showing a step subsequent to the step shown in FIG. 4C. It is sectional drawing which shows the manufacturing process of the other example of the imprint type
  • FIG. 6D is a cross-sectional view showing a step subsequent to the step shown in FIG. 6B.
  • FIG. 6D is a cross-sectional view showing a step subsequent to the step shown in FIG. 6C.
  • FIG. 6 drawing explaining the further another example of the formation method of the light shielding resin film of FIG. It is sectional drawing which shows the next process of the process shown to FIG. 7A. It is sectional drawing which shows the next process of the process shown to FIG. 7B.
  • FIG. 7C It is sectional drawing which shows the next process of the process shown to FIG. 7C. It is a picked-up photograph by the metallographic microscope of the light shielding resin film surface formed by the method shown in FIG. It is a 3D image by the atomic force microscope (AFM) of the surface of the light shielding resin film formed by other methods. It is a 3D image by the atomic force microscope (AFM) of the surface of the light shielding resin film formed by another method. It is the graph which compared the regular reflectance of the light shielding resin film provided with the mat surface-like uneven structure on the surface, and the light shielding resin film which does not have such a mat surface-like uneven structure.
  • AFM atomic force microscope
  • Ra the average distance
  • S the average distance
  • FIG. 21B is a cross-sectional view showing a step subsequent to the step shown in FIG. 21A.
  • FIG. 21B is a cross-sectional view showing a step subsequent to the step shown in FIG. 21B.
  • FIG. 1 is a cross-sectional view schematically showing a near-infrared cut filter according to the first embodiment of the present invention.
  • a near-infrared cut filter 100 of the present embodiment is integrally formed with a near-infrared cut filter main body (hereinafter simply referred to as “filter main body”) 10 and an outer peripheral portion of one main surface thereof.
  • filter main body a near-infrared cut filter main body
  • a light shielding resin film 20 A light shielding resin film 20.
  • the filter body 10 is formed on the transparent base material 11 and one main surface of the transparent base material 11 and transmits light in the visible wavelength region but reflects light in the ultraviolet wavelength region and the infrared wavelength region.
  • the light shielding resin film 20 is formed on the main surface of the filter body 10 on the ultraviolet / infrared light reflecting film 12 side with a light shielding resin containing an inorganic or organic colorant such as carbon black.
  • the type of resin is not particularly limited, and any of a photocurable resin, a thermoplastic resin, and a thermosetting resin that is cured by irradiation with light in the ultraviolet wavelength region or the like can be used.
  • light shielding refers to a property of blocking light transmission mainly by absorbing light.
  • Such a light-shielding resin film 20 made of a photocurable resin having a light-shielding property is used when the near-infrared cut filter 100 of this embodiment is used in an imaging device incorporating an imaging element as described later. It functions as a so-called stop that adjusts the amount of light incident on the lens and cuts stray light.
  • the light shielding resin film 20 has a fine concavo-convex structure 22 having a light reflection preventing function on its surface (surface opposite to the filter body 10, that is, light incident side).
  • Examples thereof include a structure 22b (FIGS. 2A and 2B) and a mat-like uneven structure 22c (FIG. 2C) in which irregularly shaped irregularities are finely formed.
  • the arrangement pitch of the circular or pyramidal concave and convex portions is set to be equal to or less than the wavelength of the incident light, and the ratio of the pitch to the depth or height of the concave and convex portions.
  • the aspect ratio is 1 or more, substantially all of the incident light enters the inside (here, the light-shielding resin film 20) and exhibits an antireflection function.
  • the arrangement pitch of the concave and convex portions is 50 to 300 nm and the depth or height thereof is 200 to 3000 nm.
  • the mat surface-like concavo-convex structure 22c exhibits an antireflection function as a result of diffuse reflection of incident light on its surface and scattering in various directions.
  • This antireflection function exhibits a particularly large antireflection effect for specularly reflected light having a wide incident angle range and a wide wavelength range.
  • the mat surface-like concavo-convex structure 22c has a surface roughness on the surface of the light shielding resin film 20 on which the concavo-convex structure is formed, in accordance with JIS B0601 (1994). It is preferable that the arithmetic average roughness (Ra) measured by (AFM) is 0.1 ⁇ m or more. A more preferable range is 0.15 to 10 ⁇ m, a further preferable range is 0.2 to 2 ⁇ m, and a further preferable range is 0.2 to 0.5 ⁇ m.
  • the average distance (S) between local peaks measured with an ultradeep shape measuring microscope in accordance with JIS B0601 (1994) is 1 to 100 ⁇ m.
  • the maximum height (Ry) measured in accordance with JIS B0601 (1994) is 2 ⁇ m or more.
  • a more preferable range of the average distance (S) between the local peaks is 2 to 50 ⁇ m, and 5 to 20 ⁇ m is even more preferable.
  • a more preferable range of the maximum height (Ry) is 3 to 9 ⁇ m, and a more preferable range is 4 to 6 ⁇ m.
  • this concavo-convex structure has a surface roughness of the surface of the light-shielding resin film 20 on which the concavo-convex structure is formed by an atomic force microscope (AFM) in accordance with JIS B0601 (1994). It is preferable that the measured arithmetic average roughness (Ra) is 0.1 ⁇ m or more, more preferably 0.15 to 10 ⁇ m, and still more preferably 0.23 to 10 ⁇ m. In addition, the average distance (S) between the local peaks measured by the above method is preferably 5 to 100 ⁇ m, more preferably 5 to 50 ⁇ m, and even more preferably 5 to 20 ⁇ m.
  • the light-shielding resin film 20 provided with the negative moth-eye structure 22a, the positive moth-eye structure 22b, and the mat surface-like concavo-convex structure 22c can be formed by the following methods, for example.
  • FIGS. 4A to 4D are diagrams using such an imprint mold. It is sectional drawing which shows the process of forming the light shielding resin film 20 provided with the negative moth-eye structure 22a in order.
  • a substrate 31 made of quartz or the like as a material of the negative moth-eye structure forming imprint mold 30 is prepared, and a metal 32 is deposited on the surface thereof by vapor deposition, sputtering, or the like (FIG. 3A).
  • the substrate 31 is dry-etched using the metal 32 as a mask (FIG. 3B), the remaining metal 32 is removed, and a negative moth-eye structure forming imprint mold having a circular or pyramidal projection 33 on the surface. 30 is formed (FIG. 3C).
  • the light shielding resin film 20 is formed on the surface of the ultraviolet / infrared light reflecting film 12 of the filter body 10 using the negative type moth-eye structure forming imprint mold 30 as described below.
  • a photocurable resin having a light shielding property is applied to the entire surface of the ultraviolet / infrared light reflecting film 12 of the filter body 10 and dried to form a photocurable resin coating layer 20A (FIG. 4A).
  • a photocurable resin coating method spin coating method, bar coating method, dip coating method, casting method, spray coating method, bead coating method, wire bar coating method, blade coating method, roller coating method, curtain coating method, A slit die coating method, a gravure coating method, a slit reverse coating method, a micro gravure method, a comma coating method and the like can be used.
  • the application may be performed in a plurality of times.
  • the surface of the ultraviolet / infrared light reflecting film 12 may be subjected to a coupling treatment in order to improve the adhesion to the ultraviolet / infrared light reflecting film 12.
  • the negative moth-eye structure forming imprint mold 30 is pressed against the surface of the photocurable resin coating layer 20A with the convex 33 forming side thereof being brought into contact with the surface of the photocurable resin coating layer 20A.
  • the surface shape of the imprint mold 30 is transferred to the surface of the photocurable resin coating layer 20A (FIG. 4B).
  • the pressing may be performed while heating and pressing.
  • the photocurable resin coating layer 20A is irradiated with light L through a photomask 34 having an opening corresponding to the light shielding resin film 20 ( FIG. 4C).
  • the light curable resin 20A is cured by light in the ultraviolet wavelength region, the light to be irradiated is irradiated with light including at least light in the ultraviolet wavelength region. Thereby, the portion of the photocurable resin that becomes the light shielding resin film 20 irradiated with light is cured.
  • the light-curing resin film 20 having the negative moth-eye structure 22a on the surface is formed by selectively removing the photocurable resin in the unirradiated portion by development (FIG. 4D).
  • development wet development, dry development, or the like is used.
  • wet development it can be carried out by a known method such as dipping, spraying, brushing, and slapping using a developer corresponding to the type of photocurable resin, such as an alkaline aqueous solution, an aqueous developer, an organic solvent or the like.
  • the light-shielding resin film 20 may be further cured by heating at about 80 to 250 ° C. or irradiation with light as necessary.
  • FIGS. 6A to 6D are diagrams illustrating the positive mold using the imprint mold. It is sectional drawing which shows the process of forming the light shielding resin film 20 provided with the moth-eye structure 22b in order.
  • the positive type moth-eye structure forming imprint mold 40 is manufactured as follows. . First, a substrate 31 made of quartz or the like is prepared, and a metal 32 is attached to the surface thereof by vapor deposition, sputtering, or the like (FIG. 5A). Next, the substrate 31 is dry-etched using the metal 32 as a mask (FIG. 5B), the remaining metal 31 is removed, and an imprint mold for forming a negative moth-eye structure in which a circular or pyramidal projection 33 is formed on the surface. 30 is formed (FIG. 5C).
  • the convex portion 33 is formed on the surface of the photocurable resin coating layer 36A formed by applying and drying the photocurable resin on the substrate 35 made of quartz or the like to the negative moth-eye structure forming imprint mold 30.
  • the formation side is brought into contact with and pressed against the surface of the photocurable resin coating layer 36A, and the surface shape of the imprint mold 30 is transferred to the surface of the photocurable resin coating layer 36A (FIG. 5D).
  • the pressing may be performed while heating and pressing.
  • the imprint mold 30 is removed from the photocurable resin coating layer 36A, and the photocurable resin coating layer 36A is irradiated with light L and cured.
  • a positive moth-eye structure forming imprint mold 40 having a circular or pyramidal recess 37 formed on the surface is obtained (FIG. 5E).
  • the light shielding resin film 20 is formed on the surface of the ultraviolet / infrared light reflection film 12 of the filter body 10 by using the positive type moth-eye structure forming imprint mold 40.
  • the ultraviolet / infrared light reflecting film 12 of the filter body 10 is used in the method (1) except that the positive type moth-eye structure forming imprint mold 40 is used instead of the negative type moth-eye structure forming imprint mold 30. This is performed in the same manner as in the case of forming the light shielding resin film 20 on the surface.
  • a photocurable resin having a light shielding property is applied to the entire surface of the ultraviolet / infrared light reflecting film 12 of the filter body 10 and dried to form a photocurable resin coating layer 20A (FIG. 6A).
  • the positive moth-eye structure-forming imprint mold 40 is pressed against the surface of the photocurable resin coating layer 20A with the concave 37 forming side being brought into contact with the surface of the photocurable resin coating layer 20A, and pressed.
  • the surface shape of the print mold 40 is transferred to the surface of the photocurable resin coating layer 20A (FIG. 6B).
  • the pressing may be performed while heating and pressing.
  • the photocurable resin coating layer 20A is irradiated with light L through the photomask 34 having an opening corresponding to the light shielding resin film 20 ( FIG. 6C). Thereby, the portion of the photocurable resin that becomes the light shielding resin film 20 irradiated with light is cured. Thereafter, the light-curing resin film 20 having the positive moth-eye structure 22b on the surface is formed by selectively removing the photocurable resin in the unirradiated portion by development (FIG. 6D).
  • FIGS. 7A to 7D are cross-sectional views sequentially showing steps of forming the light shielding resin film 20 having the mat surface-like uneven structure 22c.
  • a photocurable resin having a light shielding property is applied to the entire surface of the ultraviolet / infrared light reflecting film 12 of the filter body 10 and dried to form a photocurable resin coating layer 20A.
  • the light L is irradiated to the photocurable resin coating layer 20A through the photomask 34 having an opening corresponding to the light shielding resin film 20 (FIG. 7A).
  • the light curable resin 20A is cured by light in the ultraviolet wavelength region, the light to be irradiated is irradiated with light including at least light in the ultraviolet wavelength region.
  • the coating method of the photocurable resin spin coating method, bar coating method, dip coating method, casting method, spray coating method, bead coating method, wire bar coating method, blade coating method, roller coating method, curtain coating method
  • a slit die coating method, a gravure coating method, a slit reverse coating method, a micro gravure method, a comma coating method and the like can be used.
  • the application may be performed in a plurality of times.
  • the surface of the ultraviolet / infrared light reflecting film 12 may be subjected to a coupling treatment in order to improve the adhesion to the ultraviolet / infrared light reflecting film 12.
  • the photo-curing resin in the unirradiated portion is selectively removed by development to form the light-shielding resin film 20 (FIG. 7B).
  • development wet development, dry development, or the like is used.
  • wet development it can be carried out by a known method such as dipping, spraying, brushing, and slapping using a developer corresponding to the type of photocurable resin, such as an alkaline aqueous solution, an aqueous developer, an organic solvent or the like.
  • the light shielding resin film 20 is irradiated with radiation L ′, and only the surface layer portion of the light shielding resin film 20 is further cured (FIG. 7C).
  • radiation L ′ one having a wavelength that has a large absorption in the light shielding resin film 20 is used.
  • Preferable radiation L ′ includes ultraviolet light having a wavelength of 170 nm to 270 nm, for example, ultraviolet light having a wavelength of 184 nm to 254 nm.
  • the heating temperature may be a temperature at which the portion other than the surface layer portion of the cured light shielding resin film 20 is softened, and is usually about 50 to 300 ° C., preferably about 150 to 220 ° C.
  • FIG. 8 shows an example of a photograph in which the surface of the mat-like uneven structure 22c formed by such a method is imaged with a metal microscope. In the example of this photograph, a bowl-shaped fine uneven structure is formed.
  • the case where the light shielding resin film 20 is made of a photocurable resin is described as an example.
  • the methods (1) to (3) are performed as follows.
  • an uncured or semi-cured resin layer having a pattern shape corresponding to the light shielding resin film 20 is formed on the surface of the ultraviolet / infrared light reflecting film 12 of the filter body 10.
  • the negative moth-eye structure forming imprint mold 30 or the positive moth-eye structure forming imprint mold 40 is pressed against the resin layer, and the surface shape thereof is transferred to the resin layer.
  • the uncured or semi-cured resin layer is cured.
  • an uncured or semi-cured resin layer having a pattern shape corresponding to the light-shielding resin film 20 is formed on the surface of the ultraviolet / infrared light reflecting film 12 of the filter body 10.
  • the resin layer is cured.
  • the cured resin layer is irradiated with radiation to further cure only the surface layer portion of the cured resin layer, and then heated to relieve stress caused by the radiation irradiation.
  • a printing method such as screen printing or flexographic printing can be used, and a light-shielding semi-cured resin film molded in a predetermined pattern shape with an adhesive is used as a filter. It may be formed by adhering to the surface of the ultraviolet / infrared light reflecting film 12 of the main body 10.
  • a light-shielding cured resin film molded in a predetermined pattern shape is adhered to the surface of the ultraviolet / infrared light reflecting film 12 of the filter body 10 with an adhesive, and the adhered cured resin The film may be irradiated with radiation and heated.
  • the light-shielding resin film 20 having the mat-like uneven structure 22c is made of a matting agent such as inorganic fine particles such as alumina, titanium oxide, silica, calcium carbonate, and carbon black, and resin fine particles such as nylon, polyethylene, and polyester. It can also be formed using the light-shielding resin contained.
  • a matting agent such as inorganic fine particles such as alumina, titanium oxide, silica, calcium carbonate, and carbon black
  • resin fine particles such as nylon, polyethylene, and polyester. It can also be formed using the light-shielding resin contained.
  • the average particle diameter (D50) of the fine particles is preferably 0.4 ⁇ m or more, which is larger than the visible light wavelength, in order to increase the scattering effect due to the unevenness of the mat surface. Further, if the average particle diameter (D50) of the fine particles is 100 ⁇ m or more, the fine particles cannot be uniformly dispersed in the light-shielding resin, and unevenness may occur in the concavo-convex structure of the matte surface of the light-shielding resin film 20. Is preferred. 2 ⁇ m or more and 15 ⁇ m or less is more preferable.
  • the 90% diameter (D90) is 300 ⁇ m or less is preferable, and 50 ⁇ m or less is more preferable.
  • the average particle diameter (D50) and the 90% diameter (D90) are obtained by calculating a cumulative curve with the total volume of a group of particles obtained by measuring with a laser diffraction particle size distribution measuring apparatus as 100%. Means the particle size at the point of 50% and 90%, respectively.
  • the entire surface of the ultraviolet / infrared light reflecting film of the filter body is made to contain a matting agent together with a light-shielding resin containing a matting agent, for example, an inorganic or organic colorant such as carbon black.
  • a light-blocking photo-curing resin, thermoplastic resin, or thermosetting resin mixed with a solvent or dispersion medium according to the pattern shape corresponding to the light-blocking resin film by screen printing or flexographic printing.
  • the application may be performed in a plurality of times.
  • the surface of the ultraviolet / infrared light reflecting film 12 may be treated with a coupling agent in order to improve adhesion to the ultraviolet / infrared light reflecting film. You may make it mix
  • FIG. 9A is an example of a 3D image obtained by measuring the surface of the mat-like concavo-convex structure formed by such a method with an atomic force microscope (AFM), in which fine irregular concavo-convex portions are formed. Yes.
  • AFM atomic force microscope
  • the content of the matting agent in the light-shielding resin is usually 2 to 10% by mass, preferably 2.5 to 8% by mass, although it depends on the type of the matting agent and the particle size thereof, based on the solid content. % Range. If it is less than 2% by mass, a fine uneven structure like a mat surface is not sufficiently formed, and a good antireflection effect may not be obtained. If it exceeds 10% by mass, uniform dispersion in the light-shielding resin becomes difficult, and the film thickness and the uneven structure may become non-uniform. Moreover, there exists a possibility of reducing adhesiveness.
  • the light-shielding resin may contain an additive for improving adhesion, such as a silane coupling agent, as described above.
  • the light shielding resin film 20 provided with the mat surface-like uneven structure 22c can be further formed by a dry etching technique.
  • a light shielding resin for example, an inorganic or organic colorant such as carbon black is contained in the entire surface of the ultraviolet / infrared light reflecting film of the filter body, and a solvent or a dispersion medium is added as necessary.
  • a mixed photo-curing resin, thermoplastic resin or thermosetting resin with light-shielding properties is applied to the pattern shape corresponding to the light-shielding resin film by a printing method such as screen printing or flexographic printing, and then dried to block the light.
  • a resin coating layer is formed. The application may be performed in a plurality of times.
  • the surface of the ultraviolet / infrared light reflecting film 12 may be treated with a coupling agent in order to improve adhesion to the ultraviolet / infrared light reflecting film. You may make it mix
  • FIG. 9B is an example of a 3D image obtained by measuring the surface of the mat-like concavo-convex structure formed by such a method by AFM, and concavo-convex portions having fine irregular shapes are formed.
  • the thickness of the light-shielding resin film 20 on which the fine concavo-convex structure 22 as described above is formed is preferably in the range of 1 to 30 ⁇ m from the viewpoint of miniaturization of the imaging device and light-shielding property.
  • the range of ⁇ 10 ⁇ m is more preferable, and the range of 3 to 10 ⁇ m is even more preferable.
  • a fine uneven structure 22 for preventing light reflection is formed on the surface of a light shielding resin film 20 having a diaphragm function, which is integrally formed with the filter body 10.
  • the fine concavo-convex structure 22 can be formed by a simpler process than the antireflection film, and the antireflection effect has neither wavelength dependency nor angle dependency like the antireflection film. Therefore, it is possible to integrally include a light shielding film that is excellent in productivity and economy and has an antireflection effect that does not depend on the wavelength or angle of incident light.
  • the light-shielding resin film 20 has an average value of regular reflectance for light having a wavelength of 420 nm or more and 650 nm or less at an incident angle of 0 to 45 degrees on the surface where the fine concavo-convex structure 22 is formed, measured at 1 nm intervals. It is preferably 5% or less, and more preferably 2% or less.
  • the standard deviation ( ⁇ ) of the regular reflectance with respect to light having a wavelength of 420 nm or more and 650 nm or less at an incident angle of 0 to 45 degrees on the surface of the fine uneven structure 22 of the light shielding resin film 20 measured at intervals of 10 nm is 0 respectively. It is preferably 0.6% or less and 0.6% or less, and more preferably 0.4%.
  • the standard deviation ( ⁇ ) exceeds 0.6%, even if the average regular reflectance is small, the stray light due to the reflected light has a special color, and the stray light becomes conspicuous as an image.
  • FIG. 10A is a graph showing the results of an experiment conducted for examining the antireflection effect of the mat-like uneven structure (the rugged uneven structure obtained by the above method (3)).
  • light was applied at various angles to each of the light shielding resin film (Example) having a mat-like uneven structure on the surface and the light-shielding resin film (Comparative Example) before providing such a mat-like uneven structure.
  • Irradiation was performed at (5 degrees, 30 degrees, 45 degrees), and the regular reflectance was measured.
  • a spectrophotometer (Hitachi spectrophotometer U-4100 manufactured by Hitachi High-Tech) was used for the measurement.
  • FIG. 10B is a graph showing the results of examining the antireflection effect due to the difference in the concavo-convex structure when the ridge-like fine concavo-convex structure as shown in FIG. 8 is formed as the mat-like concavo-convex structure. is there. That is, FIG. 10B was measured for a light-shielding resin film having a ridge-like fine concavo-convex structure formed by changing the “arithmetic mean roughness (Ra)” with respect to various “average intervals of local peaks (S)”. It is a graph which shows a regular reflectance.
  • the light shielding resin films having different “arithmetic mean roughness (Ra)” and “average distance between local peaks (S)” can be formed by changing the formation conditions (radiation dose, heating temperature, heating time, etc.).
  • FIG. 11 is a plan view of the near-infrared cut filter 100 of the present embodiment as viewed from the light shielding resin film 20 side.
  • the planar shape of the filter body 10 is circular, and the light shielding resin film 20 is provided in an annular shape along the outer periphery thereof. As shown in FIG. 12, it may be rectangular and is not particularly limited.
  • the transparent base material 11, the ultraviolet / infrared light reflection film 12 and the antireflection film 13 constituting the filter body 10 of the near infrared cut filter 100 of the present embodiment will be described in detail.
  • the shape of the transparent substrate 11 is not particularly limited as long as it transmits light in the visible wavelength region, and examples thereof include a plate shape, a film shape, a block shape, and a lens shape.
  • the transparent substrate 11 may be a resin containing infrared absorbing glass or an infrared absorbing agent.
  • Constituent materials of the transparent substrate 11 include glass, crystal, lithium niobate, sapphire, etc., polyester resin such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene, polypropylene, ethylene vinyl acetate copolymer And polyolefin resins such as norbornene resin, polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. These materials may have an absorption characteristic for at least one of the ultraviolet wavelength region and the infrared wavelength region.
  • polyester resin such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene, polypropylene, ethylene vinyl acetate copolymer
  • polyolefin resins such as norbornene resin, polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluor
  • Glass can be used by appropriately selecting from transparent materials in the visible wavelength region.
  • borosilicate glass is preferable because it is easy to process and can suppress the occurrence of scratches and foreign matters on the optical surface, and glass that does not contain an alkali component is preferable because it has good adhesion and weather resistance.
  • a light absorption type glass having absorption in the infrared wavelength region in which CuO or the like is added to fluorophosphate glass or phosphate glass can also be used.
  • fluorophosphate glass or phosphate glass added with CuO has a high transmittance for light in the visible wavelength region, and CuO sufficiently absorbs light in the near infrared wavelength region.
  • fluorophosphate glass containing CuO examples include P 2 O 5 46 to 70%, MgF 2 0 to 25%, CaF 2 0 to 25%, SrF 2 0 to 25%, and LiF. 0 to 20%, NaF 0 to 10%, KF 0 to 10%, but the total amount of LiF, NaF and KF is 1 to 30%, AlF 3 0.2 to 20%, ZnF 2 2 to 15% (however, 0.1 to 5 parts by mass, preferably 0.3 to 2 parts by mass of CuO with respect to 100 parts by mass of a fluorophosphate glass comprising up to 50% of the total fluoride fluoride) Can be mentioned.
  • Examples of commercially available products include NF-50 glass (trade name, manufactured by Asahi Glass Co., Ltd.).
  • the phosphate glass containing CuO include P 2 O 5 70 to 85%, Al 2 O 3 8 to 17%, B 2 O 3 1 to 10%, Li 2 O 0 by mass%. 100 parts by mass of a phosphate glass composed of ⁇ 3%, Na 2 O 0-5%, K 2 O 0-5%, Li 2 O + Na 2 O + K 2 O 0.1-5%, SiO 2 0-3%
  • CuO is added in an amount of 0.1 to 5 parts by mass, preferably 0.3 to 2 parts by mass.
  • the thickness of the transparent substrate 11 is not particularly limited, but is preferably in the range of 0.1 to 3 mm, and more preferably in the range of 0.1 to 1 mm, from the viewpoint of reducing the size and weight.
  • the ultraviolet / infrared light reflection film 12 has a function of promoting the formation of the light-shielding resin film 20, and at the same time, has an effect of imparting or enhancing a near-infrared cut filter function.
  • the ultraviolet / infrared light reflecting film 12 is composed of a dielectric multilayer film in which a low refractive index dielectric layer and a high refractive index dielectric layer are alternately laminated by sputtering or vacuum deposition.
  • the dielectric multilayer film can also be formed by an ion beam method, an ion plating method, a CVD method, or the like. Since the sputtering method and the ion plating method are so-called plasma atmosphere treatments, the adhesion to the transparent substrate 11 can be improved.
  • the antireflection film 13 has a function of improving the transmittance by preventing reflection of light incident on the near-infrared cut filter 100 and efficiently using incident light, and is formed by a conventionally known material and method. it can.
  • the antireflection film 3 is made of silica, titania, tantalum pentoxide, magnesium fluoride, zirconia, alumina or the like formed by sputtering, vacuum deposition, ion beam, ion plating, CVD, or the like. It is composed of one or more layers, a silicate type formed by a sol-gel method, a coating method, or the like, a silicone type, a fluorinated methacrylate type, or the like.
  • the surface material of the film in contact with the light shielding resin film 20 may be magnesium fluoride, but fluoride tends to have low adhesion strength with the light shielding resin film 20. For this reason, it is preferable that it is oxides, such as a silica, a titania, a tantalum pentoxide, a zirconia, an alumina, and adhesiveness with light shielding film resin can be increased.
  • silica is more preferable because it has a low refractive index and can easily increase the adhesion strength with the light-shielding resin film 20 by a silane coupling agent.
  • the main surface of the transparent substrate 11 opposite to the main surface on which the ultraviolet / infrared light reflection film 12 is formed is used instead of the antireflection film 13 or transparent with the antireflection film 13.
  • a second ultraviolet / infrared light reflecting film made of a dielectric multilayer film that reflects light in the ultraviolet wavelength region and the infrared wavelength region may be provided between the substrate 11 and the substrate 11.
  • the light shielding resin film 20 may be formed on the main surface of the filter main body 10 on the antireflection film 13 side like the near infrared cut filter 110 shown in FIG.
  • the outer edge of the light shielding resin film 20 may be located inside the outer edge of the filter body 10 as in the near infrared cut filter 120 shown in FIG. 14A.
  • FIG. 15 is a cross-sectional view schematically showing a near-infrared cut filter 140 according to the second embodiment of the present invention. From this embodiment onward, in order to avoid redundant description, description of points that are the same as those in the first embodiment will be omitted, and differences will be mainly described.
  • an infrared light absorption film 15 is provided between the transparent substrate 11 and the antireflection film 13.
  • the infrared light absorbing film 15 may be provided between the transparent substrate 11 and the ultraviolet / infrared light reflecting film 12.
  • the infrared light absorption film 15 is made of a transparent resin containing an infrared absorber that absorbs light in the infrared wavelength region.
  • the transparent resin only needs to transmit light in the visible wavelength region.
  • acrylic resin styrene resin, ABS resin, AS resin, polycarbonate resin, polyolefin resin, polyvinyl chloride resin, acetate resin, cellulose resin Polyester resin, allyl ester resin, polyimide resin, polyamide resin, polyimide ether resin, polyamideimide resin, epoxy resin, urethane resin, urea resin, and the like.
  • infrared absorbers that absorb light in the infrared wavelength region include organic or inorganic pigments, organic dyes, and the like, but are not particularly limited thereto.
  • An infrared absorber may be used individually by 1 type, and 2 or more types may be mixed and used for it.
  • the transparent resin further includes a color tone correction dye, a leveling agent, an antistatic agent, a heat stabilizer, an antioxidant, a dispersant, a flame retardant, and a lubricant as long as the effects of the present invention are not impaired.
  • a plasticizer or the like may be contained.
  • the infrared light absorption film 15 is prepared by, for example, preparing a coating liquid by dispersing or dissolving a transparent resin, an infrared absorber, and other additives blended as necessary in a dispersion medium or solvent. It can be formed by applying the working liquid to the main surface of the transparent substrate 11 opposite to the surface on which the ultraviolet / infrared light reflecting film 12 is formed and drying. Coating and drying can be carried out in multiple steps. At that time, a plurality of coating liquids having different components may be prepared, and these may be sequentially coated and dried.
  • dispersion medium or solvent examples include water, alcohol, ketone, ether, ester, aldehyde, amine, aliphatic hydrocarbon, alicyclic hydrocarbon, aromatic hydrocarbon and the like. These may be used alone or in combination of two or more.
  • a dispersing agent can be mix
  • a stirring device such as a rotation / revolution mixer, a bead mill, a planetary mill, or an ultrasonic homogenizer can be used.
  • a stirring device such as a rotation / revolution mixer, a bead mill, a planetary mill, or an ultrasonic homogenizer.
  • spin coating method for coating of coating liquid, spin coating method, bar coating method, dip coating method, casting method, spray coating method, bead coating method, wire bar coating method, blade coating method, roller coating method, curtain coating method
  • a slit die coating method, a gravure coating method, a slit reverse coating method, a micro gravure method, a comma coating method and the like can be used.
  • the near-infrared cut filter 140 of this embodiment includes the infrared light absorbing film 15, it can have a good near-infrared cut function.
  • FIG. 16A is a cross-sectional view schematically showing an imaging apparatus 50 according to the third embodiment.
  • the imaging device 50 of the present embodiment includes a solid-state imaging device 51, an optical filter 52, a lens 53, and a housing 54 that holds and fixes them.
  • the solid-state image sensor 51, the optical filter 52, and the lens 53 are disposed along the optical axis x, and the optical filter 52 is disposed between the solid-state image sensor 51 and the lens 53.
  • the solid-state imaging device 51 is an electronic component that converts light incident through the lens 53 and the optical filter 52 into an electrical signal, and is, for example, a CCD or a CMOS.
  • the optical filter 52 the near-infrared cut filter 100 shown in FIG. 1 is used.
  • the near-infrared cut filter 100 is disposed such that the ultraviolet / infrared light reflection film 12 is positioned on the lens 53 side and the antireflection film 13 is positioned on the solid-state imaging element 51 side.
  • the near-infrared cut filter 100 may be arranged such that the ultraviolet / infrared light reflection film 12 is positioned on the solid-state imaging device 51 side and the antireflection film 13 is positioned on the lens 53 side.
  • the fine concavo-convex structure 22 a part of the light incident on the solid-state image sensor 51 is reflected by the surface of the solid-state image sensor 51, and the reflected light is further reflected by the light shielding resin film 20. It has the effect of preventing noise (stray light) caused by entering the light.
  • the optical filter 52 the near-infrared cut filter shown in FIG. 13, FIG. 14A, FIG. 14B, FIG.
  • the light incident from the subject side enters the solid-state imaging device 51 through the lens 53 and the optical filter 52 (near infrared cut filter 100).
  • the solid-state image sensor 51 converts the incident light into an electric signal and outputs it as an image signal.
  • Incident light passes through the near-infrared cut filter 100 provided with the light-shielding resin film 20, is adjusted to an appropriate light amount, and is received by the solid-state imaging device 51 as light with sufficient near-infrared shielding.
  • a light shielding resin film 20 provided with a fine concavo-convex structure 22 for preventing light reflection is provided integrally with the near infrared cut filter 100.
  • the fine concavo-convex structure 22 can be formed by a simple process compared with the antireflection film, and the antireflection effect has neither wavelength dependency nor angle dependency like the antireflection film. Therefore, the near-infrared cut filter 100 can be integrally provided with a light-shielding film that is excellent in productivity and economy and has an antireflection effect that does not depend on the wavelength or angle of incident light.
  • the near-infrared cut filter 100 having excellent properties, economy, and optical characteristics can be provided.
  • the imaging device 50 according to the third embodiment has only one lens disposed, but may include a plurality of lenses, or a cover glass or the like that protects the solid-state imaging device is disposed. It may be. Furthermore, the position of the optical filter is not limited to between the lens and the solid-state imaging device, and may be disposed on the subject side of the lens, or when a plurality of lenses are disposed, between the lenses. May be arranged.
  • the embodiments described above are all examples of filters in which the optical filter has a near-infrared cut function, but the optical filter has functions such as a low-pass filter, an ND filter, a color tone filter, and an optical amplification filter. Also good.
  • the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
  • the spectral transmittance curve of the near-infrared light transmission filter in the examples was measured using a spectrophotometer (MCPD-3000 manufactured by Otsuka Electronics Co., Ltd.).
  • Example 1 A dielectric multilayer film is formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-shaped infrared absorbing glass (NF-50 glass manufactured by Asahi Glass Co., Ltd.), and an antireflection film is formed on the other surface. Formed.
  • NF-50 glass manufactured by Asahi Glass Co., Ltd.
  • a light-shielding ultraviolet curable acrylate resin is applied to the entire surface of the dielectric multilayer film by a spin coating method, heated, and then imprinted on the surface of the resin coating layer while maintaining the temperature at 90 ° C. ) Is pressed, and the surface shape is transferred.
  • the temperature is returned to room temperature, and the surface of the resin coating layer is cured by irradiating the surface of the resin coating layer with 100 mJ / cm 2 of ultraviolet light using a high pressure mercury lamp.
  • an unexposed part is removed using potassium hydroxide aqueous solution, a light shielding resin film is formed, and a near-infrared cut filter is manufactured.
  • a negative moth-eye structure is formed on the surface of the light shielding resin film of the near infrared cut filter.
  • Example 2 In forming the light-shielding resin film, a near-infrared cut filter is manufactured in the same manner as in Example 1 except that the imprint mold (II) is used instead of the imprint mold (I). A positive moth-eye structure is formed on the surface of the light shielding resin film of the near infrared cut filter.
  • Example 3 In the same manner as in Example 1, a dielectric multilayer film was formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-shaped infrared absorbing glass (NF-50 glass manufactured by Asahi Glass Co., Ltd.), and the other surface was formed. An antireflection film was formed.
  • NF-50 glass manufactured by Asahi Glass Co., Ltd.
  • a light-shielding ultraviolet curable acrylate resin is applied to the entire surface of the dielectric multilayer film by spin coating, heated, and then irradiated with 100 mJ / cm 2 of ultraviolet light from a high pressure mercury lamp through a photomask. And cured. Then, the unexposed part was removed using the developing solution, and the light shielding resin film with the flat surface was formed.
  • the surface of the light-shielding resin film was irradiated with 900 mJ / cm 2 of ultraviolet light (wavelength 254 nm) with a low-pressure mercury lamp, and then the light-shielding resin film was heated to produce a near-infrared cut filter.
  • Example 4 A near-infrared cut filter is manufactured in the same manner as in Example 1 except that a soda glass plate having a thickness of 0.3 mm is used in place of the infrared absorbing glass (NF-50 glass). A negative moth-eye structure is formed on the surface of the light shielding resin film of the near infrared cut filter.
  • Example 5 An infrared light absorbing layer is formed on one side of a 40 mm x 40 mm x 0.3 mm square soda glass, a dielectric multilayer film is formed on the other side, and further reflected on the surface of the infrared absorbing layer A prevention layer was formed. Thereafter, a light shielding resin film is formed on the surface of the dielectric multilayer film in the same manner as in Example 1 to manufacture a near-infrared cut filter. A negative moth-eye structure is formed on the surface of the light shielding resin film of the near infrared cut filter.
  • the method for forming the infrared light absorption layer is as follows.
  • FIG. 17 An infrared absorbing dye having a pattern whose light absorption spectrum in a wavelength region of 400 to 1000 nm measured by dissolving in acetone is shown in FIG. 17 and an acrylic resin were stirred and dissolved to obtain a coating solution.
  • the obtained coating solution was applied on a soda glass plate having a thickness of 1 mm by a die coating method using an applicator having a gap of 30 ⁇ m. Thereafter, the coating film was cured by irradiating with ultraviolet rays having a wavelength of 365 nm to form an infrared light absorption layer.
  • Example 6 The same procedure as in Example 5 was performed except that a two-layer infrared light absorbing layer was formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-like soda glass instead of the infrared light absorbing layer. To produce a near-infrared cut filter. A negative moth-eye structure is formed on the surface of the light shielding resin film of the near infrared cut filter.
  • Example 7 In the same manner as in Example 1, a dielectric multilayer film was formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-shaped infrared absorbing glass (NF-50 glass manufactured by Asahi Glass Co., Ltd.) by a vacuum deposition method. An antireflection film was formed on the other surface.
  • a dielectric multilayer film was formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-shaped infrared absorbing glass (NF-50 glass manufactured by Asahi Glass Co., Ltd.) by a vacuum deposition method.
  • An antireflection film was formed on the other surface.
  • a light-shielding resin ink 100 parts by weight of a light-shielding resin ink, 2 or 4 parts by weight of silica fine powder (average particle size (D50) 4.7 ⁇ m), 0.5 parts by weight of a silane coupling agent, and 5 parts by weight of a solvent.
  • a coating solution prepared by adding the components and mixing uniformly was applied by screen printing through a screen mask and heated to form a light-shielding resin film, thereby producing a near-infrared cut filter.
  • the surface roughness of the material formed by blending 2 parts by mass of silica fine powder (2% by mass with respect to the light-shielding resin ink) is an arithmetic average roughness (Ra) of 0.43 ⁇ m and a maximum height (Ry). ) 3.63 ⁇ m, and the average distance (S) between the local peaks was 30 ⁇ m.
  • each of the light shielding resin films is irradiated with light at various angles (5 degrees, 30 degrees, 45 degrees), and the specular photometer (Hitachi spectrophotometer U-4100, manufactured by Hitachi High-Tech) is used. It measured using. The results are shown in FIGS. 18A-18C.
  • the specular reflection of the light shielding resin film of the example containing silica powder is reduced at all measured angles.
  • the silica fine powder is used as the light shielding resin ink.
  • the regular reflectance was as low as 0.2 to 0.3% and had a good antireflection effect.
  • the light shielding resin film alone shows an increase in transmittance in the wavelength region of 1000 to 1200 nm (for example, the transmittance of 0.15 to 0.2% at a wavelength of 1200 nm).
  • the light in the same wavelength region is unnecessary for the image sensor, and leads to deterioration in image characteristics such as color balance and resolution.
  • the dielectric multilayer film and the antireflection film it is possible to prevent such deterioration in image characteristics.
  • Example 8 In the same manner as in Example 1, a dielectric multilayer film was formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-shaped infrared absorbing glass (NF-50 glass manufactured by Asahi Glass Co., Ltd.) by a vacuum deposition method. An antireflection film was formed on the other surface.
  • NF-50 glass manufactured by Asahi Glass Co., Ltd.
  • a light-shielding ultraviolet curable acrylate resin is applied to the entire surface of the dielectric multilayer film by spin coating and dried by heating, and then the surface of the resin coating layer is 100 mJ / cm 2 by a high-pressure mercury lamp through a photomask. It was cured by irradiation with ultraviolet rays. Then, the unexposed part was removed using the developing solution, and the light shielding resin film was formed.
  • etching pressure 50 Pa, an etching gas O 2, gas flow rate 100 sccm, at an applied RF power 100W conditions, selectively 0.1 ⁇ m said light shielding resin film surface, 0.60 .mu.m, 0.
  • a near infrared cut filter was manufactured by etching 7 ⁇ m or 1.1 ⁇ m.
  • the surface roughness was an etching amount of 0.7 ⁇ m, an arithmetic average roughness (Ra) of 0.030 ⁇ m, and a maximum height (Ry) of 0.25 ⁇ m.
  • the “etching amount” of the light-shielding resin film was measured with a stylus step meter (Alphastep IQ, manufactured by KLA Tencor).
  • the light shielding resin film is irradiated with light at an incident angle of 5 degrees, and its regular reflectance is measured using a spectrophotometer (Hitachi spectrophotometer U-4100, manufactured by Hitachi High-Tech) and has a wavelength of 420.
  • the average value of regular reflectance at ⁇ 650 ⁇ m and the standard deviation of regular reflectance at wavelengths of 420 to 650 ⁇ m were determined.
  • the results are shown in FIG. 20 and Table 1 show the measurement of the light shielding resin film of the near-infrared cut filter manufactured in the same manner except that the etching amount for the light shielding resin film was set to 0, that is, the light shielding resin film was not etched. The results were also shown.
  • the light-shielding resin film of the example has reduced regular reflection at all wavelengths measured, and has a good antireflection effect.
  • the etching amount is 0.6 ⁇ m or more
  • the standard deviation ( ⁇ ) of the regular reflectance is less than 0.5%, and the color deviation of the reflected light of the visible light is suppressed, so that the antireflection is better. Had characteristics.
  • Example 9 In the same manner as in Example 1, a dielectric multilayer film was formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-shaped infrared absorbing glass (NF-50 glass manufactured by Asahi Glass Co., Ltd.) by a vacuum deposition method. An antireflection film was formed on the other surface.
  • a dielectric multilayer film was formed on one surface of a 40 mm ⁇ 40 mm ⁇ 0.3 mm square plate-shaped infrared absorbing glass (NF-50 glass manufactured by Asahi Glass Co., Ltd.) by a vacuum deposition method.
  • An antireflection film was formed on the other surface.
  • the coating solution was applied by screen printing through a screen mask, and cured by heating to form a light shielding resin film.
  • the screen mask has a pattern in which a light shielding resin film as shown in FIG. 14A is formed when the glass material is divided along a dicing line in order to obtain a number of near infrared cut filters. A light shielding resin film having a shape corresponding to such a pattern is formed.
  • a bevel cut having an angle of 45 degrees formed between the bevel surface and the surface of the light shielding resin film was made on the light shielding resin film forming surface along the dicing line. Furthermore, the glass material was cut in the thickness direction by applying a step cut with a width of 0.1 mm to the bevel cut portion, and a total of 56 4.2 ⁇ 2 ⁇ 8 rows and 7 rows.
  • a near-infrared cut filter that was 4.9 mm rectangular and had a cross-sectional shape as shown in FIG. 14B was manufactured.
  • FIGS. 21A to 21C are cross-sectional views showing the dicing step
  • FIG. 21A is a step of bevel-cutting a glass material 10A in which a dielectric multilayer film and an antireflection film are formed on infrared absorbing glass
  • FIG. 21C shows a step of cutting the glass material 10A by applying a step cut to the bevel cut portion.
  • FIG. 21C shows the near-infrared cut filter 130 that has been cut into pieces.
  • 62 is a bevel cutting blade
  • 64 is a step cutting blade.
  • the optical filter of the present invention can be integrally provided with a light-shielding film having an antireflection effect that is excellent in productivity and economy and does not depend on the wavelength or angle of incident light, a digital still camera, a digital video camera, and a mobile phone It is useful for an imaging apparatus such as a small camera incorporated in an information device such as a notebook personal computer or PDA.
  • SYMBOLS 10 (Near-infrared cut) Filter main body, 11 ... Transparent base material, 12 ... Ultraviolet / infrared light reflection film, 13 ... Antireflection film, 15 ... Infrared light absorption film, 20 ... Light shielding resin film, 20A ... Photocuring Resin layer, 22 ... fine uneven structure, 22a ... negative moth eye structure, 22b ... positive moth eye structure, 22c ... mat surface-like uneven structure, 24 ... chamfered portion, 30 ... imprint mold for forming negative moth eye structure, 40 DESCRIPTION OF SYMBOLS: Imprint type for positive type moth-eye structure formation, 50 ... Imaging device, 51 ... Solid-state image sensor, 52 ... Optical filter, 53 ... Lens, 54 ... Housing, 100, 110, 120, 130, 140 ... Near-infrared cut filter.

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Abstract

La présente invention se rapporte à un filtre optique comprenant : un corps principal de filtre optique qui est placé entre un élément de capture d'image et un sujet ou une source de lumière et qui permet à une lumière incidente de passer ; et une couche mince de résine de blocage de la lumière qui est formée intégralement sur au moins une surface du corps principal de filtre optique dans le but de bloquer une partie de la lumière incidente sur l'élément de capture d'image. Enfin, une fine structure concavo-convexe est formée sur la surface de lumière incidente de la couche mince de résine de blocage de la lumière, dans le but d'empêcher la réflexion de lumière.
PCT/JP2012/077439 2011-10-24 2012-10-24 Filtre optique, procédé pour sa fabrication et dispositif de capture d'image WO2013061990A1 (fr)

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KR1020137024439A KR101483386B1 (ko) 2011-10-24 2012-10-24 광학 필터와 그의 제조 방법, 및 촬상 장치
KR1020147017159A KR20140089441A (ko) 2011-10-24 2012-10-24 광학 필터와 그의 제조 방법, 및 촬상 장치
JP2013540801A JP6197647B2 (ja) 2011-10-24 2012-10-24 光学フィルタとその製造方法、並びに撮像装置

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JPWO2020066338A1 (ja) * 2018-09-28 2021-05-20 富士フイルム株式会社 転写材料、積層体、及び、積層体の製造方法
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