WO2018062481A1 - Matériau antireflet et son procédé de fabrication - Google Patents

Matériau antireflet et son procédé de fabrication Download PDF

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Publication number
WO2018062481A1
WO2018062481A1 PCT/JP2017/035465 JP2017035465W WO2018062481A1 WO 2018062481 A1 WO2018062481 A1 WO 2018062481A1 JP 2017035465 W JP2017035465 W JP 2017035465W WO 2018062481 A1 WO2018062481 A1 WO 2018062481A1
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WO
WIPO (PCT)
Prior art keywords
concavo
light
convex structure
layer
material according
Prior art date
Application number
PCT/JP2017/035465
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English (en)
Japanese (ja)
Inventor
谷口豊
縄田晃史
北原淑行
田中覚
Original Assignee
Ｓｃｉｖａｘ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Ｓｃｉｖａｘ株式会社 filed Critical Ｓｃｉｖａｘ株式会社
Priority to JP2018542924A priority Critical patent/JPWO2018062481A1/ja
Publication of WO2018062481A1 publication Critical patent/WO2018062481A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/02—Diaphragms

Definitions

  • the present invention relates to an antireflection material that suppresses reflection of light on the surface and a method for manufacturing the same.
  • the concavo-convex structure was not controlled and was not yet sufficient from the viewpoint of antireflection. Further, prevention of diffracted light caused by the uneven structure is not taken into consideration. Furthermore, there is a problem that it is difficult to manufacture the uneven structure.
  • an object of the present invention is to provide an antireflection material capable of further suppressing light reflection and a method for manufacturing the same.
  • the antireflection material of the present invention has a reflection suppressing layer in which a concavo-convex structure for suppressing reflection of incident light is formed on the first surface, and a second surface of the reflection suppressing layer. And a light absorption layer that absorbs light transmitted through the reflection suppression layer.
  • Another antireflection material according to the present invention is formed on the second surface of the reflection suppressing layer, the reflection suppressing layer in which the concavo-convex structure for suppressing the reflection of incident light is formed on the first surface, and arbitrarily And an adhesive layer capable of adhering to the surface.
  • an adhesive layer capable of adhering to the surface.
  • the refractive index n 2 preferably satisfies 0.9n 1 ⁇ n 2 ⁇ 1.1n 2 .
  • the antireflection layer in the antireflection material of the present invention can be formed of a material having a self-repair function.
  • the material of the reflection suppressing layer may be an imprinting resin.
  • the concavo-convex structure preferably satisfies P> ⁇ , more preferably P ⁇ 6 ⁇ , where ⁇ is the wavelength of the light and P is the average pitch of the concavo-convex structure.
  • the uneven structure preferably has an average pitch P of 10 ⁇ m or less.
  • the light absorbing layer may contain a light absorbing component that absorbs the light, and the average particle diameter of the light absorbing component may be less than or equal to one-half of the wavelength of the light.
  • the concavo-convex structure can be a structure satisfying H / P ⁇ 1, where H is the average depth of the concavo-convex structure.
  • the thickness of the light absorption layer is L, it is preferable to satisfy L ⁇ ⁇ .
  • the concavo-convex structure has a form that does not generate diffracted light.
  • the concavo-convex structure has a random arrangement of element structures of the concavo-convex structure.
  • the concavo-convex structure is one in which either one or both of the size and shape of the element structure are adjusted so that the planar portion is smaller than when the size and shape of the element structure are constant. Is preferred.
  • the element structure of the concavo-convex structure has a shell shape obtained by rotating a parabola.
  • the uneven structure may be a line and space shape.
  • the cross-sectional shape of the line-and-space convex portion is a triangle.
  • the manufacturing method of the antireflection material of the present invention includes a concavo-convex structure forming step for forming a concavo-convex structure for suppressing reflection of incident light on the first surface of the transparent thin film, and before or after the concavo-convex structure forming step. And a two-layer forming step of disposing the transparent thin film on a light absorbing layer that absorbs light transmitted through the transparent thin film.
  • the uneven structure forming step can be performed by optical imprinting.
  • the antireflection material of the present invention can sufficiently suppress the reflection of light by controlling the concavo-convex structure. Further, by dividing the antireflection agent into the reflection suppressing layer and the light absorbing layer, the range of materials selection of the reflection suppressing layer forming the concavo-convex structure can be expanded.
  • FIG. 5 is an explanatory diagram showing the shape of the concavo-convex structure viewed from the direction of the II line in FIG. 4. It is a perspective view which shows another antireflection material of this invention. It is a graph which shows the reflective characteristic of another antireflection material of the present invention. It is explanatory drawing which shows the shape of the cross section of an uneven structure.
  • the antireflection material 1 of the present invention is for preventing reflection of light having a predetermined wavelength ⁇ , and is formed on the antireflection layer 2 and the second surface 22 of the antireflection layer 2 as shown in FIG. And a light absorption layer 4 that absorbs light transmitted through the reflection suppression layer 2.
  • the reflection suppression layer 2 has a first surface 21 and a second surface 22, and the first surface 21 has a concavo-convex structure 3 that suppresses reflection of incident light.
  • the material of the reflection suppression layer 2 may be any material as long as it transmits light that is desired to prevent reflection.
  • a material that is optically transparent in the visible light region of 400 nm to 780 nm glass or resin is used. Can be used.
  • a material containing quartz glass or sapphire glass having a high ultraviolet transmittance it is preferable to use a material containing quartz glass or sapphire glass having a high ultraviolet transmittance.
  • the reflection suppressing layer 2 is made of an elastic material capable of self-healing at least the concavo-convex structure 3 with respect to an external force in a use environment.
  • elastic materials include urethane acrylate, silicon resin, PDMS, and rotaxane.
  • the shape of the entire reflection suppressing layer 2 is not particularly limited as long as it has the first surface 21 and the second surface 22, and can be freely selected according to the function and application of the optical member, such as a planar shape or a curved surface shape. Can be designed.
  • the concavo-convex structure 3 is for suppressing reflection of incident light.
  • the concavo-convex structure may be any shape as long as light reflection can be suppressed, but it is preferable that the concavo-convex structure does not generate diffracted light.
  • the average pitch P of the concavo-convex structure 3 is smaller than the wavelength ⁇ of light, diffracted light may be generated by the concavo-convex structure 3. Therefore, it is better to form the average pitch P of the concavo-convex structure 3 larger than the wavelength ⁇ of light. That is, it may be formed so as to satisfy P> ⁇ .
  • the light here means light (electromagnetic wave) having a predetermined wavelength for which reflection is desired to be prevented. Therefore, when the light includes a plurality of electromagnetic waves having different wavelengths, it is necessary to configure the concavo-convex structure 3 so as to satisfy P> ⁇ for all wavelengths of light that are desired to be prevented from being reflected. That is, if the maximum wavelength of the electromagnetic wave contained in light is ⁇ max, the concavo-convex structure 3 may be configured to satisfy P> ⁇ max. For example, in order to prevent reflection of all electromagnetic waves with respect to visible light having a wavelength in the range of 380 nm to 780 nm, the concavo-convex structure 3 may be configured to satisfy P> 780 nm.
  • the average pitch P is preferably 10 ⁇ m or less.
  • a method for preventing the generation of diffracted light there is a method of randomizing the arrangement of the element structure of the concavo-convex structure 3.
  • the size and shape of the element structure of the concavo-convex structure 3 remain the same and only the arrangement is made random, a gap is generated between the element structures, and a flat portion is generated.
  • a flat portion does not occur between the element structures.
  • a concavo-convex structure may be further formed on the flat portion by ashing or the like.
  • the formation of the concavo-convex structure 3 may be processing by sandblasting or the like, but in such processing, the form of the concavo-convex structure 3 is not controlled, and reflected light or diffracted light may be generated depending on circumstances. Therefore, it is preferable to form the element structure of the concavo-convex structure 3 by controlling the shape of the element structure, for example, the shape of the element structure, the pitch of the adjacent element structure, the depth of the element structure, the aspect ratio which is the ratio of the pitch to the depth, .
  • the shape of the element structure for example, the shape of the element structure, the pitch of the adjacent element structure, the depth of the element structure, the aspect ratio which is the ratio of the pitch to the depth.
  • imprint processing, embossing, injection molding, etc. are mentioned, for example.
  • the material of the reflection suppressing layer 2 is preferably a material suitable for a manufacturing method capable of controlling the form of the concavo-convex structure 3 such as imprinting, embossing, injection molding or the like.
  • Materials suitable for imprint processing include thermoplastic resins and thermosetting resins suitable for thermal imprinting.
  • the antireflection material of the present invention is divided into the antireflection layer 2 and the light absorption layer 4, the antireflection material that forms the concavo-convex structure 3 as compared with the case where the concavo-convex structure 3 is provided in the light absorption layer 4.
  • the range of material selection for the layer 2 can be expanded.
  • a transparent material can be used as the material of the reflection suppressing layer 2 that forms the uneven structure 3. Therefore, it is also possible to use a photocurable resin suitable for optical imprinting as the material of the reflection suppressing layer 2, and the concavo-convex structure 3 can be formed by optical imprinting.
  • the uneven structure 3 is formed on the first surface of the transparent thin film (uneven structure forming step).
  • This transparent thin film is arrange
  • the arrangement of the transparent thin film on the light absorption layer 4 may be performed before or after the concavo-convex structure forming step.
  • a transparent thin film is formed by applying a photocurable resin on the film-like light absorbing layer 4 to form two layers. Thereafter, the uneven structure 3 may be formed on the transparent thin film by an imprint technique or the like.
  • the concavo-convex structure 3 may be formed first on the transparent thin film by an imprint technique or the like, and the transparent thin film may be disposed on the light absorption layer 4. In this case, the transparent thin film and the light absorption layer 4 may be joined by welding, application of an adhesive, or the like.
  • the light absorption layer 4 may be any material that absorbs at least the light transmitted through the reflection suppression layer 2.
  • the material that absorbs light refers to a material that absorbs light more than at least reflects light.
  • the extinction coefficient k is 0.4 or less, preferably 0.2 or less. More preferably, it is 0.1 or less. Examples of such a material include black pigments such as carbon black, aniline black, titanium black, and acetylene black.
  • black pigments such as carbon black, aniline black, titanium black, and acetylene black.
  • the particle diameter of the light absorption component is preferably sufficiently small with respect to the wavelength of light to be absorbed so that scattering and reflection do not occur.
  • the average particle diameter of the particles contained in the material should be less than or equal to one-half of the wavelength of light to be absorbed, more preferably less than or equal to one-fourth.
  • a particle size distribution measuring apparatus for example, an image imaging method in which an image of a particle is directly obtained with an electron microscope such as a transmission electron microscope (TEM) and converted into a particle size from the image image, or a particle group Is measured by a laser diffraction / scattering method in which a particle size distribution is obtained by calculation from an intensity distribution pattern of diffraction / scattered light emitted from the laser beam.
  • TEM transmission electron microscope
  • the thickness L of the light absorption layer 4 is too small compared to the wavelength ⁇ of light, the light is likely to pass through the light absorption layer 4 and the light absorption effect of the antireflection material 1 may be reduced. Therefore, it is preferable that the thickness of the light absorption layer 4 satisfies L ⁇ ⁇ .
  • FIG. 2 is a simulation and comparison of the relationship between the incident angle ⁇ (°) of light with respect to the concavo-convex structure 3 and the light reflectance for each size of the concavo-convex structure 3.
  • the shape of the concavo-convex structure 3 is a hole (element structure) formed of a parabolic rotating body satisfying the following formula (1) when the depth is H and the width is D.
  • the depth H of the concavo-convex structure 3 was compared in the case of 0.5 ⁇ m, 1 ⁇ m, 1.5 ⁇ m, 2 ⁇ m, 2.5 ⁇ m, 3 ⁇ m, 3.5 ⁇ m, 4 ⁇ m, 4.5 ⁇ m, and 5 ⁇ m.
  • the thickness of the remaining film of the reflection suppression layer (the portion where the uneven structure 3 is not formed) was 10 ⁇ m, and the thickness of the reflection suppression layer 2 was 100 ⁇ m.
  • the wavelength ⁇ of the light from the light source was 500 nm.
  • the concavo-convex structure 3 may have a line and space shape as shown in FIG.
  • the antireflection characteristic has a defect such as anisotropy, but there is an advantage that the strength of the concavo-convex structure 3 can be increased.
  • FIG. 7 is a simulation and comparison of the relationship between the incident angle ⁇ of light and the reflectance of light with respect to the concavo-convex structure 3 having a line-and-space configuration for each wavelength of incident light.
  • FIG. 7A shows the result when light from the light source is applied to the concavo-convex structure 3 at an incident angle with a line orthogonal to the line and space as an axis
  • FIG. 7B shows the line of space and line.
  • the concavo-convex structure 3 has a line-and-space structure composed of an isosceles triangle having a cross-sectional height (depth) of 15 ⁇ m and a base length (width) of 10 ⁇ m.
  • the thickness of the remaining film (the portion where the uneven structure 3 is not formed) of the reflection suppressing layer 2 was 10 ⁇ m, and the thickness of the light absorption layer 4 was 100 ⁇ m.
  • the wavelength ⁇ of the light from the light source was set to four types of 400 nm, 500 nm, 600 nm, and 700 nm.
  • FIG. 8 (b) a simulation was also performed for a line-and-space structure composed of an isosceles triangle having a cross-section height (depth) of 1.5 ⁇ m and a base length (width) of 1 ⁇ m. went. Also in this case, the thickness of the remaining film of the reflection suppressing layer 2 (the portion where the uneven structure 3 is not formed) was 10 ⁇ m, and the thickness of the light absorption layer 4 was 100 ⁇ m.
  • FIG. FIG. 9A shows the result when light from the light source is applied to the concavo-convex structure 3 at an incident angle with a line orthogonal to the line and space as an axis
  • FIG. 9B shows the line of space and line. The result when light from the light source is applied to the concavo-convex structure 3 at an incident angle as an axis is shown.
  • Fig. 7 shows that reflection is sufficiently suppressed. Further, as compared with FIG. 9, it can be seen that the reflectance decreases as the line and space constituting the concavo-convex structure increases.
  • the relationship between the wavelength of light and the reflectance of the antireflection material of the present invention was measured.
  • the antireflection material of the present invention (Example 1), a light-absorbing layer made of a black paint (Toyocolor TB8100) and a UV curable self-recovering paint (made by Tokushi Co., Ltd.) on a base made of polyethylene terephthalate (PET).
  • a reflection suppression layer formed of AUP-838C-80) was used.
  • Example 2 Further, ashing was performed on the antireflection material of Example 1, and a concavo-convex structure smaller than the concavo-convex structure 3 was formed on the surface of the concavo-convex structure 3 (including the flat portion 31 positioned between the element structures) ( Example 2) was prepared.
  • Comparative Example 1 Velvet (Magellan Original Flocking Paper 1304)
  • Comparative Example 2 Metal Velvet (Acktar)
  • Comparative Example 3 Soma Black (Soma Black Soma Black NR-N50)
  • Comparative Example 4 Spectral Black (Acktar) Comparative Example 5: Super Black IR (Shibuya Optical Co., Ltd.)
  • FIG. 11 shows that the antireflection materials of Examples 1 and 2 can suppress reflection more than visible light compared to the antireflection materials of Comparative Examples 3 to 5. Moreover, it turns out that reflection can be suppressed compared with Comparative Examples 1 and 2 in the long wavelength side among visible light.
  • the incident angles are 5 °, 45 °, and 60 °.
  • the measurement results of the reflectance are shown in FIGS.
  • the incident angle is 60 °
  • the reflectance of the antireflection material of Comparative Example 2 greatly exceeds 0.2%, and thus the reflection spectrum is not displayed in FIG.
  • Example 2 As shown in FIG. 12 to FIG. 14, it can be seen that the reflectance in Example 2 is lower than that in Example 1 when the incident angles are 5 °, 45 °, and 60 °.
  • the reflection suppressing layer 2 and the light absorption layer 4 are integrally formed.
  • the adhesive layer 5 is formed on the second surface 22 of the reflection suppressing layer 2 described above and can adhere to an arbitrary surface. May be provided.
  • the material of the adhesive layer 5 has a difference between the refractive index of the reflection suppressing layer 2 and the refractive index of the adhesive layer 5 of 10% or less.
  • the material of the adhesive layer 5, the refractive index of the antireflection layer 2 n 1, the refractive index of the adhesive layer 5 and n 2, the refractive index n 2 is 0.9n 1 ⁇ n 2 ⁇ 1.1 N Those satisfying 2 are preferred.
  • the refractive index of the reflection suppressing layer 2 and the refractive index of the adhesive layer 5 are the same.
  • the material of the reflection suppressing layer 2 is a PMMA UV resin (refractive index: 1.49)
  • an acrylic pressure-sensitive adhesive for OCA (refractive index: 1.49) is used as the material of the adhesive layer 5.
  • Etc. can be used.
  • the surface 52 of the adhesive layer 5 is inconvenient as it may be inadvertently adhered to other things. Therefore, as shown in FIG. 15B, it is preferable to include a cover 6 formed on the surface 52 of the adhesive layer 5 and removable from the adhesive layer 5.
  • a cover any cover can be used as long as it can be easily peeled off from the adhesive layer.
  • a separator film (PET) having a thickness of 25 ⁇ m can be used.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

La présente invention vise à fournir un matériau antireflet de type absorption qui peut supprimer suffisamment la réflexion de la lumière. Un matériau antireflet 1 comprend principalement une couche de suppression de réflexion 2 dans laquelle une structure texturée 3 pour supprimer la réflexion de la lumière incidente est formée sur une première surface 21, et une couche d'absorption de lumière 4 formée sur une seconde surface 22 de la couche de suppression de réflexion 2 pour absorber la lumière traversant la couche de suppression de réflexion 2. La couche de suppression de réflexion 2 est de préférence faite d'un matériau ayant une fonction d'auto-réparation. De plus, la structure texturée possède de préférence une forme, telle qu'une taille et une disposition aléatoires, de telle sorte qu'aucune lumière diffractée ne se produise.
PCT/JP2017/035465 2016-09-30 2017-09-29 Matériau antireflet et son procédé de fabrication WO2018062481A1 (fr)

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JP2018542924A JPWO2018062481A1 (ja) 2016-09-30 2017-09-29 反射防止材およびその製造方法

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JP2016194167 2016-09-30
JP2016-194167 2016-09-30

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021075066A1 (fr) * 2019-10-18 2021-04-22 大塚テクノ株式会社 Structure de prévention de réflexion

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Publication number Priority date Publication date Assignee Title
JP2003004904A (ja) * 2001-06-25 2003-01-08 Dainippon Printing Co Ltd 高屈折率化した防眩層を有する反射防止フィルム及び低反射表示装置
JP3676260B2 (ja) * 2000-12-28 2005-07-27 ナトコ株式会社 活性エネルギー線硬化性ウレタン（メタ）アクリレート及び活性エネルギー線硬化性組成物並びにそれらの用途
WO2013061990A1 (fr) * 2011-10-24 2013-05-02 旭硝子株式会社 Filtre optique, procédé pour sa fabrication et dispositif de capture d'image
WO2014163198A1 (fr) * 2013-04-05 2014-10-09 三菱レイヨン株式会社 Structure multicouche, procédé permettant de produire celle-ci, et article
JP2016057335A (ja) * 2014-09-05 2016-04-21 ソニー株式会社 積層体、ならびに撮像素子パッケージ、撮像装置および電子機器

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3676260B2 (ja) * 2000-12-28 2005-07-27 ナトコ株式会社 活性エネルギー線硬化性ウレタン（メタ）アクリレート及び活性エネルギー線硬化性組成物並びにそれらの用途
JP2003004904A (ja) * 2001-06-25 2003-01-08 Dainippon Printing Co Ltd 高屈折率化した防眩層を有する反射防止フィルム及び低反射表示装置
WO2013061990A1 (fr) * 2011-10-24 2013-05-02 旭硝子株式会社 Filtre optique, procédé pour sa fabrication et dispositif de capture d'image
WO2014163198A1 (fr) * 2013-04-05 2014-10-09 三菱レイヨン株式会社 Structure multicouche, procédé permettant de produire celle-ci, et article
JP2016057335A (ja) * 2014-09-05 2016-04-21 ソニー株式会社 積層体、ならびに撮像素子パッケージ、撮像装置および電子機器

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021075066A1 (fr) * 2019-10-18 2021-04-22 大塚テクノ株式会社 Structure de prévention de réflexion
JP2021067735A (ja) * 2019-10-18 2021-04-30 大塚テクノ株式会社 反射防止構造体
EP3828599A4 (fr) * 2019-10-18 2021-07-28 Otsuka Techno Corporation Structure de prévention de réflexion
CN114556161A (zh) * 2019-10-18 2022-05-27 大冢科技株式会社 防反射构造体
CN114556161B (zh) * 2019-10-18 2024-06-11 大冢科技株式会社 防反射构造体

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